TWI326799B - - Google Patents

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Publication number
TWI326799B
TWI326799B TW093122996A TW93122996A TWI326799B TW I326799 B TWI326799 B TW I326799B TW 093122996 A TW093122996 A TW 093122996A TW 93122996 A TW93122996 A TW 93122996A TW I326799 B TWI326799 B TW I326799B
Authority
TW
Taiwan
Prior art keywords
acrylate
weight
ether
film
radiation
Prior art date
Application number
TW093122996A
Other languages
English (en)
Chinese (zh)
Other versions
TW200510932A (en
Inventor
Hideki Nishimura
Takaki Minowa
Eiichiro Urushihara
Eiji Takamoto
Michinori Nishikawa
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200510932A publication Critical patent/TW200510932A/zh
Application granted granted Critical
Publication of TWI326799B publication Critical patent/TWI326799B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW093122996A 2003-07-31 2004-07-30 Radiation-sensitive resin composition, interlayer insulating film, microlens and their manufacturing method TW200510932A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003283291A JP4127150B2 (ja) 2003-07-31 2003-07-31 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法

Publications (2)

Publication Number Publication Date
TW200510932A TW200510932A (en) 2005-03-16
TWI326799B true TWI326799B (ko) 2010-07-01

Family

ID=34268219

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093122996A TW200510932A (en) 2003-07-31 2004-07-30 Radiation-sensitive resin composition, interlayer insulating film, microlens and their manufacturing method

Country Status (3)

Country Link
JP (1) JP4127150B2 (ko)
KR (1) KR101021725B1 (ko)
TW (1) TW200510932A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI570503B (zh) * 2012-03-27 2017-02-11 日產化學工業股份有限公司 感光性樹脂組成物

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101221468B1 (ko) * 2005-01-27 2013-01-11 주식회사 동진쎄미켐 감광성 수지 조성물
KR100758879B1 (ko) * 2006-07-13 2007-09-14 제일모직주식회사 컬러필터 보호막용 일액형 열경화성 수지 조성물
KR100908694B1 (ko) * 2006-08-07 2009-07-22 도쿄 오카 고교 가부시키가이샤 층간절연막용 감광성 수지조성물 및 층간절연막의 형성방법
JP4935565B2 (ja) * 2007-08-01 2012-05-23 住友化学株式会社 感光性樹脂組成物
JP5240459B2 (ja) * 2008-02-19 2013-07-17 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法
WO2009122853A1 (ja) * 2008-03-31 2009-10-08 Jsr株式会社 ポジ型感放射線性樹脂組成物、マイクロレンズおよびマイクロレンズの形成方法
CN112334500B (zh) * 2018-08-10 2022-12-13 株式会社大阪曹達 丙烯酸共聚物和橡胶材料
JP7451270B2 (ja) 2020-04-09 2024-03-18 Jsr株式会社 感放射線性組成物の処理方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3114166B2 (ja) * 1992-10-22 2000-12-04 ジェイエスアール株式会社 マイクロレンズ用感放射線性樹脂組成物
KR100252546B1 (ko) * 1997-11-01 2000-04-15 김영환 공중합체 수지와 포토레지스트 및 그 제조방법
SG85221A1 (en) * 1999-12-01 2001-12-19 Jsr Corp Radiation sensitive composition and color liquid crystal display device
JP3965868B2 (ja) * 2000-06-12 2007-08-29 Ｊｓｒ株式会社 層間絶縁膜およびマイクロレンズ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI570503B (zh) * 2012-03-27 2017-02-11 日產化學工業股份有限公司 感光性樹脂組成物

Also Published As

Publication number Publication date
KR20050014742A (ko) 2005-02-07
KR101021725B1 (ko) 2011-03-15
JP4127150B2 (ja) 2008-07-30
JP2005049720A (ja) 2005-02-24
TW200510932A (en) 2005-03-16

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