TW200706394A - Process for proudcing color filter, color filter and display device - Google Patents

Process for proudcing color filter, color filter and display device

Info

Publication number
TW200706394A
TW200706394A TW095121978A TW95121978A TW200706394A TW 200706394 A TW200706394 A TW 200706394A TW 095121978 A TW095121978 A TW 095121978A TW 95121978 A TW95121978 A TW 95121978A TW 200706394 A TW200706394 A TW 200706394A
Authority
TW
Taiwan
Prior art keywords
color filter
exposure
photosensitive layer
display device
drawing portions
Prior art date
Application number
TW095121978A
Other languages
Chinese (zh)
Inventor
Morimasa Sato
Katsuto Sumi
Kazuteru Kowada
Issei Suzuki
Takayuki Uemura
Mitsutoshi Tanaka
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200706394A publication Critical patent/TW200706394A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Sustainable Development (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)

Abstract

The invention provides a process for producing a color filter with high precision, which is excellent in display characteristic and low-cost and do not use a photomask, especially the line width variation of the black image being very low, a color filter, and a display device. Therefore, the process for producing a color filter comprises a step of forming photosensitive layer by forming at least a photosensitive layer on the surface of a substrate, an exposure step of conducting exposure by using an exposure head arranged so as to form a predetermined tilt angle θ, specifying the drawing portions used for N-overlay exposure (wherein N is a natural number) from above useful drawing portions, conducting the control of the above drawing portions so as to participate the exposure by the specified above drawing portions only, and carrying out the exposure by relatively moving the exposure heads in the scanning direction with respect to the above photosensitive layer, and a development step by developing the exposed above photosensitive layer. The present invention also provides a color filter produced by said production process and a display device using the color filter.
TW095121978A 2005-06-22 2006-06-20 Process for proudcing color filter, color filter and display device TW200706394A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005182677A JP2008233112A (en) 2005-06-22 2005-06-22 Production method of color filter, and color filter and display unit

Publications (1)

Publication Number Publication Date
TW200706394A true TW200706394A (en) 2007-02-16

Family

ID=37570373

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121978A TW200706394A (en) 2005-06-22 2006-06-20 Process for proudcing color filter, color filter and display device

Country Status (3)

Country Link
JP (1) JP2008233112A (en)
TW (1) TW200706394A (en)
WO (1) WO2006137343A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9776362B2 (en) 2014-10-27 2017-10-03 Industrial Technology Research Institute Additive manufacturing system and additive manufacturing method

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011064749A (en) * 2009-09-15 2011-03-31 Dnp Fine Chemicals Co Ltd Photosensitive colored composition
KR20120021488A (en) * 2010-08-03 2012-03-09 주식회사 동진쎄미켐 Negative photosensitive resin composition
JP5611016B2 (en) * 2010-12-07 2014-10-22 株式会社日立ハイテクノロジーズ Exposure apparatus, exposure method, and manufacturing method of display panel substrate
WO2013065429A1 (en) * 2011-11-04 2013-05-10 株式会社ニコン Substrate processing apparatus and substrate processing method
KR102259562B1 (en) * 2014-03-31 2021-06-03 엘지디스플레이 주식회사 The exposure mask for liquid crystal display device and exposure method of liquid crystal display device using thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4731787B2 (en) * 2002-04-10 2011-07-27 富士フイルム株式会社 Exposure head and exposure apparatus
JP2004157219A (en) * 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd Exposure head and exposure apparatus
JP2004347831A (en) * 2003-05-22 2004-12-09 Fuji Photo Film Co Ltd Color filter
JP4486323B2 (en) * 2003-06-10 2010-06-23 富士フイルム株式会社 Pixel position specifying method, image shift correcting method, and image forming apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9776362B2 (en) 2014-10-27 2017-10-03 Industrial Technology Research Institute Additive manufacturing system and additive manufacturing method

Also Published As

Publication number Publication date
WO2006137343A1 (en) 2006-12-28
JP2008233112A (en) 2008-10-02

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