TWI334846B - Substrate buffer device, method of buffering substrate, substrate processing apparatus and computer readable storage medium - Google Patents

Substrate buffer device, method of buffering substrate, substrate processing apparatus and computer readable storage medium Download PDF

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Publication number
TWI334846B
TWI334846B TW096105543A TW96105543A TWI334846B TW I334846 B TWI334846 B TW I334846B TW 096105543 A TW096105543 A TW 096105543A TW 96105543 A TW96105543 A TW 96105543A TW I334846 B TWI334846 B TW I334846B
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TW
Taiwan
Prior art keywords
substrate
line
conveying
transport
transported
Prior art date
Application number
TW096105543A
Other languages
Chinese (zh)
Other versions
TW200800774A (en
Inventor
Hironobu Kajiwara
Mitsuhiro Sakai
Akira Kakino
Original Assignee
Tokyo Electron Ltd
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Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200800774A publication Critical patent/TW200800774A/en
Application granted granted Critical
Publication of TWI334846B publication Critical patent/TWI334846B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/068Stacking or destacking devices; Means for preventing damage to stacked sheets, e.g. spaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G23/00Driving gear for endless conveyors; Belt- or chain-tensioning arrangements
    • B65G23/02Belt- or chain-engaging elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G23/00Driving gear for endless conveyors; Belt- or chain-tensioning arrangements
    • B65G23/02Belt- or chain-engaging elements
    • B65G23/04Drums, rollers, or wheels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2203/00Indexing code relating to control or detection of the articles or the load carriers during conveying
    • B65G2203/02Control or detection
    • B65G2203/0208Control or detection relating to the transported articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2203/00Indexing code relating to control or detection of the articles or the load carriers during conveying
    • B65G2203/04Detection means
    • B65G2203/042Sensors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/02Controlled or contamination-free environments or clean space conditions

Description

!334846 九、發明說明: 【發明所屬之技術領域】 本發明係關於:用以使由輸送線單 , e(FPD)之玻璃基板等之基板暫時^錢’用於平面顯示 及基板緩衝方法;備有如此之基板緩衝、署=之基板緩衝裝置 電腦可讀取之 記憶媒體 用以進行如此之基板緩衝方法而存在板處理裝置;及 記愔據撾„ 矛王式及電腦可键俶夕 【先前技術】 叙使用光餘刻技術。以光钱刻進行之電路334846 IX. Description of the Invention: [Technical Field] The present invention relates to a method for temporarily displaying a substrate such as a glass substrate of a transport line, e (FPD), for use in a flat display and a substrate buffering method; Such a substrate buffer, a substrate buffer device computer readable memory medium for performing such a substrate buffering method and a board processing device; and a 愔 „ 矛 矛 式 及 及 电脑 电脑 电脑 电脑 电脑 电脑Prior art] The use of optical remnant technology

FpD之製造中,為於FPD用之玻 田止… .......(坡縣板上形成電路圖案 下 使其 列順序進行:於玻璃美柘卜泠右扒厂圖案之形成’係根據 對應電路圖案而;劑抗=’ :=,案:吏用將進行抗_液之==;理: 縣如料雜送,Ϊ 右蚀— ^者,於生產線,通常在處理單元發生故障時,由於 元停止以解除故障之必要,而設置有於此驗料 =管^^^游側使處理前之玻璃基板自輸送線暫時迴避 如此之緩衝裝置’一般所知,係備有:緩衝框體(或緩衝 =),’鄰近輸送線而設置’可以複數多段之方式收納玻璃基板;及 ,握持輸送線上之玻璃基板,送入緩衝框體内(參照例如 f利文獻1、2)。此緩衝裝置,因輸送臂之昇降而可存取於 脰之隨意高度之位置,藉此方式可將收納於緩衝框體内之複數之 破璃基板以所期待之順序再送出至輸送線而構成。 又 然而,近年來FPD向大型化發展,以至於其一邊長達2m以 上之巨大玻璃基板出現於世,由於伴隨著玻璃基板之大型化,處 置性惡化’以輪送臂進行輸送之上述之習知之緩衝裝置,考慮^ 5 1334846 安全面已不適於大抛璃基板之處理。並且,由於賴衝裝置, 如以扇子掮動-般,以輸送臂使破璃基板昇降,玻璃基板一旦大 =,即易於使跡揚心紳揚起之微_著於玻璃基 之虞。 送臂並而ί 1 一旦使用需教導作業以進行複雜動作之輸 =解钱麵纟麵全—進度平 [專利文獻1〗特開2003-168713號公報 [專利文獻2]特開2004-304003號\報 【發明内容】 &塑所欲解決之琿誦 事由,以提供下列者為目的·· 並可圖生產率之提昇,並且,可U迴免微粒之飛散, 之順序再進岐輸魏之基板緩以所期待 用以進行如此板ϊϋ基板處理裝置;及 憶媒體。 土 '、’衝方法之控制程式及電腦可讀取之記 &^ΜΜ^±Μ •種基板緩衝裝置,用以使朝 輪送線迴避,其特徵在於: 為解決前述課題’本發明 輪送線單方向輸送之基板暫時自/、 具備有: 棚架部,設置成可昇降,且 … 且可載置經該輸送線所輸逆ς有上下複數段之可進出該輸送線 、昇降機構,使該棚:以板的載置台及、 者進出該輸送線;且 牛而令邊複數之載置台中之任一 該各載置台具有於進出 用之輸送帶機構,可用作線之際’沿輸送方向輸送基板 作為錢喊之-部分,於絲板自該輸 6 ,將由该輸送線輸送來之基板載置於該複數载 置台,於此狀態藉由該昇降機 牛々5亥基板與其載置台一齊自該輸送線迴避 6本發明提供一種基板緩衝裝置,用以使朝輪送線單方 。別迗之基板暫時自輸送線迴避,其特徵在於: 、 具備有: 、 、 且可設ί成可昇降,具有上下複數段之可進出該輸送線 ,置、、里该輸送線所輸送之基板的載置台; 、’ 去、隹構,使該棚架部昇降,而令該複數之載置台中之任一 者進出該輪送線;及 丁<仕 降;1制機構,用以控制由該昇降機構所施行之該棚架部之昇 用之ίΐίίί具有於進㈣輸送線之際,沿輸送方向輸送基板 逆结、=:機構’可用作為該輸送線之—部分,於使基板自該輸 =線迴避之際,將由該輸送線輸送來之基板載置於該複數載置△ 中”於該輸送線的該載置台,於此狀態藉由該昇降機構使^ 棚罙邰幵降,令該基板與其載置台一齊自該輸送線迴避; ㈣於該輸送線之載置台上載置有基板之狀態下,該控制 載置台與由該輸送線輸送來之下—基板之間成既定 距離化’藉由該昇降機構使該棚架部昇降。 本發日种,宜具有偵測部,t^於自進出該輸送線之載置台朝 輸送方向上_既定麟之位置,用叫貞_輸送線所輸送之美 板,該控制機構,根據該偵測部之偵測信號,控制由該昇降機& 進行之該棚架部之昇降。 此時該控制機構,宜控制由該昇降機構進行之該棚架部之 降,俾於自該輸送線迴避之基板再次進出該輪送線之際,由 迴避之基板開始依序進出。 以上之本發明中’宜將由該昇降機構進行之該棚架部之 之開始時點,至魏該棚架部之昇降結束,_輸送雜送來之 7In the manufacture of FpD, it is used for the FPD for the Fonda..........(The formation of the circuit pattern on the slope board is carried out in the order of the column: the formation of the glass pattern in the glass According to the corresponding circuit pattern; agent resistance = ': =, the case: the use of anti-liquid ==; Reason: County, such as miscellaneous, 右 right eclipse - ^, in the production line, usually in the processing unit failure When the element is stopped to remove the fault, the sample is provided with the buffer. The glass substrate before the treatment is temporarily evaded from the conveyor line by the buffer device. As is generally known, buffers are provided. The frame (or buffer =), "provided adjacent to the transport line" can accommodate the glass substrate in a plurality of stages; and the glass substrate on the transport line is carried into the buffer frame (see, for example, F. 1, 2) The buffer device can be accessed at a position of a random height of the crucible by the lifting and lowering of the transport arm, whereby a plurality of glass substrates accommodated in the buffer frame can be re-sent to the transport line in the desired order. However, in recent years, FPD has grown to such a large size that it has one side. A large glass substrate of 2 m or more has appeared in the world. Due to the increase in the size of the glass substrate, the handling property is deteriorated. The above-mentioned conventional buffer device for transporting by the wheel arm considers that the safety surface is not suitable for large throwing. The treatment of the glass substrate. Moreover, due to the swaying device, such as the fan swaying, the glass substrate is lifted and lowered by the transport arm, and once the glass substrate is large, it is easy to make the swell of the stalk送 送 送 送 送 送 送 送 ί ί ί 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 一旦 进度 进度 进度2004-304003\报[The content of the invention] & the object of the object to be solved, for the purpose of providing the following: · The productivity can be improved, and U can avoid the scattering of particles, the order of re-entry The substrate of Wei Wei is expected to be used for such a substrate processing device; and the media. The control program of the soil ', 'crush method' and the computer readable record & Device for feeding the wheel In order to solve the above problem, the substrate of the present invention in which the transfer line is transported in one direction is temporarily provided with a scaffolding portion, which is provided so as to be movable up and down, and can be placed on the transport line. ςThe upper and lower sections can enter and exit the conveying line and the lifting mechanism, so that the shed: the mounting table of the board and the entering and exiting the conveying line; and each of the mounting stages of the plurality of mounting stages has The conveyor belt mechanism for entering and exiting can be used as a line for conveying the substrate in the conveying direction as a part of the money, and the substrate conveyed by the conveying line is placed on the plurality of mounting platforms. In this state, the elevator burdock 5H substrate is escaping from the transport line together with the mounting table. The present invention provides a substrate buffering device for unilaterally feeding the wheel. The substrate is temporarily evaded from the transport line, and is characterized in that it has: 、, and can be set up to be movable up and down, and has a plurality of upper and lower sections that can enter and exit the transport line, and the substrate transported by the transport line The mounting platform; , 'going, arranging, lifting the scaffolding portion, and allowing any one of the plurality of mounting stations to enter and exit the wheel feeding line; and Ding <Shi Jiang; 1 system for controlling The lifting of the scaffolding portion by the lifting mechanism is used to convey the substrate in the conveying direction, and the mechanism can be used as a part of the conveying line, so that the substrate is self-contained. When the line is avoided, the substrate transported by the transport line is placed on the plurality of mounts Δ" on the mount of the transport line, and the state is lowered by the elevating mechanism. (4) in a state in which the substrate is placed on the mounting table of the transport line, the control mounting table and the substrate are transported to a predetermined distance between the substrate and the substrate. 'With the lifting mechanism to make the shed The lifting and lowering of the frame. It is advisable to have a detecting unit on the day of the hair, and the control unit is transported by the mounting platform of the conveying line toward the conveying direction _ the position of the lining _ conveying line. Controlling the lifting of the scaffolding portion by the elevator & according to the detection signal of the detecting portion. At this time, the control mechanism should control the lowering of the scaffolding portion by the lifting mechanism. When the substrate that the transport line avoids enters and exits the round feed line again, the substrate that is evaded starts to enter and exit sequentially. In the above invention, the start point of the scaffolding portion to be carried out by the elevating mechanism is to be used. The lifting of the frame is over, and the _ delivery is sent 7

=板被载置於進出該輪送線之 A 2昇降’载置於進出該輪送線之^外^ ^降機構該棚架部 T機構送出之時點為止之時間,^之基板由該輸送 time)為短。 政Ί·7亥輸运線之作業時間(tact 此時宜更包含: 出該之:作=輸送線之-部分,分別鄰接於進 該輸g之,速度側而設置,具有較 由相同之驅二發::載台之該輪送帶機構,宜係 源連接而構成。 /載〇進出5亥輸送線之際係與該驅動 子輪送方式及帶輪之^^置台之該輸送帶機構宜為滾 該輸送線而作為中’该最上段之载置台,宜於平時進出 送帶機構宜為方式,錄上段以外之各載置台之該輸 該基板緩衝裝.種基板緩衝方法’使用-基板緩衝裝置, 棚架部,設置:ΐ昇降,且有… 輸送基板之輪逆繞日/、有上下设數段之可進出於單方向 及 如線且可載置經該輸送線所輸送之基板的載置^ 之輸繼機送基板 5¾基板繞衝古、、上 17/, 線迴避,其特徵為':以使由該輸送線輪送之基板暫時自輪送 使由錢送線輪送來之基板載置於該複數之載置台中之進出 1334846 於遠輸送線的載置台,於此狀態藉由該昇降機構使該’棚架部昇 降,使其基板與其載置台一齊自該輸送線迴避,基板迴避時之由 該昇降機構進行之該棚架部之昇降,係於基板被載置於進出該輸 送線之載置台之狀態下,且其載置台與該輸送線所輸送來之下一 基板之間成既定之距離之際進行。 再者,本發明提供一種基板處理裝置,包含: 輸送線’單方向輸送基板; 處理部,對該輸送線所輸送之基板施以既定之處理;及 a 裝置’設置練該處理部靠近該輸送線之輸送方向上游 理部發纽障之際,使該輪送線所輸送之基板 其特徵在於: 該緩衝裝置,具備有: 線且版侧該輸送 者進使Γ㈣昇降,以令該複數之載置台中之任一 台;該棚架部之昇降;且 之輸送帶_,沿輸送方向輸送基板 該複輸送‘輸送來之基板載置於 使該棚架部昇降,令其基板二載„藉_昇降機構 2,;該載置台與該輸線之載置台之狀 離之際,控制以藉由該昇^ 5下一基板之間成既定之距 再者,本發明提供棚;部昇降。 於電腦上動作,於執f特徵在於: 俾施行該基板緩衝方法。卫'1各式钤,使電腦控制處理裝置, 9 1334846 缓衝方法 發明之效杲 腦上動作之控’翻有於電 $了雜制程式時’使電腦控制處理裝置,俾施行該基板 線所輸送域板二il:二可,且可載置輸送 =之ΐ域置於複數術台中“於輸;:;者使=ji ΐΓ ίΐ面且少之1時輸送基板於輸送 使各載置台進出輸送線之際用作為輸送線之-部分 魏基板之輸送帶機構而構成,因此可以隨 “待之“藉此方式讀迴避之複數之基板以 【實施方式】 f施發明之悬祛报倉 i 以下參照附圖具體説明關於本發明之實施形態。 〜ΐ-1係搭載有其為依本發明之基板缓衝裝置之一實施形態之 緩,單7L :進行對FPD狀玻雜板(以下,簡單稱為「基板」) 之抗钱劑膜之形成及曝光處理後之抗餘劑膜之顯影處理之抗钱劑 塗布顯影處理系統之概略平面圖。 抗钱劑塗布顯影處理裝置(基板處理裝置)100備有: 11盒站1 ’載置有收納複數之基板G之匣盒c ; 處理站2,對基板g施以包含抗蝕劑塗布及顯影之一連串之 處理;及 介面站4,於對基板G施以曝光處理之曝光裝置9之間進行 基板G之傳遞; 10 i 1334846 ϋ盒站1及介面站4分別配置於處理站 中,以抗蝕劑塗布顯影處理系統1〇〇 兩側。又,圖1 平面上與X方向直交之方向為長方MX方向,以於 匣盒站1備有: 載置台12 ’沿Y方向並列,可載置匿 輸送裝置11,與處理站2之間進 之 =送=動及水平旋轉,盒=站移 處理站2包含有於匣盒站1盥介 平行之2列基板G之輸送線A、B'。 間向X方向延伸之 1 獅謂特_輸送自匡盒站 ⑽介面站 於輸送線A上,自g各扯1加a人 準分子UV _元有: 熱單元(PH) 23、點附罝W A二標擦洗,尹早70 (SCR) 22、預 衝單元ίΒυΐη% (AD) 24、冷卻單元(COL) 25、緩 CDP) 37。 7部早^(COLDSi、缓衝單元(Bup) 於輸送線B上,自介面姑4如丨人r- a 顯影單元⑽v) 3G、力側向E盒站1側,依序排列有: 32、緩衝單元處理早A (HT) 3卜冷卻單元(C〇L) 】之間,讯有 )38。又,於冷卻單元(COL) 32與匣盒站 板〇之^1裝ΚΪ含抗敍劑塗布及顯影之一連串處理之基 物之2i進行基板G所包含之有機 /、把’紐洗淨單tg (SCR) 22進行基板G之揉擦洗淨 1334846 處^及乾燥處理。預熱單元(PH) 23進行基板G之加爇處理,黏 附單元(AD) 24進行基板G之疏水化處理,冷卻單元(c〇L) 25冷卻基板G。抗蝕劑塗布單元(CT) 26於基板G上供給抗蝕 劑液形成抗蝕劑膜,減壓乾燥單元(Dp) 27於減壓下使基板G上 之抗蝕劑膜所包含之揮發成分蒸發使抗蝕劑膜乾燥。加熱處理單 π (HT) 28進行基板G之加熱處理,冷卻單元(c〇L) 29與冷 卻單元(COL) 25相同冷卻基板〇。 一 顯影單元(DEV) 30逐次進行基板G上之顯影液之塗布、基 板G之漂洗處理、基板G之乾燥處理。加熱處理單元 ,加熱,理單το (HT) 28相同進行基板G之加熱處理,冷卻單元 (COL) 32與冷卻單元(C0L) 25、29相同冷卻基板G。 ^係於X方向下游側之單元,例如抗_ 主布早兀(CT) 26、減壓乾燥單元(Dp) 27、加熱處 發生轉謂,肋絲糾暫時= 4 ~ ^TdevTso 線B迴避而i在J站1發生故之際,用以使_ G暫時自輸i =:=^顧)36、37、38於後詳細説明。 ⑽)44’配置有可收納基板G之緩_盒,係基板 二43,接受經輸送線A輪送之基板G,.而輸送至旋轉台 下列^臂43可上下機、雜移缺水钱轉,可存取基板於 12 夕輪送臂43鄰接而設置;及, 鄰接而設置之周輕光裝置fEE^Cf單元⑽v)30 抗钱劑塗布顯影處理| =曝光機(T1TLER)。 使用者介_,由製連接有: 裝置100之各部分或各 理域魅布顯影處理 使各部分或各單元之運作狀、兄之輪入操作等之鍵盤,或 記憶部103,存放有被記錄匕顯示器等而成,·及 恭银W二2處條件I料等係為以步驟控制哭1G1之㈣ 貝現^钱劑塗布顯影處理裝置】 = ^控制 然後,應需要以來自使 :之f種處理而存在。 叫出隨意之配方,使步驟㈣,丨2之指不等自記憶部簡 :制二由抗_塗布顯影處理裝置‘ 2 S;傳;者亦可線上利用來自其他裝置,=== 置於顯影處理装置100中’首先,被載 之輸送臂lla輸送至基板G’由輸送裝置11 t'tti ί达’以準分子清照射單元(e—uv)21進行基 ΙτνΠ有機物之去除處理。結束於準分子UV照射單元(e 於揉Λ上有機,物之去除處理之基板G錄送線A上被輸送, 於揉早70 (SCR) 22被施以雜洗淨處理及乾燥處理。 縣洗#單元(SCR) 22之雜洗淨處理及乾燥處理 ^基板G於輸送線A上被輸送,由預熱單it (PH) 23施以加孰 J理^魏水。結束於麵單元(pH) 23之加熱處理之基板G於 輸达線A上被輸送,由黏附單元(Α〇) %施以疏水化處理。結 13 1334846 附單元(AD) 24進行之疏水化= the time at which the board is placed in the A 2 lift in and out of the round feed line and is placed at the time when the scaffolding unit T is fed out of the round feed line. Time) is short. The operation time of the political and 7th sea transport line (tact should be included at this time: out of the: the part of the conveyor line - the part is adjacent to the input, the speed side is set, and the drive is the same. Second round:: The round belt feeding mechanism of the loading platform should be constructed by connecting the source. / The belt mechanism that is carried in and out of the 5 Hai conveyor line and the driving wheel and the pulley It is advisable to roll the conveyor line as the uppermost stage of the loading line. It is advisable to enter and exit the belt feeding mechanism in a normal manner, and to record the substrate cushioning device for each mounting table other than the upper section. Substrate buffering device, scaffolding section, setting: ΐ lifting, and... The wheel of the conveying substrate is reversed by the day/, and there are several sections of the upper and lower sides which can enter the single direction and the line and can be transported through the conveying line. The substrate is placed on the substrate, and the substrate is transferred to the substrate, and the substrate is circumvented, and the line is circumvented. The feature is ': so that the substrate fed by the conveyor line is temporarily rotated from the wheel to the money delivery wheel. The substrate that is delivered is placed in the plurality of mounting stations 1334846 on the mounting platform of the far conveyor line In this state, the 'shelf frame portion is raised and lowered by the elevating mechanism, and the substrate and the mounting table are escaping from the transport line. The lifting and lowering of the scaffolding portion by the elevating mechanism during the substrate avoidance is performed on the substrate. The invention is carried out in a state of being placed in and out of the mounting table of the transport line, and the mounting table is at a predetermined distance from the substrate transported by the transport line. Further, the present invention provides a substrate processing apparatus. The method includes: a conveying line ‘unidirectional conveying substrate; a processing unit, applying a predetermined process to the substrate conveyed by the conveying line; and a device “setting the processing unit to the upstream of the conveying line in the conveying direction The substrate conveyed by the wire feeding line is characterized in that: the buffer device is provided with: a wire and the conveyor side of the plate side is moved up and down to make any one of the plurality of mounting platforms; the scaffolding The lifting and lowering of the part; and the conveying belt_, transporting the substrate in the conveying direction, the conveying conveyance of the substrate is carried by the lifting and lowering of the scaffolding portion, so that the substrate is loaded with the "borrowing_lifting mechanism 2"; the mounting table and the mounting table The loss When the line is placed, the control is controlled by the rising distance between the next substrate, and the present invention provides a shed; the part is lifted and lowered. The action on the computer is characterized by: The substrate buffering method is implemented. The computer control processing device is implemented by the computer control processing device, and the control method of the computer is controlled by the method of the buffering method. The 域 il 二 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该When the transporting and transporting of each of the mounting stages to and from the transport line is constituted by a belt mechanism as a part of the transport line of the transport line, it is possible to read and avoid the plurality of substrates in a manner of "waiting" in this manner. The present invention relates to an embodiment of the present invention with reference to the accompanying drawings. The ΐ-1 is equipped with an embodiment of the substrate buffer device according to the present invention, and the single 7L is made of an anti-drug film for an FPD-shaped glass plate (hereinafter simply referred to as "substrate"). A schematic plan view of the anti-money agent coating development processing system for developing and treating the anti-surplus film after the exposure treatment. The anti-money agent coating and developing treatment apparatus (substrate processing apparatus) 100 is provided with: 11 cassette stations 1' in which cassettes C containing a plurality of substrates G are placed; and processing station 2, which applies resist coating and development to the substrate g And a series of processing; and the interface station 4, the substrate G is transferred between the exposure devices 9 for performing exposure processing on the substrate G; 10 i 1334846 The cassette station 1 and the interface station 4 are respectively disposed in the processing station to resist The etchant coating development treatment system 1 〇〇 on both sides. Further, the direction orthogonal to the X direction on the plane of Fig. 1 is the rectangular MX direction, so that the cassette station 1 is provided with: the mounting table 12' is juxtaposed in the Y direction, and the transport device 11 can be placed between the processing station 2 and the processing station 2 In the case of sending = moving and horizontally rotating, the box = station shifting processing station 2 includes the conveying lines A, B' of the two rows of substrates G which are parallel to the cassette station 1 . The 1 lion is extended to the direction of the X. The lion is transported from the box station (10). The station is located on the conveyor line A. Each of them is added with a person. The excimer UV _ element has: thermal unit (PH) 23, point attachment WA two standard scrub, Yin Zao 70 (SCR) 22, pre-flush unit Βυΐ % % (AD) 24, cooling unit (COL) 25, slow CDP) 37. 7 parts early (COLDSi, buffer unit (Bup) on the conveyor line B, self-intermediate interface 4 such as the human r- a development unit (10) v) 3G, force side to the E box station 1 side, in order: 32 The buffer unit handles the early A (HT) 3 b cooling unit (C〇L) 】, the signal has 38). Further, in the cooling unit (COL) 32 and the cassette station board, the substrate containing the anti-small coating application and development is subjected to a series of substrates 2i to perform the organic/inclusion of the substrate G. Tg (SCR) 22 performs the cleaning of the substrate G at 1334846 and the drying process. The preheating unit (PH) 23 performs the twisting treatment of the substrate G, the adhesion unit (AD) 24 performs the hydrophobic treatment of the substrate G, and the cooling unit (c〇L) 25 cools the substrate G. A resist coating unit (CT) 26 supplies a resist liquid on the substrate G to form a resist film, and the reduced-pressure drying unit (Dp) 27 decompresses the volatile component contained in the resist film on the substrate G under reduced pressure. Evaporation causes the resist film to dry. The heat treatment of the substrate G is performed by heat treatment of a single π (HT) 28, and the cooling unit (c〇L) 29 cools the substrate 相同 in the same manner as the cooling unit (COL) 25. A developing unit (DEV) 30 successively performs application of the developer on the substrate G, rinsing of the substrate G, and drying of the substrate G. The heat treatment unit, the heating unit, and the heat treatment of the substrate G are performed in the same manner, and the cooling unit (COL) 32 cools the substrate G in the same manner as the cooling units (C0L) 25 and 29. ^The unit is located on the downstream side of the X direction, for example, the anti-main cloth early (CT) 26, the decompression drying unit (Dp) 27, the heating position occurs, the rib wire correction temporarily = 4 ~ ^ TdevTso line B avoids i will be explained in detail later when J station 1 occurs, so that _G temporarily inputs i =:=^^) 36, 37, 38. (10)) 44' is provided with a buffer _ box for accommodating the substrate G, and the substrate substrate 43 is received by the substrate G, which is transported by the transport line A, and is transported to the rotary table. The following arm 43 can be used to get on and off the machine, and the water is lost. The transferable substrate is disposed adjacent to the 12th turn arm 43; and the peripheral light device fEE^Cf unit (10) v) 30 is disposed adjacent to each other; the anti-drug coating development process | = exposure machine (T1TLER). The user interface _, connected by: the various parts of the device 100 or the various regions of the genre development processing to make the operation of each part or each unit, the keyboard of the brother's wheel operation, etc., or the memory unit 103, stored Recording 匕 display, etc., and Gong Yin W 2 2 conditions I material, etc. is to control the crying 1G1 step by step (4) Bay now ^ money agent coating development processing device] = ^ control then, should be required to f kinds of processing exist. Call out the random formula, so that the steps (4), 丨2 refer to the self-memory part: the second is made of anti-coating and developing treatment device ' 2 S; pass; can also be used online from other devices, === placed In the development processing apparatus 100, first, the conveyance arm 11a is transported to the substrate G' by the transport apparatus 11 t'tti ί' to perform the removal treatment of the organic substance by the excimer-clearing unit (e-uv) 21. The end of the excimer UV irradiation unit (e is transported on the substrate G recording line A which is organically removed, and the material is removed, and is washed and dried in the early morning 70 (SCR) 22 . Washing #Unit (SCR) 22 miscellaneous washing treatment and drying treatment ^Substrate G is transported on the transport line A, and is preheated by it (PH) 23 to be applied to the surface of the surface. The heat-treated substrate G of pH 23 is transported on the transport line A, and is hydrophobized by the adhesion unit (Α〇) %. Hydrophobization by the junction 13 1334846 attached unit (AD) 24

上被輸送,由冷卻單元(C0L) Μ冷卻。.輯运、·泉A 於基板,===板0— 由抗^塗布單元(CT) .26形成抗_膜之基板g,於輸送 姑#、ί輸H賴乾料元(DP) 27暴露於減壓蒙氣,使1 被知以抗钱劑膜之乾燥處理。 ’、 ^ G於ί減燥單元(DP) 27被施以抗·膜之乾燥處理之基板 理,t 於加熱處理單元(HT)烈被施以加熱處 至下(OTL) 29被冷卻之基板G於輸送線A上被輸送 介f站4之輪送臂43輸送至旋轉台⑽44。 ΓΪ ri 輸送臂43被輸送至外部裝置區塊90之周邊曝光 “(不上7邊曝光裝置(EE)施以用以去除抗_膜之外 之曝光處理。接著,基板G由輸送臂43被輸送 ±麵施以既定圖案之曝光處理。又,有時, 二=y。$處理結束之基板g由輸送臂 機(titler),的柯錢(τ_) Β上二字曝(TITLER)填寫既定之資訊之基板〇於輸送線 ====施=之,、 以例如下序i行:處漂祕理及乾燥處理 基板G於輸送線b上被輸送並同時於基板g上盛裝顯影液, 14 1334846 其次,輸送暫時停止,基板以既定之角度傾斜以使顯秦液流下, 以此狀態於基板G上供給漂洗液,洗落顯影液,其後,基^ G恢 復水平姿勢,再一面被輸送,並同時對基板〇吹/送乾燥I體。 由顯影單元(DEV) 30進行之顯影液之塗布處理、漂洗處理 二乾燥處理結束後之基板G ’於輸送線B上被輸送,於力:熱處理 '^元(HT) 31被施以加熱處理,去除抗蝕劑膜所含有 分。又,於顯影單元⑽V) 30與加熱處理單元^水 亍顯影液之脫色處理之1線uv照射單心於加埶“ 早兀(HT) 31進行之加熱處理縣之基板G, 适,由冷卻單元(C0L) 32冷卻。 几果B上被輸 由檢冷Γ基fG,於輸送線Β上被輸送, 之35檢查。通過檢查之基板G,由設於g盒站】 ιιϋ早7^之輸运臂lla,i納於被載置於載置台12之既定之 其次,詳細說明關於緩衝單元(BU 。 37、%时與緩解元(卿)36完全_之構 腳) 树明之_料(腳)36 (基板 圖=彳$ (咖)36之另?卜mu剖面圖, 綾衝早兀(BUF) 36備有: 01 5f中==出降’而令複數段之载置台. 納棚架部5及昇降機構6而設置之;及 以:;之,方向上游側及下游側犧^ 機構50a〜5Gf 方向—方側可輸送基板之輸送帶 進出輸魏八之際,可驅動此輸送帶機構ϋ 15 1334846 5〇f以使其用作為輪送線A之一 線A之一般輸送時,使 =成。又,平時或作為輪送 段之載置台5a進出^7A _G較易接觸氣流之最上 圖5係設於緩衝單元⑺^弘之 置台&之輸送帶機構地,如圖口5所^ 設於 分別以超高分子聚乙蝉材料形成5la、51b 向之側壁之軸承52以可旋轉之方々古姓、、^7卩$之於Y方向相 別由後述之作為驅動源之馬達53驅動而^ =二Τ、二ί 件他、5lb間之例如;^丁;:輸:。在此’於所有滾輪構 馬達53可連接此等滾輪構件51a、训中之任一者= 中央部之滾輪構件51a ’使此滾輪構件Sla旋轉,以使 ^ 力傳達帶54使所有滾輪構件51a、51b —齊〗 輸送方式,可ί其與如後述之輸送帶機構 Τ輸送方式相較耐久性較高。 q =構及滾輪構件51b向χ方向交互配置。滾輪構件 51a、51b分別包含有: 小口控之旋轉抽51c,向Y方向延伸;及It is transported and cooled by the cooling unit (C0L). .························································································ Exposure to decompression and venting, so that 1 is known to be dried by the anti-money film. ', ^ G ί 减 drying unit (DP) 27 is applied to the substrate treatment of the anti-film drying treatment, t is applied to the heat treatment unit (HT) to be heated to the lower (OTL) 29 cooled substrate G is transported to the rotary table (10) 44 by the transfer arm 43 of the transport station 4 on the transport line A. The ΓΪ ri transport arm 43 is transported to the peripheral exposure of the external device block 90. (The upper 7 side exposure device (EE) is applied to remove the exposure process other than the anti-film. Then, the substrate G is transported by the transport arm 43. The exposure surface is applied with a predetermined pattern of exposure processing. Also, sometimes, two = y. The end of the processing of the substrate g is completed by the carrier (the titler), the Ke Qian (τ_) Β上字字(TITLER) is filled in. The substrate of the information is placed on the transport line =========================================================================================== 14 1334846 Next, the conveyance is temporarily stopped, the substrate is tilted at a predetermined angle to allow the sputum liquid to flow down, and the rinsing liquid is supplied onto the substrate G in this state to wash off the developing solution, and thereafter, the base is restored to the horizontal posture, and then the side is The substrate G is blown and sent to the substrate at the same time. The coating process and the rinsing treatment by the developing unit (DEV) 30 are carried out on the conveying line B after the drying process is completed. : heat treatment '^ yuan (HT) 31 is applied by heat treatment to remove the resist The film contains a fraction. In addition, in the developing unit (10) V) 30 and the heat treatment unit, the decolorization treatment of the hydrazine developing solution is irradiated with a single line of uv irradiation, and the substrate G of the heat treatment county of the early 兀 (HT) 31 is added. , suitable, cooled by cooling unit (C0L) 32. A few fruits B were transported by the inspection of the cold base fG, which was transported on the conveyor line, and the 35 inspection. By the inspection of the substrate G, the transport arm 11a, which is provided in the g-box station, is placed on the mounting table 12, and the buffer unit (BU. 37, %) is explained in detail. With the relief Yuan (Qing) 36 complete _ the structure of the foot) Shu Mingzhi _ material (foot) 36 (substrate map = 彳 $ (Caf) 36 of the other? Bu Mu section map, 兀冲早兀 (BUF) 36 is available: 01 5f =================================================================================================================== When the conveyor belt of the side transportable substrate enters and exits the Wei 8th, the conveyor belt mechanism ϋ 15 1334846 5〇f can be driven to be used as the general conveyance of one of the line A of the transfer line A, and then =. Or as the loading section 5a of the loading section 5a in and out of the ^7A _G is the most convenient to contact the airflow. Figure 5 is set in the buffer unit (7) ^ Hongzhi's platform & conveyor belt mechanism, as shown in Figure 5 The molecular polyethylene bismuth material forms the bearing 52 of the side wall of 5la, 51b to the side of the rotatable square, and the value of ^7卩$ in the Y direction is determined by the latter. The motor 53 of the moving source is driven and ^=2, 2 ί, and 5 lb, for example; ^丁;:Transmission: Here, all the roller motor 53 can be connected to the roller members 51a, and the training is performed. One = the roller member 51a of the center portion rotates the roller member S1a so that the force transmitting belt 54 allows all the roller members 51a, 51b to be aligned, and can be conveyed in a manner similar to the belt mechanism described later. Compared with the durability, q = the roller members 51b are alternately arranged in the χ direction. The roller members 51a, 51b respectively include: a small-controlled rotary pumping 51c extending in the Y direction;

大口徑之抵接部5Id,於此旋轉軸51c沿Y方向空出間隔複 數設置; B 俾使抵接部5Id抵接基板G,支持基板G而形成,而為使對 基板G之支持力沿γ方向大略均勻分散,於滾輪構件51a與滾輪 構件51b ’抵接部51d之Y方向位置相異而構成。 ~ 圖6係設於緩衝單元(BUF) 36之載置台5b〜5f之平面圖。 没於載置台5b〜5f之輸送帶機構50b〜50f分別如圖6所示包含 有: 主動皮帶輪55a,設於例如X方向之中央部; 16 1334846 從動皮帶輪55b,分別設於例如χ方向之兩端部;·及 輪达帶55c’掛設於主動皮帶輪%及各從動皮帶輪说之間; 苹邱形成為向Y方向延伸之略圓柱狀,由設於棚 木4 5之於Υ方向相向之側壁之軸承允以可旋轉之方 門截帶T5b ’例如’沿Υ方向空出間隔複數設置,於隔 1载ϋ之間之分隔板57上以可旋轉之方式被支持。 γ方為,其對應從動皮帶輪55b,形成為細帶狀,沿 皮帶輪3送帶機構5〇b〜5〇f分別用以使主動 動而旋轉’伴隨此,各輸送帶55c及各 輸ίΐϋΪΐ/使其向X方向帶輸送基板G而構成。 輸送因此與如輸送帶機〜滚子 i 二,:== 昇降极其鱗她部5岭置於_部$之下侧。 >ΐ^1ϊίϊ61 ’设於棚架部5之底面之略中央部;及 之周圍”干機構62 ’複數設置於棚架部5之底面之汽缸機構61 降而=機構61及滚珠螺桿機構62同步伸縮,以使棚架部5昇 分別;方向相向之側壁 rsi η ~ 运之基板G之运入口 71及送出口 72。 與係衝單元(腳)%之輸送帶機構迦〜50f 7γ 1J34846 韻线部有例如 央部之滾輪構件51a之 於輸送帶機構服之X方向中 之主動皮帶輪55a之轴g向;,,送帶機構5〇b〜5〇f 輸送線A之際,盘馬^向;^部,分別設有載置台&〜5f進出 部53a礙入之孔狀^ ^卡合部仏於周向可卡合之例如卡合 線A之載置台與卡止部53b卡合,進出輸送 53 ^ (#e, s 7 離開而移動,使卡人1 &、、、&_^達53因滑動機構73自棚架部5 線a之載置台使51σ5°/^!、與 53b之卡合解除,進出輸送 53之連接解除爾成。之輸⑲機構*〜5〇f中之任一者與馬達 〜5〇f,以實現^53個別驅動複數之輸送帶機構50a 與分別設麟之旋難之卡合部 之連接,亦可由利用磁力之構件51&或主動皮帶輪55a 由馬達53進彳轉等進行而構成。 (正常時或平時之輸送速度)a 之輸送速度 線A所輸送之基板G到達線A之作業時間(自輸送 〇到達既定之位置之:无^^輸送線A所輸送之下—基板 構6進行之棚架部5之昇祐而於此,考慮到由昇降機 不崩解,可設定為較輸之生產進度平衡 辅助輪送帶機構8a、8b分別^ 快。 及由馬達53進行之輪送帶機構^^〜置^輸^線A之作業時間、 由昇降機構ό進行之棚架部5夕θ ^板G之輪送時間和 之,驅動源朝X方向對基板G 間。藉由未圖示之馬達等 帶輪送之帶輸財式㈣成滾子輸送方式或進行 送帶機構8a、8b係用作為輪(送圖線\^!^方式)’此兩輔助輸 18 1334846The large-diameter abutting portion 5Id is provided at a plurality of intervals in the Y-direction of the rotating shaft 51c. B 俾 the abutting portion 5Id is abutted against the substrate G to support the substrate G, and the support force for the substrate G is provided. The γ direction is largely uniformly dispersed, and is configured such that the roller member 51a and the roller member 51b' abutting portion 51d have different positions in the Y direction. ~ Fig. 6 is a plan view of the mounting tables 5b to 5f provided in the buffer unit (BUF) 36. As shown in FIG. 6, the conveyor belt mechanisms 50b to 50f which are not mounted on the mounting tables 5b to 5f include a driving pulley 55a provided at, for example, a central portion in the X direction, and 16 1334846 driven pulleys 55b, which are respectively disposed in, for example, a weir direction. Both ends; and the wheel belt 55c' are hung between the active pulley and the driven pulleys; the apple is formed in a slightly cylindrical shape extending in the Y direction, and is arranged in the direction of the shed The bearing of the side wall is allowed to be rotatably supported by a rotatable square door band T5b', for example, vacantly spaced apart in the Υ direction. The γ square is corresponding to the driven pulley 55b, and is formed in a thin strip shape. The belt feeding mechanisms 5〇b to 5〇f along the pulley 3 are respectively used for the active movement to rotate. Accompanied by this, each conveyor belt 55c and each conveyor belt 55 / It is configured to transport the substrate G in the X direction. The delivery is therefore with the conveyor belt machine ~ roller i II, :== lifting the extreme scales of her 5 ridges placed on the lower side of the _ section. >ΐ^1ϊίϊ61 ' is disposed at a substantially central portion of the bottom surface of the scaffolding portion 5; and the surrounding "dry mechanism 62" is provided in a plurality of cylinder mechanisms 61 provided on the bottom surface of the scaffolding portion 5, and the mechanism 61 and the ball screw mechanism 62 are lowered. Simultaneous expansion and contraction so that the scaffolding portion 5 is lifted separately; the opposite side wall rsi η ~ transported the substrate G of the transport inlet 71 and the delivery outlet 72. With the system (foot) % of the conveyor belt mechanism Jia ~ 50f 7γ 1J34846 rhyme The line portion has, for example, the roller member 51a of the central portion of the belt pulley g of the driving pulley mechanism in the X direction of the belt mechanism; and, when the belt feeding mechanism 5〇b~5〇f is conveyed by the line A, The mounting portion of the mounting portion &~5f access portion 53a is provided with a hole-shaped engaging portion, and the mounting portion, for example, the engaging line A, which is engageable in the circumferential direction, is engaged with the locking portion 53b. , in and out of the transport 53 ^ (#e, s 7 leave and move, so that the card 1 &,,, & _ ^ 53 due to the sliding mechanism 73 from the scaffolding section 5 line a of the mounting table to make 51σ5 ° / ^! And the engagement with 53b is released, and the connection of the ingress and egress 53 is removed. The one of the 19 mechanisms*~5〇f and the motor are 5~f to realize the individual drive of ^53 The connection between the number of belt conveyors 50a and the engaging portions of the respective twisting shafts may be performed by the magnetic member 51& or the driving pulley 55a by the motor 53. (Normal or normal conveying) The working time of the substrate G conveyed by the conveying speed line A of the speed) a to the line A (from the conveyance 〇 to the predetermined position: without the delivery of the conveying line A) - the scaffolding portion 5 of the substrate structure 6 In view of the fact that it is not disintegrated by the elevator, it can be set to be faster than the production schedule balance of the auxiliary belt conveyors 8a, 8b. The wheel belt mechanism by the motor 53 ^^~ The working time of the wire A, the turning time of the scaffolding portion 5 by the lifting mechanism 夕, and the driving time of the plate G, and the driving source are directed between the substrates G in the X direction. Pulleys such as motors (not shown) The belt is delivered with the type of fuel (4) into the roller conveyor mode or the belt conveyor mechanism 8a, 8b is used as the wheel (send the line \^!^ mode) 'the two auxiliary transmission 18 1334846

之基ί ί ^^基板G之輸送速度分別較輸送線AThe base ί ί ^^ substrate G transport speed is higher than the transport line A

二H輸速例如設定為與輪送帶機構*〜50f之A Ϊ傳Ϊ Λ輸送線A往進出輸送線A之载置台5a〜分之IS $^及自進出輸送線A之載置台5a〜5f往輸送線A之基L 傳^迅速進行,而可以實現輸送線A之作業_之縮短。 馬達進行之棚架部5之昇降、由滑動機構73進行之 及輔着1、馬f Z之輸送帶機構伽〜5Gf之作動、 i ===!a、8b之作動,分別由接受來自步驟控制_ 之104 (控制機構)控制。於自進出輪送線A 式載置口^崎定之_續送方向上_或輸送方向 ^例如辅助輸送帶機構8a之X方向上游側 ^ ,,輪送之基板〇之第!感測器105 (偵測部)=== 「向上Γ]端部及下游側端部,各設有侧輸送線1 ii : ^測器⑽及第3感測11⑽分別—旦制出基1 =及第3❹m撕,可關如侧基之存f之存 ^元控制器104, 一旦於缓衝單元(BUF) 36之又方向 =之單元,例如抗蝴塗布單元(CT) 26、減壓乾燥單元⑽ =^熱處理單元(HT) 28或冷卻單元(c〇L) 29發生故障 =衝早元(腳)36之輸送線A之X方向為下㈣者停止 輪迗帶^構50a停止,俾使輸送線A所輪送來之基板G被載置於 進出輸送線A之載置台5a上。在此,單元控制器1〇4 一旦接. 來自第2感測器1〇6之偵測信號’即使馬達53之羅動,亦即 帶機構50a之作動減速,若接收到來自第3感測器1〇7之偵^古 說,即使馬達53之驅動,亦即輸送帶機構50a之作動停止。^以二 此之控制,基板G被載置於載置台5a上。並且,單元控制器 19 1334846 若於此基板G被載置於載置台5a上之狀態下.,第1 測出輸送線A所輸送來之下一基板G,亦即輸送線d。105偵 下一基板G接近載置台5a至既定之距離,即使1以田^送來之 棚架部5上昇,使載置台5b〜5f進出輪送線^^構6使 游側之單元之故障解除,輸送線A修復為止, ^方向下 來之下一基板G後續之基板G逐次被載置於載置A ^ 所輸送 單元控制H 1G4與基板G被載置於載置台5&上^ 。在此 來自第2感測器106及第3感測器1〇7之_信號控41’、查亦,據 驅動,俾使基板G逐次被載置於載置台5b〜5 "'馬達53之 線A之載置台5a至第i感測器105之距離,,輸送 等之輸送速度或由昇降機構6進行之棚架部⑦ ==:=匕=^6之動作。 ^圖9係用以説明關於緩衝單元(BUF) 36 或一抗顯影處理裝置觸正常 之輸送帶機構* _ 線^;部f 置台&The two H transmission speeds are set, for example, to the carriages of the belt conveyors* to 50f, the transmission lines A, the loading stations 5a to the delivery line A, the IS$^, and the mounting stations 5a from the inlet and outlet lines A. 5f is transmitted to the base L of the conveying line A quickly, and the operation of the conveying line A can be shortened. The lifting and lowering of the scaffolding portion 5 by the motor, the movement by the sliding mechanism 73, and the operation of the conveyor belt mechanism gamma ~5Gf, i ===!a, 8b, respectively, are accepted by the steps from the steps Control _ 104 (control mechanism) control. From the A-type loading port of the self-inlet and take-out line, the type of the load, the direction of the delivery, or the direction of the transport, for example, the upstream side of the auxiliary conveyor belt mechanism 8a in the X direction, and the number of the substrate to be transported! Senser 105 (detection unit) === "upper Γ" end and downstream side, each side side line 1 ii: detector (10) and third sense 11 (10) respectively - base 1 = and the third ❹m tear, can be closed as the side of the memory of the memory controller 104, once in the buffer unit (BUF) 36 direction = unit, such as anti-butter coating unit (CT) 26, decompression Drying unit (10) = ^ heat treatment unit (HT) 28 or cooling unit (c〇L) 29 failure = the X direction of the conveyor line A of the early element (foot) 36 is lower (four), the stop rim belt structure 50a stops,基板The substrate G that is transported by the transport line A is placed on the mounting table 5a of the incoming and outgoing transport line A. Here, the unit controller 1〇4 is connected. Detection from the second sensor 1〇6 The signal 'even if the motor 53 is oscillated, that is, the action of the belt mechanism 50a is decelerated. If the sensor from the third sensor 1〇7 is received, even if the motor 53 is driven, the belt mechanism 50a is activated. By the control of this, the substrate G is placed on the mounting table 5a. Further, the unit controller 19 1334846 is placed on the mounting table 5a in this state, and the first measurement is performed. The substrate G is conveyed by the transport line A, that is, the transport line d. 105 detects that the substrate G approaches the mounting table 5a to a predetermined distance, and even if the scaffolding portion 5 sent by the field is raised, the mounting table is placed. 5b~5f in and out of the wheel feeding line ^^ structure 6 to cancel the failure of the unit on the side of the swimming side, the conveying line A is repaired, and the substrate G following the substrate G is placed on the unit where the A ^ is transported one by one. Control H 1G4 and substrate G are placed on the mounting table 5 & ^ here, from the second sensor 106 and the third sensor 1 〇 7 signal control 41 ', check also, according to the drive, make The substrate G is placed on the mounting table 5b to 5 " the distance from the mounting table 5a to the i-th sensor 105 of the line A of the motor 53, and the conveying speed of the conveyance or the scaffolding portion by the lifting mechanism 6 is performed. 7 ==:=匕=^6 action. ^ Figure 9 is used to explain the belt unit with normal buffer unit (BUF) 36 or one anti-development processing device* _ line ^; part f set &

之一部分(參照圖2)。 動钱置台%用作為輸送線A 接(顧)36之X方向下游側之單元一日發生故障, 下游側之輔助輸送帶機構七,首先似方向 之X方向上游側輸送線A所”為使自載置台5a 之送入口 71载置於載置a广輸^來之攻初之基板G〗通過框體7 圖8 (a))。X,在此,亦°可^=輸送帶機構50a停止(參照 A所輪送权最奴練送線 於基板罐繼纟- 20 1334846 旦偵測出輪送線A所輸送來之下—A杯 _ — =送帶機構50讀馬達53之連接即解 t例如载置台5b進出輸送線A而由昇^ ^ b 5f中之任-輸送帶機構50b連接馬達53使使棚架部5上昇, 置台5b上而使由馬達53進行^輸送H使^板&被載置於载 避而被保管。又,自因昇降機構6棚^置° 5^夂背自士輪送線八迴 來之基板被載置於進出輸送線:以二,送 =製=;心之作業時= C之故障解除,輸送線A所 ^ 游侧之 JJ置於载置台5c、5d...上而被保J、日 =,=、g4..·分別 置有洽與較輸送線A之緩衝單元(B_= °又,宜設 輪送之基板G之數量相同數f J置台)5aH=游側之可Part of it (see Figure 2). % of the money-paying unit is used as the conveyor line A. The unit on the downstream side of the X-direction (Gu) 36 is faulty in one day, and the auxiliary conveyor belt mechanism on the downstream side is seven. First, the direction-oriented X-direction upstream side conveyor line A is The feeding port 71 of the mounting table 5a is placed on the substrate G of the initial stage of the loading and unloading, and passes through the frame 7 (Fig. 8(a)). X, here, the conveyor belt mechanism 50a Stop (refer to A, the most slavish transmission line of the rotation right in the substrate canister - 20 1334846 Once the detection of the delivery line A is delivered - A cup _ - = the connection of the feeding mechanism 50 read motor 53 For example, if the mounting table 5b enters and exits the transport line A, the motor 53 is connected to any of the lift belt mechanisms 50b, so that the scaffold portion 5 is raised, and the motor 5 is transported by the motor 53 to make it H. The board & is placed in the escaping and is kept. Also, since the lifting mechanism 6 is placed in the shed, the substrate returned from the slinger line is placed on the in and out conveyor line: = system =; when the operation of the heart = C failure, the JJ of the transport line A is placed on the mounting table 5c, 5d... and is protected by J, day =, =, g4.. Negotiable and more transport line A Punching unit (the number of substrates G and B_ = °, should be established to send the same number of wheel mounting table f J) 5aH = the downstream side of the can

盒站】丄=冗元發生故障之際,自E 輸送=輸 =基板G全部被藉此方式可使 缓衝障-旦解除, 在此,接受來自步賴傻至輸送線Α。 使其以先行迴避之基板q、(3 l 裔104例如為 馬達53之移動、由馬德由滑動機構73進行之 輔助輪送帶機構8a、8b之_= 輪機構5Ga〜谢之驅動及Box Station】丄=When the redundant element fails, the E-transport=transmission=substrate G is all used to make the buffer barrier release, and here, it is accepted from the step-by-step to the conveyor line. The substrate q is circumvented first, and (3, the descent 104 is, for example, the movement of the motor 53, the _= wheel mechanism 5Ga to Xie, which is driven by the sliding mechanism 73 by the sliding mechanism 73, and

之基板G之導人再次開编構成/使自I站1向輸达線A 單元控制器104首先,使鍤貼鉍、"册u 機構6使棚架部5下降使載置a 5 構8b驅動,並以昇降 輸送帶機構50a驅動,使HI ^送線A,以馬達53使 從戟置σ 5a上之基板&自框體7之送出 21 ^334846 发輪送線A之下游側送出(參照圖9 U))。單元控卿l〇4 降機構6使棚架部5上再使載置# 5b進出輪送線八 使輪送等機構50b驅動,使載置# 5b上之基板&向輪逆 之控ί下游ί則送出(參照圖9 (b))。同樣地,以單元控制器刚 照i 9 Γ’ ^先订迴避之基板^、〜·.之順序向輸送線A送出(參 尸铭卞(C))。藉此方式,進行基板G之所謂先入先出,而可拙^丨 抗蝕劑塗布顯影處理裝置100中之基板G處 T抑制 ,載置於載置台5a' 5b..·上之基板Gi、G2=^ 使ίΐ,ί後,單元控制器1〇4以昇降機構6使棚架部5 ;降 送線Α,使輸送帶機構*驅動,使载C5a 冉-人用作為輸送線A之-部分(參照圖2)。 K置口 5a 送出制崎糊於緩衝單元(BUF)36之基板迴避及 緩衝單元(BUF) 36更宜設定為 部5之昇降開始之時點,至其後 進仃之棚架 A所輪送來之基板0被载置於進出輸送::牛土吉束’輸送線 任一者’因昇降機構6棚架部5再、。^口 5a〜5f中之 送線A之另外之載置台5a〜5f 牛’达出被载置於進出輸 間,較輸送線A之作業時間為短 之’^板G之時點之時 A輸送來之基板(3加以保管,_ g a 而可一面將輸送線 送線A送出。例如,緩衝單元(Bl^^保管之其他基板G朝輪 之故障之發生及解除為間歇性者, 方向下游側之單元 5c、5d.·.上分別載置有基板G3、G圖(a)所示,於載置台 前,第1感測器105偵測出輸送線f反f3 單元控制器1〇4使基板G3之向於样治之下—基板G時, 昇降機構6使棚架部5下降,使^ "^廷出動作暫時停止’以 使基板G/載置於載置台5a (袁置=進出輸送線A, i〇4以昇降機構6使棚架部5 ^ 1=;^,單元控, 迴避,並使載置台&進出輪送線A 線=置台二, 22 1334846 上之基板G3 (參照圖10 (c))。其後,由於第1 出輸送線A所輸送來之下一基板G/ (參照圖u 偵蜊 器104可以昇降機構6使棚架部5下降,使空 ^))’單元控制 ^送線A,使基板G/載置於載置台5b (參^"圖u 台5b進出 單元控制器104可向輸送線A送出G4、G5...,二―))。同樣地, ,,樣續之基板CV、(V...自輸送線A (c))。又,亦可由單元控制器104控制,以圖u S置台不昇降’而使輸送線A所輸送來之‘:Ϊ^Ϊ:ί ^説明關於構成緩衝單元(卿)36之 圖12係顯示輸送帶機構之變形例之平面圖 重要部位之剖面圖。又,關於與變形前相 ·糸頌不其 省略説明。 之邛位附以相同符號 =各載置台Sa〜Sf,為替代輸送帶機構s〇a〜5〇f (參 中rr可设置輸送帶機構5〇g。輸送帶機構5叱,且有位ϋ方a :央4之驅紐子部11G’於此驅動滾子部11Gg之/χ 兩, 邮叙有:無動力滾子部111、驅動滾子部=χ 2 ί 、驅動滾子部113、無動力滾子部114。 ;驅動滾子部110、112、113,設置有宁私错此 驅動滾子部112,滾於槿# 51h A Y ^兩牛。又,於 子部no之滾㈣i ί v 方向排列有2個。於驅動滾 有卡止部53b,並且於所有滾輪構件训之間掛設 旋轉,可,以馬達53使驅動滾子部110之滾輪構件51b 而構成。u過驅動力傳達帶54使所有滾輪構件51b 一齊旋轉 ^動力滾子部111、114分別包含有: 轉旋滾子115 ’抵接基板G ’輸送時伴隨滾輪構件51b之旋 支持部116,以可旋轉之方式支持無動力滾子ιΐ5。 23 1334846 热動力滾子115,以短小之超高分子聚乙稀材料向γ方向形 ^,使其與滚輪構件5ib之抵接部51d之γ方向位置對應而 二盘、排列。更具體而言’無動力滾子115被交錯狀配置, 於ϊίΐ Γ 抵接部51d相等之γ方向位置1個個配置, i 接部51d間之γ方向位置,向χ方向2個— 、、且排列。支持部116,包含有: =7 ’固定於棚架部5之沿γ方向相向之側壁;及 轉之Ϊ’透過軸環118固定於基材117,以可旋 锝之方式安裝有無動力滾子U5。 苴;,形成為向γ方向延伸之薄壁之L形m個使 =L轴承構件119a設於與滾輪構件训之^ 之門勤Ic-ino 〇位置’轴承構件119b設置於軸承構件119a η脉構件119a、119b分別形成為向χ方向 狀,其底面部由非圖示之螺轉扣具麻凸 ^=件119a'⑽分別於頂面 ==二面: 構件119a有1,於轴承構件11% =軸承 了式安丄 力滾子部m由於設置於x方向兩端部:動 拆卸或調整等即可卸裝。 而驅動力傳達▼ 54之 r、機構吨與上述之輸送帶機構5㈣目較,滚㈣你w (滾輪構件51a)之數量少,然而設 ^^輪^牛51b 115,支持無動力滾子115之支持 ς之热動力滾子 之轴承構件119a、11%構成,因㈣壁薄可及凸狀 因此由於於載置台5a〜5f使 ^:了確保優異之強度。 構5〇a時相較,可不使基板G之強使用輸送帶機 輕量化及低成本化。並且,㈣财置整體之 上述之輸送帶機構働〜财時相較“; 24 丄:):)4040 化,且塵埃等不易附著。 圖。;達53之連接部分之變形例之 緩衝滾子m具有通過馬達亦置緩衝滾子⑵。 .置。藉此方式,於弓遠Μ ^之碇轉軸之中心部之旋轉軸而設 ^ ^ 53a ;3 ^ 抵接於滚輪構件5=*合#,由於_滚子 衝擊,因此抑制了抵接端部而緩和了 抵接於滾輪構件51a、5主4之\生1者’若於緩衝滾子121 態下使馬達53驅動,55a之軸方向—端部之狀 轴可順暢地旋轉,卡人邱子121之旋轉,馬達53之旋轉 =咐料得容易。 心附 複數之一輪送線 型者時本ί:不3::‘PDC板’特別係基板為大 其他基板之緩衝。璃基板,其亦可廣泛適用於半導體晶片等 【圖式簡單說明】 布顯i處理統之概略平面圖,該抗蝕劑塗 處理後之純_之顯減理綱之職及曝光 依本發明之基板緩衝裝置之一實m緩衝早兀,該緩衝單元係 衝單元之側面方向之剖面圖。 衝單元之重要部位之側面方向之剖面圖。 Hi衝早兀之另外之側面方向之剖面圖。 圖係5又於緩衝單元之载置台之平面圖。 25 圖6係設於緩衝單 圖 之 圖7係顯示設於緩衝單载置台之平面圖。 21早疋之輪送帶機構與馬達之連接部分 圖8係用以説明關於 J 9係用以説明關於緩迴。 圖10係用以説明關於之基板运出動作之圖。 圖11係用以説明關於緩元之基板迴避及送出動作之圖 圖係顯示輸送帶機之基板迴避及送出動作之圖 圖】3係顯示輸送例之平面圖。 圖Μ係顯示輸送帶機 y列f重要部位之剖面圖。 、馬達之連接部分之變形例之圖。 【主要元件符號說明】 1〜匣盒站(處理部) 2〜處理站 4〜介面站(處理部) 5〜棚架部 '载置台 5a、5b、5c、5d、5e、5f 6〜昇降機構 7〜框體 8a、8b〜輔助輸送帶機構 9〜曝光裝置 10〜引導件 11〜輪送裝置(輪送單元)The leader of the substrate G is again reorganized/configured from the I station 1 to the delivery line A unit controller 104. First, the u 铋, " u u mechanism 6 lowers the scaffolding portion 5 to mount the a 5 structure 8b is driven and driven by the elevating conveyor mechanism 50a to cause the HI to feed the line A, and the motor 53 sends the substrate from the σ σ 5a to the downstream side of the frame 7 from the frame 7 Send (refer to Figure 9 U)). The unit control unit l〇4 lowering mechanism 6 causes the scaffolding unit 5 to place the #5b in and out of the rounding line 8 to drive the mechanism 50b such as the wheeling, so that the substrate & The downstream ί is sent (refer to Figure 9 (b)). Similarly, the unit controller is sent to the transport line A in the order of the substrate ^, ·, ^, which is the first to be evaded (see corp. (C)). In this way, the so-called first-in first-out of the substrate G is performed, and the substrate G at the substrate G in the resist coating and developing device 100 can be suppressed, and the substrate Gi placed on the mounting table 5a' 5b.. G2=^ After ίΐ, ί, the unit controller 1〇4 causes the scaffolding unit 5 to lift the wire Α by the lifting mechanism 6 to drive the belt mechanism* to drive the C5a 人-person as the conveying line A- Part (see Figure 2). K-mount 5a The substrate avoidance and buffer unit (BUF) 36 for feeding the buffer unit (BUF) 36 is preferably set to the point at which the lifting of the portion 5 is started, and is sent to the scaffolding A which is inserted later. The substrate 0 is placed on the in and out transport:: any of the cattle soil gauze 'conveyor line' is lifted by the scaffolding unit 5 of the lifting mechanism 6. ^The other mounting stations 5a to 5f of the feeding line A in the ports 5a to 5f are placed in the entrance and exit, and the working time of the conveying line A is shorter than the time when the board G is at the time of the delivery. The substrate (3) can be stored, and _ ga can be sent to the transport line A. For example, the buffer unit (Bl^^ other substrate G is stored in the wheel and the failure occurs intermittently, the downstream side The units 5c and 5d.·. are placed on the substrates G3 and G, respectively. As shown in (a), before the mounting table, the first sensor 105 detects the conveying line f and the f3 unit controller 1〇4. When the substrate G3 is oriented to the substrate G, the elevating mechanism 6 lowers the scaffold portion 5, and temporarily stops the operation of the substrate G to be placed on the mounting table 5a (Yuan set = In and out of the conveyor line A, i〇4 with the lifting mechanism 6 to make the scaffolding part 5 ^ 1 =; ^, unit control, avoidance, and the mounting table & in and out of the round line A line = set two, 22 1334846 on the substrate G3 (Refer to Fig. 10 (c)). Thereafter, the lower substrate G/ is transported by the first delivery line A. (Refer to Fig. 51, the detector 104 can lower the scaffold portion 5 by the elevating mechanism 6 to make it empty ^ ))' The unit control unit 2 sends the substrate A to the mounting table 5b (see Fig. 5, the inlet and outlet unit controller 104 can send G4, G5, ..., 2) to the conveying line A. Ground, ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, ': Ϊ^Ϊ: ί ^ Explain that Fig. 12 which constitutes the buffer unit (clear) 36 is a cross-sectional view showing an important part of the plan view of the modification of the conveyor belt mechanism. The same reference numeral = each of the mounting stations Sa to Sf is used instead of the conveyor belt mechanism s〇a to 5〇f (the conveyor belt mechanism 5〇g can be set in the reference rr. The conveyor belt mechanism 5叱, and Position a: The drive of the drive section 11G of the central 4 drive unit 11Gg/χ 2, the postal code: the unpowered roller section 111, the drive roller section = χ 2 ί, the drive roller section 113. The non-powered roller portion 114. The driving roller portion 110, 112, 113 is provided with a driving roller portion 112, which is rolled by the 槿# 51h AY ^ two cows. (4) i ί v The drive roller has a locking portion 53b and is rotatable between all the roller members. The motor 53 drives the roller member 51b of the roller unit 110. The u overdrive force is transmitted. The belt 54 rotates all of the roller members 51b. The power roller portions 111 and 114 respectively include: a rotary roller 115' abutting the substrate G' is conveyed in a rotatable manner with the screw support portion 116 of the roller member 51b. No power roller ιΐ5. 23 1334846 The thermodynamic roller 115 is formed in a γ-direction by a short ultra-high-molecular-weight polyethylene material so as to correspond to the γ-direction position of the abutting portion 51d of the roller member 5ib, and arranged in two disks. More specifically, the 'powerless rollers 115 are arranged in a staggered manner, and are arranged one by one in the γ direction position equal to the 抵ίΐ 抵 abutting portion 51d, and the γ direction position between the i joint portions 51d, and two directions in the χ direction, And arranged. The support portion 116 includes: =7 'fixed to the side wall of the scaffolding portion 5 facing in the γ direction; and the rotating Ϊ 'transmission collar 118 is fixed to the base material 117, and the non-powered roller is rotatably mounted U5. L;, L-shaped m formed as a thin wall extending in the γ direction, the =L bearing member 119a is provided in the door member Ic-ino 与 position of the roller member. The bearing member 119b is disposed on the bearing member 119a η pulse The members 119a and 119b are formed in a slanting direction, and the bottom surface portion is formed by a non-illustrated screw-spinning yoke 119a' (10) on the top surface == two sides: the member 119a has 1, the bearing member 11 % = bearing type ampere roller part m is installed at both ends of the x direction: it can be unloaded by disassembly or adjustment. The driving force conveys the vibration of the mechanism, and the number of the mechanism is less than that of the above-mentioned conveyor belt mechanism 5 (four), and the number of the roller (four) you w (the roller member 51a) is small, but the setting of the ^^ wheel 51b 115 supports the unpowered roller 115. The bearing members 119a and 11% of the heat-powered roller are supported, and since the wall is thin and convex, the mounting stages 5a to 5f ensure excellent strength. When the structure is 5〇a, it is possible to reduce the weight and cost of the conveyor belt machine without using the substrate G. In addition, (4) The above-mentioned conveyor belt mechanism of the whole financial position is shorter than "; 24 丄:): 4040, and dust and the like are not easily attached. Fig.; Buffer roller of a modified example of the connection portion of 53 m has a buffer roller (2) through the motor. In this way, the rotation axis of the center of the shaft of the bow is set to ^^53a; 3^ abuts the roller member 5=*合# Since the _roller impacts, the abutting end portion is suppressed and the abutment of the roller members 51a, 5, and the main member 4 is suppressed. If the motor 53 is driven in the state of the buffer roller 121, the axis direction of 55a - The axis of the end can be smoothly rotated, the rotation of the card holder Qiuzi 121, the rotation of the motor 53 = the material is easy to get. The heart is attached to one of the plural rounds of the line type. This is not 3:: 'PDC board' special The substrate is a buffer for a large other substrate. The glass substrate can also be widely applied to a semiconductor wafer, etc. [Simple description of the drawing] A schematic plan view of the processing system, and the pure _ reduction of the resist after the treatment The task and exposure of the substrate buffer device according to the present invention are buffered early, and the buffer unit is flushed. A cross-sectional view of the side of the element. A cross-sectional view of the side of the important part of the punching unit. A cross-sectional view of the other side of the punching machine. Figure 5 is a plan view of the mounting table of the buffer unit. Figure 7 is a plan view of the buffer single map. The connection between the belt feeding mechanism and the motor is shown in Fig. 8. The figure 8 is used to explain the J 9 system for explaining the slow return. Figure 10 is a diagram for explaining the substrate avoidance and delivery operation of the slow element. Figure 7 is a diagram showing the substrate avoidance and delivery operation of the conveyor. Fig. 平面图 is a cross-sectional view showing an important part of the conveyor belt unit y column f. A diagram showing a modification of the connection portion of the motor. [Description of main component symbols] 1 to 匣 box station (processing unit) 2 to Station 4 to interface station (processing unit) 5 to rack portion 'mounting table 5a, 5b, 5c, 5d, 5e, 5f 6 to lifting mechanism 7 to frame 8a, 8b to auxiliary conveyor mechanism 9 to exposure device 10~ Guide 11~rounding device unit)

Ua〜輸送臂 12〜載置台 $〜準分子UV照射單元(卜 22〜揉擦洗淨單元(SCR) 23〜預熱單元(PH) 24〜黏附單元(AD) 26 1334846 25〜冷卻單元(COL) 26〜抗敍劑塗布單元(CT)(處理部) 27〜減壓乾燥單元(DP)(處理部) . 28、31〜加熱處理單元(HT)(處理部) 29、32〜冷卻單元(COL)(處理部) ' 30〜顯影單元(DEV)(處理部) 35〜檢查裝置(IP)(檢查單元)(處理部) 36、37、38〜緩衝單元(BUF)(基板緩衝裝置) 43〜輸送臂 44〜旋轉台(RS) • 50a、50b、50c、50d、50e、50f、50g〜輸送帶機構 51a、51b〜滾輪構件 51c〜小口徑之旋轉軸 51d〜大口徑之抵接部 52〜轴承 53〜馬達(驅動源) 53a〜卡合部 53b〜^^止部 54〜驅動力傳達帶 φ 55a〜主動皮帶輪 55b〜從動皮帶輪 55c〜輸送帶 56〜轴承 • 57〜分隔板 61〜汽缸機構 62〜滾珠螺桿機構 71〜送入口 72〜送出口 73〜滑動機構 27 1334846 90〜外部裝置區塊 100〜抗蝕劑塗布顯影處理裝置(基板處理裝置) 101〜步驟控制器 102〜使用者介面 103〜記憶部 104〜單元控制器(控制機構) 105〜第1感測器(偵測部) 106〜第2感測器 107〜第3感測器 110、 112、113〜驅動滚子部 111、 114〜無動力滾子部 115〜無動力滾子 116〜支持部 117〜基材 118〜轴環 119a、119b〜軸承構件 120〜開口 121〜緩衝滚子 A、B〜輸送線 G (Gi、G2—G/、G2 …)〜基板 C〜匿盒 EE〜周邊曝光裝置 TITLER〜印字曝光機 28Ua~transport arm 12~mounting table~~excimer UV irradiation unit (Bu 22~ scrubbing unit (SCR) 23~preheating unit (PH) 24~adhesive unit (AD) 26 1334846 25~cooling unit (COL 26 to anti-small agent coating unit (CT) (processing unit) 27 to decompression drying unit (DP) (processing unit) 28, 31 to heat treatment unit (HT) (processing unit) 29, 32 to cooling unit ( COL) (processing unit) '30 to developing unit (DEV) (processing unit) 35 to inspection unit (IP) (inspection unit) (processing unit) 36, 37, 38 to buffer unit (BUF) (substrate buffer unit) 43 〜Transport arm 44 to rotary table (RS) 50a, 50b, 50c, 50d, 50e, 50f, 50g to conveyor mechanism 51a, 51b to roller member 51c to small-diameter rotary shaft 51d to large-diameter abutment portion 52 - Bearing 53 - Motor (drive source) 53a - Engagement portion 53b - ^^ Stop portion 54 - Driving force transmission belt φ 55a - Drive pulley 55b - Drive pulley 55c - Conveyor belt 56 - Bearing - 57 - Separation plate 61 ~Cylinder mechanism 62~Ball screw mechanism 71~Feeding port 72~Sending port 73~Sliding mechanism 27 1334846 90~External device Block 100 to resist coating development processing device (substrate processing device) 101 to step controller 102 to user interface 103 to memory unit 104 to unit controller (control mechanism) 105 to first sensor (detection unit) 106 to second sensor 107 to third sensor 110, 112, 113 to drive roller portion 111, 114 to unpowered roller portion 115 to non-power roller 116 to support portion 117 to base material 118 to shaft Rings 119a, 119b - bearing member 120 - opening 121 - buffer roller A, B - conveying line G (Gi, G2 - G /, G2 ...) - substrate C - box EE - peripheral exposure device TITLER - printing exposure machine 28

Claims (1)

十、申請專利範圍: 1·—種基板緩衝裝詈,η丨、,± x 自輸送線迴避,其特徵朝輸达線單方向輸送之基板暫時 具備有:/…在於: 棚架部,設置成可昇卩备,目士 、 且可^經該輸送線所輸送之基段2可進*該輸送線 者進出該輸送線;降’而令該複數之載置台中之任- 用之輪送帶機構Ugj⑦,線之際’沿輸送方向輸送基板 、於使基板自該Si:;線之-部分、: 载置於該複數載置台中之 *將由5亥輸送線輸送來之基板 ,該昇降機構使該姉^降置台’於此狀態 輪送線迴避。 .k々該基板與其載置台一齊自該 2. _ i 具備有 棚架部 種基板緩衝裝置,用以使朝於详綠€ t A 輪送線_,其特徵在J朝輸达線早方向輸送之基板暫時 木部,設置成可昇降,且 且可所輪送之基段之可進出該輸送線 者進出線使r架料降,岭賴數之載置台中之任- 降;r_,物伽_機軸行找棚架部之昇 該各載置台具有於進出該耠 於使基板自該輸送線迴避 载置於該複數载置台中之進將由讀送線輪送來之基板 藉由該昇降機構使該棚架部昇降的該载置台,於此狀態 輸送線迴避; 1计化,令該基板與其 用之輸送帶機構’可用作為該“送線^部=輪送方向輸送基板 輸送線的該载置 载置台一齊自該 輪播出於該輸送線之載置台上錢有基板之狀態下,該控制 制t在載Ϊ台與由該輪送線輸送來之下—基板之間成既定 離%,藉由該昇降機構使該棚架部昇降。 3. 如申請專利範圍第2項之基板緩衝裝置,豆中. 側既設出該輸送線之載置台朝輸送方向上游 概疋距離之位置,用以_該輸送線所輸送之基板, 進行該偵測部之偵測信號,控制由該昇降機構 4. 如申請專利範圍第2或3項之基板緩衝裝置, 该控制機構,控制由該昇降機構進令^ ^ ^該輸送線迴避之基板再次進出,俾 基板開始依序進出。 铷、踝之丨不,由先仃迴避之 5. 如申請專利範圍第1至3項中任—項&美& @ t # 將由該昇降機構進行之該棚^之昇=^=置’其中: 該棚架部之昇降結束,由哕鈐详:二:降之開始日穩,至其後 輸送缘之,茲+ 輸線輸运來之基板被載置於進出今 線之载置口,猎由該昇降機構該 此選出4 出該輪送線之另外之載置台基伴 =,载置於進 6止之該輸送線之之時點為 輔助ί 第5項之基域驗置,射更包含. 稀助輸送▼機構,用作為該輸 ,匕3. ΐ?輸ί線ΐί置台之輪送方向上游側及下游:而3鄰接於進 f送速度為快之基板輸送速度’具有較 •如申明專利範圍第1至3項中任—項之其柘铨 該各載置台之該輸送帶舰之基板緩衝裝置,其+: 載置台進出該輸送線之際係:峰動源驅動,且該 該各載置台之該輪逆册㈣=項之基板緩衝裝置,与. 之任-者。 機構輕子輸送方式及帶輪送方式令中 9.如申睛專利範圍第igqxsdw 至3項中任一項之基板緩衝!置,其中: 1334846 -部ί取上段之載置纟,於平時進出該輪送線而作為該 輪送線 之 10 專利範圍苐9項之基板緩衝裝置,其中: 該,上段之載置台之該輪送帶機構係為滾輪送 又以外之各載置台之該輸送帶機構 工 π.=緩衝方法,使用-基板緩衝裝置,4板 該最 緩衝裝置 ^ 又置成可昇降’具有上下複段之可 ,基板之輸送線且可載置經該輸送線所輸送之基板^載^向 昇降機構,用以使該棚架部昇降,令 -者進出該輸送線;且 7細數之載置台中之任 遠各載置台具有於進出該輸送線之際 L Ϊ基法,肋使由該輸送線輪送之基板暫時自 之輸送帶機構,可用作為該輸送線之一部分^别、σ 基板 輸送 線迴避’其特徵為 使由該輸送線輸送來之基板載置於該複數之 Γ亥ϊί'ίϊϊΐ台,於此狀態藉由該昇降機構使該:架部昇 降,使其基板與其載置台一齊自該輸送線迴避, 幵 基板迴避時之㈣昇關魏行之該她敎 送線所輸送來之下-基板之間航定之轉之際進彳^心、。亥輸 12. —種基板處理裝置,'包含·· τ 輸送線,單方向輸送基板; 處理部,對該輸送線所輸送之基板施以既定之處理丨及 緩衝裝置’設置練域理部靠近該輪送線之輸送方向上游 ’於該處理部發生故障之際,使該輸送線所輸送之基板 暫^自輸送線迴避; 其特徵在於: 31 該緩衝裝置,具備有: 棚架部,係設晉A、7 θ 線且可載置雜魏下複數段之可進出該輸送 曰吹协址所輪运之基板之載置台; 者進送線使J棚架部昇降’以令該複數之載置台中之任- ίf由該昇降機構控制該棚架部之昇降’·且 之輸Ϊ帶機構輸送線之際,沿輸送方向輸送基板 J 作為該輸送線之-部分; 該複ϊϊ載置使該輸送線所輸送來之基板載置於 使該棚架部昇降,令者,於此狀態藉由該昇降機構 該㈣I,甘基與其載置台一齊自該輸送線迴避; 態,與載置於進出該輸送線之載置台之狀 離之際卞制以所輸送來之下—基板之間成既定之距 α二種昇降機構使該棚架部昇降。 式,其销ΪΞ之記憶媒體,記憶有於電腦上動作之控制程 申靖亥控f’j程式時’使電腦控制處理果置,俾施r 申明專利範圍第11項之基板緩衝方法表£俾施仃把载於 十一 圖式:X. The scope of application for patents: 1·--------------------------------------------------------------- The base section 2 that can be transported by the conveyor line can enter and exit the conveyor line; the lower part of the loading platform can be used. The tape feeding mechanism Ugj7, at the time of the line, 'transports the substrate in the conveying direction, and causes the substrate to be from the Si:; the portion of the line: the substrate placed on the plurality of mounting tables* to be conveyed by the 5 liter conveying line, The lifting mechanism causes the 降^down table to evade in this state. .k々 The substrate is aligned with the mounting table from the 2. _ i has a scaffolding type substrate buffering device for making the green line toward the detailed line _, which is characterized by the early direction of the J-direction transmission line The temporary wood portion of the substrate to be transported is arranged to be movable up and down, and the base portion of the wheel that can be transported can enter and exit the line of the conveyor line to reduce the frame material, and the column of the column is lowered and lowered; r_, The gantry-axis axis is raised to the scaffolding portion, and each of the mounting stages has a substrate for feeding in and out of the plurality of mounting stages from the conveying line, and the substrate to be fed by the reading reel is The lifting mechanism causes the mounting table to be lifted and lowered, and the conveying line is evaded in this state; (1), the substrate and the conveyor belt mechanism used therein can be used as the "feeding wire portion = conveying direction conveying substrate conveying line" The mounting stage is in a state in which the substrate is placed on the mounting table of the conveying line, and the control system is formed between the carrier and the substrate. If the distance is from %, the scaffolding unit is lifted and lowered by the lifting mechanism. In the substrate buffering device of the second item, the side of the bean is disposed at a position upstream of the loading platform of the conveying line toward the upstream direction of the conveying direction, and is used for detecting the detecting portion of the substrate conveyed by the conveying line. The signal is controlled by the lifting mechanism 4. The substrate buffering device according to claim 2 or 3, the control mechanism controls the substrate to be retracted by the lifting mechanism, and the substrate is started to be re-entered. In order to enter and exit. 铷 踝 踝 , , , 5 5 5 5 5 5 5 5 5 5 5 5 5 5 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如^=Set' where: The lifting and lowering of the scaffolding section ends, due to the details: 2: the beginning of the descent is stable, and after the transfer edge, the substrate transported by the z + transmission line is placed on the line. The loading port is hunted by the lifting mechanism, and the other mounting base of the rounding line is selected to be 4, and the time at which the conveying line is placed at the end of the feeding line is the base of the auxiliary item ί Inspection, shooting more included. Rare assisted transport ▼ mechanism, used as the loss, 匕 3. ΐ? lose ΐ 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置 置The substrate buffering device of the conveyor belt is placed on the +: when the loading platform enters and exits the conveyor line: the peak source is driven, and the wheel of the mounting table is reversed (4) = the substrate buffering device of the item. In the case of the organization's lepton transport method and the belt transport method, 9. For the substrate cushioning of any of the igqxsdw to the third of the scope of the application of the patent scope, 1334846 - the section of the upper section is placed基板, the substrate buffering device of the ninth patent scope of the wheel feeding line which is in and out of the wheel, wherein: the wheel feeding mechanism of the upper stage is the roller feeding and the other loading The conveyor belt mechanism is provided with a π.=buffering method, using a substrate buffering device, and the four-plate cushioning device is further configured to be movable up and down to have a plurality of upper and lower sections, and the substrate is transported by the transport line. Substrate conveyed by the wire For lifting and lowering the scaffolding portion, so as to enter and exit the conveying line; and any of the seven rows of the mounting table has a L-base method for entering and leaving the conveying line, and the rib is made by the conveying line The substrate to be transferred temporarily from the conveyor belt mechanism can be used as part of the conveyor line, and the σ substrate conveying line is evaded, which is characterized in that the substrate conveyed by the conveying line is placed on the plurality of substrates. In this state, the lifting mechanism causes the frame portion to be raised and lowered, so that the substrate and the mounting table are escaping from the conveying line, and the substrate is evaded (4) when the lifting line is conveyed by the line of the wire. When the navigation between the substrates is turned, the heart is moving. 12. The substrate processing device, 'contains ·· τ transport line, transports the substrate in one direction; the processing unit applies a predetermined process to the substrate transported by the transport line and the buffer device is set to close to the processing area In the upstream of the transport direction of the transport line, when the processing unit fails, the substrate transported by the transport line is temporarily evaded from the transport line; and the buffer device includes: a scaffold portion Set the Jin A, 7 θ line and can place the sub-multiple sub-section of the sub-segment of the board that can be transported into and out of the substrate transported by the conveyor-blowing association; the feeder line moves the J scaffolding section to make the plural When the lifting platform controls the lifting and lowering of the scaffolding portion by the lifting mechanism, the substrate J is transported in the conveying direction as a part of the conveying line; The substrate conveyed by the transport line is placed on the scaffolding portion to be lifted and lowered. In this state, the lifting mechanism (4) I, the Ganji and the mounting table are escaping from the transport line; the state, and the loading On the loading and unloading platform of the conveyor line Bian-like manufactured from occasion to be delivered under - the predetermined distance between the substrate into two kinds of α scaffolding lifting mechanism so that the lift portion. The memory medium of the sales, the memory is controlled by the computer on the operation of the process of Shen Shenhai control f'j program, so that the computer control processing fruit, the implementation of the scope of the patent scope of the 11th substrate buffer method table仃 put in the eleventh:
TW096105543A 2006-03-14 2007-02-14 Substrate buffer device, method of buffering substrate, substrate processing apparatus and computer readable storage medium TWI334846B (en)

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