TWI319521B - A plotting device and a plotting method - Google Patents

A plotting device and a plotting method

Info

Publication number
TWI319521B
TWI319521B TW094119936A TW94119936A TWI319521B TW I319521 B TWI319521 B TW I319521B TW 094119936 A TW094119936 A TW 094119936A TW 94119936 A TW94119936 A TW 94119936A TW I319521 B TWI319521 B TW I319521B
Authority
TW
Taiwan
Prior art keywords
image drawing
exposure
heads
inter
plotting
Prior art date
Application number
TW094119936A
Other languages
English (en)
Other versions
TW200608159A (en
Inventor
Katsumi Sumi
Takayuki Uemura
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200608159A publication Critical patent/TW200608159A/zh
Application granted granted Critical
Publication of TWI319521B publication Critical patent/TWI319521B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P31/00—Antiinfectives, i.e. antibiotics, antiseptics, chemotherapeutics
    • A61P31/04—Antibacterial agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Communicable Diseases (AREA)
  • Oncology (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Organic Chemistry (AREA)
  • Pharmacology & Pharmacy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Facsimile Heads (AREA)
TW094119936A 2004-06-17 2005-06-16 A plotting device and a plotting method TWI319521B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004179587 2004-06-17

Publications (2)

Publication Number Publication Date
TW200608159A TW200608159A (en) 2006-03-01
TWI319521B true TWI319521B (en) 2010-01-11

Family

ID=35480196

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094119936A TWI319521B (en) 2004-06-17 2005-06-16 A plotting device and a plotting method

Country Status (4)

Country Link
US (1) US7177011B2 (zh)
KR (1) KR20060049398A (zh)
CN (1) CN1716101A (zh)
TW (1) TWI319521B (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200606601A (en) * 2004-06-17 2006-02-16 Fuji Photo Film Co Ltd A plotting device and a plotting method
WO2006104171A1 (ja) * 2005-03-28 2006-10-05 Fujifilm Corporation 画像記録方法及び装置
JP4606949B2 (ja) * 2005-03-31 2011-01-05 富士フイルム株式会社 描画装置および描画方法
KR100841291B1 (ko) * 2007-02-13 2008-06-26 주식회사 프로텍 노광장치에서의 스테이지 이송구조
KR100866643B1 (ko) * 2007-02-13 2008-11-04 주식회사 프로텍 스캐너를 이용한 노광장치
KR20100030999A (ko) * 2008-09-11 2010-03-19 삼성전자주식회사 마스크리스 노광 장치 및 이를 이용한 정렬 오차의 보상 방법
JP5078163B2 (ja) * 2008-12-05 2012-11-21 富士フイルム株式会社 マルチビーム露光走査方法及び装置並びに印刷版の製造方法
CN104411095A (zh) * 2014-11-29 2015-03-11 惠州市金百泽电路科技有限公司 一种提高聚四氟乙烯与阻焊油墨结合力的表面改性工艺
US10254112B1 (en) * 2015-10-29 2019-04-09 National Technology & Engineering Solutions Of Sandia, Llc Full-field surface roughness
JP6590638B2 (ja) * 2015-10-29 2019-10-16 株式会社オーク製作所 露光装置用露光ヘッドおよび露光装置用投影光学系

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5984470A (en) * 1995-04-20 1999-11-16 Canon Kabushiki Kaisha Apparatus for producing color filter with alignment error detection
JPH09277571A (ja) * 1996-04-08 1997-10-28 Canon Inc カラーフィルタ製造装置および方法ならびにカラーフィルタ
JP4114184B2 (ja) 2001-12-28 2008-07-09 株式会社オーク製作所 多重露光描画装置および多重露光描画方法
JP2004009595A (ja) 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光ヘッド及び露光装置

Also Published As

Publication number Publication date
US20050280793A1 (en) 2005-12-22
US7177011B2 (en) 2007-02-13
KR20060049398A (ko) 2006-05-18
TW200608159A (en) 2006-03-01
CN1716101A (zh) 2006-01-04

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees