TWI364632B - Photoresist removing liquid compositions for the substrate containing ag and/ or ag alloy, process for making aptterns made from these, and process for making display units containing them - Google Patents

Description

1364632 6. Technical Field of the Invention The present invention relates to a resist material peeling liquid composition for a substrate containing silver and/or a silver alloy, a pattern manufacturing method using the same, and a A display device in which the composition is patterned. [Prior Art] Compared to a liquid crystal display, an organic EL display can be expected to be a low-power, high-brightness, flat-contrast flat panel display due to its self-illuminating characteristics. In the organic light-emitting device, for example, a TFT (Thin Film Transistor), a flattening layer, and the like are sequentially laminated with a first electrode, an organic layer containing a light-emitting layer, and a second electrode. Things. The light emitted from the light-emitting layer may be emitted from the substrate side, or may be emitted from the second electrode side. In the semiconductor substrate, aluminum, aluminum alloy, or the like is used as the wiring material. In the case of the TFT wiring, a reflective film of a reflective liquid crystal display has been used (see, for example, Japanese Patent Laid-Open No. Hei.). A material such as aluminum, aluminum alloy, or chromium is used as an organic reflective electrode (see, for example, Japanese Patent Laid-Open Publication No. 2). Usually, the metal reflective film or the reflective electrode is deposited on the substrate by CVD, sputtering, electrolytic chain or the like to form a metal material, and the photoresist film is coated on the stomach metal film, exposed, and developed to form a mask. The non-mask region 1^64632 region is patterned by wet etching with a wet etching solution or by dry etching, and the photoresist material used as a mask is used from the photoresist material. The metal film is formed by peeling off. The conventional photoresist material stripping liquid is used to remove the photoresist material which is fixed on the substrate by heating by post-baking or the like, and is used to contain phenol and chlorine. Hydrocarbon liquids, due to environmental problems, are developing compositions containing imidazolidinone as a main component (for example, refer to Japanese Patent Document 3), various alkanolamines, and 1,3-dimethyl-2-imidazolidinium. A mixed solution of a ketone (for example, refer to Japanese Patent Publication No. 4). Thereafter, since it is necessary to peel off a layer of a modified photoresist material different from the conventional one by dry etching, various alkanolamines and 13-dimethyl-2-imidazolidinium have been developed. A composition of a ketone and a bis-fyl sulfoxide (for example, refer to Japanese Patent Laid-Open Publication No. 5), various alkanolamines and a polar organic solvent, and a composition containing various corrosion inhibitors. These compositions can peel off the photoresist after dry etching. The metamorphic layer and the photo-resist material that is fixed to the substrate. The material can be used as a photoresist material stripping solution after the dry etching and after the wet etching. As a anti-money agent, there is a report revealing Chamophenol (for example, see Patent Document 6), weak acid such as benzene or acetic acid (for example, refer to Japanese Patent Laid-Open No. 7), saccharides (for example, refer to Patent Document 8), catechol, gallate (gallate) Or gallic acid (gallic Either (for example, refer to the patent document 9), an amino acid (for example, refer to the patent document 1), etc. Other 'an example of adding a hydroxylamine to enhance the peeling ability' is known. The water stripping solution (1) must be rinsed with isopropyl alcohol, and (2) washed with water when there is an amine compound. If an amine compound remains on the metal surface, there is a disadvantage that the metal is rotted, and the organic amine compound, polar solvent, water, and An example of a water-soluble peeling liquid composed of a surname agent (for example, refer to Japanese Patent Laid-Open Publication No. Hei 12). Recently, silver and a silver alloy having higher reflectance than aluminum and aluminum alloy have been noted. Among them, a single-layer film containing silver and a multilayer film containing a silver layer have been used, in order to avoid the influence of moisture and the like when the reflective film is exposed to air, and to compensate for the reflectance of silver to short-wavelength light. A low-level problem is to use a multilayer film formed with a stable oxide film on a silver surface (for example, refer to Japanese Patent Literature 13, Patent Document 14), and a single layer can be used when the silver surface is not exposed to the air. (For example, refer to Japanese Patent Literature 13 and Patent Document 15) (> However, such documents, regarding wet etching, or dry etching in which the photoresist becomes deteriorated and which is not easily peeled off, are not disclosed at all about the silver film. The photoresist stripping solution used for pattern formation, the existing photoresist material stripping solution, only the photoresist of the conventional aluminum and aluminum alloy without the rice-repellent property: liquid, has not been opened _ issued a form of silver and / or The pattern of the silver alloy can not corrode the suitable photoresist stripping solution of silver and/or silver alloy. As described above, it is required to provide a photoresist material repellent which is capable of not corroding silver and/or a silver alloy and having high releasability to a photoresist material and a photoresist layer. [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Patent Document 8] Japanese Laid-Open Patent Publication No. Hei 9-296200 (Japanese Patent Laid-Open Publication No. Hei 9-296200). [Patent Patent Document 12] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. 2000-8184. [Problem to be Solved by the Invention] Therefore, the present invention has been made to be suitable for use in containing silver and/or in order to eliminate the above problems. A resist material peeling liquid composition of a silver alloy substrate. [Means for Solving the Problem] The amine compound used in the conventional photoresist material stripping liquid can be classified into an amine compound (alkanolamine group) having a hydroxyl group and an amine compound having no hydroxyl group. The amine compound having a hydroxyl group may, for example, be monoethanolamine, mono 1364632 isopropanolamine, N-methylethanolamine, N-ethylethanolamine, N-butylethanolamine or 2-(2-aminoethylamine). Ethanol, 2_(2-aminoethylamino)-2-propanol, 2-(2-aminoethoxy)ethanol, diethanolamine, diisopropanolamine 'N,N-dimethylethanolamine, N, N-diethylethanolamine, N,N-dibutylethanolamine, N-methyldiethanolamine, N-(3-aminopropyl)_N_(2-hydroxyethyl)_2-aminoethanol, trihexylamine , triisopropanolamine and the like. The amine compound having no hydroxyl group may, for example, be diethylenetriamine, triethylenetetramine, diexaminetriamine or moffrphline derivative. However, when rethinking a photoresist liquid stripper suitable for use in a substrate containing silver and/or a silver alloy, the following findings are obtained: a conventional amine compound such as monoethanolamine is used as a main component when aluminum and an aluminum alloy are used. In the case of a photoresist material stripping solution, although it has high peelability, it can be used as a silver paste and a silver alloy. Further, 'diethanolamine, triethylamine, N,N-dimethylethanolamine, etc. having a substituent on the amine group of monoethanolamine, as will be described later, are clearly known to be corrosive to silver and silver alloys. It is small, but it is difficult to peel off the photoresist material, especially the peeling layer of the photoresist material. Therefore, the present inventors have intensively and repeatedly examined g in order to solve the above problems together, and found that when the carbon chain length of the extended base bond of the organic amine compound is too long, the peeling property is lowered, and when it is too short, silver and The corrosion resistance of the silver alloy is increased, and by introducing a hetero atom between the alkyl chain, even if the carbon chain of the alkyl group has a certain length, φ can prevent the peeling property from being lowered, so that it is found to be specific to The organic amine compound and the monoethanolamine, which are added to the anti-fouling agent of the special 1364632, can be used as a photoresist material stripping liquid, and the results of further research 'finally complete the present invention. That is, the present invention relates to a photoresist material stripping liquid composition comprising a substrate of silver and/or a silver alloy, comprising: a compound represented by the formula (I) nh2-aybz, wherein A and B are respectively Independent of each other as a linear or branched chain of alkylene groups having a carbon number of 1 to 5, γ-based NH or hydrazine, Z-based NH2, OH, NH-D-NH2 (here, D-system a compound of the formula (II) NH2-AN(-B-〇H)2, which is a linear or branched chain having a carbon number of 1 to 5, wherein a and B are Equation (1) is the same, - Formula (III)

R is a compound represented by hydrazine, wherein the carbon number is 1 to 5, the hydroxyalkyl group is 1 to 5 or the carbon number! ~5 aminoalkyl, - catechu, ~ hydrogen awake, - gallic phenol, - gallic acid, and

And 1 or 2 constituents are non-water 1364632. Further, the present invention relates to the above-mentioned photoresist material peeling liquid, and the compound represented by the formula (i), the formula (Π) or the formula (ΙΠ) is a diethylenetriamine and a 2-(2-aminoethylamino group). Ethanol, 2-(2-aminoethylamino)-2-propanol, N-(3-aminopropyl)-N-(2-hydroxyethyl)-2-aminoethanol, 2- (2-Aminoethoxy)ethanol, di-extended propylene triamine 'tris-ethyltetramine, whallin, and the like. Further, the total content of the compound represented by the formula (I) or the formula (II) or the formula (III) is 20 mass% / 〇 or more and 50 mass % or less. Further, the composition of the above-mentioned photoresist material stripping liquid according to the present invention contains a compound represented by the formula (I), the formula (II) or the formula (III), and the polar organic solvent is selected from the group consisting of 1,3-dimethylimene. One or two or more of the group consisting of bite-, diethylene glycol monobutyl ether, propylene glycol, dimethyl amide, and N-methyl-2-pyrrolidone. Further, the composition of the above-mentioned photoresist material stripping liquid according to the present invention further contains an anti-money agent. Moreover, the composition of the photoresist material stripping liquid according to the present invention contains a group selected from the group consisting of monoethanolamine, catechol, hydroquinone, gallic phenol, gallic acid, and gallic acid ester or 2 More than one species. Further, the above-mentioned resist material peeling liquid composition according to the present invention is one selected from the group consisting of monoethanolamine, catechol, hydroquinone, gallic phenol, gallic acid, and gallic acid ester. Or two or more kinds of photoresist materials are separated from the liquid, "a product, a polar organic solvent N methyl 2 pyrrolidone and / or 1,3 - methyl-2-flavor. Γ364632 The present invention relates to the patterning of silver and/or silver alloys

The step of peeling off the electrode. ^ n~ 少 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Dry etching. Species consisting of silver and/or silver alloy

The formed film is formed by peeling off the light in which the mask is formed and the resist material by using the above-mentioned photoresist peeling liquid. Further, the present invention relates to a display device having a reflective film or a reflective electrode, which is provided with a plurality of display elements, and the above-mentioned display device according to the present invention, wherein the display element is made of silver and/or Or an organic light-emitting element in which an organic layer and an electrode including a light-emitting layer are laminated on the reflective film or the reflective electrode formed of a silver alloy, and light generated in the light-emitting layer is transmitted from the electrode side. Further, in the display device according to the present invention, the display element is provided with a pixel electrode on a substrate, a driving element and a wiring electrically connecting the pixel electrode, and silver is disposed between the substrate and the driving element and the wiring. And a liquid crystal display element formed of a reflective film or a reflective electrode made of a silver alloy. 1364632 [Efficacy] The composition of the photoresist material stripping liquid of the present invention is composed of a specific organic amine compound represented by formula (1), formula (II), formula (III) or a specific anti-(four)' capable of The photoresist material of the substrate containing silver and/or silver alloy is peeled off without using silver or silver alloy. Although the mechanism of the organic amine compound used in the present invention is not clear, the structure of the compound has a plurality of alkylene groups having a specific carbon number, and since the carbon chain length of the extended alkyl chain is too long, the peeling property is lowered. The dependence on silver and silver alloy is too short, so that the composition of the present invention can be applied to a substrate containing silver and/or a silver alloy by using a certain length. Further, even in the case of the photoresist layer after the dry-cut etching, it is possible to obtain good peeling without the use of silver and/or silver alloy, and it is possible to perform dry etching which has been considered to be difficult. [Embodiment] An embodiment of the present invention will be described in detail below. The photoresist material stripping liquid composition of the invention comprises:

A compound represented by the formula (I) NHz-AYBZ, wherein a and b are each independently a linear or quinone branched chain alkyl group having 1 to 5 carbon atoms, γ-based NH or hydrazine Either Z series NH2, 〇H, 1^_1)_\112 (where D is a linear or branched chain carbon number of 1 to 5 alkyl groups), 丄 inch J 厶 ( Η) Compound represented by NH2-A_N(_b_〇h)2, formula (m) A, B is the same as formula (1)

a compound represented by N~~R, wherein, a medium-sized system, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or an amino group having 1 to 5 carbon atoms; Gallic phenol; not in the group consisting of phenol, sputum, sputum, and gallic acid; and above, and one or more polar organic solvents. - 2: In the composition of the photoresist material stripping liquid of the present invention, when the water is not contained, the component contained in the stripping liquid reacts with water to exhibit alkalinity, which may corrode the side of the silver and enter the crystal. The problem of increasing the defect inside the grain_grain. That is, it can be known that the formula (1) NH2-AYBz is expressed in the form of 'A', 8 series, straight bond or branch key. The carbon number of the 5th, the extension of the yard base, the ¥ system or the middle of the —-, z-series 2, 〇H, Ν^ΝΗ2 (here D-line, linear or branch-shaped fillings 丄〜5的伸院基), Formula (II) NH2-AN(-B-〇h)2 B is the same as the formula (I), the compound represented by the formula, A formula (ΠΙ) 13 1364632

a compound represented by R, wherein R is hydrazine, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms or an aminoalkyl group having 1 to 5 carbon atoms, and is selected from the above formula ( I), the organic amine compound in the group of the formula (II) and the formula (III) can be used as a component of a resist material peeling liquid composition containing a substrate of silver and/or a silver alloy. Here, the enthalpy and enthalpy in the above formula (I) and formula (II), because if the carbon chain length of the alkyl chain is too long, the peeling property is lowered, and when it is too short, the silver and the silver alloy are corroded. Shaped or branched, carbon number is 1~5. When considering the peeling property of photoresist and the corrosiveness to silver, the carbon number of A and B is preferably 2~10, and 2~6 For better. Among these compounds, diethylenetriamine, 2-(2-aminoethylamino)ethanol, 2-(2-aminoethylamino)-2-propanol, and (3-aminopropyl) Preferably, _N_(2-hydroxyethyl)-2-aminoethanol, 2-(2-aminoethoxy)ethanol, diexexintriamine, triamethylenetetramine, or wort. Further, the content of the organic amine compound is preferably 2% by mass or more and 50% by mass or less based on the peeling performance of the photoresist layer and the photoresist layer and the corrosiveness to silver and a silver alloy. Further, examples of the polar organic solvent to be mixed with the organic amine compound represented by the formula (I), the formula (Π), and the formula (ΙΠ) include ethylene glycol monomethyl ether and ethylene glycol monoethyl ether. Ethylene glycol monopropyl sterol monobutyl ether, propylene glycol monomethyl ether monopropyl ether, propylene glycol monobutyl mystery, ethylene glycol monobutyl ether, diethylene glycol, propylene glycol monoethyl ether, propylene glycol Propylene glycol monomethyl ether, dipropylene II 14 1364632 alcohol monoethyl mystery, dipropylene glycol monopropyl mystery,

An ether solvent such as diethyl dimethyl ether or dipropylene glycol dimethyl ether; decylamine, monomethylcarbamide, dimethyl decylamine, monoethylformamide, diethylformamide , acetaminophen, monomethylacetamide, dimethylacetamide, monoethylacetamide, diethylacetamide, etc.; N-methyl-2-pyrrolidinone, B a 1,4-pyrrolidone solvent such as benzyl-2-pyrrolidone; an alcohol solvent such as decyl alcohol, ethanol 'propanol, isopropyl alcohol, ethylene glycol or propylene glycol; or a sulfoxide solvent such as dimethyl sulfoxide; Imidazolidinone solvent such as 3-dimercapto-2-imidazolidone, diethyl-2-imidazolidone, 1'3-diisopropyl-2-imidazolidinone; γ-butyrolactone, 7 a lactone solvent such as valerolactone. Among these, 1,3_dimethyl-2-imidinone, IS diethyl-2-imidazolidinone, indole, 3-diisopropylimidazolidinone, and Ν-methyl-2-pyrrole Pyridone, oxime-ethyl-2-pyrrolidone, diethylene glycol monobutyl ether, propylene glycol, dimethyl sulfoxide is preferred, from the viewpoint of removing the altered layer of the photoresist material, 2-imidazolidinone, diethylene glycol monobutyl ether, propylene glycol, dimercapto-sub-contact (more preferably, an organic amine compound represented by formula (1), formula (π)' (m) The composition of the present invention and a polar organic solvent may further contain an organic acid such as aminoacetic acid or acetic acid, phloroglucinol, m-diphenol, phenol, benzotriazole, catechol, hydroquinone, gallic acid. Further, the gallic acid ester, the gallic phenol, and the like are used as an anti-agent. The present invention is a photoresist material stripping liquid composition comprising: monoethanolamine, one or more polar organic solvents; selected from the group consisting of catechol An anti-money agent composed of hydroquinone, gallic phenol, gallic acid, gallic acid ester, or 15 or more kinds of anti-money agents. However, with catechins, hydroquinones, and Resorcinol (1,3,5-dihydroxybenzene), resorcinol, which is similar to the anti-corrosive agent of the resistive material stripping solution. (丨, 3 dihydroxybenzene), phenol, acetic acid or aminoacetic acid, even if added together with monoethanolamine, can not improve the corrosiveness to silver and silver alloy. Also, the polar organic solvent mixed with monoethanolamine can be exemplified There are: ethylene glycol monodecyl ether, ethylene glycol monoethyl ether 'ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, Propyl alcohol monoethyl ether, propanol early propyl hydrazine, propylene glycol monobutyl hydrazine, dipropylene glycol monomethyl acid, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, propylene glycol monobutyl mystery, An ether solvent such as monoethylene glycol dimethyl ether or dipropylene glycol dimethyl bond; an amine, monodecyl decylamine, dimethyl guanamine, monoethylformamide, diethyl hydrazine Amidoxime solvent such as amine 'acetamide, monomethylformamide, dimethylamine, monoethylacetamide, diethylacetamide. N-.A. base-2-° ratio slightly biting _, N.-:.ethyl, 2-° 洛洛辋. etc., β 比洛.唆_ solvent; methanol, ethanol, propanol, iso An alcohol solvent such as propanol, ethylene glycol or propylene glycol; a hardening solvent such as a sulfhydryl group; 1,3 -dimercapto-2-imidinium, 1,3-diethyl-2-imidazole a solvent such as ketone, 1,3-diisopropyl-2-imidazolium or the like; a lactone solvent such as γ-butyrolactone or r-valerolactone; wherein Ν-methyl-2- Pyrrolidone and/or 1}3-dimethyl-2-imidazole pyridine is preferred. The following shows the display of the photoresist produced by using the resist release liquid. 16 1364632 [First embodiment] 1st The figure shows a schematic cross-sectional view of one of the display devices. The TFT 12, the interlayer insulating film i 2 A and the wiring 12B are formed on the glass substrate 11. Next, the substrate 11 is entirely formed, for example, by using a spin coating method to form a planarization layer. The planarization layer 13 is patterned in a predetermined shape by exposure and development, and a connection hole 13A is formed. Thereafter, in order to carry out the oxime imidization of the polyimide, it is calcined in a clean furnace, for example, at a temperature of 3 2 °C. Next, as the electrode layer 14 containing Ag, for example, a sputtering method is used, for example, a silver plating or a lanthanum silver alloy is laminated on the planarizing layer 13 at a thickness of 1 〇〇 nm. After the electrode layer 14 containing Ag is formed, a photoresist mask is formed, for example, using a lithography technique, and the electrode layer 14 containing Ag is etched therewith. The etching can be performed by dry or wet money. The picker uses a photoresist stripping solution to remove the photoresist. Then, the insulating film i5 is formed in a comprehensive manner of the substrate π, for example, by a CVD (Chemical Vapor Deposition) method, and an opening is formed by selectively removing a portion of the insulating film 15 corresponding to the light-emitting region using, for example, a lithography technique. Part 15 A. Next, on the insulating film 15± surface, the auxiliary electrode 全面 is formed over the entire substrate, and the pattern is selectively formed by, for example, lithography to form a predetermined pattern. Next, for example, a vapor-deposited metal film having an opening is used. The organic layer 16 is formed. At this time, after the organic layer 16 is formed by using the opening portion facing the insulating film 15, the organic layer 16 is formed, for example, by using a vapor deposition method on the entire substrate.

The surface of the auxiliary electrode is electrically connected to the adhesive layer 3 formed of the auxiliary curable resin. Next, the side of the substrate 11 on which the organic layer 16 is formed is coated with heat to be bonded to the sealing substrate 21 to complete the display device. In the display device, for example, when a predetermined voltage is applied between the electrode layer 14 containing Ag and the common electrode 17, the organic layer 丨6 starts to emit light. By using the photoresist release liquid of the present invention, the photoresist can be peeled off without corrosion. Therefore, when compared with the conventional stripping solution, the reliability of the display element is improved by the fact that the defect of the eight-nose rot is reduced to about 1/10. [Second Embodiment] Fig. 2 is a cross-sectional view showing a display device according to a second embodiment of the present invention. In the display device, a liquid crystal display device which is a transflective type (semi-transmissive type) is used, and a repellent plate 6 and a counter plate 7 are disposed opposite to each other, and a liquid crystal 80 is provided between φ. The drive plate 60 is provided with a halogen electrode 62 in a matrix on a substrate 61 made of glass. An active type driving circuit is formed on the substrate 61. The active type driving circuit includes a TFT 63, a wiring 63, and the like as a driving element electrically connected to the pixel electrode 62. An alignment film 64 is provided on the opposite side of the substrate 61 from the liquid crystal 80, and a polarizing plate 65 is provided on the opposite side. The halogen has a pixel electrode 62 and an electrode layer 14 containing Ag. The halogen electrode 62 is made of, for example, ITO, and the electrode layer 14 containing Ag is composed of a layer containing 18 silver or a silver alloy. The electrode layer i4 containing Ag is shaped to be a part of the region of the pixel electrode 62. A region containing Ag 14 is formed as a reflective display region, and the pixel electrode 62_ is not overlapped with the region of the electrode layer containing Ag, and becomes a transmissive display region. The gate of the TFT 63 (not shown) is connected to a scanning circuit not shown in the drawing, and the source (not shown) is connected to the wiring 63A' which is a signal line (not shown). In the pixel electrode α. The material of the wiring μα is the same as the wiring 13B of the first embodiment. Also, the composition of the TFT63 and the first! The TF (four) sample of the embodiment is not particularly limited. The catch 63 and the wiring 63A are covered with a protective film 63B made of, for example, dioxo (Si〇2) or nitrided. The alignment film 64 is formed by, for example, rubbing (orientating) an organic compound such as polyienimine. At this time, the pretilt angle can be controlled by changing the friction condition.

The polarizing plate 65 is an optical element that can convert light from a backlight (not shown) into a linearly polarized light in a predetermined direction, and can be formed, for example, by containing a polyvinyl alcohol (PVA) film or the like. The counter plate 70 is located on the side of the halogen electrode of the drive plate 6A, and has a counter substrate 71 made of glass or the like. The v-holes are opposite to each other, and the electrodes 72 and the color filters 73 are sequentially arranged from the opposite substrate 71 side, and in the opposite substrate, along the side of the color filter, there is a light absorbing film 74 as black. matrix. On the side of the counter substrate 71 opposite to the liquid crystal 19 Γ 364632, an alignment film 75 is provided on the entire side, and on the opposite side, a polarizing plate % is provided. The transparent electrode 72 can be composed of, for example, IT〇. The light absorbing film 74 absorbs light that is incident on the light other than the opposite substrate 7 or reflected from the wiring 64 to enhance the contrast, and may be added, for example, by adding a black colorant, a hurricane, a hurricane, and a The black resin film having a concentration of 1 or more is used, or the film is made of a film filter which uses interference of the film. The thin film filter is, for example, a film in which one or more layers of metal, metal nitride or metal oxide are laminated to reduce the light by the interference of the film. Specifically, the thin medium calender can be exemplified by an interactive formation and chromium (in) (cr2〇3). The alignment film 75 and the polarizing plate % are the same as the alignment film 64 and the polarizing plate 65 of the drive plate 60. The liquid crystal 80 changes its orientation state by applying a voltage to change its permeability. Since the liquid crystal molecules are not tilted in the same direction when driving, light and dark unevenness may occur. To avoid this, the liquid crystal 80 has a slightly pretilt angle in a certain direction. The display device can be manufactured, for example, as follows. First, a film is formed on the substrate 61 by sputtering, for example, to form a halogen electrode 62 and an electrode layer 14 containing Ag. Next, a photoresist pattern is formed using a lithography step. Next, etching of the electrode layer 14 is performed by using a pattern formed of a photoresist as a mask. The etching may be performed by wet etching with a chemical solution or by dry etching. Next, the photoresist is removed by using the photoresist peeling liquid described in the second embodiment. In order to further form the pattern of the pixel electrode 62, the photoresist pattern 20 1364632 is similarly formed. After the etching, the photoresist is removed by the above-mentioned photoresist material stripping solution. Next, the TFT 63 and the wiring 63 are formed and covered with a protective film 63. After eight, the alignment film 64 is formed on the entire surface of the substrate 61, and rubbing treatment is performed. Thereby, the drive plate 60 is formed. Further, a transparent electrode 72, a light absorbing film 74, and a color filter 73 are formed on the surface of the counter substrate 71. Next, the alignment film 75 is entirely formed on the opposite substrate 71, and rubbing treatment is performed. Thereby, the opposing plate 7 is formed. Then, a sheet made of, for example, epoxy resin (not shown) or a spherical or columnar spacer (not shown) is provided around the driving plate 60 or the facing plate 70. . Then, the driving plate 6A and the opposing plate 7'' are adjusted so that the pixel electrode 62 and the transparent electrode 72 are opposed to each other, and the liquid crystal 80 is injected into the inside and sealed by being adhered to the sealing material. Next, a polarizing plate 65 is attached to the driving plate 60, and a polarizing plate 76 is attached to the opposing plate 70. By the above, the display device shown in Fig. 2 is completed. By using the photoresist material stripping liquid of the present invention, it is possible to eliminate the corrosion of the surface of the electrode layer 14 containing Ag (as a reflective film), and to increase the reflectance due to the corrosion, etc. Trustworthiness. (Examples) Hereinafter, the present invention will be described in more detail by way of Examples and Comparative Examples. However, the present invention is not limited thereto. 1. A non-aqueous photoresist material stripping solution containing the compound represented by the formula (I), the formula (II), and the formula (III) and a polar organic solvent (1) Photoresist material and a photoresist layer. A silver alloy is formed on the substrate, and a photoresist material which is coated with 21 1364632 cloth, exposed and developed on the silver alloy is used as a mask to perform dry etching and patterning to obtain a photoresist layer and a photoresist layer. The substrate was evaluated for peelability. Then, the substrate was immersed in a photoresist solution of 70 ° C for 1 minute, and then rinsed with ultrapure water, dried with a nitrogen stream, and then subjected to an optical microscope and an electron microscope for photoresist and photoresist. Material peelability evaluation. The results are shown in Table 1. (2) Evaluation of Corrosion of Silver and Silver Alloy A silver alloy was formed on a glass substrate to obtain a substrate for evaluation of the corrosion resistance of the silver alloy. Then, the substrate was immersed in 7 (TC photoresist material stripping solution for 10 minutes, rinsed with ultrapure water, dried with a nitrogen stream, and then subjected to the rot of silver alloy using an optical microscope and an electron microscope. The results are shown in Table 1.

22 1364632

^_I A , a h_yu > χυ I (g)-- ^1 DGA diethylene glycol amine = 2-(2-aminoethoxy)ethanol, , :N-(2-aminoethyl) Propylamine = 1 - (2-aminoethylamino) > 2 丄 J based j temperature I & ° specific ratio of bromo ketone, BCA · butyl carbitol, PG: propylene glycol, DMS 'O · two Sputum bite, ^^: 仏Methyl-2-Ϋ2 ◎: Can be removed, 〇: only a little left X: Can not remove sputum, 〇: 1. Charm discoloration, gloss change, one secret glare 23 1364632 2. Contains: monoethanolamine; polar organic solvent; selected from the group consisting of catechol, hydroquinone, gallic phenol, gallic acid, gallic acid ester, or two or more kinds of corrosion inhibitors The non-aqueous photoresist material stripping liquid composition was evaluated in the same manner as in the photoresist removal property of the present composition and the corrosion resistance to the silver alloy, and the results are shown in Table 2. [Table 2]

No. Photoresist material stripping liquid composition (% by mass) Evaluation junction i Photoresist to silver alloy material Alloy composition (1) Component (2) Component (3) Component (4) Peeling and deteriorating molybdenum stripping property Example 24 ΜΕΑ30 ΝΜΡ45 DMI 25 catechol (1) ◎ ◎ ◎ Example 25 ΜΕΑ30 ΝΜΡ45 DMI 25 Hydrogenation (1) ◎ ◎ ◎ Example 26 ΜΕΑ30 ΝΜΡ45 DMI 25 Gallic acid (1) ◎ ◎ ◎ Example 27 ΜΕΑ30 ΝΜΡ45 DM 25 gallic acid-n-dodecyl ester (1) ◎ ◎ ◎ Example 28 ΜΕΑ30 ΝΜΡ45 DMI 25 Galla chinensis (1) ◎ ◎ ◎ Comparative Example 10 ΜΕΑ30 ΝΜΡ45 DMI 25 - ◎ ◎ X Comparative Example 11 ΜΕΑ30 ΝΜΡ45 DMI 25 Aminoacetic acid (1) ◎ ◎ X Comparative Example 12 ΜΕΑ30 ΝΜΡ45 DMI 25 acetic acid (1) ◎ ◎ X Comparative Example 13 ΜΕΑ30 ΝΜΡ45 DMI 25 phloroglucinol (1) ◎ ◎ X Comparative Example 14 ΜΕΑ30 ΝΜΡ45 DMI 25 Benzene Diphenol (1) ◎ ◎ X Comparative Example 15 ΜΕΑ30 ΝΜΡ45 DMI 25 Benzine (1) ◎ ◎ X Comparative Example 16 ΜΕΑ30 ΝΜΡ45 DMI 25 1,2,3-Benzotriene. Sitting (1) ◎ ◎ X

[Industrial Applicability] By using the photoresist material stripping liquid of the present invention, the silver and the silver alloy are not corroded, the photoresist material after etching the silver and the silver alloy can be peeled off, and the dry etching can be removed. Since the photoresist material is deteriorated, an organic EL display using silver and a silver alloy as a metal reflective film can be manufactured. 24 1364632 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view of a first embodiment of the display device of the present invention. Fig. 2 is a schematic cross-sectional view showing a second embodiment of the display device of the present invention. [Description of main component symbols] 11 Glass substrate 12 TFT 12A interlayer insulating film 12B wiring 13 Flattening layer 1 3 A connection hole 14 Electrode layer 15 Insulating film 15A opening portion 16 Organic layer 17 Common electrode 17A Auxiliary electrode 21 Sealing electrode 30 Adhesive layer 60 drive board 61 substrate 62 halogen electrode 63 TFT 63A wiring 63B protective film 64 orientation film 65 polarizing plate 70 opposite plate 71 opposite substrate 72 transparent electrode 73 color filter 74 light absorbing film 75 alignment film 76 polarizing plate 80 liquid crystal 25

Claims (1)

Γ 364632 VII. Patent application scope: 1 . A composition of a photoresist material stripping liquid, which is a photoresist material stripping liquid composition containing a substrate of silver and/or a silver alloy, characterized in that it comprises: selected from the formula (I) ΝΗ2-Α-Υ-Β-Ζ The compound represented by the formula, wherein a and b are each independently linear or branched, and the alkyl group having a carbon number of 1 to 5, γ-form NH Or any of the bismuth, Z series NH2, OH, NH-D-NH2 (where D is a linear or branched chain carbon number of 1 to 5 alkyl groups), - (II)化合物2-Α-Ν(-Β-0Η)2 is a compound represented by the formula 'A, B is the same as formula (I), and - is formula (III) In the compound represented by the formula, the genus H, the alkyl group having 1 to 5 carbon atoms, the ketone group having a carbon number of 1 to 5 or the amine group of the ruthenium group, one or two of the group consisting of And one or more polar organic solvents, the photoresist material stripping liquid composition is non-aqueous, and the polar organic solvent is selected from the group consisting of an ether solvent, a guanamine solvent, and a pyrrolidone solvent. a group consisting of an alcohol solvent, an anthraquinone solvent, an imidazole ketone solvent, and a lactone solvent, and the total content of the compound represented by the formula (I), the formula (II) or the formula (III) is 2% by mass. The above is 50% by mass or less. 26 1364632 2. The composition of the light (four) material as described in Item 1 of the middle material, wherein the compound represented by formula (1), formula (8) or formula (111) is diethylenetriamine, 2-(2-amine Ethylethylamine)ethanol alcohol, N-(3-aminopropyl)-N-(2-carbylethoxy)ethylation, di-extension propylenetriamine, 1- 2-(2-aminoethyl) Amino) 2 -propanyl)-2-aminoethanol, 2-(2-amine-triethylenetetramine, fluolin. 3. Stripping of the photoresist as described in claim 4 (4) or 2 a liquid composition, wherein the polar organic solvent is selected from the group consisting of ruthenium (tetra) ketone, diethylene glycol monotop, propylene glycol, dimethyl hydrazine, and N-methyl-2-pyrrolidone a photoresist composition for stripping photoresist, which is a photoresist material stripping liquid composition containing a substrate of silver and/or a silver alloy, containing early ethanolamine; selected from the group consisting of tea, nitrogen, and gallnut Any one or two or more of the group consisting of gallic acid and gallic acid, and one or more polar organic solvents, the photoresist material stripping liquid composition is non-aqueous, and Polar organic solvent is selected from a group consisting of an ether solvent, a guanamine solvent, a pyrrolidone solvent, an alcoholic agent, a sulfonium solvent, an imidazolidinone solvent, and a lactone solvent. The photoresist material stripping liquid composition, wherein the polar solvent is N_mercapto-2-pyrrolidone and/or dimethyl 27 1364632. 6. Patterning of silver and/or silver alloy The method comprises the steps of: forming a metal reflective film or a reflective electrode made of silver and/or a silver alloy on a predetermined region on a substrate; forming a mask on the metal reflective film or * as a reflective electrode using a photoresist material a step of etching the metal reflective film or the reflective electrode in the non-mask region; and using the photoresist material stripping liquid composition according to any one of claims 5 to 5 to remove the photoresist material The metal reflection 臈 or the step of peeling off the reflective electrode. The method and method for forming a silver and/or a silver alloy according to claim 6 of the patent application scope, wherein the etching step is dry etching. - species with silver and / or silver A display device of a reflective film or a reflective electrode made of gold, the display device having a plurality of display elements on a substrate, wherein the display element is formed on a substrate After a layer containing silver and/or a silver alloy is used, a mask is formed on the laminated film by using a photoresist, and the laminated film is etched using the mask, and the application is as follows: The photoresist material stripping liquid composition according to any one of the items 5, wherein the photoresist device is formed by peeling off the masking material. The display element is formed by laminating an organic layer and an electrode including a light-emitting layer on a reflective film or a reflective electrode made of silver and/or a silver alloy, and 28 丄北4632 is exposed from the electrode side to the light-emitting layer. The light that happened. The manufacturing method of the display device according to claim 8, wherein the display element is provided with a halogen electrode on the substrate, a driving element electrically connecting the halogen electrode, and a wiring on the substrate A liquid crystal display element in which a reflective film or a reflective electrode made of silver and/or a silver alloy is provided between the driving element and the wiring is provided. 29