TW588223B - Projection optical system and exposure device - Google Patents

Projection optical system and exposure device Download PDF

Info

Publication number
TW588223B
TW588223B TW091124319A TW91124319A TW588223B TW 588223 B TW588223 B TW 588223B TW 091124319 A TW091124319 A TW 091124319A TW 91124319 A TW91124319 A TW 91124319A TW 588223 B TW588223 B TW 588223B
Authority
TW
Taiwan
Prior art keywords
optical system
projection optical
lens group
lens
negative
Prior art date
Application number
TW091124319A
Other languages
English (en)
Chinese (zh)
Inventor
Koji Shigematsu
Shintaro Kudo
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of TW588223B publication Critical patent/TW588223B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW091124319A 2001-11-05 2002-10-22 Projection optical system and exposure device TW588223B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001339424 2001-11-05
JP2002200695A JP4228130B2 (ja) 2001-11-05 2002-07-10 投影光学系、露光装置及びデバイスの製造方法

Publications (1)

Publication Number Publication Date
TW588223B true TW588223B (en) 2004-05-21

Family

ID=26624347

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091124319A TW588223B (en) 2001-11-05 2002-10-22 Projection optical system and exposure device

Country Status (4)

Country Link
JP (1) JP4228130B2 (https=)
KR (1) KR20030038427A (https=)
CN (1) CN100483172C (https=)
TW (1) TW588223B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
JP4779394B2 (ja) * 2005-03-23 2011-09-28 株式会社ニコン 投影光学系、露光装置、および露光方法
JP2010091751A (ja) 2008-10-07 2010-04-22 Canon Inc 投影光学系及び露光装置
CN102486569B (zh) * 2010-12-01 2014-06-18 上海微电子装备有限公司 一种投影物镜系统
CN103105666B (zh) * 2011-11-10 2015-04-15 上海微电子装备有限公司 一种曝光投影物镜
CN103364928B (zh) * 2012-03-31 2015-09-30 上海微电子装备有限公司 一种投影物镜光学系统
CN107664809B (zh) * 2016-07-29 2019-11-26 上海微电子装备（集团）股份有限公司 一种投影物镜

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3819048B2 (ja) * 1995-03-15 2006-09-06 株式会社ニコン 投影光学系及びそれを備えた露光装置並びに露光方法
JP3864399B2 (ja) * 1996-08-08 2006-12-27 株式会社ニコン 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
JP2000056219A (ja) * 1998-08-11 2000-02-25 Nikon Corp 投影光学系
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device

Also Published As

Publication number Publication date
CN100483172C (zh) 2009-04-29
JP2003202494A (ja) 2003-07-18
KR20030038427A (ko) 2003-05-16
CN1417610A (zh) 2003-05-14
JP4228130B2 (ja) 2009-02-25

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