201228914 六、發明說明： 【發明所屬之技術領域】 更詳細而言係 的基板傳送至滾輪輸i/機輪輪达機上傳送至搬運臂，或將搬運臂上 【先刖技術】 適宜間隔具有轴方向上 球狀滾輪62的多數^軸55間配紗前端具備 紅或者電動機與齒輪之組合所藉由例如氣壓 降。再者形成為：抵接於滾輪=====而可升 之叉部101 =送至農置依據以下程序，藉由搬運臂 交時，從搬運_的:游3搬^^° 1 ’搬運臂與搬運方向正 ιοί傳送至處理單元。f輪運来的基板G利用搬運臂之又部 基板；如圖·所示， 號’=過既定時間後鷄滚輪56停止而基的控制信 其:人’如轉)所示，升降桿63上升將基板G=。此時， 201228914 ϊίηΐ，射轉63啊上料健料㈣的上方，對正 60抵接於基板G的4隅進行定位。 ^如圖2(c)所示，搬運臂的4根叉部1〇1通過不 ^目干f的空基板G的下殿出既定空間插人之後，固以 w。基板G的固持方法有：如圖2(c)所示搬運臂上升，„戈搬運 臂停止而升降桿63下降。 ^謂次搬運 其次如圖所示在料桿63與對正部6 1⑴回到X軸方向，像送至下個處理單元。 傻又$ 及圖2係以來自絲板㈣運方向正交的X方向的傳送 2說月，如圖l(a)兩點鏈線所示，亦可使搬運臂之叉部 串列的下游之γ軸方向插入進行傳送。此時，使搬^ ^元又^ 102從不會與升降桿62相干涉的方向插入，傳送至處理 行。如此滾輪輸送機與搬運制之基板傳送儀使用升降桿來進 置得裝置的其他構造而言’已知有種基板傳送裝 古ίΐΐ，動軸之間配設的推桿繞鉛直軸旋轉轉動及在妒直 專利文獻I中記載的基板傳送裝置，於相忒 :搬，輪軸方向而言係在比搬運滾輪更外側二 置具有.基部，沿者錯直方向暨立設置；水平臂 i端ΐΐίί 1基板支持部’在該水平臂部前端朝向織ΐίΐ 起’且在其前端㈣_支縣板_。又， = 藉由驅動機構而繞錯直軸旋轉轉動及錯直方向升降;·心成為可 又，就其它基板傳送裝置而言，已知有種 ，並排^在與驅動轴成直角方向m ί機一直線上的傳動部所構細 泛機模』使其長邊方向絲板搬運方向平行在與 fί角方^ ’在滚輪輸送機模組之驅動滾輪上的ϋ下方，；π 個滾輪輸送機模組之間’於基板搬運方向設置機械手可進入彳 201228914 * 間(例如’參照專利文獻2)。 專利文獻2中記載的基板傳送裝置， 方向串列的下游方向之傳送，且機械手插入至; 組之間的空間’並傳送至處理單元。 疋展輪輸达機柄 【先前技術文献】 【專利文獻】 【專利文獻1】曰本特開平1〇 —310240號公報 【專利文獻2】日本特開2〇〇9—176858號公報 【發明内容】 (發明所欲解決之問題） 截的卜值ΐϋΓί示的習知基板傳送農置或專利文獻1記 之升降機構。又，升降桿的上升下降進行的基 =的情況下，升降並定位時，因為基板‘動基;= 基板直接接觸的部分配置雜滾輪使基板容胃雜。但是，因^ =輪:要„微偏離，在使基板升降時就細反滑落的 可月b性，所以凋整需要相當的時間。 、重古專利文獻2中提供—種基板傳送裝置，在基板的搬 ρΐϊΓίί臂)為串聯時場合不須要升降桿。但是，專利 並缺料爵來自錄板搬運方向正交 桿之絲傳钱置。考慮料敝獻2記載的 ϋί ft? ff絲錢财向正交的抑獻助鄰之驅動 ，間^於在相狀驅動軸間設有機械手(搬運臂)可插入的空間而 5^須使驅_間_距變大，擔心基板搬運相應變得不安定。 其把後係欲解決上述問題，目標在提供一種基板傳送裝置及 不使用料桿及精桿之升降機構，從正交方向 、#之叉雜人’職輪輸送機上的基板顧至搬運臂。 201228914 (解決問題 之方式） 含:滾輪輪;裝置，其特徵在於，包 又部，可在水平古I在水千方向上搬運基板；以及搬運臂，具有 基板；並且，μ 直方向及以繞錯絲自由旋轉方式移動 =F=== 將該嫌頌空間，而 使自，在將滾輪輸送機上的基板傳送至搬運臂時， 動，在心滾鈐列由丨滾輪列往相鄰之驅動滾輪列側移 交的方向Ξίΐϊ滾輪列之間形成雜，從她運方向正 又，在美it ί之又部插入至空間而能將基板傳送至搬運臂。 來支時’可藉由並排排列的驅動滾輪列與自由滾輪列 側，ίίίϋ且具有配設於該滾輪輸送機搬運路徑上的下游 置之^ 戦速開始位置之減速感測器與侧基板停止位 4測^的=，，以及控制機構，依據來自該減速感測器與停止 制該驅動滾輪之驅動機構；依據該控制部 到運來的基板由該減速感測器偵測 =偵測到之後’使該驅動滾輪停止。此時，亦可將該 構可絲感測器的伽信號而控制該自由滾輪移3 運來的基板由該減速感測器侧到之後 使遠自由雜列在⑽之驅動滾輪列側移動，形成該空間。 兮、奋1本發明宜包含：基板鱗位置決定麟正麟，配設於 上，並具有可麟正構件抵接於 =輸达機搬基板之下咖端部的細部；基板確定位置決 J用對正麟，配餅觀輪觀频運路徑上的上且 有可動對正構件可抵接於滾輪輪送機搬運的基板之上游側端部的 201228914 角隅部。 又，本發明之特徵在於，白 方向上搬運基板；第2滾輪輪送”滾輪，送機’可，水平 上方，可在水平方向上搬運細、配設於該第1滾輪輸送機的 方向、錯直方向及以繞船直車^=臂_；具有叉部’可在水平 理單元；侧«，侧所傳^板之處 控制該搬運臂；並且，雜丨減板；以及㈣機構， 滾輪歹m：^#_ m ^輪賴縣11動雑列與自由 輪列往相鄰之該4滾hit滚=動2構，以使該自由滚 該搬運臂可ϋ的具有驅動滾輪列，係並排在 滾现触，將該第1 下漱：ί气日f宜具有：配設於該第1滾輪輸送機搬運路徑上的 止U i ΐ t £之減速_11與偵測基板停 停測器；以及控制機構，依據來自該減速感測器與 料ifL貞測信號，控制該驅動滾輪之驅動機構；並且，依 減=制二卩之控制信號，在該第1雜輸送機搬運來的基板由該 並^=彳貞_之後，在經過既定時間後使該轉滾輪減速， 、田由該停止感測器偵測到之後，使該驅動滾輪停止。 ，ί發明中’宜將該控制部形成為可依據來自該減速感測 、偵測信號而控制該自由滾輪移動機構，在該第1滾&嬙 =來的基板由該減速感測娜酬之後，使該自由滾^往相 4之驅動滾輪列側移動，形成該空間。 ^ ’本發明宜包含：基板鮮位置蚊崎正機構，配設於 i滾輪輸送機搬運賴上的下_，並具有可_正構件抿 ，於j 1滾輪輸送機搬運的基板之下游側端部的角隅部；以及美 反確疋位置決定用對正機構，配設於該第滾輪輪送機搬運路徑i 201228914 =游構件可抵接和滚輪輪送機搬運的 田且ϋ發明之基板傳送方法，其特徵在於進行以下+驟u 的Ϊ轉減速;利用停止感測器偵測基板:依據偵·的 :搬=滾=^==，在口方向 驅動遼給祕一一 ’： 土板⑯據偵，朗的信號使該 ^ ; J該自由滾輪往相鄰之驅動滾輪 ;以及從與基板搬運方向正交的方向，將可 ttl 1： ，對ί機構的對正構件抵接於基板在搬運路赴的上游側之角 的方向，將可 (發明之效果） 將搬板時，從與基板搬運方向正交的方向 形成的空間，能將ί輪輸;:===臂袞== 細㈣繼，=傳= 支持基;，=====峨自峰列來 【實施方式】 (實施發明之最佳形態） 布· 基板傳送裝置應用於fpd基板之光阻塗 201228914 圖8中顯示作為可應用本發明基板傳送理裝置的一構成例之 =布•、顯影處理系統。此塗布顯影處理系統2〇〇設置於無塵室内， :如以FPD基板作為被處理基板(以下稱為基板G)，在FPD製程 微影製程之巾的洗淨、光阻塗布、讎烤、顯影及後烘 烤等各處理。 此塗布顯影處理系統2〇〇係由4大區塊構成。構成包含：匣 ^站部(C/S)2G1，與外部裳置傳送容納基板G舰盒CST ;塗布 線部202 ’將化學液塗布至基板G ;介面部㈣期，與曝光裝置 =基板G之傳送；顯影線部205 ’曝光後將基板G顯影。 另，曝光裝置204設置為相鄰接於介面部。 其次，說明各部的大構成。匣盒站部(c/s)2〇1包含：匣盒平 二10? ’可在水平方向例如χ方向並排載置多達4個多段叠層地 谷納夕數基板G 盒CST ;搬運機構iG1，對於此平台1〇〇 的匡盒CST進行基板g的取放。 搬運機構101具有可固持基板G之機構，例如搬運臂102， 工在水T的X、Y方向，錯直的z方向’及軌,錄旋轉的Θ方 向^ 4軸進行動作，可騎相鄰之塗布線部搬與顯影線2〇 行基板G的傳送。 上游。卩的塗布線部2〇2依序配置有清洗製程部21〇、第〗熱處 理4 2丨1、2段傳遞單元部212，鄰接於傳遞單元冑212並位於塗 布線部202與顯影線部2〇5之空間的塗布製程部213、回到塗布線 熱處理部219。另’配置有用於依據裝置構成而調整 各邛長度讀祕板進行雜搬·滾輪輸賴部(α)Νν)22〇。 另一f面’從介面部(Ι/ρ)2〇3側朝向匡盒站(c/s輝側的下游 部之顯影線部205中’配置有顯影製程部22〇與第3熱處理部 223。另’配置有用於依據裝置構成而調整各部長度之對於基板g 的滾輪輸送機部(QDNV)22卜X，配置有與®盒站 調整基板G處理速度之多段缓衝區部224。 * 處理部的各單元構成。在上游部的塗布線部202 中’ Μ洗210在與搬職構1G1相鄰之場所配置有準分子 201228914 UV照射單元(e-UV)l〇2及滌洗單元(scr)i〇3。利用準分子uv照 射產生臭氧〇3進行洗淨。減單元(SCR)1G3⑽洗淨部利用滾 輪搬運基板G並在水平姿雜運下.基板G _面(被處理 進行刷洗或喷洗。 相鄰於清洗製程部210的下游側之第丨熱處理部211，係由脫 =烤用的加熱單元(DHP)1()4、提高塗布液密接性的黏附單元 (· )1〇5、以及將基板溫度保持固定的冷卻單元(c〇L)l〇6所構成。 其次^圖6A、圖6B及圖7所示’ 2段傳遞單元部212係疊 層有.用來將基板G送出至塗布製程部犯的内傳遞單元1〇7、 =來將塗布後的基板G傳出的外傳遞單元⑽、當基板g在塗布 缓咖來暫雜軸基板G待命的2段傳遞多段 塗〒製程部Μ配置為相鄰接於2段傳遞單元部加，從内谓 ，1G7配置有傳送搬運臂m、將化學液塗布至基板g的塗 早二;，赠布的基板G扣_賴的減壓乾燥單元112。 均勺ϋ的H111❿言’有在塗布化學液後進行旋轉使化學液 ，以及從長狹縫狀喷嘴流出化學液在基板g上 而熱17使塗布液的溶職發。減壓乾 化學液之無用端ifi。’其係藉由稀釋劑將減壓乾燥後塗布的 動Ζ轴車Ζ|由向的移動’構成如下：2軸電動機85，驅 軸進H 以及Ζ軸升降構件82，在位於導執上的Ζ %、旋轉_由係由_動機 降構件82的年m軍l，回構件83配置於2轴升 能存取造t11G。藉由可存取z軸、Θ轴、X軸而 70 、外傳遞單元108、2段傳遞多段緩衝區單 12 201228914 凡109、塗布單凡11卜減壓乾燥單元112其中任何一者。 希於ϋ傳Γ遞單元部212下游的第2熱處理部219，具ΐ用來妙 定“冷卻單的ϋΓ化之職烤單元113 ’以及使基板溫度i 多含：傳遞單元115 ’用於傳出至曝光裝置綱； :=Ξ，Βυρ)117，在曝光機處理基板g中時暫時性逐 ^納基板G ;傳遞單.元118，用於將曝 =^ 影線；以及搬運臂Π6，Λ^τ、+„曰，似 土极^得出至顯 妒運劈在早錢曝光裝置204間傳送基板G。 搬運臂116可存取z軸、0軸、χ軸。 傲υ 元中’顯影製程部奶包含：顯影單 H广先早 清洗顯影液；以及乾燥料122，使频事 液及清洗液乾燥。 ▲便顯衫 卻單223包含：後供烤單元123，使顯影穩定化；冷 部早兀(COL)124，使基板G穩定化。 圖9顯示此塗布顯影處理魏之 ，搬運機制1從平台刚上的二== ㈣至清洗製程部210的準分子爪照射單元 照射單疋❻-卿02内，基板G受到紫外線照射 =式ί If?、/2)。此料線洗种，主要去·板表面的有 卜線洗淨結束後’藉由滾輪搬運而移至清洗製程部210 的滌洗單元(SCR)103。 ㈣務Ϊ單，CR)103 + ’利用滾輪搬運在水平姿勢下水平流動 ’ f且猎由對於基板G的頂面(被處理面)施以刷洗或喷洗， 表面去除粒子狀的髒污(步驟S3)。另，洗淨後也將基板g 搬運並且藉严刀等方式除液，使基板G乾燥。在蘇洗 兀）103内洗淨處理完畢的基板g，移至第丨熱處理部211 的加熱單元(DHP)104。 、在第1熱處理部211 t移至加熱單元(〇剛1〇4並在該處接受 脫水處理(步驟S4)。其二欠’基板G移至冷卻單元(C〇L)1〇6，在該 13 201228914 處冷卻直至固定的基板溫度(步驟S5)。 然後’ f板G移至黏附單元(admo〗，在該處接受疏水化處理 (步驟S6)。藉由疏水化處理提高基板G與光阻液的密接性。此疏 水化處理之後，基板G在冷卻單元(c〇L)l〇6將基板冷卻直至固定 的常溫溫度(步驟S7)。並且移至2段傳遞單元部212。 ♦其次將移至2段傳遞單元部212的内傳遞單元107之基板G 藉由塗布製程部213的搬運臂110傳送至塗布單元(〇1)111。此動 作即為本發明，後詳述其動作。 /基板G在塗布單元(CT)111利用旋轉塗布法或者狹缝塗布法 將光阻液塗布於基板頂面(被處理面)(步驟S8)。 其-人藉由搬運臂no從塗布單元m移至減壓乾燥單元 (VD/ER)112。藉由賴方紐行雌布光崎的溶聽燥處理。 其次在同單元内_洗邊機•單元㈣消除基板周緣部的多餘(無 用）光阻(步驟S9)。處理結束後，減壓乾燥單元112的基板藉由搬 運至配置於内傳遞單元1〇7上部的外傳遞單元⑽。已移 動的基板藉由滾輪搬運移至第2熱處理部219的預烘烤單元113。 在第2熱處理部219的預烘烤單元(pre_bake)U3進行光阻 塗布後的烘烤(步驟S10)。藉由此處理’使殘留在塗布於基板G上 之光阻膜巾的溶媒蒸發，強化絲膜與基板G之密接性。 其次’基板G移至冷卻單元(C0L)114，在該處冷卻直至固定 ^基板f度(步驟S11)。基板G搬運缚送雜輪(C()NV)22〇，並 部203的傳遞單元115。傳送帶滾輪的長度依據系統的 遞單元115 _板G藉由搬運臂116傳送 2〇4m圖案(步驟si3)。在已有基板^搬入曝光裝置 204處理中時，暫時性容納於多段緩衝㊄117。搬運臂可在 t繞「轉及自由料地猜動作，並料躲傳』單元 U5、夕奴緩衝區117、曝光裝置2〇4、傳遞單元⑽。 ”曝光完畢基板G藉由搬運臂116從曝光裝置2 早兀⑽⑽卿步驟S14)。其次從傳遞單元118、經由傳送帶= 14 201228914 119傳送至顯影線顯影單元12〇。 在搬 二先f 由鹿少南饱二 120清洗早兀12卜乾燥單元122進行一連 光、，ϋ以ίϊ?Γ/15)。在顯影單元120利用曝光機予以曝 沖洗顯旦^、、^^將未曝光部分的雜沖洗，並在清洗單元121 中乾燥單元122乾縣除殘存的純水。 在該處處 共烤單元(P〇S™卿23， πητ心接性奸。其次，基板G移至冷卻單元 i運臂fofii冷卻至既定基板溫度(步驟S17)。 衝區ί=112=熱處理部223的冷卻單元_經由多段缓 典味若ϋΓΓ201運作中或者11盒CST的基板G已滿而無法接 ΐ虫从泠太谷納於緩衝區部224的多段緩衝區125。在此社束一 連串的塗布顯影處理。 牡此、、《果 上本塗ΐΐίίί系統2⑻中，可將基板0的傳送裝置應用 岸6Α、圖6]8說明將本發明之基板傳送裝置 ;σρ 212與塗布製程部213之間的基板G傳送 如：A、圖6B:斤示，從上游部搬運來的基板G搬入 5;:麟元112結束處理的基板G藉由搬 發明之基板傳送裝置的第1滾輪輸送機RC1，外傳遞ί元f〇f中 具有中構成基板傳錄置的第2滚輪輸送機RC2。 以下說明基板傳送裝置。基_送錢如® 3闕5所示， 具有：第1滚輪輸送機RC1，可在水平方向上搬 搬運臂no，具有叉部101可在水平的χ、γ方向，錯“ z Z 及繞鉛直軸鉍轉的0方向自由旋轉地移動基板G。 第1滾輪輸送機RC1係由在驅動軸55上以適宜間隔装設有驅 15 201228914 S3二：m’以及在自由滾輪軸57上以適宜間隔裝201228914 VI. Description of the invention: [Technical field to which the invention pertains] In more detail, the substrate is transferred to the roller conveyor/wheel machine and transmitted to the carrier arm, or the carrier arm is provided at appropriate intervals. The front end of the yarn distribution between the plurality of shafts 55 of the spherical roller 62 in the axial direction is provided with red or a combination of the motor and the gear by, for example, air pressure drop. In addition, it is formed as follows: the fork is replaced by the roller =====, and the fork 101 can be lifted to the farm. According to the following procedure, when the carrier arm is delivered, the carrier is moved: the tour 3 moves ^^° 1 ' The transport arm and transport direction are transmitted to the processing unit. The substrate G transported by f uses the other substrate of the transport arm; as shown in the figure, the number '= after a predetermined time, the chicken roller 56 stops and the base control signal: the person's turn as shown), the lift rod 63 Rise the substrate G=. At this time, 201228914 ϊίηΐ, shot 63, above the material (4), positioning the positive 60 to the substrate G. As shown in Fig. 2(c), the four fork portions 1〇1 of the transport arm are inserted into a predetermined space of the lower substrate G of the empty substrate G, and then fixed by w. The method of holding the substrate G is as follows: as shown in Fig. 2(c), the transport arm is raised, and the lift arm is stopped and the lift rod 63 is lowered. ^The second transport is followed by the material rod 63 and the alignment portion 6 1(1) as shown. In the direction of the X-axis, the image is sent to the next processing unit. Silly and $2 are transmitted in the X direction orthogonal to the direction of the wire (4), as shown by the chain of two points in Figure l(a). Alternatively, the γ-axis direction downstream of the fork portion of the transport arm can be inserted and transmitted. At this time, the transport unit 102 is inserted in a direction that does not interfere with the lift rod 62, and is transmitted to the processing line. In the other configurations of the device in which the roller conveyor and the carrier substrate are transported using the lifting rod, there is known a substrate transfer device, and the push rod disposed between the moving shafts rotates around the vertical axis and In the substrate transfer device described in Japanese Patent Laid-Open Publication No. Hei- No. Hei. No., the second and second sides of the transfer roller are provided with a base portion, and the base portion is disposed in the wrong direction; the horizontal arm i ends ΐΐ ί 1 substrate support portion 'at the front end of the horizontal arm toward the weaving ΐ ' and at its front end (four) _ The county board _. Also, = the rotation of the wrong axis by the drive mechanism and the lifting direction in the wrong direction; the heart becomes achievable, and other substrate transfer devices are known, and are arranged side by side with the drive shaft. In the direction of the right angle m ü machine, the transmission part of the machine line is made up of a thin machine model, so that the direction of the long-side wireboard is parallel to the angle of the f 角 ^ ^ ' on the drive roller of the roller conveyor module; π Between the two roller conveyor modules, the robot can be placed in the substrate transport direction to enter the area of 201228914* (for example, refer to Patent Document 2). The substrate transfer device described in Patent Document 2 transmits the downstream direction of the direction series. And the robot is inserted into the space between the groups and transmitted to the processing unit. The sprocket wheel is transported to the handle. [Prior Art Document] [Patent Document 1] [Patent Document 1] 曰本特开平1〇—310240号[Patent Document 2] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. 9-176858. SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) The conventional substrate of the cut-off value is transmitted to the agricultural device or the lifting mechanism of Patent Document 1. Lifting rod In the case of the rise and fall of the base = when lifting and positioning, because the substrate 'moving base; = the part of the substrate directly contacting the misaligned roller to make the substrate tolerate the stomach. However, because ^ = wheel: to „micro-deviation, in making When the substrate is lifted and lowered, it may be slightly bucked down, so it takes a considerable amount of time to complete the slab. In the patent document 2, the substrate transfer device is provided, and when the substrate is moved in series, the lift bar is not required. However, the patent and the lack of material are from the direction of the board transporting orthogonal rods. Consider the ϋί ft? ff silk money recorded by the 敝 敝 2 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交 正交The drive_interval is increased, and it is feared that the substrate conveyance becomes unstable. In order to solve the above problems, the aim is to provide a substrate transfer device and an elevating mechanism that does not use a material rod and a fine rod, and the substrate is taken from the orthogonal direction, the substrate of the #之杂人' front wheel conveyor. . 201228914 (method of solving the problem) includes: a roller wheel; a device, characterized in that the bag is further configured to carry the substrate in the horizontal direction in the horizontal direction; and the carrying arm has the substrate; and, the μ direction and the winding The wrong wire is freely rotated to move = F === to dissipate the space, and when the substrate on the roller conveyor is transferred to the carrying arm, the heart is rolled and the adjacent roller is driven by the roller column. The direction in which the roller column side is handed over Ξ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ The deceleration sensor and the side substrate can be stopped by the drive roller column and the free roller column side arranged side by side, and having the idle start position disposed on the downstream of the roller conveyor transport path Bit 4 test ^, and control mechanism, according to the drive mechanism from the deceleration sensor and stop the drive roller; according to the control portion to the shipped substrate detected by the deceleration sensor = detected Then 'stop the drive roller. At this time, the gantry signal of the structuring wire sensor can also be controlled to move the substrate transported by the free roller from the side of the deceleration sensor to the side of the drive roller row of the (10). The space.兮, 奋1 The present invention preferably includes: the position of the substrate scale is determined by Lin Zhenglin, which is disposed on the upper part, and has a detail of the slab positive member abutting on the bottom of the substrate under the transfer machine; With the alignment of the lining, the upper and the movable alignment member on the path of the cake can be abutted on the 201228914 corner portion of the upstream end of the substrate conveyed by the roller conveyor. Further, the present invention is characterized in that the substrate is transported in the white direction, and the second roller is provided with a "roller, a feeder" that can be horizontally transported in the horizontal direction and disposed in the direction of the first roller conveyor. Straight direction and straight through the boat ^= arm _; with fork 'can be controlled in the horizontal unit; side«, the side of the board to control the carrying arm; and, the boring board; and (4) mechanism, Roller 歹m:^#_ m ^ The wheel 赖 县 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 : 赖 : : : : : : : : : : : : : : : : : : : : : : : : : The first squat: the suffocating day f should have: the deceleration _11 of the U i ΐ t £ disposed on the transport path of the first roller conveyor and the detection of the substrate stop And a control mechanism that controls the driving mechanism of the driving roller according to the deceleration sensor and the material ifL detection signal; and, according to the control signal of the subtraction system, is carried in the first miscellaneous conveyor After the substrate is pressed by the ^^彳贞_, the rotating roller is decelerated after a predetermined time has elapsed, and the stop sensor is used by the substrate. After the measurement, the driving roller is stopped. In the invention, the control unit is configured to control the free roller moving mechanism according to the deceleration sensing and detecting signal, and the first roller & After the substrate is subjected to the deceleration sensing, the free roller is moved to the side of the driving roller row of the phase 4 to form the space. ^ 'The present invention preferably includes: a substrate fresh position mosquito net positive mechanism, equipped with i The roller conveyor carries the lower _, and has a 抿-member 抿, a corner portion of the downstream end of the substrate conveyed by the j 1 roller conveyor; and a alignment mechanism for determining the position of the US The second roller conveyor conveyance path i 201228914 = the substrate transfer method of the invention of the movable member detachable and the roller transfer machine, characterized in that the following + u Ϊ 减速 ; ; ; ; ; ; Detector detection substrate: According to the Detective: move = roll = ^ = =, drive Liao to the secret in the direction of the mouth one: Earth plate 16 according to the detection, the signal of the Lang makes the ^; J the free roller to the adjacent Driving the roller; and from the direction orthogonal to the substrate transport direction, Ttl 1: The alignment member of the ί mechanism is in contact with the direction of the substrate on the upstream side of the conveyance path, and (the effect of the invention) is formed in a direction orthogonal to the substrate conveyance direction when the plate is moved. Space, can turn ί;; === 衮 衮 == fine (four) succeed, = pass = support base;, ===== 峨 from the peak column [embodiment] (implementing the best form of invention) · The substrate transfer device is applied to the photoresist coating of the fpd substrate 201228914. Fig. 8 shows a configuration and a processing system as a configuration example of the substrate transfer device to which the present invention is applicable. The coating and development processing system 2 is disposed at none. In the dust chamber, the FPD substrate is used as a substrate to be processed (hereinafter referred to as substrate G), and the FPD process lithography process is washed, photoresist coated, baked, developed, and post-baked. This coating development processing system 2 is composed of four large blocks. The configuration includes: a 站^ station part (C/S) 2G1, and an outer skirting conveyance accommodating substrate G box CST; a coating line part 202' applies a chemical liquid to the substrate G; a face (four) period, and an exposure apparatus = a substrate G The transfer of the developing line portion 205' after the exposure is performed. In addition, the exposure device 204 is disposed adjacent to the face portion. Next, explain the big components of each department.匣Box Station (c/s) 2〇1 contains: 匣Box 平二10? 'You can mount up to 4 multi-segmented slabs of G-boxes CST in parallel in the horizontal direction, for example, χ direction; iG1, pick and place substrate g for the cassette CST of this platform. The transport mechanism 101 has a mechanism for holding the substrate G. For example, the transport arm 102 is operated in the X and Y directions of the water T, and the z-direction of the straight line and the rail are rotated in the direction of the x-axis. The coating line portion carries the transfer of the substrate G to the developing line 2 . Upstream. The coating line portion 2〇2 of the crucible is sequentially provided with a cleaning process unit 21〇, a heat treatment 42 and a transfer unit unit 212, and is adjacent to the transfer unit 212 and located at the coating line unit 202 and the development line unit 2. The coating process portion 213 of the space of the crucible 5 is returned to the coating line heat treatment portion 219. Further, a misalignment/roller transfer unit (α) Ν ν) 22 调整 is provided for adjusting the length of each of the reading boards according to the configuration of the apparatus. The other surface f is disposed from the interfacial portion (Ι/ρ) 2〇3 side toward the cassette station (in the developing line portion 205 of the downstream portion of the c/s glow side), the developing process portion 22A and the third heat treatment portion 223 are disposed. Further, a roller conveyor unit (QDNV) 22 for the substrate g for adjusting the length of each unit depending on the device configuration is disposed, and a plurality of buffer portions 224 for adjusting the processing speed of the substrate G with the cartridge station are disposed. Each unit of the processing unit is configured. In the coating line portion 202 of the upstream portion, the sputum 210 is disposed adjacent to the moving structure 1G1, and the excipient 201228914 UV irradiation unit (e-UV) l〇2 and the washing unit are disposed. (scr) i〇3. Purification by using excimer uv irradiation to generate ozone 〇3. Subtraction unit (SCR) 1G3 (10) Washing unit uses the roller to transport the substrate G and under the horizontal posture miscellaneous. The substrate G _ surface (processed The second heat treatment unit 211 adjacent to the downstream side of the cleaning process unit 210 is a heating unit (DHP) 1 () 4 for de-bake, and an adhesion unit (·) for improving the adhesion of the coating liquid. 1〇5, and a cooling unit (c〇L) l〇6 that keeps the substrate temperature fixed. Next, Figure 2A, Figure 6B, and Figure 7 show the paragraph 2 The transfer unit unit 212 is provided with an external transfer unit (10) for sending the substrate G to the inner transfer unit 1〇7, which is used by the coating process unit, to transfer the coated substrate G, and when the substrate g is coated. The two-stage transfer multi-stage coating process section of the coffee-to-poly-axis substrate G is configured to be adjacent to the two-stage transfer unit. From the inside, the 1G7 is provided with a transfer arm m, and the chemical liquid is applied to the substrate g. The application of the second substrate; the substrate of the gift G buckle _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ On the substrate g, the heat 17 causes the coating liquid to be dissolved. The useless end of the dry chemical liquid is reduced. 'It is a moving yoke that is coated by a diluent and dried under reduced pressure. The configuration is as follows: the 2-axis motor 85, the drive shaft-in H, and the cymbal-elevating member 82, the Ζ% on the guide, the rotation _ is from the _ motility lowering member 82, and the return member 83 is disposed at 2. The shaft can be accessed to create t11G. By accessing the z-axis, the x-axis, the X-axis, 70, the outer transfer unit 108, and the second-stage transmission The single heat treatment unit 219, which is downstream of the 减压 Γ Γ 单元 212 212 212 212 212 212 212 112 112 2012 2012 2012 2012 2012 2012 2012 2012 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第The cooking unit 113' and the substrate temperature i include: the transfer unit 115' is used for transmission to the exposure device; :=Ξ, Βυρ) 117, temporarily subtracts the substrate when the exposure machine processes the substrate g G; pass the single element 118 for the exposure = ^ shadow line; and the transfer arm Π 6, Λ ^ τ, + 曰 曰, like the soil electrode ^ to the display 传送 传送 transfer the substrate between the early money exposure device 204 G. The transport arm 116 can access the z-axis, the zero-axis, and the x-axis.傲υ元中'Development process milk contains: development unit H Guang early cleaning developer; and drying material 122 to dry the frequency and cleaning solution. ▲ The shirt 223 includes: a post-bake unit 123 for stabilizing the development; and a cold portion early (COL) 124 to stabilize the substrate G. Fig. 9 shows the coating development process. The transport mechanism 1 is irradiated from the two-= (four) on the platform to the excimer-claw irradiation unit of the cleaning process unit 210, and the substrate G is irradiated with ultraviolet light = If?, /2). This stock washing is carried out, and is mainly carried out by the roller to be transported to the washing unit (SCR) 103 of the cleaning process unit 210 after the completion of the cleaning of the surface of the board. (4) Order, CR) 103 + 'Use the roller to carry the horizontal flow in the horizontal position' f and the hunting is applied to the top surface (treated surface) of the substrate G by brushing or spraying, and the surface is removed by particle-like dirt ( Step S3). Further, after the washing, the substrate g is also conveyed and the liquid is removed by a knife or the like to dry the substrate G. The processed substrate g is washed in the Suspension 103 and transferred to the heating unit (DHP) 104 of the second heat treatment unit 211. The first heat treatment unit 211 t moves to the heating unit (〇 〇 〇 4 and receives the dehydration treatment there (step S4). The second owing 'the substrate G moves to the cooling unit (C〇L) 1〇6, at The 13 201228914 is cooled until the fixed substrate temperature (step S5). Then the 'f plate G is moved to the adhesion unit (admo), where the hydrophobization treatment is received (step S6). The substrate G and the light are raised by the hydrophobization treatment. The liquid-repellent adhesion. After the hydrophobization treatment, the substrate G cools the substrate to a fixed normal temperature in the cooling unit (c〇L) 106 (step S7) and moves to the 2-stage transfer unit portion 212. ♦ Second The substrate G moved to the inner transfer unit 107 of the two-stage transfer unit portion 212 is transferred to the coating unit (〇1) 111 by the transfer arm 110 of the coating process unit 213. This operation is the present invention, and its operation will be described in detail later. /Substrate G The photoresist is applied to the top surface (processed surface) of the substrate by a spin coating method or a slit coating method in a coating unit (CT) 111 (step S8). The person is removed from the coating unit m by the transfer arm no. Move to the reduced-pressure drying unit (VD/ER) 112. By Laifang Newline, the light-dissolving dry treatment of the female cloth, the second is in the same In the inside of the element, the edge washer/unit (4) eliminates unnecessary (unwanted) photoresist on the peripheral portion of the substrate (step S9). After the process is completed, the substrate of the reduced-pressure drying unit 112 is transported to the upper portion of the inner transfer unit 1〇7. The outer transfer unit (10) moves the substrate to the prebaking unit 113 of the second heat treatment unit 219 by the roller. The prebaking unit (pre_bake) U3 of the second heat treatment unit 219 performs baking after photoresist coating. (Step S10) By this treatment, the solvent remaining in the photoresist film coated on the substrate G is evaporated to enhance the adhesion between the silk film and the substrate G. Next, the substrate G is moved to the cooling unit (C0L) 114, At this point, it is cooled until the substrate is fixed (step S11). The substrate G carries the miscellaneous wheel (C()NV) 22〇, and the transfer unit 115 of the portion 203. The length of the conveyor roller is determined according to the delivery unit 115 of the system _ The plate G conveys a 2〇4m pattern by the transport arm 116 (step si3). When the existing substrate is loaded into the exposure device 204, it is temporarily accommodated in the multi-stage buffer five 117. The transport arm can be rotated around and freely. Guess the action, and hope to avoid the transmission unit U5, Xinu buffer 117, exposure device 2〇4, transfer unit (10). The exposed substrate G is transferred from the exposure device 2 by the transfer arm 116 (10) (10), step S14), and then transferred from the transfer unit 118 to the developing line developing unit 12 via the conveyor belt = 14 201228914 119. In the move two first f from the deer Shaonan full two 120 cleaning early 12 卜 drying unit 122 for a light, ϋ ϊ Γ Γ / 15). In the developing unit 120, the unexposed portion is flushed by exposure to the exposure machine, and the drying unit 122 is dried in the cleaning unit 121 to remove the remaining pure water. At this place, the co-bake unit (P〇STM Qing 23, πητ is connected to the sex. Secondly, the substrate G is moved to the cooling unit i, the arm fofii is cooled to a predetermined substrate temperature (step S17). Punching area ί=112=heat treatment unit The cooling unit 223 of the 223 is in operation or the substrate G of the 11-box CST is full and cannot be connected to the multi-segment buffer 125 of the buffer portion 224 from the sputum. The coating and developing process is applied to the substrate transfer device of the substrate 0, and the substrate transfer device of the present invention; σρ 212 and the coating process portion 213 can be applied to the transfer device of the substrate 0 in the system 2 (8). The substrate G is transported as follows: A, FIG. 6B: the substrate G is transported from the upstream portion, and the substrate G is processed by the first unit. The second roller conveyor RC2 having the intermediate substrate transfer medium is provided in the external transfer unit. The substrate transfer device will be described below. The base transfer device is shown in Fig. 3, and has the first roller conveyor RC1. , the carrying arm no can be carried in the horizontal direction, and the fork portion 101 can be horizontal χ, γ direction, wrong "z Z and freely rotate the substrate G in the 0 direction around the vertical axis. The first roller conveyor RC1 is equipped with a drive 15 at a suitable interval on the drive shaft 55. 201228914 S3 II: m' and mounted on the free roller shaft 57 at appropriate intervals
自列往相鄰之驅動滾輪列側移動，在驅動滾輪列與 用氣^5。、'曰$成空間/的自由滚輪移賴構，#自由滾輪驅動 之叉邱im +亚且其構成係從與搬運方向正交的方向將搬運臂110 傳送i搬運空間1 ’而將第1滾輪輸送機RC1上的基板G 上的==Γ’驅動轴55構成為藉由内傳遞單元107之架台50 部64之轴承58承支成自由旋轉，並藉由設置於架 i。s f㈣轉賴機51雜肺紐驗運方向旋 轴52。7 電動機51連結有與基板搬運方向平行延伸的旋轉 係麵於旋熟52上的例如由傘齒輪構成的齒輪53 ’ 將動軸55的—端部之由傘齒輪構成的齒輪54咬合， 碰動機51 _轉達至驅動軸55及驅絲輪56。另，動 刑#λ ^ ί可不使用齒輪地將驅動機構藉由採用磁鐵磁力之非接觸 1動力，動機構進行驅動，來取代鶴電動機5卜齒輪53、54。 椹出f 面’自由旋轉地裝設有自由滾輪59的自由滾輪軸57， =巧接於自由滾輪移動機構，即自由滾輪驅_氣缸仍，而 此在相鄰之驅動軸55側靠近遠離。 、樣1時’氣缸65如圖4⑻所示具有：氣缸本體65a，橫設於第1 RC1的下方；軸桿65c，其具有在氣缸本體65a = =動的-對活塞65b ;管路65f，連制設於氣缸本體祝的兩 pq 孔65d、65e，以及空氣供給源65i，通過切換閥65g及開 =65h而連，管路65f。另，此種情況下切換閥65g具有切換 ^冓’係將從空亂供給源65i所供給的空氣供給到一邊例如接孔 時二將從另-邊的接孔65e所排出的空氣排氣至外部。 又氣缸65具有連結構件65k，其係連結於軸桿6允並經由設 缸本體65a上部且沿著軸向狹縫⑹而往上方突出，此連結構 件65k上連結有自由滾輪軸57。 依據如此構成的氣缸65，在可依據來自後述控纖構即控制 16 201228914 的 切換閥65g予以切換的狀態下，從空氣供 -邊的的接孔65d供給至氣缸本體祝内，並從另 輪59 _ M排出。並且’具有自由滾輪軸57及自由滚 im二輪麻相義驅紐翻侧鶴，能形絲運臂110 動作：二)的?㈤1(參照圖3)。又，藉由進行*述相反的 驅絲輪列雜動滾輪56與 下诡1滾輪輸送機⑽之中的基板G搬運路徑的最 盘軸55中央部附近位置，包夾驅動軸55而在上游側 測1:。==隱板G之端部的減速感測請與停止感 來形成。°二減速感測益SA與停止感測器SB係藉由光感測器 端邱又配輸職RC1之中板G搬運路涵下游侧兩 ϊϊ媒基板G基準位置蚊用對正機構⑹a，其具有可動 侧端部之H接於第L滾輪輸送機RCl所搬運的基板g的下游 徑的上游偏t又’第1滾輪輸送機犯之中的基板G搬運路 1且有可祕設有基板確定位置決定㈣正機構_， 1 _送機RC1雌運的基板 機構:基ί位置蚊用對正機構與確定位置蚊用對正 圖3(c)所-以:準位置決定用對正機構6〇Α作為代表說明時，如 可動對正mi 可在氣缸體伽内摩擦滑動； -端壁6〇c之貫穿f _並貫通設於氣缸體_的 成ΐίΓΐ在兩支持構件6la之前端部的滾輪仙所構 〇 61 動對正構件61 :觸成，當_加壓機構使可 於2根支拄棋i向基板之角隅部移動時，以自由旋轉方式裝設 的兩面前端部的2個滾輪61b減於基板G之角隅部 17 201228914 # j ΐϊί ϊϊί 65、基準位置決定用對正機構6〇a、 到減速感測讀、’依據來自接受 、確定位置決定用對正機構6GB及搬運臂^ ^用對正機構 且^1^裝5又有驅動滾輪56的驅動滾輪列予以並 m，將搬運臂11G之又部1Q1從與搬運扣 ^==_間’料2職賴奶上的編 另’苐2滾輪輸送機RC2之驅動機構係與第t滾輪輸送機奶 之驅動機構_，_在_部分標註相同符餘省略說明。 搬運臂U〇如圖7所示成為以下構成。搬運臂110的上下(Z 軸)移動構成係由：導執81 ;升降構件82，沿著導軌81進行升降； Z軸電動機’驅動升降構件82。θ軸係藉由0電動機86使升降構 件82沿著導執81旋轉。χ軸係升降機構幻上的基座構件83上 之叉部101藉由X軸驅動電動機87來前後驅動。 如此，搬運臂110可存取内傳遞單元107、外傳遞單元1〇8、 2段傳遞多段緩衝區單元109、塗布單元m、減壓乾燥單元112 其中任一者。另’設於2段傳遞多段缓衝區單元1〇9的容納部1〇9& 之底部，豎立設有支持基板G的多數支持桿i〇9b。 其次，參照圖3〜圖7、圖10A、圖10B說明基板G之處理 程序。首先，如圖4(a)所示，從上游部搬運來的基板G藉由驅動 滾輪56的驅動力與自由滾輪59的支撐而搬入來到内傳遞單元 107(步驟SA1)。減速感測器SA偵測已搬入至内傳遞單元1〇7之 第1滾輪輸送機RC1的基板G(步驟SA2)。依據按照減速感測器 SA偵測的來自控制器3〇〇之控制信號，使驅動電動機51開始減 速(步驟SA3)。其次停止感測器S2偵測基板G(步驟SA4)。依據 按照停止感測器SB的偵測的來自控制器300之控制信號經過既定 18 201228914 使驅動電動機51完全停止。同時基板G的搬運亦停止(步 對正的定位。首先，如圖3所示使基準位置決定 5對正構件61伸長至基板g的下游侧之角隅 ^A6) ό接基板的下游側之角隅部基板G進行基較位(步驟 動』^^^藉夷^基^^在經過既定時間後使驅 4準ί構6〇A具有密切的關係，設定時間以停止在 ^板G的^ 構6GA的可動對正構件61伸長時恰好碰 Ϋ於全停止時，移至圖4_步驟。藉由使自由 ί 自由雜軸57從1N的位置移 插入只要形成_又部101可 拚叮.^ …、响工間I係將自由滾輪59往上游側或者往下方 句可2由滾輪59的移動亦可藉由電動機驅絲進行。 接於^ 的上游侧的確定位置決定對正機構_抵 也丨板G的角隅°卩進仃定位確定(步驟队8)。亦即，依照下游 铲進二由滾輪59移動、上游侧的對正部之順序進行定位， , 進仃對於基板G不造成負擔的定位。 搬運ί ίω對，構_與_後退(步驟SA9)。對正結束時， )亚且此回到最初的基板搬入步驟SA1， 因為可如此不使用升降桿而進行基板的傳送接ϋ基^反G 所不的配置升降桿升降機構之高度輕間。 ”，"員圖 圖_所示的傳送流程B，使自由滾輪列的移動(步驟SA7) 19 201228914 ，(步驟’的信號而與驅動滾輪％之 ^ Γ i同時開始。因為藉此省略一次步驟，所以能ί 南基^傳送的處理速度。通常可提升約i秒的處理^所4 運的/板㈣送至圖_示的塗布單元⑴。 右塗布早兀1Π在處理中時，配設在塗 測基板G的有無並傳達給控制器 =制盗300的控制信號來鶴搬運 2 l〇9a 入至支持桿應b之間並傳送。當塗布單S ^基,G傳送至減壓乾燥單元112時，將在2段傳遞J ^ J 早疋在由搬運臂110傳送至塗布單元ni。时 之乾燥叫織布的光阻 搬運ίm之處理時’在外傳遞單元⑽藉由 送機 中縮短約“ sifU/的，降桿方式而言，在一次傳送 中’將滾輪輸：1=板=送在至：=基置之 由取，^機，大幅·球置^理貞=秒，所以可藉 RC;顯如此藉由可從與第1以輪= 的塗布 20 201228914 因應於必要而配置處理單元，降低在無塵㈣佔據_而能降低 成本。 、另’以下說明是否在外傳遞單元108中不設置内傳遞單元1〇7 ，明的自由滚輪轴57並預先設置又部101可插入的空隙。内傳遞 單元107中，藉由驅動滾輪56搬運基板G時，若不將自由滾 59配置在驅動滾輪56之間，則基板G在搬運方向的前部會向下 ，曲’在?運基板G時使基板G的前部碰撞驅動滾輪％，基板〇 能破相。但是，在外傳遞單元應中，利用搬運臂11〇載置 ，板G犄，若是在基板周緣至少配置有驅動滾輪允 ί 下撓曲。又，載置基板G之後利用二^ 合!ί在搬運方向的前部不會向下撓曲，所以基板 自ίί二ΐΐ7。因為這種理由，所以在外傳遞單幻〇8可不設置 :設置自由滾輪軸57等使裝置構成單 上J = tit _板g ’所以也不必將基板g定位，益 '^次酬、以s=n6i)A及確定位置決定㈣正機構_。 中，的其他實施形態。内傳遞單元107 由滾輪^上水’ ΐ、須使基板G在驅動滾輪56及自 動滾輪56及自由滾輪59二吏:置二 = 定位之處的驅 或表:I，6不同材質 用在基板=向上倾的未圖㈣嘴，降低作 力降低。 力的狀怨下來進行基板G的定位，代替使抓地 有在中ίίί傳送妓不限於塗布顯料統，可康用於所 在滾輪輸运機與搬運臂間的基板傳送機構。 應用所 【圖式簡單說明】 21 201228914 (b)。’丨’貞71^知基板傳钱置之概略俯視圖⑻及概略剖面圖 知_傳送褒置的傳送程序 。 面_、及。概略俯視圖⑷、概略剖 圖5係序之概略剖面圖。 略剖面圖(b)。 展輪輸迗機之概略俯視圖(a)及概 搬運臂與處_輪送機、基板容納部、及 搬運及編納部，及 增恤輪輸频 、基板容納部、及 概略IK.朗本制从板傳送裝 置的塗布•顯影裝置之 圖9係圖8之塗布•顯影裝置 ==明之中的基板傳送之處二。 圖Β係柄明之中的基板傳送之其他處理流程圖。 【主要元件符號說明】 CST匣盒 G 基板 I 空間 S1-S18、SA1 〜SA12 步驟 SA 減速感測器 SB停止感測器 SC基板有無探查感測器 Rci第1滾輪輪送機 RC2第2滾輪輸送機 22 201228914 50 架台 51 電動機 52 旋轉軸 53、54 齒輪 55 驅動軸 56 驅動滚輪 57 自由滾輪軸 58 軸承 59 自由滾輪 60A對正機構(基準位置決定對正機構） 60B對正機構(確定位置決定對正機構） 60a 氣缸體 60b 活塞 60c端壁 60d貫穿孔 61 對正構件 61a支持構件 61b 滾輪 64 軸桿支撐部 65 自由滾輪驅動用氣缸(自由滾輪移動機構) 65a 氣缸本體 65b活塞 65c軸桿 65d、65e接孔 65f管路 65g切換閥 65h開閉閥 65i 空氣供給源 65j 狹缝 65k連結構件 23 201228914 81 導軌 82 升降構件(升降機構） 83 基座構件 86、87 電動機 100 匣盒平台 101搬運臂叉部(搬運機構） 102準分子UV照射單元(e-UV) 102A搬運臂 102F搬運臂叉部 103 滌洗單元(SCR) 104加熱單元(DHP) 105黏附單元(AD) 106、114、124 冷卻單元(COL) 107内傳遞單元 108 外傳遞單元 109 2段傳遞多段緩衝區單元 109a傳遞單元多段缓衝區容納部 109b支持桿 110搬運臂 111 塗布單元 112減壓乾燥單元 113 預烘烤單元 115、118傳遞單元 116搬運臂 117、125多段缓衝區(T-BUP) 119、126傳送帶滾輪 120顯影單元 121清洗單元 122乾燥單元 123 後烘烤單元(POST-BAKE) 24 201228914 200塗布•顯影裝置 201 匣盒站部(C/S) 202 塗布線部 203 介面部(I/F) 204曝光裝置 205 顯影線部 210清洗製程部 211第1熱處理部 212 2段傳遞單元部 213 塗布製程部 219第2熱處理部 220、221 滾輪輸送機部(CONY) 222顯影製程部 223第3熱處理部 224 多段缓衝區部 300控制器(控制機構） 25Move from the column side to the adjacent drive roller column side, and drive the roller column with the gas ^5. , '曰 成 成 space / free roller shifting structure, # free roller drive fork Qiu im + sub-structure and transport the transport arm 110 from the direction orthogonal to the transport direction i transport space 1 ' and the first The ==Γ' drive shaft 55 on the substrate G on the roller conveyor RC1 is configured to be freely rotated by the bearing 58 of the gantry 50 portion 64 of the inner transfer unit 107, and is disposed on the frame i. s f (four) transfer machine 51 miscellaneous lungs check direction rotation shaft 52. 7 The motor 51 is coupled with a rotation surface parallel to the substrate conveyance direction on the rotary 52, for example, a gear 53' composed of a bevel gear. The gear 54 of the bevel gear is engaged at the end, and the impact motor 51_ is transferred to the drive shaft 55 and the drive wheel 56. In addition, the motion #λ^ ί can drive the drive mechanism without using the gears by using the non-contact 1 power of the magnet magnetic force, and the moving mechanism drives to replace the crane motor 5 gears 53, 54. The free roller shaft 57, which is freely rotatably mounted with a free roller 59, is in contact with the free roller moving mechanism, i.e., the free roller drive_cylinder remains, and is adjacent to the adjacent drive shaft 55 side. As shown in Fig. 4 (8), the cylinder 65 has a cylinder body 65a laterally disposed below the first RC1, and a shaft 65c having a pair of pistons 65b that are movable in the cylinder body 65a = = and a conduit 65f. The two pq holes 65d and 65e, which are provided in the cylinder body, and the air supply source 65i are connected to the line 65f by the switching valve 65g and the opening 65h. Further, in this case, the switching valve 65g has a switching mechanism for exhausting air supplied from the air supply source 65i to one side, for example, a hole, and exhausting air discharged from the other side hole 65e to external. Further, the cylinder 65 has a coupling member 65k that is coupled to the shaft 6 and protrudes upward through the upper portion of the cylinder main body 65a and along the axial slit (6). The free roller shaft 57 is coupled to the connecting member 65k. The cylinder 65 configured as described above is supplied from the air supply-side contact hole 65d to the cylinder main body in a state in which it can be switched in accordance with the switching valve 65g from the control structure 16 201228914, which will be described later, and from the other wheel. 59 _ M discharge. And 'has a free roller axle 57 and a free roll im two-wheeled sneakers to turn the side of the crane, can shape the wire arm 110 action: b) (5) 1 (refer to Figure 3). Further, by driving the opposite side of the center portion of the disk shaft 55 of the substrate G conveyance path among the spinning wheel row misalignment roller 56 and the lower jaw roller conveyor (10), the drive shaft 55 is sandwiched and upstream. Side test 1:. == Deceleration sensing at the end of the blank G is formed with a stop feeling. °The two deceleration senses and the stop sensor SB are connected by the light sensor terminal Qiu and the RC1 middle plate G to transport the downstream side of the road culvert to the two substrates, the G position reference mosquito alignment mechanism (6)a, The substrate G having the movable side end portion is connected to the upstream side of the downstream path of the substrate g transported by the L-th roller conveyor RCl, and the substrate G transport path 1 among the first roller conveyor is provided. The substrate determines the position to determine (4) the positive mechanism _, 1 _ the RC1 female substrate mechanism: the base position of the mosquitoes and the position of the mosquitoes are aligned with Figure 3 (c) - to: the position determination When the mechanism 6〇Α is used as a representative, if the movable alignment mi can be frictionally slid in the cylinder body gamma; the penetration of the end wall 6〇c is f _ and the penetration of the end wall 〇 设 is provided at the front end of the two support members 6la The swaying mechanism of the stalk is 61. The aligning member 61 is in contact with each other. When the _ pressurizing mechanism moves the two yokes to the corner of the base plate, the front end portions of the two sides are rotatably mounted. The two rollers 61b are reduced from the corners of the base plate G. 201228914 # j ΐϊί ϊϊί 65, the reference position is determined by the alignment mechanism 6〇a, To the deceleration sensing read, 'based on the receiving and determining position determining the alignment mechanism 6GB and the carrying arm ^ ^ using the alignment mechanism and the driving roller 56 driving roller 56 and the drive roller row, and the carrying arm 11G's 1Q1 from the handling buckle ^==_ between the two materials on the 2nd Lai milk on the other '苐2 roller conveyor RC2 drive mechanism and the t-roller conveyor milk drive mechanism _, _ in _ Partially marked with the same symbol, the description is omitted. The transport arm U〇 has the following configuration as shown in Fig. 7 . The up-and-down (Z-axis) movement of the transport arm 110 is constituted by a guide 81, a lifting member 82 that moves up and down along the guide rail 81, and a Z-axis motor that drives the elevating member 82. The θ axis rotates the lift member 82 along the guide 81 by the 0 motor 86. The fork portion 101 on the base member 83 of the cymbal lift mechanism is driven forward and backward by the X-axis drive motor 87. As such, the transport arm 110 can access any of the inner transfer unit 107, the outer transfer unit 1〇8, the 2-stage transfer multi-segment buffer unit 109, the coating unit m, and the reduced-pressure drying unit 112. Further, at the bottom of the accommodating portion 1 〇 9 & which is provided in the two-stage transfer multi-stage buffer unit 1 〇 9 , a plurality of support rods i 〇 9b supporting the substrate G are erected. Next, the processing procedure of the substrate G will be described with reference to Figs. 3 to 7, 10A and 10B. First, as shown in Fig. 4 (a), the substrate G conveyed from the upstream portion is carried into the inner transfer unit 107 by the driving force of the drive roller 56 and the support of the free roller 59 (step SA1). The deceleration sensor SA detects the substrate G of the first roller conveyor RC1 that has been carried into the inner transfer unit 1A (step SA2). The drive motor 51 starts decelerating based on the control signal from the controller 3 detected in accordance with the deceleration sensor SA (step SA3). Next, the sensor S2 is stopped to detect the substrate G (step SA4). According to the control signal from the controller 300 according to the detection of the stop sensor SB, the drive motor 51 is completely stopped by the predetermined 18 201228914. At the same time, the conveyance of the substrate G is also stopped (step alignment is performed. First, as shown in FIG. 3, the reference position determines the angle at which the alignment member 61 is extended to the downstream side of the substrate g, A^A6), and the downstream side of the substrate is spliced. The corner base plate G performs the base position comparison (step move) ^^^ borrows the base ^^ after a predetermined time has elapsed to make the drive 4 quasi-structure 6〇A have a close relationship, set the time to stop at the plate G ^ When the movable alignment member 61 of the 6GA is stretched just when it is fully stopped, it moves to the step of Fig. 4. By inserting the free LY axis 57 from the position of 1N, it is possible to form a _ . . . , the soundwork room I will move the free roller 59 to the upstream side or downward. The movement of the roller 59 can also be performed by the motor drive wire. The determined position of the upstream side of the ^ determines the alignment mechanism _ The angle of the yoke G is determined (step 8). That is, according to the downstream shovel 2, the roller 59 moves, the upstream side is aligned, and the substrate G is advanced. Positioning that does not cause a burden. Handling ί ίω, _ and _ back (step SA9). At the end of the alignment, In the initial substrate loading step SA1, the height of the lifting rod lifting mechanism can be arranged without the use of the lifting rod to perform the transfer of the substrate. "," the transfer flow B shown in the figure _, the movement of the free wheel column (step SA7) 19 201228914, (the signal of the step 'starts at the same time as the drive wheel % 。 i. Because this is omitted once Step, so can handle the processing speed of the transfer. Generally, the processing of the device can be increased by about i seconds. 4 (4) is sent to the coating unit (1) shown in Figure _. The presence or absence of the coated substrate G is transmitted to the controller = the control signal of the thief 300. The crane carries 2 l 〇 9a into the support bar between the b and transmits. When the single S ^ base is applied, the G is transferred to the decompression When the unit 112 is dried, the J J J is transferred to the coating unit ni in the second stage. When the drying is called the processing of the photoresist of the woven fabric, the external transfer unit (10) is sent to the machine. Shorten the "sifU/, in the case of the drop-down mode, in the case of a transfer, the wheel will be driven: 1 = board = sent to: = base set, ^ machine, large · ball set ^ 贞 = seconds, Therefore, it is possible to use RC; it is possible to reduce the processing unit by the coating 20 201228914 with the first round = In the case of dust-free (four) occupation, the cost can be reduced. Further, whether or not the inner transfer unit 1〇7 is provided in the outer transfer unit 108, the free free roller shaft 57 is provided, and the gap in which the other portion 101 can be inserted is preset. In the unit 107, when the substrate G is transported by the drive roller 56, if the free roller 59 is not disposed between the drive rollers 56, the front portion of the substrate G in the transport direction is downward, and the curve is made when the substrate G is transported. The front portion of the substrate G collides with the drive roller %, and the substrate 〇 can be broken. However, in the outer transfer unit, the transfer arm 11 〇 is placed, and the plate G 犄 is disposed at least on the periphery of the substrate to allow the drive roller to flex. Moreover, after the substrate G is placed, the front portion of the conveyance direction is not deflected downward, so the substrate is automatically ί7. For this reason, the single illusion 8 is not provided for setting: freedom of installation The roller shaft 57 and the like make the device form a single J = tit _ plate g ' so that it is not necessary to position the substrate g, and it is determined by the s=n6i) A and the determined position (4) positive mechanism _. Other embodiments. The inner transfer unit 107 is made of a water pump, and the substrate G is driven by the drive roller 56 and the automatic roller 56 and the free roller 59. The drive or table is placed at the position where the position is: II, 6 is used for the substrate. = The tip of the figure (4) that is tilted upwards reduces the effort. The force of the resentment to position the substrate G, instead of making the grip in the transfer, is not limited to the coating system, and can be used for the substrate transport mechanism between the roller conveyor and the transport arm. Application [Simplified illustration] 21 201228914 (b).丨 贞 贞 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板Face _, and. A schematic cross-sectional view of a schematic plan view (4) and a schematic cross-sectional view. Slightly sectional view (b). Schematic plan view of the exhibition wheel conveyor (a) and the general transfer arm and the _ wheel feeder, the substrate accommodating part, and the handling and editing department, and the charging wheel transmission frequency, the substrate accommodating part, and the outline IK. Longben Fig. 9 of the coating and developing device for the slave plate transporting device is the second embodiment of the substrate transporting in the coating/developing device == Ming. The other processing flow chart of the substrate transfer in the figure is shown. [Main component symbol description] CST cassette G substrate I Space S1-S18, SA1 ~ SA12 Step SA Deceleration sensor SB Stop sensor SC substrate with or without probe sensor Rci 1st roller wheel feeder RC2 2nd roller conveyor Machine 22 201228914 50 Rack 51 Motor 52 Rotary shaft 53, 54 Gear 55 Drive shaft 56 Drive roller 57 Free roller shaft 58 Bearing 59 Free roller 60A alignment mechanism (reference position determines alignment mechanism) 60B alignment mechanism (determination position determination pair 60a cylinder block 60b piston 60c end wall 60d through hole 61 aligning member 61a support member 61b roller 64 shaft support portion 65 free roller drive cylinder (free roller moving mechanism) 65a cylinder body 65b piston 65c shaft 65d, 65e hole 65f line 65g switching valve 65h opening and closing valve 65i air supply source 65j slit 65k connecting member 23 201228914 81 rail 82 lifting member (lifting mechanism) 83 base member 86, 87 motor 100 cassette platform 101 transport arm fork (transport mechanism) 102 excimer UV irradiation unit (e-UV) 102A transport arm 102F transport arm fork 103 scrubbing unit (SCR) 104 heating unit (DHP) 105 stick Unit (AD) 106, 114, 124 Cooling unit (COL) 107 Internal transfer unit 108 External transfer unit 109 2-stage transfer multi-segment buffer unit 109a Transfer unit Multi-segment buffer accommodation 109b Support rod 110 Transport arm 111 Coating unit 112 Press drying unit 113 pre-baking unit 115, 118 transfer unit 116 transport arm 117, 125 multi-segment buffer (T-BUP) 119, 126 conveyor belt roller 120 development unit 121 cleaning unit 122 drying unit 123 post-baking unit (POST- BAKE) 24 201228914 200 coating and developing device 201 匣 box station unit (C/S) 202 Coating line unit 203 Interfacial portion (I/F) 204 Exposure device 205 Developing line unit 210 Cleaning process unit 211 First heat treatment unit 212 Section 2 Transfer unit unit 213 Coating process unit 219 Second heat treatment unit 220, 221 Roller conveyor unit (CONY) 222 Development process unit 223 Third heat treatment unit 224 Multi-stage buffer unit 300 Controller (control mechanism) 25