TW548743B - Semiconductor arrangement and process for etching a layer of the semiconductor arrangement by means of a silicon-containing etching mask - Google Patents

Semiconductor arrangement and process for etching a layer of the semiconductor arrangement by means of a silicon-containing etching mask Download PDF

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Publication number
TW548743B
TW548743B TW091100879A TW91100879A TW548743B TW 548743 B TW548743 B TW 548743B TW 091100879 A TW091100879 A TW 091100879A TW 91100879 A TW91100879 A TW 91100879A TW 548743 B TW548743 B TW 548743B
Authority
TW
Taiwan
Prior art keywords
layer
substance
silicon
etching
cover
Prior art date
Application number
TW091100879A
Other languages
English (en)
Chinese (zh)
Inventor
Matthias Goldbach
Original Assignee
Infineon Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag filed Critical Infineon Technologies Ag
Application granted granted Critical
Publication of TW548743B publication Critical patent/TW548743B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/61—Formation of materials, e.g. in the shape of layers or pillars of insulating materials using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/405—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their composition, e.g. multilayer masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/73—Etching of wafers, substrates or parts of devices using masks for insulating materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4083—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by their behaviours during the lithography processes, e.g. soluble masks or redeposited masks

Landscapes

  • Drying Of Semiconductors (AREA)
TW091100879A 2001-01-26 2002-01-21 Semiconductor arrangement and process for etching a layer of the semiconductor arrangement by means of a silicon-containing etching mask TW548743B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10103524A DE10103524A1 (de) 2001-01-26 2001-01-26 Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske

Publications (1)

Publication Number Publication Date
TW548743B true TW548743B (en) 2003-08-21

Family

ID=7671843

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091100879A TW548743B (en) 2001-01-26 2002-01-21 Semiconductor arrangement and process for etching a layer of the semiconductor arrangement by means of a silicon-containing etching mask

Country Status (7)

Country Link
US (1) US6864188B2 (https=)
EP (1) EP1360711B1 (https=)
JP (1) JP2004517505A (https=)
KR (1) KR100516839B1 (https=)
DE (2) DE10103524A1 (https=)
TW (1) TW548743B (https=)
WO (1) WO2002059951A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7553770B2 (en) 2007-06-06 2009-06-30 Micron Technology, Inc. Reverse masking profile improvements in high aspect ratio etch
KR101972159B1 (ko) 2012-08-24 2019-08-16 에스케이하이닉스 주식회사 실리콘함유하드마스크를 구비한 반도체장치 및 그 제조 방법
KR102051529B1 (ko) 2013-03-25 2020-01-08 에스케이하이닉스 주식회사 반도체 장치 및 그 제조방법, 그리고 반도체 장치를 포함하는 마이크로프로세서, 프로세서, 시스템, 데이터 저장 시스템 및 메모리 시스템
CN111584358A (zh) * 2020-04-09 2020-08-25 中国科学院微电子研究所 刻蚀沟槽的方法

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GB1147014A (en) * 1967-01-27 1969-04-02 Westinghouse Electric Corp Improvements in diffusion masking
DE2557079C2 (de) * 1975-12-18 1984-05-24 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Herstellen einer Maskierungsschicht
JPS5351970A (en) * 1976-10-21 1978-05-11 Toshiba Corp Manufacture for semiconductor substrate
US4211601A (en) * 1978-07-31 1980-07-08 Bell Telephone Laboratories, Incorporated Device fabrication by plasma etching
US4283249A (en) * 1979-05-02 1981-08-11 International Business Machines Corporation Reactive ion etching
US5362682A (en) * 1980-04-10 1994-11-08 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
NL8301262A (nl) * 1983-04-11 1984-11-01 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij met behulp van ionenimplantatie patronen worden aangebracht in een laag siliciumnitride.
JPS62224687A (ja) * 1986-03-25 1987-10-02 Anelva Corp エツチング方法
US5091047A (en) * 1986-09-11 1992-02-25 National Semiconductor Corp. Plasma etching using a bilayer mask
FR2610140B1 (fr) * 1987-01-26 1990-04-20 Commissariat Energie Atomique Circuit integre cmos et procede de fabrication de ses zones d'isolation electrique
US4782009A (en) * 1987-04-03 1988-11-01 General Electric Company Method of coating and imaging photopatternable silicone polyamic acid
FR2652448B1 (fr) * 1989-09-28 1994-04-29 Commissariat Energie Atomique Procede de fabrication d'un circuit integre mis haute tension.
JP3006048B2 (ja) * 1990-07-27 2000-02-07 ソニー株式会社 ドライエッチング方法
KR960000375B1 (ko) * 1991-01-22 1996-01-05 가부시끼가이샤 도시바 반도체장치의 제조방법
US5217568A (en) * 1992-02-03 1993-06-08 Motorola, Inc. Silicon etching process using polymeric mask, for example, to form V-groove for an optical fiber coupling
JP3111661B2 (ja) * 1992-07-24 2000-11-27 ソニー株式会社 ドライエッチング方法
US5350484A (en) * 1992-09-08 1994-09-27 Intel Corporation Method for the anisotropic etching of metal films in the fabrication of interconnects
US5525535A (en) * 1995-07-26 1996-06-11 United Microelectronics Corporation Method for making doped well and field regions on semiconductor substrates for field effect transistors using liquid phase deposition of oxides
JPH1160735A (ja) * 1996-12-09 1999-03-05 Toshiba Corp ポリシランおよびパターン形成方法
TWI246633B (en) * 1997-12-12 2006-01-01 Applied Materials Inc Method of pattern etching a low k dielectric layen
US6025273A (en) * 1998-04-06 2000-02-15 Taiwan Semiconductor Manufacturing Company, Ltd. Method for etching reliable small contact holes with improved profiles for semiconductor integrated circuits using a carbon doped hard mask
US6387819B1 (en) * 1998-04-29 2002-05-14 Applied Materials, Inc. Method for etching low K dielectric layers
JP2001210726A (ja) * 2000-01-24 2001-08-03 Hitachi Ltd 半導体装置及びその製造方法
US6527968B1 (en) * 2000-03-27 2003-03-04 Applied Materials Inc. Two-stage self-cleaning silicon etch process
KR20030007904A (ko) * 2000-06-06 2003-01-23 이케이씨 테크놀로지, 인코포레이티드 전자 재료 제조 방법
US6583046B1 (en) * 2001-07-13 2003-06-24 Advanced Micro Devices, Inc. Post-treatment of low-k dielectric for prevention of photoresist poisoning

Also Published As

Publication number Publication date
EP1360711A1 (de) 2003-11-12
WO2002059951A1 (de) 2002-08-01
DE50209714D1 (de) 2007-04-26
US20030207588A1 (en) 2003-11-06
JP2004517505A (ja) 2004-06-10
KR20030074745A (ko) 2003-09-19
US6864188B2 (en) 2005-03-08
DE10103524A1 (de) 2002-08-22
KR100516839B1 (ko) 2005-09-26
EP1360711B1 (de) 2007-03-14

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