TWI300514B - - Google Patents

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Publication number
TWI300514B
TWI300514B TW90132340A TW90132340A TWI300514B TW I300514 B TWI300514 B TW I300514B TW 90132340 A TW90132340 A TW 90132340A TW 90132340 A TW90132340 A TW 90132340A TW I300514 B TWI300514 B TW I300514B
Authority
TW
Taiwan
Prior art keywords
exposure
substrate
upstream
heating
processed
Prior art date
Application number
TW90132340A
Other languages
English (en)
Chinese (zh)
Inventor
Kenji Kawano
Shinichi Ito
Eishi Shiobara
Daisuke Kawamura
Original Assignee
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk filed Critical Toshiba Kk
Application granted granted Critical
Publication of TWI300514B publication Critical patent/TWI300514B/zh

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW90132340A 2000-12-26 2001-12-26 TWI300514B (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000394354 2000-12-26
JP2001011299 2001-01-19

Publications (1)

Publication Number Publication Date
TWI300514B true TWI300514B (ja) 2008-09-01

Family

ID=45069988

Family Applications (1)

Application Number Title Priority Date Filing Date
TW90132340A TWI300514B (ja) 2000-12-26 2001-12-26

Country Status (1)

Country Link
TW (1) TWI300514B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI503907B (zh) * 2010-04-14 2015-10-11 Wonik Ips Co Ltd 基板處理設備

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI503907B (zh) * 2010-04-14 2015-10-11 Wonik Ips Co Ltd 基板處理設備

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees