KR100907109B1 - 플라즈마 처리 장치 - Google Patents

플라즈마 처리 장치 Download PDF

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Publication number
KR100907109B1
KR100907109B1 KR1020020058297A KR20020058297A KR100907109B1 KR 100907109 B1 KR100907109 B1 KR 100907109B1 KR 1020020058297 A KR1020020058297 A KR 1020020058297A KR 20020058297 A KR20020058297 A KR 20020058297A KR 100907109 B1 KR100907109 B1 KR 100907109B1
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KR
South Korea
Prior art keywords
high frequency
frequency antenna
processing apparatus
plasma processing
dielectric
Prior art date
Application number
KR1020020058297A
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English (en)
Korean (ko)
Other versions
KR20030028394A (ko
Inventor
사사키가즈오
스에키히데히토
사토요시츠토무
니시무라미치오
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20030028394A publication Critical patent/KR20030028394A/ko
Application granted granted Critical
Publication of KR100907109B1 publication Critical patent/KR100907109B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32871—Means for trapping or directing unwanted particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils

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  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020020058297A 2001-09-27 2002-09-26 플라즈마 처리 장치 KR100907109B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001297724 2001-09-27
JPJP-P-2001-00297724 2001-09-27

Publications (2)

Publication Number Publication Date
KR20030028394A KR20030028394A (ko) 2003-04-08
KR100907109B1 true KR100907109B1 (ko) 2009-07-09

Family

ID=37417122

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020058297A KR100907109B1 (ko) 2001-09-27 2002-09-26 플라즈마 처리 장치

Country Status (3)

Country Link
JP (1) JP4074168B2 (ja)
KR (1) KR100907109B1 (ja)
TW (1) TWI290810B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011258622A (ja) * 2010-06-07 2011-12-22 Tokyo Electron Ltd プラズマ処理装置及びその誘電体窓構造
JP5606821B2 (ja) * 2010-08-04 2014-10-15 東京エレクトロン株式会社 プラズマ処理装置
KR102035810B1 (ko) * 2013-02-28 2019-10-23 엘지전자 주식회사 조리기기
KR102278074B1 (ko) * 2014-06-30 2021-07-19 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR102075090B1 (ko) 2017-11-08 2020-02-07 아주대학교산학협력단 담도 폐쇄 모니터링 시스템 및 방법
WO2020246523A1 (ja) * 2019-06-05 2020-12-10 日新電機株式会社 プラズマ処理装置
JP2022185603A (ja) * 2021-06-03 2022-12-15 株式会社アルバック プラズマ処理装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH098010A (ja) * 1995-06-16 1997-01-10 Tokyo Electron Ltd プラズマ処理装置
KR19990030256A (ko) * 1997-09-30 1999-04-26 이노우에 쥰이치 플라즈마 처리 장치
KR20000005308A (ko) * 1998-10-09 2000-01-25 가나이 쓰도무 플라즈마 처리장치
KR20000077209A (ko) * 1999-05-13 2000-12-26 히가시 데쓰로 유도 결합 플라즈마 처리 장치
US20010015175A1 (en) * 2000-02-21 2001-08-23 Toshio Masuda Plasma processing system and apparatus and a sample processing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH098010A (ja) * 1995-06-16 1997-01-10 Tokyo Electron Ltd プラズマ処理装置
KR19990030256A (ko) * 1997-09-30 1999-04-26 이노우에 쥰이치 플라즈마 처리 장치
KR20000005308A (ko) * 1998-10-09 2000-01-25 가나이 쓰도무 플라즈마 처리장치
KR20000077209A (ko) * 1999-05-13 2000-12-26 히가시 데쓰로 유도 결합 플라즈마 처리 장치
US20010015175A1 (en) * 2000-02-21 2001-08-23 Toshio Masuda Plasma processing system and apparatus and a sample processing method

Also Published As

Publication number Publication date
TWI290810B (en) 2007-12-01
JP4074168B2 (ja) 2008-04-09
KR20030028394A (ko) 2003-04-08
JP2003209098A (ja) 2003-07-25

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