TWI368935B - Flow verification system and flow verification method - Google Patents

Flow verification system and flow verification method

Info

Publication number
TWI368935B
TWI368935B TW097127112A TW97127112A TWI368935B TW I368935 B TWI368935 B TW I368935B TW 097127112 A TW097127112 A TW 097127112A TW 97127112 A TW97127112 A TW 97127112A TW I368935 B TWI368935 B TW I368935B
Authority
TW
Taiwan
Prior art keywords
flow verification
flow
verification system
verification method
verification
Prior art date
Application number
TW097127112A
Other languages
English (en)
Other versions
TW200913005A (en
Inventor
Akiko Nakada
Kazutoshi Itoh
Akihito Sugino
Original Assignee
Ckd Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ckd Corp filed Critical Ckd Corp
Publication of TW200913005A publication Critical patent/TW200913005A/zh
Application granted granted Critical
Publication of TWI368935B publication Critical patent/TWI368935B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
    • G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
TW097127112A 2007-08-29 2008-07-17 Flow verification system and flow verification method TWI368935B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007222582A JP4870633B2 (ja) 2007-08-29 2007-08-29 流量検定システム及び流量検定方法

Publications (2)

Publication Number Publication Date
TW200913005A TW200913005A (en) 2009-03-16
TWI368935B true TWI368935B (en) 2012-07-21

Family

ID=40408776

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097127112A TWI368935B (en) 2007-08-29 2008-07-17 Flow verification system and flow verification method

Country Status (5)

Country Link
US (1) US7904257B2 (zh)
JP (1) JP4870633B2 (zh)
KR (1) KR101017285B1 (zh)
CN (1) CN101408276B (zh)
TW (1) TWI368935B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI702694B (zh) * 2018-06-26 2020-08-21 日商國際電氣股份有限公司 半導體裝置的製造方法，零件的管理方法，基板處理裝置及基板處理程式

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JP4801726B2 (ja) * 2006-03-07 2011-10-26 シーケーディ株式会社 ガス流量検定ユニット付ガス供給ユニット
JP5346628B2 (ja) * 2009-03-11 2013-11-20 株式会社堀場エステック マスフローコントローラの検定システム、検定方法、検定用プログラム
US8874388B2 (en) * 2009-09-15 2014-10-28 On Site Gas Systems, Inc. Method and system for measuring a rate of flow of an output
CN102269330A (zh) * 2011-04-28 2011-12-07 煤炭科学研究总院重庆研究院 煤层气集输管道压力调节控制器
JP5430621B2 (ja) * 2011-08-10 2014-03-05 Ｃｋｄ株式会社 ガス流量検定システム及びガス流量検定ユニット
CN102635785A (zh) * 2012-02-28 2012-08-15 中国人民解放军军事交通学院 一种不解体液压管道的流量监测方法
CN103148347B (zh) * 2013-03-18 2015-07-15 福建省文松彩印有限公司 一种使用蒸汽机台的蒸汽自动调压系统
DE102013113387A1 (de) * 2013-12-03 2015-06-03 Ulrich Gmbh & Co. Kg Injektor zur Injektion eines Fluids und Verfahren zur Steuerung eines Injektors
CN106323425A (zh) * 2015-06-19 2017-01-11 沈阳兴大通仪器仪表有限公司 一种边测边调检定装置
KR102579543B1 (ko) * 2015-08-31 2023-09-18 엠케이에스 인스트루먼츠, 인코포레이티드 비임계적 흐름 조건에서 압력 기반의 흐름 측정을 위한 방법 및 장치
JP6541584B2 (ja) * 2015-09-16 2019-07-10 東京エレクトロン株式会社 ガス供給系を検査する方法
JP6600568B2 (ja) * 2015-09-16 2019-10-30 東京エレクトロン株式会社 流量制御器の出力流量を求める方法
KR102031574B1 (ko) * 2016-01-15 2019-10-14 가부시키가이샤 후지킨 유량 측정 가능한 가스 공급 장치, 유량계, 및 유량 측정 방법
CN106369283A (zh) * 2016-10-13 2017-02-01 上海航天能源股份有限公司 管路流量控制系统及方法
KR102496178B1 (ko) * 2016-12-15 2023-02-03 현대자동차주식회사 연료전지 차량에 탑재되는 수소차단밸브의 제어 방법
US11094568B2 (en) * 2017-04-24 2021-08-17 Tokyo Electron Limited Processing apparatus, abnormality detection method, and storage medium
JP6978865B2 (ja) * 2017-07-05 2021-12-08 株式会社堀場エステック 流体制御装置、流体制御方法、及び、流体制御装置用プログラム
US10866135B2 (en) * 2018-03-26 2020-12-15 Applied Materials, Inc. Methods, systems, and apparatus for mass flow verification based on rate of pressure decay
CN110849427A (zh) * 2019-08-31 2020-02-28 广州海达安控智能科技有限公司 混凝土泵车流量监控方法、系统及计算机可读存储介质
DE102019215319A1 (de) * 2019-10-07 2021-04-08 Leybold Gmbh Einlasssystem für ein Massenspektrometer
CN112864044A (zh) * 2019-11-28 2021-05-28 上海新微技术研发中心有限公司 化学品的循环管路流量控制系统及其控制方法
CN113124323B (zh) * 2019-12-31 2023-01-31 佛山市美的清湖净水设备有限公司 供水设备的异常检测方法、装置和供水设备
JP7122334B2 (ja) * 2020-03-30 2022-08-19 Ckd株式会社 パルスショット式流量調整装置、パルスショット式流量調整方法、及び、プログラム
JP7122335B2 (ja) 2020-03-30 2022-08-19 Ckd株式会社 パルスショット式流量調整装置、パルスショット式流量調整方法、及び、プログラム
US20220328288A1 (en) * 2020-05-15 2022-10-13 Hitachi High-Tech Corporation Inspection method of plasma processing apparatus
CN111911807A (zh) * 2020-08-25 2020-11-10 深圳市德达康健股份有限公司 一种小型制氧机及其流量控制装置、方法

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GB8630794D0 (en) * 1986-12-23 1987-02-04 Univ Waterloo Gas consumption measuring system
US5817950A (en) * 1996-01-04 1998-10-06 Rosemount Inc. Flow measurement compensation technique for use with an averaging pitot tube type primary element
JP3367811B2 (ja) 1996-01-05 2003-01-20 シーケーディ株式会社 ガス配管系の検定システム
JP4177047B2 (ja) * 2002-08-27 2008-11-05 日本アプライドフロー株式会社 流速・圧力計測装置および配管網監視システム
JP4086057B2 (ja) * 2004-06-21 2008-05-14 日立金属株式会社 質量流量制御装置及びこの検定方法
JP4648098B2 (ja) 2005-06-06 2011-03-09 シーケーディ株式会社 流量制御機器絶対流量検定システム
JP4801726B2 (ja) * 2006-03-07 2011-10-26 シーケーディ株式会社 ガス流量検定ユニット付ガス供給ユニット
JP5134841B2 (ja) * 2007-03-16 2013-01-30 Ｃｋｄ株式会社 ガス供給ユニット

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI702694B (zh) * 2018-06-26 2020-08-21 日商國際電氣股份有限公司 半導體裝置的製造方法，零件的管理方法，基板處理裝置及基板處理程式

Also Published As

Publication number Publication date
US20090063059A1 (en) 2009-03-05
JP2009054094A (ja) 2009-03-12
KR101017285B1 (ko) 2011-02-28
JP4870633B2 (ja) 2012-02-08
CN101408276B (zh) 2012-12-26
CN101408276A (zh) 2009-04-15
US7904257B2 (en) 2011-03-08
KR20090023123A (ko) 2009-03-04
TW200913005A (en) 2009-03-16

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