TWI297289B - Substrate processing apparatus - Google Patents
Substrate processing apparatus Download PDFInfo
- Publication number
- TWI297289B TWI297289B TW095126022A TW95126022A TWI297289B TW I297289 B TWI297289 B TW I297289B TW 095126022 A TW095126022 A TW 095126022A TW 95126022 A TW95126022 A TW 95126022A TW I297289 B TWI297289 B TW I297289B
- Authority
- TW
- Taiwan
- Prior art keywords
- fluid
- pipe
- actuating
- unit
- actuating fluid
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1026—Valves
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Coating Apparatus (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mathematical Physics (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005212976A JP4592524B2 (ja) | 2005-07-22 | 2005-07-22 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200730258A TW200730258A (en) | 2007-08-16 |
TWI297289B true TWI297289B (en) | 2008-06-01 |
Family
ID=37794641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095126022A TWI297289B (en) | 2005-07-22 | 2006-07-17 | Substrate processing apparatus |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4592524B2 (ko) |
KR (1) | KR101259182B1 (ko) |
TW (1) | TWI297289B (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100796425B1 (ko) * | 2005-08-23 | 2008-01-21 | 도쿄 오카 고교 가부시키가이샤 | 도포장치 |
JP2009049228A (ja) * | 2007-08-21 | 2009-03-05 | Dainippon Screen Mfg Co Ltd | ポンプおよび基板処理装置 |
JP5355881B2 (ja) * | 2007-12-05 | 2013-11-27 | 東京応化工業株式会社 | 塗布装置 |
JP4824792B2 (ja) * | 2009-07-02 | 2011-11-30 | 東京エレクトロン株式会社 | 塗布装置 |
KR101365609B1 (ko) * | 2011-11-09 | 2014-02-20 | 나노에프에이 주식회사 | 접착액 도포 장치 및 이를 이용한 접착액 도포 방법 |
KR102047896B1 (ko) * | 2013-08-22 | 2019-11-22 | 세메스 주식회사 | 기판 처리 장치, 그리고 기판 처리 장치를 이용한 기판 처리 방법 |
TWI649212B (zh) * | 2015-04-03 | 2019-02-01 | 佳能股份有限公司 | 液體排放設備、壓印設備及部件製造方法 |
CN107921468B (zh) * | 2015-09-02 | 2019-12-27 | 龙云株式会社 | 喷出装置 |
CN107803292A (zh) * | 2017-11-22 | 2018-03-16 | 无锡博硕精睿科技有限公司 | 一种喷涂防滴液机构 |
JP7183088B2 (ja) | 2019-03-20 | 2022-12-05 | 株式会社東芝 | ポンプ |
KR102666440B1 (ko) * | 2021-12-02 | 2024-05-20 | 세메스 주식회사 | 감광액 공급 시스템 및 감광액 관리 방법 |
KR102568642B1 (ko) * | 2023-04-03 | 2023-08-21 | 주식회사 파인솔루션 | 벨로우즈 구동제어 기반의 내압조절식 가스 가압공급 장치 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3230128B2 (ja) * | 1994-09-09 | 2001-11-19 | 東京エレクトロン株式会社 | 処理装置 |
JPH10281069A (ja) * | 1997-04-03 | 1998-10-20 | Iwaki:Kk | ポンプユニット |
JP4046628B2 (ja) * | 2002-03-19 | 2008-02-13 | 東京エレクトロン株式会社 | 処理液供給機構および処理液供給方法 |
-
2005
- 2005-07-22 JP JP2005212976A patent/JP4592524B2/ja not_active Expired - Fee Related
-
2006
- 2006-07-17 TW TW095126022A patent/TWI297289B/zh not_active IP Right Cessation
- 2006-07-21 KR KR1020060068243A patent/KR101259182B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20070012245A (ko) | 2007-01-25 |
TW200730258A (en) | 2007-08-16 |
KR101259182B1 (ko) | 2013-04-29 |
JP2007035713A (ja) | 2007-02-08 |
JP4592524B2 (ja) | 2010-12-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |