TWD176076S - Gas supply nozzle for substrate processing equipment - Google Patents

Gas supply nozzle for substrate processing equipment

Info

Publication number
TWD176076S
TWD176076S TW104306400F TW104306400F TWD176076S TW D176076 S TWD176076 S TW D176076S TW 104306400 F TW104306400 F TW 104306400F TW 104306400 F TW104306400 F TW 104306400F TW D176076 S TWD176076 S TW D176076S
Authority
TW
Taiwan
Prior art keywords
gas supply
nozzle
substrate processing
supply nozzle
design
Prior art date
Application number
TW104306400F
Other languages
Chinese (zh)
Inventor
Toshiki FUJINO
Kosuke Takagi
Ryota Sasajima
Original Assignee
日立國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司 filed Critical 日立國際電氣股份有限公司
Publication of TWD176076S publication Critical patent/TWD176076S/en

Links

Abstract

【物品用途】;本設計的物品是基板處理裝置用氣體供給噴嘴，如「使用狀態之參考圖」所示，為一種應用於處理在反應管內部的鉛直方向上呈多段地保持基板之基板處理裝置的氣體供給噴嘴。;【設計說明】;本設計，是將圓筒形的噴嘴彎折成U字狀，在噴嘴的側壁，以相同間隔設置圓形的氣體供給口，從彎折成L字形的前端部供給的氣體，會受到在噴嘴內的壓力和流速、熱氣的影響而均勻的供給。[Use of the article]; The article of this design is a gas supply nozzle for a substrate processing device. As shown in the "Reference Picture of Used State", it is a substrate processing application that holds the substrate in multiple stages in the vertical direction inside the reaction tube. The device's gas supply nozzle. ;[Design Description];This design is to bend a cylindrical nozzle into a U shape, and provide circular gas supply ports at the same intervals on the side wall of the nozzle, and supply from the front end bent into an L shape. The gas is uniformly supplied due to the influence of the pressure, flow rate and hot gas in the nozzle.

TW104306400F 2015-05-28 2015-11-17 Gas supply nozzle for substrate processing equipment TWD176076S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-11864F JP1547057S (en) 2015-05-28 2015-05-28

Publications (1)

Publication Number Publication Date
TWD176076S true TWD176076S (en) 2016-06-01

Family

ID=55590824

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104306400F TWD176076S (en) 2015-05-28 2015-11-17 Gas supply nozzle for substrate processing equipment

Country Status (3)

Country Link
US (1) USD783351S1 (en)
JP (1) JP1547057S (en)
TW (1) TWD176076S (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD231991S (en) 2022-05-30 2024-07-01 日商國際電氣股份有限公司 (日本) Gas supply nozzle for substrate processing equipment

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* Cited by examiner, † Cited by third party
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