JP6774038B2 - Exposure equipment and exposure method, flat panel display manufacturing method, and device manufacturing method - Google Patents

Description

The present invention relates to an exposure apparatus and an exposure method, a method for manufacturing a flat panel display, and a method for manufacturing a device. More specifically, the object is irradiated with illumination light while moving the object in the first direction to obtain the object. The present invention relates to an exposure apparatus and an exposure method for scanning exposure, a method for manufacturing a flat panel display using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements and semiconductor elements (integrated circuits, etc.), masks or reticle (hereinafter collectively referred to as "masks") and glass plates or wafers (hereinafter, hereinafter, "masks") are used. A step-and-scan type exposure apparatus that transfers a pattern formed on a mask onto a substrate using an energy beam while synchronously moving the “substrate”) along the scanning direction (scanning direction). It is used.

In this type of exposure device, a fine movement stage that holds the substrate is supported from below by the weight canceling device, and a guide member that guides the movement of the weight canceling device in the cross scan direction is provided together with the weight canceling device in the scanning direction. It is known to have a substrate stage device that can be moved to (see, for example, Patent Document 1).

Here, with the recent increase in the size of the substrate, the substrate stage device tends to increase in size and weight.

U.S. Patent Application Publication No. 2010/0266961

According to the first aspect of the present invention, in an exposure apparatus that irradiates an object with illumination light while moving the object in the first direction and scans and exposes the object, an object holding portion that holds the object. , A support portion that supports the object holding portion, a first base that non-contactly supports the support portion, and a second direction that intersects the first direction are arranged on both sides of the support portion and the first base. A pair of a driving unit that moves the object holding unit in the first direction and a pair of driving units arranged on both sides of the first base and the first base in the second direction. includes a second base, a non-contact supported by said second base, and a measuring unit for measuring the position of the object-holding portion about a third direction crossing the first direction and the second direction, wherein drive unit, so that the scanning exposure for the object held in front Symbol object-holding portion is performed, the relative movement in the first direction the support portion for supporting the object-holding portion relative to said first base is allowed, the measuring unit, in the scanning exposure, an exposure apparatus by the drive unit is relatively moved to said first direction with respect to the second base for measuring the position of the object-holding portion about the third direction, Provided.

According to the second aspect of the present invention, the exposure device according to the first aspect is used to expose the substrate used for the flat panel display device as the object, and to develop the exposed object. A method of manufacturing a flat panel display including, is provided.

According to a third aspect of the present invention, there is provided a device manufacturing method including exposing the object using the exposure apparatus according to the first aspect and developing the exposed object. To.

According to a fourth aspect of the present invention, in an exposure method in which an object is moved in a first direction, the object is irradiated with illumination light, and the object is scanned and exposed, an object holding unit that holds the object. The support portion is supported by the support portion, the support portion is non-contactly supported by the first base, and the support portion that supports the object holding portion is moved in the first direction with respect to the first base. A pair of firsts arranged on both sides of the first base with respect to a second direction intersecting the first direction during the scan exposure and the scanning exposure of the object on the object holding portion by relative movement. for two base, a non-contact supported measuring unit to the second base are relatively moved to said first direction, the about third direction intersecting to said first direction and the second direction by said measuring unit An exposure method including measuring the position of an object holding portion is provided.

It is a figure which shows schematic the structure of the liquid crystal exposure apparatus which concerns on 1st Embodiment. It is a side view of the substrate stage apparatus which the liquid crystal exposure apparatus of FIG. 1 has. It is a top view of the substrate stage apparatus which the liquid crystal exposure apparatus of FIG. 1 has. FIG. 4A is a sectional view taken along line BB of the substrate stage apparatus of FIG. 3, and FIG. 4B is a diagram in which some elements are removed from the substrate stage apparatus of FIG. 4A. It is a top view of the substrate stage apparatus which concerns on the modification (the 1) of 1st Embodiment. 6 (A) is a sectional view taken along line CC of FIG. 5, and FIG. 6 (B) is a view in which some elements are removed from the substrate stage device of FIG. 6 (A). It is a figure which shows the substrate stage apparatus which concerns on the modification (the 2) of 1st Embodiment. It is a DD line sectional view of the substrate stage apparatus of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (3) of the 1st Embodiment. It is a figure for demonstrating the operation of the substrate stage apparatus of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 4) of 1st Embodiment. It is a figure which shows the substrate stage apparatus which concerns on the modification (No. 5) of 1st Embodiment. It is a figure which shows the substrate stage apparatus which concerns on 2nd Embodiment. FIG. 3 is a sectional view taken along line EE of the substrate stage apparatus of FIG. It is a top view of the substrate stage apparatus of FIG. FIG. 15 is a sectional view taken along line FF of the substrate stage apparatus of FIG. It is a figure which shows the arrangement of the Z sensor in the substrate stage apparatus of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 1) of the 2nd Embodiment. FIG. 8 is a cross-sectional view taken along the line GG of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 2) of the 2nd Embodiment. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 3) of the 2nd Embodiment. FIG. 21 is a cross-sectional view taken along the line HH of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 4) of the 2nd Embodiment. FIG. 2 is a cross-sectional view taken along the line II of FIG.

<< First Embodiment >>
Hereinafter, the first embodiment will be described with reference to FIGS. 1 to 4 (B).

FIG. 1 schematically shows the configuration of the liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan system in which a rectangular (square) glass substrate P (hereinafter, simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is used as an exposure object. It is a projection exposure device, a so-called scanner.

The liquid crystal exposure apparatus 10 resists the illumination system 12, the mask stage apparatus 14 holding the mask M on which the circuit pattern and the like are formed, the projection optical system 16, the apparatus main body 18, and the surface (the surface facing the + Z side in FIG. 1). It has a substrate stage device 20A for holding the substrate P coated with (sensitizer), a control system for these, and the like. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 during exposure is defined as the X-axis direction, and the directions orthogonal to the X-axis in the horizontal plane are defined as the Y-axis direction, the X-axis, and the Y-axis. The orthogonal directions will be the Z-axis direction, and the rotation directions around the X-axis, the Y-axis, and the Z-axis will be the θx, θy, and θz directions, respectively.

The lighting system 12 is configured in the same manner as the lighting system disclosed in, for example, US Pat. No. 5,729,331. The illumination system 12 irradiates the mask M with the illumination light IL for exposure. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm) (or the composite light of the i-line, g-line, and h-line) is used.

The mask stage device 14 has a mask stage 14a made of a plate-shaped member having an opening formed in the central portion. The mask stage 14a attracts and holds the outer peripheral edge of the mask M inserted into the opening by the support hand 14b. The mask stage 14a is mounted on a pair of stage guides 14c fixed to a lens barrel platen 18a which is a part of the apparatus main body 18, and is mounted in a scanning direction (X) by, for example, a mask stage drive system (not shown) including a linear motor. It is driven with a predetermined long stroke in the axial direction), and is appropriately slightly driven in the Y-axis direction and the θz direction. The position information (including the rotation amount information in the θz direction) of the mask stage 14a in the XY plane is obtained by using the mask interferometer 14d fixed to the lens barrel surface plate 18a and using the bar mirror 14e fixed to the mask stage 14a. Be done. The mask interferometer 14d includes a plurality of X mask interferometers and a plurality of Y mask interferometers, and the bar mirror 14e includes an X bar mirror corresponding to the X mask interferometer and a Y bar mirror corresponding to the Y mask interferometer. Although included respectively, FIG. 1 typically shows only the Y-mask interferometer and the Y-bar mirror.

The projection optical system 16 is arranged below the mask stage 14a and is supported by the lens barrel surface plate 18a. The projection optical system 16 is configured in the same manner as the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system 16 includes a plurality of projection optical systems (multi-lens projection optical systems) in which the projection regions of the pattern image of the mask M are arranged in a staggered pattern, and is a single rectangular shape having the Y-axis direction as the longitudinal direction. It functions in the same way as a projection optical system with one image field. In the present embodiment, as each of the plurality of projection optical systems, for example, a system that forms an erect image with a telecentric equal-magnification system on both sides is used.

Therefore, when the illumination region on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light passing through the mask M causes the circuit pattern of the mask M in the illumination region via the projection optical system 16. The projected image (partially upright image) of is formed in the irradiation region (exposure region) of the illumination light IL conjugated to the illumination region on the substrate P. Then, by synchronously driving the mask stage device 14 and the substrate stage device 20A, the mask M is moved relative to the illumination region (illumination light IL) in the scanning direction, and the substrate P is relative to the exposure region (illumination light IL). By moving the light relative to the scanning direction, scanning exposure of one shot region on the substrate P is performed, and the pattern formed on the mask M is transferred to the shot region. That is, in the liquid crystal exposure apparatus 10, a pattern of the mask M is generated on the substrate P by the illumination system 12 and the projection optical system 16, and the sensitive layer (resist layer) on the substrate P is exposed by the illumination light IL on the substrate P. The pattern is formed.

The apparatus main body 18 includes a lens barrel surface plate 18a, a pair of side columns 18b, and a substrate stage mount 18c. The lens barrel surface plate 18a is composed of a plate-shaped member parallel to the XY plane, and supports the mask stage device 14 and the projection optical system 16. One of the pair of side columns 18b supports the vicinity of the + Y side end of the lens barrel surface plate 18a from below, and the other supports the vicinity of the −Y side end of the lens barrel surface plate 18a from below. The side column 18b is made of a plate-shaped member parallel to the XZ plane, and is installed on the floor 11 of the clean room via the vibration isolator 18d. As a result, the apparatus main body 18 (and the mask stage apparatus 14, the projection optical system 16) is oscillatedly separated from the floor 11.

The substrate stage pedestal 18c is made of a plate-shaped member parallel to the XY plane, and is erected between the vicinity of the lower ends of the pair of side columns 18b. As shown in FIG. 2, a plurality of substrate stage mounts 18c are provided at predetermined intervals in the Y-axis direction (for example, two in the first embodiment). As shown in FIG. 3, a plurality of Y linear guides 19a extending in the Y-axis direction (for example, two) are fixed to the upper surface of the substrate stage mount 18c at predetermined intervals in the X-axis direction.

The substrate stage device 20A includes a plurality of (for example, three) base frames 22, a pair of X beams 24, a coarse movement stage 28, a fine movement stage 30 (not shown in FIG. 3, see FIG. 1), a weight canceling device 40, and a first. It has a step guide 50, a pair of second step guides 54, and a target stage 60.

For example, the three base frames 22 are each composed of plate-shaped members parallel to the YZ plane extending in the Y-axis direction, and are arranged parallel to each other at predetermined intervals in the X-axis direction. Note that FIG. 1 corresponds to the cross-sectional view taken along the line AA of FIG. 2, but the base frame 22 is omitted from the viewpoint of avoiding confusion in the drawings. For example, of the three base frames 22, the first base frame 22 is on the + X side of the board stage mount 18c on the + X side, and the second base frame 22 is on the -X side of the substrate stage mount 18c on the -X side. The third base frame 22 is installed on the floor 11 (see FIG. 2), for example, between two substrate stage mounts 18c, with a predetermined clearance for each of the substrate stage mounts 18c. A Y linear guide 23a extending in the Y-axis direction is fixed to the upper end surface (+ Z side end) of each of the plurality of base frames 22.

The pair of X-beams 24 are each composed of members having a rectangular cross section in YZ extending in the X-axis direction, and are arranged parallel to each other at predetermined intervals in the Y-axis direction. The pair of X beams 24 are supported by the base frame 22 from below in the vicinity of both ends in the longitudinal direction and in the center. As shown in FIG. 2, the pair of X beams 24 are connected to each other by connecting members 24a made of plate-shaped members extending in the Y-axis direction near both ends in the longitudinal direction on the lower surface thereof. Further, a spacer 24b is attached to the central portion in the longitudinal direction on the lower surface of the X beam 24. A Y slide member 23b that slidably engages with the Y linear guide 23a is fixed to the lower surfaces of the connecting member 24a and the spacer 24b. As a result, the pair of X beams 24 are guided straight in the Y-axis direction on the plurality of base frames 22. Further, the pair of X beams 24 are driven in the Y-axis direction by a Y actuator (for example, a linear motor, a feed screw device, etc.) (not shown) on a plurality of base frames 22 with a predetermined stroke. Here, the Z position of the lower surface of the pair of X beams 24 is located on the + Z side of the Z position of the upper end portion of the Y linear guide 19a fixed to the upper surface of the substrate stage mount 18c, and the pair of X beams The 24 is oscillated with respect to the substrate stage mount 18c (that is, the apparatus main body 18).

As shown in FIG. 3, an X linear guide 25a extending in the X-axis direction is fixed to the upper surface of each of the pair of X beams 24. Further, on both side surfaces of each of the pair of X beams 24, X stators 26a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction are fixed.

The coarse movement stage 28 is formed of a rectangular plate-shaped member in a plan view (viewed from the + Z direction), and is mounted on the pair of X beams 24. An opening 28a is formed in the central portion of the coarse movement stage 28. As shown in FIG. 4A, the lower surface of the coarse motion stage 28 is slidably engaged with the X linear guide 25a, and together with the X linear guide 25a, an X slide member constituting the X linear guide device 25. A plurality of 25b (for example, four for one X linear guide 25a) are fixed. As a result, the coarse motion stage 28 is guided straight in the X-axis direction on the pair of X beams 24.

Further, in the lower surface of the coarse movement stage 28, the region on the opening 28a + Y side and the region on the −Y side, a pair of X movers 26b face the X stator 26a via the fixing plate 27. It is attached. The X mover 26b has a coil unit, and together with the corresponding X stator 26a, constitutes an X linear motor 26 for driving the coarse movement stage 28 on the pair of X beams 24 in the X-axis direction. Further, the coarse movement stage 28 is restricted from moving relative to the pair of X beams 24 in the Y-axis direction by the action of the X linear guide device 25, and is integrated with the pair of X beams 24 in the Y-axis direction. Moving. That is, the pair of X-beams 24 and the coarse-moving stage 28 form a so-called gantry-type two-axis stage device.

Returning to FIG. 1, the fine movement stage 30 is composed of a rectangular parallelepiped member having a low height, and is arranged above the coarse movement stage 28. A substrate holder 32 is fixed to the upper surface of the fine movement stage 30. The substrate holder 32 sucks and holds the substrate P placed on the upper surface thereof, for example, by vacuum suction. In FIG. 3, the fine movement stage 30 and the substrate holder 32 are not shown from the viewpoint of avoiding the complexity of the drawings. A Y bar mirror 34y having a reflecting surface orthogonal to the Y axis is fixed to the side surface of the fine movement stage 30 on the −Y side via a mirror base 33. Further, as shown in FIG. 2, an X bar mirror 34x having a reflecting surface orthogonal to the X axis is fixed to the side surface of the fine movement stage 30 on the −X side via a mirror base 33.

The fine movement stage 30 is 3 free on the coarse movement stage 28 by a fine movement stage drive system including a plurality of voice coil motors including a stator fixed to the coarse movement stage 28 and a mover fixed to the fine movement stage 30. It is slightly driven in the degree direction (X-axis, Y-axis, θz direction). The plurality of voice coil motors include, for example, two X voice coil motors 36x (not shown in FIG. 1) and, for example, two Y voice coil motors 36y (not shown in FIG. 2, see FIG. 1). In FIG. 2, for example, two X voice coil motors 36x overlap each other in the depth direction of the paper surface. Further, in FIG. 1, for example, two Y voice coil motors 36y overlap each other in the depth direction of the paper surface.

The fine movement stage 30 is guided to the coarse movement stage 28 in a non-contact manner by the thrust (electromagnetic force) generated by the plurality of voice coil motors, whereby the coarse movement stage 28 and the X-axis direction and / or the Y-axis are induced. It moves in a predetermined stroke in a direction. Further, the fine movement stage 30 is appropriately slightly driven in the three degrees of freedom direction with respect to the coarse movement stage 28 by a plurality of voice coil motors.

Further, as shown in FIG. 1, the fine movement stage drive system has a plurality of Z voice coil motors 36z for finely driving the fine movement stage 30 in the directions of θx, θy, and three degrees of freedom in the Z-axis direction. There is. The plurality of Z voice coil motors 36z are arranged at locations corresponding to, for example, the four corners of the fine movement stage 30 (in FIG. 1, only two of the four Z voice coil motors 36z are shown, and the other two are shown. Is hidden behind the page). A configuration of a fine movement stage drive system that includes a plurality of voice coil motors is disclosed, for example, in US Patent Application Publication No. 2010/0018950.

As shown in FIG. 2, the X position information of the fine movement stage 30 is obtained by using an X bar mirror 34x with an X laser interferometer 38x fixed to the apparatus main body 18 via a member called an interferometer column 18e. Be done. Further, the Y position information of the fine movement stage 30 is obtained by using the Y bar mirror 34y by the Y laser interferometer 38y fixed to the apparatus main body 18 as shown in FIG. A plurality of X laser interferometers 38x and Y laser interferometers 38y are provided (in FIGS. 1 and 2, they overlap in the depth direction of the paper surface), so that the θz position information of the fine movement stage 30 can be obtained. It has become.

As shown in FIG. 4A, a plurality of (for example, for example) information on the positions of the fine movement stage 30 in the Z-axis, θx, and θy directions (hereinafter referred to as Z / tilt positions) are attached to the lower surface of the fine movement stage 30. It is obtained by the Z sensor 38z of 4) using the target stage 60 described later. For example, the four Z sensors 38z are arranged around the Z axis at predetermined intervals. In the substrate stage device 20A, the Z position information of the fine movement stage 30 is based on the average value of the outputs of the plurality of Z sensors 38z, and the θx and θy directions of the fine movement stage 30 are based on the output difference of the plurality of Z sensors 38z. Rotation amount information is required. The type of the Z sensor 38z is not particularly limited, but for example, a laser displacement meter, a laser interferometer, or the like can be used.

As shown in FIG. 4A, the weight canceling device 40 supports the fine movement stage 30 from below via a leveling device 46 described later. The weight canceling device 40 is inserted into the opening 28a of the coarse movement stage 28, and is supported from below by the first step guide 50 described later. The weight canceling device 40 has an air bearing 42 at the lower end thereof, and the static pressure of a pressurized gas (for example, air) ejected from the air bearing 42 to the upper surface of the first step guide 50 causes the first step. It floats on the 1-step guide 50 through a predetermined clearance. Note that FIG. 4A corresponds to a sectional view taken along line BB in FIG. 3, but the base frame 22 is omitted from the viewpoint of avoiding complication of the drawings.

The weight canceling device 40 of the present embodiment has, for example, the same configuration and function as the weight canceling device disclosed in US Patent Application Publication No. 2010/0018950. That is, the weight canceling device 40 has, for example, an air spring (not shown), and the weight of the system including the fine movement stage 30, the substrate holder 32, etc. due to the upward (+ Z direction) force generated by the air spring. (The downward (−Z direction) force due to the weight acceleration) is canceled, thereby reducing the load of the plurality of Z voice coil motors 36z when the Z / tilt position control of the fine movement stage is performed.

The weight canceling device 40 is mechanically connected to the coarse movement stage 28 via a plurality of, for example, four flexure devices 44 at a Z position (center of gravity height) substantially the same as the Z position of the center of gravity. The flexure device 44 of the present embodiment has, for example, the same configuration and function as the flexure device disclosed in US Patent Application Publication No. 2010/0018950. That is, the flexure device 44 includes, for example, a thin strip-shaped steel plate arranged parallel to the XY plane and sliding devices (for example, ball joints) provided at both ends of the steel plate, and the steel plate slides. It is erected between the weight canceling device 40 and the coarse movement stage 28 via a knot device.

As shown in FIG. 3, the flexure device 44 connects the weight canceling device 40 and the coarse movement stage 28 on the + X side, the −X side, the + Y side, and the −Y side of the weight canceling device 40, respectively. As a result, when the coarse movement stage 28 moves in the X-axis direction and / or the Y-axis direction, the weight canceling device 40 is pulled by the coarse movement stage 28 via at least one of the plurality of flexure devices 44. It moves integrally with the coarse movement stage 28 in the X-axis direction and / or the Y-axis direction.

Returning to FIG. 4A, the leveling device 46 is a spherical bearing device including a base 46a and a ball 46b, and supports the fine movement stage 30 from below while freely swinging (tilting) in the θx and θy directions. , Moves along the XY plane integrally with the fine movement stage 30. The leveling device 46 is non-contactly supported by the weight canceling device 40 from below via an air bearing (not shown) attached to the weight canceling device 40, and is allowed to move relative to the weight canceling device 40 in a direction along a horizontal plane. Has been done. If the fine movement stage 30 can be tilted and supported from below, a pseudo-spherical bearing device as disclosed in, for example, US Patent Application Publication No. 2010/0018950 is used as a leveling device. Is also good.

As shown in FIG. 3, the first step guide 50 is composed of a plate-shaped member parallel to the XY plane extending in the X-axis direction, and is arranged on, for example, two substrate stage mounts 18c. The longitudinal dimension of the first step guide 50 is set to be slightly longer than the movement stroke of the fine movement stage 30 in the X-axis direction. Further, the width direction (Y-axis direction) dimension of the first step guide 50 is set to be slightly wider than the footprint of the weight canceling device 40. The upper surface of the first step guide 50 is finished with a very high flatness so as to be parallel to the XY plane (horizontal plane), and when the weight canceling device 40 (and the fine movement stage 30) moves in the X-axis direction. It functions as a guide surface for. The material of the first step guide 50 is not particularly limited, but is preferably formed by using, for example, a stone material (for example, a fine stone material such as gabbro), ceramics, cast iron, or the like.

As shown in FIG. 4B, a plurality of Y slide members 19b slidably engaged with the Y linear guide 19a are provided on the lower surface of the first step guide 50 (for example, 2 for each Y linear guide 19a). One) It is fixed. As a result, the first step guide 50 is guided straight in the Y-axis direction along the plurality of Y linear guides 19a.

As shown in FIG. 3, a pair of connecting members 50a are fixed to the + X ends of the first step guide 50 at predetermined intervals in the Y-axis direction. In the first step guide 50, the connecting member 50a on the + Y side is connected to the X beam 24 on the + Y side via the flexure device 52, and the connecting member 50a on the −Y side is connected to the X beam 24 on the −Y side via the flexure device 52. It is connected to 24. Similarly, a pair of connecting members 52a are also fixed to the −X side end of the first step guide 50, and the first step guide 50 is connected to the pair of X beams 24 by the flexure device 52 via the pair of connecting members 52a. It is connected to each. As shown in FIG. 4A, the flexure device 52 connects the first step guide 50 and the X beam 24 at a Z position (center of gravity height) substantially the same as the Z position of the center of gravity of the first step guide 50. are doing.

The configuration of the flexure device 52 is substantially the same as that of the flexure device 44 that connects the weight canceling device 40 and the coarse movement stage 28. That is, the flexure device 52 includes a thin steel plate having a thickness parallel to the XY plane extending in the Y-axis direction and slipping devices (for example, ball joints) provided at both ends of the steel plate, and the steel plate is slipped. It is erected between the first step guide 50 and the X beam 24 via an apparatus. Therefore, the first step guide 50 and the X beam 24 are integrally (highly rigid) connected in the Y-axis direction, whereas the other five degrees of freedom directions (X, Z, θx, θy, θz). Is vibrationally separated.

In the substrate stage device 20A, in order to drive the substrate P in the X-axis direction with a predetermined stroke, when the coarse movement stage 28 is driven in the X-axis direction, the weight canceling device 40 is pulled by the coarse movement stage 28 to the second position. 1 Move on the step guide 50 in the X-axis direction. Further, when the pair of X beams 24 are driven in the Y-axis direction in order to drive the substrate P in the Y-axis direction with a predetermined stroke, the weight canceling device 40 is pulled by the coarse movement stage 28 and is driven in the Y-axis direction. Moving. At this time, since the pair of X beams 24 and the first step guide 50 move integrally in the Y-axis direction (the weight canceling device 40 and the first step guide 50 do not move relative to each other in the Y-axis direction), the weight canceling device 40 does not fall out of the first step guide 50. Therefore, the width direction (Y-axis direction) of the first step guide 50 may be the minimum size that can guide the movement of the weight canceling device 40 in the X-axis direction, and can be formed lightweight.

The pair of second step guides 54 are each composed of plate-shaped members having a rectangular cross section in YZ extending in the X-axis direction, and are arranged on, for example, two substrate stage mounts 18c. One of the pair of second step guides 54 is on the + Y side of the first step guide 50, and the other is on the −Y side of the first step guide 50, respectively, with respect to the first step guide 50 via a predetermined clearance. They are arranged in parallel.

As shown in FIG. 3, the longitudinal dimension of the second step guide 54 is set to be substantially the same as that of the first step guide 50, but the width direction (Y-axis direction) dimension is from the first step guide 50. Is also set narrowly. Further, as shown in FIG. 4B, the thickness direction dimension of the second step guide 54 is set to be substantially the same as that of the first step guide 50. A Y slide member 19c that slidably engages with the Y linear guide 19a is fixed to the lower surface of the second step guide 54. As a result, the second step guide 54 is guided straight in the Y-axis direction along the plurality of Y linear guides 19a.

The upper surface of the second step guide 54 is finished with a very high flatness so as to be parallel to the XY plane (horizontal plane), and functions as a guide surface when the target stage 60, which will be described later, moves in the X-axis direction. To do. The material of the second step guide 54 is not particularly limited, but is preferably formed by using, for example, a stone material (for example, a dense stone material such as gabbro), ceramics, cast iron, an aluminum alloy, or the like.

As shown in FIG. 4A, the pair of second step guides 54 are integrally connected by a connecting member 56 made of a member having a U-shaped cross section of YZ. The first step guide 50 is inserted between the pair of facing surfaces of the connecting member 56 via a predetermined clearance. As shown in FIG. 2, a plurality of connecting members 56 are provided at predetermined intervals in the X-axis direction (for example, four in the first embodiment).

As shown in FIG. 3, connecting members 54a are fixed to both ends of the second step guide 54 in the longitudinal direction (+ X side and −X side). In the second step guide 54 on the + Y side, the connecting member 54a is connected to the X beam 24 on the + Y side via the flexure device 58, and in the second step guide 54 on the −Y side, the connecting member 54a is the flexure device 58. It is connected to the X beam 24 on the −Y side via. The configuration of the flexure device 58 is substantially the same as that of the flexure device 52 that connects the first step guide 50 and the X beam 24. As a result, when the pair of X beams 24 move in the Y-axis direction, the first step guide 50 and the pair of second step guides 54 move integrally with the pair of X beams 24 in the Y-axis direction.

The target stages 60 are arranged between the pair of X beams 24 and mounted on the pair of second step guides 54. As shown in FIG. 4B, the target stage 60 has an upper ring 61, a lower ring 62, a connecting member 63, a plurality of targets 64, and a plurality of air bearings 65.

As shown in FIG. 3, the upper ring 61 is composed of a disc-shaped member having an opening formed in the center. The lower ring 62 is made of a disc-shaped member formed with substantially the same outer diameter and inner diameter as the upper ring 61 (however, the thickness is thinner than that of the upper ring 61), as shown in FIG. 4 (B). It is arranged below the upper ring 61 (in FIG. 3, it is hidden behind the upper ring 61). The weight canceling device 40 is inserted into the openings of the upper ring 61 and the lower ring 62, respectively. The connecting member 63 is inserted between the lower surface of the upper ring 61 and the upper surface of the lower ring 62, and integrally connects the upper ring 61 and the lower ring 62. The lower ring 62 may have a smaller diameter than the upper ring 61, and the upper ring 61 is on the + Z side of the roughing stage 28 and has a larger diameter than the opening of the roughing stage 28. Is also good.

In the first embodiment, corresponding to the plurality of Z sensors 38z, for example, the four targets 64 correspond to the Z sensors in the θz direction (around the Z axis) at predetermined intervals as shown in FIG. It is fixed to the upper surface of the upper ring 61 so as to be located directly below 38z. The type of the target 64 is preferably selected according to the type of the Z sensor 38z. When, for example, a triangular survey type reflective laser displacement sensor is used as the Z sensor 38z, it is desirable to use white ceramics for the target 64, and for example, a vertical reflection type reflective laser displacement sensor is used as the Z sensor 38z. If this is the case, it is desirable to use a mirror for the target 64 (the upper surface of the upper ring 61 may be mirror-finished and the target 64 may be omitted). The area of the target 64 is set in consideration of the amount of movement when the fine movement stage 30 is slightly driven with respect to the coarse movement stage 28 (so that the measurement beam does not deviate from the target).

A plurality of (for example, four in the first embodiment) air bearings 65 are fixed to the lower surface of the lower ring 62 at predetermined intervals in the θz direction (around the Z axis). For example, of the four air bearings 65, the gas ejection surface (bearing surface) of the two air bearings 65 faces the upper surface of the second step guide 54 on one side (+ Y side), and the gas of the other two air bearings 65. The ejection surface faces the upper surface of the other (−Y side) second step guide 54. As shown in FIG. 4B, the target stage 60 is paired by the static pressure of the pressurized gas (for example, air) ejected from the plurality of air bearings 65 to the corresponding second step guide 54. It floats on the second step guide 54 of the above through a predetermined clearance.

As shown in FIG. 3, the target stage 60 is connected to the coarse movement stage 28 by a plurality of flexure devices 66. The configuration of the flexure device 66 is substantially the same as that of the flexure device 44 that connects the weight canceling device 40 and the coarse movement stage 28 (however, a plurality of flexure devices 44 are parallel to the X-axis or the Y-axis (in a plan view). While arranged (in a + shape), the plurality of flexure devices 66 extend along the X-axis or the Y-axis, for example, in a direction forming an angle of 45 °).

In the substrate stage device 20A, in order to drive the substrate P in the X-axis direction with a predetermined stroke, when the coarse movement stage 28 is driven in the X-axis direction, the target stage 60 is pulled by the coarse movement stage 28 to form a pair. The second step guide 54 is moved in the X-axis direction. Further, when the pair of X beams 24 are driven in the Y-axis direction in order to drive the substrate P in the Y-axis direction with a predetermined stroke, the target stage 60 is pulled by the coarse movement stage 28 and is driven in the Y-axis direction. Moving. At this time, the pair of X beams 24 and the pair of second step guides 54 move integrally in the Y-axis direction (the target stage 60 and the pair of second step guides 54 do not move relative to each other in the Y-axis direction). The target stage 60 does not fall off from the pair of second step guides 54.

Further, since the fine movement stage 30 is guided by the coarse movement stage 28 and moves in the X-axis and / or Y-axis directions, the target stage 60 and the fine movement stage 30 are integrally X-axis and / or Move in the Y-axis direction. Therefore, the Z sensor 38z can obtain the Z position information of the fine movement stage 30 by using the corresponding target 64 regardless of the position of the fine movement stage 30 in the XY plane.

In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is loaded into the mask stage apparatus 14 by the mask loader (not shown) under the control of the main control apparatus (not shown). At the same time, the substrate P is loaded onto the substrate holder 32 by a substrate loader (not shown). After that, the main control device executes alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a plurality of shot regions set on the substrate P are sequentially exposed by a step-and-scan method. The operation is performed. Since this exposure operation is the same as the conventional step-and-scan exposure operation, detailed description thereof will be omitted here.

During the exposure operation and the alignment operation, in the substrate stage device 20A, the substrate P is formed by a plurality of sensors 15 (autofocus sensors) fixed in the vicinity of the projection optical system 16 on the lower surface of the lens barrel platen 18a. The Z position information of the surface of the surface is obtained, and based on the outputs of the plurality of sensors 15, the Z position of the exposure region on the substrate P is located within the depth of focus of the projection optical system 16. -Tilt position control is performed using a plurality of Z voice coil motors 36z.

According to the substrate stage device 20A according to the present embodiment described above, the target 64 used for obtaining the Z position information of the fine movement stage 30 is attached to the target stage 60 which is a separate member from the weight canceling device 40. Therefore, the weight canceling device 40 can be made smaller and lighter than the case where the target 64 is attached to the weight canceling device 40. Further, when the target 64 is attached to the weight canceling device 40, if the flatness of the upper surface of the first step guide 50 is low, the measurement accuracy of the Z / tilt position information of the fine movement stage 30 may decrease. On the other hand, in the substrate stage device 20A, when the Z / tilt position information of the fine movement stage 30 is obtained, the target stage 60 mounted on the pair of second step guides 54 is used, so that the first step guide is tentatively used. Even if the flatness of the upper surface of the 50 is low, since the upper surface of the second step guide 54 functions as a measurement reference surface, there is no problem in the measurement accuracy of the Z / tilt position information of the fine movement stage 30.

Further, since the Z / tilt position of the fine movement stage 30 can be controlled with high accuracy by a plurality of Z voice coil motors 36z, even if the flatness of the upper surface of the first step guide 50 is lowered, the fine movement stage 30 If the measurement accuracy of the Z / tilt position information can be ensured, the Z / tilt position control of the fine movement stage 30 can be performed with high accuracy. Therefore, it is not necessary to take measures such as increasing the rigidity of the first step guide 50 in order to secure the flatness of the upper surface of the first step guide 50. Therefore, the first step guide 50 can be made smaller (thinner) and lighter.

The configuration of the substrate stage device 20A according to the first embodiment can be appropriately modified. Hereinafter, a modified example of the first embodiment will be described. In the modified example of the first embodiment described below, elements having the same configuration and function as those of the first embodiment are designated by the same reference numerals and detailed description thereof will be omitted as appropriate.

<< Modified Example of First Embodiment (Part 1) >>
5 to 6 (B) show the substrate stage device 20B according to the modified example (No. 1) of the first embodiment (note that in FIG. 5, the fine movement stage 30 (FIG. 6 (A)) is shown. See) is not shown).

In the substrate stage device 20A (see FIG. 4B) of the first embodiment, the Z / tilt position information of the fine movement stage 30 is the target 64 attached to the target stage 60 by a plurality of Z sensors 38z. In contrast to the substrate stage apparatus 20B shown in FIG. 6B, the substrate stage apparatus 20B is different in that it is determined by using the upper surfaces of the pair of second step guides 54 by the plurality of Z sensors 38z. The drive system of the pair of second step guides 54 is included, and the other elements are the same as those of the first embodiment as shown in FIGS. 5 and 6 (A).

When, for example, a triangulation type reflection type laser displacement sensor is used for the Z sensor 38z, a strip-shaped member made of white ceramics is used as a target (reference surface for measuring Z / tilt position information) of the second step guide 54. It is preferable to attach it to the upper surface (in order to make the second step guide 54 itself function as a target, the second step guide 54 itself may be formed of ceramics, or ceramics or the like may be formed by thermal spraying on the metal surface). .. When, for example, a vertical reflection type reflection type laser displacement sensor is used for the Z sensor 38z, a band-shaped mirror that covers almost the entire upper surface of the second step guide 54 may be attached to the second step guide 54 ( Alternatively, almost the entire upper surface of the second step guide 54 may be mirror-finished).

According to the substrate stage apparatus 20B, the configuration is simple as compared with the substrate stage apparatus 20A of the first embodiment because it does not have the target stage 60 (see FIG. 3). Further, since the inertial mass is reduced, the position controllability of the coarse movement stage 28 (that is, the substrate P) is improved. Further, the linear motor for driving the coarse movement stage 28 can also be miniaturized. Further, since the target stage 60 is not mounted on the second step guide 54, it is not necessary to take measures such as increasing the rigidity of the second step guide 54. Therefore, the second step guide 54 can be made smaller (thinner) and lighter.

<< Modified Example of First Embodiment (Part 2) >>
7 and 8 show the substrate stage device 20C according to the modified example (No. 2) of the first embodiment. In the substrate stage device 20A of the first embodiment, as shown in FIG. 4A, the weight canceling device 40 supports the fine movement stage 30 from below via the leveling device 46 on the first step guide 50. In contrast to the configuration, as shown in FIG. 8, the substrate stage device 20C is different in that the leveling device 78 is directly mounted on the first step guide 70A. Although not shown, the first step guide 70A is mechanical with respect to the pair of X beams 24 (not shown in FIGS. 7 and 8; see FIG. 1 and the like) as in the first embodiment. It is connected to and moves in the Y-axis direction integrally with the pair of X beams 24. Further, the coarse motion stage 28 is mounted on the pair of X beams 24, is driven in the X-axis direction on the pair of X beams 24, and moves in the Y-axis direction together with the pair of X beams 24.

As shown in FIG. 7, the first step guide 70A has a guide main body 71, an air spring 72, and a pair of Z voice coil motors 73, and also functions as a weight canceling device and a Z actuator. As shown in FIG. 8, the guide main body 71 has a lower plate portion 71a, an upper plate portion 71b, and a pair of guide plates 71c. The lower plate portion 71a and the upper plate portion 71b are each composed of rectangular plate-shaped members parallel to the XY plane extending in the X-axis direction, and are arranged parallel to each other at predetermined intervals in the Z-axis direction. The upper plate portion 71b is guided by a pair of guide plates 71c (or a linear guide device (not shown) fixed to the lower plate portion 71a and can move in the Z-axis direction with respect to the lower plate portion 71a.

The air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b, and supports the central portion of the upper plate portion 71b from below. A pressurized gas is supplied to the air spring 72 from the outside, and an upward force in the direction of gravity that balances the weight of the system including the fine movement stage 30 (including the leveling device 78) is applied to the upper plate portion 71b. A plurality of air springs 72 may be arranged at predetermined intervals in the X-axis direction.

One of the pair of Z voice coil motors 73 is arranged near the + X side end of the first step guide 70A, and the other is arranged near the −X side end of the first step guide 70A. The Z voice coil motor 73 includes a stator 73a fixed to the lower plate portion 71a and a mover 73b fixed to the upper plate portion 71b, and when the Z position control of the fine movement stage 30 is performed, the upper plate portion The 71b is driven in the Z-axis direction (position control in the θx and θy directions of the fine movement stage 30 is performed via the fine movement stage drive system as in the above embodiment).

The leveling device 78 is a spherical bearing device including a base 78a and a ball 78b, and supports the fine movement stage 30 from below so as to swing (tilt operation) in the θx and θy directions, and is integrally with the fine movement stage 30. It moves along the XY plane. The base 78a is inserted into the opening 28a of the roughing stage 28, and has an air bearing (not shown) whose gas ejection surface (bearing surface) faces the −Z side (lower side). The leveling device 78 floats on the first step guide 70A through a predetermined clearance due to the static pressure of the pressurized gas (for example, air) ejected from the base 78a to the upper surface of the upper plate portion 71b. ..

As shown in FIG. 8, the Z / tilt position information of the fine movement stage 30 is the second step guide 54 by the plurality of Z sensors 38z, as in the case of the substrate stage device 20B (FIGS. 5 to 6 (B)). (The target stage 60 (see FIG. 3) may be used as in the first embodiment above).

In the substrate stage device 20C, the distance between the upper surface of the coarse movement stage 28 and the lower surface of the fine movement stage 30 can be shortened, so that the overall height dimension of the substrate stage device 20C is lowered. Further, since the inertial mass is reduced, the position controllability of the coarse movement stage 28 (that is, the substrate P) is improved. Further, the linear motor for driving the coarse movement stage 28 can also be miniaturized.

<< Modified Example of First Embodiment (Part 3) >>
FIG. 9 shows the substrate stage device 20D according to the modified example (No. 3) of the first embodiment. The board stage device 20D has a different configuration of the first step guide 70B as compared with the board stage device 20C (see FIGS. 7 and 8). Hereinafter, only the differences will be described.

The first step guide 70B includes a guide main body 74 made of a hollow rectangular parallelepiped (box-shaped) member extending in the X-axis direction, and a plurality of Z actuators 75 housed in the guide main body 74. The rigidity of the upper surface portion of the guide main body 74 is set to be lower than that of the lower surface portion, for example, by reducing the thickness. The plurality of Z actuators 75 are arranged at predetermined intervals in the X-axis direction, and press the upper surface portion of the guide main body 74 toward the + Z side. The type of the Z actuator 75 is not particularly limited, but since the driving amount of the upper surface portion is very small, for example, an air cylinder, a piezo element, or the like can be used.

In the substrate stage device 20D, as schematically shown in FIG. 10, the fine movement stage 30 is driven in the Z-axis direction by a plurality of Z actuators 75 (not shown in FIG. 10, see FIG. 9). Here, the upper surface portion of the guide main body 74 is deformed by being pressed by the plurality of Z actuators 75 and is inclined with respect to the horizontal plane, but since the fine movement stage 30 is supported via the leveling device 78, fine movement is performed. There is no problem with the Z / tilt control of the stage 30. Further, in FIG. 10, the deformation (deflection) of the upper surface portion of the guide main body 74 is exaggerated more than it actually is in order to facilitate understanding. The board stage device 20D can also obtain the same effect as the board stage device 20C.

<< Modified Example of First Embodiment (Part 4) >>
FIG. 11 shows the substrate stage device 20E according to the modified example (No. 4) of the first embodiment. The board stage device 20E has a different configuration of the first step guide 70C as compared with the board stage device 20D (see FIG. 9). Hereinafter, only the differences will be described.

The first step guide 70B (see FIG. 9) of the substrate stage device 20D drives the fine movement stage 30 in the Z-axis direction by using a plurality of Z actuators 75 arranged in the X-axis direction, whereas FIG. 11 shows. As shown, the first step guide 70C is different in that the pair of cam devices 76 drives the fine movement stage 30 in the Z-axis direction.

The pair of cam devices 76 have a lower plate portion 71a and an upper plate portion 71b, one in the vicinity of the + X side end of the first step guide 70C and the other in the vicinity of the −X side end of the first step guide 70C, respectively. It is inserted between. The cam device 76 has a lower wedge 76c mounted on a base plate 76a fixed to the lower plate portion 71a so as to be movable in the X-axis direction via an X linear guide device 76b, and a lower wedge 76c fixed to the upper plate portion 71b. It includes an upper wedge 76d arranged to face the wedge 76c and an actuator 76e that drives the lower wedge 76c in the X-axis direction. The substrate stage device 20E can also obtain the same effect as the substrate stage apparatus 20D.

<< Modified Example of First Embodiment (Part 5) >>
FIG. 12 shows the substrate stage device 20F according to the modified example (No. 5) of the first embodiment. The board stage device 20F has a leveling device 78 (see FIGS. 7 and 8) and a plurality of Z voice coil motors 36z (see FIG. 7) as compared with the board stage device 20C (see FIGS. 7 and 8). The points that are not provided and the configuration of the first step guide 70D are different. Hereinafter, only the differences will be described.

In the first step guide 70D, an air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b in the same manner as in the first step guide 70A (see FIGS. 7 and 8), and a plurality of Z voice coil motors are provided. The upper plate portion 71b is driven by the 73. The first step guide 70D does not have a guide plate 71c (see FIG. 8) like the first step guide 70A. Further, for example, two Z voice coil motors 73 are arranged in the vicinity of the end of the first step guide 70D on the + X side (or −X side) at predetermined intervals in the Y-axis direction (in FIG. 12). It overlaps in the depth direction of the paper). That is, the plurality of Z voice coil motors 73 are arranged at three locations that are not on the same straight line.

An air bearing 79 with the bearing surface facing the −Z side is attached to the central portion of the lower surface of the fine movement stage 30. The fine movement stage 30 is formed on the first step guide 70D through a predetermined clearance (non-contact) by the static pressure of the pressurized gas (for example, air) ejected from the air bearing 79 onto the upper surface of the first step guide 70D. Ascending (in state).

In the substrate stage device 20F, a plurality of Z voice coil motors 73 appropriately drive the upper plate portion 71b in the Z-axis direction and / or in the direction of tilting with respect to the horizontal plane (θx and θy directions), whereby the fine movement stage 30 Z. Tilt control is performed. According to the substrate stage apparatus 20F, the configuration is further simpler than that of the substrate stage apparatus 20C (see FIGS. 7 and 8). Similar to the substrate stage device 20D (see FIG. 9), the upper plate portion 71b may be tilted by using a plurality of Z actuators 75 (however, a plurality of Z actuators 75 are arranged at predetermined intervals in the Y-axis direction). Similar to the substrate stage device 20E (see FIG. 11). The upper plate portion 71b may be tilted by using a plurality of cam devices 76 (provided that they are arranged at three locations that are not on the same straight line).

<< Second Embodiment >>
Next, the second embodiment will be described with reference to FIGS. 13 to 17. The configuration of the liquid crystal exposure apparatus according to the second embodiment is the same as that of the first embodiment except for the configuration of the substrate stage apparatus 20G, and therefore has the same configuration and functions as those of the first embodiment. The elements are designated by the same reference numerals and detailed description thereof will be omitted as appropriate.

As shown in FIG. 4B, in the substrate stage apparatus 20A of the first embodiment, the first step guide 50 is a mechanical linear guide apparatus (Y linear guide 19a, Y slide) on the substrate stage pedestal 18c. As shown in FIG. 13, in the substrate stage apparatus 20G of the second embodiment, the first step guide 55 is mounted on the pair of base frames 80, while the first step guide 55 is mounted via the member 19b). The point is different. Further, in the first embodiment, as shown in FIG. 2, for example, two substrate stage mounts 18c are provided, whereas the substrate stage mount 18f of the second embodiment is shown in FIG. As shown, it consists of a single plate-like member. Therefore, the substrate stage device 20G does not have a base frame 22 (see FIG. 2) that supports the central portion of the X beam 24 in the longitudinal direction.

One of the pair of base frames 80 is the + X side of the board stage pedestal 18f and is between the board stage pedestal 18f and the base frame 22, and the other is the −X side of the board stage pedestal 18f and is the board stage pedestal 18f. It is arranged between the base frame 22 and the substrate stage pedestal 18f and the base frame 22 with a predetermined clearance, respectively. Note that in FIGS. 14 and 16, the base frame 22 is not shown (and the X beam 24 is also shown in FIG. 16) from the viewpoint of avoiding confusion in the drawings.

The base frame 80 is composed of a plate-shaped member parallel to the XZ plane extending in the Y-axis direction (see FIG. 15), and is installed on the floor 11 via a support plate 81 and a vibration isolator 82. The first step guide 55 is a pair of base frames 80 via a Y linear guide device including a Y linear guide 84 fixed to the base frame 80 and a Y slide member 19b fixed to the lower surface of the first step guide 55. It is mounted on the top and can move in the Y-axis direction with a predetermined stroke. Therefore, the first step guide 55 is oscillated with respect to the apparatus main body 18 and the pair of base frames 22. As shown in FIG. 15, the first step guide 55 is mechanically connected to the pair of X beams 24 via a plurality of flexure devices 52 as in the first embodiment, and the pair It moves in the Y-axis direction integrally with the X beam 24 of. The first step guide 55 is set to have a slightly larger thickness direction than that of the first embodiment in order to suppress bending due to its own weight.

As shown in FIG. 14, the second step guide 54 includes a Y linear guide 19a fixed to the substrate stage mount 18f and a Y fixed to the lower surface of the second step guide 54, as in the first embodiment. It is mounted on the substrate stage pedestal 18f via a Y linear guide device including a slide member 19c, and can be moved in a predetermined stroke in the Y-axis direction. Further, as shown in FIG. 15, both ends of the pair of second step guides 54 in the longitudinal direction are integrally connected by a connecting member 54b. Similar to the first embodiment, the pair of second step guides 54 are mechanically connected to the pair of X beams 24 via a plurality of flexure devices 58 (not shown in FIGS. 13 and 14). It moves integrally with the pair of X beams 24 in the Y-axis direction.

Also in the second embodiment, as shown in FIGS. 16 and 17, similarly to the first embodiment, the second step guide 54 is used by the plurality of Z sensors 38z attached to the fine movement stage 30. The Z / tilt position information of the fine movement stage 30 is required.

According to the board stage device 20G of the second embodiment, since the first step guide 55 supporting the weight canceling device 40 is supported by the base frame 80, the board stage pedestal 18f is compared with the first embodiment. Rigidity in the direction of gravity is not required. Therefore, the substrate stage mount 18f can be made thinner and lighter.

Further, an eccentric load acts on the substrate stage pedestal 18f according to the position of the fine movement stage 30 (and the weight canceling device 40), but in the second embodiment, the member mounted on the substrate stage pedestal 18f. Is only a pair of second step guides 54, so that the influence of the eccentric load is smaller than that of the first embodiment. The Z / tilt position information of the fine movement stage 30 may be obtained by using the target stage 60 (see FIG. 4A) as in the first embodiment, without using the second step guide 54. ..

The configuration of the substrate stage device 20G according to the second embodiment can be appropriately modified. Hereinafter, a modified example of the substrate stage device 20G according to the second embodiment will be described. In the modified example of the second embodiment described below, the elements having the same configuration and function as those of the second embodiment are designated by the same reference numerals and detailed description thereof will be omitted as appropriate.

<< Modified Example of the Second Embodiment (Part 1) >>
18 and 19 show the substrate stage device 20H according to the modified example (No. 1) of the second embodiment. In the second embodiment, the Z / tilt position information of the fine movement stage 30 was obtained by a plurality of Z sensors 38z using the second step guide 54, as shown in FIG. 17, whereas FIG. In the substrate stage apparatus 20H shown in 18 and FIG. 19, the difference is that the plurality of Z sensors 38z are obtained by using the upper surface of the substrate stage pedestal 18g.

In the substrate stage device 20H, for example, a triangulation type reflection type laser displacement sensor is used as the Z sensor 38z, and the upper surface of the substrate stage mount 18g can cover the moving region of the fine movement stage 30 in the XY plane. A target 69 having an area of, for example, made of a plate-shaped member made of white ceramics is attached. When, for example, a vertical reflection type reflection type laser displacement sensor is used as the Z sensor 38z, it is preferable to mirror-process the upper surface of the substrate stage mount 18g (or attach a mirror to the upper surface of the substrate stage mount 18g).

According to the board stage device 20H, since the Y linear guide for guiding the first step guide 55 in the Y-axis direction is not provided on the board stage stand 18g, the upper surface of the board stage stand 18g is directly targeted as a target. Can be used. As described above, the substrate stage apparatus 20H is not provided with the second step guide 54 as compared with the substrate stage apparatus 20G of the second embodiment shown in FIG. 13 and the like, and therefore, the substrate stage apparatus 20G is not provided. The substrate stage stand 18g can be made thinner and lighter than the above. Further, since the second step guide 54 is not provided, an unbalanced load does not act on the substrate stage mount 18g.

<< Modified Example of Second Embodiment (Part 2) >>
FIG. 20 shows the substrate stage device 20I according to the modified example (No. 2) of the second embodiment. The substrate stage apparatus 20I includes the substrate stage apparatus 20G (see FIGS. 13 to 17) according to the second embodiment and the substrate stage apparatus 20C (FIG. 7) according to a modification (No. 2) of the first embodiment. And FIG. 8).

That is, as shown in FIG. 20, in the substrate stage apparatus 20I, the first step guide 70A has a function as a Z actuator and a weight canceling apparatus, similarly to the substrate stage apparatus 20C. Further, the first step guide 70A is mounted on the pair of base frames 80 like the substrate stage device 20G, and is oscillatedly separated from the substrate stage pedestal 18f and the X beam 24. According to the substrate stage device 20I, the effect of the modified example (No. 2) of the first embodiment can be obtained together with the effect of the second embodiment. That is, in the substrate stage device 20I, the weight of the substrate stage pedestal 18f can be reduced, and the position controllability of the coarse movement stage 28 (that is, the substrate P) is improved.

<< Modified Example of Second Embodiment (Part 3) >>
21 and 22 show a substrate stage device 20J according to a modification (No. 3) of the second embodiment. In the substrate stage apparatus 20A (see FIG. 1 and the like) according to the first embodiment and the substrate stage apparatus 20G (see FIG. 13 and the like) according to the second embodiment, the pair of X beams 24 and the coarse motion stage 28 As a result, the so-called gantry type 2-axis stage device was configured, whereas in the substrate stage device 20J, the so-called gantry type 2 was formed by the first step guide 57 supporting the weight canceling device 40 and the coarse movement stage 28. The difference is that the shaft stage device is configured.

The first step guide 57 is composed of a plate-shaped member having a rectangular YZ cross section extending in the X-axis direction, and both ends in the longitudinal direction are similar to the substrate stage device 20G (see FIG. 13 and the like) according to the second embodiment. Is supported from below by the base frame 80 installed on the floor 11, and is oscillatedly separated from the apparatus main body 18. Although not shown in FIGS. 21 and 22, the first step guide 57 is driven by an actuator such as a linear motor (or a feed screw device) with a predetermined stroke in the Y-axis direction. The first step guide 57 is wider than the first step guide 50 included in the substrate stage device 20G (see FIG. 14) of the second embodiment so that the coarse motion stage 28 can be stably supported. It is formed (the dimension in the Y-axis direction is set large).

On the lower surface of the roughing stage 28, a plurality of (for example, four) air bearings 53 whose bearing surfaces are arranged so as to face each other on the upper surface of the first step guide 57 are attached. Further, as shown in FIG. 22, a pair of mounting plates 29 are mounted on the lower surface of the roughing stage 28, and the first step guide 57 is inserted between the pair of mounting plates 29. A plurality (for example, two) of air bearings 53 are attached to each of the surfaces of the pair of attachment plates 29 facing the side surfaces of the first step guide 57. As a result, the coarse movement stage 28 can be moved along the first step guide 57 with a predetermined stroke in the X-axis direction with low friction, and the relative movement in the Y-axis direction with respect to the first step guide 57 is restricted. To. The coarse movement stage 28 is set in the first step by an X linear motor including an X stator (not shown) fixed to the first step guide 57 and an X mover (not shown) fixed to the coarse movement stage 28. The guide 57 is driven with a predetermined stroke in the X-axis direction.

The Z / tilt position information of the fine movement stage 30 is obtained by using the upper surfaces of the pair of second step guides 54 by a plurality of Z sensors 38z, similarly to the substrate stage device 20B (see FIGS. 5 to 6B). Be done. The pair of second step guides 54 are connected to the first step guide 57 via a flexure device (not shown), and are pulled by the first step guide 57 to connect with the first step guide 57 in the Y-axis direction. Move in one piece. Since the first step guide 57 is wider than the first step guide 50 included in the substrate stage device 20G (see FIG. 14) of the second embodiment, the distance between the pair of second step guides 54 is also the substrate. It is wider than the stage device 20G.

According to the substrate stage apparatus 20J, as compared with the substrate stage apparatus 20G (see FIG. 13 and the like) according to the second embodiment, the configuration is larger because it does not have a pair of X beams 24 (see FIGS. 13 to 17). It's easy. Further, since the first step guide 57 is oscillated with respect to the apparatus main body 18, the reaction force when driving the coarse motion stage 28 does not act on the apparatus main body 18. The target used for obtaining the Z / tilt position information of the fine movement stage 30 may be attached to the weight canceling device 40.

<< Modified Example of the Second Embodiment (Part 4) >>
23 and 24 show the substrate stage device 20K according to the modified example (No. 4) of the second embodiment. The substrate stage device 20K relates to the substrate stage device 20J (see FIGS. 21 and 22) according to the modified example (No. 3) of the second embodiment and the modified example (No. 2) of the first embodiment. It has a configuration similar to that in combination with the substrate stage device 20C (see FIGS. 7 and 8).

That is, as shown in FIG. 23, the first step guide 70E of the substrate stage device 20K has, for example, two Z voice coil motors 73 between the lower plate portion 77a and the upper plate portion 77b constituting the main body portion 77. , And the air spring 72 is inserted, and it also functions as a Z actuator and a weight canceling device in the same manner as the first step guide 70A (see FIG. 7) of the substrate stage device 20C. As shown in FIG. 24, the lower plate portion 77a and the upper plate portion 77b of the first step guide 70E are slightly wider than the first step guide 70A (see FIG. 8) of the substrate stage apparatus 20C, respectively. It is formed.

Further, on the lower surface of the roughing stage 28, a plurality of (for example, four) air bearings 53 whose bearing surfaces are arranged so as to face each other on the upper surface of the upper plate portion 77b are attached. Further, as shown in FIG. 24, a pair of mounting plates 29 are mounted on the lower surface of the roughing stage 28, and the first step guide 70E is inserted between the pair of mounting plates 29. A plurality (for example, two) of air bearings 53 are attached to each of the surfaces of the pair of attachment plates 29 facing the side surfaces of the upper plate portions 77b. As a result, the coarse movement stage 28 can be moved along the first step guide 70E with a predetermined stroke in the X-axis direction with low friction, and the relative movement in the Y-axis direction with respect to the first step guide 70E is restricted. To. The coarse movement stage 28 is attached to the first step guide 70E by an X linear motor including an X stator 88a fixed to the upper surface of the upper plate portion 77b and an X mover 88b fixed to the lower surface of the rough movement stage 28. It is driven along the X-axis direction with a predetermined stroke. Although not shown in FIG. 24, the upper plate portion 77b is restricted from moving in the X-axis direction and the Y-axis direction with respect to the lower plate portion 77a. Further, the air bearing 53 attached to the pair of attachment plates 29 may be configured to face the side surface of the lower plate portion 77a.

Further, an air bearing 48 whose bearing surface faces the + Z side is attached to the central portion of the upper surface of the roughing stage 28, and the leveling device 46 is non-contactly supported from below. The Z / tilt position information of the fine movement stage 30 is obtained by using the upper surface of the second step guide 54 by a plurality of Z sensors 38z, as in the case of referring to the substrate stage device 20B (FIGS. 5 to 6 (B)). In the first step guide 70E, the weight of the system including the coarse movement stage 28 and the fine movement stage 30 is canceled by the air spring 72, so that the coarse movement stage 28 and the fine movement stage 30 are driven in the Z-axis direction. The load on the Z voice coil motor 73 is reduced. In the first step guide 70E, the coarse movement stage 28 and the fine movement stage 30 were driven in the Z-axis direction by the Z voice coil motor 73, but instead of this, as in the first step guide 70B shown in FIG. A plurality of Z actuators 75 may be used, or a pair of cam devices 76 may be used as in the first step guide 70C shown in FIG.

Further, the configurations of the first and second embodiments described above (including modified examples thereof; the same applies hereinafter) can be appropriately changed. For example, in the first and second embodiments, the first step guide 50 and the pair of second step guides 54 are each moved in the Y-axis direction by being pulled by the pair of X beams 24. However, the X position may be controlled independently of the pair of X beams 24 by an actuator such as a linear motor.

Further, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm) or KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F2 laser light (wavelength 157 nm). As the illumination light, for example, infrared region or visible region single wavelength laser light oscillated from a DFB semiconductor laser or fiber laser is amplified by a fiber amplifier doped with erbium (or both erbium and itterbium), for example. However, a harmonic whose wavelength is converted to infrared light using a non-linear optical crystal may be used. Further, a solid-state laser (wavelength: 355 nm, 266 nm) or the like may be used.

Further, the projection optical system 16 is a multi-lens type projection optical system including a plurality of projection optical units, but the number of projection optical units is not limited to this, and one or more projection optical units may be used. Further, the projection optical system is not limited to the multi-lens type, and may be, for example, a projection optical system using a large mirror of the Offner type. Further, in the above embodiment, the case where the projection optical system PL is used with the same projection magnification has been described, but the present invention is not limited to this, and the projection optical system may be either a reduction system or an enlargement system.

A light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting mask substrate was used, and is disclosed in, for example, US Pat. No. 6,778,257. As shown above, an electronic mask (variable molding mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on the electronic data of the pattern to be exposed, for example, a non-light emitting image display element (spatial light modulator). A variable molding mask using a DMD (Digital Micro-mirror Device), which is a kind of (also called), may be used.

Further, the moving body device (stage device) for moving an object along a predetermined two-dimensional plane is not limited to an exposure device, but is an object that performs a predetermined process on the object, such as an object inspection device used for inspecting an object. It may be used as a treatment device. Further, as the exposure apparatus, it can be applied to a step-and-repeat type exposure apparatus and a step-and-stitch type exposure apparatus.

As an exposure apparatus, an exposure apparatus that exposes a substrate having a size (including outer diameter, diagonal length, and at least one of one side) of 500 mm or more, for example, a large substrate for a flat panel display such as a liquid crystal display element. It is especially effective to apply it.

The application of the exposure apparatus is not limited to the exposure apparatus for liquid crystal that transfers the liquid crystal display element pattern to a square glass plate, for example, an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, and a DNA chip. It can be widely applied to an exposure apparatus for manufacturing such as. Further, in order to manufacture masks or reticle used not only in microdevices such as semiconductor elements but also in optical exposure equipment, EUV exposure equipment, X-ray exposure equipment, electron beam exposure equipment and the like, glass substrates or silicon wafers and the like are used. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern to a cathode ray. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. When the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a film-like (flexible sheet-like member) is also included.

For electronic devices such as liquid crystal display elements (or semiconductor elements), a step of designing the function and performance of the device, a step of manufacturing a mask (or reticle) based on this design step, and a step of manufacturing a glass substrate (or wafer). Except for the etching apparatus of each of the above-described embodiments, the lithography step of transferring the mask (reticle) pattern to the glass substrate by the exposure method, the development step of developing the exposed glass substrate, and the portion where the resist remains. It is manufactured through an etching step of removing an exposed member of a portion by etching, a resist removing step of removing a resist that is no longer needed after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-mentioned exposure method is executed using the exposure apparatus of the above embodiment, and the device pattern is formed on the glass substrate, so that a device having a high degree of integration can be manufactured with high productivity. ..

As described above, the exposure apparatus and exposure method of the present invention are suitable for exposing an object. Further, the method for manufacturing a flat panel display of the present invention is suitable for manufacturing a flat panel display. Moreover, the device manufacturing method of the present invention is suitable for the production of microdevices.

10 ... Liquid crystal exposure device, 20A ... Substrate stage device, 24 ... X beam, 28 ... Coarse movement stage, 30 ... Fine movement stage, 38z ... Z sensor, 40 ... Weight canceling device, 50 ... First step guide, 54 ... Second Step guide, 60 ... target stage, 64 ... target.

Claims (15)

In an exposure apparatus that irradiates an object with illumination light while moving the object in the first direction and scans and exposes the object.
An object holding unit that holds the object and
A support portion that supports the object holding portion and
A first base that non-contactly supports the support portion and
With respect to the second direction intersecting the first direction, a drive unit arranged on both sides of the support portion and the first base and moving the object holding portion in the first direction,
With respect to the second direction, a pair of second bases arranged between the drive unit arranged on both sides of the first base and the first base, respectively.
A measuring unit that is non-contact supported by the second base and measures the position of the object holding unit in a third direction that intersects the first direction and the second direction.
With
The drive unit, so that the scanning exposure for the object held in front Symbol object-holding portion is made, relative to said first direction said support portion for supporting the object-holding portion relative to said first base Move,
The measuring unit is an exposure device that is moved relative to the second base in the first direction by the driving unit during the scanning exposure to measure the position of the object holding unit in the third direction. The exposure apparatus according to claim 1, further comprising an adjusting unit that adjusts the position of the object holding unit in the third direction based on the measurement result of the measuring unit. The measuring unit has a sensor unit that emits laser light and a target unit that is irradiated with the laser light.
The sensor unit is provided on the object holding unit and is provided.
Before SL target unit, the exposure apparatus according to claim 1 or 2 is supported on the second base. A first supporting device for supporting the the previous SL first base and said second base,
The exposure device according to any one of claims 1 to 3, further comprising a second support device that is arranged apart from the first support device in the first direction and supports the drive unit. The drive unit includes a first drive unit that moves the support unit that supports the object holding unit in the first direction with respect to the first base, and the first drive unit that supports the first drive unit and the first base. The exposure apparatus according to claim 4, further comprising a second drive unit that moves the second base in the second direction with respect to the second support device. A first connection portion that connects the support portion and the drive portion,
A second connecting unit for connecting the measuring unit and the driving unit is provided.
According to claim 4 or 5, the drive unit moves the support unit that supports the object holding unit and the measurement unit in the first direction via the first connection unit and the second connection unit. The exposure apparatus according to the description. A first connection device that connects the first base and the drive unit,
A second connection device for connecting the second base and the drive unit is provided.
The driving unit according to any one of claims 4 to 6 for moving the first base and the second base in the second direction via the first connecting device and the second connecting device. The exposure apparatus according to the description. The first base is any one of claims 1 to 7, which supports the support portion in a non-contact manner so that the support portion can move relative to the first direction and the second direction on the first base. The exposure apparatus according to. The exposure apparatus according to any one of claims 1 to 8, further comprising a connecting member for connecting the plurality of second bases provided apart from each other in the second direction. The exposure apparatus according to any one of claims 1 to 9, wherein the object is a substrate used for a flat panel display apparatus. The exposure apparatus according to claim 10, wherein the substrate has at least one side length or a diagonal length of 500 mm or more. To expose the object using the exposure apparatus according to claim 10 or 11.
A method of manufacturing a flat panel display, comprising developing the exposed object. To expose the object using the exposure apparatus according to any one of claims 1 to 9.
A device manufacturing method comprising developing the exposed object. In an exposure method in which an object is irradiated with illumination light while being moved in the first direction and the object is scanned and exposed.
To support the object holding portion that holds the object by the supporting portion ,
The support portion is non-contactly supported by the first base, and
The support portion that supports the object holding portion is moved relative to the first base in the first direction, and the object on the object holding portion is subjected to scanning exposure.
During the scanning exposure, the measuring unit is non-contact supported by the second base with respect to the pair of second bases arranged on both sides of the first base with respect to the second direction intersecting the first direction . and the first direction by relatively moving, measuring the position of the object-holding portion about a third direction intersecting to said first direction and the second direction by said measuring unit,
Exposure method including. The exposure method according to claim 14, further comprising adjusting the position of the object holding unit in the third direction based on the measurement result of the measuring unit.

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