CN103765554A - Mobile device, exposure device, method for producing flat panel display, and method for producing device - Google Patents
Mobile device, exposure device, method for producing flat panel display, and method for producing device Download PDFInfo
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- CN103765554A CN103765554A CN201280042125.XA CN201280042125A CN103765554A CN 103765554 A CN103765554 A CN 103765554A CN 201280042125 A CN201280042125 A CN 201280042125A CN 103765554 A CN103765554 A CN 103765554A
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- retaining member
- exposure
- moving body
- object retaining
- microscope carrier
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
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- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
A substrate stage device (20) is provided with: an X-beam (24) capable of moving in the Y-axis direction; a coarse stage (26) provided on the X-beam (24), capable of moving with the X-beam (24) in the Y-axis direction, and capable of moving in the X-axis direction relative to the X-beam (24); a fine stage (28) for supporting a substrate (P), and, when guided by the coarse stage (26), moving in the direction of the X-axis and/or the Y-axis; and a pair of step guides (30) that are respectively positioned on the +Y side and the -Y side of the X-beam (24), support the +Y-side and the -Y-side regions of the fine stage (28) from below, and are capable of moving with the fine stage (28) in the Y-axis direction.
Description
Technical field
The invention relates to manufacture method and the manufacturing method of mobile body device, exposure device, flat-panel monitor, speech more in detail, be about by the mobile body device that keeps the object retaining member of object to drive along horizontal plane, comprise aforementioned mobile body device and in aforementioned object form set pattern exposure device, use aforementioned exposure device flat-panel monitor manufacture method and use the manufacturing method of aforementioned exposure device.
Background technology
In the past, manufacturing in the photoetching process of the electronic components (micro element) such as liquid crystal display cells, semiconductor element (integrated circuit etc.), be make mask or graticule (being generically and collectively referred to as below " mask ") and glass plate or wafer (being generically and collectively referred to as below " substrate ") along set scanning direction (SCAN direction) synchronizing moving while use energy beam by the pattern transfer that is formed at mask the exposure device to the step-scan mode on substrate.
As this kind of exposure device, owing to being with the position at a high speed and in the horizontal plane of high accuracy control substrate (scanning direction, cross scanning direction and around the position of direction of axis that is orthogonal to horizontal plane), therefore known one has the baseplate carrier device person (reference example is as patent documentation 1) of 2 axle coarse motion microscope carriers of so-called support (gantry) type and the rough micro-moving mechanism formation that fine motion microscope carrier combines.
Along with the maximization of substrate in recent years, baseplate carrier device also maximizes thereupon, thereby a kind of simple formation and can carry out with high accuracy and at a high speed the baseplate carrier device of the Position Control in the horizontal plane of large substrate of being supposed to.
Prior art document
Patent documentation
Patent documentation 1: U.S.'s application for a patent for invention discloses No. 2010/0018950.
Summary of the invention
In order to solve the means of problem
The present invention, because the above-mentioned facts and be is seen it from the 1st viewpoint, is a kind of mobile body device, and it possesses: the 1st moving body, can move in the position of the 1st direction in the two dimensional surface parallel with horizontal plane; The 2nd moving body, is located at aforementioned the 1st moving body, can along the position of aforementioned the 1st direction, move together with aforementioned the 1st moving body, and can be relative to aforementioned the 1st moving body along moving with the position of orthogonal the 2nd direction of aforementioned the 1st direction in aforementioned two dimensional surface; Object retaining member, keeps object, by aforementioned the 2nd moving body induction, along aforementioned two dimensional surface, is moved; The 1st guide member, in aforementioned the 1st direction, be disposed at aforementioned the 1st moving body one side, when being bearing in aforementioned object retaining member from below and moving along aforementioned the 2nd direction, this object retaining member is in a territory, lateral areas of aforementioned the 1st direction, and can along aforementioned the 1st direction, move together with aforementioned object retaining member; And the 2nd guide member, in aforementioned the 1st direction, be disposed at aforementioned the 1st moving body opposite side, when being bearing in aforementioned object retaining member from below and moving along aforementioned the 2nd direction, this object retaining member is in the opposite side region of aforementioned the 1st direction, and can along aforementioned the 1st direction, move together with aforementioned object retaining member.
By this, object retaining member is to be induced along the two dimensional surface parallel with horizontal plane by the 1st and the 2nd moving body.From below supporting object retaining member, at a side of the 1st direction and the 1st and the 2nd guide member in opposite side region, owing to moving along the 1st direction together with object retaining member, therefore the formation of device is simple.
The present invention sees it from the 2nd viewpoint, is a kind of exposure device, and it possesses: the mobile body device of the present invention's the 1st viewpoint; And use energy beam in the aforementioned object that is held in aforementioned object retaining member, to form the patterning device of set pattern.
The present invention sees it from the 3rd viewpoint, is a kind of manufacture method of flat-panel monitor, and it comprises: use the exposure device of the present invention's the 2nd viewpoint to make the action of aforementioned object exposure; And the action that the aforementioned object after exposure is developed.
The present invention sees it from the 4th viewpoint, is a kind of manufacturing method, and it comprises: use the exposure device of the exposure device of the present invention's the 2nd viewpoint to make the action of aforementioned object exposure; And the action that the aforementioned object after exposure is developed.
Accompanying drawing explanation
Fig. 1 is the aobvious slightly figure of the formation of the liquid crystal exposure apparatus of an example of summary.
The vertical view of the baseplate carrier device that the liquid crystal exposure apparatus that Fig. 2 is Fig. 1 has.
Fig. 3 is the B-B line profile of Fig. 2.
Embodiment
Below, use Fig. 1～Fig. 3 that one example is described.
Fig. 1 is the formation that summary shows the liquid crystal exposure apparatus 10 of an example.Liquid crystal exposure apparatus 10 is projection aligner that is the so-called scanning machines as the step-scan mode of exposure object thing for rectangle (angle type) the glass substrate P (being called substrate P to place an order) of liquid crystal indicator (flat-panel monitor) etc.
Liquid crystal exposure apparatus 10 comprises that illumination is 12, keeps that mask microscope carrier 14, the projection optics of mask M are 16, baseplate carrier pallet 18, be held in surface (being the face towards+Z side) be coated with the baseplate carrier device 20 of substrate P of resist (induction agent) and these control system etc. in Fig. 1.In the following description, by at when exposure mask M projection optics relative to substrate P, be 16 respectively the direction of relative scanning be made as X-direction, will in horizontal plane, be made as Y direction, will be made as Z-direction with X-axis and the orthogonal direction of Y-axis with the orthogonal direction of X-axis, and the direction of rotation around X-axis, Y-axis and Z axis is made as respectively to θ x, θ y and θ z direction.
Illumination is 12, and with for example U.S.'s patent of invention the 5th, the illumination that 729, No. 331 specifications etc. disclose is identical formation.That is, illumination be 12 be by exposure use illumination light IL irradiate in mask M.Illumination light IL is used the light (or synthetic light of above-mentioned i line, g line, h line) of such as i line (wavelength 365nm), g line (wavelength 436nm), h line (wavelength 405nm) etc.
Projection optics is 16 to be disposed at the below of mask microscope carrier 14.Projection optics be 16 with for example U.S.'s patent of invention the 6th, the projection optics that 552, No. 775 specifications disclose is identical formation.That is, projection optics is 16 to be that for example to comprise multiple grades with the both sides heart far away be doubly the so-called poly-lens projection optics system that forms the optical system of upright erect image, and bringing into play with the projection optics with the rectangular single image field take Y direction as long side direction is equal function.
Therefore, with after from illumination being the field of illumination on 12 illumination light IL illumination mask M, by by the illumination light IL of mask M, make the mask M in this field of illumination circuit pattern projection image via projection optics be 16 be formed at substrate P on the irradiation area of illumination light IL of field of illumination conjugation.Then, by making the relative field of illumination of mask M (illumination light IL) be displaced into scanning direction, and make the relative exposure area of substrate P (illumination light IL) be displaced into scanning direction, an irradiation area transfer printing in substrate P is formed at the pattern of mask M by this.
A pair of underframe 22, be arranged at+X of one side side baseplate carrier pallet 18+X side, be arranged at-X of the opposing party side baseplate carrier pallet 18-X side, be arranged on the ground 11 of clean room with the baseplate carrier pallet 18 both set a distance (in vibration Fen Li state under) of being separated by respectively.A pair of underframe 22 supports from below near the length direction both ends of X post 24 described later, and performance X post 24 is the guide member function so that both fixed length stroke moves in Y direction.As shown in Figure 3, in the two sides of underframe 22, be fixed with respectively and be contained in the magnet unit 21a (Y stator) of Y direction with set spaced multiple permanet magnets.Again, the key element that is fixed with Y linear guide 23 in the upper surface of underframe 22 (+Z side end) is Y linear guide 23a.
In a pair of subtend face of Y bracket 25, be fixed with respectively the coil unit 21b (X can mover) that forms Y linear motor 21 together with above-mentioned magnet unit 21a again.X post 24 is driven in Y direction by above-mentioned Y linear motor 21 on a pair of underframe 22.In addition, drive the kind of the Y actuator of X post 24 to be not limited to this, for example, can use feed screw device, belt drive, rope (wire) drive unit etc.
X post 24 Z position below as shown in Figure 1, is set as compared with more lean on+Z side of Y linear guide 27a upper end, and X post 24 is Fen Li in vibration with baseplate carrier pallet 18 (that is device body).In addition, also the complementary underframe of the length direction central portion from below supporting X post 24 can be disposed to 18 of a pair of baseplate carrier pallets.
Again, above X post 24, the key element of x-ray guiding device 29 is that x-ray guiding element 29a is fixed with for example two in X-direction with set interval as shown in Figure 2.In the two sides of X post 24, be fixed with and be contained in the magnet unit 31a (X stator) of X-direction with set spaced multiple permanet magnets again.
Coarse motion microscope carrier 26 consists of cuboid member, forms the X sliding component 29b of x-ray guiding device 29 together with being fixed with multiple and above-mentioned x-ray guiding element 29a below it.X sliding component 29b as shown in Figure 3, is interval with for example two in X-direction with set in an x-ray guiding element 29a.X sliding component 29b is sticked in corresponding x-ray guiding element 29a freely with low friction slip, and coarse motion microscope carrier 26 can move with set stroke in X-direction with low friction on X post 24.
In the two sides of coarse motion microscope carrier 26, by mounting panel 32, be fixed with and form together with magnet unit 31a in order to coarse motion microscope carrier 26 is driven to coil unit 31b in the x-ray motor 31 of X-direction (X can mover) with set stroke again.
Coarse motion microscope carrier 26 is limited the relatively moving of past Y direction of relative X post 24 by Y linear guide 29, move toward Y direction with X post 24 one.That is coarse motion microscope carrier 26 forms the twin shaft bearing table device of support (gantry) formula together with X post 24.The Y positional information of X post 24 and the X positional information of coarse motion microscope carrier 26 are obtained by for example not shown linear encoder system (or optical interferometer system) respectively.
A pair of stepping guiding element 30 is all equipped on a pair of baseplate carrier pallet 18 as shown in Figure 2.The member that a pair of stepping guiding element 30 is rectangle (with reference to Fig. 1) by the YZ section that extends X-direction respectively forms, and in Y direction, with set interval, is configured to each other parallel.Above-mentioned X post 24 inserts 30 of a pair of stepping guiding elements by both fixed gaps.Length direction (X-direction) size of stepping guiding element 30 is set as short a little compared with X post 24, and Width (Y direction) size is set as wide a little compared with X post 24.The flatness above of stepping guiding element 30 makes very high.
Below stepping guiding element 30, be fixed with as shown in Figure 1 the Y sliding component 27b that forms Y linear guide 27 together with multiple and above-mentioned Y linear guide 27a.Y sliding component 27b, is interval with for example two in Y direction with set in a Y linear guide 27a.Y sliding component 27b is sticked in corresponding Y linear guide 27a freely with low friction slip, and stepping guiding element 30 can move with set stroke in Y direction with low friction on a pair of baseplate carrier pallet 18.
A pair of stepping guiding element 30 is linked to X post 24 by hookup mechanism 34 mechanical types in all as shown in Figure 2 near the both ends of length direction.Hookup mechanism 34 comprises the rod member that extends Y direction and the sliding regulating device that is installed on these rod member both ends (for example ball bond part), by above-mentioned sliding regulating device, is set up between X post 24 and stepping guiding element 30.The rigidity of the Y direction of rod member is set as higher.
At baseplate carrier device 20, when X post 24 (not shown in Fig. 2 by multiple Y linear motors 21.With reference to Fig. 3) for example, by after the driving of the side in Y direction (+Y) direction, for example, stepping guiding element 30 in the opposing party's side (-Y side) of Y direction is drawn by X post 24 by hookup mechanism 34, and for example, by hookup mechanism 34, presses on X post 24 at the stepping guiding element 30 of side's side (+Y side) of Y direction.By this, a pair of stepping guiding element 30 is displaced into Y direction with X post 24 one.
Return to Fig. 1, fine motion microscope carrier 28 consists of the box component of overlooking rectangle, and face is fixed with substrate holding 36 thereon.In fine motion microscope carrier 28-Y side side, by speculum base 38, be fixed with the Y rod speculum 40y of the reflecting surface with the Y-axis of being orthogonal to, in fine motion microscope carrier 28-X side side, by speculum base 38, be fixed with as shown in Figure 3 the X rod speculum 40x of the reflecting surface with the X-axis of being orthogonal to.In addition, too complicated for fear of diagram in Fig. 2, the diagram of substrate holding 36, speculum base 38, Y rod speculum 40y and X rod speculum 40x (with reference to Fig. 1 and Fig. 3) is omitted respectively.
Near four bights below fine motion microscope carrier 28, be separately installed with as shown in Figure 2 reinforcement block 42.Below reinforcement block 42, air bearing 44 is installed as shown in Figure 1 again.Return to Fig. 2, the gas of for example two air bearing 44 of+Y side ejection face (bearing surface) subtend is above the stepping guiding element 30 of+Y side, and the gas ejection of for example two air bearing 44 of-Y side is in the face of to above the stepping guiding element 30 of-Y side.For example four air bearing 44 all spray gas-pressurized (for example air) above to corresponding stepping guiding element 30.Fine motion microscope carrier 28, by being provided to the gas-static between air bearing 44 and stepping guiding element 30, is suspended on a pair of stepping guiding element 30 across minim gap.In addition, the configuration of air bearing 44 and number, as long as can make fine motion microscope carrier 28 suspend on a pair of stepping guiding element 30 with stable state, be not particularly limited.
Fine motion microscope carrier 28 is induced by coarse motion microscope carrier 26 by the fine motion microscope carrier drivetrain that comprises multiple voice coil motors and is driven toward X-direction and/or Y direction.In multiple voice coil motors, comprise as shown in Figure 2 for example two X voice coil motor 46x and for example two Y voice coil motor 46y of the heap power that produces X-direction.For example two X voice coil motor 46x, a side be disposed at fine motion microscope carrier 28+Y side, the opposing party be disposed at fine motion microscope carrier 28-Y side, for example two Y voice coil motor 46y, a side be disposed at fine motion microscope carrier 28+X side, the opposing party be disposed at fine motion microscope carrier 28-X side.
The formation of above-mentioned multiple voice coil motors, except configuring difference, other parts are all identical, therefore following explanation be disposed at fine motion microscope carrier 28+the X voice coil motor 46x of Y side.As shown in Figure 1, X voice coil motor 46x comprise be fixed on coarse motion microscope carrier 26+the X stator 46a of Y side side be fixed on fine motion microscope carrier 28 X below can mover 46b.X stator 46a has not shown coil unit.X can be formed as YZ section U font by mover 46b, in its a pair of subtend face, is fixed with permanet magnet.The coil unit that X stator 46a has is by both between the above-mentioned a pair of permanet magnet of fixed gap insertion.In addition, though the X voice coil motor 46x of this example is dynamic magnetic, also moving coil type.
At baseplate carrier device 20, for example, when coarse motion microscope carrier 26 is displaced into X-direction along X post 24 with long stroke, the thrust (Lorentz force) of the X-direction that control example produces as two X voice coil motor 46x so that fine motion microscope carrier 28 to move with coarse motion microscope carrier 26 equidirectionals and identical speed.Again, when X post 24 is displaced into Y direction with long stroke, the thrust of the Y direction that control example produces as two Y voice coil motor 46y so that fine motion microscope carrier 28 to move with X post 24 (that is coarse motion microscope carrier 26) equidirectional and identical speed.By this, coarse motion microscope carrier 26 moves with long stroke along XY plane with fine motion microscope carrier 28 one.
Again, fine motion microscope carrier 28, by making for example thrust direction of two X voice coil motor 46x (or for example two Y voice coil motor 46y) become opposite directions, and coarse motion microscope carrier 26 is driven a little toward θ z direction relatively.Fine motion microscope carrier 28 is being induced by coarse motion microscope carrier 26 and when X-direction is driven with long stroke, is suitably being driven a little in Y direction and/or θ z direction.
The liquid crystal exposure apparatus 10 (with reference to Fig. 1) forming in the above described manner, under the management of not shown main control unit, by not shown mask loader, mask M is loaded into mask microscope carrier 14, and by not shown substrate loader, substrate P is loaded on substrate holding 36., by main control unit use not shown aligning detect system carry out locating tab assembly, after locating tab assembly is finished, to being set in multiple irradiation areas in substrate P, successively carry out the exposure actions of step-scan mode thereafter.In addition,, because this exposure actions is identical with the exposure actions of the step-scan mode of carrying out in the past, therefore description is omitted.
For example, when the scan exposure when the exposure actions of above-mentioned step-scan mode moves etc., at baseplate carrier device 20, by substrate holding 36, keep the fine motion microscope carrier 28 of substrate P to be driven with long stroke in X-direction.Stepping guiding element 30 length directions (X-direction) size is set as long a little in the movable distance of X-direction compared with fine motion microscope carrier 28, and fine motion microscope carrier 28, when being displaced into X-direction with coarse motion microscope carrier 26 one, is to move on a pair of stepping guiding element 30.At fine motion microscope carrier 28, when Y direction is carried out stepwise operation, be to be displaced into Y direction with coarse motion microscope carrier 26, X post 24 and a pair of stepping guiding element 30 one again.Therefore, fine motion microscope carrier 28 can not come off from a pair of stepping guiding element 30.
According to the baseplate carrier device 20 of described above example, because fine motion microscope carrier 28 is equipped on a pair of stepping guiding element 30 with contactless state, therefore can be to drive (induction) in X-axis and/or Y direction fine motion microscope carrier 28 compared with low thrust.Because the Position Control of fine motion microscope carrier 28 promotes, therefore can carry out high-precision exposure again.Again, due to suppressed from the reception and registration of outside vibration and reaction force to fine motion microscope carrier 28, therefore can be with the position of high accuracy control fine motion microscope carrier 28.
Again, because a pair of stepping guiding element 30 is encompassed in the mobile range of the fine motion microscope carrier 28 of X-direction, and in Y direction and fine motion microscope carrier 28 one, move, therefore at baseplate carrier device 20, not needing to have is enough to the guide member of the broad area of containing the full moving range of fine motion microscope carrier 28 in XY plane (for example price fixing).Therefore, with low cost and conveyance, assembling are easily.
Again, due to the key element of the Y linear motor 21 in order to drive X post 24, to be magnet unit 21a (Y stator) separation in vibration with baseplate carrier pallet 18, and it is 16 etc. that driving reaction force in the time of therefore can suppressing to drive X post 24, vibration etc. are conveyed to the projection optics being supported by device body.
In addition, the formation of described above example can suitably change.For example, also can be in configuring Z tilt actuators between fine motion microscope carrier 28 and substrate holding 36 or between reinforcement block 42 and fine motion microscope carrier 28 can control Z-direction, the θ x direction of substrate P, the position of θ y direction.Again, X post 24 also can dispose multiple in 30 of a pair of stepping guiding elements.
Again, in above-mentioned example, though stepping guiding element 30 is drawn by X post 24 and is displaced into Y direction, be not limited to this, for example, also can use the actuators such as linear motor that a pair of stepping guiding element 30 is driven independently with X post 24.Under this situation, as the stator of the linear motor in order to drive a pair of stepping guiding element 30, also can use the Y stator 21a (with reference to Fig. 3) that is fixed on underframe 22.
Again, in above-mentioned example, though driven in Y direction by multiple Y linear motors 21 by X post 24, a pair of stepping guiding element 30 and X post 24 one are displaced into the formation of Y direction, but be not limited to this, a pair of stepping guiding element 30 for example, is driven in Y direction by actuator (linear motor), follows the formation (even if the actuator that drives X post 24 is not set) that is displaced into Y direction in this X post 24 also can.
Again, in above-mentioned example, though fine motion microscope carrier 28 is supported on a pair of stepping guiding element 30 from below noncontact by multiple air bearing 44, also can for example, fine motion microscope carrier 28 be equipped on stepping guiding element 30 with contact condition by rolling element (spheroid).
Also a pair of stepping guiding element 30 physical properties (mechanically) can be linked to (but non-contravention is in X post 24) again.Under this situation, after a side stepping guiding element 30 is drawn by X post 24, due to the opposing party's stepping guiding element 30 also one move, therefore for example as long as X post 24 only draws (or pressing) side's stepping guiding element 30.
Again, illumination light can be ultraviolet light or the F of ArF excimer laser (wavelength 193nm), KrF excimer laser (wavelength 248nm) etc.
2laser (wavelength 157nm) equal vacuum ultraviolet light.Again, as illumination light, also for example can use the single wavelength laser of the infrared tape sending from dfb semiconductor laser or optical-fiber laser or visible light belt with for example doped with in addition amplification of the fiber amplifier of erbium (or erbium and ytterbium both), use nonlinear optics crystallization in addition wavelength be converted to the harmonic wave of ultraviolet light.Also can use Solid State Laser (wavelength: 355nm, 266nm) etc. again.
Again, above-mentioned example, though the situation that is 16 for the projection optics of poly-lens mode that possesses multiple projecting optical units is described, the number of projecting optical unit is not limited to this, as long as one above.In addition, being not limited to the projection optics system of poly-lens mode, can also be the projection optics system etc. that for example uses the large-scale speculum of Ou Funa (Ofner) type.Again, in above-mentioned example, though be 16 to understand and use projection multiplying powers for waiting situation of times person as projection optics, be not limited to this, projection optics system dwindles be and amplify any of system.
Again, though use, in the mask substrate of transmitance, be formed with set light-shielding pattern (or phase pattern, dim light pattern) light transmissive mask, but also can replace this mask, use for example United States Patent (USP) the 6th, 778, No. 257 specifications disclose according to the electronic data of pattern to be exposed, form transmission pattern or reflection graphic patterns, or the electronics mask of luminous pattern (variable shaping mask), for example use non-light emitting-type image display element a kind of DMD of (also claiming spatial light modulation device) (Digital Micro-mirror Device)) variable shaping mask.
Again, as exposure device, flat-panel monitor (FPD) large substrates such as substrate take size (comprising external diameter, catercorner length, at least one on one side) as 500mm more than, such as liquid crystal display cells expose as the exposure device of exposure object thing especially effective.
As exposure device, also can be applicable to the exposure device of stepping repetition (step & repeat) mode, the exposure device that stepping engages (step & stitch) mode again.Again, the object that is held in mobile body device is not limited to substrate of exposure object object etc., can also be the pattern holders (master) such as mask.
Again, the purposes of exposure device is not limited to the liquid crystal exposure device to square glass plate by liquid crystal display cells pattern transfer, also can be widely used in the exposure device of such as semiconductor manufacture use, in order to manufacture the exposure device of film magnetic head, micro-machine and DNA wafer etc.In addition, be not only the microcomponent of semiconductor element etc., the present invention also can be applicable to as manufacturing mask or the graticule for light exposure device, EUV exposure device, x-ray exposure device and electric wire exposure device etc., and circuit pattern is transferred to the exposure device of glass substrate or silicon wafer etc.Moreover the object of exposure object is not limited to glass plate, can also be other objects such as such as wafer, ceramic substrate, film member or mask substrate (mask blank).Again, when exposure object thing is the situation of flat-panel monitor substrate, the thickness of this substrate is not particularly limited, for example, also comprise film-form (the flexual flat member of tool) person.
The electronic components such as liquid crystal display cells (or semiconductor element), via manufacturings such as following steps, that is: carry out the function of element, the step of performance design, according to this design procedure, make the step of mask (or graticule), manufacture the step of glass substrate (or wafer), the exposure device of the above-mentioned each example of foundation and exposure method thereof be the lithography step to glass substrate by the pattern transfer of mask (graticule), the development step that glass substrate after exposure is developed, by etching, remove the etching step that exposes member of the part beyond the part that resist is remaining, remove the resist that finishes unwanted resist because of etching and remove step, element number of assembling steps, check step etc.Under this situation, in lithography step, because the exposure device that uses above-mentioned example is carried out aforementioned exposure method, forming element pattern on glass substrate, therefore can be with the element of good productivity manufacture high integration.
Utilizability in industry
As described above, mobile body device of the present invention is suitable for the object retaining member that keeps object to drive along the two dimensional surface parallel with horizontal plane.Again, exposure device of the present invention makes object exposure.Again, the manufacture method of flat-panel monitor of the present invention is suitable for the manufacture of flat-panel monitor.Again, manufacturing method of the present invention is suitable for the manufacture of microcomponent.
Claims (12)
1. a mobile body device, is characterized in that, possesses:
The 1st moving body, can move in the position of the 1st direction in the two dimensional surface parallel with horizontal plane;
The 2nd moving body, is located at described the 1st moving body, can along the position of described the 1st direction, move together with described the 1st moving body, and can be relative to described the 1st moving body along moving with the position of orthogonal the 2nd direction of described the 1st direction in described two dimensional surface;
Object retaining member, keeps object, by described the 2nd moving body induction, along described two dimensional surface, is moved;
The 1st guide member, in described the 1st direction, be disposed at described the 1st moving body one side, described in when being bearing in described object retaining member and moving along described the 2nd direction from below, object retaining member is in a territory, lateral areas of described the 1st direction, and can along described the 1st direction, move together with described object retaining member; And
The 2nd guide member, in described the 1st direction, be disposed at described the 1st moving body opposite side, described in when being bearing in described object retaining member and moving along described the 2nd direction from below, object retaining member is in the opposite side region of described the 1st direction, and can along described the 1st direction, move together with described object retaining member.
2. mobile body device according to claim 1, is characterized in that, described object retaining member is supported on the described the 1st and the 2nd guide member with cordless.
3. mobile body device according to claim 2, it is characterized in that, described object retaining member is suspended on the described the 1st and the 2nd guide member with cordless by the static pressure that is supplied to the gas between described object retaining member and described the 1st guide member and between described object retaining member and the 2nd guide member.
4. according to the mobile body device described in any one in claims 1 to 3, it is characterized in that further possessing relatively described described object retaining member the 2nd moving body toward the described the 1st and the 2nd direction and around the actuator driving a little with the orthogonal axle of described horizontal plane.
5. mobile body device according to claim 4, is characterized in that, the thrust that described object retaining member produces by described actuator is induced by described the 2nd moving body along described horizontal plane.
6. according to the mobile body device described in any one in claim 1 to 5, it is characterized in that further possessing the coupling member of described the 1st moving body and the link of the described the 1st and the 2nd guide member physical property.
7. an exposure device, is characterized in that, possesses:
Mobile body device in claim 1 to 6 described in any one; And
Use energy beam in the described object that is held in described object retaining member, to form the patterning device of set pattern.
8. exposure device according to claim 7, is characterized in that, when described object is formed to described pattern, described mobile body device makes described object move along described the 2nd direction relative to described energy beam.
9. according to the exposure device described in claim 7 or 8, it is characterized in that, described object is for the substrate of flat display devices.
10. exposure device according to claim 9, is characterized in that, length at least on one side of described substrate or be more than 500mm to angular length.
The manufacture method of 11. 1 kinds of flat-panel monitors, is characterized in that, comprises:
Right to use requires the exposure device described in 9 or 10 to make the action of object exposure; And
The action that described object after exposure is developed.
12. 1 kinds of manufacturing methods, is characterized in that, comprise:
Right to use requires the exposure device described in 7 or 8 to make the action of object exposure; And
The action that described object after exposure is developed.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-187777 | 2011-08-30 | ||
| JP2011187777A JP5807841B2 (en) | 2011-08-30 | 2011-08-30 | Mobile device, exposure apparatus, flat panel display manufacturing method, and device manufacturing method |
| PCT/JP2012/005462 WO2013031221A1 (en) | 2011-08-30 | 2012-08-30 | Mobile device, exposure device, method for producing flat panel display, and method for producing device |
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| Publication Number | Publication Date |
|---|---|
| CN103765554A true CN103765554A (en) | 2014-04-30 |
| CN103765554B CN103765554B (en) | 2016-11-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201280042125.XA Active CN103765554B (en) | 2011-08-30 | 2012-08-30 | Mobile body device, exposure device, the manufacture method of flat faced display and manufacturing method |
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| Country | Link |
|---|---|
| JP (1) | JP5807841B2 (en) |
| KR (2) | KR102202760B1 (en) |
| CN (1) | CN103765554B (en) |
| TW (3) | TWI710862B (en) |
| WO (1) | WO2013031221A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110383178A (en) * | 2017-03-31 | 2019-10-25 | 株式会社尼康 | Object holding apparatus, processing unit, the manufacturing method of flat-panel monitor, manufacturing method and object keeping method |
| CN110709793A (en) * | 2017-03-31 | 2020-01-17 | 株式会社尼康 | Movable body device, exposure device, flat panel display manufacturing method, device manufacturing method, and movable body driving method |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6331300B2 (en) * | 2013-09-13 | 2018-05-30 | 日本精工株式会社 | Table device and transfer device |
| TWI791036B (en) | 2017-10-05 | 2023-02-01 | 日商索尼股份有限公司 | Light source device and projection display device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010050341A1 (en) * | 1999-12-01 | 2001-12-13 | Kwan Yim Bun P. | Positioning system for use in lithographic apparatus |
| JP2008090718A (en) * | 2006-10-04 | 2008-04-17 | Nsk Ltd | Positioning device |
| CN101611470A (en) * | 2007-03-05 | 2009-12-23 | 株式会社尼康 | The manufacture method and the mobile body drive method of mobile body device, pattern formation device and pattern formation method, device manufacturing method, mobile body device |
| US20110043784A1 (en) * | 2009-08-20 | 2011-02-24 | Nikon Corporation | Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4826149B2 (en) * | 2005-06-15 | 2011-11-30 | 株式会社安川電機 | Long-stroke movable alignment stage |
| JP2008221444A (en) * | 2007-03-15 | 2008-09-25 | Danaher Motion Japan Kk | Gantry type xy stage |
| US20110085150A1 (en) * | 2009-09-30 | 2011-04-14 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| US20110123913A1 (en) * | 2009-11-19 | 2011-05-26 | Nikon Corporation | Exposure apparatus, exposing method, and device fabricating method |
| US20110164238A1 (en) * | 2009-12-02 | 2011-07-07 | Nikon Corporation | Exposure apparatus and device fabricating method |
-
2011
- 2011-08-30 JP JP2011187777A patent/JP5807841B2/en active Active
-
2012
- 2012-08-30 KR KR1020197036024A patent/KR102202760B1/en active IP Right Grant
- 2012-08-30 KR KR1020147007385A patent/KR20140068999A/en active Application Filing
- 2012-08-30 TW TW107126727A patent/TWI710862B/en active
- 2012-08-30 WO PCT/JP2012/005462 patent/WO2013031221A1/en active Application Filing
- 2012-08-30 CN CN201280042125.XA patent/CN103765554B/en active Active
- 2012-08-30 TW TW101131501A patent/TWI581069B/en active
- 2012-08-30 TW TW106107473A patent/TWI635371B/en active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010050341A1 (en) * | 1999-12-01 | 2001-12-13 | Kwan Yim Bun P. | Positioning system for use in lithographic apparatus |
| JP2008090718A (en) * | 2006-10-04 | 2008-04-17 | Nsk Ltd | Positioning device |
| CN101611470A (en) * | 2007-03-05 | 2009-12-23 | 株式会社尼康 | The manufacture method and the mobile body drive method of mobile body device, pattern formation device and pattern formation method, device manufacturing method, mobile body device |
| US20110043784A1 (en) * | 2009-08-20 | 2011-02-24 | Nikon Corporation | Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110383178A (en) * | 2017-03-31 | 2019-10-25 | 株式会社尼康 | Object holding apparatus, processing unit, the manufacturing method of flat-panel monitor, manufacturing method and object keeping method |
| CN110709793A (en) * | 2017-03-31 | 2020-01-17 | 株式会社尼康 | Movable body device, exposure device, flat panel display manufacturing method, device manufacturing method, and movable body driving method |
| CN110383178B (en) * | 2017-03-31 | 2021-10-26 | 株式会社尼康 | Object holding device, processing device, flat panel display manufacturing method, element manufacturing method, and object holding method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013051289A (en) | 2013-03-14 |
| TWI635371B (en) | 2018-09-11 |
| TW201723680A (en) | 2017-07-01 |
| KR102202760B1 (en) | 2021-01-13 |
| KR20140068999A (en) | 2014-06-09 |
| TW201842417A (en) | 2018-12-01 |
| KR20190137970A (en) | 2019-12-11 |
| CN103765554B (en) | 2016-11-23 |
| TWI581069B (en) | 2017-05-01 |
| WO2013031221A1 (en) | 2013-03-07 |
| TW201314381A (en) | 2013-04-01 |
| JP5807841B2 (en) | 2015-11-10 |
| TWI710862B (en) | 2020-11-21 |
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