CN104204955A - Exposure device, method for manufacturing flat panel display, and method for manufacturing device - Google Patents

Abstract

In a substrate stage device (PST), an X movable element (56), which faces an X stator (82) provided on an X beam (25) and in which a magnetic attractive force is generated with respect to a weight canceling device (50), is fixed at the tip of an arm (54) of the weight canceling device (50). The weight canceling device (50) transfers its own weight and part of the weight of a micro-movement stage (30) that the weight canceling device (50) supports to a floor (11) via a base frame (14) by means of the magnetic attractive force. Therefore, the biased load applied to a vibration prevention device (34) is reduced.

Description

The manufacture method of exposure device, flat-panel screens and manufacturing method

Technical field

The invention relates to manufacture method and the manufacturing method of exposure device, flat-panel screens, in detail, be about the manufacture method of the flat-panel screens of manufacturing the exposure device that uses in the photoetching process of semiconductor element, liquid crystal display cells etc., using aforementioned exposure device and use the manufacturing method of aforementioned exposure device.

Background technology

All the time, in manufacturing liquid crystal display cells, in the photoetching process of the electronic components (microcomponent) such as semiconductor element (integrated circuit etc.), to adopt to make mask or graticule (following on one side, be referred to as " mask ") (following with glass plate or wafer, be referred to as " substrate ") (scan direction) synchronizing moving along set direction of scanning, the pattern use energy beam that is formed at mask is transferred to the exposure device (so-called scanning stepper (also claiming scanning machine)) of step-scan (the step & scan) mode on substrate etc. on one side.

As this kind of exposure device, have and a kind ofly have on the X coarse motion microscope carrier that can move with long stroke in direction of scanning, lift-launch can intersect Overlapping (gantry (gantry) type) bearing table device of the mobile Y coarse motion microscope carrier of (cross scan) direction (with the orthogonal direction in direction of scanning) in scanning, as this kind of bearing table device, with for example at the upper constitutor moving along surface level of the platform being formed by stone material (surface plate) be widely known by the people (for example,, with reference to patent documentation 1).

The exposure device of above-mentioned patent documentation 1, because weight canceller is the moving on a large scale of corresponding step-scan, height that therefore must the flatness of (the mobile guiding face of weight canceller) is done above on a large scale by platform.In addition, the substrate of the exposure object of exposure device has the tendency of more and more large-scale change in recent years, and with this, platform also day by day maximizes, and therefore, except cost increases, the workability deterioration when conveyance of exposure device, installation etc. is all concerned about.For this reason, all expect there is a kind of appearance that can make the new technology that platform diminishes.

Look-ahead technique document

Patent documentation

Patent documentation 1: No. 2010/0018950 instructions of U.S. Patent Application Publication

Summary of the invention

In order to solve the means of problem

For dwindling platform, this case inventor has proposed a kind of platform movement that possesses taking the weight of canceller in the exposure device (No. 13/221568th, U.S. Patent application) of the crisscross platform that is called as stepping platform of scanning.Possesses the exposure device of this stepping platform, keeping the weight canceller of substrate holding structure of exposure object substrate toward the stepping platform of the movement of direction of scanning from below supporting in order to guiding, is to be supported on the pallet of antihunting device can be displaced under the crisscross state of scanning.Possess the exposure device of stepping platform, due to weight own also large stepping platform be that under the state that is supported with substrate holding structure and weight canceller etc., to be driven in scanning crisscross, therefore, before and after driving, the gravity motion of exposure device entirety is large.Therefore, recent findings, use the exposure device of stepping platform, can apply great unbalance loading weight in antihunting device, especially keep the substrate holding structure of large substrate to become heavy, therefore act on stepping platform and further heavily increase in the unbalance loading of pallet by stepping platform action by the weight canceller of supporting substrates retaining member, while making exposure actions, heavily cause the inclination slightly of exposure device entirety because being applied to the unbalance loading of the pallet being supported by antihunting device, and have the anxiety of the exposure accuracy of causing reduction.

The present invention's the 1st aspect, a kind of exposure device of the 1st sweep type is provided, relative to exposure energy beam, exposure object object to be moved with set the 1st stroke in the 1st direction parallel with surface level in the time of exposure-processed, it possesses: moving body, can be in the 1st direction at least with this set the 1st stroke move and can be in this surface level in moving with the 2nd stroke with orthogonal the 2nd direction of the 1st direction; Object retaining member, can keep this object, at least move in the direction parallel with this surface level together with this moving body; Weight canceller, supports this object retaining member to offset the weight of this object retaining member from below; Supporting member, extends the 1st direction, from below support this weight canceller and can from below support the state of this weight canceller, move with the 2nd stroke in the 2nd direction; Supporting pallet, supports this supporting member; And load-carrying alleviator, in order to alleviate the load-carrying load of the gravity direction that acts on this supporting pallet.

According to this invention, in the time of the exposure-processed to object, the gravity direction (vertical direction is downward) producing because of object retaining member, weight canceller and the weight of supporting member own though load-carrying load can act on supporting pallet, can alleviate because of load-carrying alleviator.Thereby can reduce the gravity motion that is that comprises object retaining member, weight canceller and supporting member and supporting pallet and act on the unbalance loading weight that supports pallet, accordingly, can maintain fully high exposure accuracy.

The present invention's the 2nd aspect, a kind of the 2nd scanning exposure apparatus is provided, relative to exposure energy beam, the object of exposure object to be moved with set the 1st stroke in the 1st direction parallel with surface level in the time of exposure-processed, it possesses: the 1st mobile member, can at least move with this set the 1st stroke in the 1st direction; The 2nd mobile member, guides the 1st mobile member toward the movement of the 1st direction and can move with the 2nd stroke together with the 1st mobile member in the 2nd direction orthogonal with the 1st direction in this surface level; Object retaining member, keeps this object, can at least move in the direction parallel with this surface level together with the 1st mobile member; Weight canceller, supports this object retaining member to offset the weight of this object retaining member from below; Supporting pallet, comprises the platform that supports this weight canceller from below; Linear motor, comprises the magnetite of being located at the 2nd mobile member and the coil of being located at the 1st mobile member, and the 1st mobile member is driven in the 1st direction with the 1st stroke; And load-carrying alleviator, utilize the power acting between this magnetite and a part for this weight canceller, alleviate the load-carrying load of the gravity direction that acts on this supporting pallet.

According to this invention, in the time of the exposure-processed to object, can with the 1st mobile member that keeps the object retaining member of object move toward the direction parallel with surface level together, by linear motor driven in the 1st direction.Now, though the load-carrying load of the gravity direction producing because of object retaining member and the weight of weight canceller own can act on supporting pallet, but this load-carrying load, can be by load-carrying alleviator, the power that utilization acts between the part of weight canceller is alleviated.Therefore, thereby can reduce the gravity motion that is that comprises object retaining member, weight canceller and supporting pallet and act on the unbalance loading weight of supporting pallet, accordingly, can maintain fully high exposure accuracy.

The present invention's the 3rd aspect provides a kind of manufacture method of flat-panel screens, comprises: use any in the above-mentioned the 1st and the 2nd exposure device to make the action of base plate exposure; And the action that the aforesaid base plate after exposure is developed.

The present invention's the 4th aspect provides a kind of manufacturing method, comprises: use any action that object is exposed in the above-mentioned the 1st and the 2nd exposure device; And the action that the aforementioned object after exposure is developed.

Brief description of the drawings

Fig. 1 is the figure that summary shows the formation of the exposure device of the 1st example.

The vertical view that Fig. 2 is shown from fine motion microscope carrier is removed for the baseplate carrier that the exposure device of Fig. 1 is had.

The figure that Fig. 3 is the baseplate carrier observing the exposure device of Fig. 1 from+directions X and have.

Fig. 4 is the figure that shows in a schematic way the flow direction of the power producing because of the weight of baseplate carrier device own.

Fig. 5 is in the figure of the magnetic attraction of weight canceller in order to illustration.

In Fig. 6, A part is for showing in a schematic way the figure of the gravity motion of the baseplate carrier device of the generation device that the magnetic attraction that can act on weight canceller is not set, and in Fig. 6, B part is for showing in a schematic way the figure of the gravity motion of the baseplate carrier device to weight canceller effect vertical direction magnetic attraction upwards.

Fig. 7 is the figure that observes the baseplate carrier device of the 2nd example from+directions X.

Fig. 8 is the vertical view of the baseplate carrier device of the 3rd example.

Fig. 9 is the figure that observes the cut-away section of the baseplate carrier device of the 3rd example from+directions X.

Figure 10 is the figure that observes the cut-away section of the baseplate carrier device of the 4th example from+directions X.

Figure 11 is the vertical view of the baseplate carrier device of the 4th example.

In Figure 12, A part will produce the permanet magnet of magnetic attraction and the figure of the example that magnetic is combined for showing, in Figure 12, B part is for producing the permanet magnet of magnetic attraction and the figure of the example that permanet magnet is combined.

Figure 13 is the figure that observes the cut-away section of the baseplate carrier device of the 1st variation of the 4th example from+directions X.

Figure 14 is the figure that observes the cut-away section of the baseplate carrier device of the 2nd variation of the 4th example from+directions X.

The figure of the cut-away section that Figure 15 is the baseplate carrier device observing the exposure device of the 5th example from-Y-direction and possess.

Figure 16 shows the figure that observes the cut-away section of the baseplate carrier device of Figure 15 from+directions X.

Figure 17 shows the figure that observes the baseplate carrier device of the variation of the 5th example from-Y-direction.

Embodiment

" the 1st example "

Below, according to B part in Fig. 1～Fig. 6, the 1st example is described.

In Fig. 1, summary has shown the formation of the exposure device 10 of the 1st example.The projection aligner (also claiming scanning machine) of exposure device 10, the step-scan mode that is exposure object thing for rectangle (square) the glass substrate P of liquid crystal indicator (flat-panel screens) (following, only to claim substrate P).

Exposure device 10, to have illumination be IOP, keep mask microscope carrier MST, the projection optics of mask M is PL, a pair of baseplate carrier pallet 33, the baseplate carrier device PST that comprises the substrate holding 31 that keeps substrate P and these control system etc.Below, by when exposure mask M projection optics relative to substrate P be 16 directions that are scanned be respectively made as in X-direction, surface level the direction orthogonal with X-axis be Y direction, with X-axis and the orthogonal direction of Y-axis be Z-direction, and be respectively θ x, θ y and θ z direction describes with the direction of rotating around X-axis, Y-axis and Z axis.In addition, the position in X-axis, Y-axis and Z-direction being made as respectively to X position, Y position and Z position describes.Again, in substrate P surface, (face of+Z side) scribbles photoresist (induction agent).

Illumination is IOP, is and for example United States Patent (USP) the 6th, and the illumination that 552, No. 775 instructionss etc. disclose is same formation.That is, illumination is that IOP has and on the mask M that throws light on respectively, is configured to jagged multiple, for example 5 illumination systems multiple, for example 5 field of illuminations, the light of never illustrated light source (for example mercury vapor lamp) ejaculation of each illumination system, via not shown catoptron, spectroscope (dichroic mirror), window shade, wavelength selective filters, various lens etc., irradiate in mask M with illumination light (illumination light) IL as exposure.Illumination light IL is the light that uses such as i line (wavelength 365nm), g line (wavelength 436nm), h line (wavelength 405nm) etc. (or synthetic light of above-mentioned i line, g line, h line).Again, the wavelength of illumination light IL can pass through wavelength selective filters, for example, depending on suitable being switched of desired resolution.

In mask microscope carrier MST, for example, mode and be fixed with its pattern plane (below Fig. 1) and be formed with the mask M of circuit pattern etc. with vacuum suction.Mask microscope carrier MST is mounted on not shown guiding element with contactless state, drives with set stroke by the mask microscope carrier drivetrain (not shown) that for example comprises linear motor, and by suitable micro-driving in Y direction and θ z direction.The positional information (containing the rotation information of θ z direction) of mask microscope carrier MST in XY plane is to be that illustrated mask interferometer system is measured by comprising fixing (or formation) in the laser interferometer of the reflecting surface illuminating laser beam (surveying long light beam) of mask M.This measurement result is provided to not shown main control unit.The above-mentioned measurement result that main control unit is measured according to mask interferometer system, drives (position control) mask microscope carrier MST by mask microscope carrier drivetrain (not shown).Also can replace mask interferometer system or use scrambler (or the encoder system being formed by multiple scramblers) together with mask interferometer system again.

Projection optics is that PL is configured in the below in Fig. 1 of mask microscope carrier MST.Projection optics is that PL has and for example United States Patent (USP) the 6th, and the projection optics that 552, No. 775 instructionss disclose is identical formation.That is, projection optics is the corresponding aforementioned multiple field of illuminations of PL, the view field of the pattern image that comprises mask M is configured to staggered multiple, for example five projection optics systems (poly-lens projection optics system), has with the projection optics cording with the single image field of rectangle taking Y direction as long side direction the function equating.In this example, each of multiple projection opticss system is that the grade that uses the such as both sides heart far away is doubly, forms upright erect image person.

Therefore, when when from illumination being the field of illumination on the illumination light IL illumination mask M of IOP, by being configured to the 1st (object plane) and the roughly illumination light IL of consistent mask M of pattern plane that projection optics is PL, by projection optics be PL by the projection image of the circuit pattern of the mask M in this field of illumination (part erect image), be formed at and the irradiated site (exposure area) of illumination light IL that is configured in the field of illumination conjugation in the 2nd (image planes) side, the substrate P that projection optics is PL.And aftermentioned fine motion microscope carrier 30 by mask microscope carrier MST and a part of formation baseplate carrier device PST synchronize driving, relative field of illumination (illumination light IL) makes mask M be displaced into direction of scanning (X-direction) and relative exposure area (illumination light IL) makes substrate P be displaced into direction of scanning (X-direction), carry out according to this scan exposure of an irradiation area (zoning region) in substrate P, in the pattern (mask pattern) of this irradiation area transfer mask M.That is, in this example, be that to throw light on be that IOP and projection optics are the pattern that PL generates mask M in substrate P, by using the exposure of inductive layer (photoresist layer) in the substrate P of illumination light IL to form this pattern in substrate P.

A pair of baseplate carrier pallet 33 is made up of the member that extends Y direction respectively that (with reference to Fig. 3, the antihunting device 34 that its long side direction both ends are arranged on ground 11 supports from below.A pair of baseplate carrier pallet 33 configures with set spaced and parallel in X-direction.In a pair of baseplate carrier pallet 33 each above, as shown in Figure 2, extend multiple (being for example 3 for each baseplate carrier pallet 33) Y linear guide 35a of the key element of the mechanicalness Y linear guide (single shaft guidance device) of Y direction in parallel to each other being fixed with of X-direction separation.

A pair of baseplate carrier pallet 33 forms the device body (body) of exposure device 10, and projection optics is that PL and mask microscope carrier MST etc. are equipped on device body.

Baseplate carrier device PST, as shown in Figure 1, possesses a pair of pedestal (base frame) 14, auxiliary pedestal 15, coarse motion microscope carrier 23, fine motion microscope carrier 30, weight canceller 50 and from the Y stepping platform 90 of below taking the weight of canceller 50 etc.

A side in a pair of pedestal 14, the baseplate carrier pallet 33 of as shown in Figures 1 and 2, be configured in+X side+X side, the baseplate carrier pallet 33 of be configured in-X of the opposing party side-X side.Because a pair of pedestal 14 has same configuration, therefore, below be only illustrated for the pedestal 14 of+X side.Pedestal 14, as shown in Figure 1, comprise by have with the parallel plane one side of YZ and another side extend body 14a that the tabular component of Y direction forms, with multiple 14b of foot from the 14a of below support body portion.The 14b of foot is Dinged Inter in Y Shaft direction with Ji has 3 every, Li as Let.Be provided with multiple adjuster 14c in the bottom of each 14b of foot, can adjust the Z position of body 14a.

In the X-direction two sides of body 14a, (that is, above-mentioned one side and another side) is fixed with respectively the Y stator 73 of the key element of linear motor.Y stator 73 has magnet unit, and this magnet unit is contained in Y direction with set spaced multiple permanet magnets.Above body 14a, be fixed with the Y linear guide 16a of the key element of the mechanicalness Y linear guide (single shaft guidance device) that extends Y direction again.

Auxiliary pedestal 15 configurations are carried between a pair of baseplate carrier pallet 33.Auxiliary pedestal 15, though its size is different, the part except the body 14a of pedestal 14 is same formation.That is, auxiliary pedestal 15, comprise the body 15a that formed by the tabular component that extends Y direction, with the adjuster 15b that can adjust the Z position of body 14a from the below 15a of support body portion.Above the body 15a of auxiliary pedestal 15, be fixed with same with pedestal 14 extends the Y linear guide 16a of Y direction.The Z position of auxiliary pedestal 15 upper ends is set to lower slightly (or roughly the same) above of more a pair of baseplate carrier pallet 33.

Coarse motion microscope carrier 23, comprises Y coarse motion microscope carrier 23y and is mounted in the X coarse motion microscope carrier 23x on Y coarse motion microscope carrier 23y.

Y coarse motion microscope carrier 23y is mounted on a pair of pedestal 14 and auxiliary pedestal 15.Y coarse motion microscope carrier 23y, as shown in Figure 2, has a pair of X beam 25.A pair of X beam 25 is made up of the member that extends X-direction respectively, in Y direction with the configuration parallel to each other of set interval.Each of a pair of X beam 25, as shown in Figure 3, YZ section be shaped as top compared with the roughly isosceles trapezoid of the handstand of bottom side length.This is trapezoidal, except upper and lower 2 limits, has one side that Z axis for example, tilts with angle θ (θ is little compared with 45 degree, is 10 degree) relatively in YZ plane, the another side tilting with angle-θ with relative Z axis in YZ plane.

In a pair of X beam 25 each long side direction both ends nearby below, as shown in Figure 2, be fixed with the member that is called as Y bracket (carriage) 75.That is, below Y coarse motion microscope carrier 23y, be provided with and for example add up to 4 Y brackets 75.2 Y brackets 75 of be configured in+X side are that the plate 76 above by being fixed on each is connected to each other.Same, 2 Y brackets 75 of be configured in-X side are also connected to each other by plate 76.Because each that for example adds up to 4 Y brackets 75 has same configuration, below, be only illustrated for 1 Y bracket 75 of correspondence+X side group frame 14.

Y bracket 75, as shown in Figure 1, is become by the member of XZ section reverse U shape, inserts the body 14a of pedestal 14 between a pair of subtend face.In a pair of subtend face of Y bracket 75 each, be fixed with respectively by both fixed gap (clearance/gap) can mover 72 with a pair of Y of each subtend of a pair of Y stator 73.Each Y can mover 72, comprises not shown coil unit, forms the moving-coil type Y linear motor of electromagnetic force (Lorentz force) type of drive that Y coarse motion microscope carrier 23y is driven with set stroke in Y direction together with the Y of subtend stator 73.Again, the Y positional information of Y coarse motion microscope carrier 23y is obtained with not shown linear encoder system.

In the end face of Y bracket 75, each Y bracket 75 is fixed with the saddle 16b that multiple (for example 2 (with reference to Fig. 2)) comprise rolling body (such as multiple balls etc.), are sticked in Y linear guide 16a in slidable mode relatively.Y coarse motion microscope carrier 23y, multiple Y linear guides of involved Y linear guide 16a and saddle 16b, directly enter to be guided in Y direction.

Below the long side direction central portion of a pair of X beam 25, be fixed with multiple (for example 2) auxiliary bracket 78 by supporting member 77 again.Auxiliary bracket 78 is become by rectangular-shaped member, below it, same with Y bracket 75, is fixed with the saddle 16b that is slidably sticked in Y linear guide 16a.Accordingly, Y coarse motion microscope carrier 23y is that relative baseplate carrier pallet 33 separates in vibration.In addition,, though be overlapping and hiding in paper depth direction in Fig. 1, for 1 auxiliary bracket 78, saddle 16b is for example, with set interval, be provided with 2 in paper depth direction (Y direction).So, Y coarse motion microscope carrier 23y, its long side direction central portion is supported from below by auxiliary pedestal 15 by auxiliary bracket 78, and the deflection that weight own is caused is suppressed.

In a pair of X beam 25 each above, as shown in Figures 2 and 3, extend the x-ray guiding element 17a of the key element of the mechanicalness single shaft guidance device of X-direction with set interval fixing many (in this example, being for example 2 for 1 X beam 25) again parallel to each other in Y direction.Again, 2 hypotenuses (inclined-plane) in the YZ of a pair of X beam 25 section, as shown in Figures 1 and 2, be fixed with from X beam 25-X side end is nearby to+nearby extended X stator 82 of X side end.X stator 82 has magnet unit, and this magnet unit is contained in X-direction with set spaced multiple permanet magnets.

X coarse motion microscope carrier 23x, a pair of web 41 that comprises a pair of X bracket 40 of link and a pair of X bracket 40 as shown in Figure 2.Because a pair of X bracket 40 has same configuration, therefore, below be only illustrated for the X bracket 40 of Y side again.

X bracket 40, as shown in Figures 2 and 3, have taking X-direction as long side direction overlook rectangular planar plate members 61, with each a pair of, 4 side wall member 62 of total of fixing with upper surface and the state that above planar plate members 61, roughly coplanar is high respectively in long side direction one end of planar plate members 61 and the Y direction both ends of the surface of the other end.X bracket 40, observes from+directions X, as shown in Figure 3, has down the shape of U-shaped, in each other in right+Y side and-side wall member 62 of Y side inserts X beam 25 to each other.The X-direction two ends of planar plate members 61, relatively+X side and-each of the side wall member 62 of X side, to the outside slightly outstanding (with reference to Fig. 2) of X-direction.Side wall member 62 each other in right+Y side with-Y side, have respectively with from upper end (+Z side) to the parallel plane part 1 of XZ nearby of central portion, with from central portion nearby to lower end (Z side) to-Y side or+Y roll tiltedly and with the part 2 of 2 inclined-plane subtends of above-mentioned X beam 25.Near long side direction (X-direction) central portion of X bracket 40, be provided with part (following, to claim notch part) 42 (with reference to the Fig. 2) that do not have side wall member 62 in 1/3 slightly short scope of the X-direction length of X bracket 40.

In the planar plate members 61 of X bracket 40 each below (face of Z side), as shown in Figure 3, each x-ray guiding element 17a is fixed with the saddle 17b that multiple (for example 4 (with reference to Fig. 2)) comprise rolling body, are sticked in Y linear guide 17a in slidable mode relatively.In this example, below X coarse motion microscope carrier 23x, be fixed with the saddle 17b that for example adds up to 16.X coarse motion microscope carrier 23x, multiple x-ray guidance devices of involved Y linear guide 17a and saddle 17b, directly enter to be guided in X-direction.

Each the inner face of part 2 of 4 side wall member 62 that have in X bracket 40, is fixed with each of a pair of X stator 82 by both the X of fixed gap (clearance/gap) subtend can mover 81.Each X can mover 81, comprises not shown coil unit, forms the moving-coil type x-ray motor of electromagnetic force (Lorentz force) type of drive that X coarse motion microscope carrier 23x is driven with set stroke in X-direction together with the X of subtend stator 82.Again, each X can comprise not shown iron core by mover 81, and the X stator 82 of subtend between produce magnetic attraction.That is, respectively can mover 81 formations there is core coil unit.Moreover the X positional information of X coarse motion microscope carrier 23x is obtained with not shown linear encoder system.

Each of a pair of web 41, as shown in Figure 2, is made up of the planar plate members that is located at Y direction.One side's web 41, be fixed on from the Y direction central authorities of the X bracket 40 of be disposed at+Y side slightly by-Y side, to the Y direction central authorities of the X bracket 40 of be disposed at-Y side slightly by+Y side, by a pair of X bracket 40+X end is connected to each other.The opposing party's web 41, be fixed on from the Y direction central authorities of the X bracket 40 of be disposed at+Y side slightly by-Y side, to the Y direction central authorities of the X bracket 40 of be disposed at-Y side slightly by+Y side, by a pair of X bracket 40-X end is connected to each other.That is, there is the X coarse motion microscope carrier 23x of a pair of X bracket 40 and a pair of web 41, have and overlook the summary rectangular shape that is central tool peristome.

In addition, though not shown, but in X coarse motion microscope carrier 23x, the block member of the removable amount that mechanically limits the relative X coarse motion microscope carrier 23x of aftermentioned fine motion microscope carrier 30 is installed or in X-axis and Y direction in order to measure the gap sensor etc. of amount of movement of the relative X coarse motion microscope carrier 23x of fine motion microscope carrier 30.

Fine motion microscope carrier 30, from Fig. 1 and Fig. 3, form by overlooking roughly foursquare tabular component (or member of box-shaped (hollow rectangular parallelepiped)), face adsorbs maintenance substrate P by substrate holding 31 in for example vacuum suction (or Electrostatic Absorption) mode thereon.

Fine motion microscope carrier 30, involved respectively containing the stator that is fixed on X coarse motion microscope carrier 23x and the fine motion microscope carrier drivetrain of the multiple voice coil motors (or linear motor) that can mover form that is fixed on fine motion microscope carrier 30, in the upper micro-3DOF direction (all directions of X-axis, Y-axis and θ z) driving in XY plane of X coarse motion microscope carrier 23x.Multiple voice coil motors, as shown in Figure 1, micro-fine motion microscope carrier 30 driving in the X of X-direction voice coil motor 18x in Y direction separated and be provided with a pair of (in paper, the X voice coil motor 18x of depths is not shown), as shown in Figure 3, micro-fine motion microscope carrier 30 driving in the Y of Y direction voice coil motor 18y is provided with to a pair of (in paper, the Y voice coil motor 18y of depths is not shown) in X-direction compartment.Fine motion microscope carrier 30, use above-mentioned X voice coil motor 18x and/or Y voice coil motor 18y to synchronize with X coarse motion microscope carrier 23x and drive (with equidirectional, the same speed drive of X coarse motion microscope carrier 23x), and be displaced into X-direction and/or Y direction with set stroke together with X coarse motion microscope carrier 23x.Therefore, fine motion microscope carrier 30 can be that PL (with reference to Fig. 1) moves (coarse motion) possibility in XY2 direction of principal axis with long stroke relative to projection optics, and can be in X, and the 3DOF direction of Y, θ z direction moves (fine motion) a little.

Again, fine motion microscope carrier drives and has in order to fine motion microscope carrier 30 is driven a little in not shown multiple Z voice coil motors of the 3DOF direction of θ x, θ y and Z-direction.About the formation of the fine motion microscope carrier drivetrain that comprises multiple voice coil motors, be disclosed in for example No. 2010/0018950 instructions of U.S. Patent Application Publication.

In fine motion microscope carrier 30-side of X side, as shown in Figure 1, fixed X moving lens (bar-shaped catoptron) 22x with the reflecting surface orthogonal with X-axis by microscope base 21.Again, in fine motion microscope carrier 30-side of Y side, as shown in Figure 3, fixed the Y moving lens 22y with the reflecting surface orthogonal with Y-axis by microscope base 28.Positional information in the XY plane of fine motion microscope carrier 30, be by comprise X moving lens 22x and Y moving lens 22y are irradiated respectively to multiple laser interferometer of surveying long light beam (interferometer beam) laser interferometer system (below, claim substrate interferometer system), detected at any time.Again, in fact, substrate interferometer system possesses the X laser interferometer of the corresponding X moving lens of multiple difference 22x and the Y laser interferometer of corresponding Y moving lens 22y, but in Fig. 1 only representational demonstration from the long light beam of survey of X laser interferometer.Multiple Ji Guang Gan She Apparatus Fen Do are fixed on device body.Again, fine motion microscope carrier 30 is in the positional information of θ x, θ y and Z-direction, is by being fixed on fine motion microscope carrier 30 sensor 26 (with reference to Fig. 3) below, and the subject matter 27 that example is fixed on weight canceller 50 is as described later obtained.The formation that is about the position measurement of above-mentioned fine motion microscope carrier 30, has been disclosed in for example No. 2010/0018950 instructions of U.S. Patent Application Publication.

Weight canceller 50, as shown in Figure 3, is made up of the cylindrical component that is located at Z-direction, is also called stem.Weight canceller 50 inserts in the peristome of X coarse motion microscope carrier 23x, is mounted on aftermentioned Y stepping platform 90.Weight canceller 50 supports fine motion microscope carrier 30 from below by aftermentioned levelling device 70.

Weight canceller 50 has basket 51, air spring 52 and Z saddle 53, a pair of arm 54 etc.

Basket 51 is made up of the member of overlooking rectangle, in the circular open portion (with reference to Fig. 2) of the face opening of be formed with+Z of central portion side.The multiple air bearing (following, claim base wad) 55 of bearing surface towards-Z side are installed below basket 51.

Air spring 52 is housed in the peristome of basket 51.In air spring 52 from outside supplied with pressurized gas.

Z saddle 53 is made up of the cylindrical member that extends Z-direction, inserts in the peristome of basket 51, is mounted on air spring 52.

Each of a pair of arm 54, is made up of the rod member that extends Y direction.The arm 54 of be configured in+Y side in a pair of arm 54, its one end be fixed on basket 51+ insert in the notch part 42 that X bracket 40 has Y side side, the other end.Same, the arm 54 of be configured in-Y side, its one end be fixed on basket 51-insert in the notch part 42 that X bracket 40 has Y side side, the other end.Each the other end of a pair of arm 54, has in the inclined-plane having respectively with a pair of X beam 25, is formed at the inclined-plane of the parallel subtend in inclined-plane of Y direction inner side.Again, in each the inclined-plane of the other end of a pair of arm 54,, be fixed with in a pair of X stator 82 having respectively with a pair of X beam 25, the X stator 82 that is configured in Y direction inner side is by both the X of fixed gap (clearance/gap) subtend can mover 56.Each X can mover 56, comprises not shown coil unit, forms the x-ray motor that weight canceller 50 is driven with set stroke in X-direction together with the X of subtend stator 82.Again, each X can mover 56, comprises not shown iron core, and the X stator 82 of subtend between produce magnetic attraction.

Carry leveling (leveling) device 70 in the top of weight canceller 50.Levelling device 70, be installed in Z saddle 53+Z side end, bearing surface support with cordless from below towards the air bearing (following, to claim sealing gasket) 57 of+Z side.Levelling device 70 is that fine motion microscope carrier 30 is supported as (tilt) device of (XY plane swings freely in θ x and θ y direction relatively) freely that fascinates.Weight canceller 50, the vertical direction producing by air spring 52 power upwards, offset by Z saddle 53 and levelling device 70 weight that is (power of gravity direction) that comprises fine motion microscope carrier 30, tool is to reduce the load of above-mentioned multiple Z voice coil motors.

Weight canceller 50 as shown in Figure 2, is for example, to be called as bending device bar hookup mechanism 45 (following, suitably to claim bending device 45) the mechanical X of being connected in coarse motion microscope carrier 23x (X bracket 40) by many (4).Bending device 45, for example comprise with the banded steel plate of the minimal thickness of XY plane parallel configuration (or cable wire, synthetic resin rope making, refining etc.), with the articulated mounting (for example spherojoint or hinge are practiced device) that is located at these steel plate both ends, above-mentioned steel plate is erected between weight canceller 50 and X bracket 40 by articulated mounting.The Z position of multiple bending devices 45, roughly consistent in the centre of gravity place of Z-direction with weight canceller 50.Bending device 45, the bight (overlooking down the summit of basket 51) of basket 51 is fixed in its one end, and the other end is fixed on the side wall member 62 of X bracket 40.That is weight canceller 50, is drawn by X coarse motion microscope carrier 23x by any one of multiple bending devices 45, and with this X coarse motion microscope carrier 23x one be displaced into X-direction or Y direction.Now, in weight canceller 50, comprise its in Z-direction centre of gravity place with the parallel plane plane of XY in have the effect of tractive force, therefore around not acting on the moment tool (pitching moment) of the orthogonal axis of moving direction.In addition, comprise levelling device 70, bending device 45, about the detailed formation of the weight canceller 50 of this example, to be disclosed in for example No. 2010/0018950 instructions of U.S. Patent Application Publication.

Y stepping platform 90, synthesizing map 1 to Fig. 3 is known, formed by the member of the YZ section rectangle that extends X-direction, in overlooking down, with and each of a pair of X beam 25 be configured between a pair of X beam 25 at a distance of both states of set a distance (contactless state).The long side direction size of Y stepping platform 90, is set to slightly long some in the shift motion of X-direction compared with fine motion microscope carrier 30.Again, Width (Y direction) size of Y stepping platform 90, the width of the base wad 55 that setting can taking the weight of canceller 50 has.The material of Y stepping platform 90 is cast iron or fine and close stone material (graniton), pottery, CFRP material etc., and the flatness above it is processed into very high.

Below Y stepping platform 90, relatively each Y linear guide 35a is fixed with the saddle 35b that multiple (for example 2 (with reference to Fig. 2)) comprise rolling body (for example, multiple balls etc.), are sticked in multiple Y linear guide 35a in slidable mode.Y stepping platform 90, multiple Y linear guides 35 of involved Y linear guide 35a and Y saddle 35b directly enter to be guided in Y direction with set stroke on a pair of baseplate carrier pallet 33.

Y stepping platform 90, as shown in Figure 2, be fixed on by being connected to+X side and-fixed component of X side end face 46 each one of to bending device 43, be mechanically linked to each a pair of Y bracket 75.Bending device 43 has roughly the same formation with above-mentioned bending device 45.So, Y stepping platform 90, when in the time that a side of Y direction or the Y bracket 75 of opposite side are driven in Y direction, is drawn by this Y bracket 75 and the past Y direction of one moves.Bending device 43, the rigidity of its long side direction (being herein Y direction) is low compared with the rigidity of other 5DOF directions (being X, Z, θ x, θ y, θ z direction) herein, in above-mentioned 5DOF direction, Y stepping platform 90 separates in vibration with Y coarse motion microscope carrier 23y.

The exposure device 10 forming in the above described manner, under the management of not shown main control unit, carry out mask M toward the loading on mask microscope carrier MST and move into device by not shown substrate and carry out substrate P toward move into (loading) on baseplate carrier device PST with not shown mask carrying device (mask loading bin).Afterwards, use not shown aligning to detect system by main control unit and implement locating tab assembly, after this finishes locating tab assembly, carry out the exposure actions of step-scan (step & scan) mode.Because this exposure actions is identical with the exposure actions of existing step-scan mode, therefore description is omitted.

Herein, the exposure actions of above-mentioned step-scan mode, is that the multiple irradiation areas to being set in substrate P sequentially carry out exposure-processed.Substrate P, in the time of scanning motion, be to be driven (following in X-direction by constant speed with set stroke, claim X scanning motion), in the time of stepwise operation, (while movement between irradiation area) is suitable X-direction and/or the Y direction (following, point another name X stepwise operation, Y stepwise operation) of being driven in.

While making substrate P be displaced into X-direction in above-mentioned X scanning motion and in X stepwise operation, in baseplate carrier device PST, be X coarse motion microscope carrier 23x to be driven in X-direction on Y coarse motion microscope carrier 23y according to the measured value of encoder system, and fine motion microscope carrier 30 synchronizeed and driven with X coarse motion microscope carrier 23x with multiple X voice coil motor 18x according to the measured value of substrate interferometer system.Again, in the time that X coarse motion microscope carrier 23x moves toward X-direction, because being drawn by this X coarse motion microscope carrier 23x, weight canceller 50 moves toward X-direction together with X coarse motion microscope carrier 23x.Now, weight canceller 50, be by main control unit by can mover by X 56 linear motors that form with X stator 82, synchronize and be driven in X-direction with X coarse motion microscope carrier 23x.Now, weight canceller 50 is to move on Y stepping platform 90.Again, when above-mentioned X scanning motion and X stepwise operation, though fine motion microscope carrier 30 has relative X coarse motion microscope carrier 23x to be driven a little in the situation of Y direction and/or θ z direction, because the Y position of weight canceller 50 can not change, therefore weight canceller 50 perseverances only move on Y stepping platform 90.

With respect to this, when above-mentioned Y stepwise operation, in baseplate carrier device PST, Y coarse motion microscope carrier 23y is driven in Y direction with set stroke on a pair of pedestal 14, Y coarse motion microscope carrier 23y one therewith, and X coarse motion microscope carrier 23x is displaced into Y direction with set stroke.Again, weight canceller 50 and X coarse motion microscope carrier 23x one be displaced into Y direction with set stroke.Now, from the Y stepping platform 90 of below taking the weight of canceller 50, synchronizeed and driven with Y coarse motion microscope carrier 23y.Therefore, weight canceller 50 perseverances are supported from below by Y stepping platform 90.

Secondly, the assembling sequence of baseplate carrier device PST is described.In this 1st example, baseplate carrier device PST, first, on the ground 11 of dust free room, arranges respectively a pair of baseplate carrier pallet 33, a pair of pedestal 14 and auxiliary pedestal 15 with the configuration shown in Fig. 2.Afterwards, by Y linear guide 16, Y bracket 75 is equipped on to a pair of pedestal 14, auxiliary bracket 78 is equipped on to auxiliary pedestal 15 respectively, and carry Y stepping platform 90 by multiple Y linear guides 35 on a pair of baseplate carrier pallet 33.Also can in other places, Y bracket 75 be assembled in advance to a pair of pedestal 14, auxiliary bracket 78 is assembled in to auxiliary pedestal 15 again.

Then, on Y stepping platform 90, carry weight canceller 50, in addition, on Y bracket 75 and auxiliary bracket 78, carry a pair of X beam 25.Afterwards, carry X bracket 40 with X stator 82 and the mode that the X that is fixed on the arm 54 that weight canceller 50 had can mover 56 subtends.Also can in other places in a pair of X beam, X bracket 40 be installed respectively in advance again.Afterwards, adjust a pair of X beam 25 position (Y direction interval) so that X stator 82 and the X that is fixed on the arm 54 that weight canceller 50 has can mover 56 at a distance of set interval subtend, also can pass through a pair of web 76 and 77 fixed positions.

Afterwards, fine motion microscope carrier 30 (containing levelling device 70) is loaded on weight canceller 50, and by the stator of multiple voice coil motors with can be combined by mover.Then, the not shown air bearing supplied with pressurized gas that air spring 52, base wad 55 and the sealing gasket 57 to weight canceller 50 and levelling device 70 have, fine motion microscope carrier 30 is supported with cordless by weight canceller 50.

Secondly, the flow direction of the power that puts on baseplate carrier device PST is described.Again, no matter the below power that puts on baseplate carrier device PST of explanation, in fine motion microscope carrier 30 static or in action, all can produce.

In the time of assembled the completing of baseplate carrier device PST, substrate P, substrate holding 31 and fine motion microscope carrier 30 (containing levelling device 70) etc. are (following, claim fine motion microscope carrier 30 etc.) because of the downward power of the Z-direction of weight own, reach on ground 11 with the following flow direction as shown in Figure 4.Again, although the baseplate carrier device PST in Fig. 4 show in a schematic way and slightly different from shape shown in Fig. 1～3, for the component part corresponding with component part shown in Fig. 1～Fig. 3, be to use to give same-sign.

As shown in Figure 4, the weight of fine motion microscope carrier 30 grades own is to be supported by Y stepping platform 90 by weight canceller 50.Herein, as shown in Figure 5, in a pair of arm 54 having in weight canceller 50, the arm 54 of be arranged on+Y side, can act on comprise be fixed on the X unshakable in one's determination of arm 54 other ends can mover 56 be arranged between the X stator 82 on inclined-plane of X beam 25 in the magnetic attraction F of the relative Y-axis cant angle theta of YZ plane direction.Same, in the arm 54 of be arranged on-Y side, can act on the magnetic attraction F of the relative Y-axis inclination-θ of YZ plane direction.Each magnetic attraction F, is decomposed into the component F of vertical direction (Z-direction) ₁, with the component F of horizontal direction (Y direction) ₂.Herein, due to the component F of horizontal direction ₂can, toward the directive effect cancelling each other out, therefore only can act on and add vertical direction component F in weight canceller 50 ₁power (that is 2F ₁).Therefore, as shown in Figure 4, the weight of fine motion microscope carrier 30 grades own, its part is by the component F of vertical direction ₁(2F ₁) offset, remaining power reaches Y stepping platform 90.Reach the power of Y stepping platform 90, be situated between and reach ground 11 by baseplate carrier pallet 33 and antihunting device 34.On the other hand, can apply the component F of vertical direction in 25, X beam ₁counter-force, weight own and vertical direction component F ₁counter-force be situated between reach ground 11 by pedestal 14 and auxiliary pedestal 15 (with reference to Fig. 1).

As described above, according to the exposure device 10 of this example, as shown in B part in A part, Fig. 6 in Fig. 6, and the baseplate carrier device PSTa (A part in Fig. 6) that can not produce magnetic attraction between weight canceller 50 and X beam 25 compares, the baseplate carrier device PST (B part in Fig. 6) of this example, fine motion microscope carrier 30 and weight canceller 50 can be considered as to the thing of the light weights such as such as hollow member due to the effect of magnetic attraction, therefore can shorten baseplate carrier device PST and be driven in the gravity motion distance L of scanning when crisscross.That is baseplate carrier device PST, changes owing to reducing to be driven in the scanning load-carrying that antihunting device 34 bears when crisscross, therefore can reduce the distortion of exposure device 10, promotes exposure accuracy.

Again, due to a part for the power downward vertical direction because of fine motion microscope carrier 30 grades and the weight generation of weight canceller 50 own is reached to X beam 25, therefore Y stepping platform 90 can reduce to act on the downward power of vertical direction of itself.Thereby the base wad 55 of taking the weight of canceller 50, can the little small-sized base wad of applied load capacity.That is Y stepping platform 90 can dwindle the guide surface (Y direction size) of supporting base wad 55.

Again, Y stepping platform 90, due to the load of energy minimizing itself, therefore can reduce the rigidity of Y stepping platform 90.Thereby Y stepping platform 90 can reduce thickness etc. and further miniaturization.

In addition, baseplate carrier device PST, due to Y stepping platform 90 Miniaturizables, therefore can reduce the driving force that Y stepping platform 90 is moved in Y direction stepping.

Secondly, other examples of exposure device are described.In the later each example of the 2nd following example, because the part beyond baseplate carrier device is identical with the exposure device 10 of aforementioned the 1st example, therefore, below be only illustrated for baseplate carrier device.

" the 2nd example "

Then, according to Fig. 7, the 2nd example is described.Herein, the component part identical or equal with aforementioned the 1st example, is that use is identical or simileys also simplifies or the description thereof will be omitted.

The baseplate carrier device PST1 of this 2nd example, though its entirety forms identical with aforesaid base plate bearing table device PST, but replace X beam 25 and that the shape part of the point of X beam 125 and the shape of X bracket 140 and X bracket 40 is set is not equal, part form and baseplate carrier device PST different.Below, centered by both dissimilaritys, describe.

As shown in Figure 7, a pair of X beam 125 that baseplate carrier device PST1 possesses, has respectively in YZ section the shape of (chamfering) is excised respectively in 4 summits of rectangle (containing rhombus and square), that is have anistree shape.One side's (+Y side) X beam 125, for example, to be fixed on above a side Y bracket 75 by installation component 124 at the state of the relative Y-axis inclination angle phi of θ x direction (45 degree).The opposing party's's (Y side) X beam 125, symmetrical with a side X beam 125, that is to be fixed on above the opposing party's Y bracket 75 by installation component 124 at the state of the relative Y-axis pitch angle-φ of θ x direction.A pair of X beam 125 has respectively 4 inclined-planes (face that XY plane tilts relatively).

In 4 inclined-planes of the X beam 125 of Yu Yifang, be not fixed on a pair of inclined-plane opposite to one another of installation component 124, that is in+Y side and+the 1st inclined-plane of Z side and-Y side and-the 2nd inclined-plane of Z side, have each of a pair of X stator 82 in the roughly total length of long side direction (X-direction) is extended.Again, the X beam 125 of Yu Yifang be fixed on installation component 124 the 3rd opposition side, inclined-plane the 4th inclined-plane (that is-Y side and+inclined-plane of Z side), in the direction parallel with this inclined-plane for example, with set interval, the parallel to each other x-ray guiding element 17a that is fixed with many (2) and extends X-direction.

In the opposing party's X beam 125, taking with the X beam of one side as symmetrical configuration, be provided with a pair of X stator 82, many x-ray guiding element 17a.

A pair of X bracket 140, falls the member of U-shaped and forms by having top and the YZ section that is located at respectively the 2 oppose side wall portions at top longitudinal edge direction both ends respectively.One side's (+Y side) X bracket 140 is to configure in the state of the relative Y-axis inclination of θ x direction φ and the 1st, the 2nd and the 4th inclined-plane subtend of X beam 125 with side-looking (observing from+directions X).Again, this side's X bracket 140, near the X-direction central portion of this side wall portion (with the 1st and the 2nd inclined-plane part of subtend respectively of X beam 125), same with aforementioned X bracket 40 notch part 42 (with reference to Fig. 2) that is formed with, in this side's the interior insertion arm 54 of notch part 42.

The pair of sidewalls portion inner face of the X bracket 140 of Yu Yifang, being fixed with respectively can mover 81 with each a pair of X of a pair of X stator 82 subtends of the 1st, the 2nd inclined-plane that is fixed on aforementioned X beam 125 by both fixed gaps (clearance/gap).Again, in the top underside of X bracket 140, each x-ray guiding element 17a is fixed with the saddle 17b that multiple (for example 4) comprise rolling body, are sticked in Y linear guide 17a in slidable mode relatively.

The opposing party's's (Y side) X bracket 140, with a side X bracket 140 be symmetrical, the identical formation of tool, being also provided with equally a pair of X can mover 81 and multiple saddle 17b.

X stator opposite to one another 82 and X can movers 81, form respectively the moving-coil type x-ray motor of electromagnetic force (Lorentz force) type of drive.Though X coarse motion microscope carrier 123x is driven in X-direction by these x-ray motors, in now, multiple x-ray guidance devices of involved x-ray guiding element 17a and saddle 17b directly enter to be guided in X-direction.

In this example, no matter in the driving of X coarse motion microscope carrier 123x or in stopping, between the X bracket 140 engaging therewith at a side's (+Y side) X beam 125, can be fixed on X beam 125 the 1st inclined-plane X stator 82 therewith the X of subtend can between mover 81, produce magnetic attraction Fb, be fixed on X beam 125 the 2nd inclined-plane X stator 82 therewith the X of subtend can between mover 81, also can produce magnetic attraction Fb.2 magnetic attraction Fb, its equal and opposite in direction and direction is just right.Certainly 2 magnetic attraction Fb, its each vertical component F, ₃and horizontal component F ₄also equate.Therefore,, between a side's (+Y side) X beam 125 and X bracket 140, as a complete unit, relatively X beam 125 can not produce X bracket 140 and be driven in the power of Z axis and Y direction.Same, between the opposing party's's (Y side) X beam 125 and X bracket 140, as a complete unit, also can not produce the relative X beam 125 of X bracket 140 and be driven in the power of Z axis and Y direction.That is, can keep the X towards oblique upper of a pair of arm 54 front ends that are arranged on weight canceller 50 can mover 56 (having core coil unit (with reference to Fig. 5)) and X stator 82 (magnet unit) between both fixed gaps (clearance/gap).

As described above, according to the baseplate carrier device PST1 of this 2nd example, can obtain the effect equal with the baseplate carrier device PST of the 1st example.In addition,, according to baseplate carrier device PST1, because the magnetic attraction Fb acting between a pair of X beam 125 and a pair of X bracket 140 can be cancelled, therefore can prevent from a pair of X bracket 140 (X saddle 17b) to apply vertical power upwards.Therefore, by by the declination angle of a pair of X beam 125 (φ) with and the declination angle of the arm 54 of X beam 125 subtends be set as arbitrarily set angle, can, under the state floating that has prevented a pair of X bracket 140, set arbitrarily the downward power of vertical direction that acts on base wad 55 and Y stepping platform 90.So, can make the further miniaturization of the further miniaturization of base wad 55 and Y stepping platform 90.

" the 3rd example "

Secondly, for the 3rd example, according to Fig. 8 and Fig. 9 in addition.Herein, the component part identical or equal with aforementioned the 2nd example, is that use is identical or simileys also simplifies or the description thereof will be omitted.

The baseplate carrier device PST2 of this 3rd example, though the formation of entirety is identical with the baseplate carrier device PST1 of aforementioned the 2nd example, form with baseplate carrier device PST1 different in the point etc., the part that replace X bracket 140 and weight canceller 50 and arrange X bracket 240 and weight canceller 250.Below, centered by dissimilarity, describe.

Each of a pair of X bracket 240, as shown in Figure 8, the tabular top 63 with the X-direction of being located at and the pair of sidewalls portion 64 of long side direction pars intermedia that is located at top 63, the shape (with reference to Fig. 9) of U-shaped is fallen in side-looking (observing from+directions X).Again, in Fig. 8, a Right X bracket 240 is simplified demonstration.In addition, as shown in Figure 9, a side's (+Y side) X bracket 240, is to configure in the state of the relative Y-axis inclination of θ x direction φ and the 1st, the 2nd and the 4th inclined-plane subtend of X beam 125 with side-looking (observing from+directions X).One side's X bracket 240, from comparison diagram 2 and Fig. 8, compares with aforementioned X bracket 40,140, and the size of X-direction is little, does not nearby form breach in X-direction central portion.

As shown in Figure 9, pair of sidewalls portion 64 inner faces of the X bracket 240 of Yu Yifang, being fixed with respectively can mover 81 with each a pair of X of a pair of X stator 82 subtends of the 1st, the 2nd inclined-plane that is fixed on aforementioned X beam 125 by both fixed gaps (clearance/gap).Again, in the top of X bracket 240 63 inner faces, each x-ray guiding element 17a is fixed with the saddle 17b that multiple (for example 4) comprise rolling body, are sticked in Y linear guide 17a in slidable mode relatively.

The opposing party's's (Y side) X bracket 240 and a side X bracket 240 are symmetrical, have same formation, and being also provided with equally a pair of X can mover 81 and multiple saddle 17b.

X stator opposite to one another 82 and X can movers 81, form respectively the moving-coil type x-ray motor of electromagnetic force (Lorentz force) type of drive.Though X coarse motion microscope carrier 223x is driven in X-direction by these x-ray motors, in now, multiple x-ray guidance devices of involved x-ray guiding element 17a and saddle 17b directly enter to be guided in X-direction.

Get back to Fig. 8, weight canceller 250, is fixed with a pair of X arm 254 in the Y direction two sides of basket 51.A pair of X arm 254, is made up of the rod member that is located at X-direction respectively, and the X-direction length of the section portion of falling U-shaped that its X-direction length has compared with X bracket 240 is slightly long some.Each of a pair of X arm 254, in the X-direction middle position of Y direction lateral surface, is connected in the side wall portion 64 of X bracket 240 by bending device 45.The height of bending device 45 is roughly consistent with the Z-direction centre of gravity place of weight canceller 250.Each of a pair of X arm 254, its long side direction both ends are linked to a pair of Y arm 255.Each of a pair of Y arm 255, is made up of the rod member that is located at Y direction, and Y direction length and a pair of X bracket 240 interval are to each other roughly with long.In addition, each of a pair of Y arm 255, in the Y direction middle position of X-direction lateral surface, is connected in web 41 by bending device 45.In the long side direction both ends of the surface of a pair of Y arm 255, the X that be fixed with in a pair of X stator 82 having respectively by both fixed gaps (clearance/gap) and a pair of X beam 125, is configured in X stator 82 subtends of Y direction inner side can mover 56.Each X can mover 56, comprises the not shown core coil unit that has, and forms weight canceller 250 is driven to the moving-coil Linear motor in X-direction together with the X of subtend stator 82 (magnet unit).

As described above, according to the baseplate carrier device PST2 of this 3rd example, can obtain the effect equal with the baseplate carrier device PST1 of the 2nd example.In addition, according to baseplate carrier device PST2, owing to can acting on magnetic attraction at a pair of Y arm 255 two ends, therefore can strengthen the power upwards of vertical direction that acts on weight canceller 250.Again, weight canceller 250, owing to being at 2 places nearby of the long side direction central authorities of the Y of magnetic attraction effect arm 255, supported (fixing) by X arm 254, therefore can prevent the deflection of the Y arm 255 when magnetic attraction acts on Y arm 255 two ends, perseverance makes weight canceller 250 produce certain magnetic attraction.

" the 4th example "

Secondly,, for the 4th example, be illustrated according to Figure 10～Figure 12.Herein, the component part identical or equal with aforementioned the 1st example, is that use is identical or simileys also simplifies or the description thereof will be omitted.

The baseplate carrier device PST3 of this 4th example, though its entirety forms identical with aforesaid base plate bearing table device PST, but at the shape of X beam 325, X bracket 340 and weight canceller 350 point different from aforementioned X beam 25, X bracket 40 and weight canceller 50 parts etc., PST is different with baseplate carrier device.Below, centered by dissimilarity, describe.

As shown in Figures 10 and 11, a pair of X beam 325 is made up of the rod member that is located at X-direction.Each of a pair of X beam 325, its YZ section shape is different from X beam 25.That is each of a pair of X beam 325, is that the profile of YZ section is rectangle, has and be arranged on extending X-direction, being divided into the hollow member of the hollow bulb of 2 parts with the parallel plane ribs regions of XZ of Y direction central authorities.Each of a pair of X beam 325, is fixed with the X stator 82 that extends X-direction in Y direction two sides, for example, in the x-ray guiding element 17a that is fixed with many (2) above and extends with set interval in Y direction X-direction.

Each of a pair of X bracket 340, as shown in figure 11, have the planar plate members 65 of the X-direction of being located at, with in the Y direction two sides of 65 long side direction pars intermedias of planar plate members with each upper surface with a pair of Z axis parallel side wall member 66 fixing with state that above planar plate members 65, roughly coplanar is high.That is, a pair of X bracket 340, having respectively X-direction central portion is the shape of section reverse U shape in YZ section, is configured to each (with reference to Figure 10) across a pair of X beam 325.

One side's (+Y side) X bracket 340, as shown in figure 10, below planar plate members 65, (end face) relatively each x-ray guiding element 17a is fixed with multiple (for example 4) and is slidably sticked in the saddle 17b of x-ray guiding element 17a, in addition, in each inner face of pair of sidewalls member 66, be fixed with respectively by both fixed gap (clearance/gap) can mover 81 with the X of each subtend of a pair of X stator 82.The opposing party's's (Y side) X bracket 340 is the same formations of X bracket 340 with a side.

A pair of X bracket 340, as shown in figure 11, by by the pair of sidewalls member 66 having respectively, side wall member 66 web 341 connected to each other that is configured in Y direction inner side links.Web 341, is made up of the planar plate members of overlooking lower central authorities and be formed with circular open portion 342, has both measured lengths (for example,, with the roughly the same length of side wall member 66) in X-direction.Below web 341, for example, be fixed with permanet magnet 343 (with reference to Figure 10) in peristome 342 many places (4 places at 90 degree intervals) around.Permanet magnet 343, the special Do of its material material No limits, and is to use the formation such as such as ferromagnet magnetite (Ferrite magnet), neodymium magnetite (Neodymium magnet) and aluminium-nickel-cobalt magnetic stone.

Get back to Figure 10, weight canceller 350 is in peristome 342 is inserted in below, is supported in Y stepping platform 90 by base wad 55.Weight canceller 350, at the shape of basket 351 and the link position of bending device 45 etc., different from aforementioned weight canceller 50.

Basket 351 is made up of the round-ended cylinder shape member that has of opening above.Basket 351, has circular blade of a sword portion 352 in bottom surface periphery.Blade of a sword portion 352, above periphery edge with the mode of permanet magnet 343 subtends that is fixed on web 341, magnetic 353 configures with set interval (set angle intervals).Weight canceller 350, when be equipped on Y stepping platform 90 with contactless state by base wad 55, be configured to permanet magnet 343 and pass through both fixed gap (clearance/gap) subtends with magnetic 353.Magnetic 353 forms by having certain thickness block member, though material is not particularly limited, uses the formation such as such as iron oxide, chromium oxide, cobalt or ferrite.

Bending device 45, its one end is the outer peripheral face fixing multiple (for example 4) at basket 351 with set interval (set angle intervals), and the other end is fixed on the peristome inner peripheral surface (with reference to Figure 11) that is formed at web 341.

As being fixed on web 341 permanet magnet 343 of many places below, can use respectively single permanet magnet, but be not limited to this, also multiple magnetite capable of being combined is used.

Lift an example, can be as shown in A part in Figure 12, below the yoke 344 being embedded in web 341 below, different polarity a pair of permanet magnet 343a, 343b are apart fixed at set interval, form according to this permanet magnet 343.In Figure 12 in the example of A part, the permanet magnet 343a of be configured in-Y side, its+Z side is that the S utmost point ,-Z side are the N utmost point, the permanet magnet 343b of on the other hand, be configured in+Y side, its+Z side is that the N utmost point ,-Z side are the S utmost point.Between a pair of permanet magnet 343a, 343b and magnetic 353, produce magnetic attraction Fc.As shown in B part in Figure 12, also can replace magnetic 353 permanet magnet 345 is configured to and permanet magnet 343 subtends again.Now, permanet magnet 345 be configured to a side of itself and permanet magnet 343a subtend be the S utmost point, with the opposite side of permanet magnet 343b subtend be the N utmost point.

As described above, according to the baseplate carrier device PST3 of this 4th example, can obtain the effect equal with the baseplate carrier device PST of the 1st example.In addition,, according to baseplate carrier device PST3, owing to can not producing the power that X bracket 340 is floated, therefore can prevent floating of X bracket 340.Accordingly, in baseplate carrier device PST3, the magnetic attraction Fc producing can be adjusted into arbitrary size between permanet magnet 343 and magnetic 353, its result, can alleviate the load-carrying that is applied to Y stepping platform 90 and antihunting device 34 freely.

" the 1st variation of the 4th example "

Secondly,, for the 1st variation of the 4th example, be illustrated according to Figure 13.Herein, the component part identical or equal with aforementioned the 4th example, is used identical or simileys also simplifies or the description thereof will be omitted.

The baseplate carrier device PST3a of this variation, the point with bending device 45, blade of a sword portion 352 and X bracket 340 being linked at the point that the position of the blade of a sword portion 352 that in baseplate carrier device PST3, weight canceller 350 has and web 341 is exchanged, with this and the point that the part of weight that acts on fine motion microscope carrier 30 of Y stepping platform 90 etc. is alleviated with the magnetic reacting force Fd between permanet magnet 343 and permanet magnet 346, PST3 is different with aforesaid base plate bearing table device.

As shown in figure 13, the weight canceller 350a of this variation, the position in the middle of the Z-direction of basket 351a, particularly, with the centre of gravity place of weight canceller 350a roughly consistent height and position be provided with blade of a sword portion 352.Periphery edge below Ngok portion 352 is fixed with permanet magnet 343.In addition,, in the outer peripheral face of blade of a sword portion 352, be connected with one end of multiple (for example 4) bending device 45 with set interval (set angle intervals).The other end of bending device 45, is connected in the side wall member 66 of X bracket 340, is configured in the side wall member 66 of Y direction inner side.

Link the web 341 of a pair of X bracket 340, be fixed in each side wall member 66 of a pair of X bracket 340, be configured in the bottom of the side wall member 66 of Y direction inner side.Again, around the peristome above web 341, with the position of each permanet magnet 343 subtends, be fixed with respectively the permanet magnet 346 that permanet magnet 343 is produced to retroaction magnetic force.

As described above, according to the baseplate carrier device PST3a of this 1st variation, decapacitation obtains outside the effect equal with the baseplate carrier device PST3 of the 4th example, owing to the blade of a sword portion 352 that is fixed with permanet magnet 343 being fixed near the Z-direction centre position of weight canceller 350a, the web 341 that is fixed with permanet magnet 346 is fixed on to the bottom of X bracket 340, therefore the Z position of X beam 325 is some belows, the Z position places that are configured in compared with weight canceller 350a.Accordingly, baseplate carrier device PST3a, can promote toward direction of scanning and scan crisscross stability when movable.

" the 2nd variation of the 4th example "

Secondly,, for the 2nd variation of the 4th example, be illustrated according to Figure 14.Herein, the component part identical or equal with aforementioned the 4th example, is used identical or simileys also simplifies or the description thereof will be omitted.

In the baseplate carrier device PST3b of this variation, the shape of the shape of X beam 325b and X bracket 340b is different from the shape of X beam 325 and the shape of X bracket 340 of aforesaid base plate bearing table device PST3.

A pair of X beam 325b, is made up of the rod member that extends X-direction respectively, and the thin top of shape of YZ section is compared with the roughly isosceles trapezoid of the handstand of base Chang Ruogan.That is, a pair of X beam, have respectively parallel plane above and below with XY, with relative XZ plane in θ x direction a pair of inclined-plane (Y direction two sides) with set angle θ ,-θ inclination.X-ray guiding element 17a and X stator 82, same with X beam 325, be separately fixed at X beam 325b above and a pair of inclined-plane (Y direction two sides).

A pair of X bracket 340b, the pair of sidewalls member 66 that the shape of the pair of sidewalls member 68 that had separately and X bracket 340 have is different.That is, side wall member 68 each other in right+Y side with-Y side, have respectively from upper end (+Z side) near central portion with the parallel plane part 1 of XZ, with near central portion to lower end (Z side) favour-Y side or+Y side and with the part 2 of 2 inclined-plane subtends of above-mentioned X beam 325b.In the end face of a pair of X bracket 340b (planar plate members 65 below), be fixed with the saddle 17b that is slidably sticked in x-ray guiding element 17a, in addition, in the part 2 of side wall member 68 internal faces, be fixed with by both fixed gap (clearance/gap) can mover 81 with the X of X stator 82 subtends, generation magnetic attraction Fe.The magnetic attraction Fe acting between a side X beam 325b and X bracket 340b, the component of horizontal direction is cancelled, same, the magnetic attraction Fe acting between the opposing party's X beam 325b and X bracket 340b, the component of horizontal direction is also cancelled.That is, act on the magnetic attraction Fe of X bracket 340b, only X bracket 340b is applied to vertical direction component upwards.

As described above, according to the baseplate carrier device PST3b of this variation, decapacitation obtains outside the effect equal with the baseplate carrier device PST3 of the 4th example, because the downward power acquisition of vertical direction that is applied to X bracket 340b alleviates, therefore in the time that baseplate carrier device PST3b is driven in X-direction, can alleviate the driving opposing producing between X saddle 17b and x-ray guiding element 17a.In addition, due to produce X in order to alleviate the magnetic attraction Fe that acts on the downward power of the vertical direction of above-mentioned X bracket 340b can mover 81, outside X stator 82, the permanet magnet 343, the magnetic 353 that are separately provided with the magnetic attraction Fc that produces the part in order to alleviate the weight such as weight canceller 350 that acts on baseplate carrier pallet 33, therefore can be set as respectively producing set magnetic attraction.

" the 5th example "

Secondly,, for the 5th example, be illustrated according to Figure 15 and Figure 16.Herein, the component part identical or equal with aforementioned the 1st example, is used identical or simileys also simplifies or the description thereof will be omitted.

The baseplate carrier device PST4 of this 5th example, though its entirety forms identical with baseplate carrier device PST, but the shape of the shape of the shape of the shape of X beam 325, X bracket 440 and aforementioned X beam 25, X bracket 40 is different, and the method etc., the part that alleviate the load that antihunting device 34 bears form with baseplate carrier device PST different.Below, centered by dissimilarity, describe.

As shown in Figure 15 and Figure 16, a pair of X beam 325 of this example, is made up of the member of a pair of X beam 325 same shapes that use with above-mentioned the 4th example, and same, multiple x-ray guiding element 17a, a pair of X stator 82 are fixed in the above and a pair of side.

A pair of X bracket 440, as shown in Figure 15 and Figure 16, have the planar plate members of overlooking rectangle 59 taking X-direction as long side direction, with upper surface separately and the state that above planar plate members 59, roughly coplanar is high be fixed on long side direction one end of planar plate members 59 and the Y direction both ends of the surface of the other end a pair of, add up to 4 side wall member 58 parallel with Z axis.X bracket 440, observes from+directions X, as shown in figure 16, has reverse U shape shape, in inserting to each other X beam 325 each other in right+Y side and the side wall member 58 of-Y side.Long side direction (X-direction) central portion in X bracket 440 is nearby provided with notch part 42 (with reference to Figure 15).

A pair of X bracket 440, be fixed with multiple (for example 4) and be sticked in slidable mode the saddle 17b of x-ray guiding element 17a respectively at the relatively each x-ray guiding element of end face (below planar plate members 59) 17a, in addition be fixed with respectively by both fixed gap (clearance/gap) can mover 81 with the X of each subtend of a pair of X stator 82 in the internal face of side wall member 58.

Aforementioned the 1st example, be fix respectively X in the front end of a pair of arm 54 that is fixed on weight canceller 50 can mover 56, alleviate a part for the load-carrying load of the gravity direction that acts on antihunting device 34, but as shown in figure 16, arm 54 is not set and X can mover 56 in the weight canceller 450 of this example.That is weight canceller 450 is made up of basket 51, air spring 52, Z saddle 53 and base wad 55 etc.Weight canceller 450 for example, is connected in a pair of X bracket 440 by many (4) bending devices 45 that are connected to basket 51.Each bending device 45 is made into the roughly the same height of centre of gravity place with weight canceller 450.

Get back to Figure 15, a pair of pedestal 414, is made up of the rod member that extends Y direction respectively.A pair of pedestal 414, comprise respectively parallel plane above and below with XY, by have one side (inclined-plane) that relative YZ plane slightly tilts in θ x direction with and body 414a of forming of the hollow member of the another side (inclined-plane) that tilts with angle in reverse direction (θ x direction) of this one side and from multiple 14b of foot of the 414a of below support body portion.Be provided with multiple adjuster 14c in the bottom of each 14b of foot, and can adjust the Z position of body 414a.

In the X-direction two sides (a pair of inclined-plane of subtend) of body 414a, be fixed with respectively the Y stator 73 that is located at Y direction as the key element of linear motor.Again, above body 414a, the parallel to each other Y linear guide 16a that is located at Y direction that is fixed with many (for example 2) and extends the key element of the mechanicalness Y linear guide (single shaft guidance device) of Y direction.

Body 414a configuration (insertion) is being fallen by XZ section between a pair of subtend face of the Y bracket 475 that the member of U-shaped forms (between side wall member).Y bracket 475, relative 1 pedestal 414 disposes multiple (for example 2) in Y direction compartment, and each Y bracket 475 is connected to each other by the plate 76 being fixed in the above.The a pair of subtend face of Y bracket 475, have upper end (+Z side) from each to central portion nearby with the parallel plane part 1 of YZ, with from central portion nearby to lower end (Z side) favour-X side or+X side and with the part 2 of 2 inclined-plane subtends of the body 414a of above-mentioned pedestal 414.Y bracket 475, is set as being equipped under the state of pedestal 414, and 2 dip plane of body 414a are parallel with the part 2 of a pair of subtend face having with the Y bracket 475 of this subtend.In the part 2 of a pair of subtend face of Y bracket 475 each, be fixed with respectively by both fixed gap (clearance/gap) can mover 472 with a pair of Y of each subtend of a pair of Y stator 73.Each Y can mover 472, comprises the not shown core coil unit that has, and forms the Y linear motor that X beam 325 is driven with set stroke in Y direction together with the Y of subtend stator 73.Again, each Y can mover 472 and the Y stator 73 of subtend between can produce magnetic attraction Ff.In addition,, in the end face of Y bracket 475, relatively each Y bracket 475 is fixed with multiple (for example 2) is slidably sticked in the saddle 16b of Y linear guide 16a.

Y stepping platform 490, is made up of the rod member that extends X-direction, is mounted on baseplate carrier pallet 33.In the long side direction two ends of Y stepping platform 490, be fixed with by both fixed gap (clearance/gap) can mover 94 with the Y of Y stator 73 subtends by fixed component 446.Each Y can mover 94, comprises the not shown core coil unit that has, and forms the x-ray motor that Y stepping platform 490 is driven with set stroke in X-direction together with the Y of subtend stator 73.Again, each Y can mover 94 and the Y stator 73 of subtend between can produce magnetic attraction Fg.

Be fixed on Y stepping platform 490+Y of X side fixed component 446 can mover 94 and and the Y stator 73 of this subtend between, in+directions X and+Z directive effect magnetic attraction Fg, be fixed on Y stepping platform 490-Y of X side fixed component 446 can mover 94 and and the Y stator 73 of this subtend between, in-directions X and+Z directive effect magnetic attraction Fg.This occasion, due to the horizontal direction component of this 2 magnetic attraction Fg equal and opposite in direction and opposite direction (just to) each other, therefore cancels each other out.That is above-mentioned 2 magnetic attraction Fg, apply vertical direction power upwards to Y stepping platform 490, its counter-force reaches ground 11 by pedestal 414.

As described above, the baseplate carrier device PST4 of this 5th example, can obtain the effect equal with the baseplate carrier device PST of the 1st example.In addition, in baseplate carrier device PST4, the load bearing due to antihunting device 34 is alleviated, and therefore can reduce the unbalance loading weight that acts on antihunting device 34 when baseplate carrier device PST4 drives.

" variation of the 5th example "

Secondly,, for the variation of the 5th example, be illustrated according to Figure 17.Herein, the component part identical or equal with aforementioned the 5th example, is used identical or simileys also simplifies or the description thereof will be omitted.

The baseplate carrier device PST4a of this variation, the point that Y can mover 94 is not set and above fixed component 446, is fixed with magnetic 96 at the fixed component 446 at long side direction both ends of being located at Y stepping platform 490a, the point that is provided with permanet magnet 97 in the top of magnetic 96 by both fixed gaps (clearance/gap) in X bracket 475a, PST4 is different from baseplate carrier device.

Permanet magnet 97, is actually and is fixed on below fixed component 478.In Y stepping platform 490a+X side, fixed component 478 is with for example, by multiple (2) Y bracket 475a mode connected to each other with set arranged spaced in Y direction, is fixed on the upper end of each Y bracket 475a-X side side.Permanet magnet 97 is to be fixed on by both modes of fixed gap and magnetic 96 subtends below fixed component 478.That is, in the Y of this variation stepping platform 490a, can be applied in and Y stator 73 and the vertical direction that is fixed on the magnetic attraction Fh independently the producing formation that magnetic attraction Ff that the Y of Y bracket 475a produces between can mover 472 is different between magnetic 96 and permanet magnet 97 power upwards of body 414a that is fixed on pedestal 414.Again, other parts of Y bracket 475a, have the formation identical with above-mentioned Y bracket 475.

As described above, the baseplate carrier device PST4a of the variation of this 5th example, can obtain the effect equal with the 5th example.In addition, according to baseplate carrier device PST4a, to be produced by magnetism generation device independently due to the vertical magnetic attraction Fh upwards that acts on Y stepping platform 490a, with the magnetic attraction Ff that acts on Y bracket 475a, therefore can, by acting on the magnetic attraction Fh and the magnetic attraction Ff that acts on Y bracket 475a of Y stepping platform 490a, be set as respectively set power.That is, can resist and reduce to set value with the driving that multiple Y linear guides of saddle 16b bear acting on the load-carrying load (unbalance loading weight) of antihunting device 34 and comprising Y linear guide 16a.

Again, it is only an example that the illustrated device of above-mentioned the 1st～5th each example and each variation (following, to claim each example etc.) forms, and certainly can have various distortion.For example, in above-mentioned each example etc., though be for utilizing magnetic attraction or magnetic repulsion force to act on Y stepping platform 90 to alleviate, 490, 490a and support this baseplate carrier pallet 33 and the situation of the load-carrying load of the gravity direction of antihunting device 34 is described, but be not limited to this, there is the electromagnetic force of direction of vertical direction component, it is the linear motor that is driven use by X coarse motion microscope carrier, or Y coarse motion microscope carrier drive use linear motor produce situation time, can the vertical component of this electromagnetic force will be utilized, act on Y stepping platform 90 to alleviate, 490, 490a and support this baseplate carrier pallet 33 and the load alleviator of the gravity direction load-carrying load of antihunting device 34, be equipped on baseplate carrier device PST, PST1, PST2, PST3, PST3a, PST3b, PST4, PST4a.

Again, also can replace stator (magnet unit) in above-mentioned each example etc. and combination that can mover (having core coil unit), and form above-mentioned load alleviator by the combination of stator (magnet unit) and magnetic member.Or, also can replace form load alleviator at least a portion permanet magnet and use electromagnet.

Again, above-mentioned each example, though be for possessing at Y stepping platform 90, 490, the upper mobile weight canceller 50 of 490a, 250, 350, 350a, 450 baseplate carrier device PST, PST1, PST2, PST3, PST3a, PST3b, PST4, PST4a is described, but be not limited to this, also the institute such as such as No. 2010/0018950 instructions of U.S. Patent Application Publication discloses, possessing in the scanning exposure apparatus of baseplate carrier device that weight canceller is housed, setting comprise the stator (magnetite) of being located at Y coarse motion microscope carrier be located at X coarse motion microscope carrier can the x-ray motor of mover (coil) so that X coarse motion microscope carrier is driven with set stroke in X-direction (direction of scanning), and utilization act on form above-mentioned can the coil of mover with a part for weight canceller between power with negative function in comprising the load-carrying alleviator of loading from the gravity direction load-carrying of the supporting pallet of the platform of below taking the weight of canceller.This occasion, in the time of the exposure-processed of substrate (object), can with the X coarse motion microscope carrier that keeps the substrate holding (object retaining member) of substrate move toward the direction parallel with surface level together, by linear motor driven in X-direction.Now, though can act on the gravity direction load-carrying load of substrate holding and the weight formation of weight canceller own in supporting pallet, but this load-carrying load can act on the power between a weight canceller part by the utilization of load-carrying alleviator, from weight canceller, a part of power is moved to X coarse motion microscope carrier and is alleviated.Therefore, can alleviate the gravity motion that is that comprises substrate holding, weight canceller and supporting pallet and the unbalance loading weight that acts on supporting pallet forming maintains sufficient exposure accuracy according to this.

Also the variation of above-mentioned the 1st～4th example and above-mentioned the 5th example and variation thereof can be used in combination again.That is, can and use to weight canceller 50,250,350,350a, 450 produce the device of vertical direction power upwards, with the device that Y stepping platform 90,490,490a is produced to vertical direction power upwards.

In above-mentioned each example, though a pair of X bracket 40,140,240,340,340b, 440 are linked with web 41,341, also can replace web 41,341 and a pair of X bracket is synchronously driven in X-direction with main control unit again.Same, though the multiple Y brackets 75 that carry on 1 pedestal 14,414,475,475a are linked respectively with plate 76, also can replace plate 76 and multiple Y bracket 75,475,475a are synchronously driven in Y direction with main control unit.

Again, in above-mentioned each example, Y stepping platform 90,490,490a are middle real members, but are not limited to this, can also be hollow member or have the shape that flank is set in hollow member inside.For example, the mode such as can cast is manufactured the Y stepping platform being made up of hollow member.

Again, in the 1st example, connecting the bending device 45 of weight canceller 50 and X bracket 40, can be to be configured to only weight canceller 50 to be drawn in Y direction.In addition, if weight canceller 50 is driven in X-direction and Y direction together with X bracket 40 by bending device 45, the X that also can replace arm 54 front ends that are fixed on weight canceller 50 can mover 56, and fixed magnetic body.

Again, in the variation of the 4th example and the 4th example, though a pair of X bracket 340,340b are linked with the web 341 that is formed with peristome, be not limited to this, also a pair of X bracket 340,340b can be linked with the multiple webs in X-direction configured separate.In addition, being fixed on the blade of a sword portion 352 of weight canceller 350,350a, need not being arranged on the all-round of weight canceller 350,350a, can be the rod member of stretching out towards peripheral direction.

Again, in the variation of the 5th example, though be to have configured magnetic 96 in the long side direction both ends of Y stepping platform 490a, but be not limited to this, due to as long as can be in Y stepping platform 490a effect vertical direction power upwards, therefore, can for example pass through fixation means arrangement arranged magnetic 96 in the long side direction center section of Y stepping platform 490a, and with the fixing permanet magnet 97 below X beam 325 of the mode at its subtend face configuration permanet magnet 97.

Again, illumination light can be ultraviolet light or the F of ArF excimer laser (wavelength 193nm), KrF excimer laser (wavelength 248nm) etc. ₂the vacuum-ultraviolet light of laser (wavelength 157nm) etc.In addition, as illumination light, also for example can use the single wavelength laser of the infrared tape sending from dfb semiconductor laser or optical-fiber laser or visible light belt with for example doped with in addition amplification of the fiber amplifier of erbium (or erbium and ytterbium both), use nonlinear optics crystallization in addition wavelength be converted to the harmonic wave of ultraviolet light.Moreover, also can use Solid State Laser (wavelength: 355nm, 266nm) etc.

Again, in above-mentioned each example etc., though be to be that PL is that the situation that possesses the poly-lens mode projection optics system of many projecting optical units is described for projection optics, the quantity of projecting optical unit is not limited to this, as long as 1 above.In addition, being also not limited to the projection optics system of poly-lens mode, can also be the projection optics system etc. of the large-scale catoptron of such as Ou Funa of Shi Yong (Ofner) type.Moreover, though be for being that PL uses projection multiplying power for the situation that waits times person is described as projection optics in above-mentioned example, being not limited to this, projection optics system dwindles be and expand any of system.

Again, in above-mentioned each example etc., though be to use to be formed with set light-shielding pattern (or phase pattern in transmitance mask substrate, dim light pattern) light transmissive mask, but also can use for example United States Patent (USP) the 6th, 778, No. 257 communiques disclose, form transmission pattern or reflection graphic patterns according to the electronic bits of data of pattern to be exposed, or the electronics mask (variable shaping mask) of formation luminous pattern, for example can adopt the variable shaping mask of a kind of DMD (Digital Micro-mirror Device) that uses non-light emitting-type image display element (being also called spatial light modulation device).

Again, as exposure device, for example, while being especially applicable to size (comprising external diameter, catercorner length, on one side at least a kind) for substrate more than 500mm, to make the exposure device of the large substrate exposure that the flat-panel screens such as liquid crystal display cells use, effective especially.

As exposure device, also can be applicable to the exposure device of stepping repetition (step & repeat) mode, the exposure device that stepping engages (step & stitch) mode again.In addition, the object that is held in the moving body of mobile body device is not limited to exposure object object substrate etc., can also be the pattern holder (raw sheet) of mask etc.

Again, the purposes of exposure device, be not limited to the liquid crystal exposure device to square glass plate by liquid crystal display cells pattern transfer, also can be widely used in the exposure device of such as semiconductor manufacture use, in order to manufacture the exposure device of thin-film head, micro-machine and DNA wafer etc.In addition; be not only the microcomponent of semiconductor element etc.; the present invention also can be applicable to as manufacturing mask or the graticule for light exposure device, EUV exposure device, x-ray exposure device and electric wire exposure device etc., and circuit pattern is transferred to the exposure device of glass basis plate or Silicon Wafer etc.Again, possessing the device of the object holding apparatus that keeps object, be not limited to exposure device, can also be other substrate board treatment, such as glass substrate (or wafer) testing fixture etc.Again, the object of exposure object is not limited to glass plate, can also be other objects such as such as wafer, ceramic substrate, film member or mask substrate (mask blank).Again, when exposure object thing is the situation of flat-panel monitor substrate, the thickness of this substrate is not particularly limited, for example, also comprise film-form (the flexual flat member of tool) person.

The electronic component of liquid crystal display cells (or semiconductor element) etc., it is the step designing via the functional performance of carrying out element, make the step of mask (or graticule) according to this design procedure, make the step of glass substrate (or wafer), with the exposure device of above-mentioned each example and exposure method thereof by mask (graticule) pattern transfer the lithography step to glass substrate, make the development step of developing through the glass substrate of exposure, by the etching step that member is removed with etching that exposes of part beyond the part of remaining resist, removal complete etching and without resist resist remove step, element number of assembling steps, inspection Check step etc. is manufactured.This occasion, because at lithography step being uses the exposure device of above-mentioned example to implement aforementioned exposure method, forming element pattern on glass substrate, therefore can be with the element of good productivity manufacture high integration.

In addition, quote the part that the announcement of all communiques about exposure device, International Publication communique, U.S. Patent Application Publication instructions and US Patent specification that above-mentioned explanation quotes is recorded as this instructions.

Utilizability in industry

As described above, exposure device of the present invention is suitable for making the object exposure on plate.Again, the manufacture method of flat-panel screens of the present invention is very suitable for making the object after exposure to develop.In addition, manufacturing method of the present invention is very suitable for manufacturing microcomponent.

Claims (29)

1. an exposure device for sweep type, is relative to exposure energy beam, exposure object object to be moved with set the 1st stroke in the 1st direction parallel with surface level in the time of exposure-processed, and it possesses:

Moving body, can in described the 1st direction at least move with described set the 1st stroke and can be in described surface level in moving with the 2nd stroke with orthogonal the 2nd direction of described the 1st direction;

Object retaining member, can keep described object, at least move in the direction parallel with described surface level together with described moving body;

Weight canceller, supports described object retaining member to offset the weight of described object retaining member from below;

Supporting member, extends described the 1st direction, from below support described weight canceller and can from below support the state of described weight canceller, move with described the 2nd stroke in described the 2nd direction;

Supporting pallet, supports described supporting member; And

Load-carrying alleviator, in order to alleviate the load-carrying load of the gravity direction that acts on described supporting pallet.

2. exposure device as claimed in claim 1, wherein, described load-carrying alleviator is by a part for the power that acts on described weight canceller is released into described supporting pallet outside, alleviates described load-carrying load.

3. exposure device as claimed in claim 1 or 2, wherein, described load-carrying alleviator is to utilize the power acting between a part for described moving body and a part for described weight canceller, alleviates described load-carrying load.

4. exposure device as claimed any one in claims 1 to 3, wherein, described moving body comprises the 1st mobile member that can at least move with described set the 1st stroke in described the 1st direction, with described the 1st mobile member of guiding toward the movement of described the 1st direction and can be at the 2nd mobile member moving with described the 2nd stroke together with described the 1st mobile member in described the 2nd direction in described surface level.

5. exposure device as claimed in claim 4, wherein, described the 1st mobile member be the involved magnetite of being located at described the 2nd mobile member, with the linear motor of coil of being located at described the 1st mobile member, drive in described the 1st direction with described the 1st stroke;

Described load-carrying alleviator is to utilize the power acting between described magnetite and a part for described weight canceller or a part for described supporting member, alleviates the load-carrying load of the gravity direction that acts on described supporting member.

6. exposure device as claimed in claim 5, wherein, has been provided with core coil in described weight canceller;

Described weight canceller by described magnetite and described in have the electromagnetic interaction between core coil and the electromagnetic force that produces, on described supporting member, drive in described the 1st direction;

The utilization of described load-carrying alleviator act on described magnetite and described in have the magnetic force between core coil, alleviate described load-carrying load.

7. exposure device as claimed in claim 1, wherein, described load-carrying alleviator is to utilize the power acting between a part for described moving body and a part for described supporting member, alleviates described load-carrying load.

8. exposure device as claimed in claim 7, wherein, described load-carrying alleviator is by a part for the power that acts on described supporting member is released into described supporting pallet outside, alleviates described load-carrying load.

9. exposure device as claimed in claim 7 or 8, wherein, described moving body comprise the 1st mobile member that can at least move with described set the 1st stroke in described the 1st direction, with described the 1st mobile member of guiding toward the movement of described the 1st direction and can be at the 2nd mobile member moving with described the 2nd stroke together with described the 1st mobile member in described the 2nd direction in described surface level.

10. exposure device as claimed in claim 9, wherein, described load-carrying alleviator is to utilize the power acting between described the 2nd mobile member and described supporting member, alleviates described load-carrying load.

11. exposure devices as described in claim 9 or 10, the bearing support that it further possesses described the 2nd mobile member of supporting, separates in vibration with described supporting pallet;

Described the 2nd mobile member be the involved magnetite of being located at described bearing support, with the linear motor that has core coil of being located at described the 2nd mobile member, drive in described the 2nd direction with described the 2nd stroke;

The utilization of described load-carrying alleviator act on described magnetite and described in have the magnetic force between core coil, further alleviate described load-carrying load.

12. exposure devices as described in any one in claim 4 to 6,9 to 11, wherein, described supporting member is to be linked to described the 2nd mobile member so that coupling arrangement is mechanical, in the time that described the 2nd mobile member moves, drawn by described the 2nd mobile member by described coupling arrangement, be displaced into according to this described the 2nd direction.

13. exposure devices as claimed in claim 12, wherein, in described coupling arrangement, with the rigid phase of described the 2nd direction, the rigidity of its other direction is lower.

14. exposure devices as described in claim 12 or 13, wherein, described coupling arrangement is on the centre of gravity place by described supporting member, the axis parallel with described the 2nd direction, is connected in described supporting member.

15. exposure devices as described in any one in claim 1 to 14, it further possesses guiding element, and described guiding element comprises and mechanically guides the key element of described supporting member toward the single shaft guidance device of the movement of described the 2nd direction;

The relatively described moving body of described guiding element separates in vibration.

16. exposure devices as claimed in claim 15, wherein, described single shaft guidance device in described the 1st direction with set be interval with multiple.

17. exposure devices as described in claim 15 or 16, wherein, described guiding element along described the 2nd direction separated from one another dispose multiple;

Described supporting member is to be mounted on described multiple guiding element.

18. exposure devices as described in any one in claim 1 to 17, wherein, described supporting member is to be made up of the mo(u)lding of middle real stone material or hollow.

19. exposure devices as described in any one in claim 1 to 18, wherein, described weight canceller is to be mounted on described supporting member with contactless state.

20. exposure devices as described in any one in claim 1 to 19, wherein, described object retaining member can relatively described moving body to be less than described the 1st direction, described the 2nd direction and around with the orthogonal axis direction fine motion of described surface level.

21. exposure devices as claimed in claim 20, wherein, described object retaining member further can relatively described moving body in the direction orthogonal with described surface level and around the axis direction fine motion parallel with described surface level.

22. exposure devices as described in any one in claim 1 to 21, it further possesses described object retaining member supporting for can be around the swinging mounting device of the axis oscillating parallel with described surface level.

23. exposure devices as claimed in claim 22, wherein, described swinging mounting device supports described object retaining member with cordless.

24. exposure devices as described in claim 22 or 23, wherein, described swinging mounting device is supported from below by described weight canceller;

Described weight canceller is to be mounted on described supporting member with contactless state.

25. exposure devices as described in any one in claim 22 to 24, wherein, described weight canceller possesses the force generating apparatus that produces vertical direction power upwards;

Described swinging mounting device is to be configured to move with the orthogonal direction of described surface level, and the described power that described force generating apparatus is produced is passed to described object retaining member.

26. 1 kinds of scanning exposure apparatus, are relative to exposure energy beam, the object of exposure object to be moved with set the 1st stroke in the 1st direction parallel with surface level in the time of exposure-processed, and it possesses:

The 1st mobile member, can at least move with described set the 1st stroke in described the 1st direction;

The 2nd mobile member, guides described the 1st mobile member toward the movement of described the 1st direction and can move with the 2nd stroke together with described the 1st mobile member in the 2nd direction orthogonal with described the 1st direction in described surface level;

Object retaining member, keeps described object, can at least move in the direction parallel with described surface level together with described the 1st mobile member;

Weight canceller, supports described object retaining member to offset the weight of described object retaining member from below;

Supporting pallet, comprises the platform that supports described weight canceller from below;

Linear motor, comprises the magnetite of being located at described the 2nd mobile member and the coil of being located at described the 1st mobile member, and described the 1st mobile member is driven in described the 1st direction with described the 1st stroke; And

Load-carrying alleviator, utilizes the power acting between described magnetite and a part for described weight canceller, alleviates the load-carrying load of the gravity direction that acts on described supporting pallet.

27. exposure devices as described in any one in claim 1 to 26, wherein, the substrate that described object is manufactured for flat-panel screens.

The manufacture method of 28. 1 kinds of flat-panel screens, comprises:

Right to use requires the exposure device described in 27 to make the action of described base plate exposure; And

The action that described substrate after exposure is developed.

29. 1 kinds of manufacturing methods, comprise:

Right to use requires the action that in 1 to 26, the exposure device described in any one exposes object; And

The action that described object after exposure is developed.