TWI305191B - - Google Patents

Description

1305191,w ninth, the invention is related to the invention. The present invention relates to a method of using a substrate dust removing device and a substrate carrying dust removing device 1 for transporting a glass plate, a synthetic resin plate or a metal; In the case of dust or dust (hereinafter referred to as dust) attached to the surface of the substrate, ultra-sonic air (hereinafter collectively referred to as washing air) which is simply washed with air or vibrated at a supersonic frequency is used. After the dust is scattered, it is sucked and removed.

[Prior Art] A substrate dust removal device for a substrate is described in the side reference sheet. Figs. 18 and 19 are explanatory views of a conventional dust transporting device for a substrate. Fig. 20 is an explanatory view for explaining the bending of the substrate, and Fig. 2(a) is an explanatory view showing the f-curve of the front end of the substrate. FIG. 2()(b) is an explanatory view showing the bending of the intermediate position of the substrate. As shown in FIG. 18 and FIG. 19, the substrate G is transported toward the substrate «direction (arrow direction a) on the transport roller (10), and the dust removing unit 2 is removed by the dust removing unit 2. The dust removing unit 200 includes the lower dust removing unit 21〇. The upper dust removing unit 220 and the upper dust removing unit 21 and the upper dust removing unit 22 are dusted on the front surface of the substrate G. The lower dust removing tray 210 is configured by arranging the suction chamber 211, the jet chamber 212, and the suction chamber along the substrate conveyance direction (arrow & direction), and is disposed in

Carry roller 1 0 0 side (lower side). Suction chamber 2 J i, 2 J

Zid and suction not shown on the map

The air pump is connected, and the jet chamber 212 is connected to the air pump of the A. Inhale

2146-7329-PF 5 1305191 The chamber 2U, the jet chamber 212, and the suction chamber 213 each include a suction slit 2i4, a discharge slit 21 5', and a suction slit 2 j 6 . Similarly, the upper dust removing unit 220 is disposed on the side (upper side) of the non-transporting roller m along the substrate conveyance direction (the arrow chamber & the direction of the intake chamber 22, the jet chamber 222, and the suction chamber 223). The chambers 221 and M3 are connected to an air suction pump (not shown), and the air chamber 222 is connected to a windshield (not shown). The air suction chamber 221, the air chamber 222 and the air suction chamber m each include a suction slit 224 and a discharge slit 225. In the 18th view, the lower dust removing unit 21D and the upper dust removing unit 22 are disposed to face each other in the vertical direction, and the substrate G is transported between the lower dust removing unit 21A and the upper dust removing unit 220. When the substrate G is located between the lower dust removing unit 210 and the upper dust removing unit 22G, the interval between the dust removing unit 210 and the distance from the surface of the substrate G to the upper dust removing unit 220 is substantially the same. " As shown in Figs. 18 and 19, the side of the front end of the substrate G is opposite to the lower side dust removing unit 21, the upper side dust removing unit 22 (), the suction gap mountain, 216, 224, 226, and the ejection slit 215', The longitudinal direction of 225' is roughly The lower side dust removing unit 21Q picks up the washing air from the air blowing chamber 212, and sucks the air by the suction chambers 2U and 213 to remove the dust which is separated by the washing air. Next: the dust removing unit 21 The surface to be dust-removed to the substrate G is a substrate surface facing the lower dust removing unit 210 (back surface in Fig. 18). Similarly, in the upper dust removing unit 22G, air is blown from the air blowing chamber, and the air suction chamber 221 is used. 223, attracting and removing the knee-washing air

2146-7329-PF 6 1305191 Dust. The upper side dust removing unit 220 dusts the dust removing object of the substrate G to the substrate surface which is opposed to π 220 (the surface is shown in Fig. 8). ..... In the case of the substrate (for the substrate), the air flowing through the side of the substrate G is removed by the air, and the attraction of the shell is utilized. The air flowing on the side of the lower dust removing unit generates the suction force to the lower side by the thin waist tube effect, but the substrate G is stably transported by adjusting the balance of the thin waist tube effect to increase the suction force to the lower side. . In addition, in the prior art of such a substrate for carrying a dust-removing device, the patent of the patent application is disclosed in Japanese Patent Application Laid-Open No. 2003-332401. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2003-332401 (paragraph No. 0027 to 0036, FIG. 3) SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION On a substrate G, in recent years, a TFT (Thin Film Transistor) liquid crystal panel and a PDP ( The demand for glass substrates used for plasma display panels and 4 LCDs (liquid crystal displays) has increased. In order to prevent damage, such a glass substrate is handled by making the glass substrate elastic. In order to ensure elasticity, the thickness of the glass substrate tends to be thin. As the glass substrate becomes thinner, the weight of the glass substrate is also gradually reduced. Thus, a new problem occurs as the glass substrate becomes thinner. These issues are explained below. (1) The problem of idling

2146-7329-PF 7 1 1305191 8 The substrate transfer dust removing device 1 shown in Fig. 8 is reduced by the weight of the plate G, and is reduced, and the friction between the conveying roller 100 and the substrate G is reduced. At the force reduction, the phenomenon that the transport roller 100 carrying the substrate G is idling can be seen. Therefore, for the handling of the vertical silver 6 6 * text, it is required to adjust the balance of the thin waist tube effect to increase the downward attraction.曰 (2) Problem of increasing dust removal performance + # : Requires an increase in dust removal performance. In order to increase the dust removal performance, the amount of discharge from 212 and 222 is increased, and the attraction from the work for the substrate G from: -1 221, the suction chambers 213, 223, etc. also needs to be changed. Under the balance of the waist tube effect, the pressure of the Sabine spray b can be increased to remove the dust. Also consider the above (1) Γ problem day. I think that under the increase of the discharge pressure and the suction pressure, the balance of the fine waist effect is adjusted, and the attraction to the lower side is increased. (3) The problem of vibration is especially caused by the occurrence of the 20th. The bending shown in Fig. 4 shows a problem that the substrate g vibrates. This vibration will be described. In addition, for the sake of simplicity, the suction slits 214 and 224 are VIs), the V1 slits, and the slits 215. 225, is a p-slot, and the suction slit 216' 226 is a slit of 2, which is explained by the main dust-removing unit 21 at the lower side and the substrate G between the upper dust-removing unit (10) as shown in Fig. 18 The slits 215, 225 are in a state in which the air is washed by the knee-washing air, and the air becomes a turbulent state. Under this condition, the substrate G travels, as shown in Figs. 18 and 19, to the suction chamber. When the 2u and m are just below, the oblique line of the front end of the substrate G of the second figure is located between the upper and lower slits, and the air

2146-7329-PF 8 1305191 π 鏠 向上 向上 , , , , , , , , , , 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难 难Dust force difference occurs (p-slot-V2 gap between the ink force is more than p-slit---------------------------------------------------- Thus, the balance of the thin waist tube effect is lost.本Although the use of the cleaning air flowing on the top and bottom of the substrate G on both sides produces the attraction of the thin waist tube effect on both sides, and the flat (four) fixed transport base using the thin waist tube effect, but in Figure 18, In the situation of Fig. 19, the balance between the lower side dust removing unit 210 and the upper side dust removing unit (10) (4) in the p-slit, 1:VI gap is small. In this case, when the front end reaches the p-slit as shown in Fig. 20(a), the substrate G receives air from the upper and lower p-slits on the front and back surfaces, and the linear ejection force acts on the substrate G from above and below. At the front end (please refer to the hatched portion of the front end of the substrate G in Fig. 19), the front end of the substrate G vibrates in the vertical direction. Further, as the elasticity of the substrate G increases, the amount of vibration increases. In the case where the front end of the substrate G is moved downward, the load is generated by the transport roller 100. However, when the front end of the substrate G is moved up and down, the upward force is applied to the substrate 因 because it is not limited. Here, as the weight of the substrate G is reduced, it may actually be easy to lift. Therefore, there is a desire to influence such vibration. And (4) the problem of bending.

The thinned substrate G is easily bent due to its elasticity. For example, when the front end of the substrate 受到 is attracted and bent as shown in the second 〇H (a), the force of the conveyance roller 1 in the vicinity of the lower dust removing unit 210 is increased, and the wheel resistance of the braking force becomes Large, and, on the outside, the roller is 1 〇〇, but the substrate 〇 2146-7329-PF 9 1305191 is difficult to convey the rotational force. These effects are mutually multiplied and have problems. In addition, as shown in Fig. 20(b), although the bending system is also a problem that often occurs during transportation, in this case, the substrate G is selected by the carrying roller 100 on both sides. The amount becomes smaller, as shown in Fig. 2(a), only before considering it. «To solve the problem of the previous (1) ~ (8), check; tune:, 'the balance of the waist effect of the field to increase the attractiveness of the lower side, but the attraction of the lower side of the D, H brother, there are zero songs instead There is also a desire to suppress bending. Therefore, in order to solve the above-described problems, an object of the present invention is to provide a method of using a substrate dust removing device and a substrate dust removing device, which prevent bending or vibration when the front end of the substrate is introduced into the dust removing unit, and the thin waist The balance of effects increases the attractiveness of the lower side, and the thin and flexible substrate also achieves an increase in the attraction of handling or dust. Means for Solving the Problem The method of using the substrate transport dust removing device according to the first aspect of the present invention is a method of using a substrate dust removing device including: the transport device 'supply from the lower side of the substrate The support force transports the substrate to the substrate transport direction; and the dust removing unit, the upper dust removing unit and the lower side of the suction chamber and the jet chamber having at least one of the opposite sides are disposed on opposite sides of the front and back sides of the substrate a dust removing unit, wherein the washing air is sprayed onto the surface of the substrate through a linear slit of the nozzle chamber, and the scattered dust is sucked through the linear slit of the suction chamber, and is characterized in that:

2146-7329-PF 10 1305191 'Look at a substantially quadrangular substrate which is disposed at a predetermined crossing angle in the longitudinal direction of the suction slit of the suction chamber of the dust removing unit and the longitudinal direction of the discharge slit of the jet chamber. The protruding end of the substrate is subjected to dust removal by being conveyed to the dust removing unit as before. Further, the method of using the substrate dust removing device for the substrate of the second application of the present invention is in the scope of the patent application! In the method of using the substrate for transporting the dust removing device, the longitudinal direction of the suction slit and the discharge slit is substantially perpendicular to the substrate transport direction, and the direction of the one side of the substantially quadrangular substrate is inclined at a predetermined crossing angle with respect to the substantially vertical direction of the substrate transport direction. . Further, the method of using the patent application device of the present invention is a method of using the patent dust device, wherein the direction is substantially inclined with respect to the substrate conveyance direction in the longitudinal direction of the substantially vertical slit of the substrate conveyance direction. The substrate for the third aspect of the substrate is transported and removed. The substrate of the first item is transported except that the one side of the square-shaped substrate is in the straight direction 'and the suction slit and the spray are substantially perpendicular to each other at a predetermined crossing angle/the fourth patent application scope of the present invention. The substrate transporting and dust removing device is a substrate transporting dust removing device, comprising: a transporting device that transports a substrate from a lower surface of the substrate and a supporting force to a predetermined substrate conveying direction; and a dust removing unit on both sides of the front and back surfaces of the substrate The upper side dust removing unit and the lower side dust removing unit of at least eight of the suction chambers and the air injection chamber are disposed opposite to each other in two groups, and the washing air is sprayed toward the surface of the substrate via the linear slit of the air injection chamber, and the suction air is passed through the suction chamber. The linear slit attracts scattered dust and is characterized by:

2146-7329-PF 11 1305191 The longitudinal direction of the linear suction slit of the suction chamber of the dust removing unit is substantially parallel to the longitudinal direction of the slit of the jet chamber, and the longitudinal direction of the slit is substantially perpendicular to each other; One side of the square-shaped substrate is in the direction in which the substrate is conveyed: the substantially vertical direction is inclined at a predetermined crossing angle, and the dust is removed by being conveyed to the dust removing unit as the protruding end of the substrate becomes the front end. Further, the substrate transporting dust removing device of the substrate of the fifth aspect of the present invention includes: a transporting device that supplies a supporting force from a lower side of the substrate and transports the substrate in a predetermined substrate transporting direction; And a dust removing unit 兀 'the upper side dust removing unit and the lower side dust removing unit having at least one of the suction chambers and the air blowing chambers are disposed opposite to each other on both sides of the front and rear sides of the substrate, and are linearly connected via the air jet chamber The slit sprays the washing air toward the surface of the substrate to attract the scattered dust through the linear slit of the suction chamber, which is characterized by:

The longitudinal direction of the linear suction slit of the suction chamber of the dust removing unit is parallel to the longitudinal direction of the slit of the jet chamber, and is inclined at a predetermined crossing angle with respect to the substantially vertical direction of the substrate conveying direction; The direction of the transport front end of the substrate adjacent to the four corners of the dust-removing single-day is substantially vertical ', and the dust is removed under the conveyance of the front end of the substrate. Further, the substrate for carrying out the dust removal of the substrate of the sixth aspect of the present application is the base (4) of the patent application scope (4) carrying the dust removing device, wherein the conveying device comprises a bar-shaped carrying roller; The direction of the carrying roller, and the suction chamber of the dust removing unit

The longitudinal direction of the linear suction slit of 2146-7329-PF 12 1305191 is substantially parallel to the longitudinal direction of the linear discharge slit of the jet chamber, and is substantially perpendicular to the substrate conveyance direction. The substrate transfer dust removing device according to claim 5, wherein the conveying device includes a plurality of circular plates arranged in an array direction of inclination. The conveying roller of the circular shape; the arrangement direction of the circular-shaped conveying rollers is arranged substantially parallel to the longitudinal direction of the linear suction slit of the suction chamber of the dust removing unit and the longitudinal ejection slit of the jet chamber, and the substrate is conveyed The substantially vertical direction of the direction is inclined at a predetermined crossing angle. Moreover, the substrate carrying dust removing device of the eighth aspect of the present invention is in the scope of the patent scope 帛 4 to 7 (4) handling removal device, and the thin waist tube of the lower dust removing unit. The attraction of the effect is greater than the attraction of the thin waist tube effect of the upper dust removing unit, and the force for pushing the substrate to the handling device is given. < 丨 , 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板The pressure of the upper side dust removing unit becomes equal, and the discharge pressure from the lower side dust removing unit is increased from the upper side dust collecting unit, and the suction force of the lower side dust removing unit is more attractive than the upper side dust removing unit. The attraction of the tube effect is large and gives the force to push the substrate to the handling device. Further, in the substrate of the tenth aspect of the invention of the present invention, the substrate is transported and removed by the substrate of the eighth item of the patent scope, ^

2146-7329-PF 13 1305191 « By making the discharge pressure from the lower dust removal unit and the discharge pressure from the upper dust removal unit equal, and making the suction pressure of the lower dust removal unit higher than the upper dust removal unit The suction pressure is large, and the suction force of the thin waist tube effect of the lower dust removing unit is larger than the suction force of the thin waist tube effect of the upper dust removing unit, and the force for pushing the substrate to the conveying device is given. Further, in the substrate of the nth aspect of the present invention, the substrate is transported and dust-removed, and the substrate is used for the dust removal device for the substrate of the δth item, wherein "by the lower side dust removing unit to the substrate surface" The interval is adjusted to be smaller than the attraction of the thin waist tube effect of the lower side dust removing unit from the upper side dust removing sheet a to the substrate table φ, and the attraction force of the thin waist tube effect of the upper side dust removing unit is larger than that of the upper side dust removing unit. The force that the device pushes the substrate. Further, the method of using the substrate dust removing device of the substrate of claim 12 of the present invention is the substrate dust removing device for the substrate of the application of the scope of the invention, wherein the measurement is from the lower dust removing unit and the upper dust removing unit. The discharge pressure 'is controlled to stop moving the dust to the dust removing unit when the discharge pressure from the upper dust removing unit is higher than the discharge pressure from the upper dust removing unit. The substrate dust removing device for a substrate according to any one of claims 4 to 12, wherein the lower dust removing unit includes abutting. An auxiliary roller that rotates while transporting the substrate. The substrate dust removing device for a substrate according to claim 14 of the invention of the present invention, wherein the auxiliary roller is disposed on the outer side portion 35 of the loading side of the lower dust removing unit.

2146-7329-PF 14 1305191 Further, the substrate carrying dust removing device of the fifth aspect of the invention is in the substrate dust removing device of the thirteenth or fourteenth aspect of the patent application, wherein the lower dust removing unit sucks The auxiliary roller is disposed in the suction slit of the air chamber. The substrate handling dust removing device according to any one of claims 4 to 5, wherein the lower side is used in the method of the present invention. The dust removing unit and the upper dust removing unit are arranged to arrange the air ejection chamber and the two air suction chambers separated by the air ejection chamber φ in the substrate transport direction. Advantageous Effects of Invention According to the present invention as described above, it is possible to provide a method of using a substrate dust removing device and a substrate carrying dust removing device, so that bending or vibration does not occur when the front end of the substrate is introduced into the dust removing unit, and the waist is adjusted. The balance of the tube effect is such that the attraction of the lower side is increased, and the substrate which is thin and elastic is also capable of achieving stable handling or attraction of dust, etc. [Embodiment] Next, a preferred embodiment of the present invention will be described with reference to the drawings ( The first type of sorrow is a substrate dust removal device and a method of using the same. The figure is an explanatory view showing a substrate dust removing device and a method of using the same. Fig. 2 is a structural diagram of a dust removing device for transporting a substrate. Fig. 3 is a structural view of the moving roller viewed from the direction in which the substrate is conveyed, Fig. 3 (3) is a first structural view, and Fig. 3 is a second structural drawing. Fig. 4 is a sectional view of the dust removing unit. Figure 5 is based on

2146-7329-PF 15 1305191 Explanation of board transportation, Fig. 5 (a) is an explanatory diagram of the state in which the protruding end reaches the suction slit on the front side, and Fig. 5 (b) shows the state in which the protruding end reaches the discharge, and Fig. 5 (4) The protruding end reaches the inner suction gap map. The substrate transfer dust removing device of the present embodiment includes a transport roller 100 and a dust removing unit 2A as shown in the drawings and Fig. 2 . The dust removing unit 2A further includes a lower dust removing unit 21A and an upper dust removing unit 22, and the front and back surfaces of the substrate 6 are dusted by the lower dust removing unit 210 and the upper dust removing unit 22A. 'Handling roller 10. A specific example of the transporting device is a roller that supports and transports the substrate G. The transport roller (10) is structurally supplied with a driving force for transporting the substrate g, or is freely rotatable in structure, and is driven by a substrate G transported by another drive source.

As shown in FIG. 3( a ), the conveyance roller 100 has a long rod-shaped conveyance roller 100 that straddles both sides of the substrate G, and not only a part of the substrate G but also a part of the substrate G as shown in FIG. 3( b ) There are two types (four in the third figure (b)) and two types of the case of the short rod-shaped carrying roller 100. Select this open y state as appropriate. The transport roller 1 of this embodiment will be described below with a long transport roller 100 as shown in Fig. 3(a). As shown in FIG. 4, the lower dust removing unit 207 arranges the air absorbing chamber 211, the air blast chamber 212, and the air absorbing chamber 213 along the substrate transport direction (the 旒& direction) to be disposed on the transport roller 100 side (below). side). The suction chambers 211, 213 are connected to the suction pump, and the jet chamber 212 is connected to a conveying fruit not shown. The suction chamber 211, the air ejection chamber 212, and the suction chamber 213 each include a suction slit 214, a discharge slit 215, and a suction slit 216.

2146-7329-PF 16 1305191 Similarly, the upper dust removing unit 22 is configured by arranging the suction chamber 221, the air ejection chamber 222, and the suction chamber 223 in the substrate conveyance direction (arrow direction a), and is disposed in the non-transport roller 1〇. The side of the squat (upper side). The suction chamber "I" is connected to the suction pump which is not shown in the figure, and the air injection chamber 222 and the air supply pump (not shown) are connected to the air intake valve 221, and the air injection chamber 222 and the air suction chamber 223 each include a suction slit 224 and a spray. The slit 225 and the suction slit 226. It is also known in the second drawing that the lower dust removing unit 21〇 and the upper dust removing unit 配置 are arranged to face each other in the up-and-down direction, and the suction slit 2丨4, the ejection slit 2丨5, and the suction slit are formed. 21, the suction slit 224, the discharge slit 225, and the suction slit 226 are substantially parallel in the longitudinal direction. In particular, the suction slit 214, the discharge slit 215, the suction slit 216, the suction slit 224, the discharge slit 225, and the suction slit 2-6 are formed as The substrate G is transported between the lower dust removing unit 210 and the upper dust removing unit 22A. The substrate g is located between the lower dust removing unit 210 and the upper dust removing unit 22, and is disposed. The interval from the back surface of the substrate G to the lower dust removing unit 21A and the interval from the surface of the substrate g to the upper dust removing unit 220 are substantially equal. Further, in the present embodiment, the jet chamber 212 from the lower dust removing unit 210 is made Squirting pressure The discharge pressure from the upper dust chamber A 220 is large, and the balance is made by the thin waist tube effect to attract downward. The balance of the thin waist tube effect is explained. First, the suction phenomenon using the thin waist tube effect will be described. First, only the upper side dust removing unit 22 is considered. The washing air ejected from the air ejecting chamber 222 has, for example, not reflected as light, and then flows toward the suction chamber 22, but along the surface of the substrate (^). In addition, it becomes narrow in the forward flow path of the upper side dust removing unit 220, and is on the upper side.

2146-7329-PF 17 1305191 The structure of the two outer flow paths of the side dust removing unit 220. In this case, the use of the thin waist tube effect causes the attraction force of the upper side dust removing unit 220 and the substrate G to be attracted due to the fact that the bunker is lowered to the low side of the dust collecting sheet 7L 22G on the upper side of the narrow flow path. In this case, the upper side dust removing unit 22 is mechanically fixed. However, since the substrate G is placed only on the carrying roller, the substrate G is lifted away from the carrying roller 100. Then, the substrate G is attracted to the upper side dust removing unit 220 by the "slim waist tube effect". Therefore, the discharge pressure is similarly applied to the lower dust removing unit 21, and the thin waist tube effect of the lower side suction is applied. At this time, as shown in the foregoing description, the suction pressure of the suction chamber 2U and the suction chamber 213 of the lower dust removing unit 210 and the suction pressure of the suction chamber 221 and the suction chamber 223 of the upper dust removing unit 220 are made equal. Further, the discharge pressure of the jet chamber 212 from the lower dust removing unit 2 is made larger than the discharge pressure of the jet chamber 222 from the upper dust removing unit 22, and the balance is obtained by the thin waist tube effect to attract the lower side. . Therefore, the suction force by the thin waist tube effect of the lower dust removing unit 2 is made larger than the suction force of the upper side dust removing unit 220 by the thin waist tube effect, and the substrate G is brought into contact with the transport roller 1〇〇. The substrate G is, for example, a glass substrate used in a TFT (Thin Film Transistor) liquid crystal panel, a PDP (plasma display panel), or an LCD (Liquid Crystal Display). Only one of the long substrates 6 is shown on the substrate g shown in Figs. 1 to 5 . In this patent specification, the upper surface of the substrate G is defined as a surface, and the lower surface is defined as a back surface. 2146-7329-PF 18 1305191 In particular, in the present embodiment, a glass substrate for a plate is used. Next, the dust removal of this embodiment will be described. The plurality of substrates G are sequentially conveyed on the transport roller (10) provided at predetermined intervals. As shown in FIG. 1 and FIG. 2, the τ substrate G is moved on the conveyance plane by the conveyance roller, and is formed on the basis of the substantially square shape, the side direction, the lower side dust removing unit 210, and the upper side dust removing unit 22. . The suction slits 214, 216, 224, 226 of the suction chambers 213, 221, 223, and 223 and the discharge slits 215, 225 of the jet chambers 212, 222 are vertically conveyed obliquely at a predetermined crossing angle. The longitudinal direction of the suction slits 214, 21B, 〇9β R , 15 224 , 226 and the ejection slits 215 and 225 is substantially perpendicular to the substrate conveyance direction a based on the substrate conveyance direction a, and the edge of the substantially square substrate G is approximately The direction is inclined to the substantially vertical direction of the substrate conveyance direction a by the same angle. The present crossing angle is arranged to constitute an angle α as shown in Fig. 1 (4). The corner angle α of the intersection will be described later. The substrate G in the state of being tilted and moved is moved to the lower dust removing unit 21 〇, and the upper side dust removing device 220 is removed. In this case, the dust removing unit 2 is configured to perform the ejection of the purge air by the jet chambers 212 and m and the suction of the dust by the suction chambers 211, 213, and 221 and the suction chamber 223. In other words, on the substrate G, both sides of the front and back surfaces become the dust-removing target surface. To r = it: The lower side dust removal unit 21° is carried in the direction of the arrow & the substrate G to be dusted. The protruding end G1 of the substrate G is a part of the front end, as shown in Fig. 5 (&)

2146-7329-PF 19 1305191 The protruding end G1 enters the suction slits 214, 216 of the suction chamber 211 '221. In this case, 'the suction pressure acts only on the oblique line portion of the protruding end G1 of the substrate G, and the suction pressure is small'. Since the pressure is not applied to the entire front end as in the prior art (refer to FIG. 9), the possibility of bending is remarkably reduced. Sex. Also, vibration is suppressed. Explain this. In addition, here, in order to simplify § You Ming's Han attracting slits 214, 2 2 4 are V1 slits, and the slits 21 5 and 2 2 5 are P slits, and the suction slits 21 6 and 2 2 6 are V 2 slits. , explain it. As shown in Fig. 4, the upper and lower p slits are inclined toward the opposite side of the substrate conveyance direction a, and the substrate G travels as these p slits. In the state shown in Fig. 5(a) in this case, although the advancement of the substrate G hinders the inflow of air into the V1 slit, the shielding area is narrow, and it is difficult to prevent the washing air from flowing into the upper and lower n slits at once. There is no possibility that the flow of the washing air becomes turbulent. In addition, since the air of the strip is forcibly sent in the direction between the visors by the inclination of the P: gap, most of the air flows between the P-vis. Therefore, the air flow between the P-slot and the V1 gap and the p-sew line on the opposite side, and the air flow balance between the V2 gaps, the pressure between the P-slot-VI gap and the gap-VB2 gap maintains a difference in power. (P gap - the pressure between the V1 slit 13⁄4 and the pressure between the P slit and the V2 slit is almost equal), 1 and 2 will also cause the flow of the scrubbed air to become turbulent ^ plus 14 effects The balance of the thin waist tube effect is maintained. As shown in Fig. 5(b) and Fig. 5(C), the substrate G is transported along the substrate. A. The suction pressure and the discharge pressure are also applied. However, because not only!

2146-7329-PF 20 1305191 *r Plate G from the carrying roller 100 protrudes from the 屮 々 々 plate G", 摅 摅 ~ 里 (hereinafter referred to as the amount of overhang) is much smaller than the base ^. The suction yoke plus the pressure is in the slash area and "t -1 Λ ϋ> ^ - not less than in the past, and also maintains the balance of the thin waist S admin" continues to move under the suppression of bending and vibration, using the lower dust removing unit 210 The sills on both sides. 搬运 The carrying roller on the 旳 side supports the 〇〇. After that, the substrate G' is firmly brought into contact with the conveyance roller 100 by the attraction force and the self-contained one, and "the X-base board G is separated from the conveyance roller 1". Next, the description of the father and the brother of the brother is explained. α. The angle of intersection α is from the acute angle of 45, which is about 1m cut-_#d0. According to the substrate G, the specific value of the appropriate kind and the angle α is determined. Indicates the upper limit of the discharge pressure when the substrate of the glass 400mm > 〇0 0_x thickness 〇·7mni is owed to the more common prong angle (the vibration is generated when the larger 喷 ® ® ® ® ® ® • 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。交叉 Cross angle α 3° Spray pressure 6KPa

8° 12° 8KPa llKPa ~ Add the upper limit of the discharge pressure to increase the inclination. It is presumed that this is because the area of the nozzle discharge pressure (the hatched portion in Fig. 5) is decreased as the cross-reading angle α is decreased, and the biasing force is reduced. According to the above-mentioned one, the 始 + is the ι storm board handling dust removal device and its use method, using the balance of the thin waist tube effect generated by the air flowing above and below the substrate G (4) substrate k stability (4) This is because the substrate (3) enters through the lower side dust removal unit 21 0 and the upper side falls deer. Λ 陈 陈 陈 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀 兀Especially by using the inclined VI slit, P slit, V2 slit, you can face ώ 〆 +〆

^ Will come from the jet room 201P, 301P

2146-7329-PF 21 1305191 It is set to the extent that it has been made to make the soil 3 small and smaller, and it can be transported safely (because the substrate G does not rise in the vicinity of the discharge slit, and the lower side The attraction is weak, and it is difficult to carry the conveyance failure of the substrate G. In addition, if the crossover is as large as the maximum one, the house strength can be increased, and the improvement of the attractiveness or the dust removal performance can be estimated while maintaining the balance of the thin waist tube effect. Next, a second embodiment of the substrate for carrying dust removal and the method of using the same according to the present invention will be described with reference to the drawings. In addition, the same reference numerals are given to the same structures as those described above, and the same reference numerals are given and the description thereof will be omitted. Fig. 6 is a structural view of the substrate for carrying the dust removal in the second form. < The substrate transporting and dust removing device of the present embodiment includes the transporting roller 100, the dust removing unit 200, and the transport control unit 300 as shown in Fig. 6. The transport control unit 300 is added to the structure of the first aspect shown in Fig. 2 In the present embodiment, the substrate transport roller 100 and the dust removing unit 200 are conveyed in the direction of the arrow a in the same manner as in the first embodiment, and the description thereof will be repeated. The transport control unit 300 is shown in FIG. The pressure introduction portion 3, the differential pressure sensor 203, and the drive control portion 3 〇3 are formed. The pressure introduction portion 301 is provided in the chambers of the air ejection chambers 212, 222, and introduces air in the air ejection chambers 212, 222. The pressure sensor 302 inputs air from the two pressure introduction portions 3, and measures the differential pressure of the air to output a differential pressure signal. The drive control unit 303 rotates in response to the self-differential pressure sensor 3〇2. Differential pressure 2246-7329-PF 22 130 5191 #号' Carrying the transport roller〗 〇 Drive control. The transport control unit 3 is not limited to the above-described structure. For example, although not shown, pressure detection may be provided in each of the air chambers 212 and 222. The sensor (converter) measures the discharge pressure of the jet chambers 212 and 222, and respectively outputs a pressure signal, and calculates a differential pressure signal based on the pressure signals transmitted from the two places, and drives the differential pressure signal according to the differential pressure signal. The control unit 303 performs drive control of the transport roller 100. ^ These structures are appropriately selected. For example, in a small-scale device, the shape of the differential sensor 3G2 shown in Fig. 4 is preferably used in view of price. Next, the dust removal of the present embodiment will be described. The plurality of substrates G are sequentially conveyed at predetermined intervals to perform dust removal. f In this case, the lower dust removing unit 21〇 and the upper dust removing unit 22〇_straightening and utilizing the jet chambers 212 and 222 The ejection of the washing air and the suction of the dust by the suction chambers 2, 213, 221, and 223. First, between the lower dust removing unit 21A and the upper dust removing unit 22, the dust-removed substrate G is conveyed in the direction of the arrow a. The front and back surfaces of the substrate g are the dust-removing surface. In this case, the washing pressure of the washing air ejected from the lower air chamber 212 (lower side) of the lower dust removing unit 21 is higher than that from the upper side of the upper dust collecting sheet. The air discharge pressure is large, as shown in the front: the adjustment is adjusted to the lower side suction. Further, in the case where the substrate G is located between the lower side of the lower deer I & ty ! n 〇〇n ^ gB Γ ^ ^ 麈 兀 、 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The interval between the unit 210 and the surface of the substrate (the third surface of the seesaw G to the upper side dust removing unit 22 is

2146-7329-PF 23 1305191 The intervals are approximately equal. On the other hand, in the ejection of the washing air, the differential pressure signal is outputted by the sensor 01 control unit 303 after the introduction of the air via the two pressures to the difference star sensor. The driving force of the driving drive control unit 3〇3 is larger than the discharge pressure of the second embodiment of the second embodiment, and the discharge pressure of the second embodiment of the second embodiment is greater than the discharge pressure of the second embodiment. It is judged to be normal. If the drive control is to be sprayed out repeatedly: Normally, the transporter (10) is rotated, so that the substrate G enters the lower dust removing unit ^ between the upper dust removing unit 220. However, the alien wheel 100 stops. In the case of the hanging heart-controlling city, the suction of the upper side of the dust-removing unit is stopped by the suction state of the lower dust-removing unit A 21G due to the fluctuation of the discharge pressure, and the substrate G is stopped. In the normal state, the conveyance roller 100 is configured to reduce the possibility that the substrate G is lifted off from the conveyance roller (10), and the dust is removed in a state where the substrate G reliably abuts the conveyance roller m. , @ % 1 & The possibility of damage to the low substrate G' is only a minimum of one to carry the roller on the transport mechanism, and does not require a large equipment space or a complicated and arrogant device structure. In particular, it is suitable for the case where both sides of the substrate are required to be washed. Next, a third aspect of the substrate dust removing device and the method of using the same according to the present invention will be described with reference to the drawings. It is to be noted that the same reference numerals are given to the same structures as those of the above-described first embodiment and the second embodiment is omitted. Figure 7 is a carrier dust removal device for this form.

2146-7329-PF 24 1305191 Construction diagram. Figure 8 is a structural diagram of the auxiliary wheel of the Fen, and the 4/v port auxiliary roller. Figure 8 (a) is the first structure diagram, and Figure 8 (b) is the second broadcast 'sheng θ 〇, 弟一结构Figure. Fig. 9 is a structural view of a substrate-carrying dust removal device for improved green. In the case of the substrate for carrying out the dust removal, the auxiliary roller 1〇2 is added to the first embodiment shown in Fig. 2 . The roller 100 and the dust removing unit 20 are transported. The same as the first embodiment, and the repeated description thereof will be omitted. Only the difference points will be described. As shown in Fig. 7, the auxiliary roll is disposed on the lower side of the lower side __^ dust early element 21 0 and the outer side of the carry-out I side. The auxiliary roller 102 is, for example, viewed from the side as shown in Fig. 8(a) as a structure having a localized spoke, or as a second wheel (or three or more rounds) as shown in the figure δ (b). Construction is OK. In this embodiment, the description of the multiple rounds of Fig. 8(b), and the 'successor' will be described with respect to the shape of the character. The dust is separated from the younger brother by the plurality of G at a predetermined interval. In this case, in the dust removing unit 2 (10), - _ straight forwards the use of the jet chambers 212, 222, the washing of the oxygen, and the suction of the dust by the second wind to 21 213, 22, 223. First, the substrate to be removed from the dust removing unit 2 and transported in the direction of 唬a [j. Use the thin waist tube effect to have ~ r -rs to adjust the dust to the lower side of the early squatting 210. The bottom of the suction base ° □ No: the carrying roller 100 'and the auxiliary roller 1 〇 2 support the soil to move. The military 笮 伸 里 里 里 里 在It is still abutting the auxiliary roller 1. 2 • Moving the substrate G under the carrying roller, and is placed on the lower side. Dust removal unit·

2146^7329-PF 25 1305191 Auxiliary roller on both sides 1 02 · Handling roller 1 00. Then, with the attraction force, the substrate G surely abuts the auxiliary roller 1〇2. • The conveyance roller 100 does not cause the substrate G to be separated from the conveyance roller. As described above, in the present embodiment, the effect of transporting the substrate G is not performed without leaving the transport roller, and the auxiliary roller 102 is used by the lower dust removing unit 210 and the upper dust removing unit 70 220. The overhang 1 reduction 'is less likely to attract the front end of the substrate G. Therefore, since it is possible to eliminate the possibility of damage of the substrate G, and to carry the roller 100 and the auxiliary roller 1〇2 to the transport mechanism at a minimum, it is not necessary to have a large equipment space or a complicated and expensive device structure. Further, as shown in Fig. 9, the modified form of the auxiliary roller 〇2 in the second embodiment may have an effect similar to that of the third embodiment. Next, a fourth aspect of the substrate transfer dust removing device and the method of using the same according to the present invention will be described with reference to the drawings. Incidentally, the same configurations as those of the first, second, and third forms II are assigned the same reference numerals and the description thereof will be omitted. Fig. 1G is a structural view of the substrate dust removing device of the present embodiment, and Fig. 11 is an explanatory view of the auxiliary roller structure. Fig. 12 is a structural view of the improved dust removal device for the board. In the present embodiment, the substrate for moving the dust collecting device is provided with the auxiliary roller in the first form, and the third embodiment is different in the arrangement of the auxiliary roller at the position different from each other. y~ The society is in a bad shape. As shown in Fig. 1, the A M 圏 is not in the suction of the lower dust removing unit 210 to the upper side of the 211 and 21 3, and the auxiliary rolling wheel 103 is arranged. For example, as shown in Fig. 11, the auxiliary roller 103 is disposed in the suction chamber twice to the ZU, 2U suction slits 214, 21 6_. In addition, the auxiliary and the private 1 n qj f assist/reinforcement wheel 103 are, for example, as shown in Fig. 8(a).

2146-7329-PF 26 1305191 The substrate conveyance direction is a one-wheel structure, or as shown in Fig. 8(b), the structure is viewed from the side as a plurality of wheels (at least two wheels as shown in Fig. 8(b)). Although the auxiliary roller 103 is made of material, it is possible to ensure that the dust removing performance does not occur as long as the sufficiently large suction slits 214 and 216 are provided which do not affect the suction of the dust. As described above, in the present embodiment, the effect of transporting the substrate G without departing from the transport roller 100 is utilized, and the auxiliary roller 1〇3 is utilized by entering the lower dust removing unit 21G and the upper dust removing unit 220. The outer extension i is reduced, making it less likely to attract the front end of the substrate G. Therefore, since it is possible to eliminate the possibility of damage of the substrate G, and only the conveyance mechanism is limited to the conveyance roller 100 and the auxiliary roller 1〇3, a large equipment space or a complicated and expensive device structure is not required. Further, as shown in Fig. 12, the use of the auxiliary roller 103 in the second form: a good form, and an effect similar to the fourth embodiment. Next, a fifth embodiment of the substrate dust removing device and the method of using the same according to the present invention will be described with reference to the drawings. In addition, the same structure as the first, third, fourth, and fourth configurations is assigned the same reference numerals, and the substrate transfer dust removal pattern of the present invention is omitted. The figure is a diagram for the conveyance of the substrate in this form. ...the substrate for this form is used for the removal of the substrate ==Ming, (4) Figure (4) The 5th brother of the sudden arrival of the protruding end to the suction gap of the front side, Figure 5, α, in the *山图(b) The state of reaching the exiting gap =, = (c) The state in which the protruding end reaches the inner suction slit is an explanatory view of the supporting shaft of the conveying roller. Figure 17 is an explanatory diagram of the auxiliary roller.

2146-7329-PF 27 1305191 Although the substrate for carrying out the dust removal step 1 of the present embodiment has the same structure as the first, second, third, and fourth forms described by M. /, 匁 and the face, but the difference is The lower dust removing unit 210 and the upper dust removing unit 22 are inclined, instead of tilting a certain plate G. In this case, in the lower stage and the rear side of the lower side dust removing unit 2, the carrying roller 1〇4 which is inclined in the arrangement direction is disposed. As shown in the figure, the carrying roller ι〇4 13 has a circular plate shape and is arranged in a plurality of oblique directions. Therefore, the lower side dust removing unit 2 is disposed obliquely. Further, the dust removing unit 200 is inclined, and the suction slits 214, 224, the discharge slits 215, 225, and the suction slits 216, 226 also appear as a line when viewed from the front. Further, the longitudinal direction and the suction chamber 21 of the linear discharge slits 215, 225 of the lower side dust removing unit 210 and the upper side dust removing unit 22, the jet chambers 212, 222 of the upper side dust removing unit 22 are structurally opposed to one side of the substantially square substrate G. The longitudinal direction of the linear attraction slits 214, 216, 224, 226 of 213, 221, 223 is inclined at the parental fork angle. Further, when the substrate conveyance direction a is used as a reference, the one side direction of the substantially square-shaped substrate G is substantially perpendicular to the substrate conveyance direction a, and the longitudinal direction of the discharge slits 215 and 225 and the suction slits 214, 216, 224, and 226 are opposite to the substrate conveyance direction. a is inclined at a predetermined intersection angle. When the projecting end G1 of the seeding substrate G becomes the leading end, it is moved to the dust removing unit 200, and the dust removing parent fork angle is arranged to form an angle as shown in Fig. 14. Next, the dust removal of this form will be described. The plurality of substrates G are sequentially conveyed on the conveyance rollers 100 and 104 provided at predetermined intervals. Inserting the substrate G in the tilted state into the lower dust removing unit 210 and

2146-7329-PF 28 1305191 The upper dust removing unit 9 9 η , & ' performs dust removal. In this case, the lower dust removing unit 21 0 and the upper side dust removing 3 | yuan ^ ^ a , σ 220 total 疋 疋 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 利用 喷气 喷气 喷气 喷气 喷气 喷气 喷气 喷气 喷气 喷气 喷气211, 213, 221, the suction chamber 223, and the spoon are attracted, that is, the substrate G and the front and back surfaces become the dust-removing target surface. The first substrate is placed on the lower side dust removing unit 21 0 in the direction of the arrow a to transport the substrate G to be dusted. A portion of the front end of the projecting end G1 of the substrate G enters the suction chambers 211, 221 as shown in the figure (4). In this case, the suction pressure only acts on the oblique line of the substrate G, and the 丨廒β and the introduction pressure are small, because the pressure is not applied to the front end as a whole (see the first Θ). Figure), significantly reducing the possibility of occurrence of f curvature. Also, regarding vibration, as shown in the description of Figure 4, p-slit - the gap between the VI gaps is 11 i. Air flow between the P-slot and the V2 gap in the middle and the Han side

Quantity balance, in the P-slit to V1 gap gate; PaB, LW gap and p-slot-V2 gap to maintain the pressure difference is 〇 (P-slit ^- y 1 pa ^ ^, V i pressure between the seams and The pressure between the p-slit and the V2 slits is almost equal). The shape of the heart thus adds to these effects to maintain the balance of the thin waist tube effect. In the following, as shown in Fig. 15 (8) and Fig. 15 (7), the substrate G is transported in the transport direction. At this time, the suction pressure and the dust force as indicated by the oblique line portion are applied, but not only the substrate G is white. ·- Storage, apricot ± person, the amount of protrusion of the seesaw b from the transport roller 1〇4 (or the auxiliary roller 102 or the auxiliary roller 103) (the following is the amount of overhanging v μ 栎) is only smaller than the substrate G A part of the full length, and a pound is ^ ^ #刀, and according to the principle described above to maintain the balance of the thin waist tube effect, in the suppression of bending ^ dispatch # continue to move into the 'use the lower dust removal unit 21 〇 ^日,丨&, the carrying roller on both sides of the ZiU 1〇4 (or

2146-7329-PF 29 1305191 Auxiliary roller 102 or auxiliary roller 1〇3) support. Thereafter, the substrate g is firmly contacted to the conveyance rollers 1A and 1B by the attraction force and the self-weight, and the substrate G does not come off the conveyance roller 1 (10). In addition, there are a plurality of 'transport roller 104', but the height is higher than that of the other rollers, and the if roller 1 〇4 is only one case because the substrate G is only located on the moving roller, and the force is set. The position has a defect such as bending of the substrate G. Therefore, the i-th diagram allows the support shaft 105 of the transport roller to be adjusted in height via the leaf spring 106. In the sequential manner, it is possible to avoid the situation where the force is concentrated on one position of the substrate G. Since the positioning relationship is the outermost direction of the arrangement of the carrying rollers, if the plate magazine (10) is removed and only the support shaft 1 0 5 ' is ensured Positioning. - Further, as shown in the figure, the auxiliary roller can be disposed on the upper side of the suction slits 215, 225 of the lower side dust removing unit 21, and the suction groove 215, 225 is disposed on the upper side. Construction > The arrangement direction of the circular-shaped auxiliary rollers and the lower phase of the deer-staying---- hate the vertical direction of the suction slits 215, 225 of the suction chambers 211, 213 of the dust removing chambers. Although such an auxiliary roller 1〇3 exists, it is not necessary to have a problem in dust removal performance as long as a sufficiently large suction port which does not affect the attraction of dust is secured. In the second form, in the present state, not only the same effects as the first to fourth aspects described above can be obtained, but also the substrate G does not need to be placed obliquely in the carrying roller 10 0. t Gan L / / /, to enter the substrate G side of the direction of the substrate transport direction a into a vertical configuration, also automatically set the intersection angle α' can be designed with the pre-existing attraction. Further, the worker does not have to perform the work of tilting only the parent angle α, and the workability can be improved.

2146-7329-PF 30 1305191 Although the above description shows that the younger brother is a five-shaped evil, it is also possible to have various deformed forms. In the case of the first - 窜隹 〜 弟 弟 弟 弟 , , , 下 下 下 下 下 下 下 下 下 下 下 下 下 下 下 下 : : : : : : : : : : : : : : : : : : : : : 下 下In addition to the configuration of an inhalation chamber between the two jet chambers - { VP configuration k ), or arranging an inhalation to and a jet chamber and configuring < 1 illusion to α ν configuration or V Ρ configuration ). Choose these constructs appropriately. . In the first to fifth aspects, the upper and lower discharge pressures are changed in the adjustment of the thin waist tube effect, but other adjustments may be made. For example, the discharge pressure from the lower side of the discharge pressure r:! from the lower side dust removal unit 210 is equal to 70 220, and the lower side: the earlier '21 two suction ratio is compared with the upper side dust removal unit. 22. The attraction of the fortress is "large, and the attractiveness of the thin waist tube effect of the lower side dust removal unit 210 is greater than that of the upper waist tube effect of the upper element 220, and the duty and the handling of the handle ^ & 2, 103 pushes the force of the substrate G. In addition, in this case, the transportation control unit of the 法 越 ® 镇 镇 镇 镇 镇 镇 镇 镇 镇 镇 镇 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 I can also adjust the interval from the lower dust removing unit to the back surface of the substrate G to a small interval of _ ^ ^ 1 j to remove the surface from the surface of the substrate G to the surface of the substrate G.目I丨Bee rm _ lower side dusting early 兀21 0 The thin waist tube effect is more attractive than the upper side dust removing unit 22{] The flat waist tube effect is attractive, so that the carrying roller 100, 4 , ±; £ 4 or the auxiliary roller 102 ' 103 pushes the force of the substrate G. In addition, in this case, the helmet method ‘... knows the sixth figure, the nine figure, the twelfth

The handling control unit of the shape of the figure. 2146-7329-PF 31 1305191 VIII, the structure of the auxiliary roller m, 〇3 is carried, but in the handling: 0 104, or for example, to ensure the height direction, and to set it up - in other cases, In the case of the transport surface that forms the numerous ejection holes of the gong, the substrate is placed and the upper brake is placed on the transport surface. In this case, the vertical λ 湓枉 w ^ v of each slit is right in the substrate transport direction. The longitudinal direction of the gap ensures that the intersection of the two can have the same effect as described above.

Further, a conveying device including the auxiliary rollers 103 of the auxiliary rollers of Fig. 7 may be employed. 10 2 and Fig. 10, the substrate for carrying out the dust removal and the use of the substrate in accordance with the present invention: the dust removal device for the substrate according to the present embodiment and the method of using the same, (1) idling, (2) increasing dust removal performance Big problems, vibration problems, and (4) bending problems. The inclined slit shown causes the air to not become balanced. The problem of (3) vibration is eliminated, and first, the problem of the thin waist tube effect (4) can be maintained by the turbulent flow in Fig. 4.

In the case of the approximately quadrangular substrate as shown in Fig. 1 and Fig. 14, the direction of the edge of the suction chamber of the suction chamber of the dust removing unit and the discharge slit of the jet chamber are predetermined.乂 乂 乂 使 使 使 使 使 使 使 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 搬运 子 子 子 子 子The pressure of the discharge pressure or the suction pressure is large and the balance of the fine waist tube effect is adjusted, and the attraction to the lower side can be increased to increase the shoulder separation (1) the problem of idling, and (2) the increase of the dust removal performance.

2146-7329-PF 32 1305191 Question.基板 A dust removal device for substrates that uses these effects to multiply and improve reliability, and a method of using the same. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an explanatory view showing a substrate dust removing device and a method of using the same. Fig. 2 is a structural view of a substrate dust removal device. Fig. 3 is a structural view of the transport roller as seen from the direction in which the substrate is transported, Fig. 3 (the first structural view of the phantom system, and Fig. 3(b) is the second structural view. Fig. 4 is a cross-sectional view of the dust removing unit. Fig. 5 is a substrate transporting 5(a) is an explanatory view showing a state in which the protruding end reaches the suction slit on the front side, and FIG. 5(b) is an explanatory view showing a state in which the protruding end reaches the discharge slit, and FIG. 5(c) shows that the protruding end reaches the inside. Fig. 6 is a structural view of a substrate dust removing device according to a second aspect. Fig. 7 is a structural view of a substrate carrying dust removing device according to a third aspect. Fig. 8 is a structural view of the auxiliary roller. Fig. 8(a) is a first structural view, and Fig. 8(b) is a second structural view. Fig. 9 is a structural view of a substrate carrying dust removing device according to a modified form. Fig. 0 is a fourth embodiment of a substrate carrying dust removing device. Fig. 11 is an explanatory view of the structure of the auxiliary roller structure. Fig. 11 is a structural view of the substrate dust removing device for a modified form.

2146-7329-PF 33 1305191 Fig. 1 is an explanatory view showing the movement of the substrate of the fifth embodiment. FIG. 15(4) is a view showing a state in which the protruding end reaches the suction slit on the front side, and FIG. 15(5) shows a state in which the protruding end reaches the discharge slit in the state in which the substrate is transported by the dust removing device. Description, Fig. me) An explanatory diagram of a state in which the projecting end reaches the inner suction slit. Fig. 1 is an explanatory view of a support shaft of a conveyance roller. Figure 17 is an explanatory view of the auxiliary roller. Fig. 18 is an explanatory view showing a conventional dust removing device for a substrate. Fig. 19 is an explanatory view showing a conventional dust removing device for a substrate. Fig. 20 is an explanatory view showing the bending of the substrate, Fig. 2 ("Illustration of the bending of the front end of the substrate, and the explanation of the bending of the intermediate position of the substrate. [Main element symbol] Description] 1 Substrate transport dust removal device 1 0 0 transport roller 1 01 support shaft 102, 103 auxiliary roller 104 transport roller 1 0 5 support shaft 106 spring 200 dust removal unit 210 lower dust removal unit

2146-7329-PF 34 1305191 211, 21 3 suction chamber 212 air injection chamber 214, 216 suction slit 21 5 discharge slit 220 upper side dust removing unit 221, 223 suction chamber 222 air injection chamber 224, 226 suction slit φ 225 ejection Slot 300 conveyance control unit 301 pressure introduction unit 30 2 differential pressure sensor 3 0 3 drive control unit G substrate

2146-7329-PF 35

Claims (1)

1305 ^4 127090 Patent Application Scope Amendment Date: 97.11.10 X. Patent Application Range: 1. A method of using a dust removal device for a substrate, the substrate dust removal device includes: a carrier device from the underside of the substrate Supplying the floor force to transport the substrate in a predetermined substrate transport direction; and the dust removing unit 'on the both sides of the front and back sides of the substrate, the upper side dust removing unit having at least one of the suction chamber and the air chamber and the lower side a side dust removing unit, wherein the washing air is sprayed to the surface of the substrate via a linear slit of the air jet chamber, and the scattered dust is sucked through the linear slit of the air suction chamber, and is characterized in that: the dust removing unit is disposed in a side direction The substrate having a substantially quadrangular shape in which the longitudinal direction of the suction slit of the suction chamber and the linear discharge slit of the jet chamber are inclined at a predetermined crossing angle is subjected to dust removal by being conveyed to the dust removing unit as the leading end of the substrate becomes the leading end. 2. In the method of using the substrate dust removing device of the patent application (4), the longitudinal direction of the suction slit and the discharge slit is substantially perpendicular to the substrate transport direction, and the direction of the substrate in the direction of the substrate is approximately one side of the substantially square substrate. The substantially vertical direction is inclined at a predetermined crossing angle. 3. If you apply for a patent scope! In the method of using the substrate dust removing device, the one side of the substantially quadrangular substrate is substantially perpendicular to the substrate conveying direction, and the longitudinal direction of the suction slit and the ejection slit is substantially perpendicular to the substrate conveying direction. Angle tilting 4. A substrate dust removing device includes: a conveying device that supplies a supporting force from a lower side of the substrate, and transports the substrate to a predetermined substrate 2146-7329-PF1 36 1305191; and two surfaces on the substrate The side is arranged in a side-by-side direction with side dust removal: there are each of the suction chambers and the upper side dust removal unit of the air injection chamber and the lower side: the dust is early, and the air is washed out to the substrate via the linear gap of the jet chamber. The scattered dust is attracted by the oxygen-absorbing uterus & & & 、 、 & & & & & & & , , , , , , , , , , , 吸引 吸引 吸引 吸引 吸引 吸引 吸引 吸引 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸 吸Vertical The longitudinal direction of the linear ejection slits of the "I-chamber" is substantially parallel, and the direction in which the respective sheets are conveyed is substantially perpendicular and the direction of substrate conveyance is in the direction of one side of the substantially square-shaped substrate: the state in which the vertical direction is inclined at a predetermined crossing angle is If the dog's end of the substrate becomes the front, it is removed to the dust removal unit. 5. A substrate for carrying a dust removal device, comprising: a conveying device that supplies a supporting force from a lower side of the substrate, and conveys the substrate in a predetermined substrate conveying direction; and dust removal early, two sets on both sides of the front and back sides of the substrate The upper dust removing unit and the lower dust removing unit having at least one of the suction chamber and the air blowing chamber are disposed opposite to each other, and the washing space 1 is discharged to the surface of the substrate via the linear gap of the air blowing chamber, and the suction chamber is discharged through the suction chamber. The linear slit attracts the scattered dust, and is characterized in that the longitudinal direction of the linear suction slit of the suction chamber of the dust removing unit and the linear discharge slit of the jet chamber are substantially parallel to each other, and are substantially perpendicular to the substrate conveying direction. The direction is inclined at a predetermined crossing angle; at the same time, one of the conveying front ends of the substantially quadrangular substrate is substantially perpendicular to the substrate conveyance 2146-7329-PF1 37 '1305191, and is subjected to dust removal when the protruding end of the substrate becomes the front end and is conveyed to the dust removing unit. 6. The substrate handling dust removing device according to claim 4, wherein the conveying device comprises a bar-shaped conveying roller; the axial direction of the bar-shaped conveying roller is arranged in line with the suction chamber of the dust removing unit. The longitudinal direction of the suction slit and the linear discharge slit of the jet chamber are substantially parallel in the longitudinal direction, and are substantially perpendicular to the substrate conveyance direction. 7. The substrate dust removing device according to claim 5, wherein the conveying device includes a plurality of disk-shaped conveying rollers arranged in an array direction of inclination; and an arrangement direction of the disk-shaped conveying rollers The longitudinal direction of the linear suction slit of the suction chamber of the dust removing unit and the linear discharge slit of the jet chamber are substantially parallel to each other, and are inclined at a predetermined crossing angle with respect to a substantially vertical direction of the substrate conveying direction. 8. The substrate handling dust removing device according to any one of claims 4 to 7, wherein the attraction of the thin waist tube effect of the lower dust removing unit is greater than the suction force of the thin waist tube effect of the upper side dust removing unit. And the force that pushes the substrate to the handling device. [9] The substrate dust removing device for a substrate according to the eighth aspect of the invention, wherein the suction pressure of the lower dust removing unit and the suction pressure of the upper dust removing unit are equal, and the discharge pressure from the lower dust removing unit is made The suction force of the lower dust removing unit is larger than the suction force from the upper dust removing unit, and the suction force of the thin waist tube effect of the lower dust removing unit is greater than the suction force of the thin waist tube effect of the upper dust removing unit. 2146-7329-PF1 38,1305191 ίο. The substrate dust removal device for a substrate according to claim 8 of the patent application, wherein 'by spraying from the lower side dust removal unit', Wang Ganji <_gong pressure and from the upper dust removal unit The discharge pressure becomes equal, and the suction pressure of the dust-repellent soap element is larger than the suction force of the upper dust-removing unit, and the pressure of the thin waist tube of the lower dust-removing unit is attracted. The force is greater than the attraction of the thin waist tube effect of the upper side dust removing unit, and the force is applied to the substrate by the pushing device. 11. The substrate dust removing device according to the eighth aspect of the invention, wherein the interval from the lower dust removing unit to the substrate surface is adjusted to be smaller than an interval from the upper dust removing unit to the substrate surface, and the lower side is provided. The attraction of the thin waist tube effect of the dust removing unit is greater than the attraction of the thin waist tube effect of the upper side dust removing unit, and the force for pushing the substrate to the conveying device is given. 12. The substrate handling dust removing device according to claim 9, wherein: 3: measuring the discharge pressure from the lower dust removing unit and the upper dust removing unit, the discharge pressure from the upper dust collecting unit is higher than that from the upper dust removing unit The discharge pressure is controlled to stop the conveyance of the substrate to the dust removing unit. 13. The substrate handling dust removing device of claim 4, wherein the lower dust removing unit includes an auxiliary roller that rotates against the conveyed substrate. 14. The substrate dust removing device according to claim 13, wherein the auxiliary roller is disposed on an outer side of the loading side of the lower dust removing unit. 15. The substrate handling dust removing device according to claim 13, wherein the auxiliary roller is disposed in a suction slit of the suction chamber of the lower dust removing unit. 16. The substrate dust removal device 2146-7329-PF1 39 1305191 of the fourth or fifth aspect of the invention, wherein the lower dust removing unit and the upper dust removing unit are arranged in a row along the substrate conveying direction, and are separated by a jet. Two suction chambers in the room. 2146-7329-PF1 40