TWI397350B - Atmosphere pressure plasma generation device for mass production - Google Patents

Description

Atmospheric piezoelectric slurry generating device for mass production

The present invention relates to an atmospheric piezoelectric slurry generating apparatus for mass production, which is provided with a gas thermostat adjusting device on a generating device and maintains a gas flowing into the plasma generating device at a certain temperature, and is forcibly supplied at an initial stage. The thermal state change factor after a certain plasma generation time elapses, so that the processing characteristics in the initial state and the processing characteristics after the saturation state can be made uniform.

In general, flat panel display FPD (Flat Panel Display) such as Thin Film Transistor Liquid Crystal Display, Plasma Display Panel (PDP), Organic Light Emitting Diode (OLED) In the process of semiconductor substrate or the like, the substrate cleaning step is inevitably passed.

Wet steps are used in existing substrate cleaning steps, but plasma technology as a dry scrubbing technique is commonly used in recent years. As one of such plasma technologies, there is a method of using plasma in a low temperature and low pressure state.

The substrate cleaning method using low-temperature plasma is to remove ions or active gases generated in the low-pressure vacuum chamber due to the generation of plasma to the surface of the substrate, thereby removing impurities or contaminants on the surface of the substrate.

Such a substrate cleaning method using a low-pressure plasma has a good cleaning effect, but is not commonly used because a vacuum device is required for generating low-pressure plasma, and is not suitable for use under atmospheric pressure. Continuous steps.

Therefore, atmospheric piezoelectric slurry technology which produces plasma under atmospheric pressure and is used for substrate surface cleaning is being studied, and atmospheric piezoelectric slurry cleaning apparatus is different from existing "UV (which requires continuous maintenance cost due to lamp replacement). The UltraViolet) does not require additional costs after the equipment is supplied, so it is attracting attention as a future replacement for UV cleaners.

1 is a cross-sectional view of a plasma generating apparatus (100) utilizing a general atmospheric piezoelectric slurry source (130).

As shown in Fig. 1, a plasma generating device (100) using an atmospheric piezoelectric slurry source (130) is composed of an atmospheric piezoelectric slurry source (130) which is ejected to the surface of an LCD glass (150) to be cleaned. An oxygen radical generated in the slurry reaction; a power supply device (140) that applies an alternating voltage to the atmospheric piezoelectric slurry source (130); and a gas supply device (120) that transmits the above-mentioned atmospheric piezoelectric slurry source ( 130) The connected gas piping supplies a gas such as nitrogen, oxygen, air, and the like, and a conveying device (160) that conveys the LCD glass in one direction at a certain speed during the atmospheric pressure discharge of the atmospheric piezoelectric slurry source (130). ).

In the cleaning process in such a plasma generating device (100), the conveying device (160) formed at the lower end of the LCD glass (150) conveys the LCD glass (150) of the cleaning object in one direction at a certain speed. The atmospheric piezoelectric slurry source (130) formed at the upper end is subjected to plasma atmospheric pressure discharge to the LCD glass (150) to effect cleaning.

On the other hand, an atmospheric piezoelectric slurry cleaning method in which a plasma is generated under an atmospheric pressure state uses an oxygen radical in a plasma to remove an organic substance, a moisture in a substrate, and a residual polymer such as a residual polymer generated when a circuit is manufactured. Therefore, it has the advantages of protecting the environment and high cleaning efficiency.

2a and 2b are cross-sectional views showing a conventional atmospheric piezoelectric slurry source (200).

As shown in Fig. 2a, the conventional atmospheric piezoelectric slurry source (200) is a gas supply device or the like on both sides, and the gas from the outside is supplied from the gas supply port (200a to 200h) to be filled into the atmospheric piezoelectric slurry source (200). The body thus distributes the gas fluid inside the atmospheric piezoelectric slurry source (200) evenly, and the generation of the plasma becomes uniform.

Figure 2b is a side cross-sectional view of the atmospheric piezoelectric slurry source (200) of Figure 2a.

As shown in Fig. 2b, the atmospheric piezoelectric slurry source (200) represents a dielectric discharge (DBD: Dielectric Barrier Discharge) plasma device.

As shown in the above figures, a pair of electrodes are disposed apart from each other and face to face, and dielectrics having a thickness of 25 μm to 10 mm are disposed facing each other on the mutually facing faces of the electrodes, and are 0.1 between the electrodes facing each other. A discharge interval is formed from mm to 0.5 mm.

As shown in the above figure, a gas distributor (210) for uniformly distributing the gas supplied through the gas supply port to the inside of the plasma source is disposed at the upper end. The gas distributor (210) is disposed in order to achieve a uniform degree of gas flow into the dielectric space (260) to achieve uniformity of plasma generation.

That is, the uniformity of the prior art is aimed at achieving uniformity of plasma having the following functions, that is, uniformizing the gas supply, the thickness of the dielectric, and the interval between the electrodes when the surface is improved before and after the cleaning, thereby uniformly generating electricity. The slurry has the same processing capability regardless of the position of the object to be processed in the PR ashing or etching process. However, in other fields of application of atmospheric piezoelectric pastes, the uniformity of processing effects over time is also very high. In the above PR ashing or Etching processes, changes in processing effects over time become very important issues.

That is, in the conventional plasma generating apparatus, uniform generation of plasma due to uniform supply of gas or the like and uniform processing of the processed object are popular items, but failure to solve the problem of generating plasma post-processing ability exists over time. The problem of difference.

On the other hand, it takes a long time from the generation of the plasma to the saturation state, so there is a problem that it takes a long time in mass production.

The present invention has been made to solve such a problem, and an object of the invention is to provide a plasma generating device including a gas thermostat capable of constant temperature of a gas flowing into a plasma generating device and A gas medium temperature control device capable of controlling the temperature of a gaseous medium inside a frame, thereby producing uniform plasma even over time.

In order to achieve the above object, the present invention provides an atmospheric piezoelectric slurry generating apparatus for mass production, comprising: a power supply electrode connected to a direct current pulse or an alternating current power source; and being separated from the power supply electrode and formed with a plasma gas. a ground electrode for ejecting a through hole; a frame for accommodating and fixing the power supply electrode and the ground electrode; a gas supply portion for supplying a gas between the power supply electrode and the ground electrode of the frame; and flowing from the gas supply portion through the pipe The gas temperature inside the frame is adjusted to a constant temperature gas thermostat.

Further, in the above frame, there may be a heat supply unit that supplies heat to the frame, and the heat supply unit is a heat ray.

Further, a second frame made of aluminum and including the gas supply portion and the heat supply unit and integrally formed may be attached to the side surface of the frame.

The gas thermostat apparatus preferably includes a heater for increasing the temperature of the gas, a gas temperature sensor for measuring the temperature of the gas flowing into the inside of the frame, and a pipe for connecting to the gas supply portion.

Further, the atmospheric piezoelectric slurry generating apparatus for mass production may further include a gas medium temperature control device including a heater capable of supplying a heat source to the heat supply unit. Further, the lower end of the atmospheric piezoelectric slurry generating apparatus for mass production may further include a conveying device having a conveying unit capable of conveying the processed object.

According to the above invention, it is possible to provide a plasma generating apparatus which can increase the temperature of the plasma generating apparatus to a certain temperature or higher required for mass production at the initial stage of the plasma generating apparatus, and therefore can be mass-produced at an initial stage.

Further, it is possible to provide a plasma generating device that maintains a constant temperature by controlling the temperature inside the plasma generating device.

Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

Figure 3 is a perspective view showing an atmospheric piezoelectric slurry generating apparatus for mass production according to an embodiment of the present invention; Figure 4 is a cross-sectional view showing an atmospheric piezoelectric slurry generating apparatus for mass production according to an embodiment of the present invention; A cross-sectional view of another embodiment of an atmospheric piezoelectric slurry generating apparatus for mass production.

As shown in the figure, the atmospheric piezoelectric slurry generating apparatus (10) for mass production includes: a power supply electrode (20) connected to a direct current pulse or an alternating current power source; and the power supply electrode (20) is separately provided and formed a ground electrode (30) of the ejection via (31) through which the plasma gas generated by the reaction with the power supply electrode (20) is passed; and an internal portion for housing and fixing the power supply electrode (20) and the ground electrode (30) a space portion (41) connected to the ejection through hole (31) of the ground electrode (30) to form a frame (40) of the open member; included in the frame (40), thereby being connected to the power electrode (20) and the ground a gas supply unit (50) for supplying a gas between the electrodes (30); and a gas thermostat (60) for adjusting a gas flowing from the gas supply unit (50) through the pipe (63) into the frame (40) to a constant temperature ).

The power electrode (20) has a certain area and is connected to a DC pulse or an AC power source, and the ground electrode (30) is disposed at a distance from the power electrode (20) so as to pass through the gas supply portion (50). The gas supplied between the power supply electrode (20) and the ground electrode (30) is converted into a plasma state between the power supply electrode (20) and the ground electrode (30) with a constant pressure and a generation rate.

The frame (40) has an internal space portion (41) for accommodating and fixing the power supply electrode (20) and the ground electrode (30), and the frame (40) is provided on a conveying device capable of conveying a cleaning object such as a covering At the upper end of (80), an open member through which the plasma gas generated between the power supply electrode (20) and the power supply electrode (20) is permeable is formed on the ground electrode (30). The plasma gas is sprayed toward the side of the conveying device (80) having the above-described conveying unit (81) through the above-described injection through hole (31) and the open member.

The gas supply unit (50) is a device in which holes are formed on both sides of the frame to allow gas to be injected into the holes. The gas supply unit (50) may be connected through a pipe from the outside of the frame, or may be provided inside the second frame (42) in which the gas supply unit (50) is integrally formed and connected through a pipe.

The covering such as the cleaning article is exposed to the plasma gas ejected from the plasma generating device (10), and is transported to one side through the transport unit (81), and the transfer is performed at a constant speed to maintain a predetermined distance from each other. Therefore, the entire surface of the covering material is occupied to a certain extent.

Generally, the plasma generating device (10) is electrically connected to the power electrode (20) through an external power source to generate a plasma. The usable power source is a DC pulse or an AC voltage, and the plasma is generated above a certain temperature. Time can be achieved.

That is, after a certain period of time from the initial stage of plasma generation, saturation occurs after the treatment effect is increased, and the longer the above period, the lower the production yield of the product in the series type production system.

Further, such a thermal state change factor is forcibly provided in the initial stage, so that the processing characteristics in the initial state and the processing characteristics in the saturated state can be made uniform, and this is to control the temperature of the supplied gas to a constant temperature.

The temperature of the gas supplied as described above can be supplied to a suitable temperature as needed, which is achieved by a gas thermostat (60).

The gas thermostat (60) is connected to a gas supply unit (50) provided on a side surface of the frame (40) through a pipe (63), and the gas thermostat (60) includes heating capable of heating the gas. The device (62) and a gas temperature sensor (61) capable of confirming the temperature of the heated gas. The gas temperature sensor (61) is preferably disposed at a connection portion between the gas thermostat (60) and the piping (63).

Further, the gas thermostat (60) may include a control unit that stops the supply of the heat source when the temperature transmitted from the gas temperature sensor (61) is equal to or higher than a certain temperature, and supplies the heat source when the temperature is equal to or lower than a certain temperature (in the figure) Not shown).

Further, even if the gas heated to a certain extent is continuously supplied to the inside of the frame (40), it is sent to the conveying device (80) and the gas is discharged to the outside through the ejection through hole (31), so that the temperature inside the frame (40) is It is lowered to the temperature of the gas which is heated to a certain extent in the initial stage.

That is, the gas medium temperature control device (70) is provided in order to prevent the temperature inside the frame (40) from dropping below the temperature of the supplied gas.

The gas medium temperature control device (70) is provided with a heat supply unit around the frame (40) for the purpose of increasing the temperature of the gas medium inside the frame (40) by the temperature rise of the frame (40), and the heat supply unit is hot. The ray (71), preferably the heat ray (71) is in contact with the frame (40) outside the frame (40).

Further, the gas supply portion (50) and the heat ray (71) are disposed inside the integrally formed second frame (42), and the second frame (42) may be disposed on one side or both sides of the frame (40). The frame (40) is preferably made of an aluminum material so that the heat of the heat ray (71) can be correctly moved in the direction of the frame (40).

The gas medium temperature control device (70) includes a frame internal temperature sensor (not shown) for measuring the temperature inside the frame (40), and transmits a signal transmitted from the temperature sensor inside the frame. Decide whether to adjust the heat source supply to the heat ray (71).

Even if the temperature of the gas flowing into the inside of the frame (40) is lowered by the operation of the heat ray (71), the temperature of the gas medium inside the frame (40) can be maintained at a constant temperature.

The gas medium temperature control device (70) may further have a supply that can stop the supply of the heat source when the temperature transmitted from the temperature sensor (not shown) inside the frame is equal to or higher than a certain temperature, and supply the heat source when the temperature is lower than a certain temperature. Control unit (not shown).

Next, the operation procedure of the above-described atmospheric piezoelectric slurry generating apparatus (10) for mass production will be briefly described.

First, an electrical connection is formed on the atmospheric piezoelectric slurry generating apparatus for mass production, and when a gas supply is formed between the power supply electrode (20) and the ground electrode (30), plasma is gradually generated, and the plasma generated as described above is generated. When the saturation state is reached, the transfer device (81) transfers the transfer device (80) to realize cleaning of an LCD panel or the like provided at the upper end of the transfer device (80). This is because the grounding electrode (30) has the ejection through hole (31) so that the plasma gas can be transmitted to the side of the conveying device (80) through the above-described ejection through hole (31).

At this time, when a gas heated to a constant temperature is supplied as a gas supplied to the plasma generating device (10), plasma generation is achieved at a faster rate and reaches a saturated state. To this end, a gas that is heated by the gas thermostat (60) to the temperature of the gas passing through the gas supply unit (50) of the frame (40) to a certain temperature is supplied. When the heated gas is supplied to the plasma generating device (10), it quickly reaches a saturated state, thereby having the advantage of being able to quickly switch to the mass production system in a series of steps. A heater (62) is required for heating the gas supplied above, and the heater (62) may use an electric device, or other devices that heat the gas may be used.

A gas temperature sensor (61) is provided for measuring the temperature of the heated gas, and the gas temperature sensor (61) is generally disposed on a side of the pipe (63) connected to the gas thermostat (60). The start is made to confirm the temperature supplied to the inside of the frame (40).

The temperature drop inside the frame (40) may also occur during the above-mentioned mass production because the temperature of the gas medium may be lowered by various external factors during the supply of the gas, in order to use the gas as described above. The medium temperature is maintained at a certain temperature and a gas medium temperature control device (70) is required. The gas medium temperature control device (70) is in contact with the frame (40) or has a heat ray (71) inside the second frame (42), and has a frame internal temperature sensor in the inner space of the frame (40) (Fig. Not shown), so that the temperature of the gas medium is controlled by the operation of the heat ray (71) when the temperature received from the temperature sensor inside the frame is below a certain temperature, and the heat ray (71) does not operate when the temperature is above a certain temperature.

The foregoing description of the preferred embodiments of the present invention has been specifically described as the technical features of the present invention, but the present invention is not limited to the embodiments, and it should be understood that the embodiments of the above-described embodiments and the prior art are simply combined. And those skilled in the art can change and modify the present invention without departing from the spirit and scope of the invention, and such changes and modifications are to be included in the scope defined by the following claims.

10. . . Atmospheric piezoelectric slurry generator

20. . . Power electrode

30. . . Ground electrode

31. . . Jet through hole

40. . . frame

41. . . Interior space department

42. . . Second frame

50. . . Gas supply department

60. . . Gas thermostat

61. . . Gas temperature sensor

62. . . Heater

63. . . Piping

70. . . Gas medium temperature control device

71. . . Heat ray

80. . . Conveyor

81. . . Transfer unit

100. . . Plasma generating device

120. . . Gas supply device

130. . . Atmospheric piezoelectric pulp source

140. . . Power supply device

150. . . LCD glass

160. . . Conveyor

200. . . Atmospheric piezoelectric pulp source

200a. . . Gas supply埠

200b. . . Gas supply埠

200c. . . Gas supply埠

200d. . . Gas supply埠

200e. . . Gas supply埠

200f. . . Gas supply埠

200g. . . Gas supply埠

200h. . . Gas supply埠

210. . . Gas distributor

260. . . Dielectric space

Figure 1 is a cross-sectional view of a plasma generating apparatus using a general atmospheric piezoelectric slurry;

2a and 2b are cross-sectional views showing a conventional atmospheric piezoelectric slurry;

Figure 3 is a perspective view of an atmospheric piezoelectric slurry generating apparatus for mass production according to an embodiment of the present invention;

Figure 4 is a cross-sectional view showing an atmospheric piezoelectric slurry generating apparatus for mass production according to an embodiment of the present invention;

Figure 5 is a cross-sectional view showing an atmospheric piezoelectric slurry generating apparatus for mass production according to another embodiment of the present invention.

10. . . Atmospheric piezoelectric slurry generator

40. . . frame

50. . . Gas supply department

60. . . Gas thermostat

61. . . Gas temperature sensor

62. . . Heater

63. . . Piping

70. . . Gas medium temperature control device

71. . . Heat ray

80. . . Conveyor

81. . . Transfer unit

Claims (6)

An atmospheric piezoelectric slurry generating device for mass production, comprising: a power electrode connected to a direct current pulse or an alternating current power source; a ground electrode separated from the power supply electrode and formed with a jet gas permeable through hole; a frame for accommodating and fixing the power electrode and the ground electrode; a gas supply portion for supplying a gas between the power supply electrode and the ground electrode outside the frame; and a pair of gas flowing from the gas supply portion into the frame through the pipe a gas thermostat that regulates gas temperature; and a pair of heat supply units that supply heat to the frame, wherein the heat supply unit is a heat ray. The atmospheric piezoelectric slurry generating apparatus for mass production according to claim 1, wherein a second frame is attached to a side of the frame, the second frame including the gas supply portion and the heat supply unit and forming As one. The atmospheric piezoelectric slurry generating apparatus for mass production according to claim 2, wherein the second frame is made of an aluminum material. The atmospheric piezoelectric slurry generating apparatus for mass production according to claim 1, wherein the gas thermostat adjusting device comprises a heater for increasing the temperature of the gas, and a temperature for measuring the gas flowing into the interior of the frame. A gas temperature sensor and a pipe for connecting to the gas supply unit. The atmospheric piezoelectric slurry generating apparatus for mass production according to claim 1, wherein the atmospheric piezoelectric slurry generating apparatus further comprises a gas medium temperature control device, wherein the gas medium temperature control device comprises a heat capable of The supply unit provides a heater for the heat source and a frame internal temperature sensor for measuring the temperature inside the frame. An atmospheric piezoelectric slurry generating apparatus for mass production according to claim 1 of the patent application scope, The lower end of the atmospheric piezoelectric slurry generating device further includes a conveying device having a plurality of conveying units capable of conveying the processed object.