TWD236040S - 基板處理裝置用氣體噴嘴之部分 - Google Patents

基板處理裝置用氣體噴嘴之部分 Download PDF

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Publication number
TWD236040S
TWD236040S TW112303020F TW112303020F TWD236040S TW D236040 S TWD236040 S TW D236040S TW 112303020 F TW112303020 F TW 112303020F TW 112303020 F TW112303020 F TW 112303020F TW D236040 S TWD236040 S TW D236040S
Authority
TW
Taiwan
Prior art keywords
substrate processing
gas nozzle
processing equipment
design
nozzle part
Prior art date
Application number
TW112303020F
Other languages
English (en)
Chinese (zh)
Inventor
西本英幸
Original Assignee
日商國際電氣股份有限公司 (日本)
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 (日本), 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司 (日本)
Publication of TWD236040S publication Critical patent/TWD236040S/zh

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TW112303020F 2023-01-25 2023-06-16 基板處理裝置用氣體噴嘴之部分 TWD236040S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023-001109 2023-01-25
JP2023001109F JP1746467S (OSRAM) 2023-01-25 2023-01-25

Publications (1)

Publication Number Publication Date
TWD236040S true TWD236040S (zh) 2025-01-21

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ID=86721108

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Application Number Title Priority Date Filing Date
TW112303020F TWD236040S (zh) 2023-01-25 2023-06-16 基板處理裝置用氣體噴嘴之部分

Country Status (3)

Country Link
US (1) USD1110973S1 (OSRAM)
JP (1) JP1746467S (OSRAM)
TW (1) TWD236040S (OSRAM)

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276796B1 (en) * 1987-01-27 1992-04-08 Asahi Glass Company Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
JP5044931B2 (ja) * 2005-10-31 2012-10-10 東京エレクトロン株式会社 ガス供給装置及び基板処理装置
US20090205631A1 (en) * 2008-02-20 2009-08-20 Kao Hsung Tsung Gas burner head
USD645118S1 (en) * 2010-05-25 2011-09-13 Caldwell Tanks, Inc. Nozzle tubing having offset nozzles
TWI473903B (zh) * 2013-02-23 2015-02-21 Hermes Epitek Corp 應用於半導體設備的噴射器與上蓋板總成
US10683571B2 (en) * 2014-02-25 2020-06-16 Asm Ip Holding B.V. Gas supply manifold and method of supplying gases to chamber using same
JP6578243B2 (ja) * 2015-07-17 2019-09-18 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ ガス供給ノズル、基板処理装置、半導体装置の製造方法およびプログラム
JP6710134B2 (ja) * 2016-09-27 2020-06-17 東京エレクトロン株式会社 ガス導入機構及び処理装置
TWI649446B (zh) * 2017-03-15 2019-02-01 漢民科技股份有限公司 應用於半導體設備之可拆卸式噴氣裝置
USD888196S1 (en) 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
JP1624352S (OSRAM) * 2018-07-19 2019-02-12
JP1648531S (OSRAM) * 2019-01-28 2019-12-23
USD886947S1 (en) * 2019-03-17 2020-06-09 Runjian Mo Handheld shower
USD886948S1 (en) * 2019-03-17 2020-06-09 Runjian Mo Handheld shower
JP1684258S (OSRAM) * 2020-07-27 2021-04-26
JP1685215S (ja) * 2020-08-18 2024-05-10 基板処理装置用ガス導入管
JP1706319S (OSRAM) * 2021-06-16 2022-01-31
JP7308241B2 (ja) * 2021-08-20 2023-07-13 株式会社Kokusai Electric 基板処理装置および半導体装置の製造方法
JP1731676S (ja) * 2022-05-30 2025-12-15 基板処理装置用ガス供給ノズル
USD991416S1 (en) * 2022-06-25 2023-07-04 Jiangsu Mingqian Intellectual Property Co., Ltd. Threaded connection pipe
USD1030956S1 (en) * 2023-01-31 2024-06-11 Sidel Participations Nozzle for use with a blow molder
CA229515S (en) * 2023-07-14 2025-04-30 Lg Electronics Inc Nozzle for water purifier

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Publication number Publication date
USD1110973S1 (en) 2026-02-03
JP1746467S (OSRAM) 2023-06-16

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