TWD180288S - 電漿處理裝置用上腔室 - Google Patents

電漿處理裝置用上腔室

Info

Publication number
TWD180288S
TWD180288S TW104305548D01F TW104305548D01F TWD180288S TW D180288 S TWD180288 S TW D180288S TW 104305548D01 F TW104305548D01 F TW 104305548D01F TW 104305548D01 F TW104305548D01 F TW 104305548D01F TW D180288 S TWD180288 S TW D180288S
Authority
TW
Taiwan
Prior art keywords
design
upper chamber
difference
original design
processing device
Prior art date
Application number
TW104305548D01F
Other languages
English (en)
Chinese (zh)
Inventor
Takashi Uemura
Kohei Sato
Susumu Tauchi
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of TWD180288S publication Critical patent/TWD180288S/zh

Links

TW104305548D01F 2016-02-26 2016-04-29 電漿處理裝置用上腔室 TWD180288S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2016-4151F JP1564934S (ko) 2016-02-26 2016-02-26

Publications (1)

Publication Number Publication Date
TWD180288S true TWD180288S (zh) 2016-12-21

Family

ID=57406451

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104305548D01F TWD180288S (zh) 2016-02-26 2016-04-29 電漿處理裝置用上腔室

Country Status (3)

Country Link
US (1) USD812578S1 (ko)
JP (1) JP1564934S (ko)
TW (1) TWD180288S (ko)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD875054S1 (en) 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD826300S1 (en) * 2016-09-30 2018-08-21 Oerlikon Metco Ag, Wohlen Rotably mounted thermal plasma burner for thermalspraying
JP1611626S (ko) * 2017-01-20 2018-08-20
USD842259S1 (en) * 2017-04-28 2019-03-05 Applied Materials, Inc. Plasma chamber liner
USD838681S1 (en) * 2017-04-28 2019-01-22 Applied Materials, Inc. Plasma chamber liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD818447S1 (en) * 2017-04-28 2018-05-22 Applied Materials, Inc. Plasma feedthrough flange
USD837754S1 (en) * 2017-04-28 2019-01-08 Applied Materials, Inc. Plasma chamber liner
JP1638504S (ko) * 2018-12-06 2019-08-05
JP1646366S (ko) * 2019-03-19 2019-11-25
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
US12100577B2 (en) 2019-08-28 2024-09-24 Applied Materials, Inc. High conductance inner shield for process chamber
USD1042373S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1008967S1 (en) * 2022-05-16 2023-12-26 Japan Aviation Electronics Industry, Limited Collar for connector

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153907A (en) * 1977-05-17 1979-05-08 Vactec, Incorporated Photovoltaic cell with junction-free essentially-linear connections to its contacts
USD274836S (en) * 1982-12-02 1984-07-24 Smith Edward J Space heater assembly
US5641375A (en) * 1994-08-15 1997-06-24 Applied Materials, Inc. Plasma etching reactor with surface protection means against erosion of walls
USD404369S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Manifold cover for use in a semiconductor wafer heat processing apparatus
US6623609B2 (en) * 1999-07-12 2003-09-23 Semitool, Inc. Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same
USD448729S1 (en) * 1999-12-14 2001-10-02 Mitsubishi Denki Kabushiki Kaisha Stator of AC generator for vehicles
JP4470274B2 (ja) * 2000-04-26 2010-06-02 東京エレクトロン株式会社 熱処理装置
US20040069223A1 (en) * 2002-10-10 2004-04-15 Taiwan Semiconductor Manufacturing Co., Ltd. Wall liner and slot liner for process chamber
USD491963S1 (en) * 2002-11-20 2004-06-22 Tokyo Electron Limited Inner wall shield for a process chamber for manufacturing semiconductors
US9677188B2 (en) * 2009-06-17 2017-06-13 Novellus Systems, Inc. Electrofill vacuum plating cell
TWI502617B (zh) * 2010-07-21 2015-10-01 應用材料股份有限公司 用於調整電偏斜的方法、電漿處理裝置與襯管組件
WO2013148890A1 (en) * 2012-03-28 2013-10-03 Novellus Systems, Inc. Methods and apparatuses for cleaning electroplating substrate holders
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
US10049862B2 (en) * 2015-04-17 2018-08-14 Lam Research Corporation Chamber with vertical support stem for symmetric conductance and RF delivery

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875054S1 (en) 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD858468S1 (en) 2018-03-16 2019-09-03 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD998575S1 (en) 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1009816S1 (en) 2021-08-29 2024-01-02 Applied Materials, Inc. Collimator for a physical vapor deposition chamber
USD997111S1 (en) 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1038901S1 (en) 2022-01-12 2024-08-13 Applied Materials, Inc. Collimator for a physical vapor deposition chamber

Also Published As

Publication number Publication date
JP1564934S (ko) 2016-12-05
USD812578S1 (en) 2018-03-13

Similar Documents

Publication Publication Date Title
TWD180288S (zh) 電漿處理裝置用上腔室
TWD175852S (zh) 電漿處理裝置用上腔室
TWD175855S (zh) 電漿處理裝置用下腔室
USD997947S1 (en) Electronic device with a tablet stand
USD910913S1 (en) Pod for an electronic vaporizer
USD839254S1 (en) Case for an electronic device
USD968737S1 (en) Vacuum cleaner nozzle
USD824387S1 (en) Electronic device
USD839870S1 (en) Electronic device
USD742883S1 (en) Component for an electronic device
TWD186395S (zh) 電漿處理裝置用保護環
USD792403S1 (en) Electronic device
USD792404S1 (en) Electronic device
USD815379S1 (en) Vacuum cleaner
TWD168827S (zh) 半導體製造裝置用晶舟
TWD175853S (zh) 電漿處理裝置用罩環
TWD179562S (zh) 置物架
USD771281S1 (en) Architectural fixture
TWD179095S (zh) 基板保持環
TWD192241S (zh) 半導體元件之部分
TWD174920S (zh) 基板處理裝置用氣體供給噴嘴
USD752844S1 (en) Brassiere with surface ornamentation
USD841267S1 (en) Vacuum cleaner
USD796440S1 (en) Electrical plug
USD775980S1 (en) Sensor device