TWD231991S - 基板處理裝置用氣體供給噴嘴之部分 - Google Patents

基板處理裝置用氣體供給噴嘴之部分 Download PDF

Info

Publication number
TWD231991S
TWD231991S TW111305740F TW111305740F TWD231991S TW D231991 S TWD231991 S TW D231991S TW 111305740 F TW111305740 F TW 111305740F TW 111305740 F TW111305740 F TW 111305740F TW D231991 S TWD231991 S TW D231991S
Authority
TW
Taiwan
Prior art keywords
gas supply
supply nozzle
substrate processing
processing equipment
design
Prior art date
Application number
TW111305740F
Other languages
English (en)
Chinese (zh)
Inventor
平野敦士
Original Assignee
日商國際電氣股份有限公司 (日本)
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 (日本), 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司 (日本)
Publication of TWD231991S publication Critical patent/TWD231991S/zh

Links

TW111305740F 2022-05-30 2022-11-18 基板處理裝置用氣體供給噴嘴之部分 TWD231991S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022011412F JP1731676S (enrdf_load_stackoverflow) 2022-05-30 2022-05-30
JP2022-011412 2022-05-30

Publications (1)

Publication Number Publication Date
TWD231991S true TWD231991S (zh) 2024-07-01

Family

ID=84322281

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111305740F TWD231991S (zh) 2022-05-30 2022-11-18 基板處理裝置用氣體供給噴嘴之部分

Country Status (3)

Country Link
US (1) USD1042731S1 (enrdf_load_stackoverflow)
JP (1) JP1731676S (enrdf_load_stackoverflow)
TW (1) TWD231991S (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD176076S (zh) 2015-05-28 2016-06-01 日立國際電氣股份有限公司 基板處理裝置用氣體供給噴嘴

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3869793D1 (de) * 1987-01-27 1992-05-14 Asahi Glass Co Ltd Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase.
JP3076809B2 (ja) * 1990-09-26 2000-08-14 株式会社パウレック 洗浄ノズル
AU114000S (en) * 1990-11-26 1992-05-13 Electrolux Ab A gas burner
USD641830S1 (en) * 2010-11-17 2011-07-19 Fna Ip Holdings, Inc. Spray nozzle
KR101205436B1 (ko) * 2011-01-04 2012-11-28 삼성전자주식회사 화학 기상 증착 장치
JP6320824B2 (ja) * 2014-03-31 2018-05-09 株式会社東芝 ガス供給管、およびガス処理装置
JP1520999S (enrdf_load_stackoverflow) * 2014-09-02 2015-04-06
JP1534651S (enrdf_load_stackoverflow) 2015-01-28 2015-10-05
JP1563647S (enrdf_load_stackoverflow) * 2016-01-29 2016-11-21
JP1563524S (enrdf_load_stackoverflow) 2016-03-30 2016-11-21
US10960415B1 (en) * 2016-12-23 2021-03-30 Bete Fog Nozzle, Inc. Spray nozzle and method
JP1589673S (enrdf_load_stackoverflow) * 2017-04-14 2017-10-30
JP1605945S (enrdf_load_stackoverflow) 2017-12-27 2018-06-04
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
JP1624354S (enrdf_load_stackoverflow) * 2018-07-19 2019-02-12
JP1644261S (enrdf_load_stackoverflow) 2019-03-20 2019-10-28
JP1684258S (enrdf_load_stackoverflow) * 2020-07-27 2021-04-26
JP1706319S (enrdf_load_stackoverflow) * 2021-06-16 2022-01-31

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD176076S (zh) 2015-05-28 2016-06-01 日立國際電氣股份有限公司 基板處理裝置用氣體供給噴嘴

Also Published As

Publication number Publication date
JP1731676S (enrdf_load_stackoverflow) 2022-12-08
USD1042731S1 (en) 2024-09-17

Similar Documents

Publication Publication Date Title
TWD203444S (zh) 基板處理裝置用氣體導入管
TWD208179S (zh) 基板處理裝置用晶舟之部分
TWD215398S (zh) 基板處理腔室的製程護罩
TWD215400S (zh) 基板處理腔室的製程護罩
TWD196097S (zh) 用於半導體製造設備的氣體供應板
TWD227498S (zh) 氣體分配板
TWD232581S (zh) 半導體製造裝置用反應管的內管
JP1700780S (ja) 基板処理装置用ノズルホルダー
JP1684468S (ja) 基板処理装置用天井ヒータ
JP1678278S (ja) 基板処理装置用ボート
JP1700777S (ja) 基板処理装置用ボート
TWD197467S (zh) 基板處理裝置用氣體導入管
JP1746406S (ja) サセプタユニット
JP1678273S (ja) 反応管
TWD231991S (zh) 基板處理裝置用氣體供給噴嘴之部分
JP1684469S (ja) 基板処理装置用天井ヒータ
TWD226182S (zh) 基板處理裝置用氣體供給噴嘴之部分
TWD236040S (zh) 基板處理裝置用氣體噴嘴之部分
TWD215922S (zh) 基板處理裝置用氣體導入管
TWD225633S (zh) 半導體製造裝置用隔熱組件外罩
JP1737181S (ja) 半導体処理装置用シャワーヘッド
JP1722189S (ja) 半導体処理装置用シャワーヘッドアセンブリ
TWD225634S (zh) 半導體製造裝置用隔熱組件外罩之部分
JP1678274S (ja) 基板処理装置用ボート
JP1700782S (ja) 基板処理装置用ボート