SG136094A1 - Radiation sensitive composition for forming a colored layer and color filter - Google Patents

Radiation sensitive composition for forming a colored layer and color filter

Info

Publication number
SG136094A1
SG136094A1 SG200702124-9A SG2007021249A SG136094A1 SG 136094 A1 SG136094 A1 SG 136094A1 SG 2007021249 A SG2007021249 A SG 2007021249A SG 136094 A1 SG136094 A1 SG 136094A1
Authority
SG
Singapore
Prior art keywords
forming
color filter
colored layer
radiation sensitive
sensitive composition
Prior art date
Application number
SG200702124-9A
Other languages
English (en)
Inventor
Hiroki Ohara
Koji Hirano
Shingo Naruse
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG136094A1 publication Critical patent/SG136094A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
SG200702124-9A 2006-03-22 2007-03-22 Radiation sensitive composition for forming a colored layer and color filter SG136094A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006078037A JP4904869B2 (ja) 2006-03-22 2006-03-22 着色層形成用感放射線性組成物およびカラーフィルタ

Publications (1)

Publication Number Publication Date
SG136094A1 true SG136094A1 (en) 2007-10-29

Family

ID=38630737

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200702124-9A SG136094A1 (en) 2006-03-22 2007-03-22 Radiation sensitive composition for forming a colored layer and color filter

Country Status (5)

Country Link
JP (1) JP4904869B2 (ja)
KR (1) KR101345427B1 (ja)
CN (1) CN101042532B (ja)
SG (1) SG136094A1 (ja)
TW (1) TWI414885B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4987404B2 (ja) * 2006-09-28 2012-07-25 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性樹脂組成物
JP5224030B2 (ja) * 2007-03-22 2013-07-03 Ｊｓｒ株式会社 熱硬化性樹脂組成物、保護膜および保護膜の形成方法
JP5535814B2 (ja) * 2009-09-14 2014-07-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
JP2011148950A (ja) * 2010-01-25 2011-08-04 Fujifilm Corp 硬化性組成物、カラーフィルタおよびその製造方法
CN102445853B (zh) * 2010-10-12 2013-10-16 京东方科技集团股份有限公司 感光树脂组合物、彩色滤光片及其制备方法
JP5994782B2 (ja) * 2011-08-30 2016-09-21 旭硝子株式会社 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子
JP2013195973A (ja) * 2012-03-22 2013-09-30 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP6173556B2 (ja) * 2013-03-13 2017-08-02 キャボット コーポレイションＣａｂｏｔ Ｃｏｒｐｏｒａｔｉｏｎ 組み合わされた低誘電率、高抵抗率及び光学濃度特性、ならびに、制御された電気抵抗率を有するフィラー−ポリマー組成物を含むコーティング、それから製造されるデバイス及びその製造方法
JP6460836B2 (ja) * 2015-02-26 2019-01-30 東京応化工業株式会社 非回転式塗布用組成物及び樹脂組成物膜形成方法
JP6695369B2 (ja) * 2017-02-16 2020-05-20 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
CN107490817A (zh) * 2017-10-09 2017-12-19 青岛海信电器股份有限公司 Qdcf、其加工方法及应用
US20230185190A1 (en) * 2021-12-10 2023-06-15 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same and color filter

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62251739A (ja) * 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd 感光性組成物
JPH0667420A (ja) * 1992-08-19 1994-03-11 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH086244A (ja) * 1994-06-17 1996-01-12 Shin Etsu Chem Co Ltd 感放射線性レジスト組成物
WO2001007941A1 (fr) * 1999-07-28 2001-02-01 Matsushita Electric Industrial Co., Ltd. Procede de fabrication d'un filtre colore, filtre colore et dispositif a cristaux liquides
TWI300795B (en) * 2001-08-21 2008-09-11 Mitsubishi Chem Corp Curable resin composition for die coating and process for producing color filter
JP4108303B2 (ja) * 2001-08-23 2008-06-25 三菱化学株式会社 硬化性樹脂組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置
JP2004144976A (ja) * 2002-10-24 2004-05-20 Toray Ind Inc カラーフィルター用着色ペーストおよびカラーフィルター
JP4627617B2 (ja) * 2003-05-23 2011-02-09 東洋インキ製造株式会社 着色組成物、カラーフィルタの製造方法およびブラックマトリックス基板の製造方法
JP2007148258A (ja) * 2005-11-30 2007-06-14 Daicel Chem Ind Ltd レジスト組成物
JP4835210B2 (ja) * 2006-03-10 2011-12-14 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、カラーフィルタおよびカラーフィルタの製造方法

Also Published As

Publication number Publication date
JP4904869B2 (ja) 2012-03-28
TWI414885B (zh) 2013-11-11
CN101042532A (zh) 2007-09-26
CN101042532B (zh) 2012-04-25
TW200804975A (en) 2008-01-16
KR101345427B1 (ko) 2013-12-27
KR20070095801A (ko) 2007-10-01
JP2007256407A (ja) 2007-10-04

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