TWI635371B - Movable body apparatus, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

The substrate stage device (20) includes an X-pillar (24) that can be moved in the Y-axis direction, and is provided in the X-pillar (24) and can be moved in the Y-axis direction together with the X-pillar (24) and can be opposed to the X-pillar (24) ) Coarse movement stage (26) moving in the X axis direction, fine movement stage (28) holding the substrate (P) and induced to move in the X axis and / or Y axis direction by the coarse movement stage (26), and respectively It is arranged on the + Y side and -Y side of the X-pillar (24) and supports the + Y side and -Y side area of the micro-motion stage (28) from below and can move in the Y-axis direction together with the micro-motion stage (28) One pair of step guides (30).

Description

Manufacturing method of moving body device, exposure device, flat panel display, and component manufacturing method

The present invention relates to a manufacturing method of a moving body device, an exposure device, a flat panel display, and a component manufacturing method. More specifically, the present invention relates to a moving body device that drives an object holding member that holds an object along a horizontal plane, and includes the foregoing moving body device. An exposure device that forms a predetermined pattern on the aforementioned object, a method of manufacturing a flat panel display using the aforementioned exposure device, and a method of manufacturing a device using the aforementioned exposure device.

Conventionally, in the lithography process for manufacturing electronic components (micro-components) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a photomask or reticle (hereinafter collectively referred to as a "photomask") and glass An exposure device in a step-and-scan method in which a plate or wafer (hereinafter collectively referred to as a "substrate") is moved synchronously along a predetermined scanning direction (SCAN direction), and a pattern formed on a photomask is transferred to a substrate using an energy beam.

As such an exposure device, since the position in the horizontal plane (scanning direction, cross scanning direction, and position around the axis orthogonal to the horizontal plane) of the substrate is controlled with high speed and high accuracy, a so-called bracket ( A gantry) type substrate carrier device with a coarse and fine movement structure composed of a combination of a 2-axis coarse movement stage and a fine movement stage (see, for example, Patent Document 1).

With the increase in size of substrates in recent years, the size of substrate stage devices has also increased. A substrate stage device having a simple structure and capable of performing position control in a horizontal plane of a large substrate with high accuracy and high speed.

[Patent Literature]

[Patent Document 1] US Patent Application Publication No. 2010/0018950

The present invention is made in view of the foregoing circumstances, and is a mobile device from the first viewpoint, which includes: a first mobile body that can be moved at a position in a first direction in a two-dimensional plane parallel to a horizontal plane; The second moving body is provided on the first moving body, and can move with the first moving body at a position along the first direction, and can move along the two-dimensional plane with the first moving body relative to the first moving body. The position is moved in the second direction orthogonal to the direction; the object holding member holds the object and is induced to move along the two-dimensional plane by the second moving body; the first guide member is disposed in the first direction in the first direction. The side of the moving body is supported from below when the object holding member moves in the region of one side of the first direction when the object holding member moves in the second direction, and can move in the first direction together with the object holding member; and The second guide member is disposed on the other side of the first moving body in the first direction, and is supported from below by the object holding member when the object holding member moves in the second direction. The object holding member is on the other side of the first direction. Area and can move in the first direction together with the object holding member.

Thereby, the object holding member is induced along the two-dimensional plane parallel to the horizontal plane by the first and second moving bodies. The first and second guide members supporting the object holding member in one of the first direction and the other side areas from below are moved in the first direction together with the object holding member, so that the structure of the device is simple.

Viewed from a second aspect, the present invention is an exposure apparatus comprising: the moving body device according to the first aspect of the present invention; and a pattern forming apparatus that forms a predetermined pattern on the object held by the object holding member using an energy beam.

Viewed from a third aspect, the present invention is a method for manufacturing a flat panel display, which includes: The operation of exposing the object using the exposure apparatus according to the second aspect of the present invention, and the operation of developing the object after exposure.

Viewed from a fourth aspect, the present invention is a device manufacturing method including the operation of exposing the object using an exposure device of the exposure device of the second aspect of the present invention, and an operation of developing the object after exposure.

10‧‧‧ LCD exposure device

11‧‧‧ land

12‧‧‧ Department of Lighting

14‧‧‧Mask stage

16‧‧‧ Department of Projection Optics

18‧‧‧ substrate stage

19‧‧‧Anti-vibration device

20‧‧‧ substrate stage device

21‧‧‧Micro-motion stage

21a‧‧‧Magnet unit

21b‧‧‧coil unit

22‧‧‧ bottom frame

23‧‧‧Y linear guide

23a‧‧‧Y Linear Guide

23b‧‧‧Y sliding member

24‧‧‧X-pillar

25‧‧‧Y bracket

26‧‧‧Coarse movement stage

27‧‧‧Y linear guide

27a‧‧‧Y Linear Guide

27b‧‧‧Y sliding member

28‧‧‧Micro-motion stage

29‧‧‧Y linear guide

29a‧‧‧X linear guide

29b‧‧‧X sliding member

30‧‧‧step guide

31‧‧‧X Linear Motor

31a‧‧‧magnet unit

31b‧‧‧coil unit

32‧‧‧Mounting plate

34‧‧‧ Connected device

36‧‧‧ substrate holder

38‧‧‧Mirror base

40x‧‧‧X rod mirror

40y‧‧‧Y rod mirror

42‧‧‧ reinforcement

44‧‧‧Air bearing

46a‧‧‧X

46b‧‧‧X mover

46x‧‧‧X voice coil motor

46y‧‧‧Y voice coil motor

IL‧‧‧illumination light

M‧‧‧Photomask

P‧‧‧ substrate

FIG. 1 is a diagram schematically showing the configuration of a liquid crystal exposure apparatus according to an embodiment.

FIG. 2 is a plan view of a substrate stage device included in the liquid crystal exposure device of FIG. 1. FIG.

Fig. 3 is a sectional view taken along line -B of Fig. 2.

An embodiment will be described below with reference to FIGS. 1 to 3.

FIG. 1 schematically shows the configuration of a liquid crystal exposure apparatus 10 according to an embodiment. The liquid crystal exposure device 10 is a projection exposure device of a step-and-scan method in which a rectangular (corner-shaped) glass substrate P (hereinafter referred to as a substrate P) used for a liquid crystal display device (flat panel display) is used as an exposure target. Scanner.

The liquid crystal exposure device 10 includes an illumination system 12, a mask stage 14 holding a mask M, a projection optical system 16, a substrate stage stand 18 (an example of a stage device), and a surface (in the direction of + in FIG. 1) The surface on the Z side) of the substrate stage device 20 on which the substrate P is coated with a resist (inductive), and the control system and the like. In the following description, the directions of the relative scanning of the mask M and the substrate P relative to the projection optical system 16 during exposure are set to the X-axis direction (example of the first direction), and the direction orthogonal to the X-axis in the horizontal plane. Set the Y-axis direction (example of the second direction), set the direction orthogonal to the X-axis and Y-axis as the Z-axis direction, and set the rotation directions around the X-axis, Y-axis, and Z-axis respectively θx, θy, and θz directions.

The lighting system 12 has the same configuration as the lighting system disclosed in, for example, US Patent No. 5,729,331. That is, the illumination system 12 irradiates the illumination light IL for exposure to the mask M. For the illumination light IL, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the like (or the combined light of the i-line, g-line, and h-line) is used.

The photomask stage 14 holds, for example, a photomask M formed with a predetermined circuit pattern by vacuum suction. The reticle stage 14 is driven in a scanning direction (X-axis direction) by a predetermined stroke by a reticle stage driving system (not shown) including, for example, a linear motor, and is appropriately slightly driven in the Y-axis direction and θz direction. The position information of the mask stage 14 in the XY plane (including rotation information in the θz direction) is obtained by a mask interferometer system including a laser interferometer (not shown).

The projection optical system 16 is disposed below the mask stage 14. The projection optical system 16 has the same configuration as the projection optical system disclosed in, for example, US Patent No. 6,552,775. That is, the projection optical system 16 is, for example, a so-called multi-lens projection optical system including a plurality of optical systems that form an erect image with telecentric equal magnifications on both sides. The projection optics of a single image field is equivalent.

Therefore, after the illumination area on the mask M is illuminated with the illumination light IL from the illumination system 12, the projection image of the circuit pattern of the mask M in the illumination area is projected by the illumination light IL passing through the mask M through the projection. The optical system 16 is formed in an irradiation area of the illumination light IL conjugated to the illumination area on the substrate P. Next, the mask M is moved in the scanning direction with respect to the illumination area (illumination light IL), and the substrate P is moved in the scanning direction with respect to the exposure area (illumination light IL), thereby transferring to an irradiation area on the substrate P. A pattern formed on the mask M.

The substrate stage 18 is composed of members extending in the Y-axis direction, and as shown in FIG. 2, for example, two are provided at predetermined intervals in the X-axis direction. For example, a plurality of Y linear guides 27a extending in the Y-axis direction are fixed on the respective two substrate stage stands 18 on the X-axis direction at a predetermined interval. In this embodiment, there are three. As shown in FIG. 1, the vicinity of an end portion of the substrate stage stand 18 in the longitudinal direction is supported from below by a vibration isolation device 19 provided on the floor 11 of the clean room. The substrate stage 18 constitutes a part of the apparatus body (body) of the liquid crystal exposure apparatus 10. The photomask stage 14 and the projection optical system 16 are supported by the apparatus body, and are separated from the ground 11 in vibration. In addition, the graph The substrate stage device 20 shown in FIG. 1 corresponds to a cross-sectional view taken along the line A-A in FIG. 2.

As shown in FIG. 2, the substrate stage device 20 includes a pair of bottom frames 22 (an example of the bottom), an X-pillar 24 mounted on the pair of bottom frames 22, and a coarse motion stage 26 mounted on the X-pillar 24. (Exemplary aspect of the first drive system), a micro-movement stage 28 (an exemplary aspect of an object holding device) that is induced in the X-axis direction and / or the Y-axis direction by a coarse motion stage 26 with a predetermined stroke, and a guide One of the pair of step guides 30 (an exemplary aspect of the supporting device) of the micro-movement stage 21 is moved along the XY plane.

One pair of bottom frames 22 is disposed on the + X side of the + X-side substrate stage stage 18 and the other is disposed on the -X side of the -X-side substrate stage stage 18, respectively, at a predetermined distance from the substrate stage stage 18 ( It is installed on the ground 11 in a clean room in a state of being separated in vibration. The pair of bottom frames 22 support the vicinity of both ends in the longitudinal direction of the X-pillar 24 described below from below, and function as a guide member when the X-pillar 24 moves in the Y-axis direction with a predetermined long stroke. As shown in FIG. 3, magnet units 21a (Y holders) including a plurality of permanent magnets arranged at a predetermined interval in the Y-axis direction are fixed to both sides of the bottom frame 22, respectively. Further, a Y linear guide 23 a which is a component of the Y linear guide 23 is fixed to an upper end surface (+ Z side end portion) of the bottom frame 22.

The X-pillar 24 is formed of a YZ cross-section rectangle (see FIG. 1) extending in the X-axis direction. An inverted U-shaped member having an XZ cross section called a Y-bracket 25 (an example of a second drive system) is fixed below the vicinity of both ends of the X-pillar 24 in the longitudinal direction corresponding to the pair of bottom frames 22 described above. . The bottom frame 22 is inserted between one of the facing surfaces of the Y bracket 25. On the top surface of the Y bracket 25, a Y sliding member 23b constituting a Y linear guide 23 together with the Y linear guide 23a is fixed. The Y sliding member 23b is slidably engaged with the corresponding Y linear guide 23a with low friction, and the X column 24 can move on the pair of bottom frames 22 with a predetermined stroke in the Y-axis direction with low friction.

Further, a coil unit 21b (X mover) constituting a Y linear motor 21 together with the magnet unit 21a is fixed to one of the opposing surfaces of the Y bracket 25, respectively. The X-pillar 24 is driven in the Y-axis direction on the pair of bottom frames 22 by the Y linear motor 21. In addition, the type of the Y actuator that drives the X-pillar 24 is not limited to this. For example, a feed screw device, a belt drive device, and a wire drive can be used. Moving device, etc.

The Z position under the X-pillar 24 is shown in FIG. 1 and is set closer to the + Z side than the upper end of the Y linear guide 27a. The X-pillar 24 is separated from the substrate stage 18 (ie, the device body) in vibration. In addition, an auxiliary bottom frame supporting the central portion in the longitudinal direction of the X-pillar 24 from below may be disposed between the pair of substrate stage racks 18.

Further, on the X-pillar 24, as shown in FIG. 2, the X-linear guide 29 a which is an element of the X-linear guide 29 is fixed at a predetermined interval in the X-axis direction, for example, two pieces. Further, magnet units 31a (X holders) including a plurality of permanent magnets arranged at a predetermined interval in the X-axis direction are fixed to both sides of the X-pillar 24.

The coarse movement stage 26 is composed of a rectangular parallelepiped member, and a plurality of X sliding members 29b constituting the X linear guide device 29 together with the X linear guide 29a are fixed below. As shown in FIG. 3, the X sliding member 29b is provided with one X linear guide 29a at a predetermined interval in the X axis direction, for example, two. The X sliding member 29b is slidably engaged with the corresponding X linear guide 29a with low friction, and the coarse movement stage 26 can move on the X-pillar 24 with a predetermined stroke in the X-axis direction with low friction.

Further, on both sides of the coarse movement stage 26, a coil unit 31b of an X linear motor 31 configured to drive the coarse movement stage 26 in the X-axis direction with a predetermined stroke is fixed together with the magnet unit 31a through the mounting plate 32 ( X mover).

The coarse movement stage 26 is restricted from moving relative to the X-pillar 24 in the Y-axis direction by the Y linear guide 29, and moves integrally with the X-pillar 24 in the Y-axis direction. That is, the coarse motion stage 26 and the X-pillar 24 together constitute a gantry-type biaxial stage apparatus. The Y position information of the X-pillar 24 and the X position information of the coarse motion stage 26 are respectively obtained by, for example, a linear encoder system (or an optical interferometer system) not shown.

Each pair of step guides 30 is mounted on a pair of substrate stage racks 18 as shown in FIG. 2. The pair of step guides 30 are each formed of a rectangular YZ cross-section (see FIG. 1) extending in the X-axis direction, and are arranged parallel to each other at a predetermined interval in the Y-axis direction. The X-pillar 24 passes through a predetermined gap Insert a pair of step guides 30. The length direction (X-axis direction) of the stepping guide 30 is set to be shorter than the X-pillar 24, and the width direction (Y-axis direction) is set to be wider than the X-pillar 24. The flatness of the upper surface of the step guide 30 is made very high.

Below the step guide 30, a plurality of Y sliding members 27b constituting a Y linear guide 27 together with the Y linear guide 27a are fixed as shown in FIG. For example, two Y sliding members 27b are provided at a predetermined interval in the Y-axis direction on one Y linear guide 27a. The Y sliding member 27b is slidably engaged with the corresponding Y linear guide 27a with low friction, and the stepping guide 30 can move on the pair of substrate stage 18 with a predetermined stroke in the Y-axis direction with low friction.

As shown in FIG. 2, the pair of step guides 30 are mechanically connected to the X-pillar 24 via a connection device 34 (an example of the connection device) in the vicinity of both ends in the longitudinal direction. The linking device 34 includes a rod-shaped member extending in the Y-axis direction and sliding joint devices (such as ball joints) mounted on both ends of the rod-shaped member, and is mounted on the X-pillar 24 and the step guide 30 through the sliding joint device. between. The rod-shaped member has a high rigidity in the Y-axis direction.

In the substrate stage device 20, when the X-pillar 24 is driven in one of the Y-axis directions (for example, + Y) by a plurality of Y linear motors 21 (not shown in FIG. 2) (see FIG. 3), the The step guide 30 on the other side (for example, the -Y side) in the axial direction is pulled by the X-pillar 24 through the connecting device 34, and the step guide 30 on one side (for example, the + Y side) in the Y direction is connected through the connection. The device 34 is pressed against the X-pillar 24. Thereby, the pair of step guides 30 and the X-pillar 24 are moved integrally in the Y-axis direction.

Returning to FIG. 1, the micro-movement stage 28 is formed of a rectangular box-shaped member in plan view, and a substrate holder 36 is fixed on the box-shaped member. On the side of the -Y side of the micro-motion stage 28, a Y rod mirror 40y having a reflecting surface orthogonal to the Y axis is fixed through the mirror base 38, and on the side of the -X side of the micro-motion stage 28, as shown in FIG. 3 An X rod mirror 40x having a reflecting surface orthogonal to the X axis is fixed through the mirror base 38. In addition, in order to avoid the illustration being too complicated in FIG. 2, illustrations of the substrate holder 36, the mirror base 38, the Y rod mirror 40 y, and the X rod mirror 40 x (see FIGS. 1 and 3) are omitted respectively.

Reinforcement blocks 42 are respectively installed near the four corners under the micro-motion stage 28 as shown in FIG. 2. An air bearing 44 is mounted below the reinforcing block 42 as shown in FIG. 1. Returning to FIG. 2, the gas ejection surfaces (bearing surfaces) of, for example, two air bearings 44 on the + Y side are opposed to the step guide 30 on the + Y side, and the gas ejection surfaces of, for example, two air bearings 44 on the -Y side. Above the step guide 30 facing the -Y side. For example, each of the four air bearings 44 ejects a pressurized gas (such as air) onto the corresponding step guide 30. The micro-motion stage 28 is suspended on the pair of stepping guides 30 through a small gap by the static pressure of the gas supplied between the air bearing 44 and the stepping guides 30. In addition, the arrangement and number of the air bearings 44 are not particularly limited as long as the micro-motion stage 28 can be suspended on the pair of step guides 30 in a stable state.

The micro-motion stage 28 is driven in the X-axis direction and / or the Y-axis direction by the coarse-motion stage 26 by a micro-motion stage driving system (an example of an object holding device driving system) including a plurality of voice coil motors. As shown in FIG. 2, the plurality of voice coil motors includes, for example, two X voice coil motors 46x and two Y voice coil motors 46y that generate a stacking force in the X-axis direction. For example, one of the two X voice coil motors 46x is disposed on the + Y side of the micro-motion stage 28, and the other is disposed on the -Y side of the micro-motion stage 28. For example, one of the two Y-voice coil motors 46y is disposed on the micro-motion stage. The + X side of the stage 28 is disposed on the -X side of the micro-motion stage 28.

The configuration of the above-mentioned plurality of voice coil motors is the same except that the arrangement is different. Therefore, the X voice coil motor 46x disposed on the + Y side of the micro-motion stage 28 will be described below. As shown in FIG. 1, the X voice coil motor 46 x includes an X stator 46 a fixed to the + Y side surface of the coarse motion stage 26 and an X movable element 46 b fixed below the micro motion stage 28. The X holder 46a includes a coil unit (not shown). The X mover 46b is formed in a U-shaped YZZ cross section, and permanent magnets are fixed to a pair of opposite surfaces thereof. The coil unit of the X holder 46a is inserted between the pair of permanent magnets through a predetermined gap. In addition, although the X voice coil motor 46x of this embodiment is a moving magnetic type, it may be a moving coil type.

In the substrate stage device 20, for example, the coarse movement stage 26 moves along the X-pillar 24 along the X-axis with a long stroke. In the direction, for example, the thrust force (Lorentz force) in the X-axis direction generated by the two X voice coil motors 46x is controlled so that the micro-motion stage 28 moves in the same direction and the same speed as the coarse-motion stage 26. In addition, when the X-pillar 24 moves in the Y-axis direction with a long stroke, for example, the thrust in the Y-axis direction generated by the two Y voice coil motors 46y is controlled so that the micro-movement stage 28 communicates with the X-pillar 24 (that is, coarse movement). The stage 26) moves in the same direction and at the same speed. Thereby, the coarse movement stage 26 and the fine movement stage 28 are integrally moved with a long stroke along the XY plane.

In addition, the micro-motion stage 28 makes the thrust directions of, for example, two X voice coil motors 46x (or, for example, two Y voice coil motors 46y) opposite directions, and the relatively coarse motion stage 26 moves in the θz direction. Driven slightly. When the fine movement stage 28 is induced by the coarse movement stage 26 and is driven with a long stroke in the X-axis direction, it is appropriately driven finely in the Y-axis direction and / or θz direction.

The liquid crystal exposure device 10 (refer to FIG. 1) configured as described above is under the management of a main control device (not shown), and mounts the photomask M on the photomask stage 14 through a photomask loader (not shown). The substrate P is loaded on the substrate holder 36 by a substrate loader (not shown). Thereafter, the main control device performs an alignment measurement using an alignment detection system (not shown). After the alignment measurement is completed, the exposure operations of the step-and-scan method are sequentially performed on the plurality of irradiation areas set on the substrate P. . In addition, since this exposure operation is the same as the exposure operation of the conventional step-and-scan method, a detailed description thereof is omitted.

For example, during the scanning exposure operation during the exposure operation in the above-mentioned step-and-scan method, the substrate stage device 20 is driven by the micro stage 28 holding the substrate P through the substrate holder 36 in the X-axis direction with a long stroke. The length (X-axis direction) dimension of the stepping guide 30 is set to be slightly longer than the movable distance of the micro-motion stage 28 in the X-axis direction. When the micro-motion stage 28 moves in the X-axis direction integrally with the coarse motion stage 26, It is moved on a pair of step guides 30. When the micro-movement stage 28 performs a step motion in the Y-axis direction, the micro-motion stage 28 moves in the Y-axis direction integrally with the coarse motion stage 26, the X-pillar 24, and the pair of step guides 30. Therefore, the micro-movement stage 28 does not fall off from the pair of step guides 30.

According to the substrate stage device 20 of the present embodiment described above, since the micro-motion stage 28 is mounted on the pair of step guides 30 in a non-contact state, the micro-motion stage 28 can be driven (induced) to the micro-motion stage 28 with a small thrust. X-axis and / or Y-axis direction. In addition, since the position control of the micro-motion stage 28 is improved, high-precision exposure can be performed. In addition, since the transmission of external vibration and reaction force to the micro-motion stage 28 is suppressed, the position of the micro-motion stage 28 can be controlled with high accuracy.

In addition, since the pair of step guides 30 covers the movable range of the micro-movement stage 28 in the X-axis direction and moves integrally with the micro-movement stage 28 in the Y-axis direction, the substrate stage device 20 does not need to have sufficient coverage. A wide-area guide member (such as a fixed plate) having a full movement range of the micro-motion stage 28 in the XY plane. Therefore, the cost is low, and transportation and assembly are easy.

In addition, since the magnet unit 21a (Y holder) that drives the Y linear motor 21 of the X-pillar 24 is separated from the substrate stage frame 18, the driving reaction force and vibration when the X-pillar 24 is driven can be suppressed. It is transmitted to the projection optical system 16 etc. supported by the apparatus body.

In addition, the configuration of the embodiment described above can be appropriately changed. For example, a Z tilt actuator may be disposed between the micro-motion stage 28 and the substrate holder 36 or between the reinforcement block 42 and the micro-motion stage 28 to control the Z-axis direction, θx direction, and θy direction of the substrate P. position. Moreover, a plurality of X-pillars 24 may be arranged between a pair of step guides 30.

In the above-mentioned embodiment, the stepping guide 30 is moved by the X-pillar 24 and moved in the Y-axis direction, but it is not limited to this. For example, a pair of stepping guides 30 and The X-pillars 24 are driven independently. In this case, as a holder for driving a pair of linear motors of the stepping guide 30, a Y holder 21a (see FIG. 3) fixed to the bottom frame 22 may be used.

In the above-mentioned embodiment, although the X-pillar 24 is driven by a plurality of Y linear motors 21 in the Y-axis direction, and the pair of step guides 30 and the X-pillar 24 are integrally moved in the Y-axis direction, it is not limited to this. Here, a pair of stepping guides 30 are driven in the Y-axis direction by an actuator (for example, a linear motor), and the X-pillar 24 is moved in the Y-axis direction (even if an actuator for driving the X-pillar 24 is not provided) Yes.

In the above-mentioned embodiment, although the micro-movement stage 28 is supported by a pair of step guides 30 through a plurality of air bearings 44 in a non-contact manner from below, the micro-movement can be carried in a contact state through a rolling element (such as a sphere). The stage 28 is mounted on the step guide 30.

In addition, a pair of step guides 30 may be physically (mechanically) connected (but not against the X-pillar 24). In this case, after one stepping guide 30 is pulled by the X-pillar 24, since the other stepping guide 30 also moves integrally, for example, as long as the X-pillar 24 pulls (or presses) only one stepping guide 30 is enough.

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F2 laser light (wavelength 157 nm). As the illumination light, for example, a single-wavelength laser light in an infrared band or a visible light band emitted from a DFB semiconductor laser or an optical fiber laser may be used, for example, a fiber amplifier doped with erbium (or erbium and erbium). The amplitude is converted to harmonics of ultraviolet light using non-linear optical crystals. Alternatively, a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

In the above embodiment, the case of the multi-lens projection optical system 16 having a plurality of projection optical units has been described, but the number of projection optical units is not limited to this, as long as it is one or more. The projection optical system is not limited to the multi-lens projection optical system, and may be, for example, a projection optical system using a large reflector of the Ofner type. In the above-mentioned embodiment, although the case where the projection optical system 16 is used as the projection magnification has been described, the projection optical system is not limited to this, and the projection optical system may be any of a reduction system and an enlargement system.

In addition, although a light-transmitting photomask in which a predetermined light-shielding pattern (or phase pattern or light-reduction pattern) is formed on a light-transmitting photomask substrate is used, it is possible to use, for example, US Patent No. 6,778,257 instead of this photomask. An electronic photomask (variable forming photomask) that forms a transmission or reflection pattern, or a luminescent pattern according to the electronic data of the pattern to be exposed disclosed in the manual, such as using a non-light-emitting image display element (also known as spatial light modulation) (DMD) Digital Micro-mirror Device (DMD).

In addition, as an exposure device, a substrate having a size (including at least one of outer diameter, diagonal length, and at least one side) of 500 mm or more, such as a large-sized substrate for a flat panel display (FPD) such as a liquid crystal display device, is used as an exposure target. The device is particularly effective.

In addition, as an exposure device, it can be applied to an exposure device of a step & repeat method, and an exposure device of a step & stitch method. The object held on the mobile device is not limited to a substrate or the like of the object to be exposed, and may be a pattern holding body (original plate) such as a photomask.

In addition, the application of the exposure device is not limited to an exposure device for a liquid crystal that transfers a pattern of a liquid crystal display element to a square glass plate, but can also be widely applied to, for example, an exposure device for semiconductor manufacturing, a thin film magnetic head, a micromachine, and DNA Wafer exposure equipment. In addition, not only micro-elements such as semiconductor elements, but the present invention can also be applied to the manufacture of photomasks or reticle used in light exposure equipment, EUV exposure equipment, X-ray exposure equipment, and electron-ray exposure equipment, etc. The pattern is transferred to an exposure device such as a glass substrate or a silicon wafer. Furthermore, the object to be exposed is not limited to a glass plate, but may be other objects such as a wafer, a ceramic substrate, a thin film member, or a mask blank. When the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a thin film (a flexible sheet-like member) is also included.

Electronic components such as liquid crystal display elements (or semiconductor elements) are manufactured through the following steps, that is, the steps of designing the function and performance of the elements, the steps of making a photomask (or reticle) according to this design step, and manufacturing The steps of the glass substrate (or wafer), the lithography step of transferring the pattern of the photomask (reticle) to the glass substrate according to the exposure apparatus and the exposure method of the above embodiments, and the development of the exposed glass substrate. A development step, an etching step to remove exposed members other than the remaining portion of the resist by etching, a resist removal step to remove unnecessary resist due to the end of the etching, an element assembly step, an inspection step, and the like. In this case, in the lithography step, since the aforementioned exposure method is performed using the exposure apparatus of the above-mentioned embodiment to form an element pattern on a glass substrate, a highly integrated element can be manufactured with good productivity.

Industrial availability

As described above, the moving body device of the present invention is suitable for driving an object holding member holding an object along a two-dimensional plane parallel to the horizontal plane. The exposure apparatus of the present invention exposes an object. Moreover, the manufacturing method of the flat panel display of this invention is suitable for manufacture of a flat panel display. Moreover, the device manufacturing method of the present invention is suitable for manufacturing a micro device.

Claims (13)

A moving body device comprising: an object holding device that holds an object; a first driving system that moves the object holding device in a first direction; and a support device that is provided in the second direction that intersects the first direction and is disposed in the first direction. 1 Both sides of the drive system support the object holding device in a non-contact manner from below; and the second drive system moves the support device in the second direction while the support device supports the object holding device. The moving body device according to claim 1, wherein the first driving system relatively moves the object holding device in the first direction relative to the supporting device. The moving body device according to claim 2, wherein the second drive system moves the first drive system in the second direction. The moving body device according to claim 3, further comprising: a connecting device for transmitting a driving force for moving the first drive system in the second direction by the second drive system to the support device, The first drive system is connected to the support device. The moving body device according to claim 1, further comprising: an object holding device drive system that moves the object holding device relative to the first driving system in the first direction and the second direction. The moving body device according to claim 1, wherein the supporting device supports the object holding device at different positions in the first direction, respectively. The moving body device according to any one of claims 1 to 6, comprising: a gantry device supporting the support device; and a bottom portion arranged separately from the gantry device in the first direction to support the first drive system and The second drive system. An exposure device comprising: the moving body device according to any one of claims 1 to 7; and a pattern forming device for forming a predetermined pattern on the object held by the object holding device using an energy beam. The exposure device according to claim 8, wherein when the pattern is formed on the object, the moving body device moves the object in the first direction with respect to the energy beam. The exposure apparatus according to claim 8 or 9, wherein the aforementioned substance system is used for a substrate of a flat panel display device. The exposure apparatus according to claim 10, wherein a length or a diagonal length of at least one side of the substrate is 500 mm or more. A manufacturing method of a flat panel display, comprising: an operation of exposing the aforementioned object using the exposure device according to claim 10 or 11; and an operation of developing the aforementioned object after exposure. A component manufacturing method comprising: an operation of exposing the aforementioned object using the exposure device according to claim 8 or 9; and an operation of developing the aforementioned object after exposure.