TWI257436B - Method and vessel for the delivery of precursor materials - Google Patents
Method and vessel for the delivery of precursor materials Download PDFInfo
- Publication number
- TWI257436B TWI257436B TW93124581A TW93124581A TWI257436B TW I257436 B TWI257436 B TW I257436B TW 93124581 A TW93124581 A TW 93124581A TW 93124581 A TW93124581 A TW 93124581A TW I257436 B TWI257436 B TW I257436B
- Authority
- TW
- Taiwan
- Prior art keywords
- container
- space
- fluid
- precursor
- thermally conductive
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0391—Affecting flow by the addition of material or energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/4891—With holder for solid, flaky or pulverized material to be dissolved or entrained
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US49618703P | 2003-08-19 | 2003-08-19 | |
| US58729504P | 2004-07-12 | 2004-07-12 | |
| US10/902,778 US7261118B2 (en) | 2003-08-19 | 2004-08-02 | Method and vessel for the delivery of precursor materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200525046A TW200525046A (en) | 2005-08-01 |
| TWI257436B true TWI257436B (en) | 2006-07-01 |
Family
ID=34069125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW93124581A TWI257436B (en) | 2003-08-19 | 2004-08-16 | Method and vessel for the delivery of precursor materials |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7261118B2 (https=) |
| EP (1) | EP1508631B1 (https=) |
| JP (1) | JP4012181B2 (https=) |
| KR (1) | KR100590463B1 (https=) |
| CN (1) | CN100523289C (https=) |
| AT (1) | ATE466969T1 (https=) |
| DE (1) | DE602004026968D1 (https=) |
| IL (1) | IL163536A0 (https=) |
| SG (2) | SG130188A1 (https=) |
| TW (1) | TWI257436B (https=) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7601225B2 (en) * | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
| US6921062B2 (en) | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US7300038B2 (en) | 2002-07-23 | 2007-11-27 | Advanced Technology Materials, Inc. | Method and apparatus to help promote contact of gas with vaporized material |
| US6909839B2 (en) | 2003-07-23 | 2005-06-21 | Advanced Technology Materials, Inc. | Delivery systems for efficient vaporization of precursor source material |
| JP4312555B2 (ja) * | 2003-09-18 | 2009-08-12 | 富士フイルム株式会社 | 真空蒸着用ルツボおよび蛍光体シート製造装置 |
| GB2432371B (en) * | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
| FI121430B (fi) * | 2006-04-28 | 2010-11-15 | Beneq Oy | Kuuma lähde |
| DE102006022534A1 (de) * | 2006-05-15 | 2007-11-22 | Aixtron Ag | Quellenbehälter einse VPE-Reaktors |
| DE102006023046B4 (de) * | 2006-05-17 | 2009-02-05 | Qimonda Ag | Verfahren und Ausgangsmaterial zum Bereitstellen eines gasförmigen Precursors |
| EP2038456B1 (en) * | 2006-06-09 | 2014-03-05 | Soitec | System and process for high volume deposition of gallium nitride |
| US20080018004A1 (en) * | 2006-06-09 | 2008-01-24 | Air Products And Chemicals, Inc. | High Flow GaCl3 Delivery |
| KR100840783B1 (ko) | 2006-08-21 | 2008-06-23 | 삼성전자주식회사 | 전구체 기화 방법 및 장치, 및 이를 이용한 유전막 형성방법 |
| US20080241805A1 (en) * | 2006-08-31 | 2008-10-02 | Q-Track Corporation | System and method for simulated dosimetry using a real time locating system |
| CN101522943B (zh) * | 2006-10-10 | 2013-04-24 | Asm美国公司 | 前体输送系统 |
| US9109287B2 (en) * | 2006-10-19 | 2015-08-18 | Air Products And Chemicals, Inc. | Solid source container with inlet plenum |
| US9481944B2 (en) | 2006-11-22 | 2016-11-01 | Soitec | Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same |
| US9481943B2 (en) * | 2006-11-22 | 2016-11-01 | Soitec | Gallium trichloride injection scheme |
| EP2055804A1 (en) * | 2007-10-29 | 2009-05-06 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Method for preparing a deposition from a vapour |
| US8343583B2 (en) * | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
| CN102597310B (zh) | 2009-11-02 | 2015-02-04 | 西格玛-奥吉奇有限责任公司 | 固态前体输送组件以及相关方法 |
| US9809711B2 (en) | 2012-01-17 | 2017-11-07 | Versum Materials Us, Llc | Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process |
| US20130243968A1 (en) | 2012-03-16 | 2013-09-19 | Air Products And Chemicals, Inc. | Catalyst synthesis for organosilane sol-gel reactions |
| US9598766B2 (en) | 2012-05-27 | 2017-03-21 | Air Products And Chemicals, Inc. | Vessel with filter |
| KR20230080495A (ko) | 2012-05-31 | 2023-06-07 | 엔테그리스, 아이엔씨. | 배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송 |
| US9347696B2 (en) * | 2012-06-05 | 2016-05-24 | Applied Materials, Inc. | Compact ampoule thermal management system |
| WO2014018740A1 (en) * | 2012-07-25 | 2014-01-30 | William Kimmerle | Chemical precursor bubbler assembly |
| US10170297B2 (en) | 2013-08-22 | 2019-01-01 | Versum Materials Us, Llc | Compositions and methods using same for flowable oxide deposition |
| US10443128B2 (en) * | 2015-04-18 | 2019-10-15 | Versum Materials Us, Llc | Vessel and method for delivery of precursor materials |
| KR101606681B1 (ko) * | 2016-01-13 | 2016-03-28 | (주)서일퍼시픽 | 이동식 기침 유발기 |
| US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| KR102344996B1 (ko) | 2017-08-18 | 2021-12-30 | 삼성전자주식회사 | 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법 |
| US10597773B2 (en) * | 2017-08-22 | 2020-03-24 | Praxair Technology, Inc. | Antimony-containing materials for ion implantation |
| US12312684B2 (en) | 2018-06-15 | 2025-05-27 | Versum Materials Us, Llc | Siloxane compositions and methods for using the compositions to deposit silicon containing films |
| KR20200020608A (ko) | 2018-08-16 | 2020-02-26 | 에이에스엠 아이피 홀딩 비.브이. | 고체 소스 승화기 |
| CN109576675B (zh) * | 2019-01-15 | 2021-08-13 | 北京北方华创微电子装备有限公司 | 原子层沉积装置及方法 |
| US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| JP2024508458A (ja) * | 2021-02-26 | 2024-02-27 | インテグリス・インコーポレーテッド | 固体蒸発器 |
| KR20230040279A (ko) * | 2021-09-15 | 2023-03-22 | 에이에스엠 아이피 홀딩 비.브이. | 액체를 제어하기 위한 방법 및 장치 |
| US20240011160A1 (en) * | 2022-07-11 | 2024-01-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thin film deposition with improved control of precursor |
| CN120604329A (zh) * | 2023-02-08 | 2025-09-05 | 株式会社堀场Stec | 液体材料气化装置、液体材料气化系统 |
| DE102023136171A1 (de) * | 2023-12-21 | 2025-06-26 | Element 3-5 Gmbh | Vorrichtung zur Herstellung von elektronischen oder opto-elektronischen Bauelementen oder Festkörperbatterieschichten oder von metallischen Einfach- oder Mehrfachschichten |
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| JPH01168331A (ja) * | 1987-12-24 | 1989-07-03 | Mitsui Toatsu Chem Inc | 有機金属化合物の飽和方法 |
| DE3801147A1 (de) * | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
| JPH0269389A (ja) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法 |
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| JPH0632695A (ja) | 1992-07-14 | 1994-02-08 | Fujitsu Ltd | バブラー |
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| US7601225B2 (en) | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
| US7186385B2 (en) * | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
| US6921062B2 (en) * | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US6915592B2 (en) * | 2002-07-29 | 2005-07-12 | Applied Materials, Inc. | Method and apparatus for generating gas to a processing chamber |
| US6797337B2 (en) * | 2002-08-19 | 2004-09-28 | Micron Technology, Inc. | Method for delivering precursors |
| US6740586B1 (en) * | 2002-11-06 | 2004-05-25 | Advanced Technology Materials, Inc. | Vapor delivery system for solid precursors and method of using same |
| US6909839B2 (en) * | 2003-07-23 | 2005-06-21 | Advanced Technology Materials, Inc. | Delivery systems for efficient vaporization of precursor source material |
-
2004
- 2004-08-02 US US10/902,778 patent/US7261118B2/en not_active Expired - Lifetime
- 2004-08-12 IL IL16353604A patent/IL163536A0/xx unknown
- 2004-08-13 SG SG200700792-5A patent/SG130188A1/en unknown
- 2004-08-13 SG SG200405525A patent/SG109618A1/en unknown
- 2004-08-16 TW TW93124581A patent/TWI257436B/zh not_active IP Right Cessation
- 2004-08-17 EP EP20040019503 patent/EP1508631B1/en not_active Expired - Lifetime
- 2004-08-17 DE DE200460026968 patent/DE602004026968D1/de not_active Expired - Lifetime
- 2004-08-17 AT AT04019503T patent/ATE466969T1/de not_active IP Right Cessation
- 2004-08-17 KR KR1020040064595A patent/KR100590463B1/ko not_active Expired - Fee Related
- 2004-08-19 CN CNB2004100832841A patent/CN100523289C/zh not_active Expired - Lifetime
- 2004-08-19 JP JP2004239630A patent/JP4012181B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| SG109618A1 (en) | 2005-03-30 |
| US20050039794A1 (en) | 2005-02-24 |
| EP1508631A1 (en) | 2005-02-23 |
| CN1611636A (zh) | 2005-05-04 |
| KR100590463B1 (ko) | 2006-06-19 |
| JP4012181B2 (ja) | 2007-11-21 |
| SG130188A1 (en) | 2007-03-20 |
| CN100523289C (zh) | 2009-08-05 |
| IL163536A0 (en) | 2005-12-18 |
| EP1508631B1 (en) | 2010-05-05 |
| ATE466969T1 (de) | 2010-05-15 |
| US7261118B2 (en) | 2007-08-28 |
| TW200525046A (en) | 2005-08-01 |
| JP2005101564A (ja) | 2005-04-14 |
| DE602004026968D1 (de) | 2010-06-17 |
| KR20050020643A (ko) | 2005-03-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |