JP2003068620A - Aligner - Google Patents

Aligner

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Publication number
JP2003068620A
JP2003068620A JP2001257622A JP2001257622A JP2003068620A JP 2003068620 A JP2003068620 A JP 2003068620A JP 2001257622 A JP2001257622 A JP 2001257622A JP 2001257622 A JP2001257622 A JP 2001257622A JP 2003068620 A JP2003068620 A JP 2003068620A
Authority
JP
Japan
Prior art keywords
reticle
mask
stage
arm
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001257622A
Other languages
Japanese (ja)
Inventor
Hidekazu Kikuchi
秀和 菊地
Original Assignee
Nikon Corp
Sendai Nikon:Kk
株式会社ニコン
株式会社仙台ニコン
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Sendai Nikon:Kk, 株式会社ニコン, 株式会社仙台ニコン filed Critical Nikon Corp
Priority to JP2001257622A priority Critical patent/JP2003068620A/en
Publication of JP2003068620A publication Critical patent/JP2003068620A/en
Application status is Pending legal-status Critical

Links

Abstract

PROBLEM TO BE SOLVED: To smoothly exchange a reticle without enlarging the size of an aligner. SOLUTION: Carrying out of a reticle R mounted on a stage RST, that is movable in the scanning direction and carrying it in to the stage are performed from the direction crossing with the scanning direction, by a reticle exchanging robot 32 that is placed on one side in a direction orthogonal to the scanning direction, in a plane parallel to a moving plane 60a of the stage. Thereby, for example, when these is an idle space by the side of the scanning direction in the moving range of the stage, the reticle is smoothly exchanged, without enlarging the size of the exposure device by placing the reticle exchanging robot in the space. Further, when the stage is moved from the exposure position to the exchanging position for exchanging the reticle, the moving distance in the scanning direction is shortened, regardless of the number of the reticles which can be placed on the stage in the scanning direction, so that enlargement of the aligner is also prevented from this respect.

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus, and more particularly, to an exposure apparatus.
For details, refer to Resources for manufacturing semiconductor devices, liquid crystal display devices, etc.
The present invention relates to an exposure apparatus used in a lithography process. In recent years, semiconductor devices, liquid crystal display devices and the like have been manufactured.
In the lithography process, high integration of semiconductor elements
Substrates, masks or reticles (such as wafers)
Below, collectively referred to as “reticle”).
From the perspective of emphasizing loop, step-and-re
Pete type reduction projection exposure equipment or this stepper
Step-and-scan type scanning dew
Sequential use of optical devices (so-called scanning steppers)
A mobile projection exposure apparatus is mainly used. For example, with a conventional scanning stepper
Is a reticle to the reticle stage that holds the reticle.
As a reticle exchange mechanism for loading and unloading
4 employs a mechanism as shown in a plan view.
The reticle changing mechanism 620 shown in FIG.
Chickle exchange is generally performed as follows. [0004] First, a library robot (not shown) is
14 from a library cassette (not shown).
Is placed on the standby table 610 as shown in FIG.
The reticle R1 is in position by the arms 608A and 608B.
The suction portions 612a to 612c are suction-held. This and
In parallel, on reticle stage RST, reticle R
2 are hook portions 614a to 614a of the arms 606A and 606B.
14c holds by suction. And up and down movement (not shown)
・ In the vertical direction by the rotating mechanism ・ Integrally with the rotating shaft 604
Drive the arms 608A, 608B, 606A, 606B.
The moving arm drive unit 602 is driven up by a predetermined amount. This
Thereby, the arms 608A, 608B, 606A, 60
Reticles R1 and R2 respectively held in 6B stand by
From table 610, reticle stage RST
It is carried out (unloaded). Next, a vertical movement / rotation mechanism is used for vertical movement / rotation.
The arm drive unit 602 rotates 180 ° integrally with the rotation shaft 604.
Is driven to rotate, and reticle R1 is on reticle stage RST.
The reticle R2 is transported above the standby table 610.
It is. Next, the vertical movement / rotation axis is
The arm drive unit 602 is driven downward by the arm 6.
08A, 608B, 606A, 606B
I do. As a result, the reticles R1 and R2 are
The carriage TT and the standby table 610 are respectively loaded (B
Mode). Then, arms 608A, 608B and
When the arms 606A and 606B are retracted upward,
Reticle exchange is completed. [0006] By the way, recently,
Device rules accompanying high integration of semiconductor devices (practical
(Minimum line width)
Multiple stages on the same stage to achieve high throughput.
Multi-reticle capable of mounting several (for example, two) reticles
Development of a reticle stage with a cleaver system is currently underway.
ing. This multi-reticle holder type reticle stay
Page, without having to replace the reticle
It is possible to perform multiple exposure such as so-called double exposure
The resolution and resolution are not reduced as much as possible.
Exposure accuracy is improved by improving DOF (depth of focus)
It is expected to be. [0007] However, the above-described double reticle ho
The conventional reticle exchange described above is attached to the rudder reticle stage.
It is a realistic choice to use the exchange mechanism as it is
Absent. The reason is as follows. That is, a multi-reticle holder type laser
In the case of the reticle stage, the reticle
Move any reticle to the exposure position
This is necessary for the reticle stay
The direction of movement of the long stroke
Direction) is inevitably longer
I do. In addition, the conventional reticle exchange mechanism
The reticle stage from the long stroke direction
Adopt a reticle exchange mechanism of the type that exchanges ticicles
To replace any reticle,
Increasing the moving distance of the stage in the long stroke direction
Or make the arm longer.
In the former case, the exposure of the reticle stage in the long stroke direction
An increase in the length of the optical device causes an increase in the size of the exposure device.
Inevitably increases the turning radius of the arm.
As the reticle exchange mechanism becomes larger,
The size of the exposure equipment
Because The present invention has been made under such circumstances.
The purpose is to make the device almost bulky.
And the number of masks that can be mounted on the mask stage
Regardless, the mask replacement on the mask stage is performed smoothly
It is to provide a new exposure apparatus which can perform the exposure. [0010] The invention according to claim 1
Means that a pattern formed on a mask (R) is formed on a substrate (W).
An exposure apparatus for transferring the mask onto the mask, wherein the mask is placed
Together with a mask stage movable in at least the first axial direction.
And the mask stay including the first axis.
Perpendicular to the first axis in a plane parallel to the moving surface (60a)
The mask stage on the mask stage
Unloading a mask and loading a mask onto the mask stage
Intersects the first axis direction in a plane parallel to the moving plane
And a mask transport device (32) that performs from the direction.
Device. According to this, at least the first axial direction (long
On the mask stage that can be moved in the stroke direction)
Unloading the mask placed on the mask and loading it onto the mask stage
The loading of the mask is in a plane parallel to the moving surface of the mask stage
For transporting the mask arranged on one side in the direction orthogonal to the first axis
The device intersects in a first axial direction in a plane parallel to the moving plane.
It is performed from the direction to be inserted. For this reason, for example,
Space on the side in the long stroke direction within the movement range of the page.
If there is a mask transfer device in that space,
The exposure equipment increases the size of the exposure equipment
Therefore, the mask can be changed smoothly. Ma
In addition, the mask stage must be
To move to the replacement position from the
Only one mask can be placed, or multiple masks
For example, whether it can be placed along the long stroke direction
However, the moving distance in the long stroke direction (first axis direction)
The separation can be shortened. Therefore, the exposure apparatus of the present invention
According to the method, the device is hardly enlarged and the mass
Regardless of the number of masks that can be mounted on the
Replacement of masks on the stage can be performed smoothly
Become. In this case, the exposure according to claim 2
As in the apparatus, the mask conveying device causes the
The mask conveyed to and from the stage is placed, and at least
A pair of rotatable mask loading / unloading buffers (25A,
25B). In this case, the exposure according to claim 3
As in the apparatus, each of the mask loading / unloading buffers is placed and mounted.
Can also serve as a mask alignment mechanism
it can. In each of the exposure apparatuses according to the first to third aspects,
The exposure apparatus according to claim 4, wherein
Tage must be able to place multiple masks at the same time
It can be. In each of the exposure apparatuses according to the first to fourth aspects,
There are various types of mask transport devices that transport masks.
The exposure according to claim 5, wherein a configuration can be adopted.
Like the apparatus, the mask transport apparatus holds the mask
Hands (27A, 27B) at the distal end,
Command in a plane parallel to the moving surface and perpendicular to the moving surface.
Arms (51A, 51B) that can be driven in the second axis direction,
A robot (32) provided with at least one
And the exposure apparatus according to claim 6,
The mask transport device includes a hand (2) for holding the mask.
27A, 227B) at the tip with a substantially symmetrical arrangement
And moving the pair of hands in a plane parallel to the moving plane and in front of the hand.
Arm (2) that can be driven in a second axis direction orthogonal to the moving surface.
51), and a robot (232) having
May be. Also, as in the exposure apparatus according to claim 7,
A hand holding the mask;
(327A, 327B) at the tip, and
A second plane in a plane parallel to the moving plane and orthogonal to the moving plane;
Arms (351A, 351B) that can be driven in the axial direction
A pair of robots (332) provided;
In an almost symmetrical arrangement with respect to a plane parallel to the moving plane
Holding member (101);
No. In the exposure apparatus according to the first aspect,
The mask transport device as in the exposure device according to claim 8.
The mask is conveyed to and from the mask stage
A mask loading / unloading buffer (18
9), wherein the mask stage includes a plurality of mask stages simultaneously.
Can be placed side by side in the first axial direction.
The mask transport device includes a plurality of handles for holding the mask.
(427A, 427B) at the tip in a parallel arrangement
And moving the hand in a plane parallel to the moving plane and in the moving plane.
An arm (451) that can be driven in a second axis direction orthogonal to
To have a robot (432) equipped with
it can. In this case, the exposure according to claim 9
As in the apparatus, the mask loading / unloading buffer is mounted
Can also serve as a mask alignment mechanism.
Wear. In each of the exposure apparatuses according to the fifth to ninth aspects,
And the mask as in the exposure apparatus according to claim 10.
The transfer device replaces the mask on the mask stage
At one side in the second axial direction at a predetermined mask replacement position
Delivery of the mask between the placed and each hand
A plurality of support members (45A, 45B) for performing
A support member at least at the replacement position;
In front of the loading position where the mask is loaded into the stage and the replacement position
A driving device that is driven between a standby position on one side in the second axial direction;
An elevator unit (35) having a structure (95);
It may be further provided, or the exposure device according to claim 11 can be provided.
Like an optical device, the mask transport device includes the mask stage.
Change the mask on the page.
And located at one side of the second axial direction,
Transfer position on the other side in the second axial direction of the mask stage
Hand over the mask with each hand
A plurality of support members (63);
The mask stage in the transfer position and the exchange position
Drive mechanism for driving between a standby position on one side in the second axis direction
(67) A center-up unit (61) having:
May be further provided. In each of the exposure apparatuses according to the first to eleventh aspects,
13. The exposure apparatus according to claim 12, wherein
The mask transfer device is vibrationally separated from the mask stage.
Can be provided. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First Embodiment Hereinafter, the present invention will be described.
A first embodiment of the present invention will be described with reference to FIGS.
You. FIG. 1 shows an exposure apparatus according to the first embodiment.
The arrangement 10 is shown schematically. This exposure apparatus 10
An exposure apparatus main body 30;
Reticle transport system 150 provided. The exposure apparatus main body 30 is a light source (not shown).
The reticle R1 (or R
2) Illumination unit ILU for illuminating, 2 reticles R
1. Reticles as a mask stage holding R2
Ejected from tage RST, reticle R1 (or R2)
Illumination light onto a wafer W1 (or W2) as a substrate.
Projection optical system PL and wafers W1 and W2
Two wafer stages WST1, WST2, etc.
It has. The exposure apparatus body 30 further includes a reticle
RST, projection optical system PL, and wafer stay
A main body 36 for holding the WST1 and WST2 is provided.
I have. As the light source, for example, KrF excimer
Laser light (wavelength 248 nm) or ArF excimer laser light
(Wavelength 193 nm) or F Two Laser light (wavelength 15
7nm) pulsed laser light source that outputs pulsed ultraviolet light
Is used. The lighting unit ILU includes, for example, a lighting
System housing 40 and predetermined within illumination system housing 40
Variable attenuator, beam shaping optics arranged in a positional relationship
System, optical integrator (fly-eye lens,
Internal reflection type integrator or diffractive optical element
Etc.), condensing optical system, vibrating mirror, illumination system aperture stop plate,
Ray lens system, reticle blind, main condenser
A reticle stay equipped with a lens, mirror, lens system, etc.
On reticle R1 (or R2) held on
Predetermined illumination area (slit shape extending linearly in the X-axis direction)
Or a rectangular illumination area) is illuminated with a uniform illuminance distribution.
Here, the rectangular shape irradiated on the reticle R1 (or R2) is used.
The lit illumination light is projected by the circular projection of the projection optical system PL in FIG.
Extends elongated in the X-axis direction (non-scanning direction) at the center of the shadow field
In the Y-axis direction (scanning direction) of the illumination light.
The width is set almost constant. As the lighting unit ILU, for example,
JP-A-1-259533 (corresponding to U.S. Pat.
7,207)) and the like.
Is used. The main body 36 has a base plate B
A plurality (here, four) of support members 4 provided on P
2 and an anti-vibration unit fixed to the upper part of each support member 42.
A lens barrel base plate 46 supported substantially horizontally via a knit 44
And suspended from the lower surface of the lens barrel base 46 downward.
A hanging column 48 and a support provided on the lens barrel base 46 are provided.
And a holding column 52. Each of the vibration isolation units 44 includes a support member 42.
Adjustable internal pressure placed in series (or parallel) on top of
It includes a simple air mount and a voice coil motor.
Have been. Base play is performed by each anti-vibration unit 44.
Transmitted to the lens barrel surface plate 46 via the BP and the support member 42.
Micro vibration from floor F is isolated at micro G level
Swelling. The lens barrel base 46 is made of a casting or the like.
And a circle in plan view (as viewed from above) formed in the center
A first opening (not shown) having a shape and a ± Y direction from the first opening.
A pair of second openings formed at positions that are substantially the same distance apart.
And a mouth (not shown). The inside of the first opening is
The shadow optical system PL has its optical axis direction as the Z-axis direction and
Inserted, slightly below the center of the outer circumference of the lens barrel in the height direction
To the lens barrel surface plate 46 through the flange provided on the side
Attached. Each of the pair of second openings
Whether the alignment systems ALG1 and ALG2 are inside
And provided on the outer periphery in the same manner as the projection optical system PL.
To the lens barrel surface plate 46 via the flanges
Installed. The hanging column 48 is a wafer base.
The platen 54 and the wafer base platen 54 are substantially horizontal.
4 suspended and supported on the lower surface of the barrel base 46 in the state
And a hanging member 56 for books. The support column 52 is located above the lens barrel base 46.
Four surfaces provided so as to surround the projection optical system PL on the surface.
Legs 58 and are supported substantially horizontally by these legs 58
And a reticle base surface plate 60. The reticle stage RST has a support
Arranged on the reticle base surface plate 60 constituting the
The upper surface 60a of the reticle base platen 60 is a reticle.
It is a moving surface of the stage RST. Reticle stay
The di-RST has two reticles (reticle R1 in FIG. 1,
R2) to vacuum chuck or electrostatic chuck
Double reticle holder reticle for more suction holding
Stage, for example, a reticle including a linear motor, etc.
Stage drive system 62 (not shown in FIG. 1, see FIG. 4)
Reticle R1, R2
Linear drive with a large stroke in the Y-axis direction on the platen 60
And the X-axis direction and the θz direction (rotation around the Z-axis).
Direction) can be minutely driven. The two lasers on the reticle stage RST
Chickles are selectively used, for example, during double exposure,
These reticles can be scanned in synchronization with the wafer side.
It has a structure that can be cut. In the XY plane of the reticle stage RST,
The position (including the θz rotation, which is the rotation around the Z axis)
A reticle base is fixed via a movable mirror 79 provided in a part.
By a reticle laser interferometer 64 fixed to the board 60
It is detected with a resolution of about 0.5 to 1 nm. Actually
As shown in FIG. 2, reticle stage RST
A pair of corner cube mirrors on the + Y side end of the upper surface
Y-axis moving mirror 79Y 1 , 79Y Two Is installed, + X side end
X-axis moving mirror 79X composed of a plane mirror
It extends along. Also, corresponding to these
As shown, a pair of pairs used for position measurement in the Y-axis direction
Used for Y-axis laser interferometer and position measurement in X-axis direction
An X-axis laser interferometer is provided. This
As described above, a plurality of moving mirrors and laser interferometers are provided.
In FIG. 1, these are typically the moving mirror 79 and the reticule.
Is shown as a laser interferometer 64. Note that
In place of the moving mirror, the end face of reticle stage RST is
Form a reflective surface (corresponding to the reflective surface of each movable mirror above) by surface processing
You can do it. Measured by reticle laser interferometer 64
Reticle stage RST (that is, reticle (R1
Or R2)) the position information (or speed information) is the main controller
50 (see FIG. 4). The main controller 50 is basically
In general, the position information output from the reticle laser interferometer 64
Report (or speed information) is a command value (target position, target speed)
The reticle stage drive system 62 is controlled so that
You. Returning to FIG. 1, as the projection optical system PL,
Is the object plane side (reticle R1 (or R2)
Side) and the image plane side (wafer W1 (or W2) side)
With a centric, circular projection field of view, quartz and fireflies
Is only a refractive optical element (lens element) using stone as an optical glass material?
1/4, 1/5 or 1/6 reduction magnification refracting optical system
Is used. Therefore, the reticle R1 (or R
When pulsed ultraviolet light is applied to 2), reticle R1 (or
Represents the pulsed ultraviolet light in the circuit pattern area on R2)
Therefore, the image forming light flux from the illuminated portion is projected onto the projection optical system PL.
And the partial inverted image of the circuit pattern is pulsed ultraviolet
A circle on the image plane side of the projection optical system PL for each pulse of light
Image is limited to a slit or rectangle at the center of the field of view
Is done. This allows the projected circuit pattern to be partially collapsed.
The standing image is formed on the wafer W placed on the image forming plane of the projection optical system PL.
1 (or W2), one of the plurality of shot areas
It is reduced and transferred to the resist layer on the surface of the shot area. Wafer stages WST1, WST2
Is a wafer base constituting the hanging column 48 described above.
It is arranged on the upper part of the surface plate 54, for example, a linear motor
Wafer stage drive system 66 (not shown in FIG.
4) and continuously moves in the Y-axis direction.
In addition, it moves stepwise in the X-axis direction and the Y-axis direction. The wafer stages WST1 and WST2
On the upper surface, wafers are respectively inserted via wafer holders (not shown).
C W1 and W2 are held by vacuum suction or the like, respectively.
You. Further, each of wafer stages WST1 and WST2
On the upper surface of the alignment system ALG1, ALG2
Reference marks used for loose baseline measurement
A fiducial mark plate (not shown) on which fiducial marks are formed
Each is fixed. These fiducial marks are on the surface
Are substantially the same height as the wafers W1 and W2. Ma
The upper surfaces of the wafer stages WST1 and WST2
Are provided with movable mirrors 70 and 74, respectively. What
Actually, on the upper surface of one wafer stage WST1,
Has a Y moving mirror extending in the X-axis direction fixed to the −Y side end.
The X movable mirror extending in the Y axis direction is fixed to the + X side end.
ing. Also, on the upper surface of the other wafer stage WST2,
Is a Y movable mirror extending in the X axis direction fixed to the + Y side end.
The X movable mirror extending in the Y axis direction is fixed to the + X side end.
ing. Thus, wafer stages WST1, WST
2 is provided with two movable mirrors on the upper surface.
Now, these movable mirrors are typically referred to as movable mirrors 70 and 74.
Is illustrated. Through the movable mirrors 70 and 74, respectively,
XY position and rotation of wafer stages WST1 and WST2
Amount (rotation amount in the θz direction (yaw amount), rotation around the Y axis
Rotation amount (rolling amount) in the rotation direction (θy direction), X-axis rotation
(Rotation amount in the rotation direction (θx direction) (pitching amount))
Is provided by the wafer interferometer system 130 (see FIG. 4).
Each has a predetermined resolution, for example, about 0.5 to 1 nm.
Measured in real time at resolution. This will be described in more detail.
The system 130 is actually a pair of wafer Y-axis interferometers 7.
2, 78, and a wafer X-axis interferometer 84.
ing. The wafer Y-axis interferometers 72 and 78 have a projection optical system P
Detection of L optical axis and alignment system ALG1, ALG2
Each has a length measurement axis in the Y-axis direction passing through the center, and
Y moving mirror on stage WST1, wafer stage WST2
A plurality of measuring beams are illuminated for each of the upper Y moving mirrors.
The wafer stages WST1 and WST2 in the Y-axis direction.
Position, pitching and yawing amounts are constantly measured
are doing. The wafer X-axis interferometer 84 is a projection optical system.
Optical axis of system PL, detection center of alignment system ALG1, and
Y passing through the detection center of the alignment system ALG2
It has first to third measurement axes in the axial direction. This wafer X
The axis interferometer 84 is located below the projection optical system PL.
During exposure when the WST1 and WST2 move,
Each X-axis moving mirror is irradiated with a measuring beam from the first measuring axis
And the position of each wafer stage in the X-axis direction and
Measure the amount of ringing. Further, the wafer X-axis interferometer 84
Is the wafer stage W below the alignment system ALG1.
During the wafer alignment where ST1 moves,
The X-axis movable mirror is irradiated with the measurement beam from the second measurement axis, and
X-axis position of Ehastage WST1 (and Rollin
Measurement). Further, the wafer X-axis interferometer 84
Wafer stage WST below alignment system ALG2
X-axis during wafer alignment where 2 moves
The movable mirror is irradiated with a measurement beam from the third measurement axis, and the wafer is irradiated.
Stage WST2 position in X-axis direction (and rolling
Volume). That is, in this embodiment, any of the wafers
Regarding the stage, either during exposure or alignment
In this case, the XY position is set without Abbe error.
Can be measured. The measurement of the wafer interferometer system 130 described above
The measured value is supplied to the main controller 50.
(See FIG. 4). It should be noted that instead of each of the movable mirrors described above, a wafer stage
Mirror end surface of WST1 and WST2 and reflection surface
(Corresponding to the reflection surface of each movable mirror). The alignment systems ALG1, ALG2
Is an off-axis system with the same function
It is a mark detection system. These alignment systems ALG
1. In this embodiment, ALG2 is an image processing system.
FIA (File
d Image Alignment) -based alignment sensor
Have been. In the present embodiment, the alignment system ALG1
Is an wafer formed on a wafer on wafer stage WST1.
References formed on alignment marks and fiducial marks
Used for mark position measurement and the like. Also, alignment
ALG2 is formed on the wafer on wafer stage WST2.
Formed on the alignment mark and fiducial mark plate
It is used for the position measurement of the reference mark thus set. The reticle transport system 150 is shown in FIG.
As shown in FIG. 2 which is a plan view of FIG.
Are the reticle exchange robot 32, the reticle relay unit 89 and
And reticle supply / collection unit 87
ing. The reticle exchange robot 32 includes a reticle
Loading (loading) of the reticle to the
Unloading of reticle from reticle stage RST
Load). This reticle exchange robot
32 is a reticle-based surface plate 6 as shown in FIG.
The upper plate 21 provided on the −X side of 0 (the back side of the paper surface of FIG. 1)
And a plurality of legs 23 supporting the upper plate 21 from below.
It is mounted on the formed transport system support base 75. this
The transfer system support pedestal 75 vibrates relative to the exposure apparatus main body 30.
They are arranged independently. The reticle exchange robot 32 is shown in FIG.
Reticle on reticle stage RST
First arm 51A to enter and on reticle stage RST
Arm 51B for unloading the reticle from the
51A and 51B can be freely rotated and rotated in a plane parallel to the XY plane.
Can be expanded and contracted, and can be driven vertically
Arm driving unit 53 and rotating arm driving unit 53
And a rotation drive unit 55 that performs the rotation. In addition,
In FIG. 1, for convenience of illustration, only one arm is simplified.
Is shown. The distal ends of the arms 51A and 51B are
It is constituted by hands 27A and 27B. These c
Flats that support the reticle from below of the hands 27A and 27B.
Each U-shaped (U-shaped) support part when viewed from above (as viewed from above)
Is provided with a vacuum chuck (not shown). The arm driving section 53 has a cylindrical housing.
And a first arm 51A and a second arm 5 inside the housing.
1B can be freely rotated independently in a plane parallel to the XY plane.
A horizontal drive mechanism (not shown) for rotating and extending and retracting
Drive each of the systems 52A and 52B independently in the vertical direction.
And a vertical movement mechanism (not shown). The rotation drive unit 55 includes a housing and the housing.
The arm driving section 53 provided inside is driven in the rotation direction.
And a driving unit (not shown). In the following description, the arm drive
The arm driving device 5
It shall be called 7. The reticle relay unit 89 is provided as described later.
Supplied by the reticle supply / collection unit 87 to the reticle
Reticles to be loaded (loaded) into
Unloaded from the reticle stage RST
Reticles collected by the reticle supply / collection unit 87
The reticle stage RST.
For relaying with the reticle supply / collection unit 87
is there. The reticle relay unit 89 is provided with a transfer system support base 75.
The -Y side of the upper reticle exchange robot 32 (see FIGS. 1 and 2)
Is placed on the left side of the paper) at predetermined intervals in the X-axis direction.
It has a pair of loading / unloading buffers 25A and 25B. The one loading / unloading buffer 25A is shown in FIG.
As shown in the enlarged perspective view of
A rotating table 37 to be placed,
Rotating tape around a rotating shaft (not shown) connected to the center of the lower surface
And a rotation drive device 29 that drives the cable 37 to rotate.
I have. As shown in FIG.
As shown in the figure, it is composed of six positioning pins 31a to 31f.
Contact type reticle positioning device 141 (see FIG. 4)
And three reticle holding members 33a to 33c are provided.
Have been. The contact type reticle positioning device 141 is
The six positioning pins 31a to 31f constituting the
Move along each of the six grooves formed in the cable 37
It is possible. Reticle (here "Reticle R"
The reticle holding member 33 on the rotary table 37.
a-33c, all positioning pins
31a to 31f are controlled by main controller 50 (see FIG. 4).
And move to the position (positioning position) shown in FIG.
It contacts one of the end faces of the reticle R. Ie this
In this way, the reticle R is
It is mechanically positioned on 3c. This positioning is completed
Then, the reticle holding members 33a to 33c are
For example, the reticle R is held by suction by vacuum suction or the like. This
Immediately after the suction of the icle R, all the positioning pins 31a to 31a
1f is controlled by the main controller 50, and the position of FIG.
To the outer edge of the turntable 37 (positioning
Release position). Thus, the loading / unloading buffer 2
5A also has a reticle alignment mechanism
You. The rotation driving device 29 includes a rotation motor and the like.
The rotary table 37 can be driven to rotate around the Z axis.
Has been established. Reticle R in loading / unloading buffer 25A
When it is not placed on the turntable 37, FIG.
As shown in FIG.
a is the center of the loading / unloading buffer 25A and a library to be described later.
A state parallel to the straight line L1 connecting the center of the re-robot 88
And the reticle R is placed on the turntable 37.
When the motor is running,
The rotating table 37 is driven to rotate by the moving device 29,
The surface 37a is connected to the loading / unloading buffer 25A and the reticle exchange robot.
In a state parallel to the straight line L2 connecting the centers of the slots 32
It is supposed to. The other loading / unloading buffer 25B also has the same
It has the same configuration as the input / output buffer 25A. Sandals
The reticle is mounted on the loading / unloading buffer 25B.
A rotating table 39 having a substantially square shape in a plan view,
A not-shown turn connected to the center of the lower surface of the turntable 39
Rotary drive for rotating the rotary table 39 about the rotation axis
Device 41. The rotary table 39 has a loading / unloading buffer.
As in the case of the locker 25A, a contact formed of six positioning pins is provided.
Tactile reticle positioning device 151 (see FIG. 4)
And three reticle holding members as shown. The rotation driving device 41 includes a rotation motor and the like.
The rotary table 39 can be driven to rotate around the Z axis.
Has been established. The reticle rotates in the loading / unloading buffer 25B.
When it is not placed on the turntable 39,
As shown, a predetermined one end surface 39a of the turntable 39 is provided.
Is the loading / unloading buffer 25B and the reticle exchange robot 32
Waits in a state parallel to the straight line L3 connecting the centers of
When the vehicle is mounted on the turntable 39,
Under the direction of main controller 50, rotation is performed by rotation drive device 41.
The turntable 39 is driven to rotate, and the end face 39a is moved in and out.
Center of buffer 25B and library robot 8 described later
Waits in a state parallel to the straight line L4 connecting the center of the line 8
It has become. The reticle supply / recovery section 87
Reticle Supply via Reticle Relay 89 and Reticle
The reticle is collected via the relay unit 89.
The reticle supply / collection unit 87 is provided with a transfer system support base 75.
1 and 2 provided at a predetermined height position on the −Y side of FIG.
Arranged on the unit support 131 shown by the imaginary line
I have. The reticle supply / collection unit 87
A cassette table 82 disposed on a support table 131;
It is placed on the set table 82 at a predetermined interval in the X-axis direction.
Reticle in which multiple reticles are stored
Cassette 80 1 , 80 Two (However, in FIG. 1, one reticle
Cassette 80 Two (Not shown in FIG. 2, see FIG. 2)
Of the cassette support table 131 on which the cassette table 82 is placed
Horizontal articulated joints located one step below
And a library robot 88 composed of bots.
You. The reticle cassette 80 1 , 80 Two Is
Has a plurality of shelves (not shown) inside, and has a shape on the + Y side.
Through the opening (not shown) formed, the level of the shelf
It is configured to be able to carry in and out of chickle
I have. The transfer robot 88 has a telescopic and XY plane.
Arm 90 that can freely rotate inside the
And a driving unit 92 that moves. This library Robo
The slit 88 extends along a support guide 94 extending in the Z-axis direction.
Upper surface of a slider 96 having an L-shaped XZ section that moves up and down
It is installed in. Therefore, the library robot 88
The arm 90 can be extended and retracted and swiveled in the XY plane.
Movement is also possible. Also, the vertical movement of the slider 96
Is a movable member (not shown) provided integrally with the slider 96.
Not shown extending in the Z-axis direction inside the arm and the support guide 94
Z-axis linear motor 98 (see FIG. 4)
). The support guide 94 corresponds to FIG. 1 and FIG.
As you can see, the X guide extended in the X axis direction
It is arranged above 100. The support guide 94 is
X guide integrated with slider 102 fixed to the lower end surface of
It moves along the node 100. That is, the slider 102
Is provided with a mover (not shown).
Of the X-axis linear motor 104 (see FIG. 4)
The illustrated stator is provided on the X guide 100. X axis
The near motor 104 and the support guide 94
The library robot 88 is driven in the Y-axis direction. In the present embodiment, the library robot 88
Drive unit 92, Z-axis linear motor 98 and X-axis linear motor
Data 104 and the like are controlled by main controller 50.
(See FIG. 4). In the following, the library robot
The above-described components for driving the unit 88 are put together to form a robot driving device.
It is referred to as a device 69 (see FIG. 4). FIG. 4 shows the control of the exposure apparatus 10 of this embodiment.
The configuration of the control system is shown simply. This control system
Station (or microcomputer)
The main control device 50 is mainly configured. Main control unit
The device 50 performs various kinds of control described above, and further includes a device.
The overall control of the device is controlled. Next, the reticle constructed as described above is used.
FIG. 2 shows the reticle transport operation by the
This will be described in detail with reference to FIGS. 5 (A) to 6 (C). The reticle transport system 15 described below
0 is controlled by main controller 50.
However, in the following, in order to avoid complicating the description,
Therefore, description of the main control device 50 is omitted. Also,
For the purpose of the transfer of the reticle,
Hand and reticle stage RST, loading / unloading buffer
For vacuum chucks provided in 25A, 25B, etc.
Especially necessary for vacuum on / off operation
Omitted unless otherwise specified. As a premise, the exposure apparatus body 30
Uses reticles R1 'and R2' on tickle stage RST
Double exposure operation (this
This will be described later). A. First, the robot driving device 69 (FIG. 4)
) And the Z-axis direction and X of the library robot 88.
Driving in the axial direction and turning / expanding / retracting driving of the arm 90 are performed.
Reticle cassette 80 1 (Or 80 Two ) From new
Chickle (here, reticle R1) is taken out
You. Next, the library drive is performed by the robot driving device 69.
The bot 88 and the arm 90 are driven, and the reticle
Set 80 1 (Or 80 Two Reticle R taken out from)
1 is moved by the arm 90 to a position above the loading / unloading buffer 25A.
Conveyed by. At this time, it is in the loading / unloading buffer 25A.
For example, the rotary table 37 is provided with an end face 37a shown in FIG.
Is waiting in a direction parallel to the straight line L1.
You. B. Then, the robot driving device 69
The library robot 88 is driven downward.
The loading / unloading bar from the arm 90 of the library robot 88.
The reticle R1 is placed on the rotary table 37 of the buffer 25A.
Loaded. After that, the library robot 88 carries in and out.
Evacuate from the buffer 25A. C. Next, the reticle R1 was placed.
In the rotary table 37 of the loading / unloading buffer 25A, a contact type
All positionings constituting the reticle positioning mechanism 141
Pins 31a to 31f are on any end face of reticle R1.
The reticle R1 rotates to the positioning position where it contacts
It is mechanically positioned on the table 37. This positioning
The reticle on the turntable 39
The vacuum of the holding members 33a to 33c is turned on,
Thereafter, the positioning pins 31a to 31f return to their original positions. So
Then, the rotary table 37 is moved by the rotary driving device 29 to a predetermined position.
The end face 37a of the turntable 37 is rotated by a fixed angle.
The direction is set to be parallel to the straight line L2. Then rotate
The table 37 waits in that direction. D. On the other hand, the above c. In parallel with loading and unloading
Library robot 88 evacuated from buffer 25A
Is moved in the Z-axis direction by the robot driving device 69 (see FIG. 4).
And drive in the X-axis direction, turning and telescopic drive, live
Reticle cassette by arm 90 of rally robot 88
80 1 (Or 80 Two ) To a new reticle (here retic
(Referred to as a circle R2). Next, the robot driver
Library robot 88 and arm 9
0 is performed, and the reticle cassette 80 is driven. 1 (Or 8
0 Two The reticle R2 taken out of
Therefore, the sheet is transported to a position above the loading / unloading buffer 25B. this
FIG. 2 shows the state during the transportation, and in this case,
The rotation table 39 of the loading / unloading buffer 25B
Is waiting in a direction in which the end surface 39a is parallel to the straight line L3.
You. E. Then, the robot driving device 69
The library robot 88 is driven downward.
The loading / unloading bar from the arm 90 of the library robot 88.
The reticle R2 is placed on the rotary table 39 of the buffer 25B.
Loaded. After that, the library robot 88 carries in and out.
Withdraw from buffer 25B. F. Next, the reticle R2 was placed.
The rotary table 39 of the loading / unloading buffer 25B has a contact type
All positioning of reticle positioning mechanism 151
Position where the pin abuts on either end of reticle R2
The reticle R2 on the rotary table 39.
Is positioned mechanically. When this positioning is completed
In both cases, the reticle holding member on the rotary table 39
Is turned on. After that, the positioning pin is
And the rotary table 39 is rotated by the rotary drive device 41.
The table is rotated by a predetermined angle from the direction of FIG.
9 is set in a direction in which the end face 39a is parallel to the straight line L4.
You. Thereafter, the turntable 39 stands by in that direction. G. Thus, both loading and unloading buffers
Reticles R1 and R2 are placed on 25A and 25B.
And an arm driving device constituting the reticle exchange robot 32.
The second arm 51B rotates, expands and contracts, and moves up and down
Moved on the turntable 37 of the loading / unloading buffer 25A.
The tip of the second arm 51B is positioned below the mounted reticle R1.
The end (hand 27B) is moved. H. Next, by the arm driving device 57
The second arm 51B is driven up by a predetermined amount. This second
On the rotary table 37 almost at the same time as the rising of the arm 51B.
Vacuum of the reticle holding members 33a to 33c is off
Is in the middle of the upward movement of the second arm 51B.
The vehicle R1 is supported from below by the hand 27B,
By raising the second arm 51B, the reticle R1
Is transferred from the turntable 37 to the hand 27B.
That is, the reticle R1
Loading is performed. Then, the second arm 51B is turned
The cable 37 rises to a height position at which it does not interfere with the cable 37. I. A. ~ H. Reticle during
Page RST, the reticle R1 'and the reticle R2'
Reticle stage RST is completed
The reticle shown in FIG.
It is moved to the exchange position and waits. At this time,
The state is shown in FIG. In this embodiment, for convenience of explanation,
The loading / unloading buffer 25A,
After the reticle has been transported to each of the
Reticle from the loading / unloading buffer 25A by the
It was decided to be unloaded, but the loading / unloading buffer 25A
At the stage when the reticle is placed on the second arm 51B.
Of course it is good that the reticle is unloaded
No. From the state shown in FIG.
Reticle replacement on reticle stage RST as shown in
Is performed. J. First, as shown in FIG.
Below the reticle R1 'on the reticle stage RST
Arm driving device so that the hand 27A is positioned
The first arm 51A pivots, expands and contracts, and
Moved down. In this manner, the lower side of reticle R1 'is
When the arm 27A is positioned, the arm driving device 57
As a result, the first arm 51A is driven to rise by a predetermined amount.
Of reticle R1 'from below by hand 27A
Supported, and the first arm 51A is further raised.
The reticle R1 'moves from the reticle stage RST.
Is transferred to the server 27A. That is, the reticle R1 '
Unloading from reticle stage RST is performed. K. Next, the arm driving device 57 is configured.
The arm drive unit 53 is driven by, for example, Z
It is rotated counterclockwise around the axis, and the first and second
As the arms 51A and 51B are turned and driven to expand and contract,
As shown in FIG. 5 (C), it is held by the hand 27A.
Reticle R1 'moves above loading / unloading buffer 25A
The reticle R1 held by the hand 27B is
The upper stage RST is moved. Then, the first ar
51A is driven down, and the loading / unloading
The reticle R1 'is delivered to the
Is). Similarly, the second arm 51B is driven to descend.
During the descent, the reticle is placed on the reticle stage RST.
The tickle R1 is delivered (loaded). L. Next, by the arm driving device 57,
The second arm 51B loaded with the reticle R1 turns and extends.
By being contracted, the hand 27B is moved to the reticle R1.
Evacuation from below, and as shown in FIG.
Mounted on + Y side (right side of paper) on tickle stage RST
Move the hand 27B to the lower side of the reticle R2 '
You. On the other hand, the first arm 51A is connected to the arm driving device 57.
By turning and expanding and contracting, the reticle R1 '
(From above the loading / unloading buffer 25A)
C below the reticle R2 placed on the buffer 25B.
27A is moved. M. Then, as described above,
Each arm 51A, 51B is driven upward by the driving device 57.
Moved, reticle placed on reticle stage RST
Unloading and loading / unloading buffer R2 '
The mounted reticle R2 is unloaded. this
The state immediately after is shown in FIG. N. Next, the arm driving device 57 is configured.
The arm drive unit 53 is rotated by the rotating drive unit 55
And the first and second arms 51A and 51B rotate,
The reticle R2 is driven to extend and retract, and the reticle stage RST is moved.
Reticle R1 'is unloaded while being positioned upward
It is positioned above the input buffer 25A. Then each
The arms 51A and 51B are driven to descend, and during the descending movement.
Reticle R1 is delivered on reticle stage RST
(Loaded), and the reticle R1 '
5B (rotary table 39).
Is). Thereafter, the arms 51A and 51B are driven by the arms.
The device 27 is rotated and driven to expand and contract, and the hand 27A
Evacuates from tickle stage RST and unloads hand 27B
Withdraw from the input buffer 25B. As described above, the reticle R1, R2
When the loading on the chicken stage RST is completed, FIG.
As shown in (C), reticle stage drive system 62
Causes reticle stage RST to be above projection optical system PL.
Is driven in the + Y direction. The above k. In the reticle R1 '
Is transferred to the loading / unloading buffer 25A.
The rotary table 37 is driven to rotate by a predetermined angle
In a direction where the end face 37a is parallel to the straight line L1,
Until the reticle is collected by the Lari robot 88,
And wait. On the other hand, n. In the reticle R
In the loading / unloading buffer 25B loaded with 2 ', the rotating drive
The rotating table 39 is rotated by a predetermined angle by the moving device 41.
Driven so that the end face 39a is parallel to the straight line L3,
The reticle is collected by the library robot 88.
Wait until Next, after the reticle exchange is completed,
The processing sequence on the exposure apparatus body 30 side
The control operation of main controller 50 will be briefly described.
You. First, the main controller 50 operates a reticle (not shown).
Microscope and alignment system ALG1, ALG2, etc.
Reticle alignment and alignment system ALG
1, baseline measurement of ALG2, etc. in a predetermined procedure
U. Next, main controller 50 sets alignment system ALG
1 (or ALG2) using the wafer W1 (or W2)
Fine Alignment (EGA (Enhanced Glow)
Alignment) and the like, and the wafer W1 (or
W2) Obtain array coordinates of a plurality of shot areas on the upper side. Next, the main controller 50 executes the above-described alignment.
Measurement of the wafer interferometer system 130 based on the
By controlling the wafer stage drive system 66 while monitoring the value
Acceleration for exposure of first shot of wafer W1 (W2)
Wafer stage WST1 (or WST2) at start position
Moving. Next, main controller 50 controls the reticle stay.
Through the laser drive system 62 and the wafer stage drive system 66.
Chickle stage RST and wafer stage WST1 (or
WST2) starts scanning in the Y-axis direction. Both stages R
ST, WST1 (or WST2) are the respective target scans
When the speed is reached, the reticle R1
(Or R2) pattern area begins to be illuminated and scanning exposure
Is started. Then, the pattern of reticle R1 (or R2)
Different regions of the energy region are sequentially illuminated with pulsed ultraviolet light,
By completing the illumination of the entire pattern area,
Scanning exposure of the first shot on wafer W1 (or W2)
finish. Thereby, the reticle R1 (or R2)
The turn is reduced to the first shot via the projection optical system PL.
Will be copied. In this manner, the scanning exposure of the first shot
Is completed, main controller 50 starts driving the wafer stage.
Wafer stage WST1 (or WST)
2) Step move in the X and Y axis directions to
After moving to the acceleration start position for exposure,
Then, the same scanning exposure as described above is performed. Thus, the wafer W1 (or W2)
Steps for scanning exposure of the upper shot and exposure for the next shot
Is repeated, and the wafer W1 (or W
2) Reticle R1 (or
The pattern of R2) is sequentially transferred. Then, all wafers on the wafer W1 (or W2)
Putter of reticle R1 (or R2) on the boat area
When the transfer of the reticle is completed, the main controller 50
Runs reticle stage RST via stage drive system 62
Move the reticle R2 (or R1) by moving a predetermined amount in the inspection direction.
After setting the inspection start position (acceleration start position),
To the entire shot area on the wafer W1 (or W2).
The pattern of the reticle R2 (or R1) is transferred.
Here, reticle R1 and reticle R2 use exposure conditions and transparency.
When the reticle alignment
Each condition is measured, and the condition is changed according to the result.
The update may be performed. As described above, wafer stage WST1
(Or WST2) on wafer W1 (or W2)
When the pattern transfer is completed, wafer stage WST2
(Or WST1) on wafer W2 (or W1)
Then, double exposure is performed in the same manner as described above. Thus, reticle stage RST
Using reticle R1 and reticle R2 loaded on top
When the exposure is completed, re-
Exchange is performed. During the above exposure operation, live
Used by the Lari robot 88 in the previous exposure operation
Reticles R1 'and R2' are collected and
To (80 1 , 80 Two ), And
The reticle to be used next is the reticle cassette (8
0 1 , 80 Two ) From any one of the carry-in / out buffers 25A, 2
5B. Then, the second arm 51B is transported.
Holding the reticle placed on the access buffer 25A
The first arm 51A waits until the exposure operation ends, and the first arm 51A
Stand by without holding the reticle near the vehicle change position. As described in detail above, the present embodiment
According to the exposure apparatus 10, the reticle stage RST is mounted on the reticle stage RST.
Unloading of the placed reticle and reticle stage RST
The loading of the reticle onto the
Direction perpendicular to the scan direction in a plane parallel to the
Reticle exchange robot 32 arranged in the
This is performed from a direction intersecting the non-scanning direction. This
For example, how to scan within the moving range of the reticle stage
If there is empty space on the side of the
By placing reticle transport system 150 on the source,
The reticle can be replaced without increasing the size of the entire optical device.
It can be performed smoothly. Also, reticle stage
Move RST from exposure position to exchange position for reticle exchange
When moving, the scanning direction of reticle stage RST
Can be shortened. Therefore, the exposure equipment
The reticle stay can be installed without increasing the size of the entire
Reticle exchange on page RST
Become. In particular, as in this embodiment, the reticle
RST along the scan direction
Double reticle holder system on which two reticles are placed
When using a reticle stage,
Distance from the reticle exchange robot 32
Reticle exchange robot 32
It is possible to reduce the size of the exposure equipment
It works. Further, the sheet is conveyed to and from the reticle stage.
Loading / unloading buffer 25A on which a reticle is placed and carrying out
Since the input buffer 25B can rotate,
A reticle that transports the reticle through the buffers 25A and 25B.
Drive control of the exchange robot 32 and the library robot 88
Can be arranged without receiving about. Therefore,
Since the degree of freedom in designing the chickle transport system 150 increases,
Relocation of each part of the reticle transport system for the purpose of miniaturization
I can. The loading / unloading buffer 25A and the loading / unloading buffer
A contact reticle positioning device 141,
151 are provided, and the lasers placed on the upper surfaces thereof are provided.
The ability to mechanically align the tickle
When the reticle is placed on the reticle stage
The displacement can be suppressed as much as possible. Therefore, reticks
Reloading of the image file is avoided, and the throughput of the entire exposure process is reduced.
Can be prevented from becoming worse. The reticle transport system 150 includes an exposure apparatus
Vibration with the main body 30, ie, the reticle stage RST
Since it is provided separately, the exposure
While the optical operation is being performed, the reticle transport system 150 moves forward.
Perform the preparatory operation for reticle exchange described above
The operation of the reticle transport system 32 is
There is no possibility of causing a zero vibration factor. Therefore, the pattern
Exposure operation and lens level while maintaining the shooting accuracy, that is, exposure accuracy
The exposure operation is performed in parallel with the preparation operation for
When performing operations and reticle change operations sequentially
In comparison, the throughput can be improved. The reticle exchange in the above embodiment
The sequence is an example and is not limited to this.
No, loading / unloading buffers 25A, 25B, reticle changer
Depends on the bot 32, reticle replacement position, etc.
To reduce the time required for reticle replacement
It is possible to adopt a sequence of file exchange. In the above embodiment, the reticle stay
The exchange positions of the two reticles on the RST are different
When replacing each reticle, use reticle stage R
ST is set to the standby state, but is not limited to this.
For example, at the position of reticle R2 shown in FIG.
May be replaced. In this case, each reticle
The reticle stage RST in the scanning direction during the replacement of
To replace any reticle.
Control the reticle exchange robot 32 at the same position.
Control is relatively easy. In the above embodiment, the loading / unloading buffer is used.
25A and 25B are the loading buffer and the unloading buffer.
The case where both functions are shared has been described.
One buffer is not limited to the reticle stage.
Dedicated for loading where reticles to be loaded are temporarily placed
Of the reticle stage and the other buffer
Out where the unloaded reticle is temporarily placed
It may be a dedicated buffer. << Second Embodiment >> Next, a second embodiment of the present invention will be described.
An exposure apparatus according to an embodiment will be described with reference to FIG.
I do. Here, the same as the first embodiment described above or
The same reference numerals are used for equivalent components.
The description will be simplified or omitted.
The exposure apparatus of the second embodiment is the same as that of the first embodiment described above.
Of reticle exchange robot in exposure apparatus 10 in the ready state
Of reticle replacement
Only the difference from the above-described first embodiment is the other.
This is similar to the first embodiment. So,
In the following description, such differences will be mainly described. FIG. 7 shows an exposure apparatus according to the second embodiment.
Reticle transport system 250 is shown. This retic
Reticle exchange robot 132 that constitutes the transfer system 250
Is different from the reticle exchange robot 32 of the first embodiment.
And only one arm, not shown
Suspended from the support base. That is, reticle exchange robot 132
Is a vertical movement / rotation drive unit 157 fixed to the support base.
And one end in the longitudinal direction of the vertical movement / rotation drive unit 157.
A first arm 151a rotatably connected to the first arm 151a,
One end in the longitudinal direction is connected to the other end of the arm 151a.
The second arm 151b, which is connected to the second arm 151b.
And an arm 152 including a hand portion 151c. The arm 152 is connected to each connecting portion (joint portion).
Min) drive in the direction of rotation (θz rotation) in the horizontal plane
A movable actuator is provided for each connecting part.
It is possible to control every minute. For this reason, the reticle
The control accuracy and the degree of freedom of the exchange robot 132 are extremely high.
It's getting worse. Further, the vertical movement / turning drive unit 157 is
The first arm 151a constituting the arm 152 is vertically driven.
Arm 15
2, that is, the hand 151c is freely driven in the vertical direction.
Is possible. Hereinafter, the reticle transport system according to the second embodiment will be described.
Exchange of reticle on reticle stage RST by 250
The replacement method will be briefly described. The second embodiment
In the state, the operation of the reticle exchange robot,
Unload a new reticle from buffer 25B
Operation to load on reticle stage RST and use
Unlocked reticle from reticle stage RST
Of loading and loading on the loading / unloading buffer 25A
However, this is only different from the first embodiment,
The explanation will focus on the points. In addition, the reticle exchange robot 13
2 is driven by an actuator provided in each part
However, in order to avoid complicating the description,
Is omitted. First, the reticle exchange robot 132
FIG. 7 shows reticle stage RST in which the optical operation has been completed.
Wait until it is positioned at the reticle exchange position to be replaced.
Then, reticle stage RST is at the reticle exchange position.
At the stage where it is positioned, the arm 152 turns, expands and contracts,
Reticle R moved up and down and on reticle stage RST
The hand unit 151c is moved below 1 '. Then
The arm 152 (hand unit 151c) is driven upward.
As a result, reticle R1 ′ is supported by hand 151c.
Reticle R
1 'is transferred to the hand unit 151c. Then, the hand unit 151c moves the reticle
Up to a height that does not interfere with (do not touch)
At this stage, the reticle R1 'is placed above the loading / unloading buffer 25A.
Arm 152 extends almost the shortest distance so that
Is driven. Thereafter, the reticle R1 'is moved to the loading / unloading buffer.
When the arm 152 is moved upward by 25A, the arm 152 is driven downward.
And the reticle R1 'is delivered to the loading / unloading buffer 25A.
(Loaded). Next, the hand unit 151c
Evacuate from the loading / unloading buffer 25A and set a new reticle R1.
Loading and unloading to transport the wafer onto the reticle stage RST.
The movement toward the buffer 25B is started. The arm 152 moves to the loading / unloading buffer 25B.
When it moves, it moves through the shortest distance
After receiving reticle R1 at Buffa 25B,
Reticle R1 'is mounted on the stage RST
The reticle R1 is loaded at the position where it was set. In FIG.
Indicates that reticle R1 is located above reticle stage RST.
The state immediately before being determined is shown. Replacing the other reticle R2 '
Is performed in the same manner as described above. As described above, in the second embodiment,
According to the exposure apparatus, the same effect as in the first embodiment can be obtained.
Reticle exchange robot 13
2 is composed of only one arm and has a small turning radius.
Therefore, the reticle transport system 250 can be made more compact.
It is possible. Reticle exchange robot
Each connecting part (joint part) of 132 is actuated
Data, and can be controlled independently.
As the degree of freedom increases, the reticle replacement position can be set arbitrarily.
Can be Therefore, the size of the reticle transport system 250 is small.
It is possible to make design changes for the purpose of
You. In the second embodiment, the reticle
The exchange robot 132 is suspended and supported,
However, the present invention is not limited to this, and as in the first embodiment,
75. << Third Embodiment >> Next, a third embodiment of the present invention will be described.
Regarding the exposure apparatus according to the embodiment, FIGS.
It will be described based on the following. Here, the first and second realities described above are used.
The same or equivalent components as the embodiment are the same.
The symbols are used and the description is simplified or omitted.
Shall be omitted. The exposure apparatus of the present embodiment has been described above.
Reticle changer in exposure apparatus 10 of first embodiment
Some parts of the bot and concomitant
Only part of the work is different, others are the first implementation
It is the same as the form. Therefore, in the following,
The following description focuses on these differences. FIG. 8 shows an exposure apparatus according to the third embodiment.
Reticle transport system 350 is shown. This retic
Reticle exchange robot 232 constituting the transfer system 350
Is a reticle exchange robot 1 according to the second embodiment described above.
32, only one arm 251 is provided.
However, the hand 233 constituting the tip of the arm 251
, And up / down / swivel drive on the transport system support base 75
The difference is that it is installed via the device 257. That is, the hand 233 of the third embodiment.
Is independently driven to rotate near one end of the second arm 151b.
Rotating plate 222 arranged so that
Two hand parts 227A provided at both ends in the longitudinal direction,
227B. Hereinafter, this reticle exchange robot 232 will be described.
Regarding the reticle changing method used, FIGS.
This will be described with reference to FIG. In addition, reticle exchange robot
Other than the operation of the unit 232, the first and second embodiments described above
Therefore, the description is omitted. First, reticle stage RST performs an exposure operation.
During the operation, as shown in FIG.
The pickle exchange robot 232 moves to the loading / unloading buffer 25A.
And is placed on the loading / unloading buffer 25A.
The reticle R1 is held by the hand unit 227A and
Similarly load and wait. Next, the exposure operation of reticle stage RST
When the work is completed, the reticle stage RST is reticked.
9B, driven by the stage driving system 62.
When the reticle is positioned at the reticle change position
Actuators provided at each connection part of the exchange robot 232
180 degrees rotation operation of the rotating hand 233 by the eta,
The turning and extension / contraction operations of the arm 251 are performed, and FIG.
(B) As shown in FIG.
Window 227B is in standby mode at the reticle exchange position.
Unload reticle R1 'on tickle stage RST
I do. Next, the third reticle R1 is held.
The reticle R1 'is placed on the
Position on the reticle stage RST
Then, the rotary hand 233 is driven to rotate by 180 °. FIG.
Shows the state at this time. Then, the reticle exchange robot 132
Arm 251 is driven downward to load reticle R1.
You. Next, the arm 251 is turned, expanded and contracted, and moved up and down.
By using, the used part held by the hand part 227B
Reticle R1 'is placed on loading / unloading buffer 25B.
You. At this time, at the same time, the hand unit 227A
Has been evacuated from below. And the loading / unloading buffer 25
After placing B on reticle R1 ', hand unit 227
B is retracted from below reticle R1 '. Thereafter, a new reticule is performed in the same manner as described above.
Mounted on the reticle stage RST and the reticle stage RST.
The used reticle R2 'is replaced. As described above, according to the third embodiment,
According to the exposure apparatus, the same effects as in the second embodiment are obtained.
In addition to the two hand units 227A, 22
7B, the rotary hand 233 has
The time required for replacing the vehicle can be further reduced. << Fourth Embodiment >> Next, a fourth embodiment of the present invention will be described.
An exposure apparatus according to the embodiment will be described with reference to FIGS.
A description will be given below. Here, the first to third embodiments described above.
The same reference numerals are used for the same or equivalent components
And simplify or omit the description.
Shall be. FIG. 10 shows a reticle according to the fourth embodiment.
The transfer system 450 is shown in a plan view. This retic
In the transfer system 450, the configuration of the reticle exchange robot is
Unlike the first embodiment described above,
About it is the same. Therefore, in the following:
The configuration of the reticle exchange robot 332 will be mainly described. FIG. 11 shows a reticle exchange robot 332.
A side view as seen from the −Y direction to the + Y direction is shown. This
As shown in FIG. 11, the reticle exchange robot 33
2, three plate-shaped members are assembled in a U-shape (or U-shape)
A support 101 as a combined holding member, and a support 1
01, a first arm 351A fixed to
51A, the second arm 351 almost vertically symmetrical
B. Tip of each arm 351A, 351B
The unit is constituted by hands 327A and 327B. The support 101 is made of a plate-like member 103A.
At the -X end on the plate member 103A.
XZ section and XY section are U-shaped (U-shaped)
Between the frame member 103B and the first frame member 103B.
Same shape as the first frame member 103A supported flat
And a second frame member 103C having
ing. The second frame member 103C includes a first frame portion.
Is directly supported from below by the material 103B.
And a reinforcing member 109 made of a substantially triangular plate member.
It is also supported indirectly. An opening (not shown) is formed in a part of the plate member 103A.
Is provided, and the plate-like member 103 is connected to the opening.
A tubular member 105B is connected from below A. this
A part of the tubular member 105B has the plate-like member 103A
A support member 111 for supporting the camera is provided. In addition, a part of the second frame member 103C
Is provided with an opening (not shown), and the pipe is connected to the opening.
105A is connected. The first arm 351A is connected to the second frame
Suspended and supported on the lower surface of the member 103C by screws or the like
The second arm 351B is located above the plate-like member 103A.
It is fixed to the surface by screws or the like. Cables / Piping 1 of First Arm 351A
07A is an opening and a tubular portion of the second frame member 103C.
Connected to a power supply device (not shown) via the material 105A,
The cables and piping 107B of the two arms 351B are plate-shaped.
Not shown through the opening of the member 103A and the tubular member 105B.
The power supply device shown in FIG. In the fourth embodiment, the first
Reticle exchange is performed in almost the same sequence as the embodiment.
Therefore, the description is omitted. As described above, the exposure apparatus of the present embodiment
According to the arrangement, an effect equivalent to that of the above-described first embodiment is obtained.
Other arms can interfere with each other.
One arm drives the other arm
1st Embodiment
It is possible to achieve the above high throughput
You. The reticle exchange robot according to the present embodiment
When using the robot, the area occupied by the robot (footprint
) Has one arm as in the second embodiment.
Can have almost the same area as a reticle exchange robot.
Therefore, it is possible to reduce the size of the entire exposure apparatus.
You. In the fourth embodiment, the first arc
When the arm and the second arm are moved up and down, the hand of each arm
Each arm may interfere (contact) with each other.
Loading and unloading of reticle without moving
Elevator unit, which will be described later, and
It is very effective to adopt a center-up unit
It is. << Fifth Embodiment >> Next, a fifth embodiment of the present invention will be described.
The exposure apparatus according to the embodiment will be described with reference to FIG.
I will tell. Here, the same as the first to fourth embodiments described above.
Or use the same reference numerals for equivalent components.
And the description shall be simplified or omitted.
I do. The exposure apparatus according to the fifth embodiment includes the above-described first to fifth embodiments.
Reticle transport system in exposure apparatus 10 of fourth embodiment
Of reticle replacement
Only the parts are different, and the others are the first to fourth embodiments described above.
It is the same as the form. Therefore, in the following
The following description focuses on these differences. FIG. 12 shows a retic according to the fifth embodiment.
The vehicle transport system 550 is schematically illustrated in a plan view.
The reticle transport system 550 is a reticle transport system 550 according to the second embodiment.
Reticle relay compared to the reticle transport system 250 (see FIG. 7)
Parts and reticle exchange robots have different configurations.
The points are almost the same. Hereinafter, the reticle exchange roller according to the fifth embodiment will be described.
Bot 432 and reticle as mask loading / unloading buffer
The relay unit 189 will be described with reference to FIG. The reticle exchange robot 432 is
Reticle exchange robot 132 of the embodiment (see FIG. 7)
The configuration is almost the same as that described above, but holds one reticle.
Instead of the hand part 151c
Is a hand that can hold two reticles simultaneously
It is composed of a part 151c '. This is further elaborated
Then, the hand part 151c 'is connected to one end of the second arm part 151b.
Actuator for rotary drive inside
A rotation drive unit 91 having an eta;
A plate-like hand support 93 provided symmetrically to the left and right
A, 93B and on the hand support parts 93A, 93B
Hand units 42 holding the reticles, each supported
7A and 427B. Each hand part 427A,
427B is the second stage mounted on reticle stage RST.
Are arranged at almost the same interval as the reticle.
You. The reticle relay section 189 has been
Reticle relay according to first to fourth embodiments described above
Unlike the unit 89, a plurality of buffers (here, 2
Reticle).
You. That is, the reticle relay section 189 is
The reticle mounting table 143 and the reticle mounting table 143.
Contact type reticle positioning device similar to the above-described respective embodiments.
Of holding the reticle from below,
And a reticle holding unit shown in FIG. Contact reticle position
The spacing between the positioning devices 141, 151, ie the reticle
The mounting interval of the reticle on the mounting table 143 is
(That is, the reticle)
(The distance between two reticles on stage RST)
Is defined. Hereinafter, the reticle transport system according to the fifth embodiment will be described.
The method of exchanging the reticle 550 is described with reference to FIG.
Will be described. As shown in FIG. 12, the reticle stay
When the RST is positioned at the reticle exchange position,
The reticle exchange robot 432 that does not hold the
Moved and used reticle on reticle stage RST
The hand units 427A and 427B are located below the hands R1 'and R2'.
Position. Next, the reticle exchange robot 432
By being driven upward, reticles R1 'and R2'
It is supported from below by the hand parts 427A and 427B.
The reticle R1 '
R2 'is delivered to the hand units 427A and 427B. After that, the hand units 427A and 427B
Position that does not interfere with (touch) the tickle stage RST
When the arm 451 is swung up and down,
And a hand unit 427 holding the reticles R1 'and R2'.
A, 427B are located above reticle relay portion 189.
You. Next, the reticle exchange robot 432 is driven downward.
And the reticles R1 ′ and R2 ′ are on the reticle relay section 189.
Passed to (loaded). After that, hand part 4
27A and 427B are retracted from above reticle relay unit 189.
It is. Next, the reticle is relayed by the robot 88.
Reticles R1 'and R2' on section 189 are
To (80 1 , 80 Two ) In order. Change
In addition, the robot 88 includes a reticle cassette (80 1 , 8
0 Two ), Renew new reticles R1 and R2.
It is transported onto the tickle relay section 189. As described above, the reticle
When the chickles R1 and R2 are transported by the robot 88,
By contact type reticle positioning mechanism 141, 151
Reticles R1 and R2 are aligned.
When the adjustment is completed, the hand units 427A and 427B
So that it is located below reticles R1 and R2.
451 is rotated, expanded and contracted, and driven in the vertical direction. As described above, under reticle R1, R2
After hand parts 427A and 427B are positioned on the side
The arm 451 is driven upward, and the hand unit 427A,
427B, reticle R on reticle relay section 189
1, R2 are received (unloaded) at the same time. Next, the arm 451 is connected to the reticle stay.
Rotate so that reticles R1 and R2 are located on
Rotation, expansion and contraction, and vertical driving.
When the vehicle exchange robot 432 is driven downward,
Two reticles R1 and R2 on reticle stage RST
At the same time, the hand units 427A, 427
B is retracted from reticle stage RST. As described above, the exposure apparatus of the present embodiment
According to the position, two reticles from above reticle stage RST
Can be unloaded at the same time
Receives two reticles simultaneously from the reticle relay unit 189
And two on the reticle stage RST.
Reticle can be loaded at the same time.
Double reticle holder type reticle that holds reticle
When it is necessary to change the reticle when using the hull stage
It is possible to shorten the interval. Note that the time required for reticle exchange is further reduced.
Library for two reticles
Two bots 88 may be prepared. Also, 2
Provide two reticle relay sections on which two reticles can be placed
It is good. In this case, the reticle exchange robot 4
32 unlocks reticle from reticle stage RST
While loading, two new lasers are inserted into one reticle relay section.
The reticle is exchanged by the reticle exchange robot 432
Unload the reticle and use it for the other reticle relay.
Immediately after placing two used reticles,
Replacement robot 432 is placed on one reticle relay section
Two new reticles on reticle stage RST
Can be loaded. Do this
This further reduces the time required for reticle replacement
be able to. In this case, the two reticle relays are
May be arranged in multiple stages. In the above embodiment, one arm is used.
A so-called single arm double with two hands
We will adopt a hand-type reticle exchange robot.
However, the arm with these two hands is
A so-called double-arm double hank with a main installation
Reticle exchange robot
good. In this case, the reticle stay
Before unloading the used reticle on the RST,
The other arm holds two new reticles
So two reticles can be moved by one arm
Immediately after unloading, load two reticles simultaneously
Reticle replacement time
can do. In each of the first to fifth embodiments,
Loading / unloading buffer 25A (or reticle relay unit 189)
Arm that has received the reticle from here (here the first
The "first arm 51A" of the embodiment is quoted)
When loading a reticle directly on the restage RST
However, the present invention is not limited to this.
For example, as shown in FIG.
Providing the elevator unit 35 above the replacement position
It is good. The elevator unit 35 has the structure shown in FIG.
As shown in (A), two hanks as support members
Hand parts 45A, 45B
In the opening / closing direction (opposite in the X-axis direction in FIG.
Direction) and drive vertically (Z-axis direction)
). This drive
The mechanism 95 moves the hand parts 45A and 45B closer to each other or
Hand opening / closing mechanism 47 driven in the opening / closing direction to be separated
The hand opening / closing mechanism 47 in the vertical direction (Z-axis direction);
Vertical movement and rotation driven in the direction of rotation (θz rotation) in the horizontal plane
And a rotation mechanism 76. [0158] Such an elevator unit 35 is
The above embodiment is provided by providing the
To load the reticle from the non-scanning direction
Due to this, the direction of the reticle R must be rotated 90 °.
Even if it does not happen, as shown in FIG.
The first arm 51A moves the reticle R to the elevator unit 3
5 and the driving mechanism 95
Opening of the hand parts 45A and 45B of the elevator unit 35
The reticle (here, reticle)
R) is passed to the hand units 45A and 45B,
After reticle R is rotated 90 ° by drive mechanism 95
Is loaded on the reticle stage RST.
Loading of reticle R by adopting a sequence
be able to. Also, the portion where the reticle R is placed is dug.
Lowered reticle stage (FIG. 13B described later)
Stage).
However, by using the elevator unit 35,
The loading and unloading of the tickle R becomes possible. This place
In this case, the elevator unit 35 includes the reticle base platen 6
0, so that the entire exposure apparatus is large.
Conversion is suppressed. As described above, the elevator unit 35 is installed.
Reticle exchange robot and elevator unit
The masks constitute a mask transport device. If only the elevator unit 35 is used,
However, as shown in FIG.
May be provided with a center-up unit 61
No. The center-up unit 61 is
The reticle base platen 60 corresponding to the reticle exchange position
Most of it is embedded inside, and the reticle is
Having a plurality of pin portions 63 that can be supported from
The center up 65 in the vertical direction.
A vertical drive mechanism 67 as a drive mechanism
ing. In this center-up unit 61,
The pin portion 6 constituting the center up 65 by the mechanism 67
3 is made to be able to come and go on the upper surface side of the reticle base platen 60
ing. In this case, reticle stage RST is
When it is positioned at the
The center up 65 is raised by the vertical movement mechanism 67 of the
The reticle base platen 60 and the reticle
Reticle stage through opening formed in page RST
Pin part 63 of center up 65 protrudes on the upper surface side of RST
I do. As a result, as shown in FIG.
The first arm waiting above the tickle stage RST
Reticle R held at 51A is centered up 65
Handed over to After that, the first arm 51A is
Evacuate from above stage RST and center up
65 is driven downward, and the reticle is placed on reticle stage RST.
The vehicle R is loaded. Also, reticle R is unloaded
In such a case, the operation is performed in the reverse manner to the above. As described above, the reticle base platen 60
By providing the center-up unit 61, FIG.
As shown in FIG. 3 (B), the portion where the reticle is placed is
When using a reticle stage that has been dug down
Do not change the configuration of the reticle exchange robot.
Load the reticle on the reticle stage RST
It is possible. In this case, the center up unit
61 is provided below the reticle exchange position.
Exposure using this center-up unit
The whole device is rarely increased in size. As described above, the center-up unit 6
1 is provided, the reticle exchange robot and the center
The mask transport device is constituted by the up unit 61.
You. Note that the elevator unit 35 and the sensor
It is good to use together with the turn-up unit 61
No. Note that, as reticle stage RST,
When using a reticle holder-type reticle stage
Elevator unit or center-up unit
Move the reticle stage with respect to
May be replaced, or on one reticle
(Or below) and above (or below) the other reticle
Elevator unit (or center)
-Up unit). Ma
Two elevator units for each reticle
Or two center-up units
good. In each of the above embodiments, the reticle stay
Double reticle holder type reticle stage
However, it is not limited to this, but single retic
Reticle stage of
Tsui with two reticle stages of tickle holder type
It is also possible to adopt a reticle stage or the like. In each of the above embodiments, the reticle
Holding three or more reticles simultaneously
Reticle stage that can perform
In the embodiment, depending on the number of reticles,
Reticle exchange robot that holds three or more wafers simultaneously
May be adopted. In each of the above embodiments, two wafers are used.
Double wafer stay for simultaneous and parallel processing using a stage
The di-type exposure apparatus has been described.
The scope is not limited to this
The present invention can be suitably applied to a exposure type exposure apparatus.
You. The application of the exposure apparatus includes the exposure for semiconductor manufacturing.
Without limitation to optical devices, for example, a square glass
Exposure for liquid crystal to transfer liquid crystal display element pattern to rate
Devices, thin-film magnetic heads, micromachines and DNA chips
Widely applicable to exposure equipment for manufacturing
You. Also, not only micro devices such as semiconductor elements
Light exposure apparatus, EUV exposure apparatus, X-ray exposure apparatus,
Reticles or masks used in electron beam exposure equipment, etc.
To manufacture glass substrates or silicon wafers
The present invention can be applied to an exposure apparatus for transferring a circuit pattern.
You. The light source of the exposure apparatus of the above embodiment is
F Two Laser light source, ArF excimer laser light source, KrF laser
G-line, not limited to UV pulse light sources such as Kisima laser light sources
(Wavelength: 436 nm), i-line (wavelength: 365 nm), etc.
It is also possible to use an ultra-high pressure mercury lamp
You. In addition, DFB semiconductor laser or fiber laser
Infrared or visible single wavelength laser light oscillated from
For example, erbium (or erbium and ytterbiu)
Both of which are amplified by a doped fiber amplifier,
Using the nonlinear optical crystal to convert the wavelength of the harmonic to ultraviolet light
May be used. Also, the magnification of the projection optical system is
Instead, it may be either a unity magnification or a magnification system. The semiconductor device has the function and performance of the device.
Steps to perform design, retic based on this design step
Making a wafer, making wafer from silicon material
Operation, the exposure apparatus of the embodiment described above
Step of transferring the pattern of the tickle onto the wafer
Assembly steps (dicing process, bonding
Process, including packaging process), inspection steps, etc.
Built. As described above, the exposure apparatus of the present invention
According to the method, the device is hardly enlarged and the mass
Regardless of the number of masks that can be mounted on the
Mask replacement on the stage can be performed smoothly
This has the effect.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a view schematically showing an exposure apparatus according to a first embodiment of the present invention. FIG. 2 is a plan view showing the vicinity of a reticle transport system and a reticle stage according to the first embodiment. FIG. 3 is an enlarged perspective view showing the loading buffer of FIGS. 1 and 2; FIG. 4 is a block diagram illustrating a configuration of a control system according to the first embodiment. FIG. 5 is a diagram (part 1) for describing a reticle transport operation by the reticle transport system of FIGS. 1 and 2; FIG. 6 is a diagram (part 2) for explaining the reticle transport operation by the reticle transport system of FIGS. 1 and 2; FIG. 7 is a plan view showing the vicinity of a reticle transport system and a reticle stage according to a second embodiment. FIG. 8 is a plan view showing the vicinity of a reticle transport system and a reticle stage according to a third embodiment. FIGS. 9A and 9B are diagrams for explaining the operation of the reticle exchange robot 233 of FIG. FIG. 10 is a plan view showing the vicinity of a reticle transport system and a reticle stage according to a fourth embodiment. 11 is a side view of the reticle exchange robot of FIG. FIG. 12 is a plan view showing the vicinity of a reticle transport system and a reticle stage according to a fifth embodiment. FIG. 13A is a diagram illustrating an elevator unit according to a modification, and FIG. 13B is a diagram illustrating a center-up unit according to a modification. FIG. 14 is a view for explaining a conventional reticle transport device. [Explanation of Signs] 10: Exposure apparatus, 25A, 25B: Mask loading / unloading buffer, 27A, 27B, 227A, 227B, 427A,
427B: Hand part (hand), 32, 132, 23
2,332,432 ... reticle exchange robot (robot, mask transfer device), 35 ... elevator unit, 4
5A, 45B ... hand part (support member), 51A ... first arm (arm), 51B ... second arm (arm), 60
a: moving surface, 61: center-up unit, 63: pin portion (support member), 67: vertical movement mechanism (drive mechanism), 9
5: drive mechanism, 101: support (holding member), 251,
351A, 351B, 451 ... arm, 189 ... reticle relay unit (mask loading / unloading buffer), 327A, 327
B: Hand, R1, R2: Reticle (mask), RST
... Reticle stage (mask stage), W1, W2 ...
Wafer (substrate).

Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (Reference) H01L 21/68 H01L 21/68 G K 21/30 514D F term (Reference) 5F031 CA05 CA07 DA01 DA17 FA04 FA07 FA09 FA11 FA12 FA14 FA15 GA03 GA08 GA15 GA25 GA35 GA40 GA43 GA47 GA48 GA49 GA50 HA13 HA16 HA33 HA42 HA53 HA55 HA59 JA06 JA14 JA17 JA22 JA32 JA38 KA02 KA06 KA07 KA08 KA11 KA12 LA07 LA08 MA27 5F046 AA23 BA04 BA05 CC01 CC02 CC04 CD09 CD06 CD02 CD04

Claims (1)

1. An exposure apparatus for transferring a pattern formed on a mask onto a substrate, comprising: a mask stage on which the mask is mounted and movable at least in a first axial direction; The mask is placed on one side in a direction perpendicular to the first axis in a plane parallel to the movement plane of the mask stage including the first axis, and the unloading of the mask on the mask stage and the transfer of the mask onto the mask stage are performed. A mask transport device that carries in the wafer in a direction that intersects the first axial direction in a plane parallel to the moving surface. 2. The apparatus according to claim 1, further comprising a pair of mask loading / unloading buffers on which a mask transported between the mask stage and the mask stage is placed by the mask transporting device, and at least rotatable. Exposure apparatus according to the above. 3. The exposure apparatus according to claim 2, wherein each of the mask loading / unloading buffers also functions as an alignment mechanism for a mounted mask. 4. The mask stage according to claim 1, wherein a plurality of masks can be placed on the mask stage at the same time.
The exposure apparatus according to any one of the above. 5. The mask transporting device has a hand holding the mask at a tip end, and is capable of driving the hand in a plane parallel to the moving surface and in a second axis direction orthogonal to the moving surface. The exposure apparatus according to any one of claims 1 to 4, further comprising a robot having at least one arm. 6. The mask transporting apparatus has a hand holding the mask at a distal end in a substantially symmetrical arrangement, and the pair of hands are in a plane parallel to the moving surface and orthogonal to the moving surface. The exposure apparatus according to claim 1, further comprising a robot having an arm that can be driven in a second axis direction. 7. The mask transfer device, having a hand for holding the mask at a distal end portion, and capable of driving the hand in a plane parallel to the moving surface and in a second axial direction orthogonal to the moving surface. 5. A pair of robots comprising: an arm; and a holding member for holding the pair of robots in a substantially symmetric arrangement with respect to a plane parallel to the moving surface. Exposure apparatus according to Item. 8. The apparatus according to claim 1, further comprising a mask loading / unloading buffer capable of simultaneously mounting a plurality of masks transferred to and from the mask stage by the mask transfer device, wherein the mask stage simultaneously transfers the plurality of masks. The mask transfer device can be placed side by side in the first axis direction, the mask transport device has a plurality of hands holding the mask at a tip end in a parallel arrangement, and the hands are disposed in a plane parallel to the moving surface and the hand. The exposure apparatus according to claim 1, further comprising a robot having an arm that can be driven in a second axis direction orthogonal to a moving surface. 9. The exposure apparatus according to claim 8, wherein the mask loading / unloading buffer also functions as an alignment mechanism for the mask placed thereon. 10. The mask transfer device is disposed on one side in the second axial direction at a predetermined mask replacement position for replacing a mask on the mask stage, and transfers the mask to and from each hand. A plurality of supporting members to be driven, and the plurality of supporting members are driven at least between a carry-in position for carrying a mask into the mask stage at the replacement position and a standby position on the one side in the second axial direction of the replacement position. The exposure apparatus according to any one of claims 5 to 9, further comprising an elevator unit having a driving mechanism that performs the driving. 11. The mask transport device is disposed on one side in the second axis direction at a predetermined mask replacement position where a mask on the mask stage is replaced, and the second axis of the mask stage at the replacement position is provided. A plurality of support members for transferring the mask between the hands at the transfer position on the other side of the direction, and the second axial direction of the mask stage at the transfer position and the exchange position. The exposure apparatus according to any one of claims 5 to 9, further comprising a center-up unit having a driving mechanism for driving between a standby position on one side. 12. The exposure apparatus according to claim 1, wherein the mask transport device is provided so as to be vibrated separately from the mask stage.
JP2001257622A 2001-08-28 2001-08-28 Aligner Pending JP2003068620A (en)

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