TWD231991S - Gas supply nozzle for substrate processing equipment - Google Patents

Gas supply nozzle for substrate processing equipment

Info

Publication number
TWD231991S
TWD231991S TW111305740F TW111305740F TWD231991S TW D231991 S TWD231991 S TW D231991S TW 111305740 F TW111305740 F TW 111305740F TW 111305740 F TW111305740 F TW 111305740F TW D231991 S TWD231991 S TW D231991S
Authority
TW
Taiwan
Prior art keywords
gas supply
substrate processing
processing equipment
supply nozzle
nozzle
Prior art date
Application number
TW111305740F
Other languages
Chinese (zh)
Inventor
平野敦士
Original Assignee
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD231991S publication Critical patent/TWD231991S/en

Links

TW111305740F 2022-05-30 2022-11-18 Gas supply nozzle for substrate processing equipment TWD231991S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022-011412 2022-05-30

Publications (1)

Publication Number Publication Date
TWD231991S true TWD231991S (en) 2024-07-01

Family

ID=

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD176076S (en) 2015-05-28 2016-06-01 日立國際電氣股份有限公司 Gas supply nozzle for substrate processing equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD176076S (en) 2015-05-28 2016-06-01 日立國際電氣股份有限公司 Gas supply nozzle for substrate processing equipment

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