JP2019113868A - Exposure device and exposure method, and production method of flat panel display, and production method of device - Google Patents

Abstract

To provide a method of simplifying a structure of a substrate stage device.SOLUTION: A substrate stage device 20A includes: a first step guide 50 extending in a scanning direction (X-axis direction) and capable of moving a position along a cross-scanning direction (Y axis direction); a slow moving stage 30 that is supported from the lower side by the first step guide 50, can move a position along a scanning direction along a top surface of the first step guide 50, and can move a position along a cross-scanning direction together with the first step guide 50; and a position measuring system that obtains Z-tilt information of the slow moving stage 30 by using a Z sensor 38z provided on the slow moving stage 30 with a top surface of the second step guide 54 as a reference surface.SELECTED DRAWING: Figure 4

Description

  The present invention relates to an exposure apparatus, an exposure method, a method of manufacturing a flat panel display, and a method of manufacturing a device, and more specifically, illuminating light onto an object while moving the object in a first direction to The present invention relates to an exposure apparatus and an exposure method for scanning exposure, a method of manufacturing a flat panel display using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

  Conventionally, in a lithography process for manufacturing an electronic device (micro device) such as a liquid crystal display element or a semiconductor element (integrated circuit etc.), a mask or reticle (hereinafter collectively referred to as "mask") and a glass plate or wafer (hereinafter referred to A step-and-scan type exposure apparatus that transfers a pattern formed on a mask onto a substrate using an energy beam while synchronously moving the substrate (generally called “substrate”) along a scanning direction (scanning direction) It is used.

  In this type of exposure apparatus, a fine movement stage for holding a substrate is supported from below by a weight cancellation apparatus, and a guide member for guiding the movement of the weight cancellation apparatus in the cross scan direction is a scanning direction together with the weight cancellation apparatus. Patent Document 1 discloses one having a movable substrate stage device.

  Here, with the increase in size of substrates in recent years, the size of the substrate stage apparatus tends to be increased and the weight thereof is increased.

U.S. Patent Application Publication No. 2010/026691

  According to a first aspect of the present invention, an exposure apparatus that emits illumination light to an object while moving the object in a first direction, and scans and exposes the object, the object holding unit holding the object A support portion for supporting the object holding portion, a first base supporting the support portion in a non-contact manner, and a second base disposed on both sides of the first base in a second direction intersecting the first direction And a measurement unit supported by the second base in a non-contact manner and measuring a position of the object holding unit in a third direction intersecting the first direction and the second direction; The scanning exposure of the object held by the object holding unit is performed by moving the supporting unit to be supported relative to the first base in the first direction, and the measurement unit performs the scanning exposure. To the second base An exposure device for measuring the position of the object-holding portion about the third direction while relatively moving to the first direction Te is provided.

  According to a second aspect of the present invention, there is provided using the exposure apparatus according to the first aspect to expose a substrate used in a flat panel display device as the object, and developing the exposed object. A method of manufacturing a flat panel display, is provided.

  According to a third aspect of the present invention, there is provided a device manufacturing method comprising: exposing the object using the exposure apparatus according to the first aspect; and developing the exposed object. Ru.

  According to a fourth aspect of the present invention, in an exposure method of irradiating illumination light onto the object while moving the object in a first direction, and scanning exposure of the object, the object holding unit for holding the object is provided. Supporting the object holding portion, supporting the support portion on the first base in a non-contact manner, and supporting the object holding portion in the first direction with respect to the first base Moving relative to each other to scan and expose the object on the object holding unit, and second scanning means disposed on both sides of the first base in a second direction intersecting the first direction during the scanning exposure And moving the measurement unit relative to the base in the first direction, and measuring the position of the object holding unit in a third direction intersecting the first direction and the second direction. A method is provided.

It is a figure showing roughly the composition of the liquid crystal exposure device concerning a 1st embodiment. It is a side view of the substrate stage apparatus which the liquid-crystal exposure apparatus of FIG. 1 has. It is a top view of the substrate stage apparatus which the liquid-crystal exposure apparatus of FIG. 1 has. FIG. 4A is a cross-sectional view of the substrate stage device of FIG. 3 taken along the line B-B, and FIG. 4B is a diagram in which some elements are removed from the substrate stage device of FIG. It is a top view of the substrate stage device concerning the modification (the 1) of a 1st embodiment. 6 (A) is a cross-sectional view taken along the line C-C in FIG. 5, and FIG. 6 (B) is a view in which some elements are removed from the substrate stage device of FIG. 6 (A). It is a figure which shows the substrate stage apparatus which concerns on the modification (the 2) of 1st Embodiment. It is the DD sectional view taken on the line of the substrate stage apparatus of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 3) of 1st Embodiment. It is a figure for demonstrating the operation | movement of the substrate stage apparatus of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 4) of 1st Embodiment. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 5) of 1st Embodiment. It is a figure showing the substrate stage device concerning a 2nd embodiment. It is the EE sectional view taken on the line of the substrate stage apparatus of FIG. It is a top view of the substrate stage apparatus of FIG. It is the FF sectional view taken on the line of the substrate stage apparatus of FIG. It is a figure which shows arrangement | positioning of Z sensor in the substrate stage apparatus of FIG. It is a figure showing the substrate stage device concerning the modification (the 1) of a 2nd embodiment. It is the GG sectional view taken on the line of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 2) of 2nd Embodiment. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 3) of 2nd Embodiment. It is the HH sectional view taken on the line of FIG. It is a figure which shows the substrate stage apparatus which concerns on the modification (the 4) of 2nd Embodiment. It is the II sectional view taken on the line of FIG.

First Embodiment
Hereinafter, a first embodiment will be described based on FIGS. 1 to 4B.

  The configuration of a liquid crystal exposure apparatus 10 according to the first embodiment is schematically shown in FIG. The liquid crystal exposure apparatus 10 is a step-and-scan method in which a rectangular (square-shaped) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display (flat panel display) is an exposure object. It is a projection exposure apparatus, a so-called scanner.

  The liquid crystal exposure apparatus 10 is a resist on an illumination system 12, a mask stage apparatus 14 for holding a mask M on which a circuit pattern and the like are formed, a projection optical system 16, an apparatus body 18, and a surface (a surface facing + Z in FIG. 1). It has a substrate stage device 20A for holding a substrate P coated with (sensitive agent), a control system of these, and the like. Hereinafter, the direction in which the mask M and the substrate P are scanned relative to the projection optical system 16 at the time of exposure is taken as the X axis direction, and the direction orthogonal to the X axis in the horizontal plane is the Y axis direction, the X axis and the Y axis Description will be made with the direction orthogonal to the Z axis direction, and the rotational directions about the X axis, the Y axis, and the Z axis as θx, θy, and θz directions, respectively.

  The illumination system 12 is configured in the same manner as the illumination system disclosed in, for example, US Pat. No. 5,729,331. The illumination system 12 illuminates the mask M with illumination light IL for exposure. As the illumination light IL, for example, light such as i-ray (wavelength 365 nm), g-ray (wavelength 436 nm), h-ray (wavelength 405 nm) or the like (or combined light of the i-ray, g-ray and h-ray) is used.

  The mask stage device 14 has a mask stage 14a formed of a plate-like member having an opening formed at its central portion. The mask stage 14a sucks and holds the outer peripheral edge portion of the mask M inserted into the opening by the support hand 14b. The mask stage 14a is mounted on a pair of stage guides 14c fixed to a lens barrel base 18a which is a part of the apparatus main body 18, and for example, a mask stage drive system (not shown) including a linear motor scans the scanning direction (X While being driven with a predetermined long stroke in the axial direction), it is appropriately slightly driven in the Y-axis direction and the θz direction. Position information (including rotation amount information in the θz direction) of the mask stage 14a in the XY plane is obtained by the mask interferometer 14d fixed to the lens barrel surface plate 18a using the bar mirror 14e fixed to the mask stage 14a. Be The mask interferometer 14d includes a plurality of X mask interferometers and Y mask interferometers, respectively, and the bar mirror 14e includes an X bar mirror corresponding to the X mask interferometer and a Y bar mirror corresponding to the Y mask interferometer. Although each is included, only the Y mask interferometer and the Y bar mirror are representatively shown in FIG.

  The projection optical system 16 is disposed below the mask stage 14a, and is supported by the barrel base 18a. The projection optical system 16 is configured in the same manner as, for example, the projection optical system disclosed in US Pat. No. 6,552,775. That is, the projection optical system 16 includes a plurality of projection optical systems (multi-lens projection optical systems) in which projection areas of the pattern image of the mask M are arranged in a staggered manner, and a rectangular single unit having the Y axis direction as the longitudinal direction. It works the same as a projection optical system with one image field. In the present embodiment, as each of the plurality of projection optical systems, for example, one that forms an erecting correct image by a both-side telecentric equal-magnification system is used.

  Therefore, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light passing through the mask M causes the circuit pattern of the mask M in the illumination area via the projection optical system 16 The projected image (partial erect image) of the light source is formed on the irradiation area (exposure area) of the illumination light IL conjugated to the illumination area on the substrate P. Then, by synchronously driving the mask stage device 14 and the substrate stage device 20A, the mask M is moved relative to the illumination area (illumination light IL) in the scanning direction, and the substrate P relative to the exposure area (illumination light IL) Is moved in the scanning direction, scanning exposure of one shot area on the substrate P is performed, and the pattern formed on the mask M is transferred to the shot area. That is, in the liquid crystal exposure apparatus 10, a pattern of the mask M is generated on the substrate P by the illumination system 12 and the projection optical system 16, and exposure of the sensitive layer (resist layer) on the substrate P by the illumination light IL is performed on the substrate P. The pattern is formed.

  The apparatus main body 18 includes a lens barrel base 18a, a pair of side columns 18b, and a substrate stage mount 18c. The lens barrel base 18 a is formed of a plate-like member parallel to the XY plane, and supports the mask stage device 14 and the projection optical system 16. One of the pair of side columns 18b supports the vicinity of the end portion on the + Y side of the barrel surface plate 18a from below, and the other supports the vicinity of the end portion on the −Y side of the barrel surface plate 18a from below. The side column 18b is formed of a plate-like member parallel to the XZ plane, and is installed on the floor 11 of the clean room via the vibration isolation device 18d. As a result, the device body 18 (and the mask stage device 14, the projection optical system 16) is vibrationally separated from the floor 11.

  The substrate stage mount 18c is formed of a plate-like member parallel to the XY plane, and is bridged between the lower end portions of the pair of side columns 18b. As shown in FIG. 2, a plurality of (for example, two in the first embodiment) substrate stage mounts 18 c are provided at predetermined intervals in the Y-axis direction. On the upper surface of the substrate stage mount 18c, as shown in FIG. 3, a plurality (for example, two) of Y linear guides 19a extending in the Y axis direction are fixed at predetermined intervals in the X axis direction.

  The substrate stage device 20A includes a plurality (for example, three) of base frames 22, a pair of X beams 24, a coarse movement stage 28, and a fine movement stage 30 (not shown in FIG. 3; see FIG. 1). A step guide 50, a pair of second step guides 54, and a target stage 60 are provided.

  For example, the three base frames 22 are each formed of a plate-like member parallel to the YZ plane extending in the Y-axis direction, and are arranged in parallel to each other at a predetermined interval in the X-axis direction. 1 corresponds to a cross-sectional view taken along the line A-A in FIG. 2, but the base frame 22 is omitted from the viewpoint of avoiding the complication of the drawing. For example, among the three base frames 22, the first base frame 22 is on the + X side of the substrate stage rack 18c on the + X side, and the second base frame 22 is on the -X side of the substrate stage rack 18c on the -X side. The third base frame 22 is installed, for example, between two substrate stage mounts 18c on the floor 11 (see FIG. 2) with a predetermined clearance with respect to the substrate stage mounts 18c. A Y linear guide 23 a extending in the Y-axis direction is fixed to the upper end surface (the end on the + Z side) of each of the plurality of base frames 22.

  The pair of X beams 24 is a member having a YZ cross section rectangular shape extending in the X axis direction, and is arranged in parallel to each other at a predetermined interval in the Y axis direction. The pair of X beams 24 is supported by the base frame 22 from below in the vicinity of both end portions in the longitudinal direction and the central portion respectively. As shown in FIG. 2, the pair of X beams 24 are connected to each other by connecting members 24 a formed of plate-like members extending in the Y-axis direction in the vicinity of both longitudinal end portions of the lower surface. Further, a spacer 24 b is attached to a longitudinal center of the lower surface of the X beam 24. A Y slide member 23b slidably engaged with the Y linear guide 23a is fixed to the lower surface of the connection member 24a and the spacer 24b. Thus, the pair of X beams 24 are linearly guided in the Y axis direction on the plurality of base frames 22. Further, the pair of X beams 24 are driven in the Y axis direction with a predetermined stroke on the plurality of base frames 22 by a Y actuator (for example, a linear motor, a feed screw device, etc.) (not shown). Here, the Z position of the lower surface of the pair of X beams 24 is located on the + Z side of the Z position of the upper end portion of the Y linear guide 19a fixed to the upper surface of the substrate stage mount 18c. 24 is vibrationally separated with respect to the substrate stage mount 18 c (ie, the apparatus body 18).

  As shown in FIG. 3, an X linear guide 25 a extending in the X-axis direction is fixed to the upper surface of each of the pair of X beams 24. Further, on both side surfaces of each of the pair of X beams 24, an X stator 26a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction is fixed.

  The coarse movement stage 28 is formed of a rectangular plate-like member in plan view (as viewed from the + Z direction), and is mounted on the pair of X beams 24. An opening 28 a is formed at the central portion of the coarse movement stage 28. An X slide member slidably engaged with the X linear guide 25a on the lower surface of the coarse movement stage 28, as shown in FIG. 4A, and constitutes the X linear guide device 25 together with the X linear guide 25a. A plurality of 25b (for example, four per one X linear guide 25a) are fixed. Thereby, the coarse movement stage 28 is linearly guided in the X axis direction on the pair of X beams 24.

  A pair of X movers 26b face the X stator 26a via the fixed plate 27 on the lower surface of the coarse movement stage 28 in the region on the opening 28a + Y side and the region on the −Y side. Installed. The X mover 26b has a coil unit, and constitutes an X linear motor 26 for driving the coarse movement stage 28 in the X axis direction on the pair of X beams 24 together with the corresponding X stator 26a. Further, relative movement of the coarse movement stage 28 in the Y-axis direction with respect to the pair of X beams 24 is restricted by the action of the X linear guide device 25, and the coarse movement stage 28 is integrated with the pair of X beams 24 in the Y axis direction. Moving. That is, the pair of X beams 24 and the coarse movement stage 28 constitute a so-called gantry type biaxial stage device.

  Returning to FIG. 1, the fine adjustment stage 30 is formed of a rectangular parallelepiped member with a low height, and is disposed above the coarse adjustment stage 28. The substrate holder 32 is fixed to the upper surface of the fine adjustment stage 30. The substrate holder 32 sucks and holds the substrate P placed on the upper surface thereof, for example, by vacuum suction. In FIG. 3, the fine movement stage 30 and the substrate holder 32 are omitted from the viewpoint of avoiding the confusion of the drawing. A Y-bar mirror 34y having a reflection surface orthogonal to the Y-axis via the mirror base 33 is fixed to the side surface on the -Y side of the fine movement stage 30. Further, as shown in FIG. 2, an X-bar mirror 34 x having a reflection surface orthogonal to the X-axis is fixed via the mirror base 33 on the side surface on the −X side of the fine movement stage 30.

  Fine movement stage 30 has three free movements on coarse movement stage 28 by a fine movement stage drive system including a plurality of voice coil motors including a stator fixed to coarse movement stage 28 and a mover fixed to fine movement stage 30. The actuator is finely driven in the angular direction (X axis, Y axis, θz direction). The plurality of voice coil motors include, for example, two X voice coil motors 36x (not shown in FIG. 1) and, for example, two Y voice coil motors 36y (not shown in FIG. 2; see FIG. 1). In FIG. 2, for example, two X voice coil motors 36x overlap in the depth direction of the drawing. Further, in FIG. 1, for example, two Y voice coil motors 36 y overlap in the paper depth direction.

  Fine movement stage 30 is guided in a non-contact manner on coarse movement stage 28 by the thrust (electromagnetic force) generated by the plurality of voice coil motors, whereby X-axis direction and / or Y axis along with the coarse movement stage 28 Move in the direction with a predetermined stroke. Fine movement stage 30 is appropriately slightly driven in the direction of the three degrees of freedom with respect to coarse movement stage 28 by a plurality of voice coil motors.

  In addition, as shown in FIG. 1, the fine movement stage drive system has a plurality of Z voice coil motors 36z for slightly driving the fine movement stage 30 in three degrees of freedom in θx, θy, and Z axis directions. There is. A plurality of Z voice coil motors 36z are arranged, for example, at positions corresponding to the four corners of fine movement stage 30 (in FIG. 1, only two of four Z voice coil motors 36z are shown; Is hidden behind the paper). The configuration of the fine movement stage drive system including a plurality of voice coil motors is disclosed, for example, in US Patent Application Publication No. 2010/0018950.

  The X position information of fine movement stage 30 is obtained using X bar mirror 34 x by X laser interferometer 38 x fixed to apparatus main body 18 via a member called interferometer column 18 e as shown in FIG. 2. Be Further, as shown in FIG. 1, the Y position information of the fine movement stage 30 is obtained by the Y laser interferometer 38y fixed to the apparatus main body 18 using the Y bar mirror 34y. A plurality of X laser interferometers 38 x and Y laser interferometers 38 y are provided (in FIG. 1 and FIG. 2, respectively, in the depth direction in the drawing), so that θz position information of fine movement stage 30 can be obtained It has become.

  As shown in FIG. 4A, information on positions (hereinafter referred to as Z and tilt positions) in the Z-axis, θx, and θy directions of fine movement stage 30 are plural (for example, attached to the lower surface of fine movement stage 30) , 4) using the target stage 60 described later. For example, four Z sensors 38z are disposed at predetermined intervals around the Z axis. In substrate stage device 20A, the Z position information of fine movement stage 30 is based on the average value of the outputs of the plurality of Z sensors 38z, and the θx and θy directions of fine movement stage 30 based on the output difference of the plurality of Z sensors 38z. Rotation amount information is obtained. The type of the Z sensor 38z is not particularly limited, and for example, a laser displacement meter, a laser interferometer or the like can be used.

  The weight cancellation device 40 supports the fine movement stage 30 from below via a leveling device 46 described later, as shown in FIG. 4 (A). The weight cancellation device 40 is inserted into the opening 28 a of the coarse movement stage 28 and supported from below by a first step guide 50 described later. The weight cancellation device 40 has an air bearing 42 at its lower end, and the static pressure of the pressurized gas (for example, air) ejected from the air bearing 42 to the upper surface of the first step guide 50 It floats above the one-step guide 50 via a predetermined clearance. 4A corresponds to a cross-sectional view taken along the line B-B in FIG. 3, but the base frame 22 is omitted from the viewpoint of avoiding the confusion of the drawing.

  The weight cancellation device 40 of this embodiment has the same configuration and function as the weight cancellation device disclosed in, for example, US Patent Application Publication No. 2010/0018950. That is, the weight cancellation device 40 has, for example, an air spring (not shown), and the weight of a system including the fine movement stage 30, the substrate holder 32, and the like by the force in the gravity direction upward (+ Z direction) generated by the air spring. This cancels (the downward (-Z direction) force due to weight acceleration), and thereby reduces the load on the plurality of Z voice coil motors 36z when the Z / tilt position control of the fine movement stage is performed.

  The weight cancellation device 40 is mechanically connected to the coarse movement stage 28 via a plurality of, for example, four flexure devices 44 at a Z position (center of gravity height) substantially the same as the Z position of the center of gravity. The flexure device 44 of this embodiment has the same configuration and function as the flexure device disclosed in, for example, US Patent Application Publication No. 2010/0018950. That is, the flexure device 44 includes, for example, a thin strip-like steel plate having a thickness arranged parallel to the XY plane, and a slide device (for example, a ball joint) provided at both ends of the steel plate. It is installed between the weight cancellation device 40 and the coarse movement stage 28 via the joint device.

  As shown in FIG. 3, the flexure device 44 connects the weight cancellation device 40 and the coarse movement stage 28 on each of the + X side, the −X side, the + Y side, and the −Y side of the weight cancellation device 40. Thereby, when the coarse movement stage 28 moves in the X-axis direction and / or the Y-axis direction, the weight cancellation device 40 is pulled to the coarse movement stage 28 via at least one of the plurality of flexure devices 44, It moves in the X axis direction and / or the Y axis direction integrally with the coarse movement stage 28.

  Referring back to FIG. 4A, the leveling device 46 is a spherical bearing device including a base 46a and a ball 46b, and supports the fine movement stage 30 from below while freely swinging (tilting) in the θx and θy directions. , Moves integrally with the fine movement stage 30 along the XY plane. The leveling device 46 is noncontact supported from below by the weight cancellation device 40 via an air bearing (not shown) attached to the weight cancellation device 40, and relative movement along the horizontal surface with respect to the weight cancellation device 40 is permitted. It is done. If fine movement stage 30 can be tiltably supported from below, the pseudo-spherical bearing device as disclosed in, for example, US Patent Application Publication No. 2010/0018950 can be used as a leveling device. Also good.

  As shown in FIG. 3, the first step guide 50 is formed of a plate-like member parallel to the XY plane extending in the X-axis direction, and is disposed, for example, on two substrate stage mounts 18c. The longitudinal dimension of the first step guide 50 is set to be somewhat longer than the movement stroke of the fine movement stage 30 in the X-axis direction. Further, the dimension in the width direction (Y-axis direction) of the first step guide 50 is set to be somewhat wider than the footprint of the weight cancellation device 40. The upper surface of the first step guide 50 is finished to be very flat so as to be parallel to the XY plane (horizontal plane), and when the weight cancellation device 40 (and the fine movement stage 30) moves in the X axis direction Act as a guide surface for The material of the first step guide 50 is not particularly limited, but it is preferable to use, for example, stone (for example, dense stone such as mottled rock), ceramic, cast iron or the like.

  On the lower surface of the first step guide 50, as shown in FIG. 4B, a plurality of Y slide members 19b slidably engaged with the Y linear guide 19a (for example, 2 per one Y linear guide 19a) One) is fixed. As a result, the first step guide 50 is linearly guided in the Y-axis direction along the plurality of Y linear guides 19a.

  As shown in FIG. 3, a pair of connecting members 50 a are fixed at predetermined intervals in the Y-axis direction at the + X end of the first step guide 50. In the first step guide 50, the connecting member 50a on the + Y side is connected to the X beam 24 on the + Y side via the flexure device 52, and the connecting member 50a on the -Y side via the flexure device 52 on the -Y side Connected to 24. Similarly, a pair of connection members 52a is also fixed to the end on the -X side of the first step guide 50, and the first step guide 50 is paired with the X beams 24 by the flexure device 52 via the pair of connection members 52a. Connected to each. The flexure device 52 connects the first step guide 50 and the X beam 24 at a Z position (center of gravity height) substantially the same as the Z position of the center of gravity of the first step guide 50, as shown in FIG. 4A. doing.

  The configuration of the flexure device 52 is substantially the same as the flexure device 44 connecting the weight cancellation device 40 and the coarse movement stage 28. That is, the flexure device 52 includes a thin steel plate having a thickness parallel to the XY plane extending in the Y-axis direction, and slide devices (for example, ball joints) provided at both ends of the steel plate. It is installed between the first step guide 50 and the X beam 24 through the device. Therefore, the first step guide 50 and the X beam 24 are integrally (highly rigid) connected in the Y-axis direction, while the other five degrees of freedom (X, Z, θx, θy, θz) Are segregated vibrationally.

  In substrate stage device 20A, when coarse movement stage 28 is driven in the X-axis direction in order to drive substrate P with a predetermined stroke in the X-axis direction, weight cancellation device 40 is pulled by coarse movement stage 28 and It moves on the one-step guide 50 in the X-axis direction. Further, when the pair of X beams 24 are driven in the Y axis direction to drive the substrate P in the Y axis direction with a predetermined stroke, the weight cancellation device 40 is pulled by the coarse movement stage 28 and is moved in the Y axis direction. Moving. At this time, since the pair of X beams 24 and the first step guide 50 move integrally in the Y axis direction (the weight cancel device 40 and the first step guide 50 do not move relative to each other in the Y axis direction), the weight cancel device 40 does not drop out of the first step guide 50. Accordingly, the dimension in the width direction (Y-axis direction) of the first step guide 50 may be a minimum dimension that can guide the movement of the weight cancellation device 40 in the X-axis direction, and can be formed lightweight.

  The pair of second step guides 54 is formed of a plate-like member having a YZ cross-section rectangular shape extending in the X-axis direction, and is disposed, for example, on two substrate stage mounts 18c. One of the pair of second step guides 54 is on the + Y side of the first step guide 50, and the other is on the -Y side of the first step guide 50, respectively, with respect to the first step guide 50 via a predetermined clearance. It is arranged in parallel.

  The longitudinal dimension of the second step guide 54 is set substantially the same as that of the first step guide 50 as shown in FIG. 3, but the dimension in the width direction (Y-axis direction) is greater than that of the first step guide 50. Is also set narrow. Further, as shown in FIG. 4B, the dimension in the thickness direction of the second step guide 54 is set to be substantially the same as that of the first step guide 50. A Y slide member 19 c slidably engaged with the Y linear guide 19 a is fixed to the lower surface of the second step guide 54. As a result, the second step guide 54 is linearly guided in the Y axis direction along the plurality of Y linear guides 19a.

  The upper surface of the second step guide 54 is finished to be very high in flatness so as to be parallel to the XY plane (horizontal plane), and functions as a guide surface when the target stage 60 described later moves in the X axis direction. Do. The material of the second step guide 54 is not particularly limited, but it is preferable to use, for example, stone (for example, dense stone such as mottled rock) or ceramics, cast iron, aluminum alloy or the like.

  As shown in FIG. 4A, the pair of second step guides 54 are integrally connected by a connecting member 56 formed of a member having a U-shaped YZ cross section. The first step guide 50 is inserted between a pair of opposing surfaces of the connecting member 56 via a predetermined clearance. As shown in FIG. 2, a plurality of (for example, four in the first embodiment) connecting members 56 are provided at predetermined intervals in the X-axis direction.

  As shown in FIG. 3, connection members 54 a are fixed to both end portions of the second step guide 54 in the longitudinal direction (+ X side and −X side). The connection member 54a of the second step guide 54 on the + Y side is connected to the X beam 24 on the + Y side via the flexure device 58, and the connection member 54a of the second step guide 54 on the −Y side is the flexure device 58. Are connected to the X beam 24 on the -Y side. The configuration of the flexure device 58 is substantially the same as the flexure device 52 connecting the first step guide 50 and the X beam 24. Thus, when the pair of X beams 24 move in the Y axis direction, the first step guide 50 and the pair of second step guides 54 move in the Y axis direction integrally with the pair of X beams 24.

  The target stage 60 is disposed between the pair of X beams 24 and mounted on the pair of second step guides 54. As shown in FIG. 4B, the target stage 60 has an upper ring 61, a lower ring 62, a connection member 63, a plurality of targets 64, and a plurality of air bearings 65.

  The upper ring 61 is, as shown in FIG. 3, a disk-like member having an opening at its center. The lower ring 62 is a disk-like member formed with the same outer diameter and inner diameter as the upper ring 61 (although the thickness is thinner than the upper ring 61), as shown in FIG. 4B. , And is disposed below the upper ring 61 (in FIG. 3, it is hidden behind the upper ring 61 in the drawing). The weight cancellation device 40 is inserted into the opening of each of the upper ring 61 and the lower ring 62. The connecting member 63 is inserted between the lower surface of the upper ring 61 and the upper surface of the lower ring 62, and integrally connects the upper ring 61 and the lower ring 62. The lower ring 62 may have a smaller diameter than the upper ring 61, and the upper ring 61 may be on the + Z side of the coarse movement stage 28 and may have a larger diameter than the opening of the coarse movement stage 28. Also good.

  In the first embodiment, for example, four targets 64 corresponding to the plurality of Z sensors 38z correspond to the Z sensors at predetermined intervals in the θz direction (around the Z axis) as shown in FIG. It is fixed to the upper surface of the upper ring 61 so as to be located immediately below 38z. It is desirable to select the type of target 64 according to the type of Z sensor 38z. When, for example, a trigonometric reflection type laser displacement sensor is used as the Z sensor 38z, it is desirable to use a white ceramic as the target 64. For example, a vertical reflection type reflection laser displacement sensor is used as the Z sensor 38z. In the case where it is possible, it is desirable to use a mirror as the target 64 (the upper surface of the upper ring 61 may be mirror-finished and the target 64 may be omitted). The area of the target 64 is set in consideration of the amount of movement when the fine movement stage 30 is slightly driven with respect to the coarse movement stage 28 (so that the measurement beam does not deviate from the target).

  A plurality of (for example, four in the first embodiment) air bearings 65 are fixed to the lower surface of the lower ring 62 at predetermined intervals in the θz direction (about the Z axis). For example, out of the four air bearings 65, the gas ejection surfaces (bearing surfaces) of the two air bearings 65 face the upper surface of the second step guide 54 on one side (the + Y side), and the gas of the other two air bearings 65 The jet surface faces the top surface of the other (−Y side) second step guide 54. As shown in FIG. 4B, the target stage 60 has a pair of static pressure of pressurized gas (for example, air) ejected from the plurality of air bearings 65 to the corresponding second step guide 54. The second step guide 54 floats on the second step guide 54 through a predetermined clearance.

  The target stage 60 is connected to the coarse movement stage 28 by a plurality of flexure devices 66, as shown in FIG. The configuration of the flexure device 66 is substantially the same as the flexure device 44 connecting the weight cancellation device 40 and the coarse movement stage 28 (however, the plurality of flexure devices 44 are parallel to the X axis or Y axis (in plan view The plurality of flexure devices 66 extend in a direction forming an angle of, for example, 45 ° with respect to the X axis or the Y axis, while being arranged in a + shape).

  In substrate stage device 20A, when coarse movement stage 28 is driven in the X-axis direction in order to drive substrate P with a predetermined stroke in the X-axis direction, target stage 60 is pulled by coarse movement stage 28 and a pair is performed. The second step guide 54 is moved in the X-axis direction. Further, when the pair of X beams 24 are driven in the Y axis direction to drive the substrate P in the Y axis direction with a predetermined stroke, the target stage 60 is pulled by the coarse movement stage 28 and is moved in the Y axis direction. Moving. At this time, the pair of X beams 24 and the pair of second step guides 54 move integrally in the Y axis direction (the target stage 60 and the pair of second step guides 54 do not move relative to each other in the Y axis direction). The target stage 60 does not drop out of the pair of second step guides 54.

  In addition, since fine movement stage 30 is guided by coarse movement stage 28 and moves in the X axis direction and / or Y axis direction, target stage 60 and fine movement stage 30 integrally form the X axis and / or Move in the Y-axis direction. Therefore, the Z sensor 38z can obtain the Z position information of the fine adjustment stage 30 using the corresponding target 64 regardless of the position of the fine adjustment stage 30 in the XY plane.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask loader (not shown) loads the mask M onto the mask stage apparatus 14 under the control of the main controller (not shown). At the same time, the substrate P is loaded onto the substrate holder 32 by a substrate loader (not shown). Thereafter, alignment measurement is performed by the main controller using an alignment detection system (not shown), and after completion of the alignment measurement, step-and-scan exposure is sequentially performed on a plurality of shot areas set on the substrate P An operation is performed. Note that this exposure operation is the same as the exposure operation of the step-and-scan method which has been conventionally performed, and thus the detailed description is omitted here.

  During the exposure operation and the alignment operation, in the substrate stage device 20A, the plurality of sensors 15 (autofocus sensor) fixed on the lower surface of the lens barrel base 18a and in the vicinity of the projection optical system 16 Z position information of the surface of the substrate P is determined, and the Z position of the exposure area on the substrate P is positioned within the focal depth of the projection optical system 16 based on the outputs of the plurality of sensors 15. The tilt position control is performed using a plurality of Z voice coil motors 36z.

  According to the substrate stage device 20A according to the present embodiment described above, the target 64 used when obtaining Z position information of the fine movement stage 30 is attached to the target stage 60 which is a separate member from the weight cancellation device 40 As compared with the case where the target 64 is attached to the weight cancellation device 40, the weight cancellation device 40 can be made smaller and lighter. In addition, if the target 64 is attached to the weight cancellation device 40 and the flatness of the upper surface of the first step guide 50 is low, the measurement accuracy of the Z tilt position information of the fine movement stage 30 may be lowered. On the other hand, in the substrate stage device 20A, the target stage 60 mounted on the pair of second step guides 54 is used when obtaining the Z tilt position information of the fine movement stage 30. Therefore, temporarily the first step guide Since the upper surface of the second step guide 54 functions as a measurement reference surface even if the flatness of the upper surface of the upper surface 50 is low, there is no problem in the measurement accuracy of the Z tilt position information of the fine movement stage 30 at all.

  In addition, since the Z tilt position of fine movement stage 30 can be controlled with high accuracy by a plurality of Z voice coil motors 36 z, even if the flatness of the upper surface of first step guide 50 is lowered, If the measurement accuracy of Z and tilt position information can be secured, Z and tilt position control of fine movement stage 30 can be performed with high accuracy. Therefore, it is not necessary to take measures such as increasing the rigidity of the first step guide 50 in order to secure the flatness of the upper surface of the first step guide 50. Therefore, the first step guide 50 can be miniaturized (thinned) and lightened.

  The configuration of the substrate stage device 20A according to the first embodiment can be modified as appropriate. Hereinafter, modifications of the first embodiment will be described. In addition, in the modification of 1st Embodiment described below, regarding the element which has the structure similar to the said 1st Embodiment, and a function, the same code | symbol is attached | subjected and the detailed description is suitably abbreviate | omitted.

<< Modification of First Embodiment (Part 1) >>
FIGS. 5 to 6B show a substrate stage device 20B according to a modification (part 1) of the first embodiment (note that in FIG. 5, fine movement stage 30 (FIG. 6 (A)). See) not shown).

  In the substrate stage device 20A (refer to FIG. 4B) of the first embodiment, the Z tilt position information of the fine movement stage 30 corresponds to the target 64 attached to the target stage 60 by a plurality of Z sensors 38z. The substrate stage device 20B shown in FIG. 6B is different from the one obtained using the substrate stage in that the plurality of Z sensors 38z can be obtained using the upper surfaces of the pair of second step guides 54. The other elements including the drive system of the pair of second step guides 54 are the same as those in the first embodiment as shown in FIGS. 5 and 6A.

  When, for example, a trigonometric reflection type laser displacement sensor is used for the Z sensor 38z, a belt-like member formed of white ceramic is used as a target (a reference surface for measuring Z and tilt position information) of the second step guide 54. It is good to attach to the upper surface (in order to make the second step guide 54 itself function as a target, the second step guide 54 itself may be formed of ceramics, or ceramics etc. may be formed on the metal surface by spraying) . If, for example, a vertical reflection type reflection-type laser displacement sensor is used for the Z sensor 38z, it is preferable to attach a band-like mirror covering substantially the entire top surface of the second step guide 54 to the second step guide 54 (see FIG. Alternatively, substantially the entire top surface of the second step guide 54 may be mirror-polished).

  According to the substrate stage device 20B, since the target stage 60 (see FIG. 3) is not provided as compared with the substrate stage device 20A of the first embodiment, the configuration is simple. In addition, since the inertial mass is reduced, the position controllability of the coarse movement stage 28 (that is, the substrate P) is improved. In addition, the linear motor for driving the coarse movement stage 28 can also be miniaturized. Further, since the target stage 60 is not mounted on the second step guide 54, it is not necessary to take measures such as increasing the rigidity of the second step guide 54. Therefore, the second step guide 54 can be miniaturized (thinned) and lightened.

<< Modification of First Embodiment (Part 2) >>
FIGS. 7 and 8 show a substrate stage device 20C according to a modification (part 2) of the first embodiment. In the substrate stage device 20A of the first embodiment, as shown in FIG. 4A, the weight cancellation device 40 supports the fine adjustment stage 30 from below via the leveling device 46 on the first step guide 50. While the configuration is as shown in FIG. 8, the substrate stage device 20C differs in that the leveling device 78 is directly mounted on the first step guide 70A. Although not shown, the first step guide 70A is mechanical to the pair of X beams 24 (not shown in FIG. 7 and FIG. 8. See FIG. 1 etc.) as in the first embodiment. , And moves in the Y-axis direction integrally with the pair of X beams 24. The coarse movement stage 28 is mounted on the pair of X beams 24 and driven in the X axis direction on the pair of X beams 24 and moves in the Y axis direction together with the pair of X beams 24.

  As shown in FIG. 7, the first step guide 70A includes a guide main body 71, an air spring 72, and a pair of Z voice coil motors 73, and also functions as a weight cancellation device and a Z actuator. As shown in FIG. 8, the guide main body 71 has a lower plate portion 71a, an upper plate portion 71b, and a pair of guide plates 71c. The lower plate portion 71a and the upper plate portion 71b are rectangular plate members parallel to the XY plane extending in the X-axis direction, and arranged in parallel to each other at a predetermined interval in the Z-axis direction. The upper plate portion 71b is guided by a pair of guide plates 71c (or linear guide devices not shown) fixed to the lower plate portion 71a, and is movable in the Z-axis direction with respect to the lower plate portion 71a.

  The air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b, and supports the central portion of the upper plate portion 71b from below. Pressurized gas is supplied from the outside to the air spring 72, and an upward force in the direction of gravity is applied to the upper plate portion 71b in balance with the weight of the system including the fine movement stage 30 (including the leveling device 78). A plurality of air springs 72 may be arranged at predetermined intervals in the X-axis direction.

  One of the pair of Z voice coil motors 73 is disposed in the vicinity of the + X side end of the first step guide 70A, and the other is disposed in the vicinity of the −X side end of the first step guide 70A. Z voice coil motor 73 includes a stator 73a fixed to lower plate portion 71a and a mover 73b fixed to upper plate portion 71b, and when Z position control of fine movement stage 30 is performed, the upper plate portion 71 b is driven in the Z-axis direction (position control of the fine movement stage 30 in the θx and θy directions is performed via the fine movement stage drive system as in the above embodiment).

  The leveling device 78 is a spherical bearing device including a base 78a and balls 78b, and supports the fine adjustment stage 30 from below while freely swinging (tilting) in the θx and θy directions and integrally with the fine adjustment stage 30. Move along the XY plane. The base 78a is inserted into the opening 28a of the coarse movement stage 28 and has an air bearing (not shown) whose gas ejection surface (bearing surface) faces the -Z side (lower side). The leveling device 78 floats on the first step guide 70A through a predetermined clearance by static pressure of pressurized gas (for example, air) ejected from the base 78a to the upper surface of the upper plate portion 71b. .

  As shown in FIG. 8, the Z / tilt position information of fine movement stage 30 is provided with a plurality of Z sensors 38 z as a second step guide 54 as in the case of reference to substrate stage device 20 B (FIGS. 5 to 6 B). The target stage 60 (see FIG. 3) may be used as in the first embodiment.

  In substrate stage device 20C, since the distance between the upper surface of coarse movement stage 28 and the lower surface of fine movement stage 30 can be shortened, the overall height dimension of substrate stage device 20C is reduced. In addition, since the inertial mass is reduced, the position controllability of the coarse movement stage 28 (that is, the substrate P) is improved. In addition, the linear motor for driving the coarse movement stage 28 can also be miniaturized.

<< Modification of First Embodiment (Part 3) >>
FIG. 9 shows a substrate stage device 20D according to a modification (part 3) of the first embodiment. The substrate stage device 20D is different from the substrate stage device 20C (see FIGS. 7 and 8) in the configuration of the first step guide 70B. Only the differences will be described below.

  The first step guide 70B includes a guide main body 74 formed of a hollow rectangular parallelepiped (box-shaped) member extending in the X-axis direction, and a plurality of Z actuators 75 accommodated in the guide main body 74. The rigidity of the upper surface portion of the guide main body 74 is set to be lower than that of the lower surface portion, for example, by reducing the thickness. The plurality of Z actuators 75 are arranged at predetermined intervals in the X axis direction, and press the upper surface portion of the guide main body 74 to the + Z side. Although the type of the Z actuator 75 is not particularly limited, for example, an air cylinder, a piezo element, or the like can be used because the driving amount of the upper surface portion is very small.

  In substrate stage device 20D, fine movement stage 30 is driven in the Z-axis direction by a plurality of Z actuators 75 (not shown in FIG. 10, see FIG. 9) as schematically shown in FIG. Here, the upper surface portion of the guide main body 74 is deformed by being pressed by the plurality of Z actuators 75 and inclined with respect to the horizontal plane, but since the fine movement stage 30 is supported via the leveling device 78, the fine movement There is no problem in the Z / tilt control of the stage 30. Further, FIG. 10 shows the deformation (deflection) of the upper surface portion of the guide main body 74 in an exaggerated manner more than the actual one for ease of understanding. The substrate stage device 20D can also obtain the same effect as the substrate stage device 20C.

<< Modification of First Embodiment (Part 4) >>
FIG. 11 shows a substrate stage device 20E according to a modification (part 4) of the first embodiment. The substrate stage device 20E is different from the substrate stage device 20D (see FIG. 9) in the configuration of the first step guide 70C. Only the differences will be described below.

  While the first step guide 70B (see FIG. 9) of the substrate stage device 20D drives the fine movement stage 30 in the Z-axis direction using a plurality of Z actuators 75 arranged in the X-axis direction, FIG. As shown, the first step guide 70C is different in that the pair of cam devices 76 drive the fine adjustment stage 30 in the Z-axis direction.

  In the pair of cam devices 76, one is near the end on the + X side of the first step guide 70C, and the other is near the end on the −X side of the first step guide 70C. Is inserted between The cam device 76 is fixed to the lower plate 76a mounted on the base plate 76a fixed to the lower plate portion 71a via the X linear guide device 76b so as to be movable in the X-axis direction, and fixed to the upper plate portion 71b. It includes an upper wedge 76d disposed opposite to the wedge 76c, and an actuator 76e for driving the lower wedge 76c in the X-axis direction. The substrate stage device 20E can also obtain the same effect as the substrate stage device 20D.

<< Modified Example of the First Embodiment (Part 5) >>
FIG. 12 shows a substrate stage device 20F according to a modification (part 5) of the first embodiment. The substrate stage device 20F has a leveling device 78 (see FIGS. 7 and 8) and a plurality of Z voice coil motors 36z (see FIG. 7) as compared to the substrate stage device 20C (see FIGS. 7 and 8). However, the configuration of the first step guide 70D is different. Only the differences will be described below.

  In the first step guide 70D, the air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b as in the first step guide 70A (see FIGS. 7 and 8), and a plurality of Z voice coil motors The upper plate portion 71 b is driven by 73. The first step guide 70D does not have a guide plate 71c (see FIG. 8) like the first step guide 70A. Further, for example, two Z voice coil motors 73 are arranged at predetermined intervals in the Y-axis direction near the end on the + X side (or −X side) of the first step guide 70D, for example (FIG. 12) Overlap in the paper depth direction). That is, the plurality of Z voice coil motors 73 are arranged at three places which are not on the same straight line.

  An air bearing 79 whose bearing surface faces the −Z side is attached to the central portion of the lower surface of fine adjustment stage 30. Fine movement stage 30 is driven by a static pressure of pressurized gas (for example, air) ejected from air bearing 79 to the upper surface of first step guide 70D, through a predetermined clearance on first step guide 70D. Is rising).

  In substrate stage device 20F, fine movement stage 30 is appropriately driven by a plurality of Z voice coil motors 73 in a direction (the θx and θy directions) in which upper plate portion 71b is tilted with respect to the Z axis direction and / or the horizontal plane. Z-tilt control is performed. The substrate stage device 20F has a simpler structure than the substrate stage device 20C (see FIGS. 7 and 8). As in the case of the substrate stage device 20D (see FIG. 9), the upper plate portion 71b may be tilted using a plurality of Z actuators 75 (provided a plurality of them are arranged at predetermined intervals also in the Y axis direction), Similar to the substrate stage device 20E (see FIG. 11). The upper plate portion 71b may be tilted using a plurality of cam devices 76 (provided at three locations not on the same straight line).

Second Embodiment
Next, a second embodiment will be described using FIG. 13 to FIG. The configuration of the liquid crystal exposure apparatus according to the second embodiment is the same as that of the first embodiment except for the configuration of the substrate stage device 20G, so it has the same configuration and function as those of the first embodiment. About the element, the same numerals are attached and the detailed explanation is omitted suitably.

  As shown in FIG. 4B, in the substrate stage device 20A of the first embodiment, the first step guide 50 is a mechanical linear guide device (Y linear guide 19a, Y slide) on the substrate stage mount 18c. While the substrate stage device 20G of the second embodiment is mounted via the members 19b), as shown in FIG. 13, the first step guide 55 is mounted on the pair of base frames 80. The point is different. In the first embodiment, as shown in FIG. 2, for example, two substrate stage mounts 18c are provided, whereas in the second embodiment, a substrate stage mount 18f is provided as shown in FIG. As shown, it consists of one plate-like member. Accordingly, the substrate stage device 20G does not have the base frame 22 (see FIG. 2) that supports the longitudinal central portion of the X beam 24.

  One of the pair of base frames 80 is on the + X side of the substrate stage mount 18f and between the substrate stage mount 18f and the base frame 22, and the other is on the −X side of the substrate stage mount 18f and the substrate stage mount 18f It is disposed between the base frame 22 and the substrate stage mount 18f and the base frame 22 via a predetermined clearance, respectively. In FIGS. 14 and 16, illustration of the base frame 22 (also illustration of the X beam 24 in FIG. 16) is omitted from the viewpoint of avoiding confusion of the drawings.

  The base frame 80 is formed of a plate-like member parallel to the XZ plane extending in the Y-axis direction (see FIG. 15), and is installed on the floor 11 via the support plate 81 and the antivibration device 82. The first step guide 55 includes a pair of base frames 80 via a Y linear guide device including a Y linear guide 84 fixed to the base frame 80 and a Y slide member 19 b fixed to the lower surface of the first step guide 55. It is mounted on the top and can move in the Y-axis direction with a predetermined stroke. Therefore, the first step guide 55 is vibrationally separated with respect to the apparatus body 18 and the pair of base frames 22. The first step guide 55 is mechanically connected to the pair of X beams 24 via the plurality of flexure devices 52 as shown in FIG. Move integrally with the X beam 24 in the Y axis direction. The first step guide 55 is set to have a somewhat larger dimension in the thickness direction than the first embodiment in order to suppress bending due to its own weight.

  The second step guide 54 is, as shown in FIG. 14, similarly to the first embodiment, a Y linear guide 19a fixed to the substrate stage frame 18f and a Y fixed to the lower surface of the second step guide 54. It is mounted on the substrate stage mount 18f via a Y linear guide device composed of a slide member 19c, and can be moved in the Y axis direction with a predetermined stroke. Further, as shown in FIG. 15, the pair of second step guides 54 are integrally connected at both ends in the longitudinal direction by the connecting member 54b. Similarly to the first embodiment, the pair of second step guides 54 are mechanically connected to the pair of X beams 24 via a plurality of flexure devices 58 (not shown in FIGS. 13 and 14). It moves in the Y-axis direction integrally with the pair of X beams 24.

  Also in the second embodiment, as shown in FIG. 16 and FIG. 17, the plurality of Z sensors 38 z attached to the fine adjustment stage 30 uses the second step guide 54 as in the first embodiment. The Z tilt position information of fine movement stage 30 is obtained.

  According to the substrate stage device 20G of the second embodiment, since the first step guide 55 supporting the weight cancellation device 40 is supported by the base frame 80, compared to the first embodiment, the substrate stage mount frame 18f. Stiffness in the direction of gravity is not required. Therefore, it is possible to reduce the thickness and weight of the substrate stage mount 18f.

  In addition, although an offset load acts on the substrate stage mount 18f in accordance with the position of the fine movement stage 30 (and the weight cancellation device 40), in the second embodiment, a member mounted on the substrate stage mount 18f Since only the pair of second step guides 54 is, the influence of the above-mentioned offset load is small as compared with the first embodiment. The Z / tilt position information of fine movement stage 30 may be obtained using target stage 60 (see FIG. 4A) as in the first embodiment without using second step guide 54. .

  The configuration of the substrate stage device 20G according to the second embodiment can be modified as appropriate. Hereinafter, modifications of the substrate stage device 20G according to the second embodiment will be described. In addition, in the modification of 2nd Embodiment described below, regarding the element which has the structure similar to the said 2nd Embodiment, and a function, the same code | symbol is attached | subjected and the detailed description is suitably abbreviate | omitted.

<< Modification Example of Second Embodiment (Part 1) >>
FIGS. 18 and 19 show a substrate stage device 20H according to a modification (part 1) of the second embodiment. In the second embodiment, the Z / tilt position information of the fine movement stage 30 is obtained by using the second step guide 54 by the plurality of Z sensors 38z as shown in FIG. The substrate stage device 20H shown in FIG. 18 and FIG. 19 differs in that it can be determined using the upper surface of the substrate stage mount 18g by the plurality of Z sensors 38z.

  In the substrate stage device 20H, for example, a reflection type laser displacement sensor of triangulation method is used as the Z sensor 38z, and the upper surface of the substrate stage gantry 18g can cover the movement region in the XY plane of the fine movement stage 30. A target 69 consisting of a plate-like member having an area of, for example, a white ceramic is attached. When, for example, a reflection type laser displacement sensor of vertical reflection type is used as the Z sensor 38z, it is preferable to mirror-finish the upper surface of the substrate stage mount 18g (or attach a mirror to the upper surface of the substrate stage mount 18g).

  According to the substrate stage device 20H, since the Y linear guide for guiding the first step guide 55 in the Y-axis direction is not provided on the substrate stage mount 18g, the upper surface of the substrate stage mount 18g is used directly as a target. It can be used. As described above, in the substrate stage device 20H, the second step guide 54 is not provided as compared with the substrate stage device 20G of the second embodiment shown in FIG. 13 and the like, and accordingly, the substrate stage device 20G The substrate stage mount 18g can be thinner and lighter than the above. In addition, since the second step guide 54 is not provided, no offset load acts on the substrate stage mount 18g.

<< Modification of Second Embodiment (Part 2) >>
FIG. 20 shows a substrate stage device 20I according to a modification (part 2) of the second embodiment. The substrate stage device 20I includes a substrate stage device 20G (see FIGS. 13 to 17) according to the second embodiment and a substrate stage device 20C (FIG. 7) according to a modification (part 2) of the first embodiment. And FIG. 8) in combination.

  That is, as shown in FIG. 20, in the substrate stage device 20I, like the substrate stage device 20C, the first step guide 70A has a function as a Z actuator and a weight cancellation device. In addition, the first step guide 70A is mounted on the pair of base frames 80 as in the case of the substrate stage device 20G, and is vibrationally separated from the substrate stage mount 18f and the X beam 24. According to the substrate stage apparatus 20I, it is possible to obtain the effect of the modification (part 2) of the first embodiment, in addition to the effect of the second embodiment. That is, in the substrate stage device 20I, the weight reduction of the substrate stage mount frame 18f can be achieved, and the position controllability of the coarse movement stage 28 (that is, the substrate P) is improved.

<< Modification of Second Embodiment (Part 3) >>
FIGS. 21 and 22 show a substrate stage device 20J according to a modification (part 3) of the second embodiment. In the substrate stage device 20A (see FIG. 1 etc.) according to the first embodiment and the substrate stage device 20 G (see FIG. 13 etc.) according to the second embodiment, the pair of X beams 24 and the coarse movement stage 28 The so-called gantry-type biaxial stage device is configured, whereas in the substrate stage device 20J, the so-called gantry-type device 2 is constituted by the first step guide 57 supporting the weight cancellation device 40 and the coarse movement stage 28. The difference is that the axis stage device is configured.

  The first step guide 57 is formed of a plate member having a YZ cross-section rectangular shape extending in the X-axis direction, and both ends in the longitudinal direction are similar to the substrate stage device 20G (see FIG. 13 etc.) according to the second embodiment. Are supported from below on the base frame 80 installed on the floor 11 and are vibrationally separated from the apparatus main body 18. The first step guide 57 is driven with a predetermined stroke in the Y-axis direction by an actuator such as a linear motor (or a feed screw device) although not shown in FIGS. 21 and 22. The first step guide 57 is wider than the first step guide 50 of the substrate stage device 20G (see FIG. 14) of the second embodiment so as to stably support the coarse movement stage 28. It is formed (the dimension in the Y-axis direction is set large).

  On the lower surface of the coarse movement stage 28, a plurality of (for example, four) air bearings 53 having bearing surfaces disposed opposite to the upper surface of the first step guide 57 are attached. Further, as shown in FIG. 22, a pair of mounting plates 29 is attached to the lower surface of the coarse movement stage 28, and the first step guide 57 is inserted between the pair of mounting plates 29. A plurality of (for example, two) air bearings 53 are attached to each of the surfaces of the pair of mounting plates 29 facing the side surfaces of the first step guides 57. Thus, coarse movement stage 28 can be moved along the first step guide 57 with low friction and in the X-axis direction with a predetermined stroke, and the relative movement in the Y-axis direction with respect to the first step guide 57 is limited. Ru. The coarse movement stage 28 is a first step by an X linear motor including an X stator (not shown) fixed to the first step guide 57 and an X mover (not shown) fixed to the coarse movement stage 28. It is driven on the guide 57 with a predetermined stroke in the X-axis direction.

  Similar to the substrate stage device 20B (see FIGS. 5 to 6B), the Z tilt position information of the fine movement stage 30 is obtained using the upper surfaces of the pair of second step guides 54 by the plurality of Z sensors 38z. Be The pair of second step guides 54 is connected to the first step guide 57 via a flexure device (not shown), and by being pulled by the first step guide 57, the first step guide 57 and the first step guide 57 are combined. Move together. Since the first step guide 57 is wider than the first step guide 50 of the substrate stage device 20G (see FIG. 14) of the second embodiment, the distance between the pair of second step guides 54 is also a substrate. It is wider than the stage device 20G.

  According to the substrate stage device 20J, as compared with the substrate stage device 20G (see FIG. 13 etc.) according to the second embodiment, the configuration is the portion not having the pair of X beams 24 (see FIGS. 13 to 17). It is easy. Further, since the first step guide 57 is vibrationally separated with respect to the apparatus main body 18, a reaction force when driving the coarse movement stage 28 does not act on the apparatus main body 18. The target used when obtaining the Z tilt position information of fine movement stage 30 may be attached to weight cancellation device 40.

<< Modification of Second Embodiment (Part 4) >>
FIGS. 23 and 24 show a substrate stage device 20K according to a modification (part 4) of the second embodiment. The substrate stage device 20K is a substrate stage device 20J (see FIGS. 21 and 22) according to a modification (part 3) of the second embodiment, and a modification (part 2) according to the modification of the first embodiment. It has a configuration as combined with the substrate stage device 20C (see FIGS. 7 and 8).

  That is, as shown in FIG. 23, the first step guide 70E of the substrate stage device 20K has, for example, two Z voice coil motors 73 between the lower plate 77a and the upper plate 77b of the main body 77. The air spring 72 is inserted, and functions as a Z actuator and a weight cancellation device as well as the first step guide 70A (see FIG. 7) of the substrate stage device 20C. As shown in FIG. 24, the lower plate portion 77a and the upper plate portion 77b of the first step guide 70E are somewhat wider than the first step guide 70A (see FIG. 8) of the substrate stage device 20C. It is formed.

  Further, on the lower surface of the coarse movement stage 28, a plurality of (for example, four) air bearings 53 are provided, the bearing surfaces of which are arranged to face the upper surface of the upper plate portion 77b. Further, as shown in FIG. 24, a pair of mounting plates 29 are attached to the lower surface of the coarse movement stage 28, and the first step guide 70E is inserted between the pair of mounting plates 29. A plurality of (for example, two) air bearings 53 are attached to each of the surfaces facing the side surfaces of the upper plate portion 77 b of the pair of attachment plates 29. As a result, coarse movement stage 28 can be moved along the first step guide 70E with low friction and a predetermined stroke in the X-axis direction, and the relative movement in the Y-axis direction with respect to the first step guide 70E is limited. Ru. The coarse movement stage 28 is mounted on the first step guide 70E by an X linear motor including an X stator 88a fixed to the upper surface of the upper plate portion 77b and an X mover 88b fixed to the lower surface of the coarse movement stage 28. It is driven along the X axis direction with a predetermined stroke. Although not shown in FIG. 24, the movement of the upper plate portion 77b in the X axis direction and the Y axis direction is restricted with respect to the lower plate portion 77a. Also, the air bearings 53 attached to the pair of attachment plates 29 may be configured to face the side surface of the lower plate portion 77a.

  In addition, an air bearing 48 whose bearing surface is directed to the + Z side is attached to the upper central portion of the coarse movement stage 28, and the leveling device 46 is supported in a non-contact manner from below. The Z tilt position information of fine movement stage 30 is obtained using the upper surface of second step guide 54 by a plurality of Z sensors 38z, as in the case of the substrate stage device 20B (FIGS. 5 to 6B). In the first step guide 70E, the weight of the system including the coarse moving stage 28 and the fine moving stage 30 is canceled by the air spring 72 to drive the coarse moving stage 28 and the fine moving stage 30 in the Z-axis direction. The load on the Z voice coil motor 73 is reduced. In the first step guide 70E, the coarse movement stage 28 and the fine movement stage 30 are driven in the Z-axis direction by the Z voice coil motor 73. Instead of this, like the first step guide 70B shown in FIG. A plurality of Z actuators 75 may be used, or a pair of cam devices 76 may be used as the first step guide 70C shown in FIG.

  Further, the configuration of the first and second embodiments described above (including the modifications thereof, and the same applies to the following) can be modified as appropriate. For example, in the first and second embodiments, the first step guide 50 and the pair of second step guides 54 are configured to move in the Y axis direction by being pulled by the pair of X beams 24. However, for example, the X position may be controlled independently of the pair of X beams 24 by an actuator such as a linear motor.

  The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm) or KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F 2 laser light (wavelength 157 nm). In addition, as illumination light, for example, single wavelength laser light in the infrared region or visible region oscillated from a DFB semiconductor laser or fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium) Alternatively, harmonics of which wavelength is converted to ultraviolet light using a non-linear optical crystal may be used. Also, a solid state laser (wavelength: 355 nm, 266 nm) or the like may be used.

  Also, although the projection optical system 16 is a multi-lens type projection optical system provided with a plurality of projection optical units, the number of projection optical units is not limited to this and it is sufficient if there is one or more. Further, the projection optical system is not limited to the multi-lens type projection optical system, and may be, for example, a projection optical system using a large offner type mirror. In the above embodiment, the projection optical system PL has the same magnification. However, the present invention is not limited to this. The projection optical system may be either a reduction system or an enlargement system.

  In addition, although the light transmission type | mold mask which formed the predetermined | prescribed light shielding pattern (or phase pattern * light reduction pattern) on the transparent mask substrate was used, it is disclosed, for example in US Patent 6,778,257. An electronic mask (variable shaped mask) for forming a transmission pattern or a reflection pattern or a light emission pattern based on electronic data of a pattern to be exposed as described, for example, a non-light emitting image display device (spatial light modulator) A variable molding mask using a DMD (Digital Micro-mirror Device), which is also a kind of

  In addition, as a moving body device (stage device) for moving an object along a predetermined two-dimensional plane, not only an exposure device but an object inspection device used for inspection of an object, for example, an object that performs predetermined processing on an object You may use for a treatment apparatus. In addition, as the exposure apparatus, the present invention can be applied to a step-and-repeat exposure apparatus and a step-and-stitch exposure apparatus.

  As an exposure apparatus, an exposure apparatus for exposing a substrate having a size (including at least one of outer diameter, diagonal length, and one side) of 500 mm or more, for example, a large substrate for flat panel display such as a liquid crystal display element It is particularly effective to apply it to

  Further, the application of the exposure apparatus is not limited to an exposure apparatus for liquid crystal which transfers a liquid crystal display element pattern to a square glass plate, and, for example, an exposure apparatus for semiconductor manufacture, a thin film magnetic head, a micromachine and a DNA chip The present invention can be widely applied to an exposure apparatus for manufacturing a light source, etc. In addition, in order to manufacture not only micro devices such as semiconductor devices but also masks or reticles used in light exposure devices, EUV exposure devices, X-ray exposure devices, electron beam exposure devices, etc., glass substrates or silicon wafers etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern to a light source. The object to be exposed is not limited to the glass plate, but may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. When the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film (a sheet-like member having flexibility).

  Electronic devices such as liquid crystal display elements (or semiconductor elements) are subjected to functional function / performance design of the device, fabrication of a mask (or reticle) based on the design steps, fabrication of a glass substrate (or wafer) An exposure apparatus according to each of the above-described embodiments, a lithography step of transferring a pattern of a mask (reticle) to a glass substrate by the exposure method, a development step of developing an exposed glass substrate, and portions other than resist remaining portions. It is manufactured through an etching step of etching away the exposed member of the portion, a resist removing step of removing the unnecessary resist after etching, a device assembling step, an inspection step and the like. In this case, in the lithography step, the exposure method described above is performed using the exposure apparatus of the above embodiment, and the device pattern is formed on the glass substrate, so that a device with high integration can be manufactured with high productivity. .

  As described above, the exposure apparatus and the exposure method of the present invention are suitable for exposing an object. Also, the method of manufacturing a flat panel display of the present invention is suitable for manufacturing a flat panel display. Also, the device manufacturing method of the present invention is suitable for the production of micro devices.

  DESCRIPTION OF SYMBOLS 10 ... Liquid-crystal exposure apparatus, 20A ... Substrate stage apparatus, 24 ... X beam, 28 ... Coarse movement stage, 30 ... Fine movement stage, 38z ... Z sensor, 40 ... Weight cancellation apparatus, 50 ... 1st step guide, 54 ... 2nd Step guide, 60: Target stage, 64: Target.

Claims (15)

An exposure apparatus which irradiates illumination light to the object while moving the object in a first direction, and scans and exposes the object;
An object holding unit that holds the object;
A support unit for supporting the object holding unit;
A first base supporting the support in a non-contact manner;
A second base disposed on both sides of the first base with respect to a second direction intersecting the first direction;
A measurement unit supported by the second base in a non-contact manner and measuring a position of the object holding unit in a third direction intersecting the first direction and the second direction;
The scanning exposure of the object held by the object holding unit is performed by relatively moving the support unit supporting the object holding unit in the first direction with respect to the first base.
The exposure apparatus measures the position of the object holding unit in the third direction while moving relative to the second base in the first direction during the scanning exposure.   The exposure apparatus according to claim 1, further comprising: an adjustment unit configured to adjust the position of the object holding unit in the third direction based on the measurement result of the measurement unit. The measurement unit includes a sensor unit that emits a laser beam and a target unit that is irradiated with the laser beam.
One of the sensor unit and the target unit is provided in the object holding unit,
The exposure apparatus according to claim 1, wherein one of the sensor unit and the target unit is supported by the second base. A driving unit that moves the supporting unit that supports the object holding unit relative to the first base in the first direction, and moves the measuring unit relative to the second base in the first direction;
A first support device for supporting the first base and the second base;
The exposure apparatus according to any one of claims 1 to 3, further comprising: a second support device that is disposed apart from the first support device in the first direction and supports the drive unit.   The drive unit supports a first drive unit for moving the support unit supporting the object holding unit in the first direction with respect to the first base, and supports the first drive unit, and The exposure apparatus according to claim 4, further comprising: a second drive unit configured to move the second base with respect to the second base in the second direction. A first connection portion connecting the support portion and the drive portion;
And a second connection unit connecting the measurement unit and the drive unit,
The driving unit may move the supporting unit supporting the object holding unit and the measuring unit in the first direction via the first connection unit and the second connection unit. Exposure apparatus as described. A first connection device for connecting the first base and the drive unit;
And a second connection device connecting the second base and the drive unit,
The drive unit moves the first base and the second base in the second direction via the first connection device and the second connection device. Exposure apparatus as described.   The said 1st base supports the said support part non-contactingly so that the said support part can be relatively moved on the said 1st base to the said 1st direction and the said 2nd direction. The exposure apparatus according to.   The exposure apparatus according to any one of claims 1 to 8, further comprising a connecting member that connects the plurality of second bases provided apart from each other in the second direction.   The exposure apparatus according to any one of claims 1 to 9, wherein the object is a substrate used in a flat panel display device.   11. The exposure apparatus according to claim 10, wherein the substrate has at least one side length or a diagonal length of 500 mm or more. Exposing the object using the exposure apparatus according to claim 10 or 11;
And b. Developing the exposed object. Exposing the object using the exposure apparatus according to any one of claims 1 to 9;
Developing the exposed object. In the exposure method of irradiating illumination light onto the object while moving the object in a first direction, and scanningly exposing the object,
Supporting the object holding unit holding the object on the object holding unit;
Contactlessly supporting the support on the first base;
Moving the support portion supporting the object holding portion relative to the first base in the first direction to scan and expose the object on the object holding portion;
During the scanning exposure, the measurement unit is relatively moved in the first direction with respect to a second base disposed on both sides of the first base in a second direction intersecting the first direction, and the first direction Measuring the position of the object holder in a third direction intersecting with the second direction and the second direction;
Exposure method.   The exposure method according to claim 14, further comprising adjusting the position of the object holding unit in the third direction based on the measurement result of the measurement unit.

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