TWD231991S - Gas supply nozzle for substrate processing equipment - Google Patents
Gas supply nozzle for substrate processing equipment Download PDFInfo
- Publication number
- TWD231991S TWD231991S TW111305740F TW111305740F TWD231991S TW D231991 S TWD231991 S TW D231991S TW 111305740 F TW111305740 F TW 111305740F TW 111305740 F TW111305740 F TW 111305740F TW D231991 S TWD231991 S TW D231991S
- Authority
- TW
- Taiwan
- Prior art keywords
- gas supply
- supply nozzle
- substrate processing
- processing equipment
- design
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract description 7
- 238000010586 diagram Methods 0.000 description 1
Abstract
【物品用途】;本設計的物品是基板處理裝置用氣體供給噴嘴，係一種應用在對於在反應管內部的垂直方向上被保持成多層的基板進行處理的基板處理裝置之氣體供給噴嘴。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。[Application of the article]; The article of this design is a gas supply nozzle for a substrate processing device, which is a gas supply nozzle used in a substrate processing device for processing substrates held in multiple layers in a vertical direction inside a reaction tube. ;[Design description]; The dotted line part disclosed in the figure is the part that this case does not advocate the design of.
Description
本設計的物品是基板處理裝置用氣體供給噴嘴，係一種應用在對於在反應管內部的垂直方向上被保持成多層的基板進行處理的基板處理裝置之氣體供給噴嘴。The article of the present invention is a gas supply nozzle for a substrate processing apparatus, and is a gas supply nozzle used in a substrate processing apparatus for processing substrates held in multiple layers in a vertical direction inside a reaction tube.
圖式所揭露之虛線部分，為本案不主張設計之部分。The dotted line part in the diagram is not the design advocated by this case.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022-011412 | 2022-05-30 | ||
| JP2022011412F JP1731676S (en) | 2022-05-30 | 2022-05-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD231991S true TWD231991S (en) | 2024-07-01 |
Family
ID=84322281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111305740F TWD231991S (en) | 2022-05-30 | 2022-11-18 | Gas supply nozzle for substrate processing equipment |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD1042731S1 (en) |
| JP (1) | JP1731676S (en) |
| TW (1) | TWD231991S (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD176076S (en) | 2015-05-28 | 2016-06-01 | 日立國際電氣股份有限公司 | Gas supply nozzle for substrate processing equipment |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0276796B1 (en) * | 1987-01-27 | 1992-04-08 | Asahi Glass Company Ltd. | Gas feeding nozzle for a chemical vapor deposition apparatus |
| JP3076809B2 (en) * | 1990-09-26 | 2000-08-14 | 株式会社パウレック | Cleaning nozzle |
| AU114000S (en) * | 1990-11-26 | 1992-05-13 | Electrolux Ab | A gas burner |
| USD641830S1 (en) * | 2010-11-17 | 2011-07-19 | Fna Ip Holdings, Inc. | Spray nozzle |
| KR101205436B1 (en) * | 2011-01-04 | 2012-11-28 | 삼성전자주식회사 | Chemical Vapor Deposition Apparatus |
| JP6320824B2 (en) * | 2014-03-31 | 2018-05-09 | 株式会社東芝 | Gas supply pipe and gas processing apparatus |
| JP1520999S (en) * | 2014-09-02 | 2015-04-06 | ||
| JP1534651S (en) | 2015-01-28 | 2015-10-05 | ||
| JP1563647S (en) * | 2016-01-29 | 2016-11-21 | ||
| JP1563524S (en) | 2016-03-30 | 2016-11-21 | ||
| US10960415B1 (en) * | 2016-12-23 | 2021-03-30 | Bete Fog Nozzle, Inc. | Spray nozzle and method |
| JP1589673S (en) * | 2017-04-14 | 2017-10-30 | ||
| JP1605945S (en) | 2017-12-27 | 2018-06-04 | ||
| USD888196S1 (en) * | 2018-07-05 | 2020-06-23 | Kokusai Electric Corporation | Gas nozzle for substrate processing apparatus |
| JP1624354S (en) * | 2018-07-19 | 2019-02-12 | ||
| JP1644261S (en) | 2019-03-20 | 2019-10-28 | ||
| JP1684258S (en) * | 2020-07-27 | 2021-04-26 | ||
| JP1706319S (en) * | 2021-06-16 | 2022-01-31 |
-
2022
- 2022-05-30 JP JP2022011412F patent/JP1731676S/ja active Active
- 2022-11-18 TW TW111305740F patent/TWD231991S/en unknown
- 2022-11-28 US US29/861,210 patent/USD1042731S1/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD176076S (en) | 2015-05-28 | 2016-06-01 | 日立國際電氣股份有限公司 | Gas supply nozzle for substrate processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1731676S (en) | 2022-12-08 |
| USD1042731S1 (en) | 2024-09-17 |
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