TWI397350B - 用於量產之大氣壓電漿產生裝置 - Google Patents

用於量產之大氣壓電漿產生裝置 Download PDF

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Publication number
TWI397350B
TWI397350B TW098102521A TW98102521A TWI397350B TW I397350 B TWI397350 B TW I397350B TW 098102521 A TW098102521 A TW 098102521A TW 98102521 A TW98102521 A TW 98102521A TW I397350 B TWI397350 B TW I397350B
Authority
TW
Taiwan
Prior art keywords
gas
frame
temperature
mass production
atmospheric piezoelectric
Prior art date
Application number
TW098102521A
Other languages
English (en)
Chinese (zh)
Other versions
TW200939905A (en
Inventor
Sang Ro Lee
Seong Sil Im
Yun Hwan Kim
Woo Cheol Choi
Original Assignee
Se Plasma Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Se Plasma Inc filed Critical Se Plasma Inc
Publication of TW200939905A publication Critical patent/TW200939905A/zh
Application granted granted Critical
Publication of TWI397350B publication Critical patent/TWI397350B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW098102521A 2008-01-25 2009-01-22 用於量產之大氣壓電漿產生裝置 TWI397350B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080008071A KR100975665B1 (ko) 2008-01-25 2008-01-25 양산용 상압 플라즈마 발생장치

Publications (2)

Publication Number Publication Date
TW200939905A TW200939905A (en) 2009-09-16
TWI397350B true TWI397350B (zh) 2013-05-21

Family

ID=41028308

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098102521A TWI397350B (zh) 2008-01-25 2009-01-22 用於量產之大氣壓電漿產生裝置

Country Status (3)

Country Link
JP (1) JP5015972B2 (ko)
KR (1) KR100975665B1 (ko)
TW (1) TWI397350B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101103349B1 (ko) * 2009-10-22 2012-01-05 (주)에스이피 Ｔｆｔ 기판의 패드영역 개방을 위한 대기압 플라즈마 에칭 장치 및 이를 이용한 대기압 플라즈마 에칭 방법
KR101598808B1 (ko) * 2014-06-25 2016-03-02 (주)트리비스 광폭 대기압 플라즈마 방전장치
EP3240308B1 (en) * 2016-04-29 2019-11-27 Interacoustics A/S Microphone calibration compensation from coupler transfer function
CN107774622A (zh) * 2016-08-25 2018-03-09 大连旭计器有限公司 温度控制器的电洗净装置
CN110463354B (zh) * 2017-04-04 2022-05-13 株式会社富士 等离子体产生系统
CN114286488B (zh) * 2021-12-30 2023-02-28 南京工业大学 一种基于气路模块化的大气压大尺度dbd材料改性装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003100646A (ja) * 2001-09-27 2003-04-04 Sekisui Chem Co Ltd 放電プラズマ処理装置
JP2005023546A (ja) * 2003-06-30 2005-01-27 Sumitomo Metal Steel Products Inc 金属管支柱
US6849306B2 (en) * 2001-08-23 2005-02-01 Konica Corporation Plasma treatment method at atmospheric pressure
TWI244112B (en) * 2003-05-14 2005-11-21 Sekisui Chemical Co Ltd Plasma processing apparatus and method for manufacturing the same
TWI260037B (en) * 2003-03-06 2006-08-11 Sekisui Chemical Co Ltd Plasma processing device and method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4151749B2 (ja) 1998-07-16 2008-09-17 東京エレクトロンＡｔ株式会社 プラズマ処理装置およびその方法
TW582050B (en) * 1999-03-03 2004-04-01 Ebara Corp Apparatus and method for processing substrate
KR100476136B1 (ko) * 2002-12-02 2005-03-10 주식회사 셈테크놀러지 대기압 플라즈마를 이용한 표면처리장치
JP3934101B2 (ja) * 2003-11-06 2007-06-20 積水化学工業株式会社 プラズマ化用の電極およびプラズマ処理装置
KR100529299B1 (ko) * 2003-05-09 2005-11-17 학교법인 한양학원 상압 플라즈마 분사장치
JP2007227068A (ja) * 2006-02-22 2007-09-06 Noritsu Koki Co Ltd ワーク処理装置
JP4724572B2 (ja) 2006-02-28 2011-07-13 株式会社サイアン ワーク処理装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6849306B2 (en) * 2001-08-23 2005-02-01 Konica Corporation Plasma treatment method at atmospheric pressure
JP2003100646A (ja) * 2001-09-27 2003-04-04 Sekisui Chem Co Ltd 放電プラズマ処理装置
TWI260037B (en) * 2003-03-06 2006-08-11 Sekisui Chemical Co Ltd Plasma processing device and method
TWI244112B (en) * 2003-05-14 2005-11-21 Sekisui Chemical Co Ltd Plasma processing apparatus and method for manufacturing the same
JP2005023546A (ja) * 2003-06-30 2005-01-27 Sumitomo Metal Steel Products Inc 金属管支柱

Also Published As

Publication number Publication date
JP5015972B2 (ja) 2012-09-05
KR20090081898A (ko) 2009-07-29
KR100975665B1 (ko) 2010-08-17
TW200939905A (en) 2009-09-16
JP2009172595A (ja) 2009-08-06

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