TWI326800B - Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern - Google Patents
Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern Download PDFInfo
- Publication number
- TWI326800B TWI326800B TW095119051A TW95119051A TWI326800B TW I326800 B TWI326800 B TW I326800B TW 095119051 A TW095119051 A TW 095119051A TW 95119051 A TW95119051 A TW 95119051A TW I326800 B TWI326800 B TW I326800B
- Authority
- TW
- Taiwan
- Prior art keywords
- pigment
- resin composition
- sensitive resin
- colored pattern
- type radiation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Epoxy Resins (AREA)
Description
COOH I 0 ch2=ch-co-ch2chch2-o
5·如申請專利範圍第4項所述之顏料分散型 脂组成物’其中更含有用以調整接觸角之高分子黏每 該高分子黏結劑之含量,係在100重量份之該 合物中為5重量份以上、少於5〇重量份。 6. 如申請專利範圍第5項所述之顏料分散型 脂組成物,其中該高分子黏結劑為笨乙烯丙烯酸之 7. 如申請專利範圍第4項所述之顏料分散型 脂組成物,其中該光聚合性化合物為親水性。 8. 如申請專利範圍第4項所述之顏料分散型 脂組成物,其中該光聚合性化合物含有以通式(1 ) 合物: HOOC-Y-CO-O- -X-0-C0-Z-C0-0- -X-0-C0-Y-C00H _ COOH Jn 〔式中,η係1〜20之整數,Y係二羧酸酐化合物 後之殘基,Ζ係四羧酸二酐化合物脫除酸酐基後之 以通式(2 )所代表之化合物: 0 o-ch2chch2-oc-ch=ch2 ,式中R,、R2係分別為Η、CH3、或
Ra 感放射線樹 ;劑, 光聚合性化 感放射線樹 终聚物。 感放射線樹 感放射線樹 所代表之化 …⑴ 脫除酸酐基 殘基,X係 …⑵ -34- I3.2_0 ,其中R3為H或CH3〕。 9. 如申請專利範圍第1或4項所述之顏料分散型感放射 線樹脂组成物’其中該顏料係黑色顏料。 10. 如申請專利範圍第1或4項所述之顏料分散型感放射 線樹脂組成物’其中該顏料係碳黑或鈦黑。 11. 一種形成著色圖案之方法,其特徵為在基板上形成由 如申請專利範圍第1或4項所述之顏料分散型感放射線樹脂組 成物所構成之光聚合性著色組成物層’在該組成物層選擇性地 照射特定波長之光,並加以顯影以形成著色圖案。 12. —種圖案,其特徵為經將如申請專利範圍第丨或4項 中之顏料分散型感放射線樹脂組成物加以光硬化所形成。 13· —種彩色濾光片,其特徵為具有如申請專利範圍第12 項所述之圊案。 -35 ·
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005188894A JP2007010796A (ja) | 2005-06-28 | 2005-06-28 | 顔料分散型感放射線樹脂組成物および着色パターンの形成方法 |
JP2005188893A JP4627224B2 (ja) | 2005-06-28 | 2005-06-28 | 顔料分散型感放射線樹脂組成物および着色パターンの形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200708893A TW200708893A (en) | 2007-03-01 |
TWI326800B true TWI326800B (en) | 2010-07-01 |
Family
ID=37868681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095119051A TWI326800B (en) | 2005-06-28 | 2006-05-29 | Pigment-dispersing type radiation-sensitive resin composition and method of forming colored pattern |
Country Status (4)
Country | Link |
---|---|
JP (2) | JP2007010796A (zh) |
KR (1) | KR100805862B1 (zh) |
CN (1) | CN100439946C (zh) |
TW (1) | TWI326800B (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101386207B1 (ko) * | 2007-06-01 | 2014-04-21 | 주식회사 케이씨씨 | 안료 분산액 및 그의 제조방법 |
JP2009300564A (ja) * | 2008-06-11 | 2009-12-24 | Toppan Printing Co Ltd | 感光性着色組成物、これを用いたカラーフィルタ及び液晶表示装置 |
CN101952750B (zh) * | 2008-12-18 | 2012-05-30 | 凸版印刷株式会社 | 液晶显示装置用滤色器及液晶显示装置 |
JP5740184B2 (ja) * | 2010-03-25 | 2015-06-24 | 富士フイルム株式会社 | パターン形成方法及びレジスト組成物 |
CN105408367B (zh) * | 2013-07-19 | 2017-07-11 | Dic株式会社 | 活性能量射线固化性组合物、使用其的活性能量射线固化性印刷墨和印刷物 |
JP6123620B2 (ja) * | 2013-09-30 | 2017-05-10 | Jsr株式会社 | 感放射線性樹脂組成物、表示素子の絶縁膜、その形成方法及び表示素子 |
US10712483B2 (en) * | 2015-08-24 | 2020-07-14 | Samsung Electronics Co., Ltd. | Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same |
KR102152600B1 (ko) * | 2018-09-27 | 2020-09-07 | 한국세라믹기술원 | 소수성 세라믹 잉크 조성물 |
JP7402034B2 (ja) * | 2019-12-16 | 2023-12-20 | 東京応化工業株式会社 | 着色感光性組成物、着色膜、着色膜の製造方法及びパターン化された着色膜の製造方法 |
KR200497302Y1 (ko) | 2021-02-18 | 2023-09-27 | 주식회사 다우기업 | 튜브짜개 |
TW202315897A (zh) | 2021-10-06 | 2023-04-16 | 日商日本化藥股份有限公司 | 著色感光性組成物、硬化物、具備硬化物之圖像顯示裝置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3709565B2 (ja) * | 1995-01-25 | 2005-10-26 | 三菱化学株式会社 | カラーフィルター用重合組成物 |
JPH08220328A (ja) * | 1995-02-09 | 1996-08-30 | Mitsubishi Chem Corp | カラーフィルター用重合性組成物 |
US5908720A (en) * | 1995-10-13 | 1999-06-01 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof |
JPH1184125A (ja) | 1997-09-12 | 1999-03-26 | Tokyo Ohka Kogyo Co Ltd | 色フィルタ用光重合性組成物、および色フィルタの製造方法 |
JP2002145999A (ja) * | 2000-11-15 | 2002-05-22 | Nagase Kasei Kogyo Kk | 光重合性不飽和樹脂および該樹脂を含有する感光性樹脂組成物 |
CN1711503B (zh) * | 2002-11-06 | 2010-05-26 | 旭硝子株式会社 | 负型感光性树脂组合物用于制造隔壁的用途 |
JP2004219809A (ja) * | 2003-01-16 | 2004-08-05 | Fuji Photo Film Co Ltd | 遮光性感光樹脂組成物、遮光性感光樹脂転写材料、遮光性画像の形成方法、及びカラーフィルター |
-
2005
- 2005-06-28 JP JP2005188894A patent/JP2007010796A/ja active Pending
- 2005-06-28 JP JP2005188893A patent/JP4627224B2/ja active Active
-
2006
- 2006-05-29 TW TW095119051A patent/TWI326800B/zh active
- 2006-06-26 CN CNB2006100946964A patent/CN100439946C/zh active Active
- 2006-06-26 KR KR1020060057305A patent/KR100805862B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TW200708893A (en) | 2007-03-01 |
KR20070000993A (ko) | 2007-01-03 |
JP2007010796A (ja) | 2007-01-18 |
KR100805862B1 (ko) | 2008-02-21 |
CN100439946C (zh) | 2008-12-03 |
CN1892264A (zh) | 2007-01-10 |
JP4627224B2 (ja) | 2011-02-09 |
JP2007010795A (ja) | 2007-01-18 |
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