KR102228708B1 - Moving body device, exposure device, flat panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

The substrate stage device 20A extends in the scan direction (X-axis direction) and is movable in a position along the cross-scan direction (Y-axis direction) to the first step guide 50 and the first step guide 50. A fine moving stage 30 supported from below and capable of moving a position along the scan direction along the upper surface of the first step guide 50, and capable of moving a position along the cross scan direction together with the first step guide 50 And a position measuring system for obtaining Z-tilt position information of the fine moving stage 30 using the Z sensor 38z formed in the fine moving stage 30 with the upper surface of the second step guide 54 as a reference surface.

Description

A mobile body device, an exposure device, a manufacturing method for a flat panel display, and a device manufacturing method TECHNICAL FIELD TECHNICAL FIELD OF THE INVENTION

The present invention relates to a moving body device, an exposure device, a manufacturing method of a flat panel display, and a device manufacturing method, and more particularly, a moving body device that moves a moving body along a predetermined two-dimensional plane, and an exposure including the moving body device It relates to an apparatus, a manufacturing method of a flat panel display using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements and semiconductor elements (integrated circuits, etc.), masks or reticles (hereinafter, collectively referred to as ``masks''), and glass plates or wafers (hereinafter, A step-and-scan exposure apparatus is used in which a pattern formed on a mask is transferred onto a substrate using an energy beam while synchronously moving a "substrate") along a scanning direction (scan direction).

In this type of exposure apparatus, a fine moving stage holding a substrate is supported from below by a weight canceling device, and a guide member that guides the movement of the weight canceling device in the cross scan direction is scanned together with the weight canceling device. It is known to have a substrate stage device that can move in the direction (see, for example, Patent Document 1).

Here, with the recent increase in the size of the substrate, the substrate stage device tends to increase in size and increase in weight.

US Patent Application Publication No. 2010/0266961 Specification

The present invention has been made under the above-described circumstances, and from a first point of view, it extends in a first direction in a predetermined two-dimensional plane, and moves a position in a second direction orthogonal to the first direction in the two-dimensional plane. A possible guide member, supported by the guide member from below, and capable of moving a position along the first direction along a first surface defined by the guide member, and a position along the second direction together with the guide member It is a moving body device comprising a moving body capable of moving and a position measuring system that obtains positional information about a direction intersecting the two-dimensional plane of the moving body using a second surface defined by a member separate from the guide member as a reference plane. .

According to this, since the second surface is the reference surface, no precision is required on the first surface of the guide member. Accordingly, the configuration of the guide member can be simplified, and the movable body device can be reduced in size and weight.

The present invention, from a second viewpoint, extends in a first direction in a predetermined two-dimensional plane and is capable of moving a position in a second direction orthogonal to the first direction in the two-dimensional plane, and the guide member A moving body supported from below and capable of moving a position in the first direction along a guide surface defined by the guide member, and movable in a position along the second direction together with the guide member, and the guide member It is formed in, and is a movable body device including a driving device for driving the movable body in a direction crossing the two-dimensional plane.

According to this, since the guide member drives the moving object in a direction crossing the two-dimensional plane, the configuration can be simplified compared to the case where the moving object is driven in a direction crossing the two-dimensional plane by a separate driving device, and the moving object device is miniaturized. , It becomes possible to reduce weight.

The present invention, from a third point of view, extends in a first direction in a predetermined two-dimensional plane and is capable of moving a position in a second direction orthogonal to the first direction in the two-dimensional plane, and the A second moving member formed on the first moving member, capable of moving a position in the first direction along the first moving member, and movable in the second direction together with the first moving member, and the first It is a moving body device including a moving body supported by a moving member from below and guided by the second moving member to move along the two-dimensional plane.

According to this, the second moving member guiding the moving object along the two-dimensional plane can move in the first direction along the first moving member supporting the moving object from below, and can move along the second direction together with the first moving member. Therefore, the device configuration is simple.

In a fourth aspect, the present invention provides a moving object device according to any one of the first to third aspects of the present invention in which a predetermined object is held in the moving object, and an energy beam is used for the object held in the moving object. It is an exposure apparatus provided with a pattern forming apparatus which forms a pattern of.

The present invention is a manufacturing method of a flat panel display comprising exposing the object to light using the exposure apparatus according to the fourth aspect of the present invention and developing the exposed object from a fifth point of view.

The present invention is a device manufacturing method comprising exposing the object to light using the exposure apparatus according to the fourth aspect of the present invention and developing the exposed object from a sixth point of view.

1 is a diagram schematically showing a configuration of a liquid crystal exposure apparatus according to a first embodiment.
FIG. 2 is a side view of a substrate stage apparatus included in the liquid crystal exposure apparatus of FIG. 1.
3 is a plan view of a substrate stage apparatus included in the liquid crystal exposure apparatus of FIG. 1.
4(A) is a cross-sectional view taken along line BB of the substrate stage device of FIG. 3, and FIG. 4(B) is a view in which some elements are removed from the substrate stage device of FIG. 4(A).
5 is a plan view of a substrate stage device according to a modification example (part 1) of the first embodiment.
FIG. 6(A) is a cross-sectional view taken along line CC in FIG. 5, and FIG. 6(B) is a view in which some elements are removed from the substrate stage device of FIG. 6(A).
7 is a diagram showing a substrate stage apparatus according to a modification example (part 2) of the first embodiment.
8 is a cross-sectional view taken along line DD of the substrate stage device of FIG. 7.
9 is a diagram showing a substrate stage device according to a modification example (part 3) of the first embodiment.
10 is a view for explaining the operation of the substrate stage device of FIG. 9.
11 is a diagram showing a substrate stage device according to a modification example (part 4) of the first embodiment.
12 is a diagram showing a substrate stage apparatus according to a modification example (part 5) of the first embodiment.
13 is a diagram showing a substrate stage device according to a second embodiment.
14 is a cross-sectional view taken along line EE of the substrate stage device of FIG. 13.
15 is a plan view of the substrate stage device of FIG. 13.
16 is a cross-sectional view taken along line FF of the substrate stage device of FIG. 15.
17 is a diagram showing an arrangement of Z sensors in the substrate stage device of FIG. 13.
18 is a diagram showing a substrate stage device according to a modification example (part 1) of the second embodiment.
19 is a cross-sectional view taken along line GG in FIG. 18.
Fig. 20 is a diagram showing a substrate stage apparatus according to a modified example (part 2) of the second embodiment.
Fig. 21 is a diagram showing a substrate stage device according to a modified example (part 3) of the second embodiment.
22 is a cross-sectional view taken along line HH in FIG. 21.
23 is a diagram showing a substrate stage device according to a modification example (Part 4) of the second embodiment.
24 is a cross-sectional view taken along line II of FIG. 23.

<< first embodiment >>

Hereinafter, a first embodiment will be described based on Figs. 1 to 4(B).

In Fig. 1, a configuration of a liquid crystal exposure apparatus 10 according to a first embodiment is schematically shown. The liquid crystal exposure apparatus 10 is, for example, a step of making a rectangular (rectangular) glass substrate P (hereinafter simply referred to as a substrate P) used in a liquid crystal display device (flat panel display) as an object to be exposed. It is an and-scan type projection exposure apparatus, a so-called scanner.

The liquid crystal exposure device 10 includes an illumination system 12, a mask stage device 14 holding a mask M on which a circuit pattern and the like are formed, a projection optical system 16, a device body 18, and a surface (+Z in FIG. 1 ). It has a substrate stage device 20A for holding the substrate P coated with a resist (sensitizer) on the side facing side), and a control system thereof. Hereinafter, the direction in which the mask M and the substrate P are respectively scanned relative to the projection optical system 16 at the time of exposure is referred to as the X-axis direction, and the direction orthogonal to the X-axis in the horizontal plane is the Y-axis direction and the X-axis. And the direction orthogonal to the Y axis is referred to as the Z axis direction, and the rotation directions around the X axis, the Y axis, and the Z axis are referred to as θx, θy, and θz directions, respectively.

The illumination system 12 is configured in the same manner as the illumination system disclosed in, for example, US Patent No. 5,729,331 specification. The illumination system 12 irradiates the mask M with illumination light IL for exposure. As the illumination light (IL), for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), and h-line (wavelength 405 nm) (or synthetic light of the i-line, g-line, and h-line) ) Is used.

The mask stage device 14 has a mask stage 14a made of a plate-shaped member in which an opening is formed in a central portion. The mask stage 14a adsorbs and holds the outer peripheral edge portion of the mask M inserted into the opening by a support hand 14b. The mask stage 14a is mounted on a pair of stage guides 14c fixed to the barrel platen 18a, which is a part of the device main body 18, and includes a mask stage drive system (not shown) including, for example, a linear motor. As a result, it is driven with a predetermined long stroke in the scanning direction (X-axis direction), and is suitably finely driven in the Y-axis direction and θz direction. Position information (including rotation amount information in the θz direction) of the mask stage 14a in the XY plane is a bar mirror fixed to the mask stage 14a by a mask interferometer 14d fixed to the barrel base 18a It is obtained using (14e). The mask interferometer 14d includes a plurality of X mask interferometers and Y mask interferometers, respectively, and the bar mirror 14e includes an X bar mirror corresponding to the X mask interferometer and a Y bar mirror corresponding to the Y mask interferometer. In FIG. 1, only a Y mask interferometer and a Y bar mirror are typically shown.

The projection optical system 16 is disposed below the mask stage 14a, and is supported by the barrel base plate 18a. The projection optical system 16 is configured in the same manner as the projection optical system disclosed in, for example, US Patent No. 6,552,775. That is, the projection optical system 16 includes a plurality of projection optical systems (multi-lens projection optical systems) in which the projection area of the pattern image of the mask M is arranged in a zigzag pattern, and a single rectangular shape having the Y-axis direction as the length direction. It functions equivalently to a projection optical system that has an image field of. In the present embodiment, as each of the plurality of projection optical systems, for example, one that forms an erect top with a telecentric equal magnification system on both sides is used.

For this reason, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light passing through the mask M causes the mask in the illumination area through the projection optical system 16 to be illuminated. The projection image (partial erect image) of the circuit pattern of (M) is formed in the irradiation area (exposure area) of the conjugated illumination light IL in the illumination area on the substrate P. Then, by synchronous driving of the mask stage device 14 and the substrate stage device 20A, the mask M is moved relative to the illumination area (illumination light IL) in the scanning direction, and the exposure area (illumination light ( By moving the substrate P relative to IL)) in the scanning direction, scanning exposure of one shot region on the substrate P is performed, and the pattern formed on the mask M is transferred to the shot region. That is, in the liquid crystal exposure apparatus 10, the pattern of the mask M is generated on the substrate P by the illumination system 12 and the projection optical system 16, and the response on the substrate P by the illumination light IL The pattern is formed on the substrate P by exposure of the layer (resist layer).

The apparatus main body 18 is provided with a barrel platen 18a, a pair of side columns 18b, and a substrate stage mount 18c. The barrel platen 18a is made of a plate-shaped member parallel to the XY plane, and supports the mask stage device 14 and the projection optical system 16. One pair of side columns 18b supports the vicinity of an end portion on the +Y side of the barrel base plate 18a from below, and the other side supports an end portion on the -Y side of the barrel base plate 18a from below. The side column 18b is made of a plate-like member parallel to the XZ plane, and is provided on the floor 11 of the clean room via a vibration isolator 18d. Thereby, the apparatus main body 18 (and the mask stage apparatus 14 and the projection optical system 16) are vibratingly separated from the floor 11.

The substrate stage mount 18c is made of a plate-like member parallel to the XY plane, and is interposed between the vicinity of the lower end of a pair of side columns 18b. As shown in FIG. 2, a plurality of substrate stage mounts 18c are formed at predetermined intervals in the Y-axis direction (in the first embodiment, for example, two). On the upper surface of the substrate stage mount 18c, as shown in FIG. 3, a plurality of Y linear guides 19a extending in the Y-axis direction are fixed at predetermined intervals in the X-axis direction (for example, two).

The substrate stage device 20A is a plurality of (for example, three) base frames 22, a pair of X-beams 24, a coarse motion stage 28, and a fine motion stage 30 (not shown in FIG. 3). 1), a weight canceling device 40, a first step guide 50, a pair of second step guides 54, and a target stage 60.

For example, the three base frames 22 are each made of a plate-like member extending in the Y-axis direction and parallel to the YZ plane, and are arranged parallel to each other at predetermined intervals in the X-axis direction. In addition, although FIG. 1 corresponds to the cross-sectional view taken along the line A-A in FIG. 2, the illustration of the base frame 22 is omitted from the viewpoint of avoiding the appearance of the drawings. For example, of the three base frames 22, the first base frame 22 is on the +X side of the +X side substrate stage mount frame 18c, and the second base frame 22 is on the -X side substrate stage. On the -X side of the mount frame 18c, the third base frame 22 is, for example, between two substrate stage mount mounts 18c, with a predetermined clearance interposed with respect to the substrate stage mount mount 18c, respectively. It is installed on the floor 11 (see Fig. 2). A Y linear guide 23a extending in the Y-axis direction is fixed to the upper end surface (end portion on the +Z side) of each of the plurality of base frames 22.

The pair of X-beams 24 are each formed of a member having a YZ cross section extending in the X-axis direction, and are arranged parallel to each other at predetermined intervals in the Y-axis direction. As for the pair of X-beams 24, each of the vicinity of both ends in the longitudinal direction and the center portion is supported by the base frame 22 from below. As shown in FIG. 2, the pair of X-beams 24 are connected to each other by connection members 24a made of plate-like members extending in the Y-axis direction in the vicinity of both ends in the longitudinal direction on the lower surface thereof. Has been. In addition, a spacer 24b is attached to the central portion of the X-beam 24 in the longitudinal direction on the lower surface thereof. On the lower surfaces of the connection member 24a and the spacer 24b, a Y slide member 23b that engages with the Y linear guide 23a so that it can slide freely is fixed. Thereby, the pair of X-beams 24 is guided straight on the plurality of base frames 22 in the Y-axis direction. In addition, a pair of X-beams 24 are driven in the Y-axis direction with a predetermined stroke on a plurality of base frames 22 by a Y actuator (e.g., a linear motor, a thumb screw device, etc.) (not shown). . Here, the Z position of the lower surface of the pair of X beams 24 is located on the +Z side than the Z position of the upper end of the Y linear guide 19a fixed to the upper surface of the substrate stage mount 18c, The X-beam 24 is vibratingly separated from the substrate stage mount 18c (that is, the apparatus main body 18).

On the upper surface of each of the pair of X beams 24, as shown in Fig. 3, an X linear guide 25a extending in the X-axis direction is fixed. Further, on both side surfaces of each of the pair of X beams 24, an X stator 26a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction is fixed.

The coarse motion stage 28 is made of a rectangular plate-shaped member in plan view (viewed from the +Z direction), and is mounted on the pair of X-beams 24. In the central portion of the coarse motion stage 28, an opening 28a is formed. On the lower surface of the coarse motion stage 28, as shown in Fig. 4(A), the X linear guide 25a is engaged so that it can slide freely, and together with the X linear guide 25a, the X linear guide device 25 ) Is fixed to a plurality of X slide members 25b (for example, four with respect to one X linear guide 25a). Thereby, the coarse motion stage 28 is guided straight on the pair of X beams 24 in the X-axis direction.

In addition, in each of the lower surface of the coarse motion stage 28, the region on the +Y side of the opening (28a) and the region on the -Y side, a pair of X movable elements 26b is provided through the fixed plate 27 to the X stator. It is attached to face (26a). The X mover 26b has a coil unit, and an X linear motor 26 for driving the coarse motion stage 28 together with the corresponding X stator 26a in the X-axis direction on a pair of X beams 24 It is composed of. In addition, the coarse motion stage 28 is limited in relative movement in the Y-axis direction with respect to the pair of X beams 24 by the action of the X linear guide device 25, and the pair of X beams ( It moves in the Y-axis direction integrally with 24). That is, the pair of X-beams 24 and the coarse motion stage 28 constitute a so-called gantry-type biaxial stage device.

Returning to FIG. 1, the fine moving stage 30 is made of a rectangular parallelepiped member having a low height, and is disposed above the coarse moving stage 28. The substrate holder 32 is fixed to the upper surface of the fine moving stage 30. The substrate holder 32 adsorbs and holds the substrate P mounted on the upper surface thereof, for example, by vacuum adsorption. In addition, in FIG. 3, the illustration of the fine moving stage 30 and the substrate holder 32 is omitted from the viewpoint of avoiding the appearance of the drawings. A Y bar mirror 34y having a reflective surface orthogonal to the Y axis is fixed to the side surface of the -Y side of the fine moving stage 30 via the mirror base 33. In addition, an X-bar mirror 34x having a reflective surface orthogonal to the X axis is fixed to the side surface of the fine moving stage 30 on the -X side, as shown in FIG. 2, through the mirror base 33.

The fine motion stage 30 is 3 on the coarse motion stage 28 by a fine motion stage drive system including a stator fixed to the coarse motion stage 28 and a plurality of voice coil motors comprising a mover fixed to the fine motion stage 30. It is driven finely in the directions of degrees of freedom (X-axis, Y-axis, θz direction). In the plurality of voice coil motors, for example, two X voice coil motors 36x (not shown in Fig. 1), and, for example, two Y voice coil motors 36y (not shown in Fig. 2). Fig. 1 Reference) is included. In addition, in FIG. 2, for example, two X voice coil motors 36x overlap with the depth direction of the paper. In addition, in Fig. 1, for example, two Y voice coil motors 36y overlap with the depth direction of the paper.

The fine motion stage 30 is non-contactly induced to the coarse motion stage 28 by the thrust (electromagnetic force) generated by the plurality of voice coil motors, whereby the coarse motion stage 28 and the X-axis direction, and/ Or, it moves with a predetermined stroke in the Y-axis direction. Further, the fine motion stage 30 is suitably finely driven in the direction of the three degrees of freedom with respect to the coarse motion stage 28 by a plurality of voice coil motors.

In addition, as shown in FIG. 1, the fine moving stage drive system has a plurality of Z voice coil motors 36z for finely driving the fine moving stage 30 in the directions of θx, θy, and three degrees of freedom in the Z-axis direction. . The plurality of Z voice coil motors 36z are arranged at points corresponding to the four corners of the fine moving stage 30, for example (in FIG. 1, only two of the four Z voice coil motors 36z are shown. , The other two are hidden by the depth of the ground). A configuration of a fine-moving stage drive system including a plurality of voice coil motors is disclosed in, for example, US Patent Application Publication No. 2010/0018950.

The X position information of the fine moving stage 30 is an X-bar mirror by an X laser interferometer 38x fixed to the apparatus main body 18 via a member referred to as an interferometer column 18e, as shown in FIG. It is obtained using (34x). In addition, the Y position information of the fine moving stage 30 is obtained using the Y bar mirror 34y by the Y laser interferometer 38y fixed to the apparatus main body 18, as shown in FIG. The X laser interferometer 38x and the Y laser interferometer 38y are each formed in plural (in Figs. 1 and 2, respectively, overlapping with the depth direction of the ground), so that the θz position information of the fine moving stage 30 can be obtained. Has been.

As shown in Fig. 4(A), information on the Z-axis, θx, and θy-direction positions (hereinafter referred to as Z-tilt positions) of the fine-moving stage 30 is a plurality of pieces mounted on the lower surface of the fine-moving stage 30. It is calculated|required using the target stage 60 mentioned later by the Z sensor 38z of (for example, four). For example, four Z sensors 38z are arranged at predetermined intervals around the Z axis. In the substrate stage device 20A, the Z position information of the fine moving stage 30 is based on the average value of the outputs of the plurality of Z sensors 38z, based on the output difference of the plurality of Z sensors 38z, Information on the amount of rotation of the stage 30 in the θx and θy directions is obtained. The type of the Z sensor 38z is not particularly limited, and for example, a laser displacement meter, a laser interferometer, or the like can be used.

The weight canceling device 40 supports the fine moving stage 30 from below through the leveling device 46 described later as shown in FIG. 4(A). The weight canceling device 40 is inserted into the opening 28a of the coarse motion stage 28 and is supported from below by a first step guide 50 to be described later. The weight canceling device 40 has an air bearing 42 at its lower end, and the static pressure of pressurized gas (for example, air) ejected from the air bearing 42 against the upper surface of the first step guide 50 As a result, it is floated on the first step guide 50 via a predetermined clearance. In addition, although FIG. 4(A) is equivalent to the cross-sectional view taken along the line B-B in FIG. 3, the illustration of the base frame 22 is omitted from the viewpoint of avoiding the appearance of the drawing.

The weight canceling device 40 of the present embodiment has the same configuration and function as the weight canceling device disclosed in, for example, US 2010/0018950 specification. That is, the weight canceling device 40 has, for example, an air spring (not shown), and the fine moving stage 30 and the substrate holder 32 are generated by a force in the upward direction (+Z direction) in the gravitational direction generated by the air spring. ), etc. (force in the downward direction (-Z direction) due to weight acceleration) is erased, whereby, when the Z-tilt position control of the fine moving stage is performed, the plurality of Z voice coil motors 36z are Reduce the load.

The weight canceling device 40 is mechanically interposed with a plurality of, for example, four flexure devices 44 with respect to the coarse motion stage 28 at a Z position substantially the same as the Z position of the center of gravity (the height of the center of gravity). It is connected to. The flexure device 44 of this embodiment has the same configuration and function as the flexure device disclosed in, for example, US Patent Application Publication No. 2010/0018950. That is, the flexure device 44 includes, for example, a thin strip-shaped steel plate arranged parallel to the XY plane, and a sliding device (for example, a ball joint) formed at both ends of the steel plate. , The steel plate is interposed between the weight canceling device 40 and the coarse motion stage 28 via a sliding device.

The flexure device 44 is the weight canceling device 40 and the coarse motion stage 28 on the +X side, -X side, +Y side, and -Y side of the weight canceling device 40, respectively, as shown in FIG. 3. Are connecting. Thereby, when the coarse motion stage 28 moves in the X-axis direction and/or the Y-axis direction, the weight canceling device 40 is the coarse motion stage 28 via at least one of the plurality of flexure devices 44 By being pulled by, it moves in the X-axis direction and/or the Y-axis direction integrally with the coarse motion stage 28.

Returning to Fig. 4(A), the leveling device 46 is a spherical bearing device including a base 46a and a ball 46b, which can freely swing (tilt) the fine moving stage 30 in the θx and θy directions. It is supported from the lower side so that it can move and moves along the XY plane integrally with the fine moving stage 30. The leveling device 46 is non-contact supported by the weight canceling device 40 from below via an air bearing (not shown) attached to the weight canceling device 40, and a direction along a horizontal plane with respect to the weight canceling device 40 Relative movement is allowed. In addition, if it is possible to support the fine moving stage 30 from below so that it can tilt freely, as a leveling device, for example, a similar spherical bearing device as disclosed in US Patent Application Publication No. 2010/0018950 is used. Can also be done.

As shown in FIG. 3, the 1st step guide 50 consists of a plate-shaped member parallel to the XY plane extending in the X-axis direction, and is arrange|positioned on two board|substrate stage mounts 18c, for example. The dimension in the longitudinal direction of the first step guide 50 is set slightly longer than the movement stroke of the fine moving stage 30 in the X-axis direction. In addition, the width direction (Y-axis direction) dimension of the 1st step guide 50 is set slightly wider than the footprint of the weight canceling device 40. The top surface of the first step guide 50 is finished in a very high flatness so as to be parallel to the XY plane (horizontal plane), and when the weight canceling device 40 (and the fine moving stage 30) moves in the X-axis direction. It functions as a guide surface of. The material of the first step guide 50 is not particularly limited, but it is preferably formed using, for example, a stone (for example, a dense stone such as crushed stone), ceramics, cast iron, or the like.

On the lower surface of the first step guide 50, as shown in Fig. 4(B), there are a plurality of Y slide members 19b engaging the Y linear guide 19a so that they can slide freely (one Y linear guide). With respect to (19a), for example, two) are fixed. Thereby, the 1st step guide 50 is guided straight in the Y-axis direction along the several Y linear guides 19a.

As shown in FIG. 3, a pair of connecting members 50a are fixed at predetermined intervals in the Y-axis direction at the end of the first step guide 50 on the +X side. In the first step guide 50, the connecting member 50a on the +Y side is connected to the X-beam 24 on the +Y side through the flexure device 52, and the connecting member 50a on the -Y side is flexible. It is connected to the X-beam 24 on the -Y side via the lexer device 52. Similarly, a pair of connecting members 52a is also fixed to the end of the first step guide 50 on the -X side, and the first step guide 50 is flexible through the pair of connecting members 52a. It is connected to each of the pair of X-beams 24 by the lexer device 52. As shown in FIG. 4(A), the flexure device 52 is at a Z position (weight center height) substantially the same as the Z position of the center of gravity of the first step guide 50, the first step guide 50 And the X-beam 24 are connected.

The configuration of the flexure device 52 is substantially the same as the flexure device 44 connecting the weight canceling device 40 and the coarse motion stage 28. That is, the flexure device 52 includes a steel plate having a thin thickness parallel to the XY plane extending in the Y-axis direction, and a sliding device (for example, a ball joint) formed at both ends of the steel plate, and the steel plate is slid. It is interposed between the first step guide 50 and the X-beam 24 via an apparatus. Therefore, while the first step guide 50 and the X beam 24 are connected integrally (high rigidity) with respect to the Y-axis direction, the other five-degree-of-freedom directions (X, Z, θx, θy, Regarding θz), it is vibratingly separated.

In the substrate stage device 20A, in order to drive the substrate P with a predetermined stroke in the X-axis direction, when the coarse motion stage 28 is driven in the X-axis direction, the weight canceling device 40 is the coarse motion stage 28 It is pulled on and moves on the first step guide 50 in the X-axis direction. In addition, in order to drive the substrate P with a predetermined stroke in the Y-axis direction, when a pair of X-beams 24 are driven in the Y-axis direction, the weight canceling device 40 is pulled by the coarse motion stage 28 It moves in the Y axis direction. At this time, the pair of X-beams 24 and the first step guide 50 are integrally moved in the Y-axis direction (the weight canceling device 40 and the first step guide 50 are relative in the Y-axis direction). Does not move), the weight canceling device 40 does not come off from the first step guide 50. Therefore, the width direction (Y-axis direction) dimension of the first step guide 50 should be the minimum dimension capable of guiding the movement of the weight canceling device 40 in the X-axis direction, and thus can be formed at a light weight. have.

Each of the pair of second step guides 54 is formed of a plate-shaped member having a rectangular YZ cross section extending in the X-axis direction, and is disposed on, for example, two substrate stage mounts 18c. One pair of the second step guide 54 is on the +Y side of the first step guide 50, the other is on the -Y side of the first step guide 50, and the first step guide 50 is respectively On the other hand, they are arranged parallel to each other through a predetermined clearance.

The lengthwise dimension of the second step guide 54 is set substantially the same as that of the first step guide 50 as shown in FIG. 3, but the width direction (Y-axis direction) dimension is the first step guide ( It is set narrower than 50). In addition, as shown in FIG. 4(B), the thickness direction dimension of the 2nd step guide 54 is set substantially the same as the 1st step guide 50. On the lower surface of the second step guide 54, a Y slide member 19c that engages with the Y linear guide 19a so that it can slide freely is fixed. Thereby, the 2nd step guide 54 is guided straight in the Y-axis direction along the several Y linear guides 19a.

The top surface of the second step guide 54 has a very high flatness finish so as to be parallel to the XY plane (horizontal plane), and functions as a guide surface when the target stage 60 described later moves in the X-axis direction. The material of the second step guide 54 is not particularly limited, but it is preferably formed using, for example, a stone (for example, a dense stone such as crushed stone), ceramics, cast iron, aluminum alloy, or the like.

The pair of second step guides 54 are integrally connected by a connecting member 56 made of a U-shaped member in YZ cross section, as shown in Fig. 4A. The first step guide 50 is inserted between the pair of opposing surfaces of the connecting member 56 via a predetermined clearance. As shown in FIG. 2, a plurality of connecting members 56 (for example, four in the first embodiment) are formed at predetermined intervals in the X-axis direction.

As shown in FIG. 3, the connecting member 54a is fixed to each of both ends of the 2nd step guide 54 in the longitudinal direction (+X side and -X side). In the second step guide 54 on the +Y side, the connecting member 54a is connected to the X-beam 24 on the +Y side via the flexure device 58, and the second step guide 54 on the -Y side ), the connection member 54a is connected to the X-beam 24 on the -Y side through the flexure device 58. The configuration of the flexure device 58 is substantially the same as the flexure device 52 connecting the first step guide 50 and the X beam 24. Thus, when one pair of X-beams 24 moves in the Y-axis direction, the first step guide 50 and the pair of second step guides 54 are integrated with the pair of X-beams 24. It moves in the Y axis direction.

The target stage 60 is disposed between a pair of X-beams 24 and mounted on a pair of second step guides 54. The target stage 60 is an upper ring 61, a lower ring 62, a connecting member 63, a plurality of targets 64, and a plurality of air bearings 65, as shown in FIG. 4(B). ).

As shown in Fig. 3, the upper ring 61 is made of a disc-shaped member having an opening in the center. The lower ring 62 is made of a disk-shaped member formed with an outer diameter and an inner diameter that are substantially the same as those of the upper ring 61 (but the thickness is thinner than the upper ring 61), as shown in FIG. 4(B). Likewise, it is disposed below the upper ring 61 (in Fig. 3, it is covered by the depth of the ground with respect to the upper ring 61). The weight canceling device 40 is inserted into the openings of the upper ring 61 and the lower ring 62, respectively. The connecting member 63 is inserted between the lower surface of the upper ring 61 and the upper surface of the lower ring 62, and integrally connects the upper ring 61 and the lower ring 62. Further, the lower ring 62 may have a smaller diameter than the upper ring 61, and the upper ring 61 may be on the +Z side than the coarse motion stage 28, and may have a larger diameter than the opening of the coarse motion stage 28. .

In this first embodiment, corresponding to the plurality of Z sensors 38z, for example, four targets 64 correspond to each other at predetermined intervals in the θz direction (around the Z axis), as shown in FIG. 3. It is fixed to the upper surface of the upper ring 61 so that it may be located directly below the Z sensor 38z. It is preferable to select the type of the target 64 according to the type of the Z sensor 38z. As the Z sensor 38z, for example, when a reflective laser displacement sensor of a triangulation method is used, it is preferable to use white ceramics as the target 64, and as the Z sensor 38z, for example, vertical When a reflective laser displacement sensor of a reflection type is used, it is preferable to use a mirror as the target 64 (the upper surface of the upper ring 61 may be mirror-finished and the target 64 may be omitted). The target 64 has an area set (so that the measurement beam does not deviate from the target) in consideration of the amount of movement when the fine motion stage 30 is slightly driven with respect to the coarse motion stage 28.

A plurality of air bearings 65 (for example, four in the first embodiment) are fixed to the lower surface of the lower ring 62 at predetermined intervals in the θz direction (around the Z axis). For example, of the four air bearings 65, the gas ejection faces (bearing faces) of the two air bearings 65 face the upper face of the second step guide 54 on one (+Y side), and the other two The gas ejection surface of the two air bearings 65 faces the upper surface of the second step guide 54 on the other side (-Y side). The target stage 60 is a positive pressure of pressurized gas (for example, air) ejected from the plurality of air bearings 65 against the corresponding second step guide 54 as shown in FIG. 4B. As a result, it floats on the pair of second step guides 54 via a predetermined clearance.

The target stage 60 is connected to the coarse motion stage 28 by a plurality of flexure devices 66 as shown in FIG. 3. The configuration of the flexure device 66 is substantially the same as that of the flexure device 44 connecting the weight canceling device 40 and the coarse motion stage 28 (however, the plurality of flexure devices 44 are X-axis Alternatively, the plurality of flexure devices 66 extend in the X-axis or Y-axis, for example, in a direction forming an angle of 45°, while being arranged parallel to the Y-axis (+ in a plane view). have).

In the substrate stage device 20A, in order to drive the substrate P with a predetermined stroke in the X-axis direction, when the coarse motion stage 28 is driven in the X-axis direction, the target stage 60 becomes the coarse motion stage 28. It is pulled on and moves on a pair of second step guides 54 in the X-axis direction. In addition, in order to drive the substrate P with a predetermined stroke in the Y-axis direction, when a pair of X-beams 24 are driven in the Y-axis direction, the target stage 60 is pulled by the coarse motion stage 28 It moves in the Y axis direction. At this time, a pair of X beams 24 and a pair of second step guides 54 are integrally moved in the Y-axis direction (target stage 60 and a pair of second step guides 54) Does not move relative to the Y-axis direction), the target stage 60 does not come off from the pair of second step guides 54.

Further, since the fine moving stage 30 is guided to the coarse moving stage 28 and moves in the X-axis and/or Y-axis direction, the target stage 60 and the fine moving stage 30 are integrated with X It moves in the direction of the axis and/or the Y axis. Therefore, the Z sensor 38z can obtain the Z position information of the fine moving stage 30 using the corresponding target 64 regardless of the position of the fine moving stage 30 in the XY plane.

In the liquid crystal exposure apparatus 10 (refer to FIG. 1) configured as described above, the mask M to the mask stage apparatus 14 is controlled by a mask loader (not shown) under management of a main control apparatus (not shown). While loading is performed, the substrate P is loaded onto the substrate holder 32 by a substrate loader (not shown). Thereafter, alignment measurement is performed by the main control device using an alignment detection system (not shown), and after the alignment measurement is completed, a plurality of shot regions set on the substrate P are sequentially stepped and scanned. The exposure operation is performed. In addition, since this exposure operation is the same as the conventional step-and-scan exposure operation, a detailed description is omitted here.

At the time of the exposure operation and the alignment operation, in the substrate stage device 20A, a plurality of sensors 15 (autofocus sensors) that are the lower surfaces of the barrel platen 18a and fixed in the vicinity of the projection optical system 16 Accordingly, the Z position information of the surface of the substrate P is obtained, and the Z position of the exposure area on the substrate P is located within the depth of focus of the projection optical system 16 based on the outputs of the plurality of sensors 15. Thus, the Z-tilt position control of the fine motion stage 30 is performed using a plurality of Z voice coil motors 36z.

According to the substrate stage device 20A according to the present embodiment described above, the target 64 used to obtain the Z position information of the fine moving stage 30 is a target stage which is a member separate from the weight canceling device 40 Since it is attached to 60, compared to the case where the target 64 is attached to the weight canceling device 40, for example, the weight canceling device 40 can be made smaller and lighter. In addition, for example, when mounting the target 64 to the weight canceling device 40, when the flatness of the upper surface of the first step guide 50 is lowered, the measurement accuracy of the Z-tilt position information of the fine moving stage 30 is In contrast to the possibility of lowering, in the substrate stage device 20A, when obtaining the Z-tilt position information of the fine moving stage 30, the target stage mounted on the pair of second step guides 54 ( 60) is used, for example, even if the top surface of the first step guide 50 is lowered, since the top surface of the second step guide 54 functions as a measurement reference surface, the Z-tilt position of the fine moving stage 30 There is no problem with the measurement accuracy of information.

In addition, since the Z-tilt position of the fine moving stage 30 can be controlled with high precision by a plurality of Z voice coil motors 36z, for example, even if the flatness of the upper surface of the first step guide 50 decreases, the fine moving stage If the measurement accuracy of the Z-tilt position information of (30) can be ensured, the Z-tilt position control of the fine moving stage 30 can be performed with high precision. Therefore, it is not necessary to take measures such as increasing the rigidity of the first step guide 50 in order to ensure the flatness of the upper surface of the first step guide 50. Accordingly, the first step guide 50 can be made smaller (thinner) and lighter.

In addition, the configuration of the substrate stage device 20A according to the first embodiment can be appropriately modified. Hereinafter, a modified example of the first embodiment will be described. In addition, in a modified example of the first embodiment described below, elements having the same configuration and function as in the first embodiment are denoted by the same reference numerals, and detailed descriptions thereof are omitted as appropriate.

<< Modification Example of First Embodiment (Part 1) >>

5 to 6(B), the substrate stage apparatus 20B according to the modification example (part 1) of the first embodiment is shown (in addition, in FIG. 5, the micro-moving stage 30 (FIG. 6(A)) Reference) is not shown).

In the substrate stage device 20A of the first embodiment (refer to Fig. 4B), the Z-tilt position information of the fine moving stage 30 is determined by a plurality of Z sensors 38z, and the target stage ( In contrast to that obtained using the target 64 attached to 60), in the substrate stage device 20B shown in FIG. 6(B), a pair of second step guides ( 54) The points obtained using each top surface are different. In addition, other elements, including the driving system of the pair of second step guides 54, are the same as those of the first embodiment, as shown in Figs. 5 and 6A.

When, for example, a reflective laser displacement sensor of a triangulation method is used for the Z sensor 38z, a band-shaped member formed of white ceramic is used as a target (a reference plane for measuring Z-tilt position information), and a second step guide It is sufficient to attach it to the upper surface of (54) (to make the second step guide 54 itself function as a target, the second step guide 54 itself may be formed of ceramics, or ceramics etc. may be formed on the metal surface by thermal spraying). May be formed). In addition, in the case where, for example, a vertical reflection type reflective laser displacement sensor is used for the Z sensor 38z, a band-shaped mirror covering substantially the entire upper surface of the second step guide 54 is used as the second step guide ( 54) (or mirror processing may be performed on the entire upper surface of the second step guide 54).

According to the substrate stage device 20B, since it does not have the target stage 60 (see Fig. 3) as compared to the substrate stage device 20A of the first embodiment, the configuration is simple. In addition, since the inertial mass becomes small, the position controllability of the coarse motion stage 28 (that is, the substrate P) is improved. Moreover, the linear motor for driving the coarse motion stage 28 can also be downsized. Further, since the target stage 60 is not mounted on the second step guide 54, there is no need to take measures such as increasing the rigidity of the second step guide 54. Accordingly, the second step guide 54 can be made smaller (thinner) and lighter.

<< Modification Example of First Embodiment (Part 2) >>

7 and 8 show a substrate stage apparatus 20C according to a modified example (part 2) of the first embodiment. In the substrate stage device 20A of the first embodiment, as shown in FIG. 4(A), the weight canceling device 40 is on the first step guide 50 via a leveling device 46, and a fine moving stage ( 30) is supported from below, whereas in the substrate stage device 20C, as shown in FIG. 8, the leveling device 78 is directly mounted on the first step guide 70A. . In addition, although not shown, the 1st step guide 70A is similar to the said 1st Embodiment, with respect to the pair of X-beams 24 (not shown in FIGS. 7 and 8, see FIG. 1 etc.) mechanically. It is connected by, and moves in the Y-axis direction integrally with a pair of X-beams 24. In addition, the coarse motion stage 28 is mounted on a pair of X-beams 24, and is driven in the X-axis direction on the pair of X-beams 24, together with a pair of X-beams 24. It moves in the Y axis direction.

The first step guide 70A has a guide body 71, an air spring 72, and a pair of Z voice coil motors 73, as shown in Fig. 7, a weight canceling device, and a Z actuator It also functions as. The guide body 71 has a lower plate part 71a, an upper plate part 71b, and a pair of guide plates 71c, as shown in FIG. 8. The lower plate portion 71a and the upper plate portion 71b are each formed of a rectangular plate-shaped member parallel to the XY plane extending in the X-axis direction, and are arranged parallel to each other at predetermined intervals in the Z-axis direction. The upper plate portion 71b is guided by a pair of guide plates 71c (or linear guide devices not shown) fixed to the lower plate portion 71a, and is movable in the Z-axis direction with respect to the lower plate portion 71a. .

The air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b, and supports the central portion of the upper plate portion 71b from below. Pressurized gas is supplied from the outside to the air spring 72, and a force in the upward direction of gravity balanced with the weight of the system including the fine moving stage 30 (including the leveling device 78) is applied to the upper plate portion 71b. Acts against Further, a plurality of air springs 72 may be disposed at predetermined intervals in the X-axis direction.

One pair of Z voice coil motors 73 is disposed in the vicinity of the end portion on the +X side of the first step guide 70A and the other in the vicinity of the end portion on the -X side of the first step guide 70A. . The voice coil motor 73 includes a stator 73a fixed to the lower plate portion 71a and a mover 73b fixed to the upper plate portion 71b, and Z position control of the fine moving stage 30 is to be performed. At this time, the upper plate portion 71b is driven in the Z-axis direction (position control in the θx and θy directions of the fine moving stage 30 is performed via the fine moving stage drive system in the same manner as in the above embodiment).

The leveling device 78 is a spherical bearing device including a base 78a and a ball 78b, and supports the fine moving stage 30 from below so that it can freely swing (tilt operation) in the θx and θy directions. , It moves along the XY plane integrally with the fine moving stage 30. The base 78a is inserted into the opening 28a of the coarse motion stage 28, and has an air bearing (not shown) in which the gas ejection surface (bearing surface) faces the -Z side (lower side). The leveling device 78 is placed on the first step guide 70A through a predetermined clearance by the positive pressure of the pressurized gas (for example, air) ejected from the base 78a to the upper surface of the upper plate portion 71b. Is injured.

As shown in FIG. 8, the Z-tilt position information of the fine moving stage 30 is similar to the substrate stage device 20B (refer to FIGS. 5 to 6(B)), to a plurality of Z sensors 38z. As a result, it is obtained using the upper surface of the second step guide 54 (as in the first embodiment, the target stage 60 (refer to Fig. 3) may be used).

In the substrate stage device 20C, since the interval between the upper surface of the coarse moving stage 28 and the lower surface of the fine moving stage 30 can be shortened, the overall height direction dimension of the substrate stage device 20C is lowered. In addition, since the inertial mass becomes small, the position controllability of the coarse motion stage 28 (that is, the substrate P) is improved. Moreover, the linear motor for driving the coarse motion stage 28 can also be downsized.

<< Modification Example of 1st Embodiment (Part 3) >>

In Fig. 9, a substrate stage device 20D according to a modification example (No. 3) of the first embodiment is shown. The substrate stage device 20D differs in the configuration of the first step guide 70B as compared to the substrate stage device 20C (see FIGS. 7 and 8 ). Hereinafter, only the differences will be described.

The first step guide 70B includes a guide body 74 made of a hollow rectangular parallelepiped (box-shaped) member extending in the X-axis direction, and a plurality of Z actuators 75 accommodated in the guide body 74. do. The guide body 74 has, for example, reduced in thickness, so that the rigidity of the upper surface portion is set lower than that of the lower surface portion. The plurality of Z actuators 75 are arranged at predetermined intervals in the X-axis direction, and press the upper surface portion of the guide body 74 to the +Z side. In addition, the type of the Z actuator 75 is not particularly limited, but since the driving amount of the upper surface portion is small, for example, an air cylinder, a piezo element, or the like can be used.

In the substrate stage device 20D, as schematically shown in Fig. 10, the fine moving stage 30 is driven in the Z-axis direction by a plurality of Z actuators 75 (not shown in Fig. 10, see Fig. 9). do. Here, the upper surface portion of the guide body 74 is deformed by being pressed by the plurality of Z actuators 75 and is inclined with respect to the horizontal surface, but since the fine moving stage 30 is supported via the leveling device 78 There is no problem in the Z-tilt control of the fine moving stage 30. In addition, in FIG. 10, the deformation|transformation (dent) of the upper surface part of the guide main body 74 is exaggerated and shown in order to facilitate understanding. The substrate stage device 20D can also obtain the same effects as the substrate stage device 20C.

<< Modification Example of First Embodiment (Part 4) >>

In Fig. 11, a substrate stage device 20E according to a modified example (No. 4) of the first embodiment is shown. The substrate stage device 20E differs from the substrate stage device 20D (see FIG. 9) in the configuration of the first step guide 70C. Hereinafter, only the differences will be described.

The first step guide 70B (refer to FIG. 9) of the substrate stage device 20D drives the fine moving stage 30 in the Z-axis direction using a plurality of Z actuators 75 arranged in the X-axis direction. In contrast, as shown in FIG. 11, the first step guide 70C differs in that the pair of cam devices 76 drives the fine moving stage 30 in the Z-axis direction.

Each of the pair of cam devices 76 is in the vicinity of an end portion on the +X side of the first step guide 70C, and the other is in the vicinity of an end portion on the -X side of the first step guide 70C. ) And the upper plate portion 71b. The cam device 76 includes a lower wedge 76c mounted on a base plate 76a fixed to the lower plate portion 71a so as to be movable in the X-axis direction via an X linear guide device 76b, and an upper plate portion ( 71b), and an upper wedge 76d disposed opposite to the lower wedge 76c, and an actuator 76e that drives the lower wedge 76c in the X-axis direction. The substrate stage device 20E can also obtain the same effects as the substrate stage device 20D.

<< Modification Example of 1st Embodiment (Part 5) >>

In Fig. 12, a substrate stage device 20F according to a modification example (No. 5) of the first embodiment is shown. The substrate stage device 20F is compared with the substrate stage device 20C (see Figs. 7 and 8), the leveling device 78 (refer to Figs. 7 and 8), and a plurality of Z voice coil motors 36z. ) (Refer to Fig. 7), and the configuration of the first step guide 70D is different. Hereinafter, only the differences will be described.

In the first step guide 70D, an air spring 72 is inserted between the lower plate portion 71a and the upper plate portion 71b in the same manner as the first step guide 70A (see Figs. 7 and 8), and a plurality of The upper plate portion 71b is driven by the Z voice coil motor 73. Moreover, the 1st step guide 70D does not have the same guide plate 71c (refer FIG. 8) as the said 1st step guide 70A. In addition, a plurality of Z voice coil motors 73 are arranged, for example, at predetermined intervals in the Y-axis direction in the vicinity of the end portion of the first step guide 70D on the +X side (or -X side). (In Fig. 12, it overlaps with the direction of the depth of the ground). That is, the plurality of Z voice coil motors 73 are disposed at three points not on the same straight line.

An air bearing 79 whose bearing surface faces the -Z side is attached to the central portion of the lower surface of the fine moving stage 30. The fine-moving stage 30 is formed on the first step guide 70D by a positive pressure of pressurized gas (for example, air) ejected from the air bearing 79 against the upper surface of the first step guide 70D. It is floating (in a non-contact state) through the clearance.

In the substrate stage device 20F, a plurality of Z voice coil motors 73 appropriately drive the upper plate portion 71b in the Z-axis direction and/or in a direction tilting with respect to the horizontal plane (θx and θy directions). , Z-tilt control of the fine moving stage 30 is performed. According to the substrate stage device 20F, the configuration is further simpler than that of the substrate stage device 20C (see Figs. 7 and 8). In addition, similarly to the substrate stage device 20D (see Fig. 9), the upper plate portion 71b may be tilted using a plurality of Z actuators 75 (a plurality of Z actuators 75 are arranged at predetermined intervals also in the Y-axis direction). In the same manner as the substrate stage device 20E (see Fig. 11), the upper plate portion 71b may be tilted using a plurality of cam devices 76 (but arranged at three points not on the same straight line).

<< 2nd embodiment >>

Next, a second embodiment will be described with reference to FIGS. 13 to 17. Since the configuration of the liquid crystal exposure apparatus according to the second embodiment is the same as that of the first embodiment, except for the configuration of the substrate stage device 20G, elements having the same configuration and functions as in the first embodiment are provided. Regarding, the same reference numerals are assigned and detailed descriptions thereof are omitted as appropriate.

As shown in Fig. 4(B), in the substrate stage device 20A of the first embodiment, the first step guide 50 is mounted on the substrate stage mount frame 18c and is a mechanical linear guide device (Y linear guide). 19a) and the Y slide member 19b), whereas the substrate stage device 20G of the second embodiment, as shown in FIG. 13, has a 1st step guide 55. It is different in that it is mounted on the pair of base frames 80. In addition, in the above-described first embodiment, as shown in FIG. 2, while two substrate stage mounts 18c are formed, for example, the substrate stage mount 18f of the second embodiment is shown in FIG. 13. As shown in, it consists of one plate-shaped member. Therefore, the substrate stage device 20G does not have the base frame 22 (refer to FIG. 2) supporting the central portion in the longitudinal direction of the X-beam 24.

One pair of base frames 80 is the +X side of the substrate stage mount 18f, and the other is the -X side of the substrate stage mount 18f, between the substrate stage mount 18f and the base frame 22. Between the board|substrate stage mount 18f and the base frame 22, they are arrange|positioned with respect to the board|substrate stage mount 18f and the base frame 22, respectively, with a predetermined clearance interposed. 14 and 16, the illustration of the base frame 22 (in FIG. 16, the illustration of the X-beam 24) is abbreviate|omitted from the viewpoint of avoiding the confusion of the figure.

The base frame 80 is made of a plate-like member parallel to the XZ plane extending in the Y-axis direction (see Fig. 15), and is installed on the floor 11 via the support plate 81 and the vibration isolator 82 Has been. The first step guide 55 is via a Y linear guide device comprising a Y linear guide 84 fixed to the base frame 80 and a Y slide member 19b fixed to the lower surface of the first step guide 55 Thus, it is mounted on a pair of base frames 80 and is movable with a predetermined stroke in the Y-axis direction. Accordingly, the first step guide 55 is vibratingly separated from the apparatus main body 18 and the pair of base frames 22. As shown in Fig. 15, the first step guide 55 is mechanically connected to a pair of X-beams 24 via a plurality of flexure devices 52, similar to the first embodiment, And moves in the Y-axis direction integrally with the pair of X-beams 24. In addition, the first step guide 55 has a slightly larger dimension in the thickness direction compared to the first embodiment in order to suppress depression due to its own weight.

As shown in FIG. 14, the second step guide 54 includes a Y linear guide 19a fixed to the substrate stage mount 18f and the second step guide 54 in the same manner as in the first embodiment. It is mounted on a substrate stage mount 18f via a Y linear guide device made of a Y slide member 19c fixed to the lower surface, and is movable with a predetermined stroke in the Y axis direction. In addition, as shown in FIG. 15, the pair of 2nd step guide 54 is integrally connected by the connecting member 54b at both ends in the longitudinal direction. In the same manner as in the first embodiment, a pair of second step guides 54 uses a plurality of flexure devices 58 (not shown in FIGS. 13 and 14) for a pair of X-beams 24. It is mechanically connected through the interposition, and moves in the Y-axis direction integrally with the pair of X-beams 24.

As shown in Figs. 16 and 17 in this second embodiment, the second step guide 54 is provided by a plurality of Z sensors 38z mounted on the fine moving stage 30, similarly to the first embodiment. ), the Z-tilt position information of the fine stage 30 is obtained.

According to the substrate stage device 20G of the second embodiment, since the first step guide 55 supporting the weight canceling device 40 is supported by the base frame 80, compared to the first embodiment. The rigidity in the gravitational direction of the substrate stage mount 18f is not required. Therefore, it becomes possible to reduce the thickness and weight of the substrate stage mount 18f.

In addition, an unbalanced load acts on the substrate stage mount 18f depending on the position of the fine moving stage 30 (and the weight canceling device 40), but in the second embodiment, it is mounted on the substrate stage mount 18f. Since the formed member is only the pair of second step guides 54, the influence of the offset load is less than that of the first embodiment. In addition, the Z-tilt position information of the fine moving stage 30 does not use the second step guide 54, and the target stage 60 (refer to Fig. 4A) is used in the same manner as in the first embodiment. You may use it to obtain.

In addition, the configuration of the substrate stage device 20G according to the second embodiment can be appropriately modified. Hereinafter, a modified example of the substrate stage device 20G according to the second embodiment will be described. In addition, in a modified example of the second embodiment described below, elements having the same configuration and function as in the second embodiment are denoted by the same reference numerals, and detailed descriptions thereof are omitted as appropriate.

<< Modification Example of 2nd Embodiment (Part 1) >>

18 and 19 show a substrate stage apparatus 20H according to a modified example (part 1) of the second embodiment. The Z-tilt position information of the fine moving stage 30 is obtained using the second step guide 54 by a plurality of Z sensors 38z, as shown in FIG. 17 in the second embodiment. On the other hand, in the substrate stage apparatus 20H shown in FIGS. 18 and 19, a point obtained by using the upper surface of the substrate stage mount 18g by the plurality of Z sensors 38z is different.

In the substrate stage device 20H, as the Z sensor 38z, for example, a reflective laser displacement sensor of a triangulation method is used, and the XY plane of the fine moving stage 30 is on the upper surface of the substrate stage mount 18g. A target 69 made of a plate-like member formed of, for example, white ceramics having an area large enough to cover the inner moving region is mounted. Further, as the Z sensor 38z, for example, when a vertical reflection type reflective laser displacement sensor is used, the upper surface of the substrate stage mount 18g is mirror-finished (or on the upper surface of the substrate stage mount 18g). If you attach a mirror).

According to the substrate stage device 20H, since a Y linear guide for guiding the first step guide 55 in the Y axis direction is not formed on the substrate stage mount 18g, the upper surface of the substrate stage mount 18g Can be used directly by targeting. As described above, in the substrate stage device 20H, as compared with the substrate stage device 20G of the second embodiment shown in Fig. 13 and the like, the second step guide 54 is not formed, and thus the substrate stage device Compared with (20G), the board|substrate stage mount|stand 18g can be made thinner and lighter. Further, since it does not have the second step guide 54, there is no case where an unbalanced load acts on the substrate stage mount 18g.

<< Modification Example of 2nd Embodiment (Part 2) >>

In Fig. 20, a substrate stage device 20I according to a modified example (part 2) of the second embodiment is shown. The substrate stage device 20I includes a substrate stage device 20G (refer to FIGS. 13 to 17) according to the second embodiment, and a substrate stage device 20C according to a modification example (part 2) of the first embodiment. ) (See Figs. 7 and 8) has the same configuration as a combination.

That is, as shown in FIG. 20, in the substrate stage device 20I, similarly to the substrate stage device 20C, the first step guide 70A has a function as a Z actuator and a weight canceling device. In addition, the 1st step guide 70A is mounted on a pair of base frames 80 like the said board|substrate stage apparatus 20G, and the board|substrate stage mount 18f, and the X-beam 24 It is vibratingly separated from each other. According to the substrate stage device 20I, in addition to the effects of the second embodiment, the effects of the modified example (part 2) of the first embodiment can be obtained. That is, in the substrate stage apparatus 20I, while the substrate stage mount 18f can be reduced in weight, the position controllability of the coarse moving stage 28 (that is, the substrate P) is improved.

<< Modification Example of 2nd Embodiment (Part 3) >>

21 and 22, a substrate stage apparatus 20J according to a modified example (No. 3) of the second embodiment is shown. In the substrate stage device 20A according to the first embodiment (see Fig. 1, etc.) and the substrate stage device 20G according to the second embodiment (see Fig. 13, etc.), a pair of X-beams 24 While the so-called gantry-type biaxial stage device is constituted by the coarse motion stage 28, in the substrate stage device 20J, the first step guide 57 and the coarse motion stage supporting the weight canceling device 40 According to (28), a point in which a so-called gantry-type two-axis stage device is configured is different.

The first step guide 57 is made of a plate-shaped member having a square YZ cross section extending in the X-axis direction, and in the same manner as the substrate stage device 20G (refer to Fig. 13) according to the second embodiment, in the longitudinal direction Each of the both ends of is supported from below by the base frame 80 provided on the floor 11, and is vibratingly separated from the apparatus main body 18. The first step guide 57 is not shown in Figs. 21 and 22, but is driven with a predetermined stroke in the Y-axis direction by an actuator such as a linear motor (or thumb screw device), for example. In order to stably support the coarse motion stage 28, the first step guide 57 is compared to the first step guide 50 of the substrate stage device 20G (refer to Fig. 14) of the second embodiment. It is formed in a wide width (the dimension in the Y-axis direction is set large).

On the lower surface of the coarse motion stage 28, a plurality of (for example, four) air bearings 53 arranged with bearing surfaces opposite to the upper surface of the first step guide 57 are attached. In addition, on the lower surface of the coarse motion stage 28, as shown in FIG. 22, a pair of attachment plates 29 is attached, and the first step guide 57 is between the pair of attachment plates 29. Is inserted. A plurality of (for example, two) air bearings 53 are attached to each of the surfaces of the pair of mounting plates 29 facing the side surfaces of the first step guide 57. Thereby, the coarse motion stage 28 can move with a predetermined stroke in the X-axis direction with low friction along the first step guide 57, and the relative movement in the Y-axis direction with respect to the first step guide 57 This is limited. The coarse motion stage 28 is a first X linear motor comprising an X stator (not shown) fixed to the first step guide 57 and an X mover (not shown) fixed to the coarse motion stage 28. It is driven on the step guide 57 with a predetermined stroke in the X-axis direction.

The Z-tilt position information of the fine moving stage 30 is the same as the substrate stage device 20B (refer to Figs. 5 to 6(B)) by a plurality of Z sensors 38z as a pair of second steps. It is obtained using the upper surface of the guide 54. The pair of second step guides 54 is connected to the first step guide 57 via a flexure device (not shown), and is pulled by the first step guide 57 to be first in the Y-axis direction. It moves integrally with the step guide 57. In addition, since the first step guide 57 is wider than the first step guide 50 of the substrate stage device 20G (refer to Fig. 14) of the second embodiment, a pair of second step guides The interval of 54 is also wider than that of the substrate stage device 20G.

According to the substrate stage device 20J, compared to the substrate stage device 20G (see Fig. 13 and the like) according to the second embodiment, it does not have a pair of X-beams 24 (see Figs. 13 to 17). As long as it is, the configuration is simple. Further, since the first step guide 57 is vibratingly separated from the apparatus main body 18, the reaction force when driving the coarse motion stage 28 does not act on the apparatus main body 18. Further, the target used when obtaining the Z-tilt position information of the fine moving stage 30 may be attached to the weight canceling device 40.

<< Modification Example of 2nd Embodiment (Part 4) >>

23 and 24 show a substrate stage apparatus 20K according to a modified example (No. 4) of the second embodiment. The substrate stage device 20K includes a substrate stage device 20J (see Figs. 21 and 22) according to a modified example (part 3) of the second embodiment, and a modified example (part 2) of the first embodiment. It has the same configuration as the combination of the substrate stage device 20C (refer to Figs. 7 and 8) related to.

That is, as shown in FIG. 23, the first step guide 70E of the substrate stage device 20K is between the lower plate portion 77a and the upper plate portion 77b constituting the body portion 77, for example, 2 Two Z voice coil motors 73, and an air spring 72 are inserted, and in the same manner as the first step guide 70A (refer to Fig. 7) of the substrate stage device 20C, a Z actuator and a weight canceling device are used. Also functions. As shown in FIG. 24, the lower plate part 77a and the upper plate part 77b of the 1st step guide 70E are each in the 1st step guide 70A (refer FIG. 8) of the said board|substrate stage apparatus 20C. In comparison, it is slightly wider.

Further, on the lower surface of the coarse motion stage 28, a plurality of (for example, four) air bearings 53 arranged with bearing surfaces opposite to the upper surface of the upper plate portion 77b are attached. In addition, as shown in FIG. 24, a pair of attachment plates 29 is attached to the lower surface of the coarse motion stage 28, and the said 1st step guide 70E is between the pair of attachment plates 29. Is inserted. A plurality of (for example, two) air bearings 53 are attached to each of the surfaces of the pair of mounting plates 29 facing the side surfaces of the upper plate portions 77b. Thereby, the coarse motion stage 28 can move with a predetermined stroke in the X-axis direction with low friction along the first step guide 70E, and the relative movement in the Y-axis direction with respect to the first step guide 70E. This is limited. The coarse motion stage 28 is a first step guide by an X linear motor comprising an X stator 88a fixed to the upper surface of the upper plate portion 77b and an X mover 88b fixed to the lower surface of the coarse motion stage 28. It is driven with a predetermined stroke in the X-axis direction along 70E. In addition, although not shown in FIG. 24, the movement of the upper plate part 77b in the X-axis direction and the Y-axis direction with respect to the lower plate part 77a is restricted. Further, the air bearing 53 attached to the pair of attachment plates 29 may be configured to face the side surface of the lower plate portion 77a.

In addition, an air bearing 48 with a bearing surface facing the +Z side is attached to the center of the upper surface of the coarse motion stage 28, and the leveling device 46 is non-contact supported from below. The Z-tilt position information of the fine stage 30 is the second step guide 54 by a plurality of Z sensors 38z, similarly to the substrate stage device 20B (refer to Figs. 5 to 6B). ) Is obtained using the upper surface of. In the first step guide 70E, by canceling the weight of the system including the coarse motion stage 28 and the fine motion stage 30 by the air spring 72, the coarse motion stage 28 and the fine motion stage 30 The load on the Z voice coil motor 73 for driving in the Z axis direction is reduced. In addition, the first step guide 70E drives the coarse motion stage 28 and the fine motion stage 30 in the Z-axis direction by the Z voice coil motor 73, but instead, the first step guide shown in FIG. 9 Like the step guide 70B, a plurality of Z actuators 75 may be used, or a pair of cam devices 76 may be used like the first step guide 70C shown in FIG. 11.

Further, the configurations of the first and second embodiments (modified examples thereof are also included. The same hereinafter) described above can be appropriately changed. For example, in the first and second embodiments, each of the first step guide 50 and the pair of second step guides 54 is pulled by a pair of X-beams 24, so that the Y axis Although the structure moves in the direction, for example, the X position may be controlled independently from the pair of X beams 24 by an actuator such as a linear motor.

Further, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F2 laser light (wavelength 157 nm). In addition, as illumination light, for example, an infrared or visible single wavelength laser light oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). Alternatively, harmonics obtained by converting wavelengths into ultraviolet light using a nonlinear optical crystal may be used. Further, a solid-state laser (wavelength: 355 nm, 266 nm) or the like may be used.

In addition, the projection optical system 16 was a multi-lens projection optical system including a plurality of projection optical units, but the number of projection optical units is not limited to this, and one or more projection optical units may be sufficient. Further, it is not limited to a projection optical system of a multi-lens system, and may be, for example, a projection optical system using an opener-type large mirror. In addition, in the above-described embodiment, the case where a projection optical system PL having an equal projection magnification is used is described, but the projection optical system is not limited to this, and the projection optical system may be any of a reduction system and an enlargement system.

In addition, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern/photosensitive pattern) was formed on a light-transmitting mask substrate was used, but as disclosed in, for example, U.S. Patent No. 6,778,257, exposure is required. Based on the electronic data of the pattern, an electronic mask (variable shaping mask) that forms a transmission pattern, a reflection pattern, or a light-emitting pattern, for example, DMD ( Digital Micro-mirror Device) may be used.

In addition, as a moving body device (stage device) that moves an object along a predetermined two-dimensional plane, it is not limited to an exposure device, and, for example, an object inspection device used for object inspection, which performs predetermined processing on an object. You may use it for an object treatment device. Moreover, as an exposure apparatus, it can also apply to the exposure apparatus of the step-and-repeat type exposure apparatus, and the exposure apparatus of the step-and-stitch type.

Further, as an exposure apparatus, an exposure apparatus that exposes a substrate having a size (including an outer diameter, a diagonal length, and at least one of one side) of 500 mm or more, for example, a large substrate for a flat panel display such as a liquid crystal display element. It is particularly effective to apply against.

In addition, the use of the exposure device is not limited to an exposure device for liquid crystal that transfers a liquid crystal display element pattern to a prismatic glass plate, for example, an exposure device for semiconductor manufacturing, a thin film magnetic head, a micromachine, and a DNA chip. It can also be widely applied to an exposure apparatus for manufacturing. In addition, in order to manufacture a mask or reticle used in not only microdevices such as semiconductor devices, but also optical exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, and electron beam exposure apparatuses, circuit patterns are transferred to glass substrates or silicon wafers. The present invention can also be applied to an exposure apparatus to be described. In addition, the object to be exposed is not limited to the glass plate, but may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. In addition, when the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and, for example, a film (a sheet-like member having flexibility) is included.

For electronic devices such as liquid crystal display devices (or semiconductor devices), steps to design the function and performance of the device, steps to fabricate a mask (or reticle) based on these design steps, and steps to fabricate a glass substrate (or wafer) , The exposure apparatus of each of the above-described embodiments, and the lithography step of transferring the pattern of the mask (reticle) to the glass substrate by the exposure method, the developing step of developing the exposed glass substrate, other than the portion where the resist remains It is manufactured through an etching step of removing the partially exposed member by etching, a resist removing step of removing unnecessary resist after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-described exposure method is performed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate, so that a device having a high degree of integration can be manufactured with good productivity.

In addition, the disclosures of all publications, international publications, US patent application publication specifications, and US patent specifications cited in the description so far are incorporated as part of the description of this specification.

Industrial applicability

As described above, the movable body device of the present invention is suitable for moving the movable body along a predetermined two-dimensional plane. Further, the exposure apparatus of the present invention is suitable for forming a predetermined pattern on an object held by a moving body. Moreover, the manufacturing method of a flat panel display of this invention is suitable for manufacturing a flat panel display. Further, the device manufacturing method of the present invention is suitable for the production of microdevices.

Claims (16)

An object holding unit that holds an object and is movable in a first direction and a second direction intersecting each other,
A support part for supporting the object holding part,
A first base supporting the support,
A measurement unit that measures the position of the object holding unit in a third direction intersecting the first direction and the second direction,
A second base disposed on both sides of the first base with respect to the second direction so as to be disposed apart from the first base with respect to the second direction, and supporting the measurement unit;
A first driving part for moving the support part for supporting the object holding part in the first direction with respect to the first base,
A moving body device including a second driving unit supporting the first driving unit and moving the first base and the second base in the second direction. The method of claim 1,
A first support device for supporting the first base and the second base,
A moving body device comprising a second support device that is disposed apart from the first support device in the first direction and supports the second drive unit. The method according to claim 1 or 2,
A first connecting portion connecting the support portion and the first driving portion,
A second connecting portion connecting the measuring portion and the first driving portion,
The first driving unit is a moving body device that moves the support unit and the measurement unit to support the object holding unit in the first direction through the first connection unit and the second connection unit. The method according to claim 1 or 2,
The measurement unit has a sensor unit that emits a laser and a target unit to which the laser is irradiated,
The sensor unit is formed on the object holding unit,
The target portion is a moving body device supported by the second base. The method according to claim 1 or 2,
A first connection device connecting the first base and the second driving unit,
And a second connection device connecting the second base and the second driving unit,
The second drive unit is a moving body device that moves the first base and the second base in the second direction via the first connection device and the second connection device. The method according to claim 1 or 2,
A moving body device comprising a connection member connecting the first base and the second base. The method according to claim 1 or 2,
The first base is a moving body device for non-contact support of the support portion so that the support portion can move relative to the first base in the first direction and the second direction. The moving body device according to claim 1 or 2, and
An exposure apparatus comprising a pattern forming apparatus for forming a predetermined pattern on the object by using an energy beam. The method of claim 8,
The exposure apparatus, wherein the object is a substrate used in a flat panel display apparatus. The method of claim 9,
The substrate is an exposure apparatus having a length of at least one side or a diagonal length of 500 mm or more. Holding an object and supporting a support portion for supporting an object holding portion movable in a first direction and a second direction crossing each other by a first base
A measurement unit for measuring the position of the object holding unit in the vertical direction is supported by a second base disposed on both sides of the first base so as to be disposed apart from the first base in the second direction,
Moving the support part supporting the object holding part in the first direction with respect to the first base,
And supporting the first driving unit and moving the first base and the second base in the second direction. Moving the object by the movement method according to claim 11,
An exposure method comprising forming a predetermined pattern on the object moved in the first direction using an energy beam. The method of claim 12,
The exposure method wherein the object is a substrate used in a flat panel display device. The method of claim 13,
The exposure method in which the substrate has at least one side length or a diagonal length of 500 mm or more. Exposing the object using the exposure method according to any one of claims 12 to 14, and
A method of manufacturing a flat panel display comprising developing the exposed object. Exposing the object using the exposure method according to any one of claims 12 to 14, and
A device manufacturing method comprising developing the exposed object.

Images