USD1042731S1 - Gas nozzle for semiconductor manufacturing equipment - Google Patents

Gas nozzle for semiconductor manufacturing equipment Download PDF

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Publication number
USD1042731S1
USD1042731S1 US29/861,210 US202229861210F USD1042731S US D1042731 S1 USD1042731 S1 US D1042731S1 US 202229861210 F US202229861210 F US 202229861210F US D1042731 S USD1042731 S US D1042731S
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US
United States
Prior art keywords
semiconductor manufacturing
gas nozzle
manufacturing equipment
view
elevational view
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/861,210
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English (en)
Inventor
Atsushi Hirano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
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Kokusai Electric Corp
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Publication date
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Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HIRANO, ATSUSHI
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US29/861,210 2022-05-30 2022-11-28 Gas nozzle for semiconductor manufacturing equipment Active USD1042731S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-011412D 2022-05-30
JP2022011412F JP1731676S (enrdf_load_stackoverflow) 2022-05-30 2022-05-30

Publications (1)

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USD1042731S1 true USD1042731S1 (en) 2024-09-17

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Family Applications (1)

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US29/861,210 Active USD1042731S1 (en) 2022-05-30 2022-11-28 Gas nozzle for semiconductor manufacturing equipment

Country Status (3)

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US (1) USD1042731S1 (enrdf_load_stackoverflow)
JP (1) JP1731676S (enrdf_load_stackoverflow)
TW (1) TWD231991S (enrdf_load_stackoverflow)

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4880163A (en) * 1987-01-27 1989-11-14 Asahi Glass Company, Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
US5135170A (en) * 1990-09-26 1992-08-04 Kabushiki Kaisha Arikawa Seisakusho Cleaning nozzle
USD336096S (en) * 1990-11-26 1993-06-01 Aktiebolaget Electrolux Gas burner
USD641830S1 (en) * 2010-11-17 2011-07-19 Fna Ip Holdings, Inc. Spray nozzle
US20120167824A1 (en) * 2011-01-04 2012-07-05 Jong Sun Maeng Cvd apparatus
JP1534651S (enrdf_load_stackoverflow) 2015-01-28 2015-10-05
USD771543S1 (en) * 2014-09-02 2016-11-15 Hitachi Kokusai Electric Inc. Return nozzle
JP1563524S (enrdf_load_stackoverflow) 2016-03-30 2016-11-21
USD783351S1 (en) * 2015-05-28 2017-04-11 Hitachi Kokusai Electric Inc. Gas nozzle substrate processing apparatus
JP1605945S (enrdf_load_stackoverflow) 2017-12-27 2018-06-04
USD828091S1 (en) * 2016-01-29 2018-09-11 Hitachi Kokusai Electric, Inc. Gas supply nozzle
USD847301S1 (en) * 2017-04-14 2019-04-30 Kokusai Electric Corporation Return nozzle
US10364498B2 (en) * 2014-03-31 2019-07-30 Kabushiki Kaisha Toshiba Gas supply pipe, and gas treatment equipment
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD890572S1 (en) * 2018-07-19 2020-07-21 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
US10960415B1 (en) * 2016-12-23 2021-03-30 Bete Fog Nozzle, Inc. Spray nozzle and method
USD937385S1 (en) 2019-03-20 2021-11-30 Kokusai Electric Corporation Return nozzle
USD965740S1 (en) * 2020-07-27 2022-10-04 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD1020668S1 (en) * 2021-06-16 2024-04-02 Kokusai Electric Corporation Gas injector for substrate processing apparatus

Patent Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4880163A (en) * 1987-01-27 1989-11-14 Asahi Glass Company, Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
US5135170A (en) * 1990-09-26 1992-08-04 Kabushiki Kaisha Arikawa Seisakusho Cleaning nozzle
USD336096S (en) * 1990-11-26 1993-06-01 Aktiebolaget Electrolux Gas burner
USD641830S1 (en) * 2010-11-17 2011-07-19 Fna Ip Holdings, Inc. Spray nozzle
US20120167824A1 (en) * 2011-01-04 2012-07-05 Jong Sun Maeng Cvd apparatus
US10364498B2 (en) * 2014-03-31 2019-07-30 Kabushiki Kaisha Toshiba Gas supply pipe, and gas treatment equipment
USD771543S1 (en) * 2014-09-02 2016-11-15 Hitachi Kokusai Electric Inc. Return nozzle
USD771772S1 (en) 2015-01-28 2016-11-15 Hitachi Kokusai Electric Inc. Return nozzle
JP1534651S (enrdf_load_stackoverflow) 2015-01-28 2015-10-05
USD783351S1 (en) * 2015-05-28 2017-04-11 Hitachi Kokusai Electric Inc. Gas nozzle substrate processing apparatus
USD828091S1 (en) * 2016-01-29 2018-09-11 Hitachi Kokusai Electric, Inc. Gas supply nozzle
JP1563524S (enrdf_load_stackoverflow) 2016-03-30 2016-11-21
US10960415B1 (en) * 2016-12-23 2021-03-30 Bete Fog Nozzle, Inc. Spray nozzle and method
USD847301S1 (en) * 2017-04-14 2019-04-30 Kokusai Electric Corporation Return nozzle
JP1605945S (enrdf_load_stackoverflow) 2017-12-27 2018-06-04
USD889596S1 (en) 2017-12-27 2020-07-07 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD890572S1 (en) * 2018-07-19 2020-07-21 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD937385S1 (en) 2019-03-20 2021-11-30 Kokusai Electric Corporation Return nozzle
USD965740S1 (en) * 2020-07-27 2022-10-04 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD1020668S1 (en) * 2021-06-16 2024-04-02 Kokusai Electric Corporation Gas injector for substrate processing apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
WaveTopSign Laser Machine Gas Nozzle Air Regulating Diameter 6mm 8mm 2Pcs / Lots for Co2 Laser Head and Air Nozzle,https://www.aliexpress.us/item/2251832773301553.html?src=google&gatewayAdapt=glo2usa, 2024. (Year: 2024). *

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JP1731676S (enrdf_load_stackoverflow) 2022-12-08
TWD231991S (zh) 2024-07-01

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