TWI414885B - 用於形成彩色層的輻射敏感性組成物以及彩色濾光片 - Google Patents

用於形成彩色層的輻射敏感性組成物以及彩色濾光片 Download PDF

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Publication number
TWI414885B
TWI414885B TW96109933A TW96109933A TWI414885B TW I414885 B TWI414885 B TW I414885B TW 96109933 A TW96109933 A TW 96109933A TW 96109933 A TW96109933 A TW 96109933A TW I414885 B TWI414885 B TW I414885B
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TW
Taiwan
Prior art keywords
weight
solvent
meth
parts
forming
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TW96109933A
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English (en)
Chinese (zh)
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TW200804975A (en
Inventor
Hiroki Ohara
Koji Hirano
Shingo Naruse
Original Assignee
Jsr Corp
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Publication of TW200804975A publication Critical patent/TW200804975A/zh
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Publication of TWI414885B publication Critical patent/TWI414885B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW96109933A 2006-03-22 2007-03-22 用於形成彩色層的輻射敏感性組成物以及彩色濾光片 TWI414885B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006078037A JP4904869B2 (ja) 2006-03-22 2006-03-22 着色層形成用感放射線性組成物およびカラーフィルタ

Publications (2)

Publication Number Publication Date
TW200804975A TW200804975A (en) 2008-01-16
TWI414885B true TWI414885B (zh) 2013-11-11

Family

ID=38630737

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96109933A TWI414885B (zh) 2006-03-22 2007-03-22 用於形成彩色層的輻射敏感性組成物以及彩色濾光片

Country Status (5)

Country Link
JP (1) JP4904869B2 (ja)
KR (1) KR101345427B1 (ja)
CN (1) CN101042532B (ja)
SG (1) SG136094A1 (ja)
TW (1) TWI414885B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4987404B2 (ja) * 2006-09-28 2012-07-25 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性樹脂組成物
JP5224030B2 (ja) * 2007-03-22 2013-07-03 Ｊｓｒ株式会社 熱硬化性樹脂組成物、保護膜および保護膜の形成方法
JP5535814B2 (ja) * 2009-09-14 2014-07-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
JP2011148950A (ja) * 2010-01-25 2011-08-04 Fujifilm Corp 硬化性組成物、カラーフィルタおよびその製造方法
CN102445853B (zh) * 2010-10-12 2013-10-16 京东方科技集团股份有限公司 感光树脂组合物、彩色滤光片及其制备方法
JP5994782B2 (ja) * 2011-08-30 2016-09-21 旭硝子株式会社 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子
JP2013195973A (ja) * 2012-03-22 2013-09-30 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
US9790393B2 (en) * 2013-03-13 2017-10-17 Cabot Corporation Coatings having filler-polymer compositions with combined low dielectric constant, high resistivity, and optical density properties and controlled electrical resistivity, devices made therewith, and methods for making same
JP6460836B2 (ja) * 2015-02-26 2019-01-30 東京応化工業株式会社 非回転式塗布用組成物及び樹脂組成物膜形成方法
JP6695369B2 (ja) * 2017-02-16 2020-05-20 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
CN107490817A (zh) * 2017-10-09 2017-12-19 青岛海信电器股份有限公司 Qdcf、其加工方法及应用
US20230185190A1 (en) * 2021-12-10 2023-06-15 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same and color filter

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1321254A (zh) * 1999-07-28 2001-11-07 松下电器产业株式会社 滤色片的制造方法、滤色片和液晶器件
JP2003055566A (ja) * 2001-08-23 2003-02-26 Mitsubishi Chemicals Corp 硬化性樹脂組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62251739A (ja) * 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd 感光性組成物
JPH0667420A (ja) * 1992-08-19 1994-03-11 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH086244A (ja) * 1994-06-17 1996-01-12 Shin Etsu Chem Co Ltd 感放射線性レジスト組成物
TWI300795B (en) * 2001-08-21 2008-09-11 Mitsubishi Chem Corp Curable resin composition for die coating and process for producing color filter
JP2004144976A (ja) * 2002-10-24 2004-05-20 Toray Ind Inc カラーフィルター用着色ペーストおよびカラーフィルター
JP4627617B2 (ja) * 2003-05-23 2011-02-09 東洋インキ製造株式会社 着色組成物、カラーフィルタの製造方法およびブラックマトリックス基板の製造方法
JP2007148258A (ja) * 2005-11-30 2007-06-14 Daicel Chem Ind Ltd レジスト組成物
JP4835210B2 (ja) * 2006-03-10 2011-12-14 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、カラーフィルタおよびカラーフィルタの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1321254A (zh) * 1999-07-28 2001-11-07 松下电器产业株式会社 滤色片的制造方法、滤色片和液晶器件
JP2003055566A (ja) * 2001-08-23 2003-02-26 Mitsubishi Chemicals Corp 硬化性樹脂組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置

Also Published As

Publication number Publication date
SG136094A1 (en) 2007-10-29
TW200804975A (en) 2008-01-16
CN101042532A (zh) 2007-09-26
KR101345427B1 (ko) 2013-12-27
JP2007256407A (ja) 2007-10-04
CN101042532B (zh) 2012-04-25
JP4904869B2 (ja) 2012-03-28
KR20070095801A (ko) 2007-10-01

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