TW200308048A - Stage apparatus and exposing device - Google Patents

Abstract

A stage apparatus is provided with a guide member and a driving device. The guide member that guides a stage body holding a substrate in a way capable of moving in a first direction moves in a second direction above a base. The driving device drives the stage body moves towards the first direction. A follower stage that is arranged between the guide member and the base is connected to a part of the driving device and moves towards the second direction with the guide member. The stage apparatus can be achieved compactly, and the dust caused by the source-supplying member can be obstructed without the damage of the control-ability of the driving device.

Description

200308048 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a stage device that moves a stage body holding a substrate in multiple directions, and also relates to an exposure device, which is held here by using A photomask and a substrate on a stage for exposure processing, and more particularly, a stage device and an exposure device suitable for lithography engineering when manufacturing semiconductor integrated circuits or liquid crystal displays and other components. [Prior Art] Conventionally, in the manufacturing process of, for example, a liquid crystal display (collectively referred to as a flat display), an exposure device is often used in order to form a transistor or a diode on a substrate (glass substrate). In this exposure device, a substrate coated with a photosensitizer is placed on a holder of a stage device, and a fine circuit pattern drawn on a photomask is transferred to a substrate through an optical system such as a projection lens. On the substrate, circuit patterns are stacked in multiple layers to form a wiring circuit. Therefore, when a pattern image such as the second layer or later is transferred to the substrate in an exposure device, for the formed circuit patterns, these patterns to be exposed are Need to coincide correctly. In the example shown in FIG. 15, a schematic configuration of a flat plate stage (substrate stage apparatus) in an exposure apparatus for manufacturing a liquid crystal display is shown. On the -X side edge of the fixed plate 91, the fixed guide portion 92 is provided in the Y direction. Further, on the surface of the fixed plate 91, a guide beam 93 extending in the X direction is provided in a state of being combined with the first carriage (ca a r r a g e) 9 4. The guide beams 9 3 and the carriage 94 are driven by the linear motors 100 and 101 to move freely along the fixed plate 91 and the fixed guide portion 92 in the Y direction. The guide beam 9 3 is provided with a linear motor 9 9 driven by the guide beam 9 3 and

11415pif ptd Page 5 200308048 V. Description of the invention (2) The fixed plate 91 is a second carriage 95 whose guide portion can move freely in the X direction. The fixed plate 9 1, the fixed guide portion 9 2, the guide beam 9 3, and the carriages 9 4 and 9 5 are respectively assembled through a non-contact gas bearing (g a s b e a r i n g) 9 6. The upper part of the second carriage 95 is provided with a platform (p 1 a t e t a b 1 e) 9 7 capable of fine movement in the up-down (Z-axis) direction, and a flat stand 98 capable of rotating at a slight angle about the Z-axis. On the plate holder 98, a substrate (glass substrate) (not shown) is suction-corrected and fixed on the upper surface of the plate holder 98. These carriages 94 and 95, the platform 97, and the flat stand 98 constitute a flat stand 90. An imaging optical system is arranged above the substrate, and a mask holder and a mask are arranged above the imaging optics. Furthermore, an illumination optical system and a lamp tube (both not shown) as a light source are arranged above the mask. These members are supported by a cylinder provided on the fixed plate 91. In the above-mentioned structure, the fine circuit pattern drawn on the photomask is exposed to the substrate through the imaging optical system by the exposure of the light tube and the exposure light of the illumination optics. At this time, because it is limited to the exposure area where the mask and substrate can be imaged at one time through the imaging optical system, the mask and substrate are relative to the exposure light using the X direction or Y direction of the mask holder and plate stage 90 The scanning movement is performed for continuous scanning exposure. However, the conventional stage device and exposure device described above have the following problems. In the conventional stage device of the exposure device, when the scanning direction is a fixed guide direction (Y-axis), the main stage including the platform 97 or the flat stand 9 8 and the guide beam 9 3 and The linear motor 9 9 moves, so, sweep

11415pif ptd Page 6 200308048 V. Description of the invention (3) The larger the moving weight in the sight direction, the worse the controllability of the linear motors 100 and 110 is. In addition, electrical cables, air pipes, cooling pipes, etc., which are resource supply members for supplying various resources, are connected to the main carrier. However, with the movement of the main carrier, these resource supply members are subject to a steady state. It is one of the reasons for the low controllability due to external disturbance such as vibration or shock resistance. Here, although it is considered that the slave stage driven by the master stage is set in the scanning direction (Y-axis direction) or the orthogonal scanning direction (X-axis direction) and is adjacent to the stage, the relay transmission connection is made. These resource supply members to the main stage, however, are located on the fixed plate 9 1 regardless of the arrangement in either direction, so the area of the fixed plate becomes larger. At this time, the number of places (supporting surfaces) required for the precision of the fixing plate is increased, and the cost is increased, which causes a problem that the device is enlarged. In addition, when the main stage moves in a direction different from the driven direction of the driven stage, these resource supply members will rub against each other and generate dust when they move, and foreign matter will adhere to the substrate, which may cause the substrate. Risk of defective products in exposure processing. Here, although covering the above-mentioned resource supply member with a cover to suppress dust generation, in the moving direction of the cover, the vibration generated by the cover movement becomes external disturbance of the control system, resulting in high speed and high accuracy. Obstacles to positioning. On the other hand, in the above-mentioned stage device, the substrate is set on the flat plate holder 98, although the flat plate holder 98 can be rotated by a slight angle in the substrate surface (horizontal plane) to perform alignment. The complicated mechanism that needs to rotate the large flat bracket 9 8 is precise and time-consuming.

11415pif ptd Page 7 200308048 V. Description of the invention (4) It is necessary to take countermeasures to prevent displacement after positioning, and it is also necessary to worry about the flatness of the flat stand 98. In addition, in a device that continuously exposes a substrate in response to an increase in size, the number of boxes that have to be disassembled and conveyed is expected to increase due to the size of the stage and the weight or the size of the device during transportation. In such a field, it is necessary to worry that the time for field assembly will be prolonged. [Summary of the Invention] The present invention is made in consideration of the above-mentioned problems, and provides a stage device and an exposure device, without impairing the controllability of a driving device such as a linear motor, and also achieving a lighter device and reducing resources. Dust generated by the supply member. And, another object of the present invention is to provide a stage device and an exposure device, which do not require a complicated mechanism, do not cause the substrate position shift or the flatness of the flat stand to deteriorate. . Furthermore, an object of the present invention is to provide a stage device and an exposure device, which can be conveyed in a state of maintaining accuracy without disassembling a large-sized stage, and can also shorten the time of field assembly. In order to achieve the above object, the present invention adopts the structures corresponding to Figs. 1 to 13 of the first embodiment. The stage device 35 of the present invention includes a guide member 4 and a drive device YL. The guide member 4 guides the stage bodies 7, 10, 1 1 holding the substrate P to move freely in the first direction Y, and moves it on the base 1 in the second direction X. The driving device YL drives the stage bodies 7, 10, and 11 in the first direction X. Furthermore, at least a part 27 of the driving device YL is connected and moved to the guide

11415pif ptd Page 8 200308048 V. Description of the invention (5) The component 4 and the driven stage 25 in the second direction are arranged between the guide member 4 and the base 1. Therefore, in the stage device of the present invention, since the driven stage 25 includes at least a part 27 of the driving device YL, the stage body 7, 10, 11 and the guide member 4 can be moved in the second direction X. At this time, the weight is reduced, and controllability of a linear motor or the like can be suppressed. Moreover, in the present invention, the driven stage 25 is arranged between the guide member 4 and the base 1, so it is not necessary to enlarge (widen) the plane of the base 1, and it is necessary to require precision on the base. There are not many places, and it can prevent the device from becoming larger. Furthermore, when the resource supply member 17 is relayed to the driven stage 25, even if the resource supply member rubs against each other and dust is generated, it is not easy to be caused by the existence of the guide member 4 or the cover members 85 and 86. Foreign matter adheres to the substrate P. The exposure device 31 of the present invention exposes the photomask M pattern held on the photomask stage MST to the photosensitive substrate P held on the substrate stage 35, and is used as the photomask stage MST and At least one of the substrate stages 35 is a stage. Therefore, in the exposure apparatus of the present invention, the position control and speed control of the photomask M and the photosensitive substrate P can be performed with high accuracy, so that the pattern transfer accuracy can be improved, and the device can be reduced in price and downsized. Furthermore, in the present invention, since the possibility of foreign matter adhering to the photosensitive substrate P is reduced, the occurrence of defective products can be suppressed. In order to make the above and other objects, features, and advantages of the present invention more comprehensible, the following describes the preferred embodiments in detail with the accompanying drawings, as follows:

11415pif ptd Page 9 200308048 5. Description of the Invention (6) [Embodiment] Hereinafter, embodiments of the stage device and the exposure device of the present invention will be described with reference to FIGS. 1 to 14. Here, the stage device of the present invention will be described using a scanning type exposure device that exposes a mask pattern to a photosensitive substrate (substrate), for example, an angular glass substrate, as a photosensitive substrate (substrate), for example. The exposure apparatus is a substrate stage suitable for moving a stage device that holds a glass substrate. In these patterns, the same constituent elements as those in FIG. 15 of the conventional example are given the same reference numerals, and a description thereof will be omitted here. FIG. 1 is a schematic configuration diagram of an exposure apparatus 31 according to the present invention. This exposure device 31 includes: an illumination optical system 3 2. a mask stage 33 that moves while holding a mask (grating) M, a projection optical system PL, a body cylinder 3 that holds the projection optical system PL 4, and a glass substrate ( Substrate, photosensitive substrate) P is a substrate stage device (stage device) 35 that moves. The illumination optical system 32, for example, is disclosed in Japanese Patent Laid-Open No. 9-3 2 0 9 5 6 as disclosed in the early Japanese patent. The optical system is composed of a light source unit, a shutter, and a secondary light source. System, retic 1 eb 1 ind, and imaging lens system (none of which is shown). The rectangular (or arc-shaped) illumination area held on the mask M on the mask stage device 33 is uniformly illuminated by the illumination light IL. The body cylinder 34 is composed of a first cylinder 37 and a second cylinder 38. The first column 37 is vibration-proof through a plurality of (there are four here, that is, only the two on the front side are shown in FIG. 1) on the base plate PB which is the reference of the device placed on the floor FD. The stage 1 2 is held. The second cylinder 38 is provided on the first cylinder 37. This anti-vibration table 1 2 uses an elastic material such as rubber as a damping material

11415pif ptd Page 10 200308048 V. Description of the invention (7) Those who are passive. In addition, if the base plate BP is not provided, the main body column 34 may be directly provided on the installation floor FD. The first column 3 7 has a base plate (base) 1 made of cast iron having a substantially rectangular plan view, which is supported by four anti-vibration tables 12 2 horizontally and constitutes a substrate stage device 35. The upper part 4 of the upper part 4 is provided with four leg portions 40 respectively in the vertical direction, and an upper tube portion connecting the four leg portions 40 to each other simultaneously constitutes a lens barrel fixing plate 41 of a top plate portion of the first cylinder 37. An opening 4 1 a having a circular shape in a plan view is formed in a central portion of the mirror fixing plate 41, and a projection optical system PL is inserted into the opening 4 1 a from above. The projection optical system P L 9 is provided with a flange FL at a center or lower position in the height direction, and the projection optical system PL is supported by the lens barrel fixing plate 41 from below through the flange FL. The second cylinder 38 is provided with four leg portions erected around the projection optical system PL on the lens barrel fixing plate 41 and a top plate portion connecting the upper ends of the four leg portions 42 to each other, that is, a mask stage 33 Of the base 43. An opening 4 3 a constituting a passage for the illumination light IL is formed in the central portion of the base 43. The entire or a part of the base 43 (the portion corresponding to the opening 43a) may be formed of a light-transmitting material. The vibration of the body cylinder 34 constructed in this way from the floor F D is blocked to a small amount of G poles by using the vibration isolation table 12 (G is the acceleration of gravity). As the projection optical system PL, the optical axis AX direction is the Z-axis direction. Here, a method of forming a telecentric optical arrangement on both sides is used, which is formed by a plurality of lens elements arranged at predetermined intervals along the optical axis AX direction. refraction

11415pif ptd Page 11 200308048 V. Description of the invention (8) Equal times ’. Therefore, the shadow optical system PL has a predetermined projection magnification. For example, the illumination area of the mask Mσ is used to illuminate the optical system PL with the illumination light IL from the illumination optics 32. The light is transmitted through the projection light image, and is exposed to the pattern of the illuminated area portion of the mask. The exposure is equal to that of an upright conjugate. 2 The aforementioned illuminated area cover on the glass substrate ρ is coated with a photoresist. The ground support it 3 is provided with: the above-mentioned base 4 3, the direction above the base 4 3 (relative shift, f / person's photomask stage MS τ, and the photomask stage MST along the age scan Direction) in the X-axis direction (the first direction) driving the fixed punch / little drive in the orthogonal γ-axis direction (the second direction)% # AUCT ， withstands the driving mask load accompanied by this mask driving system 44 The reaction force blocking frames 45 and 46 of the reaction force generated by the mouth MST. Further, as a mechanism for receiving a reaction force generated by the driving of the photomask stage MST, a voice-coil motor other than the reaction force blocking frame may be used. As shown in the oblique view in FIG. 2, the mask stage μ ST has a rectangular shape with a rectangular opening at the center, that is, a plate-shaped member having a rectangular frame shape. , With 3 vacuum chucks 47a ~ 47c. With these vacuum chucks 47a to 47c, the mask M is sucked and held on the mask stage.

On the base 43, a pair of X guides 48A, 48B are extended at a certain interval in the X-axis direction of the scanning direction. Above the X guides 48A and 48B, a photomask stage MST is arranged. The photomask stage MST is supported in a non-contact manner by using a plurality of air bearings (air bearings) 4 8 provided at the bottom thereof.

11415pif ptd Page 12 200308048 V. Description of the invention (9) Guides 48A, 48B. In addition, the mask stage MST is supported on the X-guide by the turning guide or the like in a contact state. A pair of movable members 60A and 60B are projected in the Y-axis direction on both sides of the reticle stage MST in the Y-axis direction. The movable member 60B provided at + Y is separated from each other by sandwiching both sides of the cutout 62 formed in the X-axis direction central portion of the + Y-side end portion of the mask stage MST. Then, corresponding to these movable members 60A, 60B, the movable members 60A, 60B and the X motor 6 1A, which is a linear motor, are formed on both outer sides of the X guide portions 48A, 48B in the Y-axis direction. 6 1 B, and holding the movable members 60 A, 60 B, respectively, the fixing members 6 3 A, 6 3 Β which are opened in a zigzag shape toward the mask stage MST opening are extended along the X axis direction. The movable members 60A and 60B and the photomask stage MST are driven in the X-axis direction by using a Loroz force generated by the electromagnetic interaction between the fixed members 63 and 6 3 B. As the X motors 6 1 A and 6 1 B, a known linear motor of a moving coil (m 0 v i n g-c 0 i 1) type can be used here. In addition, as a pair of X motors, it is also okay to use a linear motor of a moving magnet (in 0 v i n g-m a g n e t) type. X motors 6 1 A and 6 1 B are controlled by the main control device (not shown). A plurality of gap sensors (not shown) facing the fixed members 6 3 A and 6 3 B are embedded in the movable members 60 A and 60 B, respectively. Each gap sensor is a non-contact method that uses a gap amount (gap amount) between the movable member 60 A and the fixed member 6 3 A and a gap amount between the movable member 60 B and the fixed member 6 3 B. For detection, for example, a reflective sensor having an optical range of 2 mm can be used. At both ends of the fixing member 63A in the X-axis direction, the base 43 is

H415pif Ptd Page 13 200308048 V. Description of the Invention The position adjustment devices 65A, 65B (but 65B is not shown in the second figure) are supported at the tip of the reaction force blocking frame 45. This reaction force blocking frame 45 is independent of the main body cylinder 34 constituting a part of the base 43 in vibration. Similarly, the fixing members 6 3 B are supported at the front ends of the reaction force blocking frame 46 through a pair of position adjusting devices 65A and 65B on both end sides in the X-axis direction. The reaction force blocking frame 46 is independent of the main cylinder 34 in vibration. As the position adjustment devices 6 5 A and 6 5 B, for example, a pressure element can be used, and the posture of the fixed element relative to the movable element can be controlled by the driving of the pressure element. The base ends of the reaction force blocking frames 45 and 46 are fixed to the ground FD through openings formed in the lens barrel fixing plate 41, the bottom bed 1, and the base plate BP shown in Fig. 1, respectively. The base ends of the reaction force blocking frames 45 and 46 may be provided outside the lens barrel fixing plate 41, the bottom bed 1, and the base plate B P. In the internal space of the cutout 62 of the reticle stage MST, an air slide 66 is provided on the X-guide portion 4 8 B and has only a degree of freedom in the scanning direction. Then, a fixing member 67 of the Y motor is provided on the air slide 66. As this puppet motor, for example, a voice coil motor (ν 〇ice-c 〇i 1 motor) can be used, and a Loroz force generated by electromagnetic interaction will be provided on an unillustrated MST side of the photomask stage. The movable member is driven in the Y-axis direction of the scanning direction, and the photomask stage MST is driven in the Y-axis direction. The air slide plate 66 is provided with a movable member 68 constituting a linear motor for driving the air slide plate to drive the fixed piece 63B and the air slide plate 66. The aforementioned Υ motor requires the reticle stage MST to be driven in the Υ axis direction regardless of where the reticle stage MST is located, so a Υ motor (such as an air slide 66 or a fixed part) is detected by a gap sensor (not shown). 67) the distance from the mask stage MST,

11415pif ptd Page 14 200308048 V. Description of the invention (11) The linear motor for driving the air slide is used to track the driving of the mask stage MST at all times. Therefore, the reaction force when the reticle stage MST is driven in the Y direction is transmitted to the reaction force interruption frame 46 through the movable member 68 and the fixing member 63B, and is further transmitted to the installation floor FD. On the other hand, a pair of triangular ridges 69A and 69B are fixed on the side of the -X side of the mask stage M ST, and the X interferometer 70 faces these triangular prisms 69A and 69B and is fixed on the base 43 -X-direction end. This X interferometer 70 actually includes a pair of two-way interferometers, and projects interference beams on the triangular prisms 6 9 A and 6 9 B, and then receives the reflected light to use the predetermined decomposition energy, for example, 0.5 The resolution energy of ~ 1 nm was used to measure the positions of the X-axis directions of the triangular prisms 6 9 A and 69B. An optical unit 71 including a polarizing beam splitter, a quarter-wave plate, and the like (not shown) is fixed to an end portion on the -Y side of the upper surface of the mask stage MST. Opposite this optical unit 71, at the end in the -Y direction on the upper surface of the base 43, the fixed mirror 72 is extended in the X-axis direction. Then, using a Y interferometer including an optical unit 7 1, a light source unit and a receiver (not shown), through the fixed mirror 72, according to a predetermined decomposition energy, such as a decomposition energy of about 0.5 to 1 nm, the photomask stage is measured. The position in the Y-axis direction of MST (and mask M). FIG. 3 is a perspective view showing the entire structure of the substrate stage device 35. The X-axis guides 2a and 2b extending in the X direction are spaced apart from each other in the Υ direction and are laid in parallel on the top of the bottom bed 1. The X carriages 3a and 3b are the X-axis guides 2a and 2a. 2 b is provided on both sides and the upper part of the b and can be moved independently. On the upper part of the X carriages 3 a and 3 b, extending in the Y direction, and in a bridge-like manner connecting the two carriages 3 a and 3 b, a suspension beam guide (guide member) 4 is connected.

11415pif ptd Page 15 200308048 5. Description of the invention (12) The knot is fixed. As shown in FIG. 4, a plurality of air bearings 5 (hereinafter referred to as a pitch bearing, p i t c h bearing) are arranged between the upper surfaces of the X carriages 3 a and 3 b and the X guide portions 2 a and 2 b. A plurality of air bearings 6 (hereinafter referred to as swing bearings, y a w b e a r i n g) are arranged between the sides of the X carriages 3 a and 3 b and the sides of the X guides 2 a and 2 b. The air bearings 5 and 6 are fixed to the X slides 3a and 3b, and the X slides 3a and 3b and the Y beam guide 4 are floating support (non-contact) to the X guides 2a and 2b. A structure in which the lead portions 2a and 2b guide and move freely in the X direction. It is also okay to omit the air bearing of either of the X carriages 3 a and 3 b. A Y carriage 7 is placed on the upper portion of the γ beam guide 4. As shown in FIG. 5, a plurality of (four in FIG. 5) air bearings 8 (hereinafter referred to as base bearings) are arranged between the Y carriage 7 and the upper surface of the Y beam guide 4. A plurality of (two in FIG. 5) air bearings 9 (hereinafter referred to as side bearings) are arranged between both sides of the Y carriage 7 and the Y beam guide 4. These air bearings 8 and 9 are fixed on the Y carriage 7 and are floated (non-contact) supported on the Y beam guide 4 by the Y carriage 7. They are guided by the Y beam guide 4 at Y Move freely in all directions. On the Y carriage 7, the platform 10 is supported by a plurality of supporting organizations (not shown). The platform 10 is provided with a plate holder 11 holding a glass substrate P by suction. These Y carriages 7, the platform 10 and the flat stand 11 constitute the stage body of the present invention. Returning to FIG. 3, the both ends of the Y-beam guide 4 are provided with movable members (second movable members) 1a, 13b constituting the X linear motor XL1. The movable parts 1 3 a and 1 3 b are moved along the fixed parts 1 4 a and 1 4 b extending in the X direction.

11415pif ptd page 16 200308048 5. Description of the invention (13). These fixtures 14a and 14b are supported by a reaction force interruption frame 46 made of a pressure element and the like through a position adjustment device (second position adjustment device) similarly to the fixtures 63A and 63B of the photomask stage MST. . A gap sensor (second detection device) (not shown) is provided to detect the amount of gap in the Z direction between the movable members 1 3 a, 1 3 b and the fixed members 1 4 a, 1 4 b. According to the detection result of the second detection device, the second position adjustment device is driven in the Z direction, thereby adjusting the relative positional relationship between the fixed parts 1 4 a, 1 4 b and the movable parts 1 3 a, 1 3 b. Below the bottom bed 1, a base frame 21 is provided on a base plate BP through a plurality of height adjustment mechanisms 20 (see Fig. 4). On the base frame 21, a plurality of pillars (supporting portions) 22 are erected in the Z direction. The pillars 2 2 are provided in a state of penetrating the through holes (second through holes) la formed in the bottom bed 1 in a non-contact manner with respect to the bottom bed 1 and protruding from the bottom bed 1 at the upper end. A follower guide irame 23 extending in the X direction is spaced apart in the Y direction and arranged in parallel at the upper end of the pillar 22. That is, the driven guide frames 23 are set in a state in which they are separated from the bottom bed 1 by vibration. A follower guide 24a extending in the X direction is also fixedly provided on each of the follower guide frames 23 with high parallelism. On each of the driven guide frames 23, the sliders 24 and 4b are arranged in a state in which movement other than the X direction is restricted. As the guide method of the slide plate 2 4b, a linear motion guide (so-called LM guide) which is rotationally contacted by a ball or a roller can be used, or a non-contact guide such as an air bearing. The driven table (driven table) 25 is located between the bed 1 and the Y-beam guide 4 and is mounted on the slide plate 2 4b. As shown in Figure 6, the follower 25 is flat

11415pi f.ptd Page 17 200308048 V. Description of the invention (14) The plan view is rectangular, and Y linear motor bearings 2 6 extending in the Y direction are provided on both ends of the X side. Each Y linear motor bearing 26 is provided with a fixture 27 constituting a Y linear motor (driving device) YL. On both ends of each of the Y linear motor bearings 26, a movable member (third movable member) 28 of a driven X linear motor (second driving device) X L 2 is provided. The movable member 28 is moved along the above-mentioned fixed members 14a, 14b (14a, not shown) extended in the X direction. That is, the gap amount between the movable member 28 and the fixed members 1 4 a and 1 4 b is detected by the second detection device. Then, according to the detection result of the second detection device, the second position adjustment device is driven toward the Z direction, whereby the relative positional relationship between the fixed members 1 4 a, 1 4 b and the movable member 28 can be adjusted. Further, in the vicinity of the center in the X direction of the driven stage 25, at both ends in the Y direction, driven stage holding mechanisms (connection devices) 15 are provided (see FIG. 4). The driven stage holding mechanism 15 is composed of: a main shaft 1 a having a spherical tip at the tip, a linear guide 1 5 b that guides the main shaft 15 a to move in the Y direction, and an air bearing 15 that drives the main shaft 15 a. c and other components. On the X carriages 3 a and 3 b, tapered bearings 16 are formed which are connected to the main shaft 15 a (spherical portion). By driving the cylinder, the main shaft 1 5 a is connected to / disengaged from the tapered bearing, thereby the driven table 2 5 can be integrated with the X carriage 3 a, 3 b and the Y beam guide 4. / Unlink. As shown in FIG. 7, the air bearing 9 mounted on the Y carriage 7 is a fine adjustment screw 5 1 and a tapered bearing 5 2 with a spherical end, and is arranged around the axis parallel to the Z axis (along the glass substrate). The holding surface of P) is rotatably supported, and is opposed to the Y-beam guide 4 from both sides of the Y carriage 7 to be empty

11415pif.ptd Page 18 200308048 V. Description of the invention (15) Air bearing 9, by which the appropriate rigidity and load capacity required by the air bearing 9 can be obtained. These air bearings 9 use a fine adjustment screw 51 to constitute a holding device of the present invention. Moreover, on the both sides of the Y carriage 7 in the width direction, there are provided movable members 53 and 53 of a Y linear motor YL that drives the Y carriage in the Y direction. The movable members 53 and 53 are used in combination with the fixed members 27 and 27 described above. The thrust generated by the electromagnetic interaction moves in the Y direction. In addition, the fixed member 27 and the movable member 53 are independently driven in the X direction. Therefore, the gap amount (gap amount) in the X direction between these fixed members 27 and the movable member is not shown. The gap sensor monitors to control the gap amount below the set value. Furthermore, a gap sensor (detection device) that detects a gap amount in the Z direction between the fixed member 27 and the movable member 53 is also provided. Therefore, a position adjustment device (not shown) composed of a pressure element and the like is assembled between the fixing member 27 and the Y linear motor bearing 26 near the two ends of the fixing member 27, and according to the detection of the detection device As a result, the position adjustment devices are driven in the Z direction, thereby adjusting the relative positional relationship between the fixed member 27 and the movable member 53. Furthermore, as shown in FIG. 8, on the Y carriage 7, below the Y beam guide 4, two linear motors for position control of the movable member 53 are arranged near the movable member 53 respectively. 5 4. In addition, a moving mirror 5 7 is provided on the + X side end edge of the flat plate holder 1 1 in the Y direction, and a measurement beam 5 6 leaving from a laser interferometer not shown in the Y direction to be irradiated is accepted. The reflected light reflected by the moving mirror 57 can measure the position in the X direction of the flat holder 1 1 (that is, the glass substrate P) and the amount of rotation around the Z axis. On the other hand, it is composed of a carriage 7, a platform 10, and a flat stand 11.

11415pif.ptd Page 19, 200308048 5. The main carrier (the main body of the carrier) of the invention description (16), electrical cables, air compressor pipes, cooling pipes and other cables (resource supply components) 1 7 (refer to Section (Figure 4) are connected to supply various resources from the outside of the stage device. These cables 17 are shown in Figures 4 and 9 to 11 as the base frame 21 and the follower. The station 25 is relayed and connected to the main carrier. As will be described in detail later, a through-hole 1 b penetrating in the Z direction is formed in the bottom bed 1. Cables 17 which are introduced below the bottom bed 1 are transmitted through the through-hole 1 b and relayed by the follower 2 5. As shown in Fig. 9, a set of linear guides 81 are fixed to the lower surface side of the driven table 25 in a manner substantially parallel (X direction) to the moving guide section 24a of the driven table 25. On the linear guide portion 81, the slide plate 8 2 is movably mounted in the guide direction (X direction.) On this slide plate 8 2 is a movable pulley 8 that winds a dustproof sheet (cover member) 85. 3, and a plurality of rollers 8 4 a capable of rotating freely, such as cable 7 are supported and mounted on the roller holding plate 84 b. Then, the cable 17 is drawn around the base frame 21 and penetrates The through hole lb is wound on a roller 84a arranged in a semicircular shape, and then folded back and introduced into the end portion 89 of the driven table 25. The dustproof sheet 85 is fixed to the driven guide frame 23 at one end, and The end is a thin plate fixed to the movable pulley 83, and is a thin plate fixed at both ends. Moreover, one end of the other dust-proof sheet (cover member) 8 6 is fixed to the side opposite to the dust-proof sheet 85 on the slide plate 8 6. The winding section 87 is fixed to the driven guide frame 23 and the like. In the exposure device 31 having the above-mentioned structure, first, the moving parts of the substrate stage device 35 will be described. When the glass substrate P is moved in the X direction (scanning Sight direction) when moving, make the third picture

11415pif ptd Page 20 200308048 V. The X linear motor XL1 and the driven X linear motor XL2 shown in the description of the invention (Π) operate. In this way, the X carriages 3a, 3b are guided by the X-axis guides 2a, 2b, and the Y-beam guide 4 is moved in the X direction together with the main stage. When the slide plate 24b is guided by the follower guide 24b, the follower 25 moves in the X direction between the Y beam guide 4 and the bed. At this time, the gap amount in the X direction of the movable member 5 3 connected to the Y carriage 7 and the fixed member 2 7 connected to the driven table 25 is monitored and maintained by the detection result of the gap sensor. At a certain value. Therefore, when moving in the X direction while maintaining a predetermined relative position relationship between the master stage and the driven stage 25, the cables are arranged between the master stage and the driven stage 25 5 No deformation, no friction or resistance, and no external disturbance such as vibration. And 'view lines 17 arranged between the driven table 25 and the base frame 21 are shown in Fig. 9 to Fig. 11 and are held by the roller holding plate § 4 b In a confined ring (arc) state, it moves in the same way as the driven table 25, so that it does not produce a constant impact and resistance. The cables 17 are folded back by the roller holding plate 84b in the X direction (moving direction). Therefore, the moving amount of the roller holding plate 84b is 1/2 of the moving amount of the driven table 25. Therefore, the size of the through hole 1 b to be formed in the bottom bed 1 can be made small. Moreover, when the driven table 25 is moved, the driven pulleys 8 3, 8 7 can be pulled out of the dustproof sheet 8 6 to expand and contract in accordance with the length of the position of the sliding plate 8 2. Therefore, even when the cables 17 are dusty, the dust-proof sheets 85, 86 and the follower 25 cover the penetrating blade 1b, so the Y-beam guide 4 can be suppressed, that is, the main stage. On the dust. When the Y beam guide 4 and the driven table 25 are moved in the X direction,

11415pif Ptd Page 21 200308048 V. Description of the invention (18) The main shaft 1 5 a of the moving stage holding mechanism 1 5 a is disengaged from the tapered bearing 16 of the X carriage 3 a, 3 b, however, the X linear motor XL 1 In the initial operation of the driven X linear motor XL2, etc., the Y beam guide 4 and the driven table 25 can be mechanically integrated and connected by joining the main shaft 15a to the tapered bearing 16. In this case, even if the linear motors XL 1 and XL 2 are in a stable state, the relative positional relationship between the fixed member 27 and the movable member 53 can be kept constant. On the other hand, when the glass substrate P is moved in the Y direction (non-scanning direction), the Y linear motor YL is operated. At this time, let the movable member 53 follow the linear encoder 54 in the same direction (-Y direction in FIG. 7), and drive only the same distance at the same time point, thereby the Y carriage 7 (ie, the main carriage) It moves in the Y direction and the main stage (glass substrate P) can move in steps. In addition, if the two movable members 5 3 follow the linear encoder 5 4 and move in the reverse direction as shown in FIG. 12 and only drive the same distance at the same time point, Y can be made to slide relative to the Y beam guide 4. The holder 7 is slightly rotated around the Z axis, and is aligned with 0 rotation (the θ z direction) of the glass substrate P.

As will be described in detail later, on both sides of the Y-beam guide 4, the air bearings 9 that are free to rotate (head vibration) are arranged facing each other, and the two movable members 5 3 are moved in opposite directions to each other, even the Y carriage 7 When the Y-beam guide 4 is inclined, the air bearing surfaces can be moved in opposite directions while maintaining the state of the air bearing surface facing the Y-beam guide. At this time, the sphere of the fine adjustment screw 51 of the support point of the air bearing 9 is rotated around the center point of the opposed air bearings 9 as the rotation center. As a result, the air gap (thickness of the air film) of the air bearing 9 and the Y-beam guide 4 becomes smaller, so that Y can be achieved.

11415pif ptd Page 22 200308048 V. Description of the invention (19) The small rotation of the carriage 7. FIG. 13 illustrates the cooperation relationship between the linear motor Y L and the air bearing 9 when the Y carriage 7 rotates around the Z axis. The two thrusts F acting in opposite directions and the opposing force R of the air bearing 9 from the Y-beam guide 4 are in the same state of momentum, and the distance from the center of rotation 0 to the movable member 53 is L. From The distance from the position where the air bearing 9 is subjected to the reaction force R to the center of revolution 0 is a, then the relationship from FXL-RX a to 0 becomes F 2 Rxa / L. &Quot; (I) 0 Here, R depends on The air bearing 9 is rigid, but the rigidity value is usually 500 N /// m or less. Here, 2.5mrad is used as the rotation angle of the Y carriage 7. At this time, the clearance change of the air bearing 9 is 1 // m, the J-shape of the air bearing 9 is 500N / // m, and the distance is 500mm. The distance a is 700 mm, and the thrust F of the linear motor YL changes from the formula (1) to F = 500 X 0 · 7/500 2 0 · 7 N. That is, even if the frictional force of each contact portion is taken into consideration, the sledge carriage 7 can be rotated with a very small force. In addition, when the air gap of the air bearing 9 is zero, the amount of rotation of the carriage 7 is very small because the slewing carriage 7 cannot be rotated to the above degree. The other reason is that the amount of the gap between the movable member 53 and the fixed member 27 of the linear motor YL or the ratio of the linear encoder (s c a 1 e) to the clearance of the bottom bed becomes the limitation of the rotation of the carriage 7. As a means for detecting the rotation amount of 0 rotations, a contact type or non-contact type substrate end-face measuring device (not shown) provided on the plate holder 11 can be used, or a connection provided outside the main stage can be used.

11415pif ptd Page 23 200308048 V. Description of the invention (20) Contact or non-contact substrate end-face measuring device. When a measurement device outside the main stage is used, before the glass substrate P is to be placed on the plate holder 1 1, the tilt information of the glass substrate P is output to a drive control device (not shown). The drive control device uses the measured values of the movable member 5 3 and the linear encoder 5 4 to correct the rotation error of the glass substrate P, and rotates the Y carriage 7 in advance. At this time, when the Y carriage 7 needs to be swiveled large, the moving mirror 57 of the measuring beam 56 of the laser interferometer that receives the measurement method for the positioning of the main stage is too inclined to enter the interference (not shown). If there is an error (erro: r) (see Figure 12). Even in such a case, the amount of rotation of the Y carriage 7 is measured by the two linear encoders 5 and 4 described above, and the plate holder 11 is set to Y after the glass substrate P is mounted from a substrate transfer device (not shown). The carriage 7 returns to the normal position and restores the laser interferometer. Therefore, no complicated mechanism for high-precision alignment is needed, and the alignment can be performed quickly without damaging the flatness of the flat plate holder 11. Next, the exposure operation of the exposure device 31 will be described. When the exposure process is started, the main stage of the mask stage MST holding the photomask M and the substrate stage device 35 holding the glass substrate P is directed toward the illumination light IL by a scanning controller (not shown). X axis direction, and move at the same speed. In this manner, the pattern of the mask M illuminated by the illumination light IL is sequentially exposed on the glass substrate P. At this time, although the driven stage 25 is also moved in synchronization with the main stage, it is arranged to support the base 1 of the main stage through the pillars 22 and the spar guides 4 that support the driven stage 25. Vibration is separated, so it can avoid moving with the driven table 2 5

11415pif ptd Page 24 200308048 V. Description of the invention (21) The vibration of “—” is transmitted to the main stage. J, j = this synchronous movement, eccentric load is applied to the anti-vibration table 12 and the sinking is not settled, so that the base 43 of the photomask stage MST and the bottom bed 1 of the substrate stage device 35 will tilt , X stage motors of the photomask stage MST 6 Α Α, 6 Β, X linear motors of the substrate stage device 35 "linear = diamond motion, and according to the gap sense provided by each linear motor: the posture of the fixed part of the sex motor. In this way, each fixation: the relative angle of = will become zero, and the amount of clearance between these fixations can be maintained at a predetermined value.! 仟 (and 'with the mask stage MST moving in the X and Υ directions) The reaction force “is transmitted to the reaction force interruption frame” through the fixtures 63A and 63B. The reaction force acts on the photomask stage MST. Similarly, the substrate stage 35 The main load d: is not anti-Li, is transmitted to the reaction force interruption through the fixing members 14a, Ub. 'On the main carrier, the external disturbance caused by the reaction force is uncooperative. Let ’s determine L'7. The reaction force of the carrier moving in the γ direction is transmitted to the driven stage 25 through = ^ = 27, but as already explained, ^ is configured as It is in a state of vibration separation from the pillar 22 and the bottom bed 1, and the external disturbance generated by the anti-knife house will not act on the main stage. In nature, 3 ν 动 In this embodiment, because the driven stage 2 5 supports Υ f and moves up to the fixed member 27 of YL. Therefore, when the linear motor xu drives the jaw opening and the Y beam guide 4 X to the X direction, the moving weight can be reduced, and

200308048 V. Description of the invention (22) Prevents the controllability of the motor from being low. Therefore, the position controllability and speed controllability of the glass substrate P held on the main stage can be improved, and improvement in the transfer accuracy of the pattern transferred on the glass substrate P can be expected. Moreover, in this embodiment, since this driven table 25 is arranged between the Y beam guide and the bottom bed 1, it is not necessary to make the bottom bed 1 large, and the bottom bed 1 can be required. The number of high-precision parts is reduced, and the size of the device can be avoided. Furthermore, when the slave stage 25 is transmitted by a cable relay, the existence of the Y-beam guide 4 allows the glass substrate P on the main stage to be dusty even if dust is generated due to the friction of the cable 17. Foreign matter is less likely to adhere, so the occurrence of defective products due to exposure processing can be suppressed. In particular, in the embodiment of the present invention, even if the driven table 25 moves in the X direction, the through-hole 1 b penetrated by the cables 17 can be covered by the dust-proof sheets 8 5 and 86 and the driven table 25. Therefore, foreign matter can be reliably prevented from adhering to the glass substrate P. Moreover, in this embodiment, since the pillars 22 and the bottom bed 1 are separated by vibration, disturbances caused by the movement of the main stage or the driven stage 25, the dust cover 85, and 86 will not cause damage to the main stage. In addition, because the cables 17 pass through the bottom bed 1 in a non-contact manner, the resistance to the normal and impact caused by the deformation of the cables 17 to the main carrier can be prevented. In addition, in this embodiment, the weight of the driven side such as the driven table 25 and the like will not be hung on the bed 1, and no deformation will occur on the X-axis guides 2a and 2b. As a result, The gain of the control loop of the main stage can be increased, so that highly responsive positioning and position tracking can be achieved. In this embodiment, since the main stage is made rotatable around the Z axis, the positioning of the glass substrate P can be easily performed. And, in this

11415pi f.ptd Page 26 200308048 V. Description of the invention (23) In the embodiment, the main stage is rotated because the movable parts 5 3, 5 3 are driven in opposite directions to each other, without the need for an additional complicated mechanism, which can quickly Moreover, the glass substrate P (alignment) is positioned without detracting from the flatness of the plate holder 11. Therefore, in this embodiment, although the driven table 25 is mechanically (vibrated) separated from the bottom bed 1, it is connected to the base frame 21 provided below the bottom bed 1 to adjust the base. After the position of the frame 21 is 1, the base frame 21 is suspended from the bottom bed 1, so that the lower position of the bottom bed 1 and the base frame 21 can be maintained, and the bottom portion of the bottom bed 1 can be supported and transported. The substrate stage device needs to be disassembled, which can shorten the assembly time on site. Moreover, in the above-mentioned embodiment, in order to maintain the relative positional relationship between the fixed member and the movable member, although the structure is adjusted to adjust the position of the fixed member according to the detection result of the gap sensor, it is not limited to this, and may It is also possible to adjust the position of the movable member or the positions of both the fixed member and the movable member. Moreover, in the above-mentioned embodiment, although the stage device of the present invention is applied to a substrate stage device, it can also be applied to only a photomask stage, or both a substrate stage device and a photomask stage. Furthermore, in the form of the embodiment described above, although the stage device of the invention i has a structure suitable for the exposure device 31, it is not limited to this, and can also be applied to transfer light other than the exposure device 31. Precision measuring equipment such as a mask drawing device and a position coordinate measuring device for a mask pattern. Moreover, as the substrate of this embodiment, not only a glass substrate P for a liquid crystal display, a semiconductor wafer for a semiconductor element, a ceramic wafer for a thin-film magnetic head, or a photomask or a grating element used in an exposure device can be used.

11415pif ptd Page 27 200308048 V. Description of the Invention (24) version (synthetic quartz, silicon wafer), etc. are applicable. As the exposure device 31, a scanning type exposure device (scanning stepper; US P 5, 4 7) is used in addition to a stepwise scanning method of scanning and exposing the pattern of the photomask M in synchronization with the photomask M and the glass substrate P. 3, 4 1 0), a step-and-repeat projection exposure device (stepper) that exposes the pattern of the photomask M in a stationary state with the photomask M and the glass substrate P and sequentially moves the glass substrate stepwise Also applies. The type of the exposure device 31 is not limited to an exposure device for manufacturing a liquid crystal display, an exposure device for manufacturing a semiconductor element that exposes a semiconductor element pattern to a wafer semiconductor, or to manufacture a thin-film magnetic head, an imaging device (CCD), or Exposure devices for gratings and the like can also be widely applied. In addition, as the light source for the exposure illumination light, not only the rays (g-line (4 3 6 nm), h-line (4 0 4 · 7 nm), I-line (3 6 5 nm)) generated by the ultra-high pressure mercury lamp can be used) , KrF excimer laser (248nm), ArF excimer laser (193nm), F2 laser (157nn〇, you can also use X-rays or electrons, such as charged particle beams. For example, when using electron beams For electronic grabbing, a boron steel (L a B 6), group (T a) of thermionic emission type can be used. Moreover, in the case of using an electronic wire, the structure of the photomask M can be used, or the photomask The structure in which the pattern is directly formed on the glass substrate. High-frequency waves such as YAG lasers or semiconductor lasers can also be used. The magnification of the projection optical PL can be not only equal magnification, reduction or magnification. And, As the projection optical system PL, when far ultraviolet rays such as excimer laser are used, as the nitrate material, transmissive quartz or fluorite is used.

11415pif ptd Page 28 200308048 V. Description of the invention (25) For materials with far ultraviolet rays, such as F 2 laser or X-ray, the reflection system or the optical system of the refractive system (the grating R is also a reflection type) In the case of using electronic wires, as the optical system, an electronic lens and an electronic optical system composed of a deflector can also be used. In addition, without using the projection optical system PL, the photomask M is brought into close contact with the glass substrate P, and a close-up exposure apparatus for exposing the pattern of the photomask M is also applicable. When using a linear motor (refer to USP 5, 6 2 3, 8 5 3 or USP 5, 5 2 8, 1 1 8) for the substrate stage device 35 or the photomask stage MST, use air from an air bearing Either a floating type or a magnetic floating type using a Loroz force or a reaction force is available. In addition, each of the stages 35 and MST may be a type that moves along the guide portion, or a type without a guide portion but without a guide portion. As the MST drive mechanism, each stage is opposed to a magnet with a two-dimensional magnet (permanent) and a motor unit with a two-dimensional coil. It is also possible to use a planar motor that drives each stage 35 by electromagnetic force and a MS T . In this case, either the magnet unit or the motor unit is connected to the stage 35 or the M ST. The magnet unit and the motor unit may be provided on the moving surface side (base) of the stage 35 or the MS. As described above, the exposure apparatus 3 1 according to the embodiment of the present invention can be assembled and manufactured while maintaining the predetermined mechanical accuracy, electrical accuracy, and optical accuracy of each subsystem including the constituent elements listed in the scope of this patent application. In order to ensure these various precisions, before and after the assembly, it is necessary to: adjust the optical precision of various optical systems, adjust the mechanical precision of various mechanical systems, and achieve the electrical precision of various electrical systems.

11415pif ptd Page 29 200308048 V. Explanation of the invention (26) Degree adjustment. The process of assembling various subsystems to the exposure device includes the mechanical connection of various subsystems, the wiring connection of electrical circuits, and the piping connection of pneumatic circuits. Before assembling these subsystems to the exposure device, of course, each subsystem needs to perform its own assembly process. After the various subsystems are assembled into the exposure device, the overall adjustment is performed to ensure the accuracy of the entire exposure device. In addition, it is preferable to manufacture the exposure device in a clean room with temperature and cleanliness management. A device such as a liquid crystal display device or a semiconductor element is manufactured through the following steps as shown in FIG. 14: Steps for designing the function / performance of the liquid crystal display device and the like 2 1. Manufacturing a photomask based on the design steps ( Raster) M Step 2 2. Steps for manufacturing glass substrate P from quartz or wafers from silicon material 20 3. Using the scanning exposure device 31 of the foregoing embodiment, the pattern of the grating R is exposed to the glass Step 2 on the substrate P (or wafer) 4. Assembly steps for the liquid crystal display device (if it is a wafer, it includes cutting, wiring, and packaging) 2 0 5, inspection step 2 0 6 Wait. From the above description, in the present invention, the controllability of a driving device such as a linear motor is not impaired, the weight of the device can be reduced, and dust generation by the resource supply means can be suppressed. In addition, the present invention does not require a complicated mechanism, does not cause positional displacement of the substrate or deteriorate flatness of the holder, and can perform substrate positioning with high accuracy and short time. Furthermore, in the present invention, it is not necessary to disassemble the stage device, and the transmission can be performed while maintaining the accuracy, and the effect of shortening the on-site assembly time can also be achieved.

11415pif ptd Page 30 200308048 V. Description of the Invention (27) Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art will not depart from the spirit and scope of the present invention. As some changes and retouching can be made, the scope of protection of the present invention shall be determined by the scope of the attached patent application.

11415pif ptd Page 31 200308048 Brief Description of Drawings [Simplified Description of Drawings] Fig. 1 shows a schematic configuration diagram of an exposure apparatus according to an embodiment of the present invention. Fig. 2 is a perspective view showing the appearance of a mask stage constituting the same exposure device. Fig. 3 is a perspective view showing the overall structure of the substrate stage device of the present invention. FIG. 4 is a side view of FIG. 3. FIG. 5 shows a simplified diagram of FIG. 3. FIG. 6 is a perspective view showing only the appearance of the structure related to the driven table 6. FIG. 7 is a schematic configuration diagram of the main stage portion. FIG. 8 is a side view of FIG. 7. FIG. 9 is a partial detailed view of a slave station such as a relay transmission cable. Fig. 10 is a partial detailed view of a slave station such as a relay transmission cable. Fig. 11 shows a detailed view of a slave station such as a relay transmission cable. Fig. 12 shows the figure after turning the Y carriage in Fig. 7. Figure 13 shows the relationship between the linear motor and the action of the air bearing when the Y carriage rotates. FIG. 14 is a flowchart showing an example of a manufacturing process of a liquid crystal display device. Fig. 15 is a perspective view showing an example of an external appearance of a conventional substrate stage device.

11415pif ptd Page 32 200308048 Brief description of the drawings [Illustration of the drawings] Μ: Photomask (grating), P: Glass substrate, XL 1: X linear motor, XL 2 ·· Driven X linear motor (second drive device ) YL: Υ linear motor (drive device) 1: bottom bed (base), la: through hole (second through hole), lb: through 孑 L, 2 a, 2 b ·. X-axis guide, 3 a, 3 b: X carriage, 4: Y beam guide (guide member), 5, 6: Air bearing, 7: Y carriage (stage body), 9: Air bearing (holding device), 10 : Platform (carrier body), 11: Flat stand (carrier body), 1 2: Anti-vibration table, 13a, 13b: Movable member (second movable member), 14a, 14b ·· Fixed member (second fixed member) ), 1 5: driven stage holding mechanism (connecting device), 1 7: cables (resource supply means), 2 1: base frame, 2 2: pillar (supporting part), 2 3: driven guide Lead frame, 2 4 a: driven guide, 2 5: driven stage (driven stage), 2 6: Y linear motor bearing, 27: fixed element, 28: movable element (third movable element), 31: exposure device, 3 5 ·· Stage apparatus (stage apparatus) 51: fine adjustment screw, 53: the movable member, 8 5, 8 6: Dust sheet (cover member)

11415pif ptd Page 33

Claims (1)

200308048 6. Scope of patent application 1 · A stage device, comprising: a guide member that guides a stage body holding a substrate in a freely movable manner in a first direction, and on a base toward a second stage Moving in the direction; and a driving device for driving the stage body to the first direction, which is characterized in that it includes: a driven stage connected to a part of the driving device, and the guide member moving to the second side , The driven carrier is arranged between the guide member and the base. 2 · The carrier device according to item 1 of the scope of the patent application, characterized in that the driven carrier is a relay-resource supply member to supply resources to the carrier body. 3. The stage device according to item 2 of the scope of patent application, wherein the resource supply member is relayed by the driven stage through a through hole formed in the base. 4. The stage device according to item 3 of the scope of patent application, further comprising a cover member covering the through hole. 5. The stage device according to item 4 of the scope of the patent application, wherein the cover member is mounted on the stage body at one end, and expands and contracts with the stage body. 6. The stage device according to any one of claims 1 to 5 in the scope of patent application, characterized in that the driven stage is set to be separated from the base in a state of vibration. 7 · The stage device according to item 6 of the scope of patent application, characterized in that the driven stage is supported by a support portion which is a through hole formed through the base 2 . 11415pif ptd Page 34 200308048 6. Scope of patent application 8 · The stage device according to any one of the scope of claims 1 to 5, wherein the driving device has: a movable member connected to the stage body And a fixed member connected to the driven carrier, characterized in that the carrier device includes: a detection device that detects a gap amount between the movable member and the fixed member; and a position adjustment device based on the detection And the relative positional relationship between the movable member and the fixed member is adjusted. 9 · The stage device according to any one of claims 1 to 5 in the scope of patent application, characterized in that it has: a connecting device that integrates the guide member and the driven stage freely. Ground connection. 1 0 · The stage device according to any one of items 1 to 5 of the scope of patent application, comprising: a holding device, so that the stage body is non-contact with the guide member in a non-contact manner. The first direction is free to move, and is rotatably held along the holding surface of the substrate; and a turning device, which rotates the stage body along the holding surface. 1 1 · The carrier device according to item 10 of the scope of patent application, characterized in that: the turning device has the driving device provided on both sides of the carrier body, and the driving devices on both sides of the carrier body Drive control devices that drive in opposite directions. 1 2 · The carrier device according to any one of the items 1 to 5 of the scope of patent application, characterized in that: 11415pif ptd Page 35 200308048 6. Scope of patent application The driving of the guide member to the second direction is performed by a second driving device with a second fixing member, and the driven carrier is directed to the second The directional driving is performed by using the second fixture. 1 3 · The stage device according to item 12 of the scope of patent application, comprising: a second detection device that detects between the second movable member connected to the guide member and the second fixed member The amount of the gap, or the amount of the gap between the third movable member and the second fixed member connected to the driven carrier, or the amount of the gap between the second movable member and the second fixed member, and the The amount of clearance between the third movable member and the second fixed member; and a second position adjusting device that adjusts the relative positional relationship between the second movable member and the second fixed member based on the detected amount of clearance, or adjust The relative positional relationship between the third movable member and the second fixed member, or the relative positional relationship between the second movable member and the second fixed member, and the relative positional relationship between the third movable member and the second fixed member are adjusted. 14 · An exposure device that exposes a pattern of a mask held on a mask stage onto a photosensitive substrate held on a substrate stage, characterized in that it is used as the mask stage or the substrate stage The patent application scope of any of the first to the fifth of the carrier device. 1 5 · The carrier device according to item 6 of the scope of patent application, wherein the driving device has a movable member connected to the carrier body and a fixed member connected to the driven carrier, and is characterized by the carrier The device includes: 11415pi f.ptd Page 36 200308048 VI. Patent application scope-a detection device that detects the amount of clearance between the movable part and the fixed part; and a position adjustment device that adjusts the movable part based on the detected amount of clearance And the relative positional relationship of the fixing member. 16 · The stage device according to item 6 of the scope of the patent application, further comprising: a connecting device for integrally connecting the guide member and the driven stage so as to be released freely. 1 7 · The stage device according to item 6 of the scope of patent application, comprising: a holding device, so that the stage body can move freely in the first direction with respect to the guide member in a non-contact manner, And is rotatably held along the holding surface of the substrate; and a turning device for rotating the stage body along the holding surface. 1 8 · The stage device according to item 17 of the scope of patent application, characterized in that: the turning device comprises: the driving device provided on both sides of the stage body, and the driving on the two sides Drive control devices that drive the devices in opposite directions. 1 9 · The stage device according to item 6 of the scope of patent application, wherein the driving of the guide member in the second direction is performed by a second driving device having a second fixing member, and The driven stage is driven in the second direction by using the second fixing member. 11415pif ptd Page 37 200308048 6. The scope of patent application 20 · The carrier system i ′ described in item 19 of the scope of patent application is characterized by including: a second detection device that detects the connection to the guide member. The amount of clearance between the second movable member and the second fixed member, or the detection connection! The amount of the gap between the third movable member and the second fixed member of the driven carrier, and the amount of the gap between the second movable member and the second fixed member and the third movable member and the second fixed member are detected. The amount of the gap between the fixed members; and a second position adjusting device that adjusts the relative positional relationship between the second movable member and the second fixed member based on the detected amount of the gap, or adjusts the third movable member and the The relative positional relationship of the second fixed member, or the relative positional relationship of the second movable member and the second fixed member, and the relative positional relationship of the third movable member and the second fixed member are adjusted. 21 · An exposure device that exposes a pattern of a mask held on a mask stage onto a photosensitive substrate held on a substrate stage, characterized in that, as the mask stage or the substrate stage, Use the stage device for patent application No. 6. 2 2 · The carrier device according to item 7 in the scope of the patent application, wherein the driving device has a movable member connected to the carrier body and a fixed member connected to the driven carrier, and is characterized by the carrier The device includes: a detection device that detects a gap amount between the movable member and the fixed member; and a position adjusting device that adjusts the relative positional relationship between the movable member and the fixed member based on the detected gap amount. 11415pif.ptd Page 38 200308048 6. Scope of Patent Application 2 3 · The stage device described in Item 22 of the scope of patent application is characterized in that it has a linking device that enables the guide member and the driven stage It is integrated in order to release freely. 2 4 · The stage device according to item 23 of the scope of patent application, comprising: a holding device, so that the stage body can move freely in the first direction with respect to the guide member in a non-contact manner. And is rotatably held along the holding surface of the substrate; and a turning device for rotating the stage body along the holding surface. 2 5 · The stage device according to item 24 of the scope of patent application, characterized in that: the turning device comprises: the driving device provided on both sides of the stage body, and the driving on the two sides Drive control devices that drive the devices in opposite directions. 2 6 · The stage device according to item 25 of the scope of patent application, characterized in that the driving of the guide member in the second direction is performed by a second driving device having a second fixing member, And the driving of the driven carrier in the direction of the 苐 2 is performed by using the 2 fixing member. 2 7 · The stage device according to item 26 of the patent application scope, comprising: a second detection device that detects between the second movable member and the second fixed member connected to the guide member The amount of clearance, or detection connected to the driven load 11415pif ptd Page 39 200308048 6. The amount of clearance between the third movable member and the second fixed member of the patent application range table, or the amount of clearance between the second movable member and the second fixed member and the first 3 the amount of clearance between the movable member and the second fixed member; and a second position adjustment device, which adjusts the relative positional relationship between the second movable member and the second fixed member based on the detected amount of clearance, or adjusts the The relative positional relationship between the third movable member and the second fixed member, or the relative positional relationship between the second movable member and the second fixed member, and the relative positional relationship between the third movable member and the second fixed member are adjusted. 28. An exposure device that exposes a pattern of a mask held on a mask stage onto a photosensitive substrate held on a substrate stage, characterized in that, as the mask stage or the substrate stage, Use the stage device of the scope of patent application No. 27. 11415pif ptd Page 40