CN105097605B - Base plate processing system and its processing method - Google Patents

Base plate processing system and its processing method Download PDF

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Publication number
CN105097605B
CN105097605B CN201410195591.2A CN201410195591A CN105097605B CN 105097605 B CN105097605 B CN 105097605B CN 201410195591 A CN201410195591 A CN 201410195591A CN 105097605 B CN105097605 B CN 105097605B
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China
Prior art keywords
substrate
ontology
supply unit
support
base plate
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CN201410195591.2A
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CN105097605A (en
Inventor
王士敏
陈雄达
吕成凤
李新华
李绍宗
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Chongqing Lai Bao Science And Technology Ltd
Shenzhen Laibao Hi Tech Co Ltd
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Chongqing Lai Bao Science And Technology Ltd
Shenzhen Laibao Hi Tech Co Ltd
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Priority to CN201410195591.2A priority Critical patent/CN105097605B/en
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Abstract

The present invention relates to technical field of flat panel display more particularly to a kind of base plate processing systems.It includes at least the supply unit and an inserted sheet unit being disposed adjacent, the inserted sheet unit includes an ontology and an insert mechanism with accommodating space, the insert mechanism is between the ontology and supply unit, the ontology has the first side towards the supply unit, the supply unit is used to load the substrate and the substrate is delivered to the first side of the ontology, the substrate is placed in the accommodating space of the ontology by the insert mechanism for grabbing the substrate from the supply unit.Moreover, it relates to a kind of substrate processing method using same.

Description

Base plate processing system and its processing method
Technical field
The present invention relates to technical field of flat panel display more particularly to a kind of base plate processing system and its processing methods.
Background technique
The main trend of today's society is had become using capacitive touch screen on mobile phone, capacitive touch screen is as a kind of Novel human-computer interaction interface is gradually widely used on various digital information systems, from small sized product for example mobile phone, PDA, Digital product, e-Book arrive medium-sized product such as automatic navigator, game machine, household electrical appliance, industry control instrument, then arrive large product As POS system, common query and self-aid system, portable computer, Medical Instruments and in TV news red-letter day it is common touch PDP is upper it can be seen that capacitance touch screen products.Therefore, capacitive touch screen has extensive market prospects.
Currently, capacitive touch screen to lightening development, generally include glass substrate (thickness is about 0.6mm) and The electrode being formed thereon.Before electrode formation, need that first large-size glass substrate is carried in inserting frame, then by inserted sheet Frame is put into annealing furnace, tempering is carried out to glass substrate, to guarantee its intensity.During being carried to inserting frame, due to glass Very thin substrate, dead-soft, it is difficult to which rapid, orderly carry, and it is easy to be collided with, be crushed or scratched in the process.Cause This, the requirement to human and material resources is high, is unfavorable for the raising of the yields and production efficiency of glass substrate.
Summary of the invention
In view of this, the present invention provides a kind of processing substrate system for being conducive to improve substrate yields and production efficiency System.
In addition, there is a need to provide a kind of production method of aforesaid substrate processing system.
The base plate processing system provided by the invention includes at least the supply unit and an inserted sheet list being disposed adjacent Member, the inserted sheet unit include an ontology and an insert mechanism with accommodating space, and the insert mechanism is located at the ontology Between supply unit, the ontology has the first side towards the supply unit, and the supply unit is described for loading Substrate and the first side that the substrate is delivered to the ontology, the insert mechanism from the supply unit for grabbing institute Substrate is stated, and the substrate is placed in the accommodating space of the ontology.
In the base plate processing system provided by the invention, the supply unit is including a transmission device and is located at the biography One second turnover device of dynamic device side, the transmission device is for loading and conveying the substrate, the second overturning dress It sets for overturning the substrate to a predetermined angle.
In the base plate processing system provided by the invention, the supply unit further includes another positioned at the transmission device First turnover device of side, first turnover device overturn the substrate to the transmission for receiving the substrate On device.
In the base plate processing system provided by the invention, first turnover device include a bottom plate, be fixed on it is described A first support on bottom plate and the second support connecting with the first support, the first support have far from the bottom The first end of plate, the second support are flexibly connected in the first end with the first support, and the second support is for holding It carries the substrate and overturns the substrate to the transmission device.
In the base plate processing system provided by the invention, the substrate has one first length, institute in transmission direction State transmission device has the second length in transmission direction, and second length is at least 1.5 times of first length.
In the base plate processing system provided by the invention, the second support and the substrate have similar shape, The second support and the contact area of the substrate at least account for the 3/4 of the substrate gross area.
In the base plate processing system provided by the invention, the transmission device at least has one along the edge of direction of transfer Oriented module, the oriented module positioned at described transmission device the same side have between the oriented module on same straight line There is identical spacing.
In the base plate processing system provided by the invention, the insert mechanism includes an adsorption module, the absorption mould Block is used to adsorb the substrate being located on second turnover device, and the substrate is moved to the accommodating space of the ontology It is interior.
In the base plate processing system provided by the invention, the ontology has one the adjacent to the side of the supply unit The contact surface of four surfaces, the transmission device and the substrate is third surface, and the 4th surface and the third surface are hung down Directly.
In the base plate processing system provided by the invention, the adsorption module connects with the oriented module and the substrate The surface of touching is respectively provided with a buffer layer, and the coefficient of elasticity for making the material of the buffer layer is all larger than the adsorption module, leads The coefficient of elasticity of the surfacing contacted to module with the substrate.
A kind of substrate processing method using same includes at least following steps:
One substrate and a base plate processing system be provided, the base plate processing system include the supply unit being disposed adjacent and One inserted sheet unit, the inserted sheet unit include an ontology with accommodating space and the insert mechanism connecting with the ontology; The supply unit loads the substrate and the substrate is delivered near ontology;The insert mechanism places the substrate In in the accommodating space of the ontology.
In described base plate processing system provided by the invention and preparation method thereof, since the base plate processing system at least wraps The supply unit being disposed adjacent and an inserted sheet unit are included, it is complete using the base plate processing system in substrate processing process Pipelining, conveying including substrate and inserted sheet process replace manual handling and inserted sheet, can be brought to avoid by manpower Substrate collide with, be crushed or scratch, be conducive to the yields and production efficiency that improve substrate.
Detailed description of the invention
Present invention will be further explained below with reference to the attached drawings and examples, in attached drawing:
Fig. 1 is the schematic side view of the base plate processing system of a better embodiment provided by the invention;
Fig. 2 is a schematic front view of base plate processing system shown in Fig. 1;
Fig. 3 is the one side schematic view of the first turnover device in base plate processing system shown in FIG. 1;
Fig. 4 is the substrate processing method using same of a better embodiment provided by the invention.
Specific embodiment
Base plate processing system provided to illustrate the invention and preparation method thereof is said below in conjunction with Figure of description and text It is bright to be described in detail.
Fig. 1 and Fig. 2 are please referred to, is a side view of the base plate processing system 100 of a better embodiment provided by the invention Schematic diagram and a schematic front view.The base plate processing system 100 includes the supply unit 101 and an inserted sheet being disposed adjacent Unit 102.The inserted sheet unit 102 includes an ontology 112 and an insert mechanism 122 with accommodating space, the plug-in sheet machine For structure 122 between the ontology 112 and supply unit 101, the ontology 112 has the towards the supply unit 101 Side, the supply unit 101 is used to load substrate 10 and is delivered to substrate 10 first side of the ontology 112, described to insert The substrate 10 is placed in the receipts of the ontology 112 for grabbing the substrate from the supply unit by piece mechanism 122 Hold in space.In present embodiment, the substrate 10 is glass substrate.
The supply unit 101 includes a transmission device 121, one first turnover device 111 and one second turnover device 131, first turnover device 111 and the second turnover device 131 are located at the two sides of the transmission device 121.Described One turnover device 111 is overturn for receiving the substrate 10, and by the substrate 10 to the transmission device 121, the biography Dynamic device 121 is used for for loading and conveying the substrate 10, second turnover device 131 by the substrate 10 overturning to one Predetermined angle, in present embodiment, the predetermined angle is 90 °, in other embodiments, the predetermined angle can for 0 °- Between 90 °.
First turnover device 111 includes a bottom plate 111a, the first support being fixed on the bottom plate 111a 111b and the second support 111c, the first support 111b connecting with the first support 111b have the separate bottom plate The first end 111ba, the second support 111c of 111a first support 111b activity described in the first end and 111ba connects It connects, the second support 111c is for carrying the substrate 10 and overturning the substrate 10 to the transmission device 121.
As shown in figure 3, its one side schematic view for the first turnover device in base plate processing system shown in FIG. 1, described There is substrate 10 first surface 10a, the second support 111c to have the second surface contacted with the substrate first surface 111ca, the area of the first surface 10a are at least the 3/4 of the second surface 111ca area, the first surface 10a with The second surface 111ca is of similar shape.The first surface 10a and the second surface 111ca size Set-up mode, which is conducive to the substrate 10, smoothly to be overturn in the second support.
The substrate 10 has one first length in transmission direction 11, and the transmission device 121 is in transmission direction 11 With the second length, second length is at least 1.5 times of first length.The length of the transmission device 121 is arranged Be conducive to the orderly transmission of the substrate 10 transmitted from first turnover device 131 successively, avoid second length Caused 10 transmit process of the substrate is staggeredly or chaotic when too short.
The transmission device 121 at least has an oriented module 141 along the edge of the direction of transfer 11, is located at the biography Send the oriented module 141 of 121 the same side of device on same straight line, having the same between the oriented module 141 Away from.The transmission device 121 further includes driving wheel and driving belt (not shown), and the driving wheel and driving belt drive The substrate 10 is moved along transmission direction 11.
The insert mechanism 122 includes at least an adsorption module 1221, and the adsorption module 122a is located at institute for adsorbing The substrate 10 on the second turnover device 131 is stated, and the substrate 10 is moved in the accommodating space of the ontology 112. The ontology 112 has one the 4th surface 112a, the transmission device 121 and the substrate adjacent to the side of the supply unit 10 contact surface is that the 4th surface 112a described in the 121a of third surface is vertical with the third surface 121a,.The adsorption module 122a is respectively provided with a buffer layer (not shown) with the surface that the oriented module 141 is contacted with the substrate, makes institute The coefficient of elasticity for stating the material of buffer layer is all larger than what the adsorption module 122a was contacted with oriented module 141 with the substrate 10 The coefficient of elasticity of surfacing.
In present embodiment, when the substrate 10 is placed in first turnover device 131, first turnover device 131 overturn the substrate 10 to horizontal position, and the substrate 10 is contacted with the transmission device 121, the transmission device The substrate 10 is sent to second turnover device 131 by 121, and second turnover device 131 overturns the substrate 10 Near to the ontology 112;The absorption of adsorption module 1221 is located at the substrate 10 on second turnover device 131, The substrate 10 is vertically raised the surface that the ontology 112 is then moved horizontally to the upper surface of the ontology 112, The last substrate 10 with the adsorption module 1221 the accommodating space for being vertically lowered and being placed on the ontology 112 It is interior.
In present embodiment, since the base plate processing system includes at least the supply unit and an inserted sheet that are disposed adjacent Unit, using the complete pipelining of the base plate processing system, conveying including substrate and is inserted in substrate processing process Piece process replaces manual handling and inserted sheet, can colliding with, be crushed or scratching to avoid the substrate as brought by manpower, be conducive to mention The yields and production efficiency of high substrate.
As shown in figure 4, its processing method flow diagram for base plate processing system described in Fig. 1.
The substrate processing method using same includes at least following steps:
Step S01: providing a substrate and a base plate processing system, the base plate processing system include be disposed adjacent it is one defeated Send unit and an inserted sheet unit, the inserted sheet unit includes an ontology with accommodating space and connect with the ontology one slotting Piece mechanism.
Step S02: the supply unit loads the substrate and the substrate is delivered near the ontology.
In present embodiment, the supply unit includes a transmission device, one first turnover device and one second overturning dress It sets, first turnover device and the second turnover device are located at the two sides of the transmission device.First turnover device It overturns for receiving the substrate, and by the substrate to the transmission device, the transmission device is for loading and conveying The substrate, second turnover device is for overturning the substrate to a predetermined angle.First turnover device includes One bottom plate, the first support being fixed on the bottom plate and the second support being connect with the first support, described first Bracket has the first end far from the bottom plate, and the second support is flexibly connected in the first end with the first support, The second support is for carrying the substrate and overturning the substrate to the transmission device.The substrate has first Surface, the second support have the second surface contacted with the substrate first surface, and the area of the first surface is at least It is the 3/4 of the second surface area, the first surface is of similar shape with the second surface.The first surface Being conducive to the substrate with the set-up mode of the second surface size can smoothly overturn in the second support.
When the substrate is placed in first turnover device, first turnover device overturns the substrate to water Prosposition is set, and the substrate is contacted with the transmission device, and the substrate is sent to second overturning by the transmission device Device, second turnover device overturn the substrate to the ontology.
Step S03: the substrate is placed in the accommodating space of the ontology by the insert mechanism.
The insert mechanism includes at least an adsorption module, and the adsorption module is located at the second overturning dress for adsorbing The substrate set, and the substrate is moved in the accommodating space of the ontology.The ontology is single adjacent to the conveying The side of member has one the 4th surface, and the contact surface of the transmission device and the substrate is third surface, the 4th surface It is vertical with the third surface.
Adsorption module absorption is located at the substrate on second turnover device, the substrate be vertically raised to Then the upper surface of the ontology is moved horizontally to the surface of the ontology, the last substrate is with the adsorption module Be vertically lowered and be placed in the accommodating space of the ontology.
The above are base plate processing system provided by the invention and its better embodiments of processing method, can not be interpreted as Limitation to rights protection scope of the present invention, those skilled in the art should know, in the premise for not departing from present inventive concept Under, a variety of improvement or replacement can be also done, all equal improvement or replacement all should be in the scope of the present invention, i.e., The scope of the present invention should be subject to the claims.

Claims (6)

1. a kind of base plate processing system includes at least the supply unit and an inserted sheet unit being disposed adjacent, the inserted sheet list Member includes an ontology and an insert mechanism with accommodating space, the insert mechanism be located at the ontology and supply unit it Between, the ontology has the first side towards the supply unit, and the supply unit is used to load the substrate and will be described Substrate is delivered to the first side of the ontology, and the insert mechanism is used to grab the substrate from the supply unit, and will The substrate is placed in the accommodating space of the ontology;
It is characterized by: the supply unit includes a transmission device and the first overturning dress positioned at the transmission device other side It sets, first turnover device overturns the substrate to the transmission device for receiving the substrate;
First turnover device include a bottom plate, the first support being fixed on the bottom plate and with the first support The second support of connection, the first support have the first end far from the bottom plate, and the second support is in the first end It is flexibly connected with the first support, the second support is for carrying the substrate and overturning the substrate to the transmission On device.
2. base plate processing system as described in claim 1, it is characterised in that: the substrate have first surface, described second Bracket has the second surface contacted with the substrate first surface, and the area of the first surface is at least the second surface The 3/4 of area.
3. base plate processing system as claimed in claim 2, it is characterised in that: the transmission device along the edge of transmission direction extremely There is an oriented module less, the oriented module positioned at described transmission device the same side is on same straight line, the guiding Intermodule spacing having the same.
4. base plate processing system as claimed in claim 3, it is characterised in that: the supply unit further includes one positioned at the biography One second turnover device of dynamic device side, the insert mechanism include an adsorption module, and the adsorption module is used for adsorption potential Substrate on second turnover device, and the substrate is moved in the accommodating space of the ontology, the ontology is adjacent The side of the nearly supply unit has one the 4th surface, and the contact surface of the transmission device and the substrate is third surface, 4th surface is vertical with the third surface.
5. base plate processing system as claimed in claim 4, which is characterized in that the adsorption module and the oriented module and institute The surface for stating substrate contact is respectively provided with a buffer layer, and the coefficient of elasticity for making the material of the buffer layer is all larger than the absorption The coefficient of elasticity for the surfacing that module, oriented module are contacted with the substrate.
6. a kind of substrate processing method using same includes at least following steps:
A substrate and a base plate processing system are provided, the base plate processing system includes that the supply unit being disposed adjacent and one insert Blade unit, the inserted sheet unit include an ontology and an insert mechanism with accommodating space, and the insert mechanism is located at described Between ontology and supply unit, the ontology has the first side towards the supply unit;
The supply unit loads the substrate and the substrate is delivered to the first side of ontology;
The insert mechanism grabs the substrate from the supply unit, and the substrate is placed in the receipts of the ontology Hold in space;
It is characterized by: the supply unit further includes a transmission device and the first overturning positioned at the transmission device other side Device, first turnover device overturn the substrate to the transmission device for receiving the substrate;
First turnover device include a bottom plate, the first support being fixed on the bottom plate and with the first support The second support of connection, the first support have the first end far from the bottom plate, and the second support is in the first end It is flexibly connected with the first support, the second support is for carrying the substrate and overturning the substrate to the transmission On device.
CN201410195591.2A 2014-05-09 2014-05-09 Base plate processing system and its processing method Active CN105097605B (en)

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CN105097605B true CN105097605B (en) 2019-07-02

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Publication number Priority date Publication date Assignee Title
CN107546166A (en) * 2017-09-29 2018-01-05 四川英发太阳能科技有限公司 Etching automation blanking guider

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1787954A (en) * 2003-06-19 2006-06-14 日商乐华股份有限公司 Thin plate-supporting body
CN101889339A (en) * 2007-12-11 2010-11-17 株式会社爱发科 Substrate transfer apparatus, substrate transfer method and vacuum processing apparatus
CN202880458U (en) * 2012-11-09 2013-04-17 天津英利新能源有限公司 Solar cell collecting device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4884039B2 (en) * 2006-03-14 2012-02-22 東京エレクトロン株式会社 Substrate buffer apparatus, substrate buffering method, substrate processing apparatus, control program, and computer-readable storage medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1787954A (en) * 2003-06-19 2006-06-14 日商乐华股份有限公司 Thin plate-supporting body
CN101889339A (en) * 2007-12-11 2010-11-17 株式会社爱发科 Substrate transfer apparatus, substrate transfer method and vacuum processing apparatus
CN202880458U (en) * 2012-11-09 2013-04-17 天津英利新能源有限公司 Solar cell collecting device

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