USD965740S1 - Gas supply nozzle for substrate processing apparatus - Google Patents

Description

FIG. 1 is a front, top and right side perspective view of a gas supply nozzle for substrate processing apparatus showing our new design;

FIG. 2 is an enlarged portion view taken along line 2-2 in FIG. 1

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is an enlarged top plan view thereof;

FIG. 10 is an enlarged bottom plan view thereof; and,

FIG. 11 is a cross-sectional view taken along line 11-11 in FIG. 6.

Claims (1)

CLAIM
1. The ornamental design for a gas supply nozzle for substrate processing apparatus, as shown and described.

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