TWI297289B - Substrate processing apparatus - Google Patents

Substrate processing apparatus Download PDF

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Publication number
TWI297289B
TWI297289B TW095126022A TW95126022A TWI297289B TW I297289 B TWI297289 B TW I297289B TW 095126022 A TW095126022 A TW 095126022A TW 95126022 A TW95126022 A TW 95126022A TW I297289 B TWI297289 B TW I297289B
Authority
TW
Taiwan
Prior art keywords
fluid
pipe
actuating
unit
actuating fluid
Prior art date
Application number
TW095126022A
Other languages
English (en)
Chinese (zh)
Other versions
TW200730258A (en
Inventor
Yoshihiro Kawaguchi
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200730258A publication Critical patent/TW200730258A/zh
Application granted granted Critical
Publication of TWI297289B publication Critical patent/TWI297289B/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1026Valves
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mathematical Physics (AREA)
TW095126022A 2005-07-22 2006-07-17 Substrate processing apparatus TWI297289B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005212976A JP4592524B2 (ja) 2005-07-22 2005-07-22 基板処理装置

Publications (2)

Publication Number Publication Date
TW200730258A TW200730258A (en) 2007-08-16
TWI297289B true TWI297289B (en) 2008-06-01

Family

ID=37794641

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095126022A TWI297289B (en) 2005-07-22 2006-07-17 Substrate processing apparatus

Country Status (3)

Country Link
JP (1) JP4592524B2 (ko)
KR (1) KR101259182B1 (ko)
TW (1) TWI297289B (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100796425B1 (ko) * 2005-08-23 2008-01-21 도쿄 오카 고교 가부시키가이샤 도포장치
JP2009049228A (ja) * 2007-08-21 2009-03-05 Dainippon Screen Mfg Co Ltd ポンプおよび基板処理装置
JP5355881B2 (ja) * 2007-12-05 2013-11-27 東京応化工業株式会社 塗布装置
JP4824792B2 (ja) * 2009-07-02 2011-11-30 東京エレクトロン株式会社 塗布装置
KR101365609B1 (ko) * 2011-11-09 2014-02-20 나노에프에이 주식회사 접착액 도포 장치 및 이를 이용한 접착액 도포 방법
KR102047896B1 (ko) * 2013-08-22 2019-11-22 세메스 주식회사 기판 처리 장치, 그리고 기판 처리 장치를 이용한 기판 처리 방법
TWI649212B (zh) * 2015-04-03 2019-02-01 佳能股份有限公司 液體排放設備、壓印設備及部件製造方法
CN107921468B (zh) * 2015-09-02 2019-12-27 龙云株式会社 喷出装置
CN107803292A (zh) * 2017-11-22 2018-03-16 无锡博硕精睿科技有限公司 一种喷涂防滴液机构
JP7183088B2 (ja) 2019-03-20 2022-12-05 株式会社東芝 ポンプ
KR102666440B1 (ko) * 2021-12-02 2024-05-20 세메스 주식회사 감광액 공급 시스템 및 감광액 관리 방법
KR102568642B1 (ko) * 2023-04-03 2023-08-21 주식회사 파인솔루션 벨로우즈 구동제어 기반의 내압조절식 가스 가압공급 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3230128B2 (ja) * 1994-09-09 2001-11-19 東京エレクトロン株式会社 処理装置
JPH10281069A (ja) * 1997-04-03 1998-10-20 Iwaki:Kk ポンプユニット
JP4046628B2 (ja) * 2002-03-19 2008-02-13 東京エレクトロン株式会社 処理液供給機構および処理液供給方法

Also Published As

Publication number Publication date
KR20070012245A (ko) 2007-01-25
TW200730258A (en) 2007-08-16
KR101259182B1 (ko) 2013-04-29
JP2007035713A (ja) 2007-02-08
JP4592524B2 (ja) 2010-12-01

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MM4A Annulment or lapse of patent due to non-payment of fees