TWI296695B - - Google Patents
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- Publication number
- TWI296695B TWI296695B TW093115120A TW93115120A TWI296695B TW I296695 B TWI296695 B TW I296695B TW 093115120 A TW093115120 A TW 093115120A TW 93115120 A TW93115120 A TW 93115120A TW I296695 B TWI296695 B TW I296695B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- film
- layers
- optical
- transmittance
- Prior art date
Links
- 239000010408 film Substances 0.000 claims description 212
- 238000002834 transmittance Methods 0.000 claims description 86
- 239000012788 optical film Substances 0.000 claims description 39
- 230000007704 transition Effects 0.000 claims description 27
- 230000003287 optical effect Effects 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 20
- 230000002265 prevention Effects 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 3
- 239000013078 crystal Substances 0.000 description 53
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 43
- 229910052681 coesite Inorganic materials 0.000 description 42
- 229910052906 cristobalite Inorganic materials 0.000 description 42
- 229910052682 stishovite Inorganic materials 0.000 description 42
- 229910052905 tridymite Inorganic materials 0.000 description 42
- 238000010586 diagram Methods 0.000 description 12
- 230000000903 blocking effect Effects 0.000 description 11
- 239000011521 glass Substances 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 6
- 238000010030 laminating Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 210000002784 stomach Anatomy 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Filtering Materials (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003152751A JP2004354735A (ja) | 2003-05-29 | 2003-05-29 | 光線カットフィルタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200506272A TW200506272A (en) | 2005-02-16 |
| TWI296695B true TWI296695B (enExample) | 2008-05-11 |
Family
ID=33487269
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093115120A TW200506272A (en) | 2003-05-29 | 2004-05-27 | Blocking filter |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7387840B2 (enExample) |
| JP (1) | JP2004354735A (enExample) |
| CN (1) | CN100392440C (enExample) |
| TW (1) | TW200506272A (enExample) |
| WO (1) | WO2004106995A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4643202B2 (ja) * | 2004-08-20 | 2011-03-02 | 日本電波工業株式会社 | 光学ローパスフィルタ |
| US7456384B2 (en) * | 2004-12-10 | 2008-11-25 | Sony Corporation | Method and apparatus for acquiring physical information, method for manufacturing semiconductor device including array of plurality of unit components for detecting physical quantity distribution, light-receiving device and manufacturing method therefor, and solid-state imaging device and manufacturing method therefor |
| JP2006201450A (ja) * | 2005-01-20 | 2006-08-03 | Olympus Corp | 光学フィルタ及び光学機器 |
| JP5217100B2 (ja) * | 2006-03-22 | 2013-06-19 | 株式会社リコー | 光学ユニット |
| US20070235771A1 (en) * | 2006-04-05 | 2007-10-11 | Yan-Hsiu Liu | Semiconductor image sensor and method for fabricating the same |
| US20080258043A1 (en) * | 2007-04-17 | 2008-10-23 | Koji Suzuki | Optical element and optical equipment |
| KR20110061677A (ko) * | 2009-12-02 | 2011-06-10 | 삼성전자주식회사 | 영상 센서 및 이의 제조 방법. |
| TWI439779B (zh) | 2010-06-24 | 2014-06-01 | Prime View Int Co Ltd | 顯示裝置、雷射轉印方法及雷射轉印色板 |
| CN102721990A (zh) * | 2011-03-30 | 2012-10-10 | 亚洲光学股份有限公司 | 红外光截止滤镜 |
| TWI475246B (zh) * | 2011-04-15 | 2015-03-01 | Largan Precision Co | 具濾光元件之光學取像鏡頭 |
| JP5973747B2 (ja) * | 2012-02-28 | 2016-08-23 | 旭硝子株式会社 | 近赤外線カットフィルター |
| CN103376489B (zh) * | 2012-04-23 | 2015-07-29 | 深圳欧菲光科技股份有限公司 | 蓝玻璃红外截止滤光片制备方法 |
| KR101987926B1 (ko) | 2012-04-25 | 2019-06-11 | 가부시키가이샤 아데카 | 파장 컷 필터 |
| CN103454709A (zh) * | 2012-05-30 | 2013-12-18 | 鸿富锦精密工业（深圳）有限公司 | 红外截止滤光片及镜头模组 |
| CN104412136B (zh) * | 2012-10-26 | 2017-07-25 | 京瓷株式会社 | 光学滤波器部件以及具备该光学滤波器部件的摄像装置 |
| CN105593712B (zh) * | 2013-12-26 | 2018-08-14 | 旭硝子株式会社 | 滤光器 |
| CN103809231B (zh) * | 2014-01-27 | 2016-04-13 | 南京工业大学 | 一种紫外-近红外双波段吸收滤光片及其制备方法 |
| JP2016038183A (ja) * | 2014-08-11 | 2016-03-22 | 日立アプライアンス株式会社 | 空気調和機および空調運転制御方法 |
| JP6670323B2 (ja) | 2015-12-09 | 2020-03-18 | 株式会社Adeka | 熱硬化性樹脂組成物 |
| JP6767774B2 (ja) * | 2016-05-19 | 2020-10-14 | ラピスセミコンダクタ株式会社 | 半導体装置、及び半導体装置の製造方法 |
| CN106517817B (zh) * | 2016-10-27 | 2019-04-19 | 宜昌南玻显示器件有限公司 | 一种抗uv光学膜玻璃及其制备方法 |
| CN106997068B (zh) * | 2017-04-26 | 2023-03-28 | 杭州科汀光学技术有限公司 | 一种用浸涂蓝墨水的玻璃作为基底的隔红外滤波器及其制备方法 |
| JP6706700B2 (ja) * | 2019-02-06 | 2020-06-10 | 日本板硝子株式会社 | 赤外線カットフィルタ、撮像装置および赤外線カットフィルタの製造方法 |
| CN110456436A (zh) * | 2019-09-09 | 2019-11-15 | 杭州麦乐克科技股份有限公司 | 6750nm长波通红外滤光敏感元件 |
| TWI766676B (zh) | 2021-05-07 | 2022-06-01 | 冠晶光電股份有限公司 | 多層濾光結構 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04133004A (ja) * | 1990-09-25 | 1992-05-07 | Matsushita Electric Works Ltd | 紫外赤外線カットフィルタ |
| JP3242495B2 (ja) * | 1993-07-01 | 2001-12-25 | シャープ株式会社 | 多層膜フィルタ付き受光素子及びその製造方法 |
| JPH08275182A (ja) * | 1995-03-28 | 1996-10-18 | Canon Inc | カラーモード・赤外モード共用型テレビカメラ |
| JP2000206325A (ja) * | 1999-01-11 | 2000-07-28 | Daishinku Corp | 赤外線カットフィルタおよび赤外線カットフィルタを用いた撮像装置 |
| JP3679268B2 (ja) * | 1999-04-28 | 2005-08-03 | 京セラキンセキ株式会社 | 赤外線カットフィルタ |
| JP3879411B2 (ja) * | 2001-02-14 | 2007-02-14 | 日本電気株式会社 | 分散補償器 |
| JP2003029027A (ja) * | 2001-07-19 | 2003-01-29 | Tokai Kogaku Kk | 近赤外線カットフィルタ |
-
2003
- 2003-05-29 JP JP2003152751A patent/JP2004354735A/ja active Pending
-
2004
- 2004-05-26 CN CNB2004800003502A patent/CN100392440C/zh not_active Expired - Fee Related
- 2004-05-26 US US10/519,490 patent/US7387840B2/en not_active Expired - Fee Related
- 2004-05-26 WO PCT/JP2004/007588 patent/WO2004106995A1/ja not_active Ceased
- 2004-05-27 TW TW093115120A patent/TW200506272A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CN1697987A (zh) | 2005-11-16 |
| TW200506272A (en) | 2005-02-16 |
| US7387840B2 (en) | 2008-06-17 |
| US20050253048A1 (en) | 2005-11-17 |
| CN100392440C (zh) | 2008-06-04 |
| WO2004106995A1 (ja) | 2004-12-09 |
| JP2004354735A (ja) | 2004-12-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |