CN104221128A - Moving body device, exposure device, flat panel display manufacturing method, and device manufacturing method - Google Patents

Moving body device, exposure device, flat panel display manufacturing method, and device manufacturing method Download PDF

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Publication number
CN104221128A
CN104221128A CN201380018913.XA CN201380018913A CN104221128A CN 104221128 A CN104221128 A CN 104221128A CN 201380018913 A CN201380018913 A CN 201380018913A CN 104221128 A CN104221128 A CN 104221128A
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Prior art keywords
guiding element
mobile
moving body
mobile body
dimensional surface
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Granted
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CN201380018913.XA
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Chinese (zh)
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CN104221128B (en
Inventor
青木保夫
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Nikon Corp
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Nikon Corp
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Priority to CN201710811403.8A priority Critical patent/CN107577116B/en
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A substrate stage device (20A) is provided with: a first step guide (50) which extends in a scan direction (the X axis direction) and which can move in a cross scan direction (the Y axis direction); a fine movement stage (30) which is supported from below by the first step guide (50), can move along the top surface of the first step guide (50) in the scan direction, and can move together with the first step guide (50) in the cross scan direction; and a position measurement system which defines the top surface of a second step guide (54) as the reference surface and uses a Z sensor (38z) provided on the fine movement stage (30) to calculate Z tilt position information of the fine movement stage (30).

Description

The manufacture method of mobile body device, exposure device, flat-panel screens and manufacturing method
Technical field
The invention relates to mobile body device, exposure device, the manufacture method of flat-panel screens and manufacturing method, in detail, be about the mobile body device making moving body along set two dimensional surface movement, possess aforementioned mobile body device exposure device and use the manufacture method of the flat-panel screens of aforementioned exposure device and use the manufacturing method of aforementioned exposure device.
Background technology
All the time, in the photoetching process manufacturing the electronic component such as liquid crystal display cells, semiconductor element, be use the exposure device be transferred to energy beam by the pattern being formed at mask (or graticule) on glass substrate (or wafer).
As this kind of exposure device, a kind of fine motion microscope carrier with maintenance substrate is supported from below by weight canceller and guides this weight canceller toward the guiding element of the movement in scanning intersection (cross scan) direction, the baseplate carrier device person that can be displaced into scanning direction together with weight canceller is widely known by the people (for example, referring to patent documentation 1).
Along with the maximization of substrate in recent years, baseplate carrier device also has maximization and tendency that weight increases.
Look-ahead technique document
Patent documentation
Patent documentation 1: U.S. Patent Application Publication No. 2010/0266961 specification
Summary of the invention
In order to solve the means of problem
The present invention is, a kind of mobile body device of the 1st viewpoint possess in view of the above-mentioned facts: guiding element, extends the 1st direction in set two dimensional surface, can be displaced into the position along 2nd direction orthogonal with the 1st direction in this two dimensional surface; Moving body, is supported from below by this guiding element, can be displaced into the position along the 1st direction and the position that can be displaced into together with this guiding element along the 2nd direction along the 1st face specified with this guiding element; And position measurement system, by using the 2nd of another the component defined different with this guiding element the as datum level, obtain the positional information of this moving body in the direction intersected with this two dimensional surface.
According to this invention, because the 2nd face is datum level, therefore the 1st of guiding element without the need to precision prescribed.Therefore, the formation of guiding element can be made simple, and mobile body device miniaturization, lightweight can be made.
The mobile body device of the present invention the 2nd viewpoint, possesses: guiding element, extends the 1st direction in set two dimensional surface, can be displaced into the position along 2nd direction orthogonal with the 1st direction in this two dimensional surface; Moving body, is supported from below by this guiding element, can be displaced into the position along the 1st direction and the position that can be displaced into together with this guiding element along the 2nd direction along the guiding face specified with this guiding element; And drive unit, being located at this guiding element, this moving body being driven the direction in intersecting with this two dimensional surface.
According to this invention, because guiding element moving body is driven the direction in intersecting with two dimensional surface, therefore with drive unit be separately set driven by moving body the situation in the direction intersected with two dimensional surface to compare, formation can be made simple, and can make that mobile body device is miniaturized, lightweight.
The mobile body device of the present invention the 3rd viewpoint, possesses: the 1st mobile member, extends the 1st direction in set two dimensional surface, can be displaced into the position along 2nd direction orthogonal with the 1st direction in this two dimensional surface; 2nd mobile member, is located at the 1st mobile member, can be displaced into the position along the 1st direction along the 1st mobile member and can be displaced into the 2nd direction together with the 1st mobile member; And moving body, supported from below by the 1st mobile member, moved along this two dimensional surface by the 2nd mobile member induction.
According to this invention, due to the 2nd mobile member along two dimensional surface induction moving body, can be displaced into the 1st direction along the 1st mobile member supporting moving body from below and can move along the 2nd direction together with the 1st mobile member, therefore device forms simple.
The exposure device of the present invention the 4th viewpoint, possesses: keep arbitrary mobile body device in the present invention of set object the 1st ~ 3rd viewpoint in aforementioned moving body and use energy beam to form the patterning device of predetermined pattern in the aforesaid object that aforementioned moving body keeps.
The manufacture method of the flat-panel screens of the present invention the 5th viewpoint, comprises: use the action that the exposure device of the present invention the 4th viewpoint makes aforesaid object expose, and the action that the aforesaid object after exposure is developed.
The manufacturing method of the present invention the 6th viewpoint, comprises: use the action that the exposure device of the present invention the 4th viewpoint makes aforesaid object expose, and the action that the aforesaid object after exposure is developed.
Accompanying drawing explanation
Fig. 1 is the figure of the formation of the liquid crystal exposure apparatus of outline display the 1st example.
The end view of the baseplate carrier device that the liquid crystal exposure apparatus that Fig. 2 is Fig. 1 has.
The vertical view of the baseplate carrier device that the liquid crystal exposure apparatus that Fig. 3 is Fig. 1 has.
The baseplate carrier device that in Fig. 4, part A is the B-B line profile of the baseplate carrier device of Fig. 3, part B is part A from Fig. 4 in Fig. 4 takes away the figure of partial element.
Fig. 5 is the vertical view of the baseplate carrier device of the variation (1) of the 1st example.
The baseplate carrier device that in Fig. 6, part A is the C-C line profile of Fig. 5, part B is part A from Fig. 6 in Fig. 6 takes away the figure of partial element.
Fig. 7 is the figure of the baseplate carrier device of the variation (2) of display the 1st example.
Fig. 8 is the D-D line profile of the baseplate carrier device of Fig. 7.
Fig. 9 is the figure of the baseplate carrier device of the variation (3) of display the 1st example.
Figure 10 is in order to the figure of the action of the baseplate carrier device of key diagram 9.
Figure 11 is the figure of the baseplate carrier device of the variation (4) of display the 1st example.
Figure 12 is the figure of the baseplate carrier device of the variation (5) of display the 1st example.
Figure 13 is the figure of the baseplate carrier device of display the 2nd example.
Figure 14 is the E-E line profile of the baseplate carrier device of Figure 13.
Figure 15 is the vertical view of the baseplate carrier device of Figure 13.
Figure 16 is the F-F line profile of the baseplate carrier device of Figure 15.
Figure 17 is the figure of the configuration of the Z sensor shown in the baseplate carrier device of Figure 13.
Figure 18 is the figure of the baseplate carrier device of the variation (1) of display the 2nd example.
Figure 19 is the G-G line profile of Figure 18.
Figure 20 is the figure of the baseplate carrier device of the variation (2) of display the 2nd example.
Figure 21 is the figure of the baseplate carrier device of the variation (3) of display the 2nd example.
Figure 22 is the H-H line profile of Figure 21.
Figure 23 is the figure of the baseplate carrier device of the variation (4) of display the 2nd example.
Figure 24 is the I-I line profile of Figure 23.
Embodiment
" the 1st example "
Below, according to part B in Fig. 1 ~ Fig. 4, the 1st example is described.
The formation of the liquid crystal exposure apparatus 10 of the 1st example of outline in Fig. 1.Liquid crystal exposure apparatus 10 is such as step-scan (the step & scan) projection aligner of mode, so-called scanning machine that rectangle (square) glass substrate P (hereinafter referred to as substrate P) of liquid crystal indicator (flat-panel screens) etc. is exposure object thing.
Liquid crystal exposure apparatus 10, has illumination and is 12, keeps being formed with the mask microscope carrier 14 of the mask M of circuit pattern (mask pattern), projection optics system 16, device body 18, keeps surface (towards the face of+Z side in Fig. 1) to scribble baseplate carrier 20A and these the control system etc. of the substrate P of photoresist (induction agent).Below, mask M during exposure and substrate P are set to by the direction scanned respectively relative to projection optics system 16 direction orthogonal with X-axis in X-direction, horizontal plane is Y direction, the direction orthogonal with X-axis and Y-axis is Z-direction, and are respectively θ x, θ y with the direction rotated around X-axis, Y-axis and Z axis and θ z direction is described.
Illumination is 12, and having the illumination disclosed with such as United States Patent (USP) the 5th, 729, No. 331 specifications etc. is identical formation.Illumination be 12 by exposure illumination light IL irradiate in mask M.As illumination light IL, be use such as i line (wavelength 365nm), g line (wavelength 436nm), h line (wavelength 405nm) etc. light (or above-mentioned i line, g line, h line synthesis light).
Mask bearing table device 14 has the mask microscope carrier 14a that the tabular component that is formed with peristome by central portion is formed.Maintenance is adsorbed to support hand 14b in the edge, periphery of the mask M inserted in above-mentioned peristome by mask microscope carrier 14a.Mask microscope carrier 14a is mounted on a pair microscope carrier guiding element 14c being fixed on as the lens barrel platform 18a of device body 18 part, such as, to be driven in scanning direction (X-direction) with set Long travel with the mask microscope carrier drivetrain (not shown) comprising linear motor and by suitably micro-move device in Y direction and θ z direction.Positional information (the rotation amount information containing θ z direction) in the XY plane of mask microscope carrier 14a is the mask interferometer 14d by being fixed on lens barrel platform 18a, uses the bar-shaped speculum 14e being fixed on mask microscope carrier 14a to be obtained.In mask interferometer 14d, comprise multiple X mask interferometer and Y mask interferometer respectively, the X bar-shaped speculum corresponding with X mask interferometer and the Y bar-shaped speculum corresponding with Y mask interferometer is comprised respectively in bar-shaped speculum 14e, but only representational display Y mask interferometer and the bar-shaped speculum of Y in Fig. 1.
Projection optics system 16 is configured in below mask microscope carrier 14a, is supported in lens barrel platform 18a.Projection optics system 16 and such as United States Patent (USP) the 6th, 552, No. 775 projection optics systems that specification discloses are formed equally.That is, the view field that projection optics system 16 comprises the pattern image of mask M is configured to multiple projection optics systems (poly-lens projection optics system) of dentation, with the projection optics cording same function with Y direction with the single image field of oblong-shaped being long side direction.In this example, as each of multiple projection optics system, be use the equimultiple system of the such as both sides heart far away and form upright erect image person.
Therefore, when throw light on the illumination light IL from illumination being 12 field of illumination on mask M time, namely by the illumination light by mask M, by the projection image (part erect image) of projection optics system 16 by the circuit pattern of the mask M in this field of illumination, be formed in be held in baseplate carrier 20 substrate P on the irradiation area (exposure area) of the illumination light of field of illumination conjugation.Then, by the synchronous driving of mask bearing table device 14 with baseplate carrier device 20A, relative field of illumination (illumination light IL) makes mask M be displaced into scanning direction, and by making substrate P relative exposure region (illumination light IL) be displaced into scanning direction, carry out the scan exposure in 1 irradiation (shot) region in substrate P according to this, the pattern being formed at mask M is transferred to this irradiation area.That is, in liquid crystal exposure apparatus 10, be by illumination be 12 and projection optics system 16 in substrate P, generate the pattern of mask M, with illumination light IL, the inductive layer in substrate P (resist layer) is exposed and in substrate P, forms this pattern according to this.
Device body 18 possesses lens barrel platform 18a, a pair lateral column 18b and baseplate carrier pallet 18c.Lens barrel platform 18a is formed by with the parallel plane tabular component of XY, supports above-mentioned mask bearing table device 14 and projection optics system 16.A pair lateral column 18b, wherein a side supports near+Y the side end of lens barrel platform 18a from below, and the opposing party then supports near-Y the side end of lens barrel platform 18a from below.Lateral column 18b is made up of the parallel planar component with XZ plane, is arranged on the ground 11 of dust free room by antihunting device 18d.Accordingly, the relative ground 11 of device body 18 (and mask bearing table device 14, projection optics system 16) is i.e. separated in vibration.
Baseplate carrier pallet 18c is formed by with the parallel plane tabular component of XY, between near the bottom being erected at a pair lateral column 18b.As shown in Figure 2, baseplate carrier pallet 18c is provided with multiple (such as, in this 1st example, 2) in Y direction with predetermined distance.Above baseplate carrier pallet 18c, as shown in Figure 3, the Y linear guide 19a extending Y direction is fixed with branched (such as 2) in X-direction with predetermined distance.
Substrate Zai Tai Installed puts 20A, has multiple (such as 3) base 22, Right X Beam 24, coarse motion microscope carrier 28, the non-Fig. of fine motion microscope carrier 30 (Fig. 3 Zhong show.With reference to Fig. 1), weight canceller 40, the 1st stepping guiding element 50, a pair the 2nd stepping guiding elements 54 and subject matter microscope carrier 60.
Such as 3 bases 22, respectively by extending forming with the parallel plane tabular component of YZ of Y direction, in X-direction with predetermined distance configuration parallel to each other.Again, Fig. 1 is equivalent to the A-A line profile of Fig. 2, but for avoiding the intricate of drawing, eliminates the diagram of base 22.Such as, in 3 bases 22,1st base 22 in the+X side of the baseplate carrier pallet 18c of+X side, the 2nd base 22 in the-X side of the baseplate carrier pallet 18c of-X side, the 3rd base 22 in such as between 2 baseplate carrier pallet 18c, opposing substrate microscope carrier pallet 18c is arranged under by the state of given clearance on ground 11 (with reference to Fig. 2) respectively.The Y linear guide 23a extending Y direction is fixed with in each upper surface (+Z side end) of multiple base 22.
A pair X beam 24 is made up of, in Y direction with predetermined distance configuration parallel to each other the component of the YZ section rectangle extending X-direction respectively.A pair X beam 24 near the both ends of long side direction and central portion, is supported by base 22 respectively from below.A pair X beam 24, as shown in Figure 2, near the long side direction both ends below it respectively by extend Y direction tabular component form connecting elements 24a and be connected to each other.In addition, the long side direction central portion below X beam 24, is provided with distance piece 24b.The Y saddle 23b engaged sliding freely with above-mentioned Y linear guide 23a is fixed with below connecting elements 24a and distance piece 24b.Accordingly, namely a pair X beam 24 be guided in Y direction by straight on multiple base 22.Again, a pair X beam 24 drives in Y direction with set stroke on multiple base 22 with not shown Y actuator (such as linear motor, feed screw device etc.).Herein, the Z position that Z position below a pair X beam 24 is comparatively fixed on the upper end of the Y linear guide 19a above aforesaid substrate microscope carrier pallet 18c is more positioned at+Z side, a pair X beam 24 opposing substrate microscope carrier pallet 18c (that is, device body 18) be separated in vibration.
Above each, as shown in Figure 3, the x-ray guiding element 25 extending X-direction is fixed with in a pair X beam 24.Again, in each two sides of a pair X beam 24, the X stator 26a being contained in multiple permanet magnets that X-direction arranges with predetermined distance is fixed with.
Rectangle (observed) by overlooking by coarse motion microscope carrier 28 tabular component from+Z-direction is formed, and is mounted on above-mentioned a pair X beam 24.Central portion in coarse motion microscope carrier 28 is formed with peristome 28a.Below coarse motion microscope carrier 28, as shown in part A in Fig. 4, be fixed with the X saddle 25b (for an x-ray guiding element 25a, such as, having 4) that multiple and above-mentioned x-ray guiding element 25a engages, forms together with this x-ray guiding element 25a x-ray guiding element device 25 sliding freely.Accordingly, namely coarse motion microscope carrier 28 is guided in X-direction by straight on a pair X beam 24.
Again, each of the region of the above-mentioned peristome 28a+Y side below coarse motion microscope carrier 28 and-Y side region, being provided with a pair X by fixed head 27 and above-mentioned X stator 26a subtend can mover 26b.X can have coil unit by mover 26b, forms the x-ray motor 26 in order to be driven on a pair X beam 24 by coarse motion microscope carrier 28 in X-direction together with corresponding X stator 26a.In addition, coarse motion microscope carrier 28, by the effect of above-mentioned x-ray guiding element device 25, makes its opposed pair X beam 24 be restricted toward the movement of Y direction, and moves with the past Y direction of a pair X beam 24 one.That is a pair X beam 24 and coarse motion microscope carrier 28 form the twin shaft bearing table device of so-called gantry (gantry) formula.
Get back to Fig. 1, fine motion microscope carrier 30 is made up of the rectangular-shaped component of low clearance, is configured in above coarse motion microscope carrier 28.Above fine motion microscope carrier 30, be fixed with substrate holding 32.Substrate holding 32 will be loaded into the substrate P above it, be adsorbed maintenance in such as vacuum suction mode.Again, in Fig. 3, for avoiding the intricate of drawing, eliminate the diagram of fine motion microscope carrier 30 and substrate holding 32.In the side ,-Y side of fine motion microscope carrier 30, be fixed with the bar-shaped speculum 34y of the Y with the reflecting surface orthogonal with Y-axis by microscope base 33.In addition, in the side ,-X side of fine motion microscope carrier 30, as shown in Figure 2, the bar-shaped speculum 34x of the X with the reflecting surface orthogonal with X-axis is fixed with by microscope base 33.
The fine motion microscope carrier of the involved multiple voice coil motor of fine motion microscope carrier 30 drives and to lie on coarse motion microscope carrier 28 micro-move device in 3DOF direction (X-axis, Y-axis, θ z direction), multiple voice coil motor by the stator being fixed on coarse motion microscope carrier 28 be fixed on can forming by mover of fine motion microscope carrier 30.In multiple voice coil motor, comprise such as 2 X voice coil motor 36x (not shown in Fig. 1) and such as 2 Y voice coil motor 36y (not shown in Fig. 2.With reference to Fig. 1).Again, in Fig. 2, such as 2 X voice coil motor 36x are overlapping in paper depth direction.In addition, in Fig. 1, such as 2 Y voice coil motor 36y are overlapping in paper depth direction.
The thrust (electromagnetic force) that fine motion microscope carrier 30 is produced by above-mentioned multiple voice coil motor, is induced by coarse motion microscope carrier 28 in a non contact fashion, accordingly, is displaced into X-direction and/or Y direction with set stroke together with this coarse motion microscope carrier 28.Again, fine motion microscope carrier 30 also by multiple voice coil motor micro-move device suitable relative to coarse motion microscope carrier 28 in above-mentioned 3DOF direction.
Again, fine motion microscope carrier drivetrain, as shown in Figure 1, has in order to by the multiple Z voice coil motor 36zs of fine motion microscope carrier 30 micro-move device in the 3DOF direction of θ x, θ y and Z-direction.Multiple Z voice coil motor 36z is the position (in Fig. 1, only show 2 in 4 Z voice coil motor 36z, another 2 are hidden in inside paper) in four bights being configured in such as corresponding fine motion microscope carrier 30.Comprise the formation of multiple voice coil motor, fine motion microscope carrier drivetrain, to be exposed in such as U.S. Patent Publication No. 2010/0018950 specification.
The X position information of fine motion microscope carrier 30, as shown in Figure 2, being the X laser interferometer 38x that component by being called as interferometer post 18e is fixed on device body 18, using the bar-shaped speculum 34x of X to be obtained.Again, the Y positional information of fine motion microscope carrier 30 as shown in Figure 1, is then the Y laser interferometer 38y by being fixed on device body 18, uses the bar-shaped speculum 34y of Y to be obtained.X laser interferometer 38x and Y laser interferometer 38y is respectively equipped with multiple (overlapping respectively at paper depth direction in Fig. 1 and Fig. 2), and can obtain the θ z positional information of fine motion microscope carrier 30.
The position in the Z axis of fine motion microscope carrier 30, θ x and θ y direction is (following, claim Z obliquity) information, as shown in part A in Fig. 4, be arranged on below fine motion microscope carrier 30 multiple (such as, 4) Z sensor 38z, use aftermentioned subject matter microscope carrier 60 to be obtained.Such as 4 Z sensor 38z configure with predetermined distance around Z axis.In baseplate carrier device 20A, be the Z positional information obtaining fine motion microscope carrier 30 according to the mean value of the output of above-mentioned multiple Z sensor 38z, obtain the θ x of fine motion microscope carrier 30 and the rotation amount information in θ y direction according to the output difference of above-mentioned multiple Z sensor 38z.The kind of Z sensor 38z is not particularly limited, and can use such as laser extensometer, laser interferometer etc.
Weight canceller 40, as shown in part A in Fig. 4, is support fine motion microscope carrier 30 from below by aftermentioned levelling device 46.Weight canceller 40 inserts in the peristome 28a of coarse motion microscope carrier 28, is supported from below by aftermentioned 1st stepping guiding element 50.Weight canceller 40, has air bearing 42 in its bottom, by from the static pressure of this air bearing 42 to the gas-pressurized (such as air) sprayed above the 1st stepping guiding element 50, suspends on the 1st stepping guiding element 50 across given clearance.Again, though part A is equivalent to the B-B line profile of Fig. 3 in Fig. 4, for avoiding the intricate of drawing, the diagram of base 22 is eliminated.
The weight canceller 40 of this example, has the formation identical with the weight canceller that such as U.S. Patent Application Publication No. 2010/0018950 specification discloses and function.That is, weight canceller 40, there is such as not shown air spring, the power of the gravity direction produced by this air spring (+Z-direction) upward, offset the weight (power of (-Z-direction) down that produce because of weight acceleration) comprising fine motion microscope carrier 30, substrate holding 32 etc. and be, accordingly, when the Z obliquity of carrying out fine motion microscope carrier controls, the load of above-mentioned multiple Z voice coil motor 36z is reduced.
Weight Di Xiao Installed puts 40, and Z position (height of C.G.) roughly the same with the Z position of its center of gravity, by multiple, such as 4 flexures, (flexure) Installed puts 44 and is mechanically connected to coarse motion microscope carrier 28.The bending device 44 of this example, has and such as U.S. Patent Application Publication No. 2010/0018950 formation that the bending device that specification discloses is identical and function.That is, bending device 44 comprise the minimal thickness such as configured with XY plane parallel banded steel plate, be located at the articulated mounting (such as spherojoint) at these steel plate both ends, above-mentioned steel plate is erected between weight canceller 40 and coarse motion microscope carrier 28 by articulated mounting.
Bending device 44, as shown in Figure 3, in+X the side of weight canceller 40 ,-X side ,+Y side and-Y side everywhere, [is linked weight canceller 40 and coarse motion microscope carrier 28.Accordingly, when coarse motion microscope carrier 28 moves toward X-direction and/or Y direction, namely weight canceller 40 is drawn by coarse motion microscope carrier 28 by least one of multiple bending device 44, according to this with this coarse motion microscope carrier 28 one be displaced into X-direction and/or Y direction.
Get back to part A in Fig. 4, levelling device 46 comprises the spherical bearing arrangement of pedestal 46a and bulb 46b, from below fine motion microscope carrier 30 is supported as swinging (tilting action) freely in θ x and θ y direction, and with fine motion microscope carrier 30 one along XY planar movement.Levelling device 46, is supported by weight canceller 40 from below in a non contact fashion by the not shown air bearing being installed on weight canceller 40, and can allow the movement in relative weight canceller 40 direction along the horizontal plane.Again, if can from below fine motion microscope carrier 30 be supported into tilting action freely, as levelling device, also can use the imitative spherical bearing arrangement that such as U.S. Patent Application Publication No. 2010/0018950 specification discloses.
1st stepping guiding element 50, as shown in Figure 3, by extending X-direction and the parallel plane tabular component of XY is formed, such as, is configured on 2 baseplate carrier pallet 18c.The long side direction size of the 1st stepping guiding element 50, is set to slightly long in the shift motion of X-direction compared with fine motion microscope carrier 30.Again, the Width (Y direction) of the 1st stepping guiding element 50 is sized to slightly wide compared with the setting area of weight canceller 40.Above 1st stepping guiding element 50, its flatness is made into very high and parallel with XY plane (horizontal plane), has the function of guiding face when above-mentioned weight canceller 40 (and fine motion microscope carrier 30) is moved toward X-direction.Though the material of the 1st stepping guiding element 50 is not particularly limited, formed better to use such as stone material (the isopyknic stone material of such as gabbro) or pottery, cast iron etc.
Below the 1st stepping guiding element 50, as shown in part B in Fig. 4, be fixed with the Y saddle 19b that multiple (such as, for a Y linear guide 19a, 2) is sticked in above-mentioned Y linear guide 19a sliding freely.Accordingly, namely the 1st stepping guiding element 50 is guided in Y direction along multiple Y linear guide 19a by straight.
In+X the side end of the 1st stepping guiding element 50, as shown in Figure 3, a pair connecting elements 50a is fixed with in Y direction with predetermined distance.1st stepping guiding element 50, the connecting elements 50a of its+Y side is connected to X the beam 24 ,-Y side of+Y side connecting elements 50a by bending device 52 is then connected to the X beam 24 of-Y side by bending device 52.Be fixed with a pair connecting elements 52a in the-X side end of the 1st stepping guiding element 50 is also same, by this pair connecting elements 52a, the 1st stepping guiding element 50 is connected to each of a pair X beam 24 by bending device 52.Bending device 52, as shown in part A in Fig. 4, in the Z position of the center of gravity with the 1st stepping guiding element 50, roughly the same Z position (height of C.G.), is connected the 1st stepping guiding element 50 with X beam 24.
The formation of bending device 52, with roughly the same with the bending device 44 that coarse motion microscope carrier 28 is connected by above-mentioned weight canceller 40.That is, bending device 52, comprise extend Y direction and the parallel plane minimal thickness steel plate of XY, with the articulated mounting (such as spherojoint) being located at these steel plate both ends, above-mentioned steel plate is erected between the 1st stepping guiding element 50 and X beam 24 by articulated mounting.Therefore, the 1st stepping guiding element 50 and X beam 24 are link into an integrated entity (high rigidity) in Y direction, in contrast, be then separated in vibration in other 5DOF directions (X, Z, θ x, θ y, θ z).
In baseplate carrier device 20A, in order to substrate P be driven toward X-direction with set stroke, when coarse motion microscope carrier 28 is driven in X-direction, namely weight canceller 40 is drawn by coarse motion microscope carrier 28 and moves toward X-direction on the 1st stepping guiding element 50.Again, in order to substrate P be driven toward Y direction with set stroke, when a pair X beam 24 is driven in Y direction, namely weight canceller 40 is drawn by coarse motion microscope carrier 28 and moves toward Y direction.Now, due to a pair X beam 24 and the 1st stepping guiding element 50 one be displaced into Y direction (weight canceller 40 and the 1st stepping guiding element 50 be not in Y direction relative movement), therefore can not produce the situation that weight canceller 40 comes off from the 1st stepping guiding element 50.Therefore, Width (Y direction) size of the 1st stepping guiding element 50, as long as weight canceller 40 can be guided toward the minimum size of the mobile degree of X-direction, can be formed as light weight.
A pair the 2nd stepping guiding elements 54 are made up of the tabular component of the YZ section rectangle extending X-direction respectively, such as, be configured on 2 baseplate carrier pallet 18c.A pair the 2nd stepping guiding elements 54, a side wherein in the+Y side of the 1st stepping guiding element 50, the opposing party in the-Y side of the 1st stepping guiding element 50, respectively relative 1st stepping guiding element 50 is across given clearance configuration parallel to each other.
The long side direction size of the 2nd stepping guiding element 54, as shown in Figure 3, though be set to roughly the same with the 1st stepping guiding element 50, Width (Y direction) size is then set to narrow compared with the 1st stepping guiding element 50.Again, as shown in part B in Fig. 4, the thickness direction size of the 2nd stepping guiding element 54, is set to roughly the same with the 1st stepping guiding element 50.The Y saddle 19c being sticked in above-mentioned Y linear guide 19a is sliding freely fixed with below the 2nd stepping guiding element 54.Accordingly, namely the 2nd stepping guiding element 54 is guided in Y direction along multiple Y linear guide 19a by straight.
2nd stepping guiding element 54 be above processed to have very high flatness and parallel with XY plane (horizontal plane), there is the function of guiding face when aftermentioned subject matter microscope carrier 60 moves toward X-direction.Though the material of the 2nd stepping guiding element 54 is not particularly limited, such as stone material (the isopyknic stone material of such as gabbro) or pottery, cast iron, aluminium alloy etc. are used to be formed better.
A pair the 2nd stepping guiding elements 54, as shown in part A in Fig. 4, coupling member 56 one consisted of YZ section U-shaped component links.1st stepping guiding element 50 is inserted between a pair subtend face of coupling member 56 by given clearance.Coupling member 56, as shown in Figure 2, is provided with multiple (in this 1st example, such as, being 4) in X-direction with predetermined distance.
In the long side direction (+X side and-X side) both ends of the 2nd stepping guiding element 54, as shown in Figure 3, be fixed with connecting elements 54a respectively.2nd stepping guiding element 54 of+Y side, its above-mentioned connecting elements 54a is connected to the 2nd stepping guiding element 54 of X the beam 24 ,-Y side of+Y side by bending device 58, its above-mentioned connecting elements 54a is connected to the X beam 24 of-Y side by bending device 58.The formation of bending device 58, above-mentioned 1st stepping guiding element 50 is roughly the same with the bending device 52 of X beam 24 with connecting.Accordingly, when a pair X beam 24 moves toward Y direction, namely the 1st stepping guiding element 50 and a pair the 2nd stepping guiding elements 54 move with the past Y direction of a pair X beam 24 one.
Subject matter microscope carrier 60 is configured between a pair X beam 24, is mounted on a pair the 2nd stepping guiding elements 54.Subject matter microscope carrier 60, as shown in part B in Fig. 4, has top loop 61, bottom ring 62, connecting elements 63, multiple subject matter 64 and multiple air bearing 65.
Top loop 61, as shown in Figure 3, the discoideus component being formed peristome by central authorities is formed.Bottom ring 62 is formed by forming (only thickness is thin compared with top loop 61) discoideus component with the roughly the same outside dimension of above-mentioned top loop 61 and internal diameter size, as shown in part B in Fig. 4, be configured in the below (in Fig. 3, being that opposite upper parts ring 61 is hidden in inside paper) of top loop 61.Above-mentioned weight canceller 40 inserts in each peristome of top loop 61 and bottom ring 62.Connecting elements 63 insert below top loop 61 and bottom ring 62 above between, top loop 61 and bottom ring 62 are linked into an integrated entity.Again, bottom ring 62, its diameter can be little compared with top loop 61, and top loop 61 comparatively coarse motion microscope carrier 28 is positioned at+Z side, and its diameter can be large compared with the peristome of coarse motion microscope carrier 28.
In this 1st example, corresponding above-mentioned multiple Z sensor 38z, such as 4 subject matters 64, as shown in Figure 3, in θ z direction (around Z axis) with predetermined distance and the mode be positioned at immediately below corresponding Z sensor 38z, are fixed on above top loop 61.The kind of subject matter 64, selects better with the kind according to Z sensor 38z.As Z sensor 38z, such as when using the situation of reflection-type laser displacement sensor of triangulation mode, use whiteware better in subject matter 64, as Z sensor 38z, such as when using the situation of reflection-type laser displacement sensor of vertical reflection mode, subject matter 64 use speculums better (subject matter 64 can be omitted to the imposing mirror finish above of top loop 61).Subject matter 64, the amount of movement (measuring beam can not depart from subject matter) when considering fine motion microscope carrier 30 relative coarse motion microscope carrier 28 micro-move device sets area.
Multiple (in this 1st example, such as, being 4) air bearing 65, is fixed on below bottom ring 62 in θ z direction (around Z axis) with predetermined distance.Such as, in 4 air bearing 65, gas discharging surface (bearing surface) subtend of 2 air bearing 65 above the 2nd stepping guiding element 54 of a side (+Y side), the gas discharging surface of other 2 air bearing 65 then subtend above the 2nd stepping guiding element 54 of the opposing party (-Y side).Subject matter microscope carrier 60, as shown in part B in Fig. 4, being the static pressure of gas-pressurized (such as air) by spraying from the 2nd stepping guiding element 54 of above-mentioned multiple air bearing 65 to correspondence, being suspended on a pair the 2nd stepping guiding elements 54 by given clearance.
Subject matter microscope carrier 60 as shown in Figure 3, is be linked to coarse motion microscope carrier 28 by multiple bending device 66.The formation of bending device 66, roughly the same with the bending device 44 connecting above-mentioned weight canceller 40 and coarse motion microscope carrier 28 (but, relative to multiple bending device 44 and X-axis or Y-axis abreast (overlook in+shape) configure, multiple bending device 66 extends the direction with X-axis or Y-axis, such as angle at 45 °).
Baseplate carrier device 20A, in order to drive in X-direction by substrate P with set stroke, when coarse motion microscope carrier 28 is driven in X-direction, namely subject matter microscope carrier 60 is drawn by coarse motion microscope carrier 28 and be displaced into X-direction on a pair the 2nd stepping guiding element 54.Again, in order to drive in Y direction by set for substrate P stroke, when a pair X beam 24 is driven in Y direction, namely subject matter microscope carrier 60 is drawn by coarse motion microscope carrier 28 and is displaced into Y direction.Now, be displaced into Y direction (subject matter microscope carrier 60 and a pair the 2nd stepping guiding element 54 not relative movements are in Y direction) due to a pair X beam 24 and a pair the 2nd stepping guiding element 54 one, therefore can not produce the situation that subject matter microscope carrier 60 comes off from a pair the 2nd stepping guiding elements 54.
Again, induced and be displaced into X-axis and/or Y direction due to fine motion microscope carrier 30 by coarse motion microscope carrier 28, what therefore subject matter microscope carrier 60 and fine motion microscope carrier 30 were integrated is displaced into X-axis and/or Y direction.Therefore, Z sensor 38z can be irrelevant with the XY In-plane position of fine motion microscope carrier 30, uses corresponding subject matter 64 to obtain the Z positional information of fine motion microscope carrier 30.
The liquid crystal exposure apparatus 10 (with reference to Fig. 1) formed in the above described manner, under the management of not shown main control unit, carry out mask M toward the loading on mask microscope carrier 14 with not shown mask loader and carry out substrate P toward moving into (loading) on substrate holding 32 by not shown substrate loader.Afterwards, use not shown aligning to detect system by main control unit to implement locating tab assembly, after this terminates locating tab assembly, the multiple irradiation areas be set in substrate P are successively carried out to the exposure actions of step-scan (step & scan) mode.Because this exposure actions is identical with the exposure actions of existing step-scan mode, therefore description is omitted.
When above-mentioned exposure actions, alignment actions time, at baseplate carrier device 20A, by below lens barrel platform 18a, be fixed on multiple sensors 15 (automatic focus sensor) near projection optics system 16, obtain the Z positional information on substrate P surface, according to the output of the plurality of sensor 15, the Z obliquity using multiple Z voice coil motor 36z to carry out fine motion microscope carrier 30 controls, to make the position, Z position of the exposure area in substrate P in the depth of focus of projection optics system 16.
According to the baseplate carrier device 20A of described above example, due to the subject matter 64 used when obtaining the Z positional information of fine motion microscope carrier 30, being mounted in from weight canceller 40 is the subject matter microscope carrier 60 of another different components, therefore compare with situation subject matter 64 being installed on weight canceller 40, weight canceller 40 miniaturization, lightweight can be made.In addition, when supposing subject matter 64 to be installed on weight canceller 40, the occasion that flatness above 1st stepping guiding element 50 is low, the certainty of measurement of the Z obliquity information of fine motion microscope carrier 30 is likely by low, relative to this, in baseplate carrier device 20A, owing to when obtaining the Z obliquity information of fine motion microscope carrier 30 being the subject matter microscope carrier 60 that use is mounted on a pair the 2nd stepping guiding elements 54, even if the flatness therefore above the 1st stepping guiding element 50 is low, but due to the function above with measurement datum of the 2nd stepping guiding element 54, therefore the certainty of measurement of the Z obliquity information of fine motion microscope carrier 30 does not have any problem.
Again, because the Z obliquity of fine motion microscope carrier 30 can be controlled by multiple Z voice coil motor 36z accurately, even if the flatness therefore above the 1st stepping guiding element 50 reduces, as long as can guarantee the certainty of measurement of the Z obliquity information of fine motion microscope carrier 30, the Z obliquity of fine motion microscope carrier 30 controls to carry out with high accuracy.Therefore, without the need in order to ensure the flatness above the 1st stepping guiding element 50, and implement the measure of the rigidity of raising the 1st stepping guiding element 50 etc.Therefore, the 1st stepping guiding element 50 miniaturization (slimming), lightweight can be made.
Again, the formation of the baseplate carrier device 20A of above-mentioned 1st example can be suitably out of shape.Below, the variation of above-mentioned 1st example is described.Again, in the variation of the 1st example below illustrated, for having the formation identical with above-mentioned 1st example and the important document of function, also suitably description is omitted to give same-sign.
" variation of the 1st example (1) "
In Fig. 5 ~ Fig. 6 in part B, show the baseplate carrier device 20B (in Fig. 5, not showing fine motion microscope carrier 30 (with reference to part A in Fig. 6)) of the variation (1) of above-mentioned 1st example.
In the baseplate carrier device 20A (with reference to part B in Fig. 4) of above-mentioned 1st example, the Z obliquity information of fine motion microscope carrier 30, be with multiple Z sensor 38z, use the subject matter 64 being installed on subject matter microscope carrier 60 to be obtained, relative to this, the difference of the baseplate carrier device 20B in Fig. 6 shown in part B is, by multiple Z sensor 38z, use each obtain of a pair the 2nd stepping guiding elements 54 above.Again, for other important documents of type of drive comprising a pair the 2nd stepping guiding elements 54, as shown in part A in Fig. 5 and Fig. 6, identical with above-mentioned 1st example.
In Z sensor 38z, such as use the Qing Xing Time of the reflection-type laser displacement sensor of triangulation mode, as subject matter (datum level of Z obliquity information measurement), the ribbon-shaped members formed using whiteware is pacified that Installed is better on the 2nd stepping guiding element 54 (also can in order to the function making the 2nd stepping guiding element 54 itself have subject matter, and the 2nd stepping guiding element 54 itself is formed with pottery, also the thermal sprayings such as pottery can be formed in metal surface).In addition, when Z sensor 38z uses the situation of reflection-type laser displacement sensor of such as vertical reflection mode, the strip mirror that can cover the 2nd stepping guiding element 54 roughly all is above installed on the 2nd stepping guiding element 54 better (or imposing mirror finish to the roughly entirety above the 2nd stepping guiding element 54).
According to baseplate carrier device 20B, compare with the baseplate carrier device 20A of above-mentioned 1st example, owing to not having subject matter microscope carrier 60 (with reference to Fig. 3), therefore form simple.Again, because inertia mass is little, the Position Control of coarse motion microscope carrier 28 (that is substrate P) therefore can be promoted.In addition, also can use to drive the linear motor of coarse motion microscope carrier 28 miniaturized.Moreover, owing to not carrying subject matter microscope carrier 60 on the 2nd stepping guiding element 54, handling of the rigidity of raising the 2nd stepping guiding element 54 etc. therefore need not be imposed.Therefore the 2nd stepping guiding element 54 miniaturization (slimming), lightweight can be made.
" variation of the 1st example (2) "
The baseplate carrier device 20C of the variation (2) of above-mentioned 1st example is shown in Fig. 7 and Fig. 8.The baseplate carrier device 20A of above-mentioned 1st example, as shown in part A in Fig. 4, support forming of fine motion microscope carrier 30 by weight canceller 40 from below by levelling device 46 on the 1st stepping guiding element 50, relative to this, as shown in Figure 8, so the dissimilarity of baseplate carrier device 20C is directly carrying levelling device 78 on the 1st stepping guiding element 70A.In addition, although not shown, the 1st stepping guiding element 70A is same with above-mentioned 1st example, and mechanical to be linked to a pair X beam 24 (not shown in Fig. 7 and Fig. 8.With reference to Fig. 1 etc.), with a pair X beam 24 one be displaced into Y direction.Again, coarse motion microscope carrier 28 is equipped on a pair X beam 24, is driven in X-direction and is displaced into Y direction on this pair X beam 24 together with a pair X beam 24.
1st stepping guiding element 70A, as shown in Figure 7, has guiding element body 71, air spring 72 and a pair Z voice coil motor 73, also has the function of weight canceller and Z actuator.Guiding element body 71, as shown in Figure 8, has lower board unit 71a, upper plate portion 71b and a pair guide plate 71c.Lower board unit 71a and upper plate portion 71b is respectively by extending X-direction, forming, in Z-direction with predetermined distance configuration parallel to each other with the parallel plane rectangular plate-like component of XY.A pair guide plate 71c (or not shown linear guide device) that upper plate portion 71b is fixed in lower board unit 71a guides and relatively can be displaced into Z-direction by lower board unit 71a.
Air spring 72 is inserted between lower board unit 71a and upper plate portion 71b, supports the central portion of upper plate portion 71b from below.The gas-pressurized from outside is supplied with, with the gravity direction that can contend with the weight being comprising fine motion microscope carrier 30 (comprising levelling device 78) masterpiece upwards for upper plate portion 71b in air spring 72.Again, air spring 72 also can be multiple with predetermined distance configuration in X-direction.
A pair Z voice coil motor 73, wherein a side is configured near+X the side end of the 1st stepping guiding element 70A, and the opposing party is then configured near-X the side end of the 1st stepping guiding element 70A.Voice coil motor 73 comprise be fixed on lower board unit 71a stator 73a, be fixed on upper plate portion 71b can mover 73b, when carrying out the Z Position Control of fine motion microscope carrier 30, upper plate portion 71b is driven in Z-direction (the θ x of fine motion microscope carrier 30 and the Position Control in θ y direction are by fine motion microscope carrier drivetrain undertaken same with above-mentioned example).
Levelling device 78 comprises the spherical bearing arrangement of pedestal 78a and bulb 78b, from below fine motion microscope carrier 30 is supported as swinging ((tilt) action of tilting) in θ x and θ y direction freely, and with fine motion microscope carrier 30 one along XY planar movement.Pedestal 78a have insert coarse motion microscope carrier 28 peristome 28a in, gas discharging surface (bearing surface) is towards the not shown air bearing of-Z side (downside).Levelling device 78, by from the static pressure of pedestal 78a to the gas-pressurized sprayed above upper plate portion 71b (such as air), is suspended on the 1st stepping guiding element 70A by given clearance.
The Z obliquity information of fine motion microscope carrier 30, as shown in Figure 8, same with aforesaid substrate bearing table device 20B (with reference to part B in Fig. 5 ~ Fig. 6), be use being obtained (use subject matter microscope carrier 60 (with reference to Fig. 3) that also can be same with above-mentioned 1st example) of the 2nd stepping guiding element 54 above with multiple Z sensor 38z.
In baseplate carrier device 20C, due to the interval of coarse motion microscope carrier 28 above and below fine motion microscope carrier 30 can be shortened, the therefore short transverse size step-down of baseplate carrier device 20C entirety.Again, because inertia mass diminishes, the Position Control of coarse motion microscope carrier 28 (that is substrate P) therefore can be promoted.In addition, also can use to drive the linear motor of coarse motion microscope carrier 28 miniaturized.
" variation of the 1st example (3) "
The baseplate carrier device 20D of the variation (3) of above-mentioned 1st example is shown in Fig. 9.Baseplate carrier device 20D and aforesaid substrate bearing table device 20C (with reference to Fig. 7 and Fig. 8) compares, and the formation of the 1st stepping guiding element 70B is different.Below, be illustrated for dissimilarity.
1st stepping guiding element 70B comprise be made up of rectangular-shaped (box-shaped) component of the hollow extending X-direction guiding element body 74, be housed in multiple Z actuators 75 in guiding element body 74.Guiding element body 74, such as thin by thickness is done, low with the comparatively lower face that the rigidity of upper surface portion is set.Multiple Z actuator 75 arranges in X-direction with predetermined distance, by the pushing of the upper surface portion of guiding element body 74 to+Z side.Again, though the kind of Z actuator 75 is not particularly limited, because the drive volume of upper surface portion is small, therefore such as cylinder, piezoelectric element etc. can be used.
In baseplate carrier device 20D, as the signal of Figure 10, be (not shown in Figure 10 by multiple Z actuator 75.With reference to Fig. 9) fine motion microscope carrier 30 is driven in Z-direction.Herein, the upper surface portion of guiding element body 74 is out of shape, relative level face tilt owing to being pushed by multiple Z actuator 75, but is supported by levelling device 78 due to fine motion microscope carrier 30, therefore accessible to the Z inclination control of fine motion microscope carrier 30.Again, Tu10Zhong is easy to understand, by the actual exaggeration that the distortion (flexure) of the upper surface portion of guiding element body 74 shows.Baseplate carrier device 20D, also can obtain the effect identical with aforesaid substrate bearing table device 20C.
" variation of the 1st example (4) "
The baseplate carrier device 20E of the variation (4) of above-mentioned 1st example is shown in Figure 11.Baseplate carrier device 20E, compare with aforesaid substrate bearing table device 20D (with reference to Fig. 9), the formation of its 1st stepping guiding element 70C is different.Below, be only illustrated for dissimilarity.
The multiple Z actuators 75 being arranged in X-direction are used to drive in Z-direction by fine motion microscope carrier 30 relative to the 1st stepping guiding element 70B (with reference to Fig. 9) of aforesaid substrate bearing table device 20D, as shown in figure 11, the dissimilarity of the 1st stepping guiding element 70C is, is driven fine motion microscope carrier 30 in Z-direction by pair of cams device 76.
A wherein side of pair of cams device 76 near the+X side end of the 1st stepping guiding element 70C, the opposing party then near the-X side end of the 1st stepping guiding element 70C, insert respectively between lower board unit 71a and upper plate portion 71b.Cam gear 76, comprises and is mounted in the mode that can be displaced into X-direction the lower wedge portion 76c be fixed on the base plate 76a of lower board unit 71a by x-ray guiding element device 76b, is fixed on upper wedge portion 76d that upper plate portion 71b and lower wedge portion 76c subtend configure and lower wedge portion 76c is driven the actuator 76e in X-direction.Baseplate carrier device 20E, also can obtain the effect identical with aforesaid substrate bearing table device 20D.
" variation of the 1st example (5) "
The baseplate carrier device 20F of the variation (5) of above-mentioned 1st example is shown in Figure 12.Baseplate carrier device 20F, compare with aforesaid substrate bearing table device 20C (with reference to Fig. 7 and Fig. 8), its dissimilarity is, the formation without levelling device 78 (with reference to Fig. 7 and Fig. 8) and multiple Z voice coil motor 36z (with reference to Fig. 7) and the 1st stepping guiding element 70D is different.Below, be only illustrated for dissimilarity.
1st stepping guiding element 70D, same with above-mentioned 1st stepping guiding element 70A (with reference to Fig. 7 and Fig. 8), air spring 72 is inserted between lower board unit 71a and upper plate portion 71b, drives upper plate portion 71b with multiple Z voice coil motor 73.Again, the 1st stepping guiding element 70D does not have the guide plate 71c (with reference to Fig. 8) as above-mentioned 1st stepping guiding element 70A.In addition, multiple Z voice coil motor 73, such as near the 1st stepping guiding element 70D+X side (or-X side) end in Y direction with predetermined distance, be such as configured with 2 (in Figure 12 in paper depth direction overlapping).That is multiple Z voice coil motor 73 is configured in not 3 places on the same line.
Central portion below fine motion microscope carrier 30 is provided with the air bearing 79 of bearing surface towards-Z side.Fine motion microscope carrier 30, by from the static pressure of air bearing 79 to the gas-pressurized (such as air) sprayed above the 1st stepping guiding element 70D, is suspended on the 1st stepping guiding element 70D by given clearance (with contactless state).
In baseplate carrier device 20F, be upper plate portion 71b suitably driven direction of fascinating (θ x and θ y direction) in relative Z-direction and/or horizontal plane by multiple Z voice coil motor 73, carry out the Z inclination control of fine motion microscope carrier 30 according to this.According to baseplate carrier device 20F, compare with aforesaid substrate bearing table device 20C (with reference to Fig. 7 and Fig. 8), its formation can more simplify.Again, same with aforesaid substrate bearing table device 20D (with reference to Fig. 9), also can use multiple Z actuator 75 (but, also need be multiple with predetermined distance configuration in Y direction) upper plate portion 71b is fascinated, or it is same with aforesaid substrate bearing table device 20E (with reference to Figure 11), use multiple cam gear 76 (but, need be configured in not 3 places) on the same line that upper plate portion 71b is fascinated.
" the 2nd example "
Secondly, Figure 13 ~ Figure 17 is used to be illustrated for the 2nd example.The formation of the liquid crystal exposure apparatus of the 2nd example, except the formation of baseplate carrier device 20G, identical with above-mentioned 1st example, therefore for having the formation identical with above-mentioned 1st example and the important document of function, also suitably description is omitted to give same-sign.
As shown in part B in Fig. 4, compared to the baseplate carrier device 20A of above-mentioned 1st example, its the 1st stepping guiding element 50 is mounted on baseplate carrier pallet 18c by mechanical linear guide device (Y linear guide 19a, Y saddle 19b), as shown in figure 13, the difference of the baseplate carrier device 20G of this 2nd example is, the 1st stepping guiding element 55 is mounted on a pair base 80.Again, above-mentioned 1st example, as shown in Figure 2, baseplate carrier pallet 18c is such as provided with 2, in contrast, the baseplate carrier pallet 18f of this 2nd example, as shown in figure 13, is made up of a tabular component.Therefore, baseplate carrier device 20G does not have the base 22 (with reference to Fig. 2) of the long side direction central portion of supporting X beam 24.
A side in a pair base 80 is in+X the side of baseplate carrier pallet 18f, between baseplate carrier pallet 18f and base 22, the opposing party is then in the-X side of baseplate carrier pallet 18f, between baseplate carrier pallet 18f and base 22, be configured in baseplate carrier pallet 18f and base 22 respectively by given clearance.Again, Figure 14 and Figure 16, for avoiding the intricate of drawing, eliminates the diagram (in Figure 16, the diagram of X beam 24 is also omitted) of base 22.
Base 80, by extending Y direction, forming with the parallel plane tabular component of XZ (with reference to Figure 15), is arranged on ground 11 by support plate 81 and antihunting device 82.1st stepping guiding element 55, by by the Y linear guide 84 being fixed on base 80 be fixed on the Y linear guide device that the Y saddle 19b below the 1st stepping guiding element 55 forms and be mounted on a pair base 80, can move in Y direction with set stroke.Therefore, the 1st stepping guiding element 55 opposite sets body 18 and a pair base 22 are separated in vibration.1st stepping guiding element 55, as shown in figure 15, same with above-mentioned 1st example, be linked to a pair X beam 24 by multiple bending device 52 is mechanical, with a pair X beam 24 one be displaced into Y direction.Again, the 1st stepping guiding element 55 is suppress because of the flexure that causes of conducting oneself with dignity, with above-mentioned 1st example compare that its thickness direction size is set bigger.
2nd stepping guiding element 54, as shown in figure 14, same with above-mentioned 1st example, by by the Y linear guide 19a being fixed on baseplate carrier pallet 18f be fixed on the Y linear guide device that the Y saddle 19c below the 2nd stepping guiding element 54 forms and be mounted on baseplate carrier pallet 18f, can move in Y direction with set stroke.Again, a pair the 2nd stepping guiding elements 54, as shown in figure 15, the both ends of long side direction are connected to one by coupling member 54b.A pair the 2nd stepping guiding elements 54, same with above-mentioned 1st example, be linked to a pair X beam 24 by multiple bending device 58 (not shown in Figure 13 and Figure 14) is mechanical, with a pair X beam 24 one be displaced into Y direction.
This 2nd example, as shown in FIG. 16 and 17, also same with above-mentioned 1st example, being the multiple Z sensor 38z by being arranged on fine motion microscope carrier 30, using the 2nd stepping guiding element 54 to obtain the Z obliquity information of fine motion microscope carrier 30.
According to the baseplate carrier device 20G of this 2nd example, the 1st stepping guiding element 55 due to taking the weight of canceller 40 is supported by base 80, therefore compares with above-mentioned 1st example, without the need to requiring the rigidity of the gravity direction of baseplate carrier pallet 18f.Therefore, baseplate carrier pallet 18f slimming, lightweight can be made.
Again, although depending on the position of fine motion microscope carrier 30 (and weight canceller 40), and act on inclined loading in baseplate carrier pallet 18f, but in this 2nd example, the component be mounted on baseplate carrier pallet 18f only has a pair the 2nd stepping guiding elements 54, therefore compare with above-mentioned 1st example, the impact of above-mentioned inclined loading is few.In addition, the Z obliquity information of fine motion microscope carrier 30, can not use the 2nd stepping guiding element 54 and the use subject matter microscope carrier 60 (with reference in Fig. 4 part A) same with above-mentioned 1st example is obtained.
Again, the formation of the baseplate carrier device 20G of above-mentioned 2nd example can be suitably out of shape.Below, the variation of the baseplate carrier device 20G of above-mentioned 2nd example is described.Again, know in following explanation in the variation of the 2nd example, for above-mentioned 2nd example, there is the important document of identical formation and function, give same-sign and suitably description is omitted.
" variation of the 2nd example (1) "
The baseplate carrier device 20H of the variation (1) of above-mentioned 2nd example is shown in Figure 18 and Figure 19.The Z obliquity information of fine motion microscope carrier 30, in above-mentioned 2nd example, as shown in figure 17, by multiple Z sensor 38z, use the 2nd stepping guiding element 54 to obtain, in contrast, the difference of the baseplate carrier device 20H shown in Figure 18 and Figure 19 is, be by multiple Z sensor 38z, use being obtained of baseplate carrier pallet 18g above.
In baseplate carrier device 20H, the reflection-type laser displacement sensor using such as triangulation mode as Z sensor 38z, the subject matter 69 that the tabular component such as formed by whiteware having installed the area with the degree that can contain the moving area of fine motion microscope carrier 30 in XY plane above baseplate carrier pallet 18g becomes.In addition, when using the situation of reflection-type laser displacement sensor of such as vertical reflection mode as Z sensor 38z, mirror finish (or installing speculum above baseplate carrier pallet 18g) is given by above baseplate carrier pallet 18g.
According to baseplate carrier device 20H, owing to baseplate carrier pallet 18g not being arranged the Y linear guide in order to the 1st stepping guiding element 55 to be guided in Y direction, therefore can directly being used baseplate carrier pallet 18g as subject matter above.As previously mentioned, in baseplate carrier device 20H, compare with the baseplate carrier device 20G of above-mentioned 2nd example shown in Figure 13 etc., owing to not arranging the 2nd stepping guiding element 54, therefore, compare with aforesaid substrate bearing table device 20G, baseplate carrier pallet 18g more slimming, lightweight can be made.In addition, owing to not having the 2nd stepping guiding element 54, inclined load effect is not therefore also had in the situation of baseplate carrier pallet 18g.
" variation of the 2nd example (2) "
The baseplate carrier device 20I of the variation (2) of above-mentioned 2nd example is shown in Figure 20.Baseplate carrier device 20I, has the formation combined by the baseplate carrier device 20C (with reference to Fig. 7 and Fig. 8) of the variation of the baseplate carrier device 20G of above-mentioned 2nd example (with reference to Figure 13 ~ Figure 17) and above-mentioned 1st example (2).
That is as shown in figure 20, baseplate carrier device 20I is same with aforesaid substrate bearing table device 20C, the 1st stepping guiding element 70A has the function of Z actuator and weight canceller.Again, the 1st stepping guiding element 70A, same with aforesaid substrate bearing table device 20G, be mounted on a pair base 80, opposing substrate microscope carrier pallet 18f and X beam 24, vibration is separated.According to baseplate carrier device 20I, except the effect of above-mentioned 2nd example, also can obtain the effect of the variation (2) of above-mentioned 1st example.That is baseplate carrier device 20I, can seek the lightweight of baseplate carrier pallet 18f and can promote the Position Control of coarse motion microscope carrier 28 (that is substrate P).
" variation of the 2nd example (3) "
The baseplate carrier device 20J of the variation (3) of above-mentioned 2nd example is shown in Figure 21 and Figure 22.Relative in the baseplate carrier device 20A (with reference to Fig. 1 etc.) of above-mentioned 1st example and the baseplate carrier device 20G (with reference to Figure 13 etc.) of above-mentioned 2nd example, form so-called gantry type double-shaft bearing table device by a pair X beam 24 with coarse motion microscope carrier 28, the difference of baseplate carrier device 20J is, be the 1st stepping guiding element 57 by taking the weight of canceller 40 and coarse motion microscope carrier 28, form so-called gantry type double-shaft bearing table device.
1st stepping guiding element 57 is made up of the tabular component of the YZ section rectangle extending X-direction, same with the baseplate carrier device 20G (with reference to Figure 13 etc.) of above-mentioned 2nd example, the base 80 that the both ends of long side direction are located on ground 11 respectively supports from below, and opposite sets body 18 is separated in vibration.1st stepping guiding element 57, in Figure 21 and Figure 22 although not shown, but passes through the actuator of such as linear motor (or feed screw device) etc., is driven in Y direction with set stroke.1st stepping guiding element 57, the 1st stepping guiding element 50 had with the baseplate carrier device 20G (with reference to Figure 14) of above-mentioned 2nd example is compared, be formed as width comparatively large (it is larger that the size of Y direction is set), with the supporting coarse motion microscope carrier 28 that can stabilize.
Below coarse motion microscope carrier 28, multiple (such as 4) air bearing 53 that the subtend being above provided with bearing surface and the 1st stepping guiding element 57 configures.Again, below coarse motion microscope carrier 28, as shown in figure 22, be provided with a pair mounting panel 29, above-mentioned 1st stepping guiding element 57 is inserted between a pair mounting panel 29.In the face of the side subtend of a pair mounting panel 29 and the 1st stepping guiding element 57, be separately installed with multiple (such as 2) air bearing 53.Accordingly, coarse motion microscope carrier 28 can move with set stroke along the 1st stepping guiding element 57 with low friction in X-direction, and moves relative to the Y direction of the 1st stepping guiding element 57 and be restricted.Coarse motion microscope carrier 28, by can the x-ray motor that forms of mover (not shown) by the X stator (not shown) being fixed on the 1st stepping guiding element 57 and the X being fixed on coarse motion microscope carrier 28, on the 1st stepping guiding element 57, be driven in X-direction with set stroke.
The Z obliquity information of fine motion microscope carrier 30, same with aforesaid substrate bearing table device 20B (with reference to part B in Fig. 5 ~ Fig. 6), be use being obtained of a pair the 2nd stepping guiding elements 54 above by multiple Z sensor 38z.A pair the 2nd stepping guiding elements 54, are linked to the 1st stepping guiding element 57 by not shown bending device, are integrally displaced into Y direction by being drawn by the 1st stepping guiding element 57 with the 1st stepping guiding element 57.Again, the 1st stepping guiding element 50 that the baseplate carrier device 20G (with reference to Figure 14) due to more above-mentioned 2nd example of the 1st stepping guiding element 57 has is wide, and therefore the interval of a pair the 2nd stepping guiding elements 54 is also wide compared with baseplate carrier device 20G.
According to baseplate carrier device 20J, compare with the baseplate carrier device 20G (with reference to Figure 13 etc.) of above-mentioned 2nd example, owing to not having a pair X beam 24 (with reference to Figure 13 ~ Figure 17), therefore it forms simple.Again, because the 1st stepping guiding element 57 opposite sets body 18 is separated in vibration, therefore drive reaction force during coarse motion microscope carrier 28 can not act on device body 18.In addition, the subject matter used when asking for the Z obliquity information of fine motion microscope carrier 30, can be installed on weight canceller 40.
" variation of the 2nd example (4) "
The baseplate carrier device 20K of the variation (4) of above-mentioned 2nd example is shown in Figure 23 and Figure 24.Baseplate carrier device 20K, has the formation combined by the baseplate carrier device 20C (with reference to Fig. 7 and Fig. 8) of the variation of the baseplate carrier device 20J of the variation of above-mentioned 2nd example (3) (with reference to Figure 21 and Figure 22) and above-mentioned 1st example (2).
That is, as shown in figure 23, the 1st stepping guiding element 70E of baseplate carrier device 20K, between the lower board unit 77a forming body 77 and upper plate portion 77b, such as insert 2 Z voice coil motors 73 and air spring 72, the function with Z actuator and weight canceller same with the 1st stepping guiding element 70A (with reference to Fig. 7) of aforesaid substrate bearing table device 20C.As shown in figure 24, the lower board unit 77a of the 1st stepping guiding element 70E and upper plate portion 77b, is formed as slightly wide compared with the 1st stepping guiding element 70A (with reference to Fig. 8) of aforesaid substrate bearing table device 20C respectively.
Again, below coarse motion microscope carrier 28, multiple (such as 4) air bearing 53 that the subtend being above provided with bearing surface and upper plate portion 77b configures.In addition, below coarse motion microscope carrier 28, as shown in figure 24, be provided with a pair mounting panel 29, above-mentioned 1st stepping guiding element 70E is inserted between a pair mounting panel 29.In a pair mounting panel 29 with the face of upper plate portion 77b side subtend, be separately installed with multiple (such as 2) air bearing 53.Accordingly, coarse motion microscope carrier 28 can move with set stroke along the 1st stepping guiding element 70E with low friction in X-direction, and is restricted relative to the movement of the Y direction of the 1st stepping guiding element 70E.Coarse motion microscope carrier 28, by by the X stator 88a be fixed on above upper plate portion 77b be fixed on X below coarse motion microscope carrier 28 can the x-ray motor that forms of mover 88b, drive with set stroke along the 1st stepping guiding element 70E in X-direction.Again, in Figure 24 although not shown, the relative lower board unit 77a of upper plate portion 77b, the movement in X-direction and Y direction is restricted.In addition, be arranged on aforementioned a pair mounting panel 29 air bearing 53 can with the side subtend of lower board unit 77a.
Again, the central portion above coarse motion microscope carrier 28, is provided with the air bearing 48 of bearing surface towards+Z side, is supported in a non contact fashion from below by levelling device 46.The Z obliquity information of fine motion microscope carrier 30, same with aforesaid substrate bearing table device 20B (with reference to part B in Fig. 5 ~ Fig. 6), be use being obtained of the 2nd stepping guiding element 54 above by multiple Z sensor 38z.In the 1st stepping guiding element 70E, offset the weight being comprising coarse motion microscope carrier 28 and fine motion microscope carrier 30 by air spring 72, reduce the load in order to coarse motion microscope carrier 28 and fine motion microscope carrier 30 to be driven the Z voice coil motor 73 in Z-direction.Again, 1st stepping guiding element 70E, though be with Z voice coil motor 73, coarse motion microscope carrier 28 and fine motion microscope carrier 30 are driven in Z-direction, but also can replace this, use multiple Z actuator 75 as the 1st stepping guiding element 70B as shown in Figure 9, or use pair of cams device 76 as the 1st stepping guiding element 70C as shown in figure 11.
Again, the described above 1st and the 2nd example (comprises its variation.As follows) formation can suitably be changed.Such as, in the above-mentioned 1st and the 2nd example, though the 1st stepping guiding element 50 and a pair the 2nd stepping guiding elements 54 are drawn by a pair X beam 24 and are displaced into the formation of Y direction respectively, but also by the actuator of such as linear motor etc., and independently control X position with a pair X beam 24.
Again, illumination light can be the vacuum-ultraviolet light of the ultraviolet light or F2 laser (wavelength 157nm) etc. of ArF excimer laser (wavelength 193nm), KrF excimer laser (wavelength 248nm) etc.In addition, as illumination light, also can use such as by the single wavelength laser of the infrared bands that sends from dfb semiconductor laser or optical-fiber laser or visible band with the fiber amplifier in addition amplification such as doped with erbium (or erbium and ytterbium both), use the nonlinear optical crystal in addition wavelength convert harmonic wave that is ultraviolet light.Moreover, also can use Solid State Laser (wavelength: 355nm, 266nm) etc.
Again, though projection optics system 16 possesses the projection optics system of the poly-lens mode of many projecting optical units, the quantity of projecting optical unit is not limited thereto, as long as more than 1.In addition, being also not limited to the projection optics system of poly-lens mode, can also be the projection optics system etc. of the Shi Yong such as large-scale speculum of Ou Funa (Ofner) type., though be described for the situation being equimultiple person as projection optics system 16 use projection multiplying power in above-mentioned example, be not limited thereto, projection optics system reduces be and expand any one of system again.
Again, though be used in transmitance mask substrate to be formed with set light-shielding pattern (or phase pattern, dim light pattern) Transmission light type mask, but also can use such as United States Patent (USP) the 6th, 778, No. 257 publications disclose, electronic data according to pattern to be exposed forms transmission pattern or reflection graphic patterns, or form the electronics mask (variable shaping mask) of luminous pattern, such as can adopt the variable shaping mask of a kind of DMD (Digital Micro-mirror Device) using non-luminescent type image display element (being also called spatial light modulator).
Again, make object along the mobile body device (bearing table device) of set two dimensional surface movement, do not limit and be used in exposure device, also can be used in such as the inspection of object object testing fixture etc., carry out the object processing apparatus of set process for object.In addition, as exposure device, be also applicable to stepping and repeat the exposure device of (step & repeat) mode, the exposure device of stepping joint (step & stitch) mode.
Again, as exposure device, especially be applicable to size (comprise external diameter, catercorner length, on one side at least a kind) be more than 500mm substrate, such as make the large substrate of the flat-panel screens such as liquid crystal display cells expose exposure device time, especially effectively.
Again, the purposes of exposure device, be not limited to liquid crystal exposure device liquid crystal display cells pattern being transferred to square glass plate, also can be widely used in the exposure device of such as semiconductor manufacturing, in order to manufacture the exposure device of film magnetic head, micro-machine and DNA wafer etc.In addition; be not only the microcomponent of semiconductor element etc.; the present invention also can be applicable to as manufacturing for the mask of light exposure device, EUV exposure device, X-ray exposure device and electric wire exposure device etc. or graticule, and circuit pattern is transferred to the exposure device of glass basis plate or Silicon Wafer etc.Again, possess the device of the object holding apparatus keeping object, being not limited to exposure device, can also be other substrate board treatment, such as glass substrate (or wafer) testing fixture etc.Again, the object of exposure object is not limited to glass plate, can also be other objects such as such as wafer, ceramic substrate, film member or mask substrate (mask blank).Again, when exposure object thing is the situation of flat-panel monitor substrate, the thickness of this substrate is not particularly limited, such as, also comprise film-form (the flexual flat member of tool) person.
The electronic component of liquid crystal display cells (or semiconductor element) etc., it is the step via the functional performance design carrying out element, the step of mask (or graticule) is made according to this design procedure, make the step of glass substrate (or wafer), with the exposure device of above-mentioned each example and exposure method thereof, mask (graticule) pattern is transferred to the lithography step of glass substrate, make the development step of the glass substrate development through exposure, part beyond the part of remaining resist exposed component to etch the etching step removed, removed etching and without the need to the resist removal step of resist, element number of assembling steps, inspection Check step etc. is manufactured.This occasion, owing to being use the exposure device of above-mentioned example to implement aforementioned exposure method at lithography step, forming element pattern on glass substrate, therefore can manufacture the element of high integration with good productivity.
In addition, the part that the announcement of quoting all publications about exposure device, International Publication publication, U.S. Patent Application Publication specification and the US Patent specification that above-mentioned explanation is quoted is recorded as this specification.
INDUSTRIAL APPLICABILITY
As described above, mobile body device of the present invention is suitable for moving body is moved along set two dimensional surface.Again, the object that exposure device of the present invention is suitable for keeping at moving body forms predetermined pattern.In addition, the manufacture method of flat-panel screens of the present invention is suitable for the manufacture of flat-panel screens.Moreover manufacturing method of the present invention is suitable for the production of microcomponent.

Claims (42)

1. a mobile body device, possesses:
Guiding element, extends the 1st direction in set two dimensional surface, can be displaced into the position along 2nd direction orthogonal with described 1st direction in described two dimensional surface;
Moving body, is supported from below by described guiding element, can be displaced into the position along described 1st direction and the position that can be displaced into together with described guiding element along described 2nd direction along the 1st face specified with described guiding element; And
Position measurement system, by using the 2nd of another the component defined different with described guiding element the as datum level, obtains the positional information of described moving body in the direction intersected with described two dimensional surface.
2. mobile body device as claimed in claim 1, wherein, another component described extends described 1st direction, can be displaced into the movable link of the position along described 2nd direction together with described moving body.
3. mobile body device as claimed in claim 2, wherein, described movable link is in described 2nd direction, the side being located at described guiding element respectively and opposite side.
4. mobile body device as claimed any one in claims 1 to 3, it possesses further and is supported in described movable link, can move and along the measurement mobile member of described 2nd direction movement together with described movable link on described 2nd of specifying with described movable link together with described moving body along described 1st direction;
Position measurement system of institute uses described measurement mobile member to obtain described positional information.
5. mobile body device as claimed in claim 4, wherein, described measurement mobile member is supported in described movable link in a non contact fashion.
6. the mobile body device as described in claim 4 or 5, it possesses the apparatus for deivation of inducing described moving body along described two dimensional surface further;
The position be displaced into along described 2nd direction of described guiding element, described movable link and the described measurement mobile member one by being induced by described apparatus for deivation.
7. mobile body device as claimed in claim 6, wherein, described measurement mobile member drives along described 1st direction with described apparatus for deivation.
8. as claimed any one in claims 1 to 3 mobile body device, wherein, what position measurement system of institute used described movable link obtains described positional information above.
9. mobile body device as claimed in claim 8, it possesses the apparatus for deivation of inducing described moving body along described two dimensional surface further;
The position be displaced into along described 2nd direction of described guiding element and the described movable link one by being induced by described apparatus for deivation.
10. the mobile body device according to any one of claim 6,7 and 9, wherein, described apparatus for deivation is located on the 1st base component;
Described guiding element is located on the 2nd base component different from described 1st base component.
11. mobile body devices as claimed in claim 10, wherein, described movable link is located on the 3rd base component different from described 2nd base component.
12. mobile body devices as claimed in claim 1, wherein, another component described is located at below described guiding element, with the size containing described moving body mobile range in described two dimensional surface and is formed.
13. mobile body devices as claimed in claim 12, wherein, described guiding element is located on the base component different from another component described.
14. mobile body devices according to any one of claim 1 to 13, wherein, described guiding element moves along described 1st direction under the state of the deadweight of the described moving body of supporting on described 1st together with described moving body, and by supporting described moving body from below along the supporting arrangement of described 2nd direction movement together with described guiding element.
15. mobile body devices as claimed in claim 14, wherein, described supporting arrangement is supported in described guiding element in a non contact fashion.
16. mobile body devices as described in claims 14 or 15, wherein, described supporting arrangement by by described moving body supporting for described moving body can be supported by the supporting arrangement that fascinates that fascinates of relatively described two dimensional surface.
17. mobile body devices according to any one of claim 1 to 16, wherein, described guiding element comprises the drive unit driven by described moving body in the direction intersected with described two dimensional surface.
18. mobile body devices as claimed in claim 17, wherein, described guiding element comprises the deadweight supporting arrangement of the deadweight of supporting described moving body.
19. mobile body devices as described in claim 17 or 18, wherein, described guiding element by by described moving body supporting for described moving body can be supported by the supporting arrangement that fascinates that fascinates of relatively described two dimensional surface.
20. mobile body devices as claimed in claim 19, wherein, described in the supporting arrangement that fascinates be supported in described guiding element in a non contact fashion.
21. mobile body devices as described in claim 17 or 18, described guiding element has the drive unit that fascinates that described 1st relatively described two dimensional surface is fascinated.
22. mobile body devices as claimed in claim 21, wherein, described moving body is supported in described guiding element in a non contact fashion.
23. mobile body devices according to any one of claim 1 to 22, wherein, position measurement system of institute uses the measurement component being located at described moving body, obtains the positional information of described moving body in the direction intersected with described two dimensional surface.
24. 1 kinds are moved body Installed and put, possess:
Guiding element, extends the 1st direction in set two dimensional surface, can be displaced into the position along 2nd direction orthogonal with described 1st direction in described two dimensional surface;
Moving body, is supported from below by described guiding element, can be displaced into the position along described 1st direction and the position that can be displaced into together with described guiding element along described 2nd direction along the guiding face specified with described guiding element; And
Drive unit, is located at described guiding element, described moving body is driven the direction in intersecting with described two dimensional surface.
25. mobile body devices as claimed in claim 24, wherein, described guiding element comprises the deadweight supporting arrangement of the deadweight of supporting described moving body.
26. mobile body devices as described in claim 24 or 25, wherein, described guiding element by by described moving body supporting for described moving body can be supported by the supporting arrangement that fascinates that fascinates of relatively described two dimensional surface.
27. mobile body devices as claimed in claim 26, wherein, described in the supporting arrangement that fascinates be supported in described guiding element in a non contact fashion.
28. mobile body devices as described in claim 24 or 25, wherein, described guiding element has the drive unit that fascinates that the relatively described two dimensional surface of described guiding face can be made to fascinate.
29. mobile body devices as claimed in claim 28, wherein, described moving body is supported in described guiding element in a non contact fashion.
30. 1 kinds of mobile body devices, possess:
1st mobile member, extends the 1st direction in set two dimensional surface, can be displaced into the position along 2nd direction orthogonal with described 1st direction in described two dimensional surface;
2nd mobile member, is located at described 1st mobile member, can be displaced into the position along described 1st direction along described 1st mobile member and can be displaced into described 2nd direction together with described 1st mobile member; And
Moving body, is supported from below by described 1st mobile member, is moved along described two dimensional surface by described 2nd mobile member induction.
31. mobile body devices as claimed in claim 30, wherein, in order to drive the key element of the actuator of described 2nd mobile member along described 1st mobile member, are located at least one party in the described 1st and the 2nd mobile member.
32. mobile body devices as described in claim 30 or 31, wherein, described 1st mobile member supports described moving body from below by deadweight supporting arrangement.
33. mobile body devices as described in claim 30 or 31, wherein, described 1st mobile member comprises the drive unit described 2nd mobile member and described moving body driven in the direction intersected with described two dimensional surface.
34. mobile body devices as claimed in claim 33, wherein, described 1st mobile member comprises the deadweight supporting arrangement of the deadweight of described 2nd mobile member of supporting and described moving body.
35. mobile body devices according to any one of claim 30 to 34, it possesses further and uses with the datum level of another the component defined different with described 1st mobile member, obtains the position measurement system of described moving body in the positional information in the direction intersected with described two dimensional surface.
36. mobile body devices as claimed in claim 35, wherein, another component described extends described 1st direction, can be displaced into the movable link of the position along described 2nd direction together with described moving body.
37. mobile body devices as claimed in claim 36, wherein, described movable link in described 2nd direction, the side being located at described 1st mobile member respectively and opposite side.
38. 1 kinds of exposure devices, possess:
The mobile body device any one of claims 1 to 37 of set object is kept in moving body; And
The described object kept in described moving body uses energy beam to form the patterning device of predetermined pattern.
39. exposure devices as claimed in claim 38, wherein, described object is used for the substrate of type flat panel display apparatus.
40. exposure devices as claimed in claim 39, wherein, described substrate length at least or be more than 500mm to angular length.
The manufacture method of 41. 1 kinds of flat-panel screens, comprises:
Use the action that the exposure device of claim 39 or 40 makes described object expose; And
Make the action of the described object development after exposure.
42. 1 kinds of manufacturing methods, comprise:
Use the action that the exposure device of claim 38 makes described object expose; And
Make the action of the described object development after exposure.
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