TWI290810B - Plasma treatment device - Google Patents

Plasma treatment device Download PDF

Info

Publication number
TWI290810B
TWI290810B TW091120344A TW91120344A TWI290810B TW I290810 B TWI290810 B TW I290810B TW 091120344 A TW091120344 A TW 091120344A TW 91120344 A TW91120344 A TW 91120344A TW I290810 B TWI290810 B TW I290810B
Authority
TW
Taiwan
Prior art keywords
high frequency
frequency antenna
dielectric
plasma processing
processing apparatus
Prior art date
Application number
TW091120344A
Other languages
English (en)
Chinese (zh)
Inventor
Kazuo Sasaki
Hidehito Sueki
Tsutomu Satoyoshi
Michio Nishimura
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TWI290810B publication Critical patent/TWI290810B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32871—Means for trapping or directing unwanted particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils

Landscapes

  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
TW091120344A 2001-09-27 2002-09-05 Plasma treatment device TWI290810B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001297724 2001-09-27

Publications (1)

Publication Number Publication Date
TWI290810B true TWI290810B (en) 2007-12-01

Family

ID=37417122

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091120344A TWI290810B (en) 2001-09-27 2002-09-05 Plasma treatment device

Country Status (3)

Country Link
JP (1) JP4074168B2 (ja)
KR (1) KR100907109B1 (ja)
TW (1) TWI290810B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011258622A (ja) * 2010-06-07 2011-12-22 Tokyo Electron Ltd プラズマ処理装置及びその誘電体窓構造
JP5606821B2 (ja) * 2010-08-04 2014-10-15 東京エレクトロン株式会社 プラズマ処理装置
KR102035810B1 (ko) * 2013-02-28 2019-10-23 엘지전자 주식회사 조리기기
KR102278074B1 (ko) * 2014-06-30 2021-07-19 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR102075090B1 (ko) 2017-11-08 2020-02-07 아주대학교산학협력단 담도 폐쇄 모니터링 시스템 및 방법
WO2020246523A1 (ja) * 2019-06-05 2020-12-10 日新電機株式会社 プラズマ処理装置
JP2022185603A (ja) * 2021-06-03 2022-12-15 株式会社アルバック プラズマ処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3192352B2 (ja) * 1995-06-16 2001-07-23 東京エレクトロン株式会社 プラズマ処理装置
JP3364675B2 (ja) * 1997-09-30 2003-01-08 東京エレクトロンエイ・ティー株式会社 プラズマ処理装置
KR20000005308A (ko) * 1998-10-09 2000-01-25 가나이 쓰도무 플라즈마 처리장치
US6331754B1 (en) * 1999-05-13 2001-12-18 Tokyo Electron Limited Inductively-coupled-plasma-processing apparatus
KR100545034B1 (ko) * 2000-02-21 2006-01-24 가부시끼가이샤 히다치 세이사꾸쇼 플라즈마처리장치 및 시료의 처리방법

Also Published As

Publication number Publication date
JP4074168B2 (ja) 2008-04-09
KR20030028394A (ko) 2003-04-08
JP2003209098A (ja) 2003-07-25
KR100907109B1 (ko) 2009-07-09

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Legal Events

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