TW200707100A - Process for forming permanent pattern - Google Patents

Process for forming permanent pattern

Info

Publication number
TW200707100A
TW200707100A TW095122940A TW95122940A TW200707100A TW 200707100 A TW200707100 A TW 200707100A TW 095122940 A TW095122940 A TW 095122940A TW 95122940 A TW95122940 A TW 95122940A TW 200707100 A TW200707100 A TW 200707100A
Authority
TW
Taiwan
Prior art keywords
photo
pixel portion
forming
exposing
permanent pattern
Prior art date
Application number
TW095122940A
Other languages
Chinese (zh)
Inventor
Masanobu Takashima
Katsuto Sumi
Kazuteru Kowada
Issei Suzuki
Takayuki Uemura
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200707100A publication Critical patent/TW200707100A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The object is to provide a process for forming a permanent pattern which is capable of forming said permanent pattern in high fineness with more better efficiency by balancing the influence caused by the variation of exposure light and inhibiting the distortion of an image formed on a photo-sensitive layer. Therefore, provided is a process for forming a permanent pattern characterized in comprising, after forming a photo-sensitive layer on a support by using a photo-sensitive composition, exposing the said photo-sensitive layer by using an exposing head which is equipped with a light-irradiating means and a light-modulating means, and is located at a predetermined inclined angle θ with the line orientation of said pixel portion, through determining said pixel portion used in a N-times (provided that N is a nature number of 2 or more) expose by a used-pixel portion-determining means to said exposing head, conducting the control of said pixel portion to that only the said designated pixel portions take part in exposure by a pixel portion-controlling means, and exposing said photo-sensitive layer conducted by relatively moving the said exposing head to the scanning orientation.
TW095122940A 2005-06-28 2006-06-26 Process for forming permanent pattern TW200707100A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005188722A JP2007010785A (en) 2005-06-28 2005-06-28 Method for forming permanent pattern

Publications (1)

Publication Number Publication Date
TW200707100A true TW200707100A (en) 2007-02-16

Family

ID=37595139

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095122940A TW200707100A (en) 2005-06-28 2006-06-26 Process for forming permanent pattern

Country Status (5)

Country Link
JP (1) JP2007010785A (en)
KR (1) KR20080020591A (en)
CN (1) CN101189557A (en)
TW (1) TW200707100A (en)
WO (1) WO2007000885A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI725468B (en) * 2019-07-05 2021-04-21 新代科技股份有限公司 Light-heating curing apparatus

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JP4903479B2 (en) 2006-04-18 2012-03-28 富士フイルム株式会社 Metal pattern forming method, metal pattern, and printed wiring board
JP5182913B2 (en) * 2006-09-13 2013-04-17 大日本スクリーン製造株式会社 Pattern drawing apparatus and pattern drawing method
EP2391924B1 (en) 2009-01-29 2013-07-24 Digiflex Ltd. Process for producing a photomask on a photopolymeric surface
JP5698925B2 (en) * 2009-06-26 2015-04-08 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Compositions and methods for forming electronic devices
DE102009046809B4 (en) * 2009-11-18 2019-11-21 Kleo Ag exposure system
DK2538960T3 (en) * 2010-02-27 2016-11-07 Univ Stellenbosch Surfactant preparations comprising the polypeptide complexes
JP5707779B2 (en) * 2010-08-24 2015-04-30 日立化成株式会社 Photosensitive resin composition, photosensitive film, rib pattern forming method, hollow structure forming method, and electronic component
KR101999497B1 (en) * 2012-08-28 2019-07-11 가부시키가이샤 니콘 Pattern forming device
CN102890426B (en) * 2012-09-18 2014-05-14 天津芯硕精密机械有限公司 Oblique scan display method in direct writing photoetching system
CN105068384B (en) * 2015-08-12 2017-08-15 杭州思看科技有限公司 A kind of laser projector time for exposure control method of hand-held laser 3 d scanner
CN114185250A (en) * 2016-12-20 2022-03-15 Ev 集团 E·索尔纳有限责任公司 Apparatus and method for exposing a photosensitive layer

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JPH07261388A (en) * 1994-03-25 1995-10-13 Hitachi Chem Co Ltd Production of photosensitive resin composition, photosensitive element using the same and plating resist
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JPH09152660A (en) * 1995-09-27 1997-06-10 Fuji Photo Film Co Ltd Image printer
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JP3496674B2 (en) * 1997-11-28 2004-02-16 日立化成工業株式会社 Photocurable resin composition and photosensitive element using the same
JP4036550B2 (en) * 1998-11-25 2008-01-23 日本化薬株式会社 Radiation sensitive polyester resin and negative resist composition using the same
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JP4731787B2 (en) * 2002-04-10 2011-07-27 富士フイルム株式会社 Exposure head and exposure apparatus
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JP2004009595A (en) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd Exposure head and exposure device
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI725468B (en) * 2019-07-05 2021-04-21 新代科技股份有限公司 Light-heating curing apparatus

Also Published As

Publication number Publication date
WO2007000885A1 (en) 2007-01-04
CN101189557A (en) 2008-05-28
KR20080020591A (en) 2008-03-05
JP2007010785A (en) 2007-01-18

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