USD901564S1 - Gas inlet attachment for wafer processing apparatus - Google Patents
Gas inlet attachment for wafer processing apparatus Download PDFInfo
- Publication number
- USD901564S1 USD901564S1 US29/699,539 US201929699539F USD901564S US D901564 S1 USD901564 S1 US D901564S1 US 201929699539 F US201929699539 F US 201929699539F US D901564 S USD901564 S US D901564S
- Authority
- US
- United States
- Prior art keywords
- processing apparatus
- gas inlet
- wafer processing
- inlet attachment
- attachment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
Claims (1)
- The ornamental design for a gas inlet attachment for wafer processing apparatus, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-001458 | 2019-01-28 | ||
JPD2019-1458F JP1648531S (en) | 2019-01-28 | 2019-01-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD901564S1 true USD901564S1 (en) | 2020-11-10 |
Family
ID=68916739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/699,539 Active USD901564S1 (en) | 2019-01-28 | 2019-07-26 | Gas inlet attachment for wafer processing apparatus |
Country Status (3)
Country | Link |
---|---|
US (1) | USD901564S1 (en) |
JP (1) | JP1648531S (en) |
TW (1) | TWD203444S (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD924953S1 (en) * | 2018-07-19 | 2021-07-13 | Kokusai Electric Corporation | Gas inlet attachment for substrate processing apparatus |
USD944661S1 (en) * | 2019-07-17 | 2022-03-01 | Kokusai Electric Corporation | Calibrator for wafer handling robots |
USD964443S1 (en) | 2020-08-18 | 2022-09-20 | Kokusai Electric Corporation | Gas inlet attachment for wafer processing apparatus |
USD967210S1 (en) * | 2020-03-25 | 2022-10-18 | SEVENTY EIGHT Co., Ltd. | Welding nozzle cleaner |
USD973738S1 (en) * | 2019-11-13 | 2022-12-27 | SEVENTY EIGHT Co., Ltd. | Welding nozzle cleaner |
USD983151S1 (en) * | 2020-09-09 | 2023-04-11 | Kokusai Electric Corporation | Exhaust liner for reaction tube |
USD1017561S1 (en) | 2021-03-22 | 2024-03-12 | Kokusai Electric Corporation | Nozzle holder of substrate processing apparatus |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1684258S (en) | 2020-07-27 | 2021-04-26 | ||
TWD223988S (en) | 2022-03-03 | 2023-03-01 | 家登精密工業股份有限公司 | air box |
Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD326272S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
USD326273S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
US20040217217A1 (en) * | 2003-04-09 | 2004-11-04 | Samsung Electronics Co., Ltd. | Gas supplying apparatus |
US20070131168A1 (en) * | 2005-10-31 | 2007-06-14 | Hisashi Gomi | Gas Supplying unit and substrate processing apparatus |
US20080092815A1 (en) * | 2006-10-18 | 2008-04-24 | Advanced Micro-Fabrication Equipment, Inc. Asia | Gas distribution assembly for use in a semiconductor work piece processing reactor |
US20100243166A1 (en) * | 2009-03-31 | 2010-09-30 | Tokyo Electron Limited | Gas flow path structure and substrate processing apparatus |
US20110098841A1 (en) * | 2008-03-27 | 2011-04-28 | Tokyo Electron Limited | Gas supply device, processing apparatus, processing method, and storage medium |
US20150240359A1 (en) * | 2014-02-25 | 2015-08-27 | Asm Ip Holding B.V. | Gas Supply Manifold And Method Of Supplying Gases To Chamber Using Same |
US20150348755A1 (en) * | 2014-05-29 | 2015-12-03 | Charm Engineering Co., Ltd. | Gas distribution apparatus and substrate processing apparatus including same |
US20170051408A1 (en) * | 2015-07-17 | 2017-02-23 | Hitachi Kokusai Electric Inc. | Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD796458S1 (en) * | 2016-01-08 | 2017-09-05 | Asm Ip Holding B.V. | Gas flow control plate for semiconductor manufacturing apparatus |
US20180087152A1 (en) | 2016-09-28 | 2018-03-29 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus, nozzle base, and manufacturing method for semiconductor device |
US20180087156A1 (en) * | 2016-09-27 | 2018-03-29 | Tokyo Electron Limited | Gas Introduction Mechanism and Processing Apparatus |
US20180135179A1 (en) * | 2016-11-14 | 2018-05-17 | Tokyo Electron Limited | Gas Injector and Vertical Heat Treatment Apparatus |
US20180135173A1 (en) * | 2016-11-15 | 2018-05-17 | Asm Ip Holding B.V. | Gas supply unit and substrate processing apparatus including the gas supply unit |
US10364493B2 (en) * | 2016-08-25 | 2019-07-30 | Asm Ip Holding B.V. | Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line |
-
2019
- 2019-01-28 JP JPD2019-1458F patent/JP1648531S/ja active Active
- 2019-06-19 TW TW108303614F patent/TWD203444S/en unknown
- 2019-07-26 US US29/699,539 patent/USD901564S1/en active Active
Patent Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD326272S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
USD326273S (en) * | 1988-07-25 | 1992-05-19 | Tel Sagami Limited | Heat insulating cylinder for thermal treatment of semiconductor wafers |
US20040217217A1 (en) * | 2003-04-09 | 2004-11-04 | Samsung Electronics Co., Ltd. | Gas supplying apparatus |
US20070131168A1 (en) * | 2005-10-31 | 2007-06-14 | Hisashi Gomi | Gas Supplying unit and substrate processing apparatus |
US20080092815A1 (en) * | 2006-10-18 | 2008-04-24 | Advanced Micro-Fabrication Equipment, Inc. Asia | Gas distribution assembly for use in a semiconductor work piece processing reactor |
US20110098841A1 (en) * | 2008-03-27 | 2011-04-28 | Tokyo Electron Limited | Gas supply device, processing apparatus, processing method, and storage medium |
US20100243166A1 (en) * | 2009-03-31 | 2010-09-30 | Tokyo Electron Limited | Gas flow path structure and substrate processing apparatus |
US20150240359A1 (en) * | 2014-02-25 | 2015-08-27 | Asm Ip Holding B.V. | Gas Supply Manifold And Method Of Supplying Gases To Chamber Using Same |
US20150348755A1 (en) * | 2014-05-29 | 2015-12-03 | Charm Engineering Co., Ltd. | Gas distribution apparatus and substrate processing apparatus including same |
US20170051408A1 (en) * | 2015-07-17 | 2017-02-23 | Hitachi Kokusai Electric Inc. | Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD796458S1 (en) * | 2016-01-08 | 2017-09-05 | Asm Ip Holding B.V. | Gas flow control plate for semiconductor manufacturing apparatus |
US10364493B2 (en) * | 2016-08-25 | 2019-07-30 | Asm Ip Holding B.V. | Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line |
US20180087156A1 (en) * | 2016-09-27 | 2018-03-29 | Tokyo Electron Limited | Gas Introduction Mechanism and Processing Apparatus |
US20180087152A1 (en) | 2016-09-28 | 2018-03-29 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus, nozzle base, and manufacturing method for semiconductor device |
US20180135179A1 (en) * | 2016-11-14 | 2018-05-17 | Tokyo Electron Limited | Gas Injector and Vertical Heat Treatment Apparatus |
US20180135173A1 (en) * | 2016-11-15 | 2018-05-17 | Asm Ip Holding B.V. | Gas supply unit and substrate processing apparatus including the gas supply unit |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD924953S1 (en) * | 2018-07-19 | 2021-07-13 | Kokusai Electric Corporation | Gas inlet attachment for substrate processing apparatus |
USD944661S1 (en) * | 2019-07-17 | 2022-03-01 | Kokusai Electric Corporation | Calibrator for wafer handling robots |
USD973738S1 (en) * | 2019-11-13 | 2022-12-27 | SEVENTY EIGHT Co., Ltd. | Welding nozzle cleaner |
USD967210S1 (en) * | 2020-03-25 | 2022-10-18 | SEVENTY EIGHT Co., Ltd. | Welding nozzle cleaner |
USD964443S1 (en) | 2020-08-18 | 2022-09-20 | Kokusai Electric Corporation | Gas inlet attachment for wafer processing apparatus |
USD983151S1 (en) * | 2020-09-09 | 2023-04-11 | Kokusai Electric Corporation | Exhaust liner for reaction tube |
USD1017561S1 (en) | 2021-03-22 | 2024-03-12 | Kokusai Electric Corporation | Nozzle holder of substrate processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP1648531S (en) | 2019-12-23 |
TWD203444S (en) | 2020-03-21 |
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