TWI326800B - Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern - Google Patents

Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern Download PDF

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Publication number
TWI326800B
TWI326800B TW095119051A TW95119051A TWI326800B TW I326800 B TWI326800 B TW I326800B TW 095119051 A TW095119051 A TW 095119051A TW 95119051 A TW95119051 A TW 95119051A TW I326800 B TWI326800 B TW I326800B
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TW
Taiwan
Prior art keywords
pigment
resin composition
sensitive resin
colored pattern
type radiation
Prior art date
Application number
TW095119051A
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English (en)
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TW200708893A (en
Inventor
Tetsuya Kato
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
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Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200708893A publication Critical patent/TW200708893A/zh
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Publication of TWI326800B publication Critical patent/TWI326800B/zh

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)

Description

COOH I 0 ch2=ch-co-ch2chch2-o
5·如申請專利範圍第4項所述之顏料分散型 脂组成物’其中更含有用以調整接觸角之高分子黏每 該高分子黏結劑之含量,係在100重量份之該 合物中為5重量份以上、少於5〇重量份。 6. 如申請專利範圍第5項所述之顏料分散型 脂組成物,其中該高分子黏結劑為笨乙烯丙烯酸之 7. 如申請專利範圍第4項所述之顏料分散型 脂組成物,其中該光聚合性化合物為親水性。 8. 如申請專利範圍第4項所述之顏料分散型 脂組成物,其中該光聚合性化合物含有以通式(1 ) 合物: HOOC-Y-CO-O- -X-0-C0-Z-C0-0- -X-0-C0-Y-C00H _ COOH Jn 〔式中,η係1〜20之整數,Y係二羧酸酐化合物 後之殘基,Ζ係四羧酸二酐化合物脫除酸酐基後之 以通式(2 )所代表之化合物: 0 o-ch2chch2-oc-ch=ch2 ,式中R,、R2係分別為Η、CH3、或
Ra 感放射線樹 ;劑, 光聚合性化 感放射線樹 终聚物。 感放射線樹 感放射線樹 所代表之化 …⑴ 脫除酸酐基 殘基,X係 …⑵ -34- I3.2_0 ,其中R3為H或CH3〕。 9. 如申請專利範圍第1或4項所述之顏料分散型感放射 線樹脂组成物’其中該顏料係黑色顏料。 10. 如申請專利範圍第1或4項所述之顏料分散型感放射 線樹脂組成物’其中該顏料係碳黑或鈦黑。 11. 一種形成著色圖案之方法,其特徵為在基板上形成由 如申請專利範圍第1或4項所述之顏料分散型感放射線樹脂組 成物所構成之光聚合性著色組成物層’在該組成物層選擇性地 照射特定波長之光,並加以顯影以形成著色圖案。 12. —種圖案,其特徵為經將如申請專利範圍第丨或4項 中之顏料分散型感放射線樹脂組成物加以光硬化所形成。 13· —種彩色濾光片,其特徵為具有如申請專利範圍第12 項所述之圊案。 -35 ·
TW095119051A 2005-06-28 2006-05-29 Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern TWI326800B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005188894A JP2007010796A (ja) 2005-06-28 2005-06-28 顔料分散型感放射線樹脂組成物および着色パターンの形成方法
JP2005188893A JP4627224B2 (ja) 2005-06-28 2005-06-28 顔料分散型感放射線樹脂組成物および着色パターンの形成方法

Publications (2)

Publication Number Publication Date
TW200708893A TW200708893A (en) 2007-03-01
TWI326800B true TWI326800B (en) 2010-07-01

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TW095119051A TWI326800B (en) 2005-06-28 2006-05-29 Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern

Country Status (4)

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JP (2) JP2007010796A (zh)
KR (1) KR100805862B1 (zh)
CN (1) CN100439946C (zh)
TW (1) TWI326800B (zh)

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* Cited by examiner, † Cited by third party
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KR101386207B1 (ko) * 2007-06-01 2014-04-21 주식회사 케이씨씨 안료 분산액 및 그의 제조방법
JP2009300564A (ja) * 2008-06-11 2009-12-24 Toppan Printing Co Ltd 感光性着色組成物、これを用いたカラーフィルタ及び液晶表示装置
CN101952750B (zh) * 2008-12-18 2012-05-30 凸版印刷株式会社 液晶显示装置用滤色器及液晶显示装置
JP5740184B2 (ja) * 2010-03-25 2015-06-24 富士フイルム株式会社 パターン形成方法及びレジスト組成物
CN105408367B (zh) * 2013-07-19 2017-07-11 Dic株式会社 活性能量射线固化性组合物、使用其的活性能量射线固化性印刷墨和印刷物
JP6123620B2 (ja) * 2013-09-30 2017-05-10 Jsr株式会社 感放射線性樹脂組成物、表示素子の絶縁膜、その形成方法及び表示素子
US10712483B2 (en) * 2015-08-24 2020-07-14 Samsung Electronics Co., Ltd. Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same
KR102152600B1 (ko) * 2018-09-27 2020-09-07 한국세라믹기술원 소수성 세라믹 잉크 조성물
JP7402034B2 (ja) * 2019-12-16 2023-12-20 東京応化工業株式会社 着色感光性組成物、着色膜、着色膜の製造方法及びパターン化された着色膜の製造方法
KR200497302Y1 (ko) 2021-02-18 2023-09-27 주식회사 다우기업 튜브짜개
TW202315897A (zh) 2021-10-06 2023-04-16 日商日本化藥股份有限公司 著色感光性組成物、硬化物、具備硬化物之圖像顯示裝置

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Publication number Priority date Publication date Assignee Title
JP3709565B2 (ja) * 1995-01-25 2005-10-26 三菱化学株式会社 カラーフィルター用重合組成物
JPH08220328A (ja) * 1995-02-09 1996-08-30 Mitsubishi Chem Corp カラーフィルター用重合性組成物
US5908720A (en) * 1995-10-13 1999-06-01 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof
JPH1184125A (ja) 1997-09-12 1999-03-26 Tokyo Ohka Kogyo Co Ltd 色フィルタ用光重合性組成物、および色フィルタの製造方法
JP2002145999A (ja) * 2000-11-15 2002-05-22 Nagase Kasei Kogyo Kk 光重合性不飽和樹脂および該樹脂を含有する感光性樹脂組成物
CN1711503B (zh) * 2002-11-06 2010-05-26 旭硝子株式会社 负型感光性树脂组合物用于制造隔壁的用途
JP2004219809A (ja) * 2003-01-16 2004-08-05 Fuji Photo Film Co Ltd 遮光性感光樹脂組成物、遮光性感光樹脂転写材料、遮光性画像の形成方法、及びカラーフィルター

Also Published As

Publication number Publication date
TW200708893A (en) 2007-03-01
KR20070000993A (ko) 2007-01-03
JP2007010796A (ja) 2007-01-18
KR100805862B1 (ko) 2008-02-21
CN100439946C (zh) 2008-12-03
CN1892264A (zh) 2007-01-10
JP4627224B2 (ja) 2011-02-09
JP2007010795A (ja) 2007-01-18

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