KR20150003250A - Moving body device, exposure device, flat panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

The substrate stage apparatus 20A includes a first step guide 50 extending in the scanning direction (X-axis direction) and movable in a position along the cross-scan direction (Y-axis direction) A fine stage 30 capable of moving a position along the scan direction along the upper surface of the first step guide 50 and a position along the cross scan direction together with the first step guide 50, Tilt position information of the fine movement stage 30 using the Z sensor 38z formed on the fine movement stage 30 with the upper surface of the second step guide 54 as a reference surface.

Description

TECHNICAL FIELD [0001] The present invention relates to a moving body device, an exposure apparatus, a method of manufacturing a flat panel display, and a device manufacturing method.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a moving body apparatus, an exposure apparatus, a method of manufacturing a flat panel display, and a device manufacturing method, and more particularly to a moving body apparatus for moving a moving body along a predetermined two- A method of manufacturing a flat panel display using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

2. Description of the Related Art Conventionally, in a lithography process for manufacturing electronic devices (micro devices) such as liquid crystal display devices and semiconductor devices (integrated circuits) and the like, a mask or a reticle (hereinafter collectively referred to as a & Scanning exposure method in which a pattern formed on a mask is transferred onto a substrate using an energy beam while synchronously moving the substrate (hereinafter referred to as a " substrate ") along the scanning direction (scanning direction).

In this type of exposure apparatus, a fine moving stage for holding a substrate is supported from below by a weight canceling device, and a guide member for guiding the movement of the weight canceling device in the cross scan direction is scanned together with a weight canceling device (For example, refer to Patent Document 1).

Here, with the recent increase in the size of the substrate, the substrate stage device is enlarged and the weight tends to increase.

U.S. Patent Application Publication No. 2010/0266961

According to a first aspect of the present invention, there is provided a method of moving a position along a first direction in a predetermined two-dimensional plane and a position along a second direction orthogonal to the first direction in the two- A movable member movable in a position along the first direction along a first surface supported by the guide member from below and defined by the guide member, And a position measuring system for obtaining positional information about a direction intersecting the two-dimensional plane of the moving body with a second surface defined by a member separate from the guide member as a reference surface .

According to this, since the second surface is the reference surface, accuracy is not required on the first surface of the guide member. Therefore, the configuration of the guide member can be simplified, and the mobile device can be reduced in size and weight.

According to a second aspect of the present invention, there is provided an information processing apparatus comprising: a guide member which is movable in a first direction in a predetermined two-dimensional plane and movable in a second direction in a second direction orthogonal to the first direction in the two- And a movable body movable along a first direction along a guide surface defined by the guide member and movable along with the guide member in a position along the second direction; And a driving device for driving the moving body in a direction crossing the two-dimensional plane.

According to this, since the guide member drives the moving body in the direction intersecting the two-dimensional plane, the configuration can be simplified as compared with the case where the moving body is driven in the direction crossing the two-dimensional plane by the separate driving device, , It becomes possible to reduce the weight.

According to a third aspect of the present invention, there is provided a display device comprising: a first moving member extending in a first direction in a predetermined two-dimensional plane and movable in a second direction perpendicular to the first direction within the two- A second moving member that is formed on the first movable member and movable along the first direction along the first movable member and movable in the second direction together with the first movable member; And a moving body supported by the moving member from below and guided by the second moving member to move along the two-dimensional plane.

According to this structure, the second moving member for guiding the moving body along the two-dimensional plane is movable in the first direction along the first moving member supporting the moving body from below, and is movable along the second direction together with the first moving member. Therefore, the configuration of the apparatus is simple.

According to a fourth aspect of the present invention, there is provided a moving body device according to any one of the first to third aspects of the present invention, in which a predetermined object is held on the moving body, And a pattern forming device for forming a pattern of the pattern.

According to a fifth aspect of the present invention, there is provided a method of manufacturing a flat panel display including exposing the object using the exposure apparatus according to the fourth aspect of the present invention, and developing the exposed object.

According to a sixth aspect of the present invention, there is provided a device manufacturing method including exposing an object using the exposure apparatus according to the fourth aspect of the present invention, and developing the exposed object.

1 is a view schematically showing a configuration of a liquid crystal exposure apparatus according to the first embodiment.
2 is a side view of the substrate stage device of the liquid crystal exposure apparatus of FIG.
3 is a plan view of the substrate stage apparatus of the liquid crystal exposure apparatus of FIG.
FIG. 4A is a sectional view taken along the BB line of the substrate stage device of FIG. 3, and FIG. 4B is a view showing a part of the substrate stage device of FIG.
5 is a plan view of a substrate stage device according to a modification (No. 1) of the first embodiment.
Fig. 6 (A) is a cross-sectional view taken along the line CC of Fig. 5, and Fig. 6 (B) is a view showing a part of the substrate stage device of Fig.
7 is a view showing a substrate stage apparatus according to a modification (No. 2) of the first embodiment.
8 is a cross-sectional view taken along the line DD of the substrate stage device of FIG.
9 is a view showing a substrate stage apparatus according to a modification (No. 3) of the first embodiment.
10 is a view for explaining the operation of the substrate stage device of FIG.
11 is a view showing a substrate stage apparatus according to a modification (No. 4) of the first embodiment.
12 is a view showing a substrate stage apparatus according to a modification (No. 5) of the first embodiment.
13 is a view showing the substrate stage device according to the second embodiment.
14 is a sectional view taken along line EE of the substrate stage device of Fig.
15 is a plan view of the substrate stage device of FIG.
16 is a sectional view of the substrate stage device of Fig. 15 taken along the FF line.
17 is a diagram showing the arrangement of the Z sensor in the substrate stage device of FIG.
18 is a view showing a substrate stage device related to a modification (No. 1) of the second embodiment.
19 is a sectional view taken along the line GG in Fig.
20 is a view showing a substrate stage device related to a modification (second) of the second embodiment.
21 is a view showing a substrate stage device according to a modification (No. 3) of the second embodiment.
22 is a sectional view taken along the line HH in Fig.
23 is a view showing a substrate stage apparatus according to a modification (No. 4) of the second embodiment.
24 is a sectional view taken along the line II in Fig.

&Quot; First embodiment "

Hereinafter, the first embodiment will be described with reference to Figs. 1 to 4 (B).

Fig. 1 schematically shows a configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 is a stepping / screening method in which a quadrangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used as a liquid crystal display (flat panel display) Called " scan " type projection exposure apparatus, a so-called scanner.

The liquid crystal exposure apparatus 10 includes a mask stage device 14 for holding an illumination system 12, a mask M on which circuit patterns and the like are formed, a projection optical system 16, an apparatus main body 18, a surface (+ Z A substrate stage device 20A holding a substrate P coated with a resist (sensitizer) on a surface facing the substrate stage 20A, and a control system thereof. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 at the time of exposure is referred to as the X-axis direction, the direction perpendicular to the X-axis in the horizontal plane is referred to as the Y- And a direction orthogonal to the Y-axis is referred to as a Z-axis direction, and rotational directions around X-axis, Y-axis, and Z-axis are referred to as? X,? Y, and? Z directions, respectively.

The illumination system 12 is constructed in the same manner as the illumination system disclosed in, for example, U.S. Patent No. 5,729,331. The illumination system 12 irradiates the mask M with the illumination light IL for exposure. As the illumination light IL, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm) ) Is used.

The mask stage device 14 has a mask stage 14a formed of a plate-shaped member having an opening formed at the center thereof. The mask stage 14a sucks and holds the outer peripheral edge portion of the mask M inserted in the opening by the supporting hand 14b. The mask stage 14a is mounted on a pair of stage guides 14c fixed to a lens barrel base 18a which is a part of the apparatus main body 18 and includes a mask stage driving system (not shown) including, for example, (X-axis direction) by a predetermined long stroke, and is appropriately finely driven in the Y-axis direction and the? Z direction. The position information (including the rotation amount information in the? Z direction) of the mask stage 14a in the XY plane is read by the bar interferometer 14d fixed to the barrel base plate 18a, (14e). The mask interferometer 14d includes a plurality of X mask interferometers and Y mask interferometers respectively and the bar mirror 14e includes an X bar mirror corresponding to the X mask interferometer and a Y bar mirror corresponding to the Y mask interferometer , Only a Y-mask interferometer and a Y-bar mirror are typically shown in Fig.

The projection optical system 16 is disposed below the mask stage 14a and is supported by the barrel base plate 18a. The projection optical system 16 is configured in the same manner as the projection optical system disclosed in, for example, U.S. Patent No. 6,552,775. That is, the projection optical system 16 includes a plurality of projection optical systems (multi-lens projection optical systems) in which the projection area of the pattern image of the mask M is arranged in a zigzag pattern, and a single rectangular- Lt; RTI ID = 0.0 > a < / RTI > image field. In the present embodiment, for each of a plurality of projection optical systems, for example, a system that forms an erect image with both side telecentric light sources is used.

Therefore, when the illumination region on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light that has passed through the mask M is guided by the projection optical system 16 through the mask A projection image (partial shaping phase) of a circuit pattern of the projection optical system M is formed in the irradiation region (exposure region) of the conjugate illumination light IL in the illumination region on the substrate P. [ The mask M is relatively moved in the scanning direction with respect to the illumination area (illumination light IL) by the synchronous drive of the mask stage device 14 and the substrate stage device 20A, The scanning exposure of one shot area on the substrate P is carried out by relatively moving the substrate P in the scanning direction with respect to the substrate P and the pattern formed on the mask M is transferred to the shot area. That is, in the liquid crystal exposure apparatus 10, the pattern of the mask M is generated on the substrate P by the illumination system 12 and the projection optical system 16, and the pattern on the substrate P by the illumination light IL And the pattern is formed on the substrate P by exposure of the layer (resist layer).

The apparatus main body 18 has a barrel base 18a, a pair of side columns 18b, and a substrate stage base 18c. The barrel support base 18a is made of a plate-like member parallel to the XY plane, and supports the mask stage device 14 and the projection optical system 16. One pair of side columns 18b supports the vicinity of the end on the + Y side of the barrel base 18a from below and the other supports the vicinity of the end on the -Y side of the barrel base 18a from below. The side column 18b is constituted by a plate-like member parallel to the XZ plane and is provided on the floor 11 of the clean room via the dustproof device 18d. Thereby, the apparatus main body 18 (and the mask stage apparatus 14, the projection optical system 16) are separated from the floor 11 in an oscillatory manner.

The substrate stage table 18c is formed of a plate-shaped member parallel to the XY plane, and is installed between the vicinities of the lower ends of the pair of side columns 18b. As shown in Fig. 2, a plurality of (for example, two in the first embodiment) substrate stage mounts 18c are formed at predetermined intervals in the Y-axis direction. On the upper surface of the substrate stage mount 18c, as shown in Fig. 3, a plurality of (for example, two) Y linear guides 19a extending in the Y axis direction are fixed at predetermined intervals in the X axis direction.

The substrate stage device 20A includes a plurality of (for example, three) base frames 22, a pair of X beams 24, a coarse movement stage 28, and a fine movement stage 30 (not shown in FIG. 1), a weight canceling device 40, a first step guide 50, a pair of second step guides 54, and a target stage 60.

For example, the three base frames 22 are plate-like members parallel to the YZ plane extending in the Y-axis direction, and are arranged parallel to each other at predetermined intervals in the X-axis direction. 1 corresponds to a cross-sectional view taken along the line A-A in Fig. 2, the view of the base frame 22 is omitted from the viewpoint of avoiding confusion in the drawings. For example, of the three base frames 22, the first base frame 22 is disposed on the + X side of the + X side substrate stage mount 18c, the second base frame 22 is mounted on the + The third base frame 22 is disposed on the -X side of the mount 18c and between the two substrate stage mounts 18c, for example, with a predetermined clearance interposed therebetween with respect to the substrate stage mount 18c And is provided on the floor 11 (see Fig. 2). A Y linear guide 23a extending in the Y-axis direction is fixed to the upper end surfaces (end portions on the + Z side) of each of the plurality of base frames 22.

Each of the pair of X beams 24 is made of a member having a YZ cross section that extends in the X axis direction, and is arranged parallel to each other at a predetermined interval in the Y axis direction. The pair of X beams 24 are supported on the base frame 22 from below in the vicinity of both end portions in the longitudinal direction and at the center portion thereof. As shown in Fig. 2, the pair of X beams 24 are connected to each other by a connection member 24a formed of a plate-like member extending in the Y-axis direction in the vicinity of both ends in the longitudinal direction on the lower surface thereof . A spacer 24b is attached to the center of the lower surface of the X-beam 24 in the longitudinal direction. A Y slide member 23b is fixed to a lower surface of the connecting member 24a and the spacer 24b so as to freely slide on the Y linear guide 23a. Thus, the pair of X beams 24 are linearly guided on the plurality of base frames 22 in the Y-axis direction. The pair of X beams 24 is driven in the Y axis direction with a predetermined stroke on the plurality of base frames 22 by a Y actuator (not shown) (for example, a linear motor, a thumb screw device, etc.) . The Z position of the lower surface of the pair of X beams 24 is located on the + Z side of the Z position of the upper end of the Y linear guide 19a fixed to the upper surface of the substrate stage mount 18c, The X-beam 24 is vibrationally separated relative to the substrate stage mount 18c (i.e., the apparatus body 18).

As shown in Fig. 3, an X linear guide 25a extending in the X-axis direction is fixed to the upper surface of each pair of X-beams 24. As shown in Fig. Further, on both side surfaces of each pair of X beams 24, an X stator 26a including a plurality of permanent magnets arranged at predetermined intervals in the X axis direction is fixed.

The coarse stage 28 is formed of a rectangular plate-shaped member viewed in plan (viewed from the + Z direction) and mounted on the pair of X beams 24. [ In the center of the coarse movement stage 28, an opening 28a is formed. The X linear guide 25a is engaged with the X linear guide 25a so as to freely slide on the lower surface of the coarse stage 28 as shown in FIG. A plurality of (for example, four) X slide members 25b constituting the X linear guide 25a are fixed. Thereby, the coarse movement stage 28 is guided straight on the pair of X-beams 24 in the X-axis direction.

A pair of X mover 26b is mounted on the lower surface of the coarse movement stage 28 and in each of the region on the opening 28a on the + Y side and the region on the -Y side via the fixed plate 27, And is mounted so as to oppose to the frame 26a. The X movable member 26b has an X linear motor 26 for driving the coarse stage 28 on the pair of X beams 24 in the X axis direction together with the corresponding X stator 26a, . The coarse stage 28 is limited in relative movement in the Y-axis direction with respect to the pair of X-beams 24 by the action of the X linear guide device 25, and the pair of X-beams 24 24 in the Y-axis direction. That is, the pair of X beams 24 and the coarse stage 28 constitute a so-called gantry type two-axis stage device.

Returning to Fig. 1, the fine motion stage 30 is composed of a rectangular parallelepiped member having a small height, and is arranged above the coarse movement stage 28. As shown in Fig. On the upper surface of the fine movement stage 30, a substrate holder 32 is fixed. The substrate holder 32 adsorbs and holds the substrate P mounted on its upper surface by, for example, vacuum adsorption. Further, in Fig. 3, the fine movement stage 30 and the substrate holder 32 are omitted from the viewpoint of avoiding confusion in the drawings. On the side of the -Y side of the fine movement stage 30, a Y-bar mirror 34y having a reflection surface orthogonal to the Y-axis is fixed via a mirror base 33. [ 2, an X-bar mirror 34x having a reflecting surface orthogonal to the X-axis is fixed via a mirror base 33 to the side of the -X side of the fine movement stage 30.

The fine motion stage 30 is moved on the coarse movement stage 28 by a fine moving stage drive system including a stator fixed to the coarse movement stage 28 and a plurality of voice coil motors composed of mover fixed to the fine movement stage 30 And is slightly driven in the directions of freedom degrees (X axis, Y axis, and? Z directions). 1) and two Y voice coil motors 36y (not shown in Fig. 2), for example, two X voice coil motors 36x (not shown in Fig. 1) ). In Fig. 2, for example, the two X voice coil motors 36x overlap the ground depth direction. In Fig. 1, for example, two Y voice coil motors 36y overlap the ground depth direction.

The fine movement stage 30 is guided in a noncontact manner with the coarse movement stage 28 by the thrust (electromagnetic force) generated by the plurality of voice coil motors so that the coarse movement of the coarse movement stage 28 in the X axis direction and / Or a predetermined stroke in the Y-axis direction. Further, the fine movement stage 30 is appropriately minutely driven in the three-degree-of-freedom direction with respect to the coarse movement stage 28 by a plurality of voice coil motors.

1, the fine moving stage drive system has a plurality of Z voice coil motors 36z for fine-driving the fine moving stage 30 in the directions of? X and? Y, and three degrees of freedom in the Z axis direction . The plurality of Z voice coil motors 36z are arranged at, for example, four corners of the fine movement stage 30 (only two of the four Z voice coil motors 36z are shown in FIG. 1 , And the other two are obscured on the ground depth side). The configuration of the fine motion stage driving system including a plurality of voice coil motors is disclosed in, for example, U.S. Patent Application Publication No. 2010/0018950.

2, the X position information of the fine movement stage 30 is transmitted to the X-bar mirror 30 by the X-ray interferometer 38x fixed to the apparatus main body 18 via a member called an interferometer column 18e, (34x). The Y position information of the fine movement stage 30 is obtained using the Y bar mirror 34y by the Y laser interferometer 38y fixed to the apparatus main body 18 as shown in Fig. The X laser interferometer 38x and the Y laser interferometer 38y are respectively formed in plural numbers (overlapping with the paper depth direction in Figs. 1 and 2, respectively), so that the θz position information of the fine movement stage 30 can be obtained .

Information of the position of the fine movement stage 30 in the Z-axis,? X, and? Y directions (hereinafter referred to as Z-tilt position) (For example, four) Z sensors 38z, which will be described later. For example, four Z sensors 38z are arranged at predetermined intervals around the Z axis. The Z position information of the fine movement stage 30 is read out based on the output difference of the Z sensors 38z based on the average value of the outputs of the plurality of Z sensors 38z in the substrate stage apparatus 20A, The rotation amount information in the? X and? Y directions of the stage 30 is obtained. The type of the Z sensor 38z is not particularly limited, and for example, a laser displacement meter, a laser interferometer, or the like can be used.

4 (A), the weight canceling apparatus 40 supports the fine movement stage 30 from below through a leveling device 46, which will be described later. The weight canceling device 40 is inserted into the opening 28a of the coarse movement stage 28 and is supported by the first step guide 50 described below from below. The weight canceling device 40 has an air bearing 42 at the lower end thereof and receives the static pressure of a pressurized gas (for example, air) ejected from the air bearing 42 onto the upper surface of the first step guide 50 And is floated on the first step guide 50 via a predetermined clearance. 4A corresponds to a sectional view taken along the line B-B in Fig. 3, and the view of the base frame 22 is omitted from the viewpoint of avoiding confusion in the drawings.

The weight cancellation device 40 of the present embodiment has the same configuration and function as the weight cancellation device disclosed in, for example, U.S. Patent Application Publication No. 2010/0018950. That is, the weight cancellation device 40 has, for example, an air spring (not shown), and the fine movement stage 30, the substrate holder 32 (The downward force (-Z direction) due to the weight acceleration) of the Z-tilt position of the Z-th voice coil motor 36z when the Z-tilt position control of the fine stage is performed, Reduce the load.

The weight canceling device 40 is provided with a plurality of, for example, four flexure devices 44 at a Z position (center-of-gravity height) substantially equal to the Z- Respectively. The flexure device 44 of the present embodiment has the same configuration and function as those of the flexure device disclosed in, for example, U.S. Patent Application Publication No. 2010/0018950. That is, the flexure device 44 includes, for example, a thin strip steel plate disposed parallel to the XY plane, and a slip device (e.g., a ball joint) formed at both ends of the steel plate , And the steel plate is interposed between the weight canceling device (40) and the coarse movement stage (28) via the hitching device.

3, the flexure device 44 includes a weight canceling device 40 and a coarse stage 28 on the + X side, the -X side, the + Y side, and the -Y side of the weight canceling device 40, Respectively. When the coarse movement stage 28 moves in the X-axis direction and / or the Y-axis direction, the weight canceling device 40 moves the coarse movement stage 28 via at least one of the plurality of flexure devices 44, And moves in the X-axis direction and / or the Y-axis direction integrally with the coarse movement stage 28.

4A, the leveling device 46 is a spherical bearing device including a base 46a and a ball 46b, and freely oscillates (tilts) the fine movement stage 30 in the? X and? Y directions And moves along the XY plane integrally with the fine motion stage 30 together with the support from below. The leveling device 46 is supported by the weight canceling device 40 from below in a non-contact manner via an air bearing (not shown) mounted on the weight canceling device 40, Relative movement is allowed. Further, if it is possible to support the fine movement stage 30 from below so as to freely tilt the movable stage 30, it is possible to use, as a leveling device, for example, a similar spherical bearing device such as that disclosed in U.S. Patent Application Publication No. 2010/0018950 .

As shown in Fig. 3, the first step guide 50 is a plate-like member parallel to the XY plane extending in the X-axis direction, and is disposed on, for example, two substrate stage mounts 18c. The dimension in the longitudinal direction of the first step guide 50 is set to be slightly longer than the moving stroke in the X-axis direction of the fine motion stage 30. The dimension in the width direction (Y-axis direction) of the first step guide 50 is set to be slightly wider than the footprint of the weight canceling device 40. [ The upper surface of the first step guide 50 is finished to have a very high flatness so as to be parallel to the XY plane (horizontal plane). When the weight canceling device 40 (and the fine motion stage 30) As shown in Fig. The material of the first step guide 50 is not particularly limited. For example, it is preferable to form the first step guide 50 by using a stone (for example, a dense stone such as a gabbro), ceramics, cast iron or the like.

As shown in Fig. 4 (B), on the lower surface of the first step guide 50, a Y slide member 19b engaged with the Y linear guide 19a so as to be freely slidable, (For example, two) with respect to the base 19a. Thereby, the first step guide 50 is linearly guided in the Y-axis direction along the plurality of Y linear guides 19a.

As shown in Fig. 3, a pair of connecting members 50a are fixed at a predetermined interval in the Y axis direction at the end of the first step guide 50 on the + X side. The first step guide 50 is configured such that the + Y side connecting member 50a is connected to the + Y side X beam 24 via the flexure device 52 and the -Y side connecting member 50a is connected to the X- And is connected to the X-beam 24 on the -Y side via the liquefaction device 52. [ A pair of connecting members 52a are similarly fixed to the end of the -X side of the first step guide 50 and the first step guide 50 is inserted through the pair of connecting members 52a, And is connected to each of the pair of X beams 24 by the lasing device 52. 4 (A), the flexure device 52 moves the first step guide 50 from the Z position (center-of-gravity height) substantially equal to the Z position of the center of gravity of the first step guide 50, And the X-beam 24 are connected to each other.

The configuration of the flexure device 52 is substantially the same as the flexure device 44 connecting the weight canceling device 40 and the coarse stage 28. [ That is, the flexure device 52 includes a steel plate having a thin thickness parallel to the XY plane extending in the Y-axis direction, and a braking device (for example, a ball joint) formed at both ends of the steel plate. Is installed between the first step guide (50) and the X beam (24) through the apparatus. Therefore, the first step guide 50 and the X beam 24 are connected integrally (with high rigidity) in the Y axis direction, while they are connected in the other 5 degrees of freedom directions (X, Z, are separated by vibration.

When the roughing stage 28 is driven in the X-axis direction in order to drive the substrate P to a predetermined stroke in the X-axis direction in the substrate stage apparatus 20A, And moves on the first step guide 50 in the X-axis direction. When the pair of X beams 24 is driven in the Y axis direction in order to drive the substrate P in the Y axis direction with a predetermined stroke, the weight canceling device 40 is pulled by the coarse stage 28 Y axis direction. At this time, when the pair of X beams 24 and the first step guide 50 integrally move in the Y axis direction (the weight canceling device 40 and the first step guide 50 are opposed in the Y axis direction The weight canceling device 40 does not fall off from the first step guide 50. Therefore, Therefore, the dimension in the width direction (Y-axis direction) of the first step guide 50 needs to be a minimum dimension enough to guide the movement of the weight canceling device 40 in the X-axis direction, have.

Each of the pair of second step guides 54 is formed of a plate-like member having a YZ cross-sectional rectangular shape extending in the X-axis direction, and is disposed on, for example, two substrate stage mounts 18c. One pair of the second step guides 54 are provided on the + Y side of the first step guide 50 and the other side are provided on the -Y side of the first step guide 50, Are arranged parallel to each other with a predetermined clearance therebetween.

3, the dimension of the second step guide 54 is set to be substantially the same as that of the first step guide 50, but the dimension in the width direction (Y axis direction) 50). 4 (B), the dimension in the thickness direction of the second step guide 54 is set to be substantially the same as that of the first step guide 50. As shown in Fig. On the lower surface of the second step guide 54, a Y slide member 19c engaged with the Y linear guide 19a so as to freely slide is fixed. Thus, the second step guide 54 is linearly guided along the Y-axis direction along the plurality of Y linear guides 19a.

The upper surface of the second step guide 54 is finished to have a very high flatness so as to be parallel to the XY plane (horizontal plane), and functions as a guide surface when the later-described target stage 60 moves in the X-axis direction. The material of the second step guide 54 is not particularly limited, but is preferably formed using, for example, a stone (for example, dense stone such as gabbro), ceramics, cast iron, aluminum alloy or the like.

The pair of second step guides 54 are integrally connected to each other by a connecting member 56 made of a U-shaped member in the YZ cross section as shown in Fig. 4 (A). The first step guide 50 is inserted between a pair of opposing surfaces of the connecting member 56 with a predetermined clearance interposed therebetween. As shown in Fig. 2, the connecting members 56 are formed in a plurality (four in the first embodiment, for example) at predetermined intervals in the X-axis direction.

A connecting member 54a is fixed to each of both end portions of the second step guide 54 in the longitudinal direction (+ X side and -X side) as shown in Fig. The second step guide 54 on the + Y side is connected to the X beam 24 on the + Y side via the flexure device 58 and the second step guide 54 on the -Y side , The connecting member 54a is connected to the X-beam 24 on the -Y side via the flexure device 58. The X- The configuration of the flexure device 58 is generally the same as the flexure device 52 connecting the first step guide 50 and the X beam 24. [ As a result, when the pair of X beams 24 move in the Y axis direction, the first step guide 50 and the pair of second step guides 54 are integrally formed with the pair of X beams 24 Y axis direction.

The stage 60 for the target is disposed between the pair of X beams 24 and mounted on the pair of second step guides 54. The stage 60 for the target has an upper ring 61, a lower ring 62, a connecting member 63, a plurality of targets 64, and a plurality of air bearings 65 ).

As shown in Fig. 3, the upper ring 61 is formed of a disc-shaped member having an opening at its center. The lower ring 62 is formed of a disk-like member having an outer diameter dimension and an inner diameter dimension substantially equal to those of the upper ring 61 (the thickness of which is thinner than that of the upper ring 61) And is disposed below the upper ring 61 (in FIG. 3, it is covered by the upper ring 61 against the depth of the ground). The weight canceling device 40 is inserted into the openings of the upper ring 61 and the lower ring 62, respectively. The connecting member 63 is inserted between the lower surface of the upper ring 61 and the upper surface of the lower ring 62 and integrally connects the upper ring 61 and the lower ring 62. The lower ring 62 may be smaller in diameter than the upper ring 61 and the upper ring 61 may be on the + Z side of the roughing stage 28 and may have a larger diameter than the opening of the roughing stage 28 .

In the first embodiment, for example, four targets 64 corresponding to the plurality of Z sensors 38z correspond to the Z sensors 38z at predetermined intervals in the &thetas; z direction (around the Z axis) And is fixed to the upper surface of the upper ring 61 so as to be positioned directly under (below) the Z sensor 38z. The type of the target 64 is preferably selected depending on the type of the Z sensor 38z. When a reflective type laser displacement sensor of a triangulation method is used as the Z sensor 38z, for example, it is preferable to use white ceramics as the target 64. As the Z sensor 38z, for example, It is preferable to use a mirror as the target 64 (the upper surface of the upper ring 61 is mirror-finished and the target 64 may be omitted). The area of the target 64 is set in consideration of the amount of movement when the fine movement stage 30 is slightly moved relative to the coarse movement stage 28 (so that the measurement beam does not deviate from the target).

A plurality of air bearings 65 (for example, four in the first embodiment) are fixed to the lower surface of the lower ring 62 at a predetermined interval in the? Z direction (Z-axis direction). For example, of the four air bearings 65, the gas ejection surfaces (bearing surfaces) of the two air bearings 65 are opposed to the upper surface of the second step guide 54 on one side (+ Y side) The gas ejecting surfaces of the air bearings 65 are opposed to the upper surface of the second step guide 54 on the other side (-Y side). The stage 60 for the target is configured to apply a positive pressure (for example, air) of a pressurized gas (for example, air) ejected from the plurality of air bearings 65 to the corresponding second step guide 54, The second step guide 54 is lifted with a predetermined clearance therebetween.

The target stage 60 is connected to the coarse stage 28 by a plurality of flexure devices 66 as shown in Fig. The configuration of the flexure device 66 is substantially the same as that of the flexure device 44 connecting the weight canceling device 40 and the coarse stage 28 Or in parallel with the Y-axis (in the + S-phase in plan view), whereas the plurality of flexure devices 66 extend in the X-axis or Y-axis, for example at an angle of 45 ° have).

In the substrate stage apparatus 20A, when the coarse movement stage 28 is driven in the X-axis direction in order to drive the substrate P in the X-axis direction at a predetermined stroke, the target stage 60 moves in the X- And moves on the pair of second step guides 54 in the X-axis direction. When the pair of X beams 24 is driven in the Y axis direction in order to drive the substrate P in the Y axis direction with a predetermined stroke, the target stage 60 is pulled by the coarse movement stage 28 Y axis direction. At this time, when the pair of X beams 24 and the pair of second step guides 54 are integrally moved in the Y-axis direction (the target stage 60 and the pair of second step guides 54) The stage 60 for the target does not fall off from the pair of second step guides 54. Therefore,

The target stage 60 and the fine motion stage 30 are integrally formed in the X axis and / or the Y axis direction in the X axis direction and the Y axis direction in the fine movement stage 30, Axis, and / or Y axis direction. The Z sensor 38z can obtain the Z position information of the fine movement stage 30 by using the corresponding target 64 irrespective of the position of the fine movement stage 30 in the XY plane.

In the liquid crystal exposure apparatus 10 (refer to Fig. 1) constructed as described above, the mask M of the mask stage 14 with respect to the mask stage apparatus 14 is controlled by a mask loader With the load being carried out, the loading of the substrate P onto the substrate holder 32 is carried out by the substrate loader (not shown). Thereafter, alignment measurement is performed using an alignment detection system (not shown) by the main controller, and after completion of the alignment measurement, a plurality of shot areas set on the substrate P are subjected to a step-and- An exposure operation is performed. Further, this exposure operation is the same as the exposure operation of the step-and-scan method, which has been carried out conventionally, and therefore, a detailed description thereof will be omitted here.

The substrate stage device 20A is provided with a plurality of sensors 15 (autofocus sensors) which are the lower surface of the barrel base plate 18a and are fixed in the vicinity of the projection optical system 16 in the alignment operation at the time of the above- The Z position information of the surface of the substrate P is obtained and based on the output of the plurality of sensors 15 the Z position of the exposure area on the substrate P is located within the depth of focus of the projection optical system 16 The Z-tilt position control of the fine movement stage 30 is performed using a plurality of Z voice coil motors 36z.

According to the substrate stage device 20A of the present embodiment described above, the target 64 used for obtaining the Z position information of the fine movement stage 30 is a member separate from the weight cancellation device 40, The weight canceling device 40 can be reduced in size and weight as compared with the case where the target 64 is attached to the weight canceling device 40. [ When the planar view of the upper surface of the first step guide 50 is lowered when the target 64 is attached to the weight canceling device 40, the measurement accuracy of the Z-tilt position information of the fine movement stage 30 Tilt position information of the fine movement stage 30 is obtained in the substrate stage apparatus 20A while the potential of the stage for target (hereinafter referred to as " stage ") mounted on the pair of second step guides 54 The upper surface of the second step guide 54 functions as the measurement reference surface even if the top surface of the first step guide 50 is lowered. There is no problem in the precision of measurement of information.

Since the Z-tilt position of the fine movement stage 30 can be controlled with high accuracy by the plurality of Z voice coil motors 36z, even if the top view of the first step guide 50 is lowered, The Z-tilt position control of the fine movement stage 30 can be performed with high accuracy if the measurement accuracy of the Z-tilt position information of the fine movement stage 30 can be ensured. Therefore, it is not necessary to take measures such as increasing the rigidity of the first step guide 50 in order to secure a plan view of the upper surface of the first step guide 50. Therefore, the first step guide 50 can be downsized (thinned) and lightweight.

Further, the configuration of the substrate stage device 20A according to the first embodiment can be suitably modified. Modifications of the first embodiment will be described below. In the modified example of the first embodiment described below, the same reference numerals are assigned to components having the same configuration and function as those of the first embodiment, and the detailed description thereof will be omitted as appropriate.

&Quot; Modified Example (1) of First Embodiment "

5 to 6B show a substrate stage device 20B related to a modification 1 of the first embodiment (the fine stage 30 (Fig. 6 (A) (Not shown).

In the substrate stage device 20A (see Fig. 4B) of the first embodiment, the z-tilt position information of the fine movement stage 30 is detected by a plurality of Z sensors 38z in the target stage The substrate stage device 20B shown in Fig. 6B is obtained by using a plurality of Z sensors 38z and a pair of second step guides 54) are different from each other. The other elements, including the driving method of the pair of second step guides 54, are the same as those of the first embodiment as shown in Figs. 5 and 6A.

When a reflective type laser displacement sensor of a triangulation method is used for the Z sensor 38z, for example, a strip-shaped member formed of white ceramics is used as a target (reference surface for Z / tilt position information measurement) (The second step guide 54 itself may be formed of ceramics to make the second step guide 54 itself function as a target, or ceramics or the like may be applied to the surface of the metal by spraying . When a reflection type laser displacement sensor of, for example, a vertical reflection type is used for the Z sensor 38z, a band-shaped mirror covering substantially the entire upper surface of the second step guide 54 is set as a second step guide (Or the upper surface of the second step guide 54 may be subjected to mirror-surface processing).

Since the substrate stage device 20B has no target stage 60 (see FIG. 3) in comparison with the substrate stage device 20A of the first embodiment, the configuration is simple. Further, since the inertial mass is small, the position controllability of the coarse movement stage 28 (i.e., the substrate P) is improved. Further, the linear motor for driving the coarse movement stage 28 can also be downsized. In addition, since the target stage 60 is not mounted on the second step guide 54, it is not necessary to take measures such as increasing the rigidity of the second step guide 54. [ Therefore, the second step guide 54 can be made smaller (thinner) and lighter.

&Quot; Modification (Embodiment 2) of First Embodiment "

7 and 8 show a substrate stage device 20C related to a modification (second embodiment) of the first embodiment. 4 (A), in the substrate stage device 20A of the first embodiment, the weight canceling device 40 is mounted on the fine stage (not shown) via the leveling device 46 on the first step guide 50 8, the substrate stage device 20C differs in that the leveling device 78 is directly mounted on the first step guide 70A, as shown in Fig. 8 . 7 and 8), the first step guide 70A is mechanically and mechanically deformed relative to the pair of X beams 24 (not shown in Figs. 7 and 8, see Fig. 1 and the like) And moves integrally with the pair of X beams 24 in the Y axis direction. The coarse stage 28 is mounted on a pair of X beams 24 and is driven in the X axis direction on the pair of X beams 24 and cooperated with a pair of X beams 24 Y axis direction.

7, the first step guide 70A has a guide main body 71, an air spring 72, and a pair of Z voice coil motors 73. The first step guide 70A includes a weight canceling device and a Z actuator . The guide main body 71 has a lower plate portion 71a, an upper plate portion 71b and a pair of guide plates 71c as shown in Fig. The lower plate portion 71a and the upper plate portion 71b are each made of a rectangular plate-like member parallel to the XY plane extending in the X-axis direction, and are arranged parallel to each other at predetermined intervals in the Z-axis direction. The upper plate portion 71b is guided by a pair of guide plates 71c (or a linear guide device not shown) fixed to the lower plate portion 71a and is movable in the Z-axis direction with respect to the lower plate portion 71a .

The air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b and supports the central portion of the upper plate portion 71b from below. A pressurized gas is supplied from the outside to the air spring 72 and the upward force in the gravity direction balanced with the weight of the system including the fine movement stage 30 (including the leveling device 78) Lt; / RTI > A plurality of air springs 72 may be arranged at predetermined intervals in the X-axis direction.

One pair of Z voice coil motors 73 are arranged in the vicinity of the end on the + X side of the first step guide 70A and the other in the vicinity of the end on the -X side of the first step guide 70A . The voice coil motor 73 includes a stator 73a fixed to the lower plate portion 71a and a mover 73b fixed to the upper plate portion 71b so that the Z position control of the fine movement stage 30 is performed (The position control in the? X and? Y directions of the fine movement stage 30 is performed via the fine motion stage driving system as in the above-described embodiment).

The leveling device 78 is a spherical bearing device including a base 78a and a ball 78b and supports the fine movement stage 30 from below so as to freely rock (tilt) in the? X and? Y directions , And moves along the XY plane integrally with the fine motion stage 30. The base 78a is inserted into the opening 28a of the coarse movement stage 28 and has an air bearing (not shown) with the gas ejection surface (bearing surface) facing the -Z side (lower side). The leveling device 78 is provided on the first step guide 70A via a predetermined clearance by a static pressure of a pressurized gas (for example, air) ejected from the base 78a to the upper surface of the upper plate portion 71b .

The Z-tilt position information of the fine movement stage 30 is provided to a plurality of Z sensors 38z in the same manner as the substrate stage device 20B (see Figs. 5 to 6B) (The target stage 60 (see FIG. 3) may be used as in the first embodiment).

The distance between the upper surface of the coarse movement stage 28 and the lower surface of the fine movement stage 30 can be shortened in the substrate stage apparatus 20C and therefore the overall height dimension of the substrate stage apparatus 20C is reduced. Further, since the inertial mass is small, the position controllability of the coarse movement stage 28 (i.e., the substrate P) is improved. Further, the linear motor for driving the coarse movement stage 28 can also be downsized.

&Quot; Modification (Embodiment 3) of the First Embodiment &

Fig. 9 shows a substrate stage device 20D according to a modification (part 3) of the first embodiment. The substrate stage device 20D differs from the substrate stage device 20C (see Figs. 7 and 8) in the configuration of the first step guide 70B. Hereinafter, only differences will be described.

The first step guide 70B includes a guide main body 74 formed of a hollow rectangular parallelepiped (box) member extending in the X axis direction and a plurality of Z actuators 75 accommodated in the guide main body 74 do. The thickness of the guide main body 74 is set to be lower, for example, by making the rigidity of the upper surface portion lower than that of the lower surface portion. The plurality of Z actuators 75 are arranged at predetermined intervals in the X axis direction, and press the upper surface portion of the guide main body 74 toward the + Z side. The type of the Z actuator 75 is not particularly limited, but an air cylinder, a piezoelectric element, or the like can be used, for example, in view of a small driving amount of the upper surface portion.

10, the fine moving stage 30 is driven in the Z-axis direction by a plurality of Z actuators 75 (not shown in Fig. 10, see Fig. 9) in the substrate stage device 20D as schematically shown in Fig. do. Here, the upper surface portion of the guide main body 74 is deformed by being pressed by the plurality of Z actuators 75 and is inclined with respect to the horizontal plane, but since the fine movement stage 30 is supported via the leveling device 78 , There is no problem in Z-tilt control of the fine movement stage 30. 10, the deformation (indentation) of the upper surface portion of the guide main body 74 is exaggerated in actuality to facilitate understanding. The substrate stage device 20D can also obtain the same effect as the substrate stage device 20C.

&Quot; Modification (Fourth Embodiment) of First Embodiment "

Fig. 11 shows a substrate stage device 20E related to a modification (No. 4) of the first embodiment. The substrate stage device 20E differs from the substrate stage device 20D (see FIG. 9) in the configuration of the first step guide 70C. Hereinafter, only differences will be described.

The first step guide 70B (see Fig. 9) of the substrate stage device 20D is configured to move the fine moving stage 30 in the Z-axis direction by using a plurality of Z actuators 75 arranged in the X- 11, the first step guide 70C is different from the first step guide 70C in that the pair of cam devices 76 drives the fine moving stage 30 in the Z-axis direction.

One pair of cam devices 76 are arranged in the vicinity of the end on the + X side of the first step guide 70C and the other in the vicinity of the end on the -X side of the first step guide 70C, And the upper plate 71b. The cam device 76 includes a lower wedge 76c mounted on the base plate 76a fixed to the lower plate portion 71a via the X linear guide device 76b so as to be movable in the X axis direction, An upper wedge 76d fixed to the lower wedge 76c and an actuator 76e for driving the lower wedge 76c in the X axis direction. The substrate stage device 20E can also obtain the same effect as the substrate stage device 20D.

&Quot; Modification of First Embodiment (Part 5) "

12 shows a substrate stage device 20F related to a modification (No. 5) of the first embodiment. 7 and 8), and a plurality of Z voice coil motors 36z (see FIG. 7 and FIG. 8), as compared with the substrate stage device 20C (See FIG. 7), and the configuration of the first step guide 70D is different. Hereinafter, only differences will be described.

The first step guide 70D is configured such that an air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b in the same manner as the first step guide 70A (see FIGS. 7 and 8) The upper plate portion 71b is driven by the Z-voice coil motor 73 of Fig. The first step guide 70D does not have the same guide plate 71c (see FIG. 8) as the first step guide 70A. The plurality of Z voice coil motors 73 are arranged in the vicinity of the end on the + X side (or -X side) of the first step guide 70D, for example, (In Fig. 12, it overlaps with the depth direction of the paper). That is, the plurality of Z voice coil motors 73 are disposed at three points which are not on the same straight line.

At the center of the lower surface of the fine motion stage 30, an air bearing 79 whose bearing surface faces the -Z side is mounted. The fine motion stage 30 is configured to apply a predetermined pressure to the first step guide 70D by a positive pressure of a pressurized gas (for example, air) ejected from the air bearing 79 onto the upper surface of the first step guide 70D. (In a non-contact state) via a clearance.

In the substrate stage device 20F, a plurality of Z voice coil motors 73 are appropriately driven in a direction (? X and? Y directions) in which the upper plate portion 71b is tilted with respect to the Z-axis direction and / , The Z-tilt control of the fine movement stage 30 is performed. According to the substrate stage device 20F, the configuration is further simplified as compared with the substrate stage device 20C (see Figs. 7 and 8). 9), the upper plate 71b may be tilted by using a plurality of Z actuators 75 (a plurality of the Z actuators 75 are arranged at predetermined intervals in the Y-axis direction as well) The upper plate portion 71b may be tilted by using a plurality of cam devices 76 (disposed at three points not on the same straight line) in the same manner as the substrate stage device 20E (see Fig. 11).

&Quot; Second Embodiment &

Next, the second embodiment will be described with reference to Figs. 13 to 17. Fig. Since the configuration of the liquid crystal exposure apparatus according to the second embodiment is the same as that of the first embodiment except for the configuration of the substrate stage apparatus 20G, Are denoted by the same reference numerals, and a detailed description thereof will be appropriately omitted.

As shown in Fig. 4B, in the substrate stage device 20A of the first embodiment, the first step guide 50 is mounted on the substrate stage mount 18c by a mechanical linear guide device (Y linear guide 13A and 13B, the substrate stage device 20G of the second embodiment is configured such that the first step guide 55 is mounted on one (1) And is mounted on the pair of base frames 80. In the first embodiment, as shown in Fig. 2, for example, two substrate stage mounts 18c are formed, whereas the substrate stage mount 18f of the second embodiment is formed as shown in Fig. 13 As shown in Fig. Thus, the substrate stage device 20G does not have the base frame 22 (see Fig. 2) supporting the longitudinally central portion of the X-beam 24.

One pair of the base frames 80 is disposed on the + X side of the substrate stage mount 18f between the substrate stage mount 18f and the base frame 22 and the other side is mounted on the -X side of the substrate stage mount 18f And is disposed between the substrate stage support frame 18f and the base frame 22 via a predetermined clearance with respect to the substrate stage support frame 18f and the base frame 22, respectively. 14 and 16, the view of the base frame 22 (the view of the X-beam 24 in Fig. 16) is omitted from the viewpoint of avoiding confusion in the drawings.

The base frame 80 is formed of a plate-like member parallel to the XZ plane extending in the Y-axis direction (see Fig. 15), and is mounted on the floor 11 via the support plate 81 and the vibration- . The first step guide 55 includes a Y linear guide device fixed to the base frame 80 and a Y slide member 19b fixed to the lower surface of the first step guide 55, And is mounted on a pair of base frames 80, and is movable in a Y-axis direction with a predetermined stroke. Therefore, the first step guide 55 is vibrationally separated from the apparatus main body 18 and the pair of base frames 22. 15, the first step guide 55 is mechanically connected to a pair of X beams 24 via a plurality of flexure units 52, as in the first embodiment And moves in the Y axis direction integrally with the pair of X beams 24. [ The first step guide 55 is set to have a slightly larger dimension in the thickness direction as compared with the first embodiment in order to suppress the depression due to its own weight.

14, the second step guide 54 includes a Y linear guide 19a fixed to the substrate stage mount 18f and a Y linear guide 19a fixed to the stage guide 18f, Is mounted on the substrate stage mount 18f via a Y linear guide device including a Y slide member 19c fixed to the lower surface thereof and is movable in a predetermined stroke in the Y axis direction. As shown in Fig. 15, the pair of second step guides 54 are integrally connected at both ends in the longitudinal direction by a connecting member 54b. The pair of second step guides 54 are provided with a plurality of flexure devices 58 (not shown in Figs. 13 and 14) for a pair of X beams 24, as in the first embodiment And is moved integrally with the pair of X beams 24 in the Y axis direction.

16 and 17, similar to the first embodiment, a plurality of Z sensors 38z mounted on the fine moving stage 30 are used to move the second step guide 54 The Z-tilt position information of the fine movement stage 30 is obtained.

According to the substrate stage device 20G of the second embodiment, since the first step guide 55 for supporting the weight canceling device 40 is supported by the base frame 80, compared with the first embodiment Rigidity in the gravitational direction of the substrate stage support 18f is not required. Therefore, it is possible to make the substrate stage table 18f thinner and lighter.

The offset load acts on the substrate stage support 18f depending on the position of the fine movement stage 30 (and the weight canceling device 40). In the second embodiment, however, The influence of the deflecting load is small compared with the first embodiment, since only the pair of second step guides 54 are provided. The Z-tilt position information of the fine movement stage 30 can be obtained by using the stage 60 for the target (see Fig. 4 (A)) in the same manner as the first embodiment without using the second step guide 54 .

The configuration of the substrate stage device 20G according to the second embodiment can be suitably modified. A modified example of the substrate stage device 20G according to the second embodiment will be described below. In the modification of the second embodiment described below, the same reference numerals are assigned to elements having the same configuration and function as those of the second embodiment, and detailed description thereof will be omitted as appropriate.

&Quot; Modification of the second embodiment (part 1) "

18 and 19 show a substrate stage device 20H related to a modification (No. 1) of the second embodiment. The Z-tilt position information of the fine movement stage 30 is obtained by a plurality of Z sensors 38z using the second step guide 54 as shown in Fig. 17 in the second embodiment On the other hand, the substrate stage device 20H shown in Figs. 18 and 19 differs from the substrate stage device 20H in that a plurality of Z sensors 38z are used to obtain the upper surface of the substrate stage mount 18g.

A reflective type laser displacement sensor of a triangulation method is used as the Z sensor 38z in the substrate stage device 20H and on the upper surface of the substrate stage mount 18g an XY plane A target 69 made of, for example, a plate-like member formed of, for example, white ceramics having an area large enough to cover a moving region in the substrate. In the case where a reflection type laser displacement sensor of a vertical reflection type is used as the Z sensor 38z, for example, when the upper surface of the substrate stage mount 18g is mirror-finished (or on the upper surface of the substrate stage mount 18g) Mirror is mounted).

Since the Y linear guide for guiding the first step guide 55 in the Y axis direction is not formed on the substrate stage mount 18g according to the substrate stage apparatus 20H, Can be directly used as a target. As described above, in the substrate stage device 20H, the second step guide 54 is not formed as compared with the substrate stage device 20G of the second embodiment shown in Fig. 13 and the like, The substrate stage mount 18g can be made thinner and lighter than the substrate stage mount 20G. Further, since the second step guide 54 is not provided, the offset load does not act on the substrate stage mount 18g.

&Quot; Modification of the second embodiment (part 2) "

20 shows a substrate stage device 20I according to a modification (second example) of the second embodiment. The substrate stage device 20I includes the substrate stage device 20G according to the second embodiment (see Figs. 13 to 17), the substrate stage device 20C related to the modification example 2 of the first embodiment (See Figs. 7 and 8) are combined with each other.

That is, as shown in Fig. 20, in the substrate stage device 20I, like the substrate stage device 20C, the first step guide 70A has a function as a Z actuator and a weight canceling device. The first step guide 70A is mounted on a pair of base frames 80 in the same manner as the substrate stage device 20G and is mounted on the substrate stage mount 18f and the X beam 24 Are separated by vibration. With the substrate stage device 20I, the effect of the second embodiment and the effect of the second variation of the first embodiment can be obtained. That is, in the substrate stage apparatus 20I, the weight of the substrate stage mount 18f can be reduced, and the position controllability of the coarse movement stage 28 (that is, the substrate P) is improved.

&Quot; Modification of the second embodiment (part 3) "

Figs. 21 and 22 show a substrate stage device 20J related to a modification (third) of the second embodiment. In the substrate stage apparatus 20A (see FIG. 1 and the like) according to the first embodiment and the substrate stage apparatus 20G (see FIG. 13 and the like) related to the second embodiment, a pair of X beams 24, Called two-axis stage device is constructed by the coarse stage 28 and the coarse stage 28. The substrate stage device 20J includes a first step guide 57 for supporting the weight canceling device 40, Axis type stage device is constituted by the above-mentioned gantry type two-axis stage device.

The first step guide 57 is formed of a plate-like member having a YZ cross section extending in the X-axis direction. Like the substrate stage device 20G (see Fig. 13 and the like) according to the second embodiment, Are supported on the base frame 80 provided on the floor 11 from below and are separated from the apparatus main body 18 in an oscillating manner. Although not shown in Figs. 21 and 22, the first step guide 57 is driven by a predetermined stroke in the Y-axis direction by an actuator such as a linear motor (or a thumb screw device). The first step guide 57 is configured to be able to stably support the coarse movement stage 28 as compared with the first step guide 50 of the substrate stage device 20G of the second embodiment (The dimension in the Y-axis direction is set to be large).

On the lower surface of the coarse movement stage 28, a plurality of (for example, four) air bearings 53 are mounted on the upper surface of the first step guide 57 with their bearing surfaces facing each other. 22, a pair of attachment plates 29 are mounted on the lower surface of the coarse movement stage 28, and the first step guide 57 is provided between the pair of attachment plates 29 Respectively. A plurality of (for example, two) air bearings 53 are mounted on each of the surfaces of the pair of attachment plates 29 opposed to the side surfaces of the first step guide 57. Thus, the coarse movement stage 28 can move along the first step guide 57 with a predetermined stroke in the X-axis direction with a low friction, and can move relative to the first step guide 57 in the Y- Is limited. The coarse movement stage 28 is moved by an X linear motor composed of an X stator (not shown) fixed to the first step guide 57 and an X movable member (not shown) fixed to the coarse movement stage 28, And is driven by a predetermined stroke in the X-axis direction on the step guide 57.

The Z-tilt position information of the fine movement stage 30 is obtained by a plurality of Z sensors 38z in the same manner as the substrate stage device 20B (see Figs. 5 to 6B) And is obtained by using the upper surface of the guide 54. The pair of second step guides 54 are connected to the first step guide 57 via a flexure device (not shown). The pair of second step guides 54 are pulled by the first step guide 57, Moves integrally with the step guide (57). The first step guide 57 is wider than the first step guide 50 of the substrate stage apparatus 20G of the second embodiment (see FIG. 14) The interval of the substrate stage device 20G is larger than that of the substrate stage device 20G.

The substrate stage device 20J has a structure in which a pair of X beams 24 (see Figs. 13 to 17) are not provided in comparison with the substrate stage device 20G (see Fig. 13 and others) , The configuration is simple. Since the first step guide 57 is vibrationally separated from the apparatus main body 18, the reaction force when driving the coarse movement stage 28 does not act on the apparatus main body 18. Further, the target used for finding the Z-tilt position information of the fine movement stage 30 may be mounted on the weight canceling device 40. [

&Quot; Modification of the second embodiment (part 4) "

23 and 24 show a substrate stage device 20K related to a modification (No. 4) of the second embodiment. The substrate stage device 20K includes the substrate stage device 20J (see FIGS. 21 and 22) related to the modification (third example) of the second embodiment, the modification example 2 of the first embodiment And a substrate stage device 20C (see Figs. 7 and 8) associated with the substrate stage device 20C.

23, the first step guide 70E of the substrate stage device 20K is provided between the lower plate portion 77a and the upper plate portion 77b constituting the main body portion 77, for example, 2 The Z-voice coil motor 73 and the air spring 72 are inserted and the Z actuator and the weight canceling device are provided in the same manner as the first step guide 70A (see FIG. 7) of the substrate stage device 20C . 24, the lower plate portion 77a of the first step guide 70E and the upper plate portion 77b are respectively engaged with the first step guide 70A (see Fig. 8) of the substrate stage device 20C As shown in FIG.

A plurality of (for example, four) air bearings 53 are mounted on the lower surface of the coarse movement stage 28 on the upper surface of the upper plate portion 77b. 24, a pair of attachment plates 29 are mounted on the lower surface of the coarse movement stage 28, and the first step guide 70E is provided between the pair of attachment plates 29 Respectively. A plurality of (for example, two) air bearings 53 are mounted on each of the surfaces of the pair of attachment plates 29 opposed to the side surfaces of the upper plate portion 77b. Thus, the coarse movement stage 28 can move along the first step guide 70E with a predetermined stroke in the X-axis direction with a low friction, and can move relative to the first step guide 70E in the Y- Is limited. The coarse stage 28 is constituted by an X linear motor composed of an X stator 88a fixed to the upper surface of the upper plate portion 77b and an X movable member 88b fixed to the lower surface of the coarse stage 28, And is driven at a predetermined stroke in the X-axis direction along the axis 70E. 24, the upper plate portion 77b is restricted from moving in the X-axis direction and the Y-axis direction with respect to the lower plate portion 77a. The air bearing 53 mounted on the pair of attachment plates 29 may be configured to face the side surface of the lower plate portion 77a.

An air bearing 48 having a bearing surface oriented toward the + Z side is mounted on the upper surface of the coarse stage 28, and the leveling device 46 is held in a noncontact manner from below. The Z-tilt position information of the fine movement stage 30 is detected by a plurality of Z sensors 38z in the same manner as the substrate stage device 20B (see Figs. 5 to 6B) ). The first step guide 70E cancels the weight of the system including the coarse movement stage 28 and the fine movement stage 30 by the air spring 72 so as to move the coarse movement stage 28 and the fine movement stage 30, The load on the Z voice coil motor 73 for driving the Z voice coil motor 73 in the Z axis direction is reduced. Although the first step guide 70E drives the coarse movement stage 28 and the fine movement stage 30 in the Z axis direction by the Z voice coil motor 73, A plurality of Z actuators 75 may be used as the step guide 70B or a pair of cam devices 76 may be used as the first step guide 70C shown in Fig.

In addition, the configurations of the first and second embodiments (including modifications thereof) described above can be appropriately changed. For example, in the first and second embodiments, each of the first step guide 50 and the pair of second step guides 54 is pulled by a pair of X beams 24, However, the X position may be controlled independently of the pair of X beams 24 by an actuator such as a linear motor, for example.

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F2 laser light (wavelength 157 nm). The illumination light may be amplified, for example, by a single-wavelength laser light emitted from a DFB semiconductor laser or a fiber laser in an infrared region or a visible region by a fiber amplifier doped with, for example, erbium (or erbium and ytterbium) And harmonics converted into ultraviolet light using nonlinear optical crystals may be used. Further, a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

The projection optical system 16 is a multi-lens type projection optical system having a plurality of projection optical units. However, the number of projection optical units is not limited to this, and it is required that there is at least one projection optical unit. Further, the present invention is not limited to a projection optical system of a multi-lens type, and may be, for example, a projection optical system using an opener-type large-sized mirror. In the above embodiment, the case where the projection magnification is equal to the projection magnification is used as the projection optical system PL. However, the present invention is not limited to this, and the projection optical system may be any of a reduction system and a magnification system.

Further, a light-transmitting mask in which a predetermined light-shielding pattern (or a phase pattern / light-shielding pattern) is formed on a light-transmitting mask substrate is used. However, as disclosed in, for example, U.S. Patent No. 6,778,257, (Variable mold mask) for forming a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern (for example, a DMD Digital Micro-mirror Device) may be used.

Furthermore, the moving body apparatus (stage apparatus) that moves an object along a predetermined two-dimensional plane is not limited to the exposure apparatus, and may be any type of apparatus that performs a predetermined process on an object such as an object inspection apparatus used for inspection of an object It may be used in an object treatment apparatus. Also, the exposure apparatus can be applied to a step-and-repeat exposure apparatus or a step-and-stitch exposure apparatus.

The exposure apparatus may be an exposure apparatus that exposes a substrate having a size (including an outer diameter, a diagonal length, and at least one side) of 500 mm or more, for example, a large substrate for a flat panel display such as a liquid crystal display Is particularly effective.

The exposure apparatus is not limited to a liquid crystal exposure apparatus for transferring a liquid crystal display element pattern to a rectangular glass plate. For example, an exposure apparatus, a thin film magnetic head, a micromachine, a DNA chip The present invention can be widely applied to an exposure apparatus for manufacturing an exposure apparatus. In addition, in order to manufacture masks or reticles used in not only microdevices such as semiconductor devices but also optical exposure devices, EUV exposure devices, X-ray exposure devices, and electron beam exposure devices, a circuit pattern is transferred onto a glass substrate, The present invention can also be applied to an exposure apparatus that performs exposure. Further, the object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank, for example. In the case where the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited and includes, for example, a film-like (sheet-like member having flexibility).

An electronic device such as a liquid crystal display element (or a semiconductor element) has a function of designing a function and a performance of a device, a step of manufacturing a mask (or a reticle) based on the design step, a step of manufacturing a glass substrate , A lithography step of transferring the pattern of the mask (reticle) onto the glass substrate by the exposure apparatus of each of the embodiments described above, and the exposure method thereof, a development step of developing the exposed glass substrate, An etching step of removing the exposed member of the portion by etching, a resist removing step of removing the unnecessary resist after etching, a device assembling step, and an inspection step. In this case, in the lithography step, the above-described exposure method is performed using the exposure apparatus of the above-described embodiment, and the device pattern is formed on the glass substrate, so that a highly integrated device can be manufactured with good productivity.

The disclosures of all publications, international publications, U.S. patent application publications, and U.S. patent publications cited in the foregoing description are incorporated herein by reference.

Industrial availability

INDUSTRIAL APPLICABILITY As described above, the mobile device of the present invention is suitable for moving a mobile body along a predetermined two-dimensional plane. Further, the exposure apparatus of the present invention is suitable for forming a predetermined pattern on an object held by a moving body. Further, the method of manufacturing a flat panel display of the present invention is suitable for manufacturing a flat panel display. Further, the device manufacturing method of the present invention is suitable for the production of microdevices.

Claims (42)

A guide member movable in a first direction in a predetermined two-dimensional plane and movable in a position in a second direction orthogonal to the first direction in the two-dimensional plane;
A movable member supported by the guide member from below and movable along a first surface defined by the guide member in a first direction and movable along the guide member in a second direction; ,
And a position measuring system for obtaining positional information about a direction intersecting the two-dimensional plane of the moving body with a second surface defined by a member separate from the guide member as a reference surface. The method according to claim 1,
Wherein the separate member is a movable member extending in the first direction and movable along with the moving member in a position along the second direction. 3. The method of claim 2,
Wherein the movable member is formed on one side and the other side of the guide member with respect to the second direction. 4. The method according to any one of claims 1 to 3,
Wherein the movable member moves along the first direction together with the movable member on the second surface defined by the movable member and moves along the second direction together with the movable member, Further comprising a member,
Wherein the position measuring system obtains the position information using the moving member for measurement. 5. The method of claim 4,
Wherein the moving member for measurement is held in non-contact with the movable member. The method according to claim 4 or 5,
Further comprising an induction device for inducing the moving body along the two-dimensional plane,
Wherein the guide member, the movable member, and the moving member for measurement are moved to a position along the second direction integrally by being guided by the guide device. The method according to claim 6,
And the measuring moving member is driven along the first direction by the guide device. 4. The method according to any one of claims 1 to 3,
Wherein the position measuring system obtains the position information by using an upper surface of the movable member. 9. The method of claim 8,
Further comprising an induction device for inducing the moving body along the two-dimensional plane,
And the guide member and the movable member are moved to a position along the second direction integrally by being guided by the guide device. 10. The method according to any one of claims 6, 7, and 9,
The induction device is formed on a first base member,
Wherein the guide member is formed on a second base member different from the first base member. 11. The method of claim 10,
Wherein the movable member is formed on a third base member different from the second base member. The method according to claim 1,
Wherein the separate member is formed below the guide member and is formed to have a width covering a movable range in the two-dimensional plane of the moving body. 13. The method of claim 12,
Wherein the guide member is formed on a base member different from the separate member. 14. The method according to any one of claims 1 to 13,
The guide member includes a supporting device that moves along the first direction together with the moving body on the first surface while supporting the weight of the moving body and moves along the second direction together with the guide member Thereby supporting the moving body from below. 15. The method of claim 14,
And the support device is non-contact-supported by the guide member. 16. The method according to claim 14 or 15,
Wherein the supporting device supports the moving body via a tilting supporting device that tiltably supports the moving body with respect to the two-dimensional plane. 17. The method according to any one of claims 1 to 16,
Wherein the guide member includes a driving device for driving the moving body in a direction crossing the two-dimensional plane. 18. The method of claim 17,
Wherein the guide member includes a self-weight supporting device for supporting a self-weight of the moving body. The method according to claim 17 or 18,
Wherein the guide member supports the moving body via a tilting support device that tiltably supports the moving body with respect to the two-dimensional plane. 20. The method of claim 19,
Wherein the tilting support device is non-contact-supported by the guide member. The method according to claim 17 or 18,
Wherein the guide member has a tilting drive device for tilting the first surface with respect to the two-dimensional plane. 22. The method of claim 21,
Wherein the moving body is not contacted with the guide member. 23. The method according to any one of claims 1 to 22,
Wherein the position measuring system obtains positional information about a direction intersecting the two-dimensional plane of the moving body by using a measuring member formed on the moving body. A guide member movable in a first direction in a predetermined two-dimensional plane and movable in a position in a second direction orthogonal to the first direction in the two-dimensional plane;
A movable body supported from below by the guide member and movable in a position along the first direction along a guide surface defined by the guide member and movable along with the guide member in the second direction;
And a driving device formed on the guide member and driving the moving body in a direction crossing the two-dimensional plane. 25. The method of claim 24,
Wherein the guide member includes a self-weight supporting device for supporting a self-weight of the moving body. 26. The method according to claim 24 or 25,
Wherein the guide member supports the moving body via a tilting support device that tiltably supports the moving body with respect to the two-dimensional plane. 27. The method of claim 26,
Wherein the tilting support device is non-contact-supported by the guide member. 26. The method according to claim 24 or 25,
Wherein the guide member has a tilting drive device for tilting the guide surface with respect to the two-dimensional plane. 29. The method of claim 28,
Wherein the moving body is not contacted with the guide member. A first moving member extending in a first direction in a predetermined two-dimensional plane and movable in a position in a second direction orthogonal to the first direction in the two-dimensional plane;
A second moving member that is formed on the first moving member and is movable along the first direction along the first moving member and movable in the second direction together with the first moving member;
And a moving member supported by the first moving member from below and guided by the second moving member to move along the two-dimensional plane. 31. The method of claim 30,
And an element of an actuator for driving the second movable member along the first movable member is formed on at least one of the first movable member and the second movable member. 32. The method according to claim 30 or 31,
And the first moving member supports the moving body from below through the self weight holding device. 32. The method according to claim 30 or 31,
Wherein the first moving member includes the second moving member and a driving device for driving the moving member in a direction crossing the two-dimensional plane. 34. The method of claim 33,
Wherein the first moving member includes the second moving member and a self-weight supporting device for supporting a self-weight of the moving body. 35. The method according to any one of claims 30 to 34,
Further comprising a position measuring system for obtaining positional information about a direction intersecting the two-dimensional plane of the mobile body using a reference surface defined by a member separate from the first moving member. 36. The method of claim 35,
Wherein the separate member is a movable member extending in the first direction and movable along with the moving member in a position along the second direction. 37. The method of claim 36,
Wherein the movable member is formed on one side and the other side of the first moving member with respect to the second direction. 37. A mobile device according to any one of claims 1 to 37, wherein a predetermined object is held on the mobile device,
And a pattern forming device for forming a predetermined pattern using the energy beam on the object held by the moving body. 39. The method of claim 38,
Wherein the object is a substrate used in a flat panel display device. 40. The method of claim 39,
Wherein the substrate has a length or a diagonal length of at least one side of 500 mm or more. A method for exposing an object to light using the exposure apparatus according to claim 39 or 40,
And developing the exposed object. ≪ Desc / Clms Page number 19 > A method for exposing an object using the exposure apparatus according to claim 38,
And developing the exposed object.

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