TW514983B - Stage device and exposure device - Google Patents

Stage device and exposure device Download PDF

Info

Publication number
TW514983B
TW514983B TW090127736A TW90127736A TW514983B TW 514983 B TW514983 B TW 514983B TW 090127736 A TW090127736 A TW 090127736A TW 90127736 A TW90127736 A TW 90127736A TW 514983 B TW514983 B TW 514983B
Authority
TW
Taiwan
Prior art keywords
platform
stage
vibration
wafer
reticle
Prior art date
Application number
TW090127736A
Other languages
English (en)
Chinese (zh)
Inventor
Masato Takahashi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of TW514983B publication Critical patent/TW514983B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW090127736A 2000-11-08 2001-11-08 Stage device and exposure device TW514983B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000340506A JP2002151379A (ja) 2000-11-08 2000-11-08 ステージ装置および露光装置

Publications (1)

Publication Number Publication Date
TW514983B true TW514983B (en) 2002-12-21

Family

ID=18815410

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090127736A TW514983B (en) 2000-11-08 2001-11-08 Stage device and exposure device

Country Status (3)

Country Link
JP (1) JP2002151379A (ja)
KR (1) KR20020036698A (ja)
TW (1) TW514983B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109212909A (zh) * 2017-06-30 2019-01-15 上海微电子装备（集团）股份有限公司 一种反力外引机构、电机装置以及光刻机

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102017002542A1 (de) * 2017-03-16 2018-09-20 Applied Materials, Inc. (N.D.Ges.D. Staates Delaware) Vorrichtung zum Halten, Positionieren und/oder Bewegen eines Objekts

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109212909A (zh) * 2017-06-30 2019-01-15 上海微电子装备（集团）股份有限公司 一种反力外引机构、电机装置以及光刻机
US10691025B2 (en) 2017-06-30 2020-06-23 Shanghai Micro Electronics Equipment (Group) Co., Ltd. Reaction force diversion mechanism, motor device and photolithography machine

Also Published As

Publication number Publication date
JP2002151379A (ja) 2002-05-24
KR20020036698A (ko) 2002-05-16

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