TWI365776B - Coating processing method, coating processing apparatus and computer readable storage medium - Google Patents

Coating processing method, coating processing apparatus and computer readable storage medium

Info

Publication number
TWI365776B
TWI365776B TW097130764A TW97130764A TWI365776B TW I365776 B TWI365776 B TW I365776B TW 097130764 A TW097130764 A TW 097130764A TW 97130764 A TW97130764 A TW 97130764A TW I365776 B TWI365776 B TW I365776B
Authority
TW
Taiwan
Prior art keywords
coating processing
storage medium
computer readable
readable storage
processing apparatus
Prior art date
Application number
TW097130764A
Other languages
English (en)
Other versions
TW200922696A (en
Inventor
Kousuke Yoshihara
Tomohiro Iseki
Koji Takayanagi
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200922696A publication Critical patent/TW200922696A/zh
Application granted granted Critical
Publication of TWI365776B publication Critical patent/TWI365776B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
TW097130764A 2007-09-27 2008-08-13 Coating processing method, coating processing apparatus and computer readable storage medium TWI365776B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007251056A JP5133641B2 (ja) 2007-09-27 2007-09-27 塗布処理方法、塗布処理装置及びコンピュータ読み取り可能な記憶媒体

Publications (2)

Publication Number Publication Date
TW200922696A TW200922696A (en) 2009-06-01
TWI365776B true TWI365776B (en) 2012-06-11

Family

ID=40508679

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097130764A TWI365776B (en) 2007-09-27 2008-08-13 Coating processing method, coating processing apparatus and computer readable storage medium

Country Status (5)

Country Link
US (1) US8318247B2 (zh)
JP (1) JP5133641B2 (zh)
KR (1) KR101332138B1 (zh)
CN (1) CN101398627B (zh)
TW (1) TWI365776B (zh)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5065071B2 (ja) * 2007-03-15 2012-10-31 東京エレクトロン株式会社 塗布処理方法、塗布処理装置及びコンピュータ読み取り可能な記憶媒体
JP5203337B2 (ja) * 2009-02-13 2013-06-05 東京エレクトロン株式会社 塗布処理方法
JP5282072B2 (ja) * 2009-08-27 2013-09-04 東京エレクトロン株式会社 塗布処理方法、プログラム及びコンピュータ記憶媒体
CN102033423B (zh) * 2009-09-28 2013-05-29 中芯国际集成电路制造(上海)有限公司 用于校准光刻工具的装置及方法
JP5023171B2 (ja) 2010-02-17 2012-09-12 東京エレクトロン株式会社 塗布処理方法、その塗布処理方法を実行させるためのプログラムを記録した記録媒体及び塗布処理装置
JP5337180B2 (ja) 2010-04-08 2013-11-06 東京エレクトロン株式会社 塗布処理方法、プログラム、コンピュータ記憶媒体及び塗布処理装置
JP5449239B2 (ja) * 2010-05-12 2014-03-19 東京エレクトロン株式会社 基板処理装置、基板処理方法及びプログラムを記録した記憶媒体
JP5384437B2 (ja) * 2010-06-18 2014-01-08 東京エレクトロン株式会社 塗布方法
JP5327238B2 (ja) * 2011-01-20 2013-10-30 東京エレクトロン株式会社 塗布処理装置、塗布処理方法及び記憶媒体
JP2012196609A (ja) * 2011-03-18 2012-10-18 Tokyo Electron Ltd 塗布処理方法および塗布処理装置
JP5789546B2 (ja) 2011-04-26 2015-10-07 東京エレクトロン株式会社 塗布処理装置、塗布現像処理システム、並びに塗布処理方法及びその塗布処理方法を実行させるためのプログラムを記録した記録媒体
KR101881894B1 (ko) * 2012-04-06 2018-07-26 삼성디스플레이 주식회사 박막 증착 장치 및 그것을 이용한 박막 증착 방법
JP2014050803A (ja) 2012-09-07 2014-03-20 Toshiba Corp 回転塗布装置および回転塗布方法
KR102239197B1 (ko) * 2012-09-13 2021-04-09 호야 가부시키가이샤 마스크 블랭크의 제조 방법 및 전사용 마스크의 제조 방법
KR102167485B1 (ko) * 2012-09-13 2020-10-19 호야 가부시키가이샤 마스크 블랭크의 제조 방법 및 전사용 마스크의 제조 방법
US9373551B2 (en) * 2013-03-12 2016-06-21 Taiwan Semiconductor Manufacturing Co., Ltd. Moveable and adjustable gas injectors for an etching chamber
CN104425322B (zh) * 2013-08-30 2018-02-06 细美事有限公司 基板处理设备以及涂覆处理溶液的方法
KR101570163B1 (ko) 2014-02-11 2015-11-19 세메스 주식회사 기판 처리 장치 및 방법
JP2015153857A (ja) * 2014-02-13 2015-08-24 東京エレクトロン株式会社 塗布処理方法、プログラム、コンピュータ記憶媒体及び塗布処理装置
CN104155672A (zh) * 2014-08-22 2014-11-19 平生医疗科技（昆山）有限公司 一种易潮解性闪烁体面板的封装方法
KR101895912B1 (ko) 2015-09-25 2018-09-07 삼성에스디아이 주식회사 실리카 막의 제조방법, 실리카 막 및 전자소자
CN107885035A (zh) * 2016-09-30 2018-04-06 苏州能讯高能半导体有限公司 一种光刻胶的涂胶工艺
KR102204885B1 (ko) * 2017-09-14 2021-01-19 세메스 주식회사 기판 처리 방법
JP7232737B2 (ja) * 2019-08-07 2023-03-03 東京エレクトロン株式会社 基板処理装置

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JPH05234869A (ja) 1992-02-03 1993-09-10 Nec Corp 塗布装置
JP3122868B2 (ja) * 1994-09-29 2001-01-09 東京エレクトロン株式会社 塗布装置
JP3504092B2 (ja) * 1996-11-19 2004-03-08 大日本スクリーン製造株式会社 塗布液塗布方法
JP3315608B2 (ja) * 1996-11-20 2002-08-19 大日本スクリーン製造株式会社 塗布液塗布方法
JPH10151406A (ja) * 1996-11-21 1998-06-09 Dainippon Screen Mfg Co Ltd 塗布液塗布方法
TW432520B (en) 1997-03-31 2001-05-01 Tokyo Electron Ltd Photoresist coating method and apparatus
JPH11297589A (ja) * 1998-04-09 1999-10-29 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001307984A (ja) * 2000-04-21 2001-11-02 Tokyo Electron Ltd レジスト塗布方法およびレジスト塗布装置
JP2004146651A (ja) * 2002-10-25 2004-05-20 Tokyo Electron Ltd レジスト塗布方法及びレジスト塗布装置
JP4535489B2 (ja) * 2004-03-31 2010-09-01 東京エレクトロン株式会社 塗布・現像装置
JP2006156565A (ja) * 2004-11-26 2006-06-15 Sharp Corp 回転塗布方法
JP4749830B2 (ja) * 2005-10-21 2011-08-17 東京エレクトロン株式会社 レジスト塗布方法およびレジスト塗布装置
JP4805769B2 (ja) * 2006-09-14 2011-11-02 東京エレクトロン株式会社 塗布処理方法

Also Published As

Publication number Publication date
KR20090033079A (ko) 2009-04-01
US8318247B2 (en) 2012-11-27
TW200922696A (en) 2009-06-01
CN101398627B (zh) 2011-11-16
KR101332138B1 (ko) 2013-11-21
JP5133641B2 (ja) 2013-01-30
US20090087559A1 (en) 2009-04-02
CN101398627A (zh) 2009-04-01
JP2009078250A (ja) 2009-04-16

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