JP2004517505A - 半導体構造、および、シリコンを含有したエッチングマスクを用いた半導体構造の層のエッチング方法 - Google Patents

半導体構造、および、シリコンを含有したエッチングマスクを用いた半導体構造の層のエッチング方法 Download PDF

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Publication number
JP2004517505A
JP2004517505A JP2002560183A JP2002560183A JP2004517505A JP 2004517505 A JP2004517505 A JP 2004517505A JP 2002560183 A JP2002560183 A JP 2002560183A JP 2002560183 A JP2002560183 A JP 2002560183A JP 2004517505 A JP2004517505 A JP 2004517505A
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JP
Japan
Prior art keywords
etching
layer
mask layer
silicon
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002560183A
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English (en)
Japanese (ja)
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JP2004517505A5 (https=
Inventor
ゴールドバッハ，マティアス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Publication of JP2004517505A publication Critical patent/JP2004517505A/ja
Publication of JP2004517505A5 publication Critical patent/JP2004517505A5/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/61—Formation of materials, e.g. in the shape of layers or pillars of insulating materials using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/405—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their composition, e.g. multilayer masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/73—Etching of wafers, substrates or parts of devices using masks for insulating materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
    • H10P76/408—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes
    • H10P76/4083—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials characterised by their sizes, orientations, dispositions, behaviours or shapes characterised by their behaviours during the lithography processes, e.g. soluble masks or redeposited masks

Landscapes

  • Drying Of Semiconductors (AREA)
JP2002560183A 2001-01-26 2002-01-17 半導体構造、および、シリコンを含有したエッチングマスクを用いた半導体構造の層のエッチング方法 Pending JP2004517505A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10103524A DE10103524A1 (de) 2001-01-26 2001-01-26 Verfahren und Halbleiteranordnung zur Ätzung einer Schicht eines Halbleitersubstrats mittels einer siliziumhaltigen Ätzmaske
PCT/DE2002/000130 WO2002059951A1 (de) 2001-01-26 2002-01-17 Halbleiteranordnung und verfahren zur ätzung einer schicht der halbleiteranordnung mittels einer siliziumhaltigen ätzmaske

Publications (2)

Publication Number Publication Date
JP2004517505A true JP2004517505A (ja) 2004-06-10
JP2004517505A5 JP2004517505A5 (https=) 2005-05-26

Family

ID=7671843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002560183A Pending JP2004517505A (ja) 2001-01-26 2002-01-17 半導体構造、および、シリコンを含有したエッチングマスクを用いた半導体構造の層のエッチング方法

Country Status (7)

Country Link
US (1) US6864188B2 (https=)
EP (1) EP1360711B1 (https=)
JP (1) JP2004517505A (https=)
KR (1) KR100516839B1 (https=)
DE (2) DE10103524A1 (https=)
TW (1) TW548743B (https=)
WO (1) WO2002059951A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7553770B2 (en) 2007-06-06 2009-06-30 Micron Technology, Inc. Reverse masking profile improvements in high aspect ratio etch
KR101972159B1 (ko) 2012-08-24 2019-08-16 에스케이하이닉스 주식회사 실리콘함유하드마스크를 구비한 반도체장치 및 그 제조 방법
KR102051529B1 (ko) 2013-03-25 2020-01-08 에스케이하이닉스 주식회사 반도체 장치 및 그 제조방법, 그리고 반도체 장치를 포함하는 마이크로프로세서, 프로세서, 시스템, 데이터 저장 시스템 및 메모리 시스템
CN111584358A (zh) * 2020-04-09 2020-08-25 中国科学院微电子研究所 刻蚀沟槽的方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1147014A (en) * 1967-01-27 1969-04-02 Westinghouse Electric Corp Improvements in diffusion masking
DE2557079C2 (de) * 1975-12-18 1984-05-24 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Herstellen einer Maskierungsschicht
JPS5351970A (en) * 1976-10-21 1978-05-11 Toshiba Corp Manufacture for semiconductor substrate
US4211601A (en) * 1978-07-31 1980-07-08 Bell Telephone Laboratories, Incorporated Device fabrication by plasma etching
US4283249A (en) * 1979-05-02 1981-08-11 International Business Machines Corporation Reactive ion etching
US5362682A (en) * 1980-04-10 1994-11-08 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
NL8301262A (nl) * 1983-04-11 1984-11-01 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting, waarbij met behulp van ionenimplantatie patronen worden aangebracht in een laag siliciumnitride.
JPS62224687A (ja) * 1986-03-25 1987-10-02 Anelva Corp エツチング方法
US5091047A (en) * 1986-09-11 1992-02-25 National Semiconductor Corp. Plasma etching using a bilayer mask
FR2610140B1 (fr) * 1987-01-26 1990-04-20 Commissariat Energie Atomique Circuit integre cmos et procede de fabrication de ses zones d'isolation electrique
US4782009A (en) * 1987-04-03 1988-11-01 General Electric Company Method of coating and imaging photopatternable silicone polyamic acid
FR2652448B1 (fr) * 1989-09-28 1994-04-29 Commissariat Energie Atomique Procede de fabrication d'un circuit integre mis haute tension.
JP3006048B2 (ja) * 1990-07-27 2000-02-07 ソニー株式会社 ドライエッチング方法
KR960000375B1 (ko) * 1991-01-22 1996-01-05 가부시끼가이샤 도시바 반도체장치의 제조방법
US5217568A (en) * 1992-02-03 1993-06-08 Motorola, Inc. Silicon etching process using polymeric mask, for example, to form V-groove for an optical fiber coupling
JP3111661B2 (ja) * 1992-07-24 2000-11-27 ソニー株式会社 ドライエッチング方法
US5350484A (en) * 1992-09-08 1994-09-27 Intel Corporation Method for the anisotropic etching of metal films in the fabrication of interconnects
US5525535A (en) * 1995-07-26 1996-06-11 United Microelectronics Corporation Method for making doped well and field regions on semiconductor substrates for field effect transistors using liquid phase deposition of oxides
JPH1160735A (ja) * 1996-12-09 1999-03-05 Toshiba Corp ポリシランおよびパターン形成方法
TWI246633B (en) * 1997-12-12 2006-01-01 Applied Materials Inc Method of pattern etching a low k dielectric layen
US6025273A (en) * 1998-04-06 2000-02-15 Taiwan Semiconductor Manufacturing Company, Ltd. Method for etching reliable small contact holes with improved profiles for semiconductor integrated circuits using a carbon doped hard mask
US6387819B1 (en) * 1998-04-29 2002-05-14 Applied Materials, Inc. Method for etching low K dielectric layers
JP2001210726A (ja) * 2000-01-24 2001-08-03 Hitachi Ltd 半導体装置及びその製造方法
US6527968B1 (en) * 2000-03-27 2003-03-04 Applied Materials Inc. Two-stage self-cleaning silicon etch process
KR20030007904A (ko) * 2000-06-06 2003-01-23 이케이씨 테크놀로지, 인코포레이티드 전자 재료 제조 방법
US6583046B1 (en) * 2001-07-13 2003-06-24 Advanced Micro Devices, Inc. Post-treatment of low-k dielectric for prevention of photoresist poisoning

Also Published As

Publication number Publication date
EP1360711A1 (de) 2003-11-12
WO2002059951A1 (de) 2002-08-01
DE50209714D1 (de) 2007-04-26
US20030207588A1 (en) 2003-11-06
KR20030074745A (ko) 2003-09-19
US6864188B2 (en) 2005-03-08
TW548743B (en) 2003-08-21
DE10103524A1 (de) 2002-08-22
KR100516839B1 (ko) 2005-09-26
EP1360711B1 (de) 2007-03-14

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