TWI266952B - Negative photoresist composition for spinless (slit) coating - Google Patents
Negative photoresist composition for spinless (slit) coatingInfo
- Publication number
- TWI266952B TWI266952B TW093115695A TW93115695A TWI266952B TW I266952 B TWI266952 B TW I266952B TW 093115695 A TW093115695 A TW 093115695A TW 93115695 A TW93115695 A TW 93115695A TW I266952 B TWI266952 B TW I266952B
- Authority
- TW
- Taiwan
- Prior art keywords
- weight
- parts
- negative photoresist
- photoresist composition
- coating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030035442A KR100579832B1 (ko) | 2003-06-02 | 2003-06-02 | 스핀리스 코팅용 포토레지스트 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200428140A TW200428140A (en) | 2004-12-16 |
TWI266952B true TWI266952B (en) | 2006-11-21 |
Family
ID=33487834
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093115695A TWI266952B (en) | 2003-06-02 | 2004-06-01 | Negative photoresist composition for spinless (slit) coating |
TW093115691A TWI274962B (en) | 2003-06-02 | 2004-06-01 | Positive photoresist composition for spinless (SLIT) coating |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093115691A TWI274962B (en) | 2003-06-02 | 2004-06-01 | Positive photoresist composition for spinless (SLIT) coating |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100579832B1 (zh) |
TW (2) | TWI266952B (zh) |
WO (2) | WO2004107052A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100595818B1 (ko) * | 2004-03-10 | 2006-07-03 | (주)서원인텍 | 엘라스토머 성형품의 도장방법 |
JP2005338831A (ja) * | 2004-05-25 | 2005-12-08 | Samsung Electronics Co Ltd | 液晶表示装置の有機膜フォトレジスト組成物、そのスピンレスコーティング方法、これを用いた有機膜パターン形成方法及びこれにより製造された液晶表示装置 |
JP4828275B2 (ja) * | 2006-03-30 | 2011-11-30 | 新日鐵化学株式会社 | カラーフィルター用遮光性樹脂組成物及びカラーフィルター |
KR101299967B1 (ko) * | 2009-06-23 | 2013-08-27 | 주식회사 엘지화학 | 스핀리스용 열경화성 수지 조성물 |
CN106866435A (zh) * | 2017-03-01 | 2017-06-20 | 无锡阿科力科技股份有限公司 | 一种含有桥环结构的聚醚胺及其制备方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1148105B1 (en) * | 2000-04-17 | 2006-10-04 | JSR Corporation | Composition for film formation, method of film formation, and silica-based film |
KR100367471B1 (ko) * | 2000-12-14 | 2003-01-10 | 주식회사 아담스테크놀로지 | 오버코트용 레지스트 조성물 |
-
2003
- 2003-06-02 KR KR1020030035442A patent/KR100579832B1/ko active IP Right Grant
-
2004
- 2004-06-01 WO PCT/KR2004/001300 patent/WO2004107052A1/en active Application Filing
- 2004-06-01 WO PCT/KR2004/001301 patent/WO2004107053A1/en active Application Filing
- 2004-06-01 TW TW093115695A patent/TWI266952B/zh active
- 2004-06-01 TW TW093115691A patent/TWI274962B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2004107052A1 (en) | 2004-12-09 |
WO2004107053A1 (en) | 2004-12-09 |
TW200428140A (en) | 2004-12-16 |
KR20040104053A (ko) | 2004-12-10 |
TWI274962B (en) | 2007-03-01 |
KR100579832B1 (ko) | 2006-05-15 |
TW200428152A (en) | 2004-12-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200510937A (en) | Antireflective film material, and antireflective film and pattern formation method using the same | |
DK1309412T3 (da) | Fremgangsmåde til belægning af et tekstureret sliplag | |
JP7092132B2 (ja) | 剥離層形成用組成物及び剥離層 | |
TW200508315A (en) | Organosilicon compound - curing composition and silicone-base coating composition | |
TW200736352A (en) | Conductive coating composition for protective film and method for producing coating layer using the same | |
WO2005033230A3 (en) | Low-cure powder coatings, related coating method and coated substrates | |
TW200621880A (en) | Curable composition, cured product, and laminate | |
ATE492613T1 (de) | Bodensubstrat mit einer beschichtung aus einer härtbaren zusammensetzung | |
DE602004009791D1 (de) | Siloxan-harz basierte anti-reflektionsbeschichtung mit hoher nassätzgeschwindigkeit | |
TW200622496A (en) | Method for forming anti-reflective coating | |
TW200724613A (en) | Infrared cut-off and anti-reflectional hard coating, method of forming the same and multi-functional optical film thereof | |
DE69910071D1 (de) | Beschichtungszusammensetzungen und daraus hergestellte beschichtungen | |
TW200609111A (en) | Composition for hard coat, surface protecting film, and optical disc | |
WO2006054888A3 (en) | Curable liquid composition, cured film, and antistatic laminate | |
TW200604723A (en) | Photoresist composition | |
EP1655342A4 (en) | CURABLE COMPOSITION | |
KR102554568B1 (ko) | 광경화성 조성물 및 이로부터 형성된 광경화 막 | |
TW200604741A (en) | Positive photoresist composition for none-spin coating method and formation method of resist pattern | |
ATE290575T1 (de) | Verfahren zum beschichten von substraten | |
TWI266952B (en) | Negative photoresist composition for spinless (slit) coating | |
WO1998051752A1 (fr) | Materiau de revetement permettant d'obtenir un film de revetement vitreux, procede de formation d'un revetement a l'aide de celui-ci, et dispositif d'application de revetement | |
MY193145A (en) | Adhesive sheet for producing semiconductor device and production method for semiconductor device using the same | |
WO2009014113A1 (ja) | スプレー塗布用ポジ型感光性樹脂組成物、それを用いた硬化膜の形成方法、硬化膜および半導体装置 | |
WO2003102044A3 (en) | Low-cure powder coatings and methods for using the same | |
WO2008096782A1 (ja) | 感光性樹脂組成物、転写フィルムおよびパターン形成方法 |