TW200510932A - Radiation-sensitive resin composition, interlayer insulating film, microlens and their manufacturing method - Google Patents
Radiation-sensitive resin composition, interlayer insulating film, microlens and their manufacturing methodInfo
- Publication number
- TW200510932A TW200510932A TW093122996A TW93122996A TW200510932A TW 200510932 A TW200510932 A TW 200510932A TW 093122996 A TW093122996 A TW 093122996A TW 93122996 A TW93122996 A TW 93122996A TW 200510932 A TW200510932 A TW 200510932A
- Authority
- TW
- Taiwan
- Prior art keywords
- radiation
- resin composition
- sensitive resin
- microlens
- insulating film
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
A radiation-sensitive resin composition is characterized in comprising: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound, (a3) a maleimide monomer containing a hydroxyl group or a carboxyl group, and (a4) an unsaturated compound excluding (a1), (a2) and (a3); and [B] a 1, 2-naphthoquinone diazide compound. The interlayer insulating film and the microlens are produced from the above composition. The radiation-sensitive resin composition has high radiation sensitivity and development margin to form a favorable pattern even when the process time exceeds the optimum developing time in a developing process, and with which a pattern thin film having excellent adhesiveness can be easily formed.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003283291A JP4127150B2 (en) | 2003-07-31 | 2003-07-31 | Radiation-sensitive resin composition, interlayer insulating film and microlens, and production method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200510932A true TW200510932A (en) | 2005-03-16 |
TWI326799B TWI326799B (en) | 2010-07-01 |
Family
ID=34268219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093122996A TW200510932A (en) | 2003-07-31 | 2004-07-30 | Radiation-sensitive resin composition, interlayer insulating film, microlens and their manufacturing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4127150B2 (en) |
KR (1) | KR101021725B1 (en) |
TW (1) | TW200510932A (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101221468B1 (en) * | 2005-01-27 | 2013-01-11 | 주식회사 동진쎄미켐 | Photosensitive resin composition |
KR100758879B1 (en) * | 2006-07-13 | 2007-09-14 | 제일모직주식회사 | One-solution type thermosetting composition for protective film of color filter |
KR100908694B1 (en) * | 2006-08-07 | 2009-07-22 | 도쿄 오카 고교 가부시키가이샤 | Photosensitive resin composition for interlayer insulating film and method of forming interlayer insulating film |
JP4935565B2 (en) * | 2007-08-01 | 2012-05-23 | 住友化学株式会社 | Photosensitive resin composition |
JP5240459B2 (en) * | 2008-02-19 | 2013-07-17 | Jsr株式会社 | Radiation-sensitive resin composition, interlayer insulating film, microlens and method for forming them |
WO2009122853A1 (en) * | 2008-03-31 | 2009-10-08 | Jsr株式会社 | Positive radiation-sensitive resin composition, microlens, and method for forming microlens |
KR101874838B1 (en) * | 2012-03-27 | 2018-07-05 | 닛산 가가쿠 고교 가부시키 가이샤 | Photosensitive resin composition |
EP3835331A4 (en) * | 2018-08-10 | 2022-05-25 | Osaka Soda Co., Ltd. | Acrylic copolymer and rubber material |
JP7451270B2 (en) | 2020-04-09 | 2024-03-18 | Jsr株式会社 | Method for processing radiation-sensitive compositions |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3114166B2 (en) * | 1992-10-22 | 2000-12-04 | ジェイエスアール株式会社 | Radiation-sensitive resin composition for microlenses |
KR100252546B1 (en) * | 1997-11-01 | 2000-04-15 | 김영환 | Polymer resin and method for preparing the same |
SG85221A1 (en) * | 1999-12-01 | 2001-12-19 | Jsr Corp | Radiation sensitive composition and color liquid crystal display device |
JP3965868B2 (en) * | 2000-06-12 | 2007-08-29 | Jsr株式会社 | Interlayer insulation film and microlens |
-
2003
- 2003-07-31 JP JP2003283291A patent/JP4127150B2/en not_active Expired - Lifetime
-
2004
- 2004-07-30 KR KR1020040060105A patent/KR101021725B1/en active IP Right Grant
- 2004-07-30 TW TW093122996A patent/TW200510932A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP4127150B2 (en) | 2008-07-30 |
KR20050014742A (en) | 2005-02-07 |
TWI326799B (en) | 2010-07-01 |
JP2005049720A (en) | 2005-02-24 |
KR101021725B1 (en) | 2011-03-15 |
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