JP2019133192A - Object transportation device, exposure device, method of producing flat panel display, and method of producing device - Google Patents

Abstract

To provide a mask stage device improved in position control properties of a mask.SOLUTION: The mask stage device 14 includes: a first micromotion stage 48 disposed on a guide 44 extending in a scanning direction (X axis direction ), supporting a +Y side end part of a mask M, and movable on the guide 44 along the scanning direction; and a second micromotion stage 48 disposed on a guide 44 other than the guide 44 extending in the scanning direction so as to physically separate from the micromotion stage 48 supporting the +Y side end part of the mask M, supporting a -Y side end part of the mask M, and movable on the other guide 44 along the scanning direction.SELECTED DRAWING: Figure 2

Description

  The present invention relates to an object conveying apparatus, an exposure apparatus, a flat panel display manufacturing method, and a device manufacturing method.

  Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a mask (photomask) or reticle (hereinafter collectively referred to as “mask”), a glass plate or A step-and-step of transferring a pattern formed on a mask onto a substrate using an energy beam while synchronously moving a wafer (hereinafter collectively referred to as a “substrate”) along a predetermined scanning direction (scanning direction). A scanning exposure apparatus (a so-called scanning stepper (also called a scanner)) or the like is used.

  As this type of exposure apparatus, an exposure apparatus having a mask stage device that controls the position of the mask by driving a frame-like member (called a mask holder or the like) that holds the edge of the mask is known. (For example, refer to Patent Document 1).

  Here, in order to transfer the mask pattern to the substrate with high accuracy, it is necessary to drive the substrate and the mask synchronously with high accuracy, and it has been desired to improve the position controllability of the mask stage apparatus.

US Patent Application Publication No. 2008/0030702

  According to the first aspect of the present invention, the first moving body that holds one end of the object on which the predetermined pattern is formed in the predetermined direction, and the second moving body that holds the other end of the object in the predetermined direction. Between the first moving body and the second moving body with respect to the predetermined direction, and a drive unit that moves the first moving body and the second moving body relative to each other in a direction away from each other. And a transport unit that supports the object positioned and released from holding the object by the first and second moving bodies by the relative movement of the first and second moving bodies. The

  According to the second aspect of the present invention, the object conveying apparatus according to the first aspect and the exposure target object are held, and the exposure target object is moved so that the predetermined pattern is exposed to the exposure target object. An exposure apparatus comprising a moving body is provided.

  According to a third aspect of the present invention, the flat panel display includes: exposing the object to be exposed using the exposure apparatus according to the second aspect; and developing the exposed object to be exposed A manufacturing method is provided.

  According to a fourth aspect of the present invention, there is provided a device manufacturing method including exposing the object to be exposed using the exposure apparatus according to the second aspect, and developing the exposed object to be exposed. Provided.

It is a figure which shows schematically the structure of the liquid-crystal exposure apparatus which concerns on 1st Embodiment. 2A is a plan view of a mask stage apparatus included in the liquid crystal exposure apparatus of FIG. 1, and FIG. 2B is a front view of the mask stage apparatus. It is a figure which shows the mask stocker, mask loader, and mask stage apparatus which the liquid crystal exposure apparatus of FIG. 1 has. It is a top view of a mask stocker, a mask loader, and a mask stage apparatus. 5A is a plan view of a support arm included in the mask loader, FIG. 5B is a side view of the support arm, and FIG. 5C is a front view of the mask stage device and the mask loader. FIGS. 6A and 6B are views (part 1) for explaining the mask replacement operation, and are a plan view and a side view of the mask stage device and the mask loader. FIGS. 7A and 7B are views (part 2) for explaining the mask replacement operation, and are a plan view and a side view of the mask stage device and the mask loader. FIGS. 8A and 8B are views (No. 3) for explaining the mask replacement operation, and are a plan view and a side view of the mask stage device and the mask loader. It is FIG. (4) for demonstrating the replacement | exchange operation | movement of a mask, Comprising: It is a top view of a mask stage apparatus and a mask loader. FIGS. 10A and 10B are views (No. 5) for explaining the mask replacement operation, and are a plan view and a side view of the mask stage device and the mask loader. FIGS. 11A and 11B are views (No. 6) for explaining the mask replacement operation, and are a plan view and a side view of the mask stage device and the mask loader. 12A and 12B are views (No. 7) for explaining the mask replacement operation, and are a plan view and a side view of the mask stage device and the mask loader. It is FIG. (8) for demonstrating the replacement | exchange operation | movement of a mask, Comprising: It is a top view of a mask stage apparatus, a mask loader, and a mask stocker. It is a top view of the mask loader concerning the 1st modification. It is a front view of the mask stage apparatus which concerns on a 2nd modification. FIGS. 16A and 16B are views (plan view and front view) for explaining the operation of the mask stage apparatus according to the second modification. FIGS. 17A and 17B are a plan view and a front view showing a mask stage apparatus according to a third modification. It is a top view of the mask stage apparatus which concerns on a 4th modification. 19A and 19B are a plan view and a side view of a mask loader according to the second embodiment. It is a top view of the mask stage apparatus which concerns on 3rd Embodiment. It is a top view of the mask stage apparatus which concerns on 4th Embodiment.

<< First Embodiment >>
Hereinafter, a first embodiment will be described with reference to FIGS.

  FIG. 1 schematically shows the configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 employs a step-and-scan method in which a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is an exposure object. A projection exposure apparatus, a so-called scanner.

  The liquid crystal exposure apparatus 10 includes an illumination system 12, a mask stage apparatus 14 that holds a light transmission type mask M, a projection optical system 16, an apparatus body 18, and a resist (sensitive agent) on the surface (the surface facing the + Z side in FIG. ) Coated substrate stage device 20, mask loader 90 (not shown in FIG. 1, see FIG. 3), mask stocker 100 (not shown in FIG. 1, see FIG. 3), and their control systems Etc. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 at the time of exposure is defined as the X-axis direction, and the direction orthogonal to the X-axis in the horizontal plane is defined as the Y-axis direction, the X-axis, and the Y-axis. The description will be made assuming that the orthogonal direction is the Z-axis direction, and the rotation directions around the X-axis, Y-axis, and Z-axis are the θx, θy, and θz directions, respectively. Further, description will be made assuming that the positions in the X-axis, Y-axis, and Z-axis directions are the X position, the Y position, and the Z position, respectively.

  The illumination system 12 is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331. The illumination system 12 irradiates light emitted from a light source (not shown) (for example, a mercury lamp) through exposure mirrors (not shown), dichroic mirrors, shutters, wavelength selection filters, various lenses, and the like. ) Irradiate the mask M as IL. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used.

  The illumination system 12 (an illumination system unit including the various lenses described above) is supported by an illumination system frame 30 installed on the floor 11 of the clean room. The illumination system frame 30 has a plurality of leg portions 32 (overlapping in the depth direction in FIG. 1) and an illumination system support portion 34 supported by the plurality of leg portions 32.

  The mask stage device 14 drives the mask M with a predetermined long stroke in the X-axis direction (scan direction) with respect to the illumination system 12 (illumination light IL), and slightly drives it in the Y-axis direction and the θz direction. Is an element. The mask M is made of, for example, a rectangular plate-like member made of quartz glass, and a predetermined circuit pattern (mask pattern) is formed on the surface (lower surface portion) facing the −Z side in FIG. As shown in FIG. 2B, a dustproof film called a pellicle Pe is attached to the lower surface of the mask M to protect the mask pattern. Here, regions where the mask pattern is not formed (hereinafter referred to as blank regions) are provided at both ends of the width direction (Y-axis direction in FIG. 2B) of the lower surface of the mask M. For this reason, the width direction dimension of the pellicle Pe is set shorter than the width direction dimension of the mask M. The detailed configuration of the mask stage device 14 will be described later.

  Returning to FIG. 1, the projection optical system 16 is disposed below the mask stage device 14. The projection optical system 16 is a so-called multi-lens projection optical system having the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775, and is a double-sided telecentric equal magnification system. A plurality of projection optical systems for forming a vertical image are provided.

  In the liquid crystal exposure apparatus 10, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light that has passed through the mask M causes the mask M in the illumination area to pass through the projection optical system 16. A projection image (partial upright image) of the circuit pattern is formed in an irradiation region (exposure region) of illumination light conjugate to the illumination region on the substrate P. Then, the mask M moves relative to the illumination area (illumination light IL) in the scanning direction, and the substrate P moves relative to the exposure area (illumination light IL) in the scanning direction. Scanning exposure of one shot area is performed, and the pattern formed on the mask M is transferred to the shot area.

  The apparatus main body 18 is installed on the floor 11 via a plurality of vibration isolation devices 19. The apparatus main body 18 is configured in the same manner as the apparatus main body disclosed in, for example, US Patent Application Publication No. 2008/0030702, and includes an upper gantry 18a, a lower gantry 18b, and a pair of middle gantry 18c. doing. The projection optical system 16 is supported by the upper mount 18a. The apparatus main body 18 is arranged so as to be vibrationally separated from the illumination system frame 30. Therefore, the projection optical system 16 and the illumination system 12 are vibrationally separated.

  The substrate stage apparatus 20 includes a base 22, an XY coarse movement stage 24, and a fine movement stage 26. The base 22 is made of a plate member that is rectangular in plan view (viewed from the + Z side), and is integrally mounted on the lower base 18b. The XY coarse movement stage 24 is, for example, a so-called gantry type that combines an X coarse movement stage that can move with a predetermined long stroke in the X-axis direction and a Y coarse movement stage that can move with a predetermined long stroke in the Y-axis direction. 2 axis stage device (X and Y coarse movement stages are not shown).

  Fine movement stage 26 is made of a plate-shaped (or box-shaped) member having a rectangular shape in plan view, and includes a substrate holder that holds the lower surface of substrate P by suction. The fine movement stage 26 is placed on the base 22 via a weight cancellation device (not shown in FIG. 1) as disclosed in, for example, US Patent Application Publication No. 2010/0018950. The fine movement stage 26 is guided (guided) by the XY coarse movement stage 24 to move with a predetermined long stroke in the X axis direction and / or the Y axis direction with respect to the projection optical system 16 (illumination light IL). To do.

  The positional information of the fine movement stage 26 in the XY plane is based on a laser interferometer 28 (actually fixed) to the apparatus main body 18 using a bar mirror 27 (actually including an X bar mirror and a Y bar mirror) fixed to the fine movement stage 26. Includes an X laser interferometer and a Y laser interferometer), and the position of the substrate P in the XY plane is controlled based on the output of the laser interferometer 28. The configuration of the substrate stage device 20 is particularly limited as long as the substrate P can be driven with a predetermined long stroke in at least the X-axis (scanning) direction so as to be synchronized with the mask M held by the mask stage device 14. Not.

  Next, the configuration of the mask stage device 14 will be described. The mask stage device 14 has a pair of stage units 40. One of the pair of stage units 40 is arranged on the + Y side of the optical path (that is, the mask M) of the illumination light IL irradiated from the illumination system, and the other is arranged on the −Y side of the optical path of the illumination light IL (that is, the mask M). ing. The pair of stage units 40 have substantially the same configuration except that they are arranged symmetrically on the paper surface with the mask M in between. Hereinafter, only one (+ Y side) stage unit 40 will be described, and description of the configuration of the other (−Y side) stage unit 40 will be omitted.

  As shown in FIG. 2A, the stage unit 40 includes a base 42, a guide 44, a coarse movement stage 46, a fine movement stage 48, and a plurality of voice coil motors (X voice coil motor 50x, a pair of Y voice coil motors). 50y).

  The base 42 is formed of a plate-like member parallel to the XY plane extending in the X-axis direction. As shown in FIG. 1, the base 42 is attached to a mask stage support member 36 fixed to a plurality of legs 32 of the illumination system frame 30. The apparatus main body 18 and the substrate stage apparatus 20 are vibrationally separated from each other. In the present embodiment, the base 42 is supported by the illumination system frame 30, but is installed on the floor 11 in a state of being vibrationally separated from the apparatus main body 18 and the substrate stage apparatus 20. It may be mounted on another base.

  Returning to FIG. 2A, a pair of X linear guides 52 a are fixed to the upper surface of the base 42 so as to be separated from each other in the Y-axis direction. The X linear guide 52 a is made of a member extending in the X axis direction, and the length thereof is set to be approximately the same as that of the base 42. A magnet unit 54a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction is fixed on the upper surface of the base 42 and in a region between the pair of X linear guides 52a.

  The guide 44 is made of a member having a rectangular YZ section (see FIG. 2B) extending in the X-axis direction, and as shown in FIG. In a region between the projection optical system 16 and the base 42 and the projection optical system 16, they are arranged apart from each other. Returning to FIG. 2A, the longitudinal dimensions of the base 42 and the guide 44 are substantially the same. In this embodiment, the length is set to about three times the longitudinal dimension of the mask M, for example. ing. The upper surface of the guide 44 is finished with very high flatness.

  As shown in FIG. 2B, the coarse movement stage 46 is made of a member having an L-shaped YZ cross section and is placed on the base 42. A plurality of (for example, two for each X linear guide 52a) X slide members 52b are fixed to the lower surface of the coarse movement stage 46. The X slide member 52b, together with the corresponding X linear guide 52a, constitutes a mechanical X linear guide device 52 as disclosed in, for example, US Pat. No. 6,761,482. Is linearly guided in the X-axis direction on the base 42 by the X linear guide device 52.

  A coil unit 54b is fixed to the center of the lower surface of the coarse movement stage 46 so as to face the magnet unit 54a. The coil unit 54b and the magnet unit 54a constitute an X linear motor 54 as disclosed in, for example, US Pat. No. 8,030,804, and the coarse movement stage 46 is driven by the X linear motor 54. Then, it is linearly driven on the base 42 in the X-axis direction. The direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown). The X position information of the coarse movement stage 46 is obtained by a linear encoder system (or optical interferometer system) not shown. The type of actuator for driving the coarse movement stage 46 in the X-axis direction is not particularly limited, and may be, for example, a feed screw device, a rope (or belt) drive device, or the like. The linear motor may be a moving magnet type.

  The fine movement stage 48 is arranged on the −Y side (mask M side) of the coarse movement stage 46 and above the guide 44. As shown in FIG. 2A, the fine movement stage 48 includes a main body 48a and a plurality of suction holding portions 48b that are portions that hold the mask M by suction. The main body 48a is made of a plate-like member parallel to the XY plane extending in the X-axis direction, and its length is set to be approximately the same as that of the coarse movement stage 46 (and the mask M). The main body 48 a has an air bearing (not shown) whose bearing surface is disposed to face the upper surface of the guide 44. As shown in FIG. 2B, the main body 48a floats with a slight clearance from the air bearing due to the static pressure of the pressurized gas ejected from the air bearing to the upper surface of the guide 44. doing.

  The suction holding portion 48b is formed in a plate shape parallel to the XY plane, and is attached in the −Y direction from the vicinity of the upper end portion of the surface portion on the −Y side (mask side) of the main body portion 48a. In the present embodiment, as shown in FIG. 2A, the fine movement stage 48 includes, for example, four suction holding portions 48b at predetermined intervals in the X-axis direction (a state in which the fine movement stage 48 is arranged in a comb shape in a plan view). And the margin area on the + Y side of the mask M is supported from below by using the four suction holding portions 48b. A vacuum suction device (not shown) disposed outside the mask stage device 14 is connected to the suction holding portion 48b. The suction holding portion 48b has a hole on the upper surface, and can hold the lower surface of the mask M by suction with a vacuum suction force supplied from the vacuum suction device. In the present embodiment, the main body portion 48a and the suction holding portion 48b are integrally formed. However, the present invention is not limited to this, and another member may be used.

  The X voice coil motor 50x applies a thrust (Lorentz force) in the X-axis direction from the coarse movement stage 46 to the fine movement stage 48, and the Y voice coil motor 50y is Y from the coarse movement stage 46 to the fine movement stage 48. Axial thrust (Lorentz force) is applied. One Y voice coil motor 50y is disposed on the + X side of the X voice coil motor 50x, and the other Y voice coil motor 50y is disposed on the -X side of the X voice coil motor 50x.

  As shown in FIG. 2B, the + X side Y voice coil motor 50y includes a stator 50a fixed to the coarse movement stage 46 and a mover 50b fixed to the fine movement stage 48. The mover 50b is formed in a UZ shape in the YZ section, and the stator 50a is inserted between a pair of opposed surfaces with a predetermined clearance. The mover 50b has a magnet unit including a permanent magnet (not shown) on a pair of opposed surfaces. The stator 50a has a coil unit (not shown). The direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown). The configuration of the -X side Y voice coil motor 50y (see FIG. 2A) is the same as that of the + X side Y voice coil motor 50y, but is controlled independently of the + X side Y voice coil motor 50y. The The configuration of the X voice coil motor 50x (see FIG. 2A) is different except that the size of the permanent magnet, the arrangement of the magnetic poles (direction of the magnetic field), the size of the coil, and the direction of the current are different. Since it is substantially the same as the Y voice coil motor 50y (including a stator fixed to the coarse movement stage 46 and a movable element fixed to the fine movement stage 48), description thereof is omitted. The X voice coil motor 50x and the Y voice coil motor 50y may be a moving coil type.

  Here, in the Y voice coil motor 50y (not shown but the same applies to the X voice coil motor 50x), between the stator 50a and the mover 50b, the dimension in the width direction of the blank area with respect to the Y-axis direction. Even long clearances are formed. As a result, the Y voice coil motor 50y can drive the fine movement stage 48 in the Y-axis direction with a stroke longer than the width-direction dimension of the blank area, and the suction holding portion 48b can be moved to the blank area. It is possible to drive between the facing position and a position retracted from below the mask M (not overlapping the mask M in the vertical direction).

  When the main controller drives the coarse movement stage 46 in the X-axis direction using the X linear motor 54, the fine movement stage 48 moves integrally with the coarse movement stage 46 in the X-axis direction in synchronization with this. In addition, the magnitude and direction of thrust generated by the X voice coil motor 50x are controlled. As described above, in the mask stage device 14, the fine movement stage 48 is guided to the coarse movement stage 46, thereby moving with a predetermined long stroke in the X-axis direction. Further, the main control device moves the fine movement stage 48 in the Y-axis direction with respect to the coarse movement stage 46 using the pair of Y voice coil motors 50y when the fine movement stage 48 moves with a predetermined long stroke in the X-axis direction. By finely driving and making the thrusts of the pair of Y voice coil motors 50 y different, the fine movement stage 48 can be finely driven in the θz direction with respect to the coarse movement stage 46.

  Position information of the fine movement stage 48 in the XY plane is fixed to the upper surface of the guide 44 (however, a position not facing the bearing surface of the air bearing of the fine movement stage 48) and the fine movement stage 48. It is calculated | required by the two-dimensional encoder system containing an encoder head not shown. The configuration of the measurement system for obtaining the position information of fine movement stage 48 is not limited to this, and for example, an optical interferometer system or a measurement system that combines an optical interferometer system and a linear encoder system may be used.

  Similar to the + Y side stage unit 40 described above, the −Y side stage unit 40 also includes a base 42, a guide 44, a coarse movement stage 46, a fine movement stage 48, and a plurality of voice coil motors (50x, 50y). ing. The configuration of the drive system for driving the coarse movement stage 46 and the fine movement stage 48 of the −Y side stage unit 40 and the measurement system for obtaining position information are the same as those of the + Y side stage unit 40. Yes (but controlled independently). In the mask stage device 14, the + Y side end of the mask M is sucked and held by the fine movement stage 48 of the + Y side stage unit 40, and the −Y side of the mask M is held by the fine movement stage 48 of the −Y side stage unit 40. Is held by suction. That is, the pair of fine movement stages 48 cooperate to function as a mask holder. Then, the main control device synchronously drives the coarse movement stage 46 (and fine movement stage 48) of each of the pair of stage units 40 with a long stroke in the X-axis direction, thereby making the mask M the illumination light IL (see FIG. 1). Drive against.

  Next, the configuration of the mask loader 90 and the mask stocker 100 shown in FIG. 3 will be described. The mask loader 90 is used for transporting the mask M between the mask stocker 100 and the mask stage device 14. Each of the mask loader 90 and the mask stocker 100 is housed in a chamber (not shown) together with the apparatus main body 18 and the substrate stage apparatus 20 (not shown in FIG. 3, see FIG. 1), and is on the floor 11 of the clean room. It is installed in a region on the −X side from the main body 18 (in FIG. 1 and FIG. 3, a region on the back side of the paper surface from the apparatus main body 18). For simplification of description, the mask stage device 14 is schematically shown in FIGS. 3 and 4.

  The mask stocker 100 is also referred to as a mask library or the like, and has a main body 102 made of a rectangular parallelepiped (box-shaped) member. The main body 102 is installed at a predetermined height position with respect to the floor 11 via the gantry 104. An opening 106 is formed on the surface of the main body 102 on the + Y side. A pair of support members 108 (only one is shown in FIG. 3; see FIG. 4) are provided at predetermined intervals in the Z-axis direction so that a plurality of masks M can be held in the vertical direction at predetermined intervals in the main body 102. Several are arranged. As shown in FIG. 4, the pair of support members 108 can support the blank area of the mask M from below. Although not shown in FIG. 3, a pellicle Pe (see FIG. 2A) is previously attached to the lower surface of each of the plurality of masks M stored in the mask stocker 100.

  The mask loader 90 includes a Y actuator 92Y, a Z actuator 92Z, a rotation drive device 94, a support arm 96, and a plurality of support pieces 98. The Y actuator 92Y is installed on the floor 11, and drives the Z actuator 92Z with a predetermined long stroke in the Y-axis direction. The Z actuator 92Z drives the rotary drive device 94 with a predetermined long stroke in the Z-axis direction. The type of each of the Y actuator 92Y and the Z actuator 92Z is not particularly limited, and a linear motor, an air cylinder, or the like can be used. The rotary drive device 94 is made of a box-shaped member having a low height, and is attached to the tip end portion (+ Z side end portion) of the Z actuator 92Z. The rotation drive device 94 has a rotation motor (not shown) and can rotate at least 180 ° in the θz direction with respect to the Z actuator 92Z.

  As shown in FIG. 4, the support arm 96 includes a pair of rod-like members 96a extending in one axial direction (Y-axis direction in FIG. 4) in the XY plane. The pair of rod-like members 96a are arranged so as to be separated from each other in the direction perpendicular to the longitudinal direction (X-axis direction in FIG. 4). The longitudinal dimension of the rod-like member 96a is not particularly limited, but is at least twice as long as the longitudinal dimension of the mask M. In this embodiment, for example, it is set to about 2.5 times the longitudinal dimension of the mask M. Yes. The rod-shaped member 96a is connected to the rotational drive device 94 at the center in the longitudinal direction. When viewed from the rotational drive device 94, one side in one axis direction (Y-axis direction in FIG. 4) in the XY plane, and Each of the other sides extends approximately the same length.

  The interval between the pair of rod-like members 96a is set to be narrower than the interval between the pair of guides 44 of the mask stage device 14, as shown in FIG. As a result, the support arm 96 can be inserted between the pair of guides 44 through a predetermined clearance. Further, the interval between the pair of rod-shaped members 96a is set to be somewhat shorter (narrower) than the dimension in the width direction of the mask M. Furthermore, the width direction dimension (thickness) of the rod-shaped member 96a is set narrower than the width direction dimension of the blank area of the mask M. Thus, the support arm 96 can support the mask M from below without contacting the pellicle Pe.

  As can be seen from FIGS. 3 and 4, the mask loader 90 is attached to a three-degree-of-freedom (Y-axis, Z-axis, θz) drive device in which the support arm 96 includes a Y actuator 92Y, a Z actuator 92Z, and a rotary drive device 94. Therefore, the support arm 96 that supports the mask M from below can be arbitrarily driven in the three degrees of freedom. That is, the mask loader 90 receives (or delivers) the mask M from the mask stocker 100 by inserting the vicinity of one end of the support arm 96 into the main body 102 of the mask stocker 100, and the mask M is received from the main body. As shown in FIG. 5A, the pair of guides of the mask stage device 14 is extracted from the portion 102 (or the mask M is returned to the mask stocker 100), and the mask M is rotated by 90 ° in the θz direction. It is possible to insert between 44. The configuration of the pair of support members 108 (see FIG. 4) included in the mask stocker 100 is, for example, comb-like (similar to the fine movement stage 48 (see FIG. 2A)) to avoid interference with the support arm 96 (see FIG. 2A). It may be movable in the X-axis direction) or may be formed by a member narrower than the suction holding portion 48b (see FIG. 2A) (it may not be moved in the X-axis direction). good.

  As shown in FIG. 5B, a plurality of (for example, three in this embodiment) support pieces 98 are provided on the upper surfaces of the rod-shaped member 96a in the vicinity of one end and the other end, respectively. Are fixed at predetermined intervals along the longitudinal direction (X-axis direction in FIG. 5B). For example, as shown in FIG. 5A, the interval between the three support pieces 98 is inserted between a plurality of (for example, four in this embodiment) suction holding portions 48b of the fine movement stage 48 of the mask stage device 14. It is set to be possible. A vacuum suction device (not shown) installed outside the mask loader 90 is connected to each of the plurality of support pieces 98. The support piece 98 has a plurality of holes formed on the upper surface, and the lower surface of the mask M can be sucked and held by the vacuum suction force supplied from the vacuum suction device.

  As shown in FIG. 5C, the height dimension of the support piece 98 is set larger than the dimension in the thickness direction of the suction holding portion 48b. Thus, the support piece 98 and the suction holding portion 48b are inserted by inserting the support piece 98 between a pair of adjacent suction holding portions 48b while the mask M is supported by the plurality of suction holding portions 48b from below. The mask M can be transferred from the mask stage device 14 to the mask loader 90 without contacting them.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is loaded onto the mask stage apparatus 14 by the mask loader 90 under the control of a main controller (not shown). The substrate P is loaded onto the substrate stage device by a substrate loader device (not shown). Thereafter, alignment measurement is performed by the main controller using an alignment detection system (not shown), and after completion of the alignment measurement, a plurality of shot areas set on the substrate P are sequentially exposed in a step-and-scan manner. Operation is performed. Since this exposure operation is the same as a conventional step-and-scan exposure operation, a detailed description thereof will be omitted.

  Here, in the liquid crystal exposure apparatus 10, the mask M is appropriately replaced according to the mask pattern formed on the substrate P. Hereinafter, the operations of the mask loader 90 and the mask stage device 14 including the replacement operation of the mask M held by the mask stage device 14 will be described with reference to FIGS. For simplification of the drawings, some elements of the mask loader 90 and the mask stage device 14 are omitted in FIGS.

In FIGS. 6 (A) and FIG. 6 (B) the mask stage apparatus 14, a mask M ₁ which is held in a pair of fine movement stage 48 shows a state that is moved to a predetermined mask exchange position . The mask replacement position is a position where the mask M is retracted from the lower side of the illumination system 12 (see FIG. 1), and specifically, near the −X side stroke end in the X-axis direction of the pair of fine movement stages 48. This is the mask position when positioned.

Further, as shown in FIG. 6 (A), one side of the support arm 96 of the mask stage apparatus 14 (a pair of fine movement stage 48) the mask M ₂ mask loader 90 will be held in place of the mask M ₁ It is supported in the vicinity of the end portion. In addition, the vicinity of the other end of the support arm 96 that is not supported (empty) is inserted between the pair of guides 44. At this time, as shown in FIG. 6B, the Z actuator 92 </ b> Z is controlled so that the upper ends of the plurality of support pieces 98 do not protrude above the upper surface of the guide 44.

In FIGS. 7 (A) and. 7 (B) shows a state in which the mask M ₁ is positioned in the mask exchange position. At the mask exchange position, the X position of the fine movement stage 48 is controlled so that the X position of the suction holding portion 48b and the X position of the support piece 98 do not overlap. When the mask M ₁ is positioned in the mask exchange position, the mask stage apparatus 14, the suction holding the mask M ₁ is released by the suction holding portion 48b.

Next, as shown in FIGS. 8A and 8B, the support arm 96 is driven up by the Z actuator 92Z, whereby the plurality of support pieces 98 are located between a pair of adjacent suction holding portions 48b. passed through contact with the lower surface of the mask M _1, the to separate the suction holding portion 48b and the mask M _1. In this state, as shown in FIG. 8A, the pair of fine movement stages 48 are separated from each other by the Y voice coil motor 50y (not shown in FIG. 8A, see FIG. 2A). It is driven, thereby the suction holding portion 48b is retracted from below the mask M _1. Mask loader 90, the mask M ₁ is held by suction with a plurality of support frames 98.

When the mask M ₁ is delivered to the mask loader 90, the mask stage apparatus 14, as shown in FIG. 9, a pair of fine movement stage 48, respectively, are driven in the + X direction. Further, in the mask loader 90, after the support arm 96 is driven up to a position where it does not come into contact with the guide 44, it is rotated by, for example, 180 ° in a clockwise direction (may be a counterclockwise direction) in a plan view by a rotation driving device 94. Is done. At this time, each of the pair of fine movement stages 48 is retracted to a position where it does not contact the support arm 96.

10A and 10B show a state after the support arm 96 has rotated, for example, 180 °. The mask loader 90 drives the support arm 96 downward using the Z actuator 92Z. At this time, below the lower surface of the upper surface suction holding portion 48b of the rod 96a, and as the lower surface of the mask M ₂ is respectively located above the upper surface of the suction holding portion 48b, Z position of the support arm 96 is positioned Is done. In the mask stage device 14, the pair of fine movement stages 48 is driven in the −X direction, and the X position of the suction holding portion 48 b is positioned at a position that does not overlap with the X positions of the plurality of support pieces 98. Each of the pair of fine movement stages 48 is driven in a direction approaching each other by a Y voice coil motor 50y (not shown in FIG. 10A, see FIG. 2A), and the plurality of suction holding portions 48b are mask M. ₂ is inserted below. Hereinafter, although not shown, the support arm 96 releases the suction holding of the mask M ₂ is driven downward, the mask M ₂ is passed from the mask loader 90 to the mask stage apparatus 14.

Then, the mask stage apparatus 14, as shown in FIG. 11 (A) and FIG. 11 (B), for exposure operation using the mask M _2, a pair of fine movement stage 48 which has adsorbed holding the mask M ₂ is Driven in the + X direction. At this time, the Z position of the support arm 96 is controlled so that the upper ends of the plurality of support pieces 98 do not contact the suction holding portion 48b.

In the mask loader 90 hands over the mask M ₂ in the mask stage unit 14, as shown in FIG. 12 (A) and FIG. 12 (B), the after supporting arm 96 has been driven upward to a position that does not contact the guide 44 For example, it is rotated 90 ° counterclockwise in plan view. Note that in FIG. 12 (A) and FIG. 12 (B), the in the mask stage apparatus 14, the exposure operation using the mask _{M 2} is being performed, and a description thereof will be omitted.

Thereafter, as shown in FIG. 13, the support arm 96 is driven in the −Y direction by the Y actuator 92 </ b> Y, and the vicinity of the end of the other side of the support arm 96 (the side supporting the mask M ₁ ) is within the mask stocker 100. Inserted into. At this time, the Z position of the support arm 96 is controlled so that the mask M ₁ can be accommodated in a desired position in the mask stocker 100.

  As described above, according to the mask stage apparatus 14 of the first embodiment, the pair of fine movement stages 48 that respectively hold the one end and the other end of the mask M are physically independent from each other ( For example, the fine movement stage 48 is more than the above-mentioned frame-shaped mask holder as compared with a conventional mask stage apparatus that holds a mask in a mask holder, which is a frame-shaped member, and drives the mask holder. Can also be reduced in weight. In addition, it is easy to ensure the rigidity of fine movement stage 48. Therefore, the position controllability of the mask M is improved. In addition, since each of the pair of fine movement stages 48, which are members corresponding to the frame-shaped mask holder, can be downsized, it is possible to integrally form the fine movement stage 48 with a high-rigidity material such as ceramics, thereby reducing costs. .

  In addition, since the pair of fine movement stages 48 are separated from each other, the pair of fine movement stages 48 can be driven independently in the Y-axis direction so as to be separated from and approach each other. As a result, the mask loader 90 can pass the support arm 96 between the pair of fine movement stages 48, and the mask M can be directly transferred between the mask stocker 100 and the mask stage device 14 without changing the holding arm 96. . Therefore, the cost of the mask loader 90 is reduced, and the mask replacement time can be shortened.

  The configuration of the liquid crystal exposure apparatus 10 of the first embodiment can be changed as appropriate. For example, as in the mask loader 90A (first modification) shown in FIG. 14, the support arm 196 may be configured to support only one mask M. In this case, the time required for the replacement operation of the mask M is longer than that in the first embodiment, but the mask loader 90A can be made cheaper and more compact than the first embodiment. In addition, the mask M is temporarily transferred (temporarily placed) on a transfer path of the mask M when the mask M is returned from the mask stage apparatus 14 to the mask stocker 100 (preferably near the mask stage apparatus 14). A plurality of mounts that can be installed may be installed. The plurality of mounts are preferably arranged in the vertical direction so that the plurality of masks M can be temporarily placed in the vertical direction.

  Further, as in the mask stage apparatus 14A (second modification) shown in FIG. 15, in the other (−Y side) stage unit 40A, the coarse movement stage 46 is predetermined in the Y-axis direction with respect to the base 42. It may be possible to move with the stroke. More specifically, the stage unit 40A has an X table 58. The X table 58 is linearly guided in the X-axis direction with respect to the base 42 via the X linear guide device 52, and is driven by the X linear motor 54 with a predetermined long stroke in the X-axis direction. The coarse movement stage 46 includes an X table 58 by a Y linear guide device 55 (including a Y linear guide 55a fixed to the upper surface of the X table 58 and a plurality of Y slide members 55b fixed to the lower surface of the coarse movement stage 46). In contrast, it is guided straight in the Y-axis direction. Although not shown, coarse movement stage 46 is Y-axis driven by a Y linear motor (including a Y stator fixed to the upper surface of X table 58 and a Y mover fixed to the lower surface of coarse movement stage 46). Driven with a predetermined stroke in the direction. In the stage unit 40A, the guide 44A is formed to be somewhat wider than the guide 44 of the other stage unit 40.

Hereinafter, the operation of the mask stage apparatus 14A will be described. In the first embodiment, as shown in FIG. 8 (A) and FIG. 8 (B), for passing the mask M ₁ from the mask stage unit 14 to the mask loader 90, a pair of fine movement stage 48, respectively 16A and 16B, in the mask stage apparatus 14A, the coarse movement stage 46 (and Y voice) on the one stage unit 40A side is driven. fine movement stage 48) is driven in the direction (-Y direction) away from the mask _{M 1} via a coil motor 5Oy. At the same time, the support arm 96 is also driven in the −Y direction (however, with a half movement amount of the coarse movement stage 46). Thus, the Y position of the suction holding portion 48b of the pair of fine movement stage 48 and the Y position of the support arm 96 is no longer overlap, that the support arm 96 to rise driven unloading the mask M ₁ from the mask stage unit 14A become able to. According to the mask stage apparatus 14A, since the fine movement stage 48 with respect to coarse movement stage 46 at the time of unloading of the mask M ₁ is not moved relative, a plurality of voice coil motors (50x, 5Oy) respectively of the stator, and between the mover Can be reduced, and the voice coil motor can be reduced in size.

  Further, as in the mask stage device 14B (third modified example) shown in FIG. 17A, a pair of clamping devices 60 may be provided on one (+ Y side) stage unit 40B. Here, unlike the mask stage apparatus 14 according to the first embodiment shown in FIG. 2A, the stage unit 40B does not have a pair of Y voice coil motors 50y. As shown in FIG. 17A, one stage unit 40A has the same configuration as the mask stage device 14A according to the second modification (see FIG. 15), and a pair of Y voice coil motors 50y. Therefore, the mask M can be slightly driven in the Y-axis direction and the θz direction.

  One pair of the clamp devices 60 is arranged on the + X side of the X voice coil motor 50x and the other is arranged on the −X side of the X voice coil motor 50x, but the configuration is the same. As shown in FIG. 17B, the clamp device 60 includes a Z actuator 60b (for example, an air cylinder) fixed to the coarse movement stage 46 via a support member 60a, and a predetermined Z-axis direction by the Z actuator 60b. And a ball 60c driven by the stroke. In addition, a recess 60d is formed on the upper surface of fine movement stage 48 at a position corresponding to ball 60c. In the stage unit 40B, the relative movement of the coarse movement stage 46 and the fine movement stage 48 along the XY plane is limited by inserting the balls 60c of the pair of clamping devices 60 into the corresponding recesses 60d. The recess 60d is defined by a conical surface (tapered surface), and the ball 60c can be easily inserted into the recess 60d even if the positions of the ball 60c and the recess 60d are somewhat shifted.

  According to the mask stage device 14B, the relative movement of the coarse movement stage 46 and the fine movement stage 48 along the XY plane is limited using the pair of clamping devices 60 without using the X voice coil motor 50x. Thus, the mask M can be driven in the X-axis direction using only the thrust of the coarse movement stage 46. The clamp device 60 is mainly used for accelerating and decelerating the mask M. For example, when the fine movement stage 48 is driven at a constant speed during an exposure operation, the clamp device 60 is turned off and the X voice coil motor 50x is turned on. It is desirable to use the position control with high accuracy. Thereby, the output of a plurality of voice coil motors (50x, 50y) can be suppressed, the voice coil motor can be reduced in size and weight, the cost can be reduced, and the amount of generated heat can be suppressed.

  Further, the pair of clamping devices 60 may be provided on the other (−Y side) stage unit 40C as in the mask stage device 14C (fourth modification) shown in FIG. Further, the coarse movement stage 46 of the stage unit 40C can move with a predetermined stroke in the Y-axis direction with respect to the base 42, like the mask stage apparatus 14A according to the second modification shown in FIG. ing. In the stage unit 40C, the pair of clamp devices 60 are used not only when accelerating and decelerating the mask M in the X-axis direction, but also when driving the fine movement stage 48 in the Y-axis direction during mask replacement. In the stage unit 40C, only one Y voice coil motor 50y is provided, and a pair of X voice coil motors 50x are provided on both sides of the Y voice coil motor 50y. In order to prevent fine movement stage 48 from rotating in the θz direction, Y voice coil motor 50y applies a thrust to fine movement stage 48 along an axis parallel to the Y axis passing through the gravity center position of fine movement stage 48 (centroid drive). It is preferable to arrange so that it can be performed. The Y voice coil motor 50y may be provided on one stage unit 40B side.

<< Second Embodiment >>
Next, a second embodiment will be described with reference to FIGS. 19A and 19B. The mask loader 190 according to the second embodiment is different from the first embodiment in the arrangement of the plurality of support pieces 98. Hereinafter, only differences will be described, and elements having the same configuration and functions as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and description thereof is omitted.

  In the first embodiment, as shown in FIG. 5C, the plurality of support pieces 98 of the mask loader 90 are arranged at both ends in the width direction of the mask M (on the + Y side in FIG. 5C and −Y). In the second embodiment, as shown in FIGS. 19 (A) and 19 (B), both end portions of the mask M in the longitudinal direction (as shown in FIGS. 19A and 19B) are supported. The blank areas formed on the + X side and the −X side in FIGS. 19A and 19B are supported by the plurality of support pieces 98 from below. That is, a pair of support pieces 98 are fixed at predetermined intervals in the X-axis direction on one side of the pair of rod-shaped members 196a constituting the support arm 196 and in the vicinity of the other end portions. The distance between the pair of support pieces 98 in the X-axis direction is shorter than the size in the longitudinal direction of the mask M so that the blank areas formed at both ends in the longitudinal direction of the mask M can be supported from below, and the pellicle (FIG. 19). (A) and FIG. 19B (not shown; see FIG. 2A)) are set longer than the longitudinal dimension. The height of the support piece 98 is set higher than the thickness of the pellicle Pe. The replacement operation of the mask M using the mask loader 190 is the same as that in the first embodiment, and a description thereof will be omitted.

  According to the second embodiment, in addition to the same effects as those of the first embodiment, it is not necessary to form a notch for inserting the support piece 98 in the fine movement stage 148 (the fine movement stage 148 is comb-toothed). It is not necessary to form it in a shape, but it may be in a comb shape). Further, since the fine movement stage 148 is not moved relative to the coarse movement stage 46 (not shown in FIG. 19; see FIG. 2A) with a long stroke in the Y-axis direction, the mask exchange time can be shortened and a plurality of voices can be shortened. A gap in the Y-axis direction between the stator and the movable element of each of the coil motors (not shown in FIGS. 19A and 19B) can be reduced. Therefore, the voice coil motor can be reduced in size and cost. In the second embodiment, the number of rod-shaped members 196a constituting the support arm 196 of the mask loader 190 is not necessarily two, and may be one, for example, or three or more. Further, the thickness of the rod-shaped member 196a does not need to consider the width of the blank area, and can be made thicker than in the first embodiment.

<< Third Embodiment >>
Next, a third embodiment will be described with reference to FIG. The mask stage device 214 according to the third embodiment is different from the first embodiment in that it has a plurality of pressing members 62. Hereinafter, only differences will be described, and elements having the same configuration and functions as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and description thereof is omitted.

  A pair of pressing members 62 is provided for each of the one and the other stage units 240. In the stage unit 240, the dimension of the coarse movement stage 246 in the X-axis direction is set to be slightly longer than the dimension of the fine movement stage 48 in the X-axis direction. One of the pair of pressing members 62 is fixed to the + X side end of the coarse movement stage 246, and the other is fixed to the −X side end of the coarse movement stage 246. The pressing member 62 has one end fixed to the coarse movement stage 246 and the other end extending above the guide 44, and the fine movement stage 48 is inserted between the pair of pressing members 62. A predetermined clearance is formed between each of the pair of pressing members 62 and the fine movement stage 48. The interval between the coarse movement stage 246 and the fine movement stage 48 is always measured by a sensor (not shown) (position sensor, force sensor, etc.), and the fine movement stage 48 and the pressing member 62 come into contact with each other during a normal exposure operation. Position control is performed so as not to.

  The pressing member 62 is set at the Y position so that the fine movement stage 48 can be driven at the center of gravity. In the mask stage device 214, similarly to the mask stage device 14B (third modified example) provided with a plurality of clamping devices 60 shown in FIG. Since the moving stage 246 can press the fine moving stage 48, it is not necessary to use the X voice coil motor 50x, which is efficient.

  In addition, since the relative movable range of the fine movement stage 48 in the X-axis direction with respect to the coarse movement stage 246 is defined by the pair of pressing members 62, the pair of pressing members 62 also function as a stopper device, and may be finely moved due to some trouble. Even when the X position of the stage 48 cannot be controlled, the runaway of the mask M can be suppressed.

<< Fourth Embodiment >>
Next, a fourth embodiment will be described with reference to FIG. The mask stage device 314 according to the fourth embodiment is different from the third embodiment (see FIG. 20) in that it has a masking blade device 70. Hereinafter, only differences will be described, and elements having the same configuration and function as those of the third embodiment are denoted by the same reference numerals as those of the third embodiment, and description thereof is omitted.

  The masking blade device 70 includes a pair of blades 72 (also referred to as blinds) and a pair of blade driving devices 74. One of the pair of blade driving devices 74 is placed on one coarse movement stage 246, and the other blade driving device 74 is placed on the other coarse movement stage 246. The pair of blades 72 is installed between the pair of blade driving devices 74. The blade 72 is made of a member extending in the Y-axis direction, and is disposed in a space above the mask M and the plurality of voice coil motors (50x, 50y). Each of the pair of blades 72 is independently driven in the X-axis direction by a pair of blade driving devices 74. In the mask stage device 314, the X position of the pair of blades 72 is appropriately controlled to prevent the exposure illumination light IL (see FIG. 1) from being irradiated onto an undesired region on the mask M. Further, the length of the pair of blade driving devices 74 is set so that the pair of blades 72 can be retracted to the + X side from the mask M during the mask replacement operation. Since the masking blade device 70 is placed on the pair of coarse movement stages 246, the position controllability of the pair of fine movement stages 48 (that is, the mask M) is not impaired. The masking blade device 70 can also be applied to the mask stage devices according to the first (including the first to fourth modifications) and second embodiments.

  Note that the configurations of the first to fourth embodiments described above (including the first to fourth modifications. The same applies hereinafter) can be changed as appropriate. For example, the pair of coarse movement stages 46 (or 246) may be configured to be movable in a direction shorter than the movable stroke in the X-axis direction in the direction orthogonal to the scanning direction (Y-axis direction). In this case, for example, as disclosed in US Pat. No. 8,159,649, a mask on which two types of mask patterns are formed is moved stepwise in the Y-axis direction without changing the mask. The mask stage apparatus according to the first to fourth embodiments can also be applied to an exposure apparatus that can selectively transfer the two types of mask patterns to the substrate.

  Further, the X voice coil motor 50x and the Y voice coil motor 50y are individually arranged. However, the present invention is not limited to this, and any one stator and one mover can be arbitrarily set in the X axis direction and / or the Y axis direction. A so-called 2DOF voice coil motor that can generate thrust may be used.

  Further, a hole other than an air bearing (not shown) hole is formed on the surface of the fine movement stage 48 (or 148) facing the guide 44, and the fine movement stage 48 is formed using the other hole. The gas between the guide 44 and the guide 44 may be vacuumed to apply a weak load in the −Z direction to the fine movement stage 48. Thereby, the attitude | position of the fine movement stage 48 can be stabilized. The guide 44 may be formed of a magnetic material, and a weak load in the −Z direction may be similarly applied to the fine movement stage 48 by attaching a magnet to the fine movement stage 48.

  The mask loader 90 may be configured to drive the support arm 96 (or 196) in the X-axis direction. In this case, with the mask M positioned at the mask replacement position, the support arm 96 can be entered below the mask from the X-axis direction. Further, in the middle of the mask conveyance path from the mask stocker 100 to the mask stage device 14, a processing device such as inspecting dust adhering to the mask M or sieving dust adhering to the mask M is interposed. Alternatively, a table for temporarily placing the mask M may be provided.

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

  Although the case where the projection optical system 16 is a multi-lens projection optical system including a plurality of optical systems has been described, the number of projection optical systems is not limited to this, and one or more projection optical systems may be used. The projection optical system is not limited to a multi-lens projection optical system, and may be a projection optical system using an Offner type large mirror. Further, the projection optical system 16 may be an enlargement system or a reduction system.

  Further, the use of the exposure apparatus is not limited to the exposure apparatus for liquid crystal that transfers the liquid crystal display element pattern onto the square glass plate. For example, the exposure apparatus for manufacturing an organic EL (Electro-Luminescence) panel, the semiconductor manufacture The present invention can also be widely applied to an exposure apparatus for manufacturing an exposure apparatus, a thin film magnetic head, a micromachine, a DNA chip, and the like. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern.

  The object to be exposed is not limited to a glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. Moreover, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member). The exposure apparatus of the present embodiment is particularly effective when a substrate having a side length or diagonal length of 500 mm or more is an exposure target.

  For electronic devices such as liquid crystal display elements (or semiconductor elements), the step of designing the function and performance of the device, the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer) A lithography step for transferring a mask (reticle) pattern to a glass substrate by the exposure apparatus and the exposure method of each embodiment described above, a development step for developing the exposed glass substrate, and a portion where the resist remains. It is manufactured through an etching step for removing the exposed member of the portion by etching, a resist removing step for removing a resist that has become unnecessary after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .

  As described above, the object conveying apparatus of the present invention is suitable for conveying an object on which a predetermined pattern is formed. The exposure apparatus of the present invention is suitable for forming a predetermined pattern on an exposure target object. Moreover, the manufacturing method of the flat panel display of this invention is suitable for production of a flat panel display. The device manufacturing method of the present invention is suitable for the production of micro devices.

  DESCRIPTION OF SYMBOLS 10 ... Liquid crystal exposure apparatus, 14 ... Mask stage apparatus, 20 ... Substrate stage apparatus, 40 ... Stage unit, 46 ... Coarse movement stage, 48 ... Fine movement stage, 90 ... Mask loader, 100 ... Mask stocker, M ... Mask, P ... substrate.

Claims (12)

A first moving body that holds one end of the object on which a predetermined pattern is formed in a predetermined direction;
A second moving body that holds the other end of the object in the predetermined direction;
A drive unit that relatively moves the first moving body and the second moving body away from each other with respect to the predetermined direction;
The object is held by the first and second moving bodies by the relative movement of the first and second moving bodies, which is located between the first moving body and the second moving body with respect to the predetermined direction. And a transport unit that supports the object. The transport unit is positioned between the first moving body and the second moving body in a state of supporting another object different from the object;
2. The object according to claim 1, wherein the driving unit causes the first moving body and the second moving body to move relative to each other in an approaching direction with respect to the predetermined direction so as to receive the another object from the transport unit. Conveying device.   The object transport apparatus according to claim 2, wherein the transport unit supports the object and the another object from below. The transport unit includes a first holding unit that holds the object, and a second holding unit that holds the another object,
The first holding unit is configured such that the second holding unit that holds the other object is positioned at the position of the first holding unit that holds the object received from the first moving body and the second moving body. The object conveying apparatus according to claim 2, further comprising a driving device that moves the holding unit and the second holding unit. A first guide part that supports the first moving body in a non-contact manner;
A second guide portion that supports the second moving body in a non-contact manner,
The drive unit moves the first moving body relative to the first guide part in the predetermined direction, and moves the second moving body relative to the second guide part in the predetermined direction. The object conveyance apparatus as described in any one of 1-4.   The driving unit intersects the first moving body with the predetermined direction with respect to the first guide unit so that the first moving body and the second moving body are positioned on both sides of the transport unit. The object conveying apparatus according to claim 5, wherein the second moving body is relatively moved in the intersecting direction with respect to the second guide portion.   The object transport apparatus according to claim 6, wherein the first moving body and the second moving body are independently movable in the predetermined direction and the intersecting direction. The object conveying device according to any one of claims 1 to 7,
An exposure apparatus comprising: a moving body that holds an exposure target object and moves the exposure target object so that the predetermined pattern is exposed to the exposure target object.   The exposure apparatus according to claim 8, wherein the object to be exposed is a substrate used for a flat panel display.   The exposure apparatus according to claim 9, wherein the substrate has a length of at least one side or a diagonal length of 500 mm or more. Exposing the object to be exposed using the exposure apparatus according to claim 8 or 9,
Developing the exposed object to be exposed, and manufacturing a flat panel display. Exposing the object to be exposed using the exposure apparatus according to any one of claims 8 to 10,
And developing the exposed object to be exposed.

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