CN104204955B

CN104204955B - Exposure device, the manufacture method of flat-panel screens and manufacturing method

Info

Publication number: CN104204955B
Application number: CN201380018931.8A
Authority: CN
Inventors: 青木保夫
Original assignee: Nikon Corp
Current assignee: Nikon Corp
Priority date: 2012-04-04
Filing date: 2013-04-03
Publication date: 2016-12-14
Anticipated expiration: 2033-04-03
Also published as: KR20150003260A; TWI670574B; WO2013150790A1; JP2013217957A; TW201802620A; KR102151930B1; CN104204955A; JP5863149B2; TW201351060A; TWI609244B

Abstract

The baseplate carrier device (PST) of the present invention, the arm (54) being had in weight canceller (50) be fixedly arranged at the front end with the X stator (82) that had with X beam (25) to, X that weight canceller (50) produces magnetic attraction can mover (56).Weight canceller (50), is reached on ground (11) by pedestal (14) by a part for the weight such as the fine motion microscope carrier (30) that weight own and weight canceller (50) are supported by this magnetic attraction.Thus alleviate the unbalance loading weight being added on antihunting device (34).

Description

Exposure device, the manufacture method of flat-panel screens and manufacturing method

Technical field

The present invention is about exposure device, the manufacture method of flat-panel screens and manufacturing method, in detail, is to close In manufacture semiconductor element, liquid crystal display cells etc. photoetching process used in exposure device, use aforementioned exposure device The manufacture method of flat-panel screens and use the manufacturing method of aforementioned exposure device.

Background technology

All the time, in manufacturing the electronic component (microcomponent) such as liquid crystal display cells, semiconductor element (integrated circuit etc.) Photoetching process in, be to use to make mask or graticule (following, to be referred to as " mask ") and glass plate or wafer (below, It is referred to as " substrate ") along set scanning direction (scan direction) synchronizing moving, while the pattern that will be formed in mask uses energy (so-called scanning stepper (also known as scans the exposure device of step-scan (the step & scan) mode that bundle is transferred on substrate Machine)) etc..

As this kind of exposure device, have and a kind of have and can take on the X coarse motion microscope carrier that scanning direction is moved with Long travel Load can be in the Overlapping of the Y coarse motion microscope carrier of scanning intersection (cross scan) direction (direction orthogonal with scanning direction) movement (gantry (gantry) type) bearing table device, as this kind of bearing table device, with such as at the platform (surface formed by stone material Plate) constitutor moved along the horizontal plane on is widely known by the people (for example, referring to patent documentation 1).

The exposure device of above-mentioned patent documentation 1, owing to weight canceller is moving on a large scale in corresponding step-scan, Therefore must the flatness of (the mobile guiding face of weight canceller) is made above on a large scale by platform height.Additionally, in recent years The substrate of the exposure object carrying out exposure device has more and more large-scale tendency, as it does so, platform the most day by day maximizes, therefore removes into Outside this increase, the conveyance of exposure device, workability deterioration when installing etc. are the most concerned.To this end, all expect there is a kind of energy Make the appearance of the new technique that platform diminishes.

Look-ahead technique document

Patent documentation

Patent documentation 1: No. 2010/0018950 description of U.S. Patent Application Publication No.

Summary of the invention

In order to solve the means of problem

For reducing platform, inventor has pointed out a kind of platform possessing taking the weight of canceller and is displaced into scanning friendship The exposure device (U.S. Patent Application No. 13/221568) of the platform being referred to as stepping platform in fork direction.Possesses this stepping The exposure device of platform, in order to guide the weight canceller of the substrate holding structure of supporting holding exposure object substrate from below Toward the stepping platform of the movement of scanning direction, it is to be supported in antihunting device when it is crisscross that scanning can be displaced into On pallet.Possesses the exposure device of stepping platform, owing to the stepping platform that weight own is the biggest is to be supported with substrate holding structure Scanning it is driven in crisscross under the state of part and weight canceller etc., therefore before and after driving, exposure device entirety Gravity motion is big.Therefore, it has recently been found that, use the exposure device of stepping platform, great unbalance loading weight can be applied in antihunting device, The substrate holding structure especially keeping large substrate becomes weight, therefore keeps the weight canceller of component to make by supporting substrates For stepping platform and heavily increased in the unbalance loading of pallet by stepping platform action further so that because executing during exposure actions The unbalance loading of pallet adding to be supported by antihunting device heavily causes the overall inclination slightly of exposure device, and has and cause exposure accuracy fall Low anxiety.

The present invention the 1st aspect, it is provided that the exposure device of a kind of 1st sweep type, is the relative exposure energy when exposure-processed Amount bundle makes exposure object object move with set 1st stroke in the 1st direction with plane-parallel, and it possesses: moving body, can be in 1st direction at least move with this set 1st stroke and can in this horizontal plane in 2nd direction orthogonal with the 1st direction with 2nd stroke moves；Object holder, this object can be kept, together with this moving body at least in the side with this plane-parallel To movement；Weight canceller, supports this object holder from below to offset the weight of this object holder；Supporting structure Part, extends the 1st direction, supports this weight canceller can be at the shape supporting this weight canceller from below from below Under state, move with the 2nd stroke in the 2nd direction；Supporting pallet, supports this supporting member；And load-carrying alleviator, in order to Alleviate the physical burden of the gravity direction acting on this supporting pallet.

Invent according to this, when to the exposure-processed of object, because of object holder, weight canceller and supporting member Weight own and the gravity direction (vertical direction is downward) that produces though physical burden can act on supporting pallet, but can be because of load-carrying Alleviator and alleviate.Object holder, weight canceller and supporting member and supporting pallet is comprised it is thus possible to reduce The gravity motion being and act on supporting pallet unbalance loading weight, accordingly, the highest exposure accuracy can be maintained.

The present invention the 2nd aspect, it is provided that a kind of 2nd scanning exposure apparatus, is the relative exposure energy when exposure-processed Bundle makes the object of exposure object move with set 1st stroke in the 1st direction with plane-parallel, and it possesses: the 1st moves structure Part, at least can move with this set 1st stroke in the 1st direction；2nd mobile member, guides the 1st mobile member toward the 1st The movement in direction and can be orthogonal with the 1st direction in this horizontal plane the 2nd direction together with the 1st mobile member with the 2nd row Cheng Yidong；Object holder, keep this object, can be at least in the side with this plane-parallel together with the 1st mobile member To movement；Weight canceller, supports this object holder from below to offset the weight of this object holder；Bearing support Platform, comprises the platform supporting this weight canceller from below；Linear motor, comprise be located at the Magnetitum of the 2nd mobile member with It is located at the coil of the 1st mobile member, the 1st mobile member is driven in the 1st direction with the 1st stroke；And load-carrying subtracts With light packs put, utilize the power between the part acting on this Magnetitum and this weight canceller, alleviate and act on this bearing support The physical burden of the gravity direction of platform.

Invent according to this, when to the exposure-processed of object, can together with keeping the object holder of object toward and water The 1st mobile member that the parallel direction of plane is moved, by linear motor driven in the 1st direction.Now, because of object holder And the weight of weight canceller own and though the physical burden of gravity direction that produces can act on supporting pallet, but this load-carrying is born Lotus, can pass through load-carrying alleviator, utilizes the power acted between a part for weight canceller to be alleviated.Cause This, comprise object holder, weight canceller and the gravity motion being of supporting pallet it is thus possible to reduce and act on and prop up The unbalance loading weight of bolster platform, accordingly, can maintain the highest exposure accuracy.

The present invention the 3rd aspect provides the manufacture method of a kind of flat-panel screens, comprises: use above-mentioned 1st and the 2nd exposure dress Any one in putting makes the action of base plate exposure；And make the action that the aforesaid base plate after exposure develops.

The present invention the 4th aspect provides a kind of manufacturing method, comprises: use appointing in above-mentioned 1st and the 2nd exposure device A kind of action making object expose；And make the action that the aforesaid object after exposure develops.

Accompanying drawing explanation

Fig. 1 is the figure that outline shows the composition of the exposure device of the 1st embodiment.

The top view that Fig. 2 is shown after fine motion microscope carrier is removed by the baseplate carrier being had by the exposure device of Fig. 1.

The figure of the baseplate carrier that Fig. 3 is had by the exposure device observing Fig. 1 from +X direction.

Fig. 4 is the figure of the flow direction showing the power because of the generation of baseplate carrier device weight own in a schematic way.

Fig. 5 is in the figure of the magnetic attraction of weight canceller in order to illustration.

In Fig. 6, part A is the generation dress that display in a schematic way is not provided with acting on the magnetic attraction of weight canceller The figure of the gravity motion of the baseplate carrier device put, in Fig. 6, part B is for show weight canceller effect lead in a schematic way Nogata is to the figure of the gravity motion of the baseplate carrier device of magnetic attraction upwards.

Fig. 7 is the figure of the baseplate carrier device observing the 2nd embodiment from +X direction.

Fig. 8 is the top view of the baseplate carrier device of the 3rd embodiment.

Fig. 9 is the figure of the cut-away section of the baseplate carrier device observing the 3rd embodiment from +X direction.

Figure 10 is the figure of the cut-away section of the baseplate carrier device observing the 4th embodiment from +X direction.

Figure 11 is the top view of the baseplate carrier device of the 4th embodiment.

In Figure 12, part A is to show the figure of the example being combined by the permanet magnet producing magnetic attraction with magnetic, figure In 12, part B is the figure of the example being combined with permanet magnet by the permanet magnet producing magnetic attraction.

Figure 13 is the figure of the cut-away section of the baseplate carrier device of the 1st variation observing the 4th embodiment from +X direction.

Figure 14 is the figure of the cut-away section of the baseplate carrier device of the 2nd variation observing the 4th embodiment from +X direction.

Figure 15 cuts open by the part of the baseplate carrier device that the exposure device observing the 5th embodiment from-Y direction is possessed The figure in face.

Figure 16 is the figure that the cut-away section of the baseplate carrier device of Figure 15 is observed in display from +X direction.

Figure 17 is the figure of the baseplate carrier device showing the variation observing the 5th embodiment from-Y direction.

Detailed description of the invention

" the 1st embodiment "

Hereinafter, according to part B in Fig. 1～Fig. 6, the 1st embodiment is described.

Fig. 1 schematically show the composition of the exposure device 10 of the 1st embodiment.Exposure device 10, for liquid crystal Rectangle (square) the glass substrate P (following, only substrate P) of showing device (flat-panel screens) is called the step-scan of exposure object thing The projection aligner (also known as scanner unit) of mode.

Exposure device 10, have illumination be IOP, keep the mask microscope carrier MST of mask M, projection optics system PL, a pair substrate Microscope carrier pallet 33, the baseplate carrier device PST comprising the substrate holding 31 keeping substrate P and these control system etc..With Under, mask M and substrate P during exposure are set in X-direction, horizontal plane relative to the direction that projection optics system 16 is scanned respectively and The orthogonal direction of X-axis be the Y direction direction orthogonal with X-axis and Y-axis be Z-direction, and to rotate around X-axis, Y-axis and Z axis Direction respectively θ x, θ y and θ z direction illustrate.Additionally, the position in X-axis, Y-axis and Z-direction is set to X position Put, Y location and Z location illustrate.Also, scribble photoresist (sensing agent) in substrate P surface (face of+Z side).

Illumination is IOP, and the illumination being disclosed with such as 6,552, No. 775 description of U.S. Patent No. etc. is same structure Become.That is, illumination be IOP have respectively illumination mask M on be configured to jagged multiple, such as 5 illumination regions many Individual, such as 5 illumination systems, the light that each illumination system will penetrate from not shown light source (such as finsen lamp), via not shown anti- Penetrate mirror, spectroscope (dichroic mirror), window shade, wavelength selective filters, various lens etc., as exposure illumination light (illumination light) IL is irradiated in mask M.Illumination light IL, is to use such as i line (wavelength 365nm), g line (wavelength 436nm), h line (ripple Long 405nm) etc. light (or synthesis light of above-mentioned i line, g line, h line).Also, the wavelength of illumination light IL can select filtering by wavelength Device, such as depending on required suitable being switched of resolution.

In mask microscope carrier MST, such as, mode with vac sorb and be fixed with its pattern plane (below Fig. 1) and be formed with circuit The mask M of pattern etc..Mask microscope carrier MST is to be mounted on not shown guiding element with contactless state, linear by such as comprising Mask microscope carrier drivetrain (not shown) of motor drives with predetermined stroke, and by suitable micro-move device in Y direction and θ z direction. Mask microscope carrier MST positional information (containing the rotation information in θ z direction) in X/Y plane, is by comprising fixing (or formation) Laser interferometer in the reflecting surface irradiating laser bundle (surveying long light beam) of mask M is that the mask interferometer system of diagram is surveyed Amount.This measurement result is provided to not shown main control unit.Main control unit according to mask interferometer system measure upper State measurement result, drive (position control) mask microscope carrier MST by mask microscope carrier drivetrain (not shown).Cover also, also may replace Film interferometer system or be used together encoder (or the encoder system being made up of multiple encoders with mask interferometer system System).

Projection optics system PL is arranged in the lower section in Fig. 1 of mask microscope carrier MST.Projection optics system PL has and the such as U.S. The composition that No. 6,552,775 projection optics system disclosed in description of patent is identical.That is, projection optics system PL correspondence is aforementioned Multiple illumination regions, the view field of the pattern image comprising mask M is configured to staggered multiple, such as five projection optics systems (poly-lens projection optics system), the projection optics cording of image field single with the rectangle having with Y direction as long side direction has Equal function.In this embodiment, each of multiple projection optics systems is just to use the equimultiple system of such as both sides telecentricity, formation Attention picture person.

Therefore, when to be the illumination region on the illumination light IL illumination mask M of IOP from illumination, i.e. by being configured Become illumination light IL of the 1st (object plane) mask M substantially uniform with pattern plane of projection optics system PL, by projection optics system PL, by projection image's (part erect image) of the circuit pattern of the mask M in this illumination region, is formed at and is configured in projected light Be the irradiated site (exposure area) of illumination light IL of the illumination region conjugation in the 2nd (image planes) side, the substrate P of PL.And By the synchronization driving of mask microscope carrier MST with the aftermentioned fine motion microscope carrier 30 of the part constituting baseplate carrier device PST, contrast Territory, area pellucida (illumination light IL) makes mask M be displaced into scanning direction (X-direction) and relative exposure region (illumination light IL) makes substrate P It is displaced into scanning direction (X-direction), carries out the scan exposure of an irradiation area (zoning region) in substrate P according to this, in this The pattern (mask pattern) of irradiation area transfer mask M.That is, in this embodiment, be with illumination be IOP and projection optics system PL generates the pattern of mask M in substrate P, by use illumination light IL substrate P on inductive layer (photoresist layer) exposure with This pattern is formed in substrate P.

A pair baseplate carrier pallet 33 is made up of the component extending Y direction respectively (with reference to Fig. 3, its long side direction two The antihunting device 34 that end is arranged on ground 11 supports from below.A pair baseplate carrier pallet 33 in X-direction with set Every configured in parallel.In a pair baseplate carrier pallet 33 above each, as in figure 2 it is shown, separate parallel to each other consolidating in X-direction Surely there are key element multiple (such as each base of the mechanicalness Y linear guide (single shaft guiding device) extending Y direction Onboard stand platform 33 is 3) Y linear guide 35a.

A pair baseplate carrier pallet 33 constitutes the device body (body) of exposure device 10, projection optics system PL and mask and carries Platform MST etc. is then equipped on device body.

Baseplate carrier device PST, as it is shown in figure 1, possess a pair pedestal (base frame) 14, auxiliary pedestal 15, coarse motion The Y stepping platform 90 etc. of microscope carrier 23, fine motion microscope carrier 30, weight canceller 50 and taking the weight of canceller 50 from below.

A side in a pair pedestal 14, as shown in Figures 1 and 2, is arranged in+X the side of the baseplate carrier pallet 33 of+X side, separately One side is then arranged in-X the side of the baseplate carrier pallet 33 of-X side.Owing to a pair pedestal 14 has same configuration, therefore, below Pedestal 14 only for+X side is illustrated.Pedestal 14, as it is shown in figure 1, comprise by have the one side parallel with YZ plane with separately One side extends body 14a and the multiple foots of support body portion 14a from below that the tabular component of Y direction is constituted 14b.Foot 14b in Y direction with set every, such as have 3.It is provided with multiple adjustor in the bottom of each foot 14b 14c, can adjust the Z location of body 14a.

It is respectively fixed with linear motor in the X-direction two sides (that is, above-mentioned one side and another side) of body 14a The Y stator 73 of key element.Y stator 73 has magnet unit, and this magnet unit is contained in Y direction and arranges with predetermined distance Multiple permanet magnets.Also, above body 14a, be fixed with the mechanicalness Y linear guide extending Y direction The Y linear guide 16a of the key element of (single shaft guiding device).

Auxiliary pedestal 15 configuration carries between a pair baseplate carrier pallet 33.Auxiliary pedestal 15, though its size is different, but except base Part outside the body 14a of frame 14 then equally constitutes.That is, assist pedestal 15, comprise by the tabular extending Y direction Component constitute body 15a and from below support body portion 15a and the adjustor 15b of the Z location of body 14a can be adjusted. Above the body 15a of auxiliary pedestal 15, being fixed with as pedestal 14 extends the Y linear guide 16a of Y direction. The Z location of auxiliary pedestal 15 upper end is set to above lower slightly (or roughly the same) compared with a pair baseplate carrier pallet 33.

Coarse motion microscope carrier 23, the X coarse motion microscope carrier 23x comprising Y coarse motion microscope carrier 23y with being mounted on Y coarse motion microscope carrier 23y.

Y coarse motion microscope carrier 23y is mounted on a pair pedestal 14 and auxiliary pedestal 15.Y coarse motion microscope carrier 23y, as in figure 2 it is shown, tool There is a pair X beam 25.A pair X beam 25 is made up of the component extending X-direction respectively, puts down each other with predetermined distance in Y direction Row configuration.Each of a pair X beam 25, as it is shown on figure 3, the substantially isosceles ladder being shaped as the top handstand compared with bottom side length of YZ section Shape.This is trapezoidal, in addition to upper and lower 2 limits, has what relative Z axis in YZ plane tilted with angle θ (θ is little compared with 45 degree, for example, 10 degree) On one side with the another side tilted with angle-θ relative to Z axis in YZ plane.

Below near each long side direction both ends of a pair X beam 25, it is referred to as Y bracket as in figure 2 it is shown, be fixed with (carriage) component of 75.That is, below Y coarse motion microscope carrier 23y, such as 4 Y brackets 75 of total are installed.It is arranged in+X 2 Y brackets 75 of side, are connected to each other by being fixed on each above plate 76.Same, it is arranged in 2 of-X side Y bracket 75 is connected to each other also through plate 76.Owing to each such as adding up to 4 Y brackets 75 has same configuration, below, only 1 Y bracket 75 for correspondence+X side pedestal 14 is illustrated.

Y bracket 75, as it is shown in figure 1, become by the component of XZ section reverse U shape, at a pair to inserting pedestal 14 between face Body 14a.In a pair couple of Y bracket 75 to each of face, be respectively fixed with by given clearance (clearance/gap) with A pair Y stator 73 each to a pair Y can mover 72.Each Y can mover 72, comprise not shown coil unit, with right To Y stator 73 constitute the electromagnetic force (Lorentz force) driven with predetermined stroke in Y direction by Y coarse motion microscope carrier 23y together The moving-coil type Y linear motor of type of drive.Also, the Y location information of Y coarse motion microscope carrier 23y is with not shown linear encoder system System is obtained.

In the end face of Y bracket 75, each Y bracket 75 relatively is fixed with multiple (such as 2 (with reference to Fig. 2)) and comprises rolling element (the most multiple balls etc.), be sticked in the saddle 16b of Y linear guide 16a in slidable mode.Y coarse motion microscope carrier 23y, is comprised Y Multiple Y linear guides of linear guide 16a and saddle 16b, straight are guided in Y direction.

Also, below the long side direction central part of a pair X beam 25, be fixed with multiple (such as 2) by supporting member 77 Auxiliary bracket 78.Auxiliary bracket 78 is become by rectangular-shaped component, in below, as Y bracket 75, is fixed with to slide Dynamic mode is sticked in the saddle 16b of Y linear guide 16a.Accordingly, Y coarse motion microscope carrier 23y i.e. opposing substrate microscope carrier pallet 33 is shaking Dynamic upper separation.Though additionally, be to hide in paper depth direction overlap in Fig. 1, for 1 auxiliary bracket 78, saddle 16b is In paper depth direction (Y direction) with predetermined distance, such as it is provided with 2.So, Y coarse motion microscope carrier 23y, its long side direction Central part is supported by auxiliary pedestal 15 from below by auxiliary bracket 78, and the flexure making weight own cause is suppressed.

In a pair X beam 25 above each, as shown in Figures 2 and 3, in Y direction with parallel to each other the consolidating of predetermined distance Fixed the most a plurality of (in this embodiment, for for example, 2,1 X beam 25) extends the mechanicalness single shaft guiding device of X-direction The x-ray guiding element 17a of key element.Also, 2 hypotenuses (inclined-plane) in the YZ section of a pair X beam 25, as shown in Figures 1 and 2, It is fixed with near-X the side end of X beam 25 to X stator 82 extended near+X side end.X stator 82 has Magnetitum list Unit, this magnet unit is contained in multiple permanet magnets that X-direction arranges with predetermined distance.

X coarse motion microscope carrier 23x, comprising as shown in Figure 2 links a pair X bracket 40 and a pair web of a pair X bracket 40 41.Also, owing to a pair X bracket 40 has same configuration, therefore, the X bracket 40 only for Y side is illustrated below.

X bracket 40, as shown in Figures 2 and 3, has the rectangular planar plate members of the vertical view with X-direction as long side direction 61 and in the long side direction one end of planar plate members 61 and the Y direction both ends of the surface of the other end respectively with upper surface and flat board Fixing each pair of state that the coplanar generally above of component 61 is high, add up to 4 side wall member 62.X bracket 40, sees from +X direction Examining, as it is shown on figure 3, have inverted U-shaped shape, the side wall member 62 in+Y side paired with each other Yu-Y side inserts X to each other Beam 25.Each of the side wall member 62 at the X-direction two ends of planar plate members 61, relatively+X side and-X side, outside X-direction Side slightly prominent (with reference to Fig. 2).+ Y side paired with each other and the side wall member 62 of-Y side, be respectively provided with and from upper end (+Z side) Part 1 that XZ plane near central part is parallel and near central part to lower end (-Z side) to-Y side or+Y side Tilt and with 2 inclined-planes of above-mentioned X beam 25 to part 2.Near in long side direction (X-direction) central part of X bracket 40 Side, the 1/3 the shortest scope in the X-direction length of X bracket 40 that is provided with do not exist side wall member 62 part (following, claim to lack Oral area) 42 (with reference to Fig. 2).

In X bracket 40 planar plate members 61 each below (face of-Z side), as it is shown on figure 3, each x-ray is led relatively Part 17a is fixed with multiple (such as 4 (with reference to Fig. 2)) and comprises rolling element, is sticked in Y linear guide 17a in slidable mode Saddle 17b.In this embodiment, below X coarse motion microscope carrier 23x, it is fixed with the saddle 17b such as adding up to 16.X coarse motion Microscope carrier 23x, is comprised multiple x-ray guiding devices of Y linear guide 17a and saddle 17b, straight is guided in X-direction.

Each the inner face of part 2 of 4 side wall member 62 being had in X bracket 40, is fixed with and a pair X stator 82 each by given clearance (clearance/gap) to X can mover 81.Each X can mover 81, comprise not shown line Coil unit, with to X stator 82 together with constitute the electromagnetic force driven with predetermined stroke by X coarse motion microscope carrier 23x in X-direction The moving-coil type x-ray motor of (Lorentz force) type of drive.Also, each X can comprise not shown iron core by mover 81, with to Magnetic attraction is produced between X stator 82.That is, respectively mover 81 composition can there is core coil unit.Furthermore, the X of X coarse motion microscope carrier 23x Positional information is to be obtained with not shown linear encoder system.

Each of a pair web 41, as in figure 2 it is shown, be made up of the planar plate members being located at Y direction.The link of one side Plate 41, is integrally fixed at from the Y direction of the X bracket 40 being configured at+Y side central authorities slightly by holding in the palm-Y side, to the X being configured at-Y side The Y direction central authorities of frame 40 are slightly by+Y side, by connected to each other for the+X end of a pair X bracket 40.The web 41 of the opposing party, then solid It is scheduled on from the Y direction of the X bracket 40 being configured at+Y side central authorities slightly by-Y side, to the Y-axis of the X bracket 40 being configured at-Y side Direction central authorities are slightly by+Y side, by connected to each other for the-X end of a pair X bracket 40.That is, there is a pair X bracket 40 and connect for a pair The X coarse motion microscope carrier 23x of knot tying 41, has and overlooks the summary rectangular shape having peristome in central authorities.

Additionally, although not shown, but in X coarse motion microscope carrier 23x, it is provided with that mechanically to limit aftermentioned fine motion microscope carrier 30 relative The block component of the removable amount of X coarse motion microscope carrier 23x or in X-axis and Y direction in order to measure the relative X coarse motion of fine motion microscope carrier 30 The gap sensor etc. of the amount of movement of microscope carrier 23x.

Fine motion microscope carrier 30, from Fig. 1 and Fig. 3, by overlook generally square tabular component (or box-shaped (hollow is rectangular Body) component) constitute, face adsorbs holding by substrate holding 31 in such as vac sorb (or Electrostatic Absorption) mode thereon Substrate P.

Fine motion microscope carrier 30, is comprised and contains the stator being fixed on X coarse motion microscope carrier 23x respectively and be fixed on fine motion microscope carrier 30 Can the fine motion microscope carrier drivetrain of multiple voice coil motors (or linear motor) that constitutes of mover, micro-move device on X coarse motion microscope carrier 23x 3DOF direction (X-axis, Y-axis and all directions of θ z) in X/Y plane.Multiple voice coil motors, as it is shown in figure 1, carry fine motion Platform 30 micro-move device has a pair (X voice coil loudspeaker voice coil horse of depths in paper in the X voice coil motor 18x of X-direction in Y direction is separately positioned Reach 18x not shown), as it is shown on figure 3, fine motion microscope carrier 30 micro-move device is then divided in X-direction in the Y voice coil motor 18y of Y direction Sow discord and be provided with a pair (in paper, the Y voice coil motor 18y of depths is not shown).Fine motion microscope carrier 30, uses above-mentioned X voice coil motor 18x and/or Y voice coil motor 18y and X coarse motion microscope carrier 23x is Tong Bu drives (equidirectional with X coarse motion microscope carrier 23x, with speed driving), And it is displaced into X-direction and/or Y direction with predetermined stroke together with X coarse motion microscope carrier 23x.Therefore, fine motion microscope carrier 30 can be relative Projection optics system PL (with reference to Fig. 1) in XY2 direction of principal axis with Long travel move (coarse motion) may, and can in X, the 3 of Y, θ z direction from (fine motion) is moved a little by degree direction.

Have in order to fine motion microscope carrier 30 is driven a little in the 3DOF of θ x, θ y and Z-direction also, fine motion microscope carrier drives Not shown multiple Z voice coil motors in direction.About the composition of the fine motion microscope carrier drivetrain comprising multiple voice coil motor, have revealed that In such as No. 2010/0018950 description of U.S. Patent Application Publication No..

In the side of-X side of fine motion microscope carrier 30, as it is shown in figure 1, secured by microscope base 21 have orthogonal to X-axis anti- Penetrate X moving lens (bar-shaped reflecting mirror) 22x in face.Also, the side of-Y side in fine motion microscope carrier 30, as it is shown on figure 3, pass through microscope base 28 secure the Y moving lens 22y with reflecting surface orthogonal to Y-axis.Positional information in the X/Y plane of fine motion microscope carrier 30, is logical Cross to comprise X moving lens 22x and Y moving lens 22y and irradiate the multiple laser interferometer surveying long light beam (interferometer beam) respectively Laser interferometer system (following, to claim substrate interferometer system), is detected at any time.Also, it practice, substrate interferometer system tool The X laser interferometer of standby the most corresponding multiple X moving lens 22x and the Y laser interferometer of corresponding Y moving lens 22y, but in Fig. 1 only Representational display is from the long light beam of survey of X laser interferometer.Multiple laser interferences divide and are fixed on device body.Also, it is micro- Dynamic load platform 30, in the positional information of θ x, θ y and Z-direction, is by being fixed on fine motion microscope carrier 30 sensor 26 (reference below Fig. 3), the most aftermentioned subject matter 27 being fixed on weight canceller 50 is used to be obtained.About above-mentioned fine motion microscope carrier 30 The composition of position measurement system, has revealed that in such as No. 2010/0018950 description of U.S. Patent Application Publication No..

Weight canceller 50, as it is shown on figure 3, be made up of the cylindrical component being located at Z-direction, also known as stem.Weight Amount canceller 50 inserts in the peristome of X coarse motion microscope carrier 23x, is mounted on aftermentioned Y stepping platform 90.Weight canceller 50 Fine motion microscope carrier 30 is supported from below by aftermentioned levelling device 70.

Weight canceller 50 has basket 51, air spring 52 and Z saddle 53, a pair arm 54 etc..

Basket 51 is made up of the component overlooking rectangle, is formed with the circular open portion (ginseng of the face opening of+Z side in central part According to Fig. 2).It is mounted below the bearing surface multiple air bearing (following, claim base wad) 55 towards-Z side in basket 51.

Air spring 52 is housed in the peristome of basket 51.In air spring 52 from outside supply of pressurized gas body.

Z saddle 53 is made up of the cylindrical member extending Z-direction, inserts in the peristome of basket 51, is mounted in air On spring 52.

Each of a pair arm 54, is made up of the rod member extending Y direction.A pair arm 54 is arranged in+Y side Arm 54, its one end is fixed on the side ,+Y side of basket 51, the other end then inserts in the notch part 42 that X bracket 40 is had. Same, it being arranged in the arm 54 of-Y side, its one end is fixed on the side ,-Y side of basket 51, the other end then inserts X bracket 40 In the notch part 42 being had.Each the other end of a pair arm 54, has in the inclined-plane being respectively provided with a pair X beam 25, shape Become the inclined-plane inside Y direction parallel to inclined-plane.Also, in each the inclined-plane of the other end of a pair arm 54, be fixed with In a pair X stator 82 being respectively provided with a pair X beam 25, it is arranged in the X stator 82 inside Y direction and passes through given clearance (clearance/gap) to X can mover 56.Each X can mover 56, comprise not shown coil unit, with to X fix Son 82 constitutes the x-ray motor driven with predetermined stroke in X-direction by weight canceller 50 together.Also, each X can mover 56, comprise not shown iron core, to X stator 82 between produce magnetic attraction.

Leveling (leveling) device 70 is carried in the top of weight canceller 50.Levelling device 70, is installed in Z sliding + Z the side end of part 53, bearing surface prop up the most in a non contact fashion towards the air bearing (following, to claim sealing gasket) 57 of+Z side Hold.Levelling device 70 be fine motion microscope carrier 30 is supported for fascinate (tilt) freely (relative X/Y plane swing in θ x and θ y direction from As) device.Weight canceller 50, the vertical direction produced by air spring 52 power upwards, by Z saddle 53 and adjust Leveling device 70 offsets the weight (power of gravity direction) being comprising fine motion microscope carrier 30, and tool is to reduce above-mentioned multiple Z voice coil motors Load.

Weight canceller 50, as in figure 2 it is shown, be to be referred to as bending device bar hookup mechanism by a plurality of (such as 4) 45 (following, suitably to claim bending device 45) are mechanical is connected to X coarse motion microscope carrier 23x (X bracket 40).Bending device 45, bag Containing such as with the banding steel plate (or cable wire, synthetic resin rope making, refining etc.) of the minimal thickness of X/Y plane configured in parallel and be located at this steel The articulated mounting (such as spherojoint or hinge practice device) at plate both ends, above-mentioned steel plate is erected at weight by articulated mounting and offsets Between device 50 and X bracket 40.The Z location of multiple bending devices 45, with weight canceller 50 in the position of centre of gravity of Z-direction Substantially uniform.Bending device 45, its one end is fixed on the corner (under vertical view, the summit of basket 51) of basket 51, and the other end is then solid Side wall member 62 due to X bracket 40.That is, weight canceller 50, by any one of multiple bending devices 45 by X coarse motion Microscope carrier 23x draws, and with this X coarse motion microscope carrier 23x one be displaced into X-direction or Y direction.Now, dress is offset in weight Put 50, comprising its effect having pull strength in the plane parallel with X/Y plane of Z-direction position of centre of gravity, thus around with Moment tool (pitching moment) of the axis that moving direction is orthogonal will not act on.Additionally, comprise levelling device 70, bending device 45, About the detailed composition of the weight canceller 50 of this embodiment, to be disclosed in such as U.S. Patent Application Publication No. 2010/ No. 0018950 description.

Y stepping platform 90, complex chart 1 to Fig. 3 understands, is made up of the component of the YZ section rectangle extending X-direction, in Under vertical view, with and each of a pair X beam 25 be arranged between a pair X beam 25 at a distance of the state (contactless state) of the most both set a distances.Y The long side direction size of stepping platform 90, is set to slightly longer some in the shift motion of X-direction compared with fine motion microscope carrier 30.Also, Y Width (Y direction) size of stepping platform 90, setting can the width of base wad 55 that is had of taking the weight of canceller 50 Degree.The stone material that material is cast iron or densification (gabbro) of Y stepping platform 90, pottery, CFRP material etc., the flatness quilt above it It is processed as the highest.

Below Y stepping platform 90, each Y linear guide 35a relatively is fixed with multiple (such as 2 (with reference to Fig. 2)) Comprise rolling element (such as, multiple balls etc.), be sticked in the saddle 35b of multiple Y linear guide 35a in slidable mode.Y stepping Platform 90, is comprised multiple Y linear guides 35 of Y linear guide 35a and Y saddle 35b, in a pair baseplate carrier pallet 33 On be guided in Y direction so that predetermined stroke is straight.

Y stepping platform 90, as in figure 2 it is shown, by be connected to be fixed on+X side and-X side end face fixing component 46 each A pair bending device 43, mechanical be linked to each pair Y bracket 75.Bending device 43 and above-mentioned bending device 45 have greatly Cause identical composition.So, Y stepping platform 90, when the Y bracket 75 at the side of Y direction or opposite side is driven in Y direction Time, i.e. drawn by this Y bracket 75 and one past Y direction move.Bending device 43, its long side direction (is Y-axis side herein To) the rigidity in rigidity relatively other 5DOF directions (being herein X, Z, θ x, θ y, θ z direction) low, in above-mentioned 5DOF direction, Y stepping platform 90 separates in vibration with Y coarse motion microscope carrier 23y.

The exposure device 10 constituted in the above described manner, under the management of not shown main control unit, covers with not shown Film carrying device (mask loader) carries out mask M and toward the loading on mask microscope carrier MST and moves into dress by not shown substrate Put and carry out substrate P toward moving into (loading) on baseplate carrier device PST.Afterwards, main control unit not shown alignment is used Detection system implements locating tab assembly, after locating tab assembly is terminated by this, carries out the exposure actions of step-scan (step) mode. Owing to this exposure actions is identical with the exposure actions of existing step-scan mode, therefore description is omitted.

Herein, the exposure actions of above-mentioned step-scan mode, is sequentially to carry out the multiple irradiation areas being set in substrate P Exposure-processed.Substrate P, is to be driven (following, claim X scanning motion) with predetermined stroke by constant speed in X-direction when scanning motion, It is then suitable to be driven in X-direction and/or Y direction is (following, respectively (when moving between irradiation area) when stepwise operation Claim X stepwise operation, Y stepwise operation).

In above-mentioned X scanning motion and when X stepwise operation makes substrate P be displaced into X-direction, in baseplate carrier device PST, is that X coarse motion microscope carrier 23x is driven in X-direction on Y coarse motion microscope carrier 23y by the measured value according to encoder system, and root Drive Tong Bu with X coarse motion microscope carrier 23x for fine motion microscope carrier 30 with multiple X voice coil motor 18x according to the measured value of substrate interferometer system. Also, when X coarse motion microscope carrier 23x moves toward X-direction, because being drawn by this X coarse motion microscope carrier 23x, weight canceller 50 is i.e. thick with X Dynamic load platform 23x moves toward X-direction together.Now, weight canceller 50, be by can mover 56 by X by main control unit The linear motor constituted with X stator 82, is Tong Bu driven in X-direction with X coarse motion microscope carrier 23x.Now, weight canceller 50 is to move on Y stepping platform 90.Also, when above-mentioned X scanning motion and X stepwise operation, though fine motion microscope carrier 30 has relative X coarse motion Microscope carrier 23x is driven a little in Y direction and/or the situation in θ z direction, but owing to the Y location of weight canceller 50 will not Change, therefore weight canceller 50 perseverance only moves on Y stepping platform 90.

In contrast, during above-mentioned Y stepwise operation, in baseplate carrier device PST, Y coarse motion microscope carrier 23y on a pair pedestal 14 Being driven in Y direction with predetermined stroke, with this Y coarse motion microscope carrier 23y one, X coarse motion microscope carrier 23x is displaced into predetermined stroke Y direction.Also, weight canceller 50 and X coarse motion microscope carrier 23x one be displaced into Y direction with predetermined stroke.Now, from The Y stepping platform 90 of lower section taking the weight of canceller 50, is driven by Tong Bu with Y coarse motion microscope carrier 23y.Therefore, weight offsets dress Put 50 perseverances to be supported from below by Y stepping platform 90.

Secondly, the assembling sequence of baseplate carrier device PST is described.In this 1st embodiment, baseplate carrier device PST, first First on the ground 11 of dust free room, with the configuration shown in Fig. 2 be respectively provided with a pair baseplate carrier pallet 33, a pair pedestal 14 and Auxiliary pedestal 15.Afterwards, by Y linear guide 16, Y bracket 75 is equipped on a pair pedestal 14 respectively, by auxiliary bracket 78 It is equipped on auxiliary pedestal 15, and carries Y stepping platform by multiple Y linear guides 35 on a pair baseplate carrier pallet 33 90.Also, also Y bracket 75 can be assembled in other places a pair pedestal 14 in advance, auxiliary bracket 78 is assembled in auxiliary pedestal 15。

Then, on Y stepping platform 90, weight canceller 50 is carried, additionally, take on Y bracket 75 and auxiliary bracket 78 Carry a pair X beam 25.Afterwards, with X stator 82 be fixed on the arm 54 that weight canceller 50 is had X can mover 56 right To mode carry X bracket 40.Also, also X bracket 40 can be respectively mounted in other places in a pair X beam in advance.Afterwards, one is adjusted To the position (Y direction interval) of X beam 25 so that X stator 82 be fixed on arm 54 that weight canceller 50 had X can mover 56 predetermined distance to, also can pass through a pair web 76 and 77 fixed position.

Afterwards, fine motion microscope carrier 30 (containing levelling device 70) is loaded on weight canceller 50, and by multiple voice coil loudspeaker voice coil horses The stator reached with can be combined by mover.Then, air spring 52, base wad 55 and the sealing gasket to weight canceller 50 57 and the not shown air bearing supply of pressurized gas body that had of levelling device 70, fine motion microscope carrier 30 is i.e. offset by weight Device 50 supports in a non contact fashion.

Secondly, illustrate to put on the flow direction of the power of baseplate carrier device PST.Also, following description put on baseplate carrier The power of device PST, no matter fine motion microscope carrier 30 static in or action in, all can produce.

When baseplate carrier device PST is assembled complete time, substrate P, substrate holding 31 and fine motion microscope carrier 30 (fill containing leveling Put 70) etc. (following, claim fine motion microscope carrier 30 etc.) because of the downward power of the Z-direction of weight own, the most as shown in Figure 4, with following stream To reaching on ground 11.Although also, the baseplate carrier device PST in Fig. 4 be in a schematic way display and with shown in Fig. 1～3 Shape is slightly different, but for the composition part the most corresponding with composition part shown in Fig. 1～Fig. 3, is to use to give same-sign.

As shown in Figure 4, the weight of fine motion microscope carrier 30 grade own is by 90, Y stepping platform by weight canceller 50 Hold.Herein, as it is shown in figure 5, in a pair arm 54 that weight canceller 50 is had, be arranged on the arm 54 of+Y side, meeting Act on comprise be fixed on arm 54 other end X unshakable in one's determination can mover 56 be arranged on X beam 25 inclined-plane X stator 82 it Between in YZ plane relative to the magnetic attraction F in Y-axis cant angle theta direction.Same, in being arranged on the arm 54 of-Y side, YZ can be acted on and put down Face tilts the magnetic attraction F in-θ direction relative to Y-axis.Each magnetic attraction F, is decomposed into the component F of vertical direction (Z-direction)₁, and The component F of horizontal direction (Y direction)₂.Herein, due to the component F of horizontal direction₂Can be toward the direction effect cancelled each other out, therefore Only can act on plus vertical direction component F in weight canceller 50₁Power (that is 2F₁).Therefore, as shown in Figure 4, fine motion carries The weight of platform 30 grade own, one part is by the component F of vertical direction₁(2F₁) offset, remaining power reaches Y stepping platform 90. Reach the power of Y stepping platform 90, reach ground 11 via baseplate carrier pallet 33 and antihunting device 34.On the other hand, in X beam 25 Then can apply the component F of vertical direction₁Counter-force, weight own and vertical direction component F₁Counter-force via pedestal 14 and auxiliary Pedestal 15 (with reference to Fig. 1) reaches ground 11.

As described above, according to the exposure device 10 of this embodiment, as shown in part B in part A, Fig. 6 in Fig. 6, And the baseplate carrier device PSTa (part A in Fig. 6) that will not produce magnetic attraction between weight canceller 50 and X beam 25 compares, The baseplate carrier device PST (part B in Fig. 6) of this embodiment, can be by fine motion microscope carrier 30 and weight due to the effect of magnetic attraction Amount canceller 50 is considered as the thing of the light weights such as such as hollow member, therefore can shorten baseplate carrier device PST and be driven in scanning Gravity motion distance L time crisscross.That is, baseplate carrier device PST, due to can reduce be driven in scanning crisscross Time the load-carrying change born of antihunting device 34, therefore can reduce the deformation of exposure device 10, promote exposure accuracy.

Also, the power that vertical direction owing to will produce because of fine motion microscope carrier 30 grade and the weight of weight canceller 50 own is downward A part reach X beam 25, therefore Y stepping platform 90 can reduce and acts on the power that vertical direction itself is downward.Thus, supporting The base wad 55 of weight canceller 50, can use the small-sized base wad that load capacity is little.That is, Y stepping platform 90 can reduce supporting The guide surface (Y direction size) of base wad 55.

Also, Y stepping platform 90, due to the load of energy minimizing itself, the rigidity of Y stepping platform 90 therefore can be reduced.Thus, Y stepping platform 90 can reduce thickness etc. and miniaturization further.

Additionally, baseplate carrier device PST, due to Y stepping platform 90 Miniaturizable, therefore can reduce and make Y stepping platform 90 In the driving force that Y direction stepping is moved.

Secondly, other embodiments of exposure device are described.In each embodiment that the 2nd following embodiment is later, Owing to the part beyond baseplate carrier device is identical with the exposure device 10 of aforementioned 1st embodiment, therefore, below only for base Onboard table apparatus is illustrated.

" the 2nd embodiment "

Then, according to Fig. 7, the 2nd embodiment is described.Herein, identical or equal with aforementioned 1st embodiment constituting portion Point, be use same or like symbol and simplification or the description thereof will be omitted.

The baseplate carrier device PST1 of this 2nd embodiment, though it is monolithically fabricated and aforesaid base plate bearing table device PST phase With, but replace X beam 25 and a shape part for the point of X beam 125 and the shape of X bracket 140 and X bracket 40 is set not on an equal basis, Part constitutes different with baseplate carrier device PST.Hereinafter, illustrate centered by both dissimilaritys.

As it is shown in fig. 7, a pair X beam 125 that baseplate carrier device PST1 possesses, it is respectively provided with and in YZ section, rectangle (is contained Rhombus and square) 4 summits excise the shape of (chamfering) respectively, that is there is octagonal shape.The X beam of one side (+Y side) 125, it is fixed on the Y bracket of a side with the state relative to Y-axis inclination angle phi (such as 45 degree) in θ x direction by installation component 124 Above 75.The X beam 125 of the opposing party (-Y side), symmetrical with the X beam 125 of a side, that is to incline relative to Y-axis in θ x direction The state of oblique angle-φ is fixed on above the Y bracket 75 of the opposing party by installation component 124.A pair X beam 125 is respectively provided with 4 Inclined-plane (face that relative X/Y plane tilts).

In 4 inclined-planes of the X beam 125 of Yu Yifang, it is not fixed to a pair inclined-plane opposite to one another of installation component 124, also I.e. in the 1st inclined-plane and-Y side and the 2nd inclined-plane of-Z side of+Y side and+Z side, in the substantially total length of long side direction (X-direction) Extended have each of a pair X stator 82.Also, the X beam 125 of Yu Yifang is contrary with the 3rd inclined-plane being fixed on installation component 124 4th inclined-plane of side (that is-Y side and the inclined-plane of+Z side), in the direction parallel with this inclined-plane with predetermined distance, parallel to each other It is fixed with a plurality of (such as 2) and extends the x-ray guiding element 17a of X-direction.

In the X beam 125 of the opposing party, be symmetrical configuration with the X beam with one side, be provided with a pair X stator 82, A plurality of x-ray guiding element 17a.

A pair X bracket 140, respectively by the 2 pairs of side of sidewall portion having top and be respectively provided at both ends, top longitudinal edge direction The component composition that YZ section is inverted U-shaped.The X bracket 140 of one side (+Y side), is in θ x direction phase with side-looking (observing from +X direction) The state that Y-axis tilts φ is oppositely disposed with the 1st of X beam 125 the, the 2nd and the 4th inclined-plane.Also, the X bracket 140 of this side, in this Side of sidewall portion (with the 1st and the 2nd inclined-plane of X beam 125 respectively to part) X-direction central part near, with aforementioned X bracket 40 Same is formed with notch part 42 (with reference to Fig. 2), and the notch part 42 in this side is inserted into arm 54.

The pair of sidewalls portion inner face of the X bracket 140 of Yu Yifang, is respectively fixed with by given clearance (clearance/ Gap) be fixed on the 1st of aforementioned X beam 125 the, the 2nd inclined-plane each a pair X stator 82 to a pair X can mover 81.Also, In the top underside of X bracket 140, each x-ray guiding element 17a relatively is fixed with multiple (such as 4) and comprises rolling element, sliding Dynamic mode is sticked in the saddle 17b of Y linear guide 17a.

The X bracket 140 of the opposing party (-Y side), is symmetrical with the X bracket 140 of a side, has identical composition, the most equally Being provided with a pair X can mover 81 and multiple saddle 17b.

X stator opposite to one another 82 and X can mover 81, respectively constitute the moving-coil of electromagnetic force (Lorentz force) type of drive Type x-ray motor.Though X coarse motion microscope carrier 123x is driven in X-direction by these x-ray motors, in now, comprised x-ray and led Multiple x-ray guiding devices of part 17a and saddle 17b are straight is guided in X-direction.

In this embodiment, no matter in the driving of X coarse motion microscope carrier 123x or in stopping, at the X beam 125 of a side (+Y side) Between the X bracket 140 i.e. engaged with this, can be fixed on X beam 125 the 1st inclined-plane X stator 82 i.e. with this to X can Between mover 81 produce magnetic attraction Fb, be fixed on X beam 125 the 2nd inclined-plane X stator 82 i.e. with this to X can mover Also magnetic attraction Fb can be produced between 81.2 magnetic attraction Fb, it is equal in magnitude and direction is the most right.Certainly, 2 magnetic attraction Fb, it is each Individual vertical component F₃And horizontal component F₄The most equal.Therefore, between X the beam 125 and X bracket 140 of a side (+Y side), the most whole For body, relative X beam 125 will not produce X bracket 140 and be driven in the power of Z axis and Y direction.Same, at the opposing party (-Y Side) X beam 125 and X bracket 140 between, as a complete unit, also will not produce the relative X beam 125 of X bracket 140 and be driven in Z axis And the power of Y direction.That is, the X towards oblique upper of a pair arm 54 front end of weight canceller 50 can be remained mounted on Can given clearance (clearance/ between mover 56 (having core coil unit (with reference to Fig. 5)) and X stator 82 (magnet unit) gap)。

As described above, according to the baseplate carrier device PST1 of this 2nd embodiment, can obtain and the 1st embodiment Effect equal for baseplate carrier device PST.In addition, according to baseplate carrier device PST1, owing to acting on a pair X beam Magnetic attraction Fb between 125 and a pair X bracket 140 can be cancelled, and therefore can prevent from executing a pair X bracket 140 (X saddle 17b) Add vertical power upwards.Therefore, by by the declination angle (-φ) of a pair X beam 125 with and X beam 125 to the inclining of arm 54 Angle φ is set as first retainer arbitrarily, can set work arbitrarily when preventing when floating of a pair X bracket 140 For the power that the vertical direction of base wad 55 and Y stepping platform 90 is downward.So, the further miniaturization of base wad 55 and Y step can be made Enter the further miniaturization of platform 90.

" the 3rd embodiment "

Secondly, for the 3rd embodiment, according to Fig. 8 and Fig. 9 in addition.Herein, identical with aforementioned 2nd embodiment or same Deng composition part, be use same or like symbol and simplification or the description thereof will be omitted.

The baseplate carrier device PST2 of this 3rd embodiment, carries though being integrally formed the substrate with aforementioned 2nd embodiment Table apparatus PST1 is identical, but arranges X bracket 240 and weight canceller 250 at replacement X bracket 140 and weight canceller 50 Point etc., part constitute different with baseplate carrier device PST1.Hereinafter, illustrate centered by dissimilarity.

Each of a pair X bracket 240, as shown in Figure 8, has the tabular top 63 being located at X-direction and is located at top The pair of sidewalls portion 64 of the long side direction pars intermedia in portion 63, the shape (with reference to Fig. 9) that side-looking (observing from +X direction) is inverted U-shaped. Also, in Fig. 8, an X bracket 240 is simplified display.Additionally, as it is shown in figure 9, the X bracket 240 of a side (+Y side), be with side-looking (observing from +X direction) is oppositely disposed with the 1st of X beam 125 the, the 2nd and the 4th inclined-plane relative to the state that Y-axis tilts φ in θ x direction. The X bracket 240 of one side, from comparison diagram 2 and Fig. 8, compares with aforementioned X bracket 40,140, and the size of X-direction is little, in X-axis Breach is not formed near the central part of direction.

As it is shown in figure 9, pair of sidewalls portion 64 inner face of the X bracket 240 of Yu Yifang, it is respectively fixed with and passes through given clearance (clearance/gap) be fixed on the 1st of aforementioned X beam 125 the, the 2nd inclined-plane each a pair X stator 82 to a pair X Can mover 81.Also, in top 63 inner face of X bracket 240, each x-ray guiding element 17a relatively is fixed with multiple (such as 4) bag Containing rolling element, the saddle 17b that is sticked in Y linear guide 17a in slidable mode.

The X bracket 240 of the opposing party (-Y side) is symmetrical with the X bracket 240 of a side, has and equally constitutes, the most equally Being provided with a pair X can mover 81 and multiple saddle 17b.

X stator opposite to one another 82 and X can mover 81, respectively constitute the moving-coil of electromagnetic force (Lorentz force) type of drive Type x-ray motor.Though X coarse motion microscope carrier 223x is driven in X-direction by these x-ray motors, in now, comprised x-ray and led Multiple x-ray guiding devices of part 17a and saddle 17b are straight is guided in X-direction.

Return to Fig. 8, weight canceller 250, be fixed with a pair X arm 254 in the Y direction two sides of basket 51.One To X arm 254, being made up of the rod member being located at X-direction respectively, its X-direction length is had compared with X bracket 240 The X-direction length in the inverted U-shaped portion of section is slightly longer some.Each of a pair X arm 254, in the X-axis side of Y direction lateral surface To middle position, it is connected to the side of sidewall portion 64 of X bracket 240 by bending device 45.The height of bending device 45 is offset with weight The Z-direction position of centre of gravity of device 250 is substantially uniform.Each of a pair X arm 254, its long side direction both ends are linked to one To Y arm 255.Each of a pair Y arm 255, is made up of the rod member being located at Y direction, Y direction length with a pair X bracket 240 interval to each other is substantially with long.Additionally, each of a pair Y arm 255, in the Y direction of X-direction lateral surface Middle position, is connected to web 41 by bending device 45.In the long side direction both ends of the surface of a pair Y arm 255, it is fixed with logical Cross in a pair X stator 82 that given clearance (clearance/gap) and a pair X beam 125 are respectively provided with, be arranged in Y direction Inner side X stator 82 to X can mover 56.Each X can mover 56, comprising not shown has core coil unit, with to X Stator 82 (magnet unit) constitutes together weight canceller 250 drives the moving-coil Linear motor in X-direction.

As described above, according to the baseplate carrier device PST2 of this 3rd embodiment, can obtain and the 2nd embodiment Effect equal for baseplate carrier device PST1.In addition, according to baseplate carrier device PST2, due at a pair Y arm 255 Two ends can act on magnetic attraction, therefore can strengthen the power acting on the vertical direction of weight canceller 250 upwards.Also, weight is supported Disappear device 250, owing to being at 2 near the long side direction central authorities of the Y arm 255 of magnetic attraction effect, is supported by X arm 254 (fixing), the flexure of the Y arm 255 when therefore can prevent magnetic attraction from acting on Y arm 255 two ends, perseverance makes weight canceller 250 produce certain magnetic attraction.

" the 4th embodiment "

Secondly, for the 4th embodiment, it is illustrated according to Figure 10～Figure 12.Herein, with aforementioned 1st embodiment phase With or equal composition part, be to use same or like symbol simplification or the description thereof will be omitted.

The baseplate carrier device PST3 of this 4th embodiment, though it is monolithically fabricated and aforesaid base plate bearing table device PST phase With, but offset dress in shape and aforementioned X beam 25, X bracket 40 and the weight of X beam 325, X bracket 340 and weight canceller 350 Put the point etc. that 50 parts are different, different with baseplate carrier device PST.Hereinafter, illustrate centered by dissimilarity.

As shown in Figures 10 and 11, a pair X beam 325 is made up of the rod member being located at X-direction.A pair X beam 325 Each, its YZ section shape is different from X beam 25.That is, each of a pair X beam 325, it is that the profile of YZ section is rectangle, has Be arranged on Y direction central authorities extends the hollow that the X-direction ribs regions parallel with XZ plane is divided into the hollow bulb of 2 parts Component.Each of a pair X beam 325, is fixed with the X stator 82 extending X-direction in Y direction two sides, solid in above Surely a plurality of (such as 2) are had to extend the x-ray guiding element 17a of X-direction in Y direction with predetermined distance.

Each of a pair X bracket 340, as shown in figure 11, has and is located at the planar plate members 65 of X-direction and at flat board The upper surface with each, the Y direction two sides of 65 long side direction pars intermedias of component and the coplanar generally above of planar plate members 65 The side wall member 66 parallel with a pair Z axis that high state is fixing.That is, a pair X bracket 340, it is respectively provided with X-direction central authorities Portion, in the shape that YZ section is section reverse U shape, is configured to each (with reference to Figure 10) across a pair X beam 325.

The X bracket 340 of one side (+Y side), as shown in Figure 10, below planar plate members 65, (end face) the most each x-ray is led Part 17a is fixed with multiple (such as 4) and is slidably sticked in the saddle 17b of x-ray guiding element 17a, additionally, in a pair Each inner face of side wall member 66, be respectively fixed with by given clearance (clearance/gap) and a pair X stator 82 is each Individual to X can mover 81.The X bracket 340 of the opposing party (-Y side), is that the X bracket 340 with a side equally constitutes.

A pair X bracket 340, as shown in figure 11, by by the pair of sidewalls being respectively provided with component 66, be arranged in Y-axis side The web 341 connected to each other to the side wall member 66 of inner side links.Web 341, is opened by being centrally formed circle under overlooking The planar plate members of oral area 342 is constituted, and has certain length (such as, of approximately equal length with side wall member 66) in X-direction.Even Below knot tying 341, the many places (at the 4 of such as 90 degree intervals) around peristome 342 are fixed with permanet magnet 343 (reference Figure 10).Permanet magnet 343, its material spy limits, is to use such as ferromagnet Magnetitum (Ferrite magnet), neodymium magnetic Stone (Neodymium magnet) and aluminium-nickel-cobalt magnetic stone etc. are formed.

Returning to Figure 10, weight canceller 350 is that insertion peristome 342 is interior from below, be supported in Y step by base wad 55 Enter on platform 90.Weight canceller 350, at shape and the link position etc. of bending device 45 of basket 351, with aforementioned weight Canceller 50 is different.

Basket 351 is made up of upper opening of bottomed cylindrical component.Basket 351, has the circular blade of a sword in bottom surface periphery Portion 352.Blade of a sword portion 352, in edge, periphery above by be fixed on the permanet magnet 343 of web 341 to in the way of, magnetic Body 353 configures with predetermined distance (first retainer interval).Weight canceller 350, is being taken with contactless state by base wad 55 When being loaded on Y stepping platform 90, it is configured to permanet magnet 343 right by given clearance (clearance/gap) with magnetic 353 To.Magnetic 353 is constituted by having certain thickness block member, though material is not particularly limited, uses such as ferrum oxide, oxidation Chromium, cobalt or ferrite etc. are formed.

Bending device 45, its one end fixes multiple (example with predetermined distance (first retainer interval) at the outer peripheral face of basket 351 Such as 4), the other end is then fixed on the peristome inner peripheral surface (with reference to Figure 11) being formed at web 341.

As being fixed on the permanet magnet 343 of many places below web 341, single permanet magnet can be used respectively, but It is not limited to this, multiple Magnetitum also be can be combined and used.

For as an example, can be as shown in part A in Figure 12, below the yoke 344 being embedded in below web 341, will Different a pair permanet magnet 343a, 343b predetermined distance of polarity is fixed, and constitutes a permanet magnet 343 according to this. In Figure 12 in the example of part A, be arranged in the permanet magnet 343a of-Y side, its+Z side be S pole ,-Z side be N pole, the opposing party Face, is arranged in the permanet magnet 343b of+Y side, its+Z side be N pole ,-Z side be S pole.A pair permanet magnet 343a, Between 343b and magnetic 353, produce magnetic attraction Fc.Also, as shown in part B in Figure 12, also may replace magnetic 353 will be permanent Magnetitum 345 be configured to permanet magnet 343 to.Now, permanet magnet 345 be configured to its with permanet magnet 343a to one Side be S pole and permanet magnet 343b to opposite side be N pole.

As described above, according to the baseplate carrier device PST3 of this 4th embodiment, can obtain and the 1st embodiment Effect equal for baseplate carrier device PST.In addition, according to baseplate carrier device PST3, X bracket is made owing to producing 340 power floated, therefore can prevent floating of X bracket 340.Accordingly, in baseplate carrier device PST3, can be by permanet magnet The magnetic attraction Fc produced between 343 and magnetic 353 is adjusted to arbitrary size, its result, can alleviate applying freely to Y stepping Platform 90 and the load-carrying of antihunting device 34.

" the 1st variation of the 4th embodiment "

Secondly, for the 1st variation of the 4th embodiment, it is illustrated according to Figure 13.Herein, shape is implemented with the aforementioned 4th The composition part that state is identical or equal, uses same or like symbol simplification or the description thereof will be omitted.

The baseplate carrier device PST3a of this variation, is being had weight canceller 350 in baseplate carrier device PST3 Point that the position of some blade of a sword portion 352 and web 341 is exchanged, with this with bending device 45 by blade of a sword portion 352 and X bracket 340 A part for the weight of the point linked and the fine motion microscope carrier 30 etc. that will act on Y stepping platform 90 is with permanet magnet 343 And the point that the magnetic counteracting force Fd between permanet magnet 346 is alleviated, different with aforesaid base plate bearing table device PST3.

As shown in figure 13, the weight canceller 350a of this variation, the position in the middle of the Z-direction of basket 351a, Specifically, it is provided with blade of a sword portion 352 at the height and position substantially uniform with the position of centre of gravity of weight canceller 350a.In portion 352 edges, periphery below are fixed with permanet magnet 343.Additionally, in the outer peripheral face in blade of a sword portion 352, with predetermined distance (first retainer Interval) connect the one end having multiple (such as 4) bending device 45.The other end of bending device 45, is connected to X bracket 340 In side wall member 66, it is arranged in the side wall member 66 inside Y direction.

Link the web 341 of a pair X bracket 340, be fixed in each side wall member 66 of a pair X bracket 340, configuration The bottom of the side wall member 66 inside Y direction.Also, around peristome above web 341, with each permanent magnetic Stone 343 to position, be respectively fixed with the permanet magnet 346 that permanet magnet 343 is produced retroaction magnetic force.

As described above, according to the baseplate carrier device PST3a of this 1st variation, decapacitation obtains and the 4th embodiment Effect equal for baseplate carrier device PST3 outside, due to the blade of a sword portion 352 being fixed with permanet magnet 343 is fixed on weight offset Near the Z-direction centre position of device 350a, the web 341 being fixed with permanet magnet 346 is fixed on X bracket 340 Bottom, therefore the Z location of X beam 325 is disposed at the some lower sections of Z location compared with weight canceller 350a.Accordingly, substrate Bearing table device PST3a, can promote toward scanning direction and scan crisscross movable time stability.

" the 2nd variation of the 4th embodiment "

Secondly, for the 2nd variation of the 4th embodiment, it is illustrated according to Figure 14.Herein, shape is implemented with the aforementioned 4th The composition part that state is identical or equal, uses same or like symbol simplification or the description thereof will be omitted.

In the baseplate carrier device PST3b of this variation, the shape of X beam 325b and the shape of X bracket 340b, with aforementioned base The shape of the X beam 325 of onboard table apparatus PST3 and the shape of X bracket 340 are different.

A pair X beam 325b, is made up of the rod member extending X-direction respectively, the relatively end, the thin top of shape of YZ section The substantially isosceles trapezoid of the handstand that limit is the most some.That is, a pair X beam, be respectively provided with parallel with X/Y plane above and following and A pair inclined-plane (Y direction two sides) that XZ plane tilts with set angle θ ,-θ in θ x direction relatively.X-ray guiding element 17a and X Stator 82, as X beam 325, is separately fixed at the above of X beam 325b and a pair inclined-plane (Y direction two sides).

A pair X bracket 340b, had a pair of the shape of the pair of sidewalls component 68 each being had and X bracket 340 Side wall member 66 is different.That is ,+Y side paired with each other and the side wall member 68 of-Y side, it is respectively provided with from upper end (+Z side) Part 1 parallel with XZ plane near central part, with near central part to lower end (-Z side) favour-Y side or+ Y side and with 2 inclined-planes of above-mentioned X beam 325b to part 2.End face (planar plate members 65 times in a pair X bracket 340b Face), it is fixed with the saddle 17b being slidably sticked in x-ray guiding element 17a, additionally, in side wall member 68 internal face Part 2, is fixed with by given clearance (clearance/gap) and X stator 82 movable to, the X that produces magnetic attraction Fe Son 81.The magnetic attraction Fe of effect between the X beam 325b and X bracket 340b of a side, the component of horizontal direction is cancelled, equally , the magnetic attraction Fe of effect between the X beam 325b and X bracket 340b of the opposing party, the component of horizontal direction is also cancelled.That is, Act on the magnetic attraction Fe of X bracket 340b, only X bracket 340b is applied vertical direction component upwards.

As described above, according to the baseplate carrier device PST3b of this variation, decapacitation obtains and the 4th embodiment Outside the effect that baseplate carrier device PST3 is equal, alleviate owing to applying to the power that the vertical direction of X bracket 340b is downward to obtain, because of This is when baseplate carrier device PST3b is driven in X-direction, can alleviate and produce between X saddle 17b and x-ray guiding element 17a Driving opposing.Additionally, due to producing in order to the magnetic alleviating the downward power of the vertical direction acting on above-mentioned X bracket 340b The X of power Fe can separately be provided with generation in order to alleviate the weight acting on baseplate carrier pallet 33 outside mover 81, X stator 82 The permanet magnet 343 of magnetic attraction Fc of a part of weight, the magnetics 353 such as canceller 350, therefore can be respectively set as producing Raw set magnetic attraction.

" the 5th embodiment "

Secondly, for the 5th embodiment, it is illustrated according to Figure 15 and Figure 16.Herein, with aforementioned 1st embodiment phase Same or equal composition part, uses same or like symbol simplification or the description thereof will be omitted.

The baseplate carrier device PST4 of this 5th embodiment, though it is monolithically fabricated identical with baseplate carrier device PST, but X The shape of beam 325, X bracket 440 shape different with the shape of the shape of aforementioned X beam 25, X bracket 40, and alleviate antihunting device The methods of 34 loads born etc., part constitute different with baseplate carrier device PST.Hereinafter, say centered by dissimilarity Bright.

As shown in Figure 15 and Figure 16, a pair X beam 325 of this embodiment, by with above-mentioned 4th embodiment used one The component of X beam 325 same shape is constituted, same, multiple x-ray guiding element 17a, a pair X stator 82 be fixed in the above and A pair side.

A pair X bracket 440, as shown in Figure 15 and Figure 16, has the flat board overlooking rectangle with X-direction as long side direction Component 59 and the respective upper surface state high with the coplanar generally above of planar plate members 59 is fixed on the long limit of planar plate members 59 Direction one end and a pair of the Y direction both ends of the surface of the other end, 4 side wall member 58 parallel with Z axis of total.X bracket 440, observe from +X direction, as shown in figure 16, there is reverse U shape shape, in the side wall member 58 of+Y side paired with each other Yu-Y side Insert X beam 325 to each other.Notch part 42 it is provided with (with reference to figure near long side direction (X-direction) central part of X bracket 440 15)。

A pair X bracket 440, is fixed with multiple respectively at end face (planar plate members 59 below) the most each x-ray guiding element 17a (such as 4) are sticked in the saddle 17b of x-ray guiding element 17a in slidable mode, additionally, in the internal face of side wall member 58 Be respectively fixed with by given clearance (clearance/gap) and a pair X stator 82 each to X can mover 81.

Aforementioned 1st embodiment, be fix X respectively in the front end of a pair arm 54 being fixed on weight canceller 50 can Mover 56, alleviates a part for the physical burden of the gravity direction acting on antihunting device 34, but as shown in figure 16, Yu Benshi Execute the weight canceller 450 of form and be not provided with arm 54 and X can mover 56.That is, weight canceller 450 is by basket 51, air spring 52, Z saddle 53 and base wad 55 etc. are constituted.Weight canceller 450 is by being connected to a plurality of (example of basket 51 Such as 4) bending device 45 is connected to a pair X bracket 440.Each bending device 45 is made into and the center of gravity of weight canceller 450 The roughly the same height in position.

Return to Figure 15, a pair pedestal 414, it is made up of the rod member extending Y direction respectively.A pair pedestal 414, point Do not comprise parallel with X/Y plane above and following, by have one side (inclined-plane) that relative YZ plane slightly tilts in θ x direction with and The body 414a of the hollow member composition of the another side (inclined-plane) that this one side tilts with angle in rightabout (-θ x direction), And multiple foot 14b of support body portion 414a from below.Multiple adjustor 14c it is provided with in the bottom of each foot 14b, and The Z location of body 414a can be adjusted.

In body 414a X-direction two sides (to a pair inclined-plane), be respectively fixed with as linear motor The Y stator 73 being located at Y direction of key element.Also, above body 414a, parallel to each other is fixed with a plurality of (example Such as 2) extend the mechanicalness Y linear guide (single shaft guiding device) of Y direction key element be located at Y direction Y linear guide 16a.

Body 414a configures (insertion) a pair couple at the Y bracket 475 being made up of the component that XZ section is inverted U-shaped to face Between (between side wall member).Y bracket 475, relative 1 pedestal 414 is configured with multiple (such as 2), each Y in Y direction compartment Bracket 475 by the plate 76 that is fixed in the above and connected to each other.A pair couple of Y bracket 475, to face, has the upper end from each (+Z side) tilts to lower end (-Z side) to the part 1 parallel with YZ plane near central part and near central part In-X side or+X side with 2 inclined-planes of the body 414a of above-mentioned pedestal 414 to part 2.Y bracket 475, sets For when being equipped on pedestal 414,2 inclined planes of body 414a with and this to Y bracket 475 had A pair pair parallel to the part 2 in face.In a pair couple of Y bracket 475 to each of the part 2 in face, it is respectively fixed with and passes through Given clearance (clearance/gap) and a pair Y stator 73 each to a pair Y can mover 472.Each Y can mover 472, comprising not shown has core coil unit, with to Y stator 73 together with constitute X beam 325 in Y direction with set The Y linear motor that stroke is driven.Also, each Y can mover 472 and to Y stator 73 between can produce magnetic attraction Ff. Additionally, in the end face of Y bracket 475, the most each Y bracket 475 is fixed with multiple (such as 2) and is slidably sticked in Y The saddle 16b of linear guide 16a.

Y stepping platform 490, is made up of the rod member extending X-direction, is mounted on baseplate carrier pallet 33.In Y The long side direction two ends of stepping platform 490, are fixed with by given clearance (clearance/gap) and Y by fixing component 446 Stator 73 to Y can mover 94.Each Y can mover 94, comprising not shown has core coil unit, with to Y stator 73 constitute the x-ray motor driven with predetermined stroke in X-direction by Y stepping platform 490 together.Also, can mover at each Y 94 and to Y stator 73 between can produce magnetic attraction Fg.

Fix in+X the side being fixed on Y stepping platform 490 component 446 Y can mover 94 with and this to Y stator 73 Between, in +X direction and +Z direction effect magnetic attraction Fg, the Y fixing component 446 in the-X side being fixed on Y stepping platform 490 can Mover 94 and and this to Y stator 73 between, in-X direction and +Z direction effect magnetic attraction Fg.This occasion, due to this 2 The horizontal direction component of individual magnetic attraction Fg (just to) of equal size to each other and in opposite direction, therefore cancels each other out.That is, above-mentioned 2 Individual magnetic attraction Fg, applies vertical direction power upwards to Y stepping platform 490, and its counter-force then reaches ground 11 by pedestal 414.

As described above, the baseplate carrier device PST4 of this 5th embodiment, the base with the 1st embodiment can be obtained Onboard effect equal for table apparatus PST.Additionally, in baseplate carrier device PST4, the load born due to antihunting device 34 is subject to Alleviate, therefore can reduce the unbalance loading weight acting on antihunting device 34 when baseplate carrier device PST4 drives.

" variation of the 5th embodiment "

Secondly, for the variation of the 5th embodiment, it is illustrated according to Figure 17.Herein, with aforementioned 5th embodiment Identical or equal composition part, uses same or like symbol simplification or the description thereof will be omitted.

The baseplate carrier device PST4a of this variation, is being located at long side direction both ends fixing of Y stepping platform 490a Component 446 be not provided with Y can the point of mover 94 and fixing component 446 be fixed on magnetic 96, upper in magnetic 96 Side is provided with the point of permanet magnet 97 by given clearance (clearance/gap) in X bracket 475a, with baseplate carrier device PST4 Different.

Permanet magnet 97, is actually held in place at below fixing component 478.In+X the side of Y stepping platform 490a, fixing structure Part 478 is multiple (such as 2) will configure with predetermined distance in Y direction in the way of Y bracket 475a is connected to each other, fixing Upper end in each side, Y bracket 475a-X side.Permanet magnet 97 by by given clearance and magnetic 96 to in the way of It is fixed on below fixing component 478.That is, in the Y stepping platform 490a of this variation, can be applied in and be fixed on pedestal The magnetic attraction Ff that the Y stator 73 of the body 414a of 414 and the Y being fixed on Y bracket 475a can produce between mover 472 is different The vertical direction that formed of the independent magnetic attraction Fh produced between magnetic 96 and permanet magnet 97 power upwards.Also, Y torr Other parts of frame 475a, have the composition identical with above-mentioned Y bracket 475.

As described above, the baseplate carrier device PST4a of the variation of this 5th embodiment, can obtain and implement with the 5th The effect that form is equal.In addition, according to baseplate carrier device PST4a, due to act on Y stepping platform 490a vertical to On magnetic attraction Fh and to act on the magnetic attraction Ff of Y bracket 475a be to be produced by independent magnetism generator, therefore can will make For Y stepping platform 490a magnetic attraction Fh with act on the magnetic attraction Ff of Y bracket 475a, be respectively set as set power.Also That is, the physical burden (unbalance loading weight) of antihunting device 34 can be will act on and comprise the multiple of Y linear guide 16a and saddle 16b The driving opposing that Y linear guide is born reduces to set value.

Also, the device illustrated by above-mentioned 1st～the 5th each embodiment and each variation (following, to claim each embodiment etc.) Constitute and be only an example, certainly can have various deformation.Such as, in above-mentioned each embodiment etc., though for utilizing magnetic attraction or magnetic Property repulsion with alleviate act on Y stepping platform 90,490,490a and support this baseplate carrier pallet 33 and antihunting device 34 The situation of the physical burden of gravity direction is described, but is not limited to this, in the electromagnetic force in the direction with vertical direction component, When being the situation of linear motor generation of the linear motor driven by X coarse motion microscope carrier or the driving of Y coarse motion microscope carrier, can be by profit With the vertical component of this electromagnetic force, with alleviate act on Y stepping platform 90,490,490a and support this baseplate carrier pallet 33 And the load mitigation device of the gravity direction physical burden of antihunting device 34, be equipped on baseplate carrier device PST, PST1, PST2, PST3、PST3a、PST3b、PST4、PST4a。

Also, the stator (magnet unit) that also may replace in above-mentioned each embodiment etc. with can mover (having core coil unit) Combination, and constitute above-mentioned load mitigation device by the combination of stator (magnet unit) Yu magnetic component.Or, also May replace and constitute at least one of permanet magnet of load mitigation device and use electromagnet.

Also, above-mentioned each embodiment, though for possess Y stepping platform 90,490, the weight of movement is offset on 490a Device 50,250,350,350a, the baseplate carrier device PST of 450, PST1, PST2, PST3, PST3a, PST3b, PST4, PST4a is described, but is not limited to this, also can such as No. 2010/0018950 description of U.S. Patent Application Publication No. etc. be taken off Show possessing equipped with in the scanning exposure apparatus of the baseplate carrier device of weight canceller, arranging to comprise and be located at Y coarse motion load The stator (Magnetitum) of platform be located at X coarse motion microscope carrier can mover (coil) with by X coarse motion microscope carrier in X-direction (scanning direction) The x-ray motor that drives with predetermined stroke and utilizing act on is constituted above-mentioned can the coil of mover and the one of weight canceller Power between part with negative function in comprise taking the weight of canceller from below platform supporting pallet gravity direction The load-carrying alleviator of physical burden.This occasion, when the exposure-processed of substrate (object), can keep with the substrate keeping substrate The X coarse motion microscope carrier that tool (object holder) moves toward the direction with plane-parallel together, by linear motor driven in X-axis Direction.Now, though the gravity direction load of substrate holding and the formation of weight canceller weight own can be acted in supporting pallet Heavy load, but this physical burden can be utilized by load-carrying alleviator and act on the power between a weight canceller part, From weight canceller, the power of a part is moved to X coarse motion microscope carrier alleviated.Accordingly, it is capable to alleviate comprise substrate holding, Weight canceller and the supporting gravity motion being of pallet and the unbalance loading weight acting on supporting pallet that formed, maintain according to this and fill The exposure accuracy divided.

Also, also can by the variation of the above-mentioned 1st～the 4th embodiment and above-mentioned 5th embodiment and variation thereof in addition It is applied in combination.That is, can and with to weight canceller 50,250,350,350a, 450 dresses producing vertical direction power upwards Put and to Y stepping platform 90,490,490a produce the device of vertical direction power upwards.

Also, in above-mentioned each embodiment, though a pair X bracket 40,140,240,340,340b, 440 be with web 41, 341 are linked, but also may replace web 41,341 and synchronize to drive in X-direction with main control unit by a pair X bracket. Same, though the multiple Y brackets 75 carried on 1 pedestal 14,414,475,475a be to be linked respectively with plate 76, but also May replace plate 76 and by multiple Y bracket 75,475,475a synchronizes to drive in Y direction with main control unit.

Also, in above-mentioned each embodiment, Y stepping platform 90,490,490a be middle real component, but be not limited to this, also may be used To be hollow member or have inside the hollow member shape that arranges flank.For example, it is possible to the modes such as casting manufacture by hollow The Y stepping platform that component is constituted.

Also, in the 1st embodiment, connect the bending device 45 of weight canceller 50 and X bracket 40, can be arranged to It is only capable of drawing in Y direction weight canceller 50.If additionally, by bending device 45 by weight canceller 50 and X Bracket 40 drives together if X-direction and Y direction, also may replace arm 54 front end being fixed on weight canceller 50 X can mover 56, and fixed magnetic body.

Also, in the variation of the 4th embodiment and the 4th embodiment, though by a pair X bracket 340,340b to be formed out The web 341 of oral area is linked, but is not limited to this, also can be by a pair X bracket 340,340b with in X-direction configured separate Multiple webs linked.Additionally, be fixed on the blade of a sword portion 352 of weight canceller 350,350a, weight need not be arranged on Canceller 350,350a all-round, the rod member that peripheral direction is stretched out can be directed towards.

Also, in the variation of the 5th embodiment, though it is configured with magnetic in the long side direction both ends of Y stepping platform 490a Gonosome 96, but be not limited to this, as long as due to can be in Y stepping platform 490a effect vertical direction power upwards, therefore, can Such as in the long side direction mid portion of Y stepping platform 490a by fixation means arrangement arranged magnetic 96, and with at it to face Mode fixing permanet magnet 97 below X beam 325 of configuration permanet magnet 97.

Also, illumination light can be ArF excimer laser (wavelength 193nm), KrF excimer laser (wavelength 248nm) etc. Ultraviolet light or F₂The vacuum-ultraviolet light of laser (wavelength 157nm) etc..Additionally, as illumination light, also can use such as will be from DFB Infrared bands that semiconductor laser or optical-fiber laser send or the single wavelength laser of visible band are with such as doped with erbium (or erbium And both ytterbium) fiber amplifier in addition amplification, using nonlinear optical crystal in addition wavelength convert is the harmonic wave of ultraviolet light.Again Person, also can use Solid State Laser (wavelength: 355nm, 266nm) etc..

Also, in above-mentioned each embodiment etc., though being to possess many projecting optical units for projection optics system PL The situation of poly-lens mode projection optics system is described, but the quantity of projecting optical unit is not limited to this, as long as more than 1 ?.Additionally, be also not limited to the projection optics system of poly-lens mode, can also be to use such as Ou Funa (Ofner) type large-scale The projection optics system etc. of reflecting mirror.Furthermore, though above-mentioned embodiment being use projection multiplying power for as projection optics system PL Situation for equimultiple person is described, but is not limited to this, and projection optics system can be to reduce be and expand any one being.

Also, in above-mentioned each embodiment etc., though it is used in transmitance mask substrate being formed with set light-shielding pattern The light transmissive mask of (or phase pattern, dim light pattern), but also can use such as 6,778, No. 257 publication institutes of U.S. Patent No. Disclosing, the electronics forming transmission pattern or reflection graphic patterns or formation luminous pattern according to the electronic bits of data of pattern to be exposed is covered Film (variable shaping mask), such as, can use the one using non-luminescent type image display element (also known as spatial light modulator) The variable shaping mask of DMD (Digital Micro-mirror Device).

Also, as exposure device, be especially adapted for use in size (comprise external diameter, catercorner length, at least 1 Kind) it is the substrate of more than 500mm, the exposure device that such as makes the large substrate of the flat-panel screens such as liquid crystal display cells expose Time, the most effectively.

Also, as exposure device, also can be suitably used for stepping and repeat (step & repeat) exposure device of mode, stepping The exposure device of (the step & stitch) mode of joint.Additionally, the object being held in the moving body of mobile body device is not limited to Exposure object subject substrate etc., can also be that the pattern of mask etc. keeps body (raw sheet).

Also, the purposes of exposure device, however it is not limited to the liquid crystal that liquid crystal display cells pattern is transferred to square glass plate is used Exposure device, be also widely portable to such as semiconductor manufacturing exposure device, in order to manufacture film magnetic head, micro-machine and The exposure device of DNA wafer etc..Additionally, be not only the microcomponent of semiconductor element etc., the present invention also can be suitably used for using into manufacturing In mask or the graticule of light exposure device, EUV exposure device, X-ray exposure device and electric wire exposure device etc., and by circuit Pattern is transferred to the exposure device of glass basis plate or Silicon Wafer etc..Also, possess the device of the object holding apparatus keeping object, not It is limited to exposure device, can also be that other substrate board treatment, such as glass substrate (or wafer) check device etc..Also, expose The object of light object is not limited to glass plate, can also be such as wafer, ceramic substrate, film member or mask substrate (mask Other objects such as blank).During also, exposure object thing is the situation of flat faced display substrate, the thickness of this substrate there is no especially Limit, the most also comprise film like (having flexual flat member) person.

The electronic component of liquid crystal display cells (or semiconductor element) etc., is to design via the functional performance carrying out element Step, according to this design procedure make mask (or graticule) step, make glass substrate (or wafer) step, with above-mentioned Mask (graticule) pattern is transferred to the lithography step of glass substrate, makes by exposure device and the exposure method thereof of each embodiment The development step of exposed glass substrate development, the part of remaining resist is exposed component with etching in addition with outer portion Remove etching step, has removed etching and without the resist removal step of resist, element number of assembling steps, inspection walk Rapid grade is manufactured.This occasion, due to lithography step be use above-mentioned embodiment exposure device implement aforementioned exposure side Method, forms element pattern on glass substrate, therefore can manufacture the element of high integration with good productivity.

Additionally, quote all publications about exposure device cited in described above, International Publication publication, United States Patent (USP) The part that the announcement of ublic specification of application and US Patent specification is recorded as this specification.

Industrial applicability

As described above, the exposure device of the present invention is suitable to make the object on plate expose.Also, the plane of the present invention shows The manufacture method of device is very suitable for the development of the object after making exposure.Additionally, the manufacturing method of the present invention is very suitable for manufacturing Microcomponent.

Claims

1. an exposure device for sweep type, be when exposure-processed relative exposure energy beam make exposure object object with water Parallel the 1st direction of plane is moved with set 1st stroke, and it possesses:

Moving body, at least can move with described set 1st stroke in described 1st direction and can in described horizontal plane in institute The 2nd direction stating the 1st direction orthogonal is moved with the 2nd stroke；

Object holder, described object can be kept, together with described moving body at least in the direction with described plane-parallel Mobile；

Weight canceller, supports described object holder from below to offset the weight of described object holder；

Supporting member, extends described 1st direction, support from below described weight canceller and can support from below described Under the state of weight canceller, move with described 2nd stroke in described 2nd direction；

Supporting pallet, supports described supporting member；And

Load-carrying alleviator, supports described moving body, by will act on the part release of the power of described weight canceller To described supporting pallet, alleviate the physical burden of the gravity direction acting on described supporting pallet.

2. exposure device as claimed in claim 1, wherein, described load-carrying alleviator is to utilize to act on described moving body Power between an a part of and part for described weight canceller, alleviates described physical burden.

3. exposure device as claimed in claim 1 or 2, wherein, described moving body comprises can be in described 1st direction at least with institute State the 1st mobile member that set 1st stroke moves, and guide described 1st mobile member toward the movement in described 1st direction and can be The 2nd mobile member moved with described 2nd stroke together with described 1st mobile member in described 2nd direction in described horizontal plane.

4. exposure device as claimed in claim 3, wherein, described 1st mobile member is comprised to be located at the described 2nd and moves structure The Magnetitum of part and be located at the linear motor of coil of described 1st mobile member, drives in described 1st side with described 1st stroke To；

Described load-carrying alleviator is the part or described supporting utilizing and acting on described Magnetitum and described weight canceller Power between a part for component, alleviates the physical burden of the gravity direction acting on described supporting member.

5. exposure device as claimed in claim 4, wherein, has been provided with core coil in described weight canceller；

The electromagnetism that described weight canceller is produced by described Magnetitum and the described electromagnetic interaction having between core coil Power, drives in described 1st direction in described supporting member；

Described load-carrying alleviator utilizes and acts on described Magnetitum and the described magnetic force having between core coil, alleviates described load-carrying Load.

6. exposure device as claimed in claim 1, wherein, described load-carrying alleviator is to utilize to act on described moving body Power between an a part of and part for described supporting member, alleviates described physical burden.

7. exposure device as claimed in claim 6, wherein, described load-carrying alleviator is by will act on described supporting structure Outside the part release extremely described supporting pallet of the power of part, alleviate described physical burden.

Exposure device the most as claimed in claims 6 or 7, wherein, described moving body comprises can be in described 1st direction at least with institute State the 1st mobile member that set 1st stroke moves and guide described 1st mobile member toward the movement in described 1st direction and can be The 2nd mobile member moved with described 2nd stroke together with described 1st mobile member in described 2nd direction in described horizontal plane.

9. exposure device as claimed in claim 8, wherein, described load-carrying alleviator is to utilize to act on the described 2nd and move Power between component and described supporting member, alleviates described physical burden.

10. exposure device as claimed in claim 8, it is further equipped with supporting described 2nd mobile member and described bearing support The bearing support that platform separates in vibration；

Described 2nd mobile member by comprise the Magnetitum being located at described bearing support and be located at described 2nd mobile member have heart yearn The linear motor of circle, drives in described 2nd direction with described 2nd stroke；

Described load-carrying alleviator utilizes and acts on described Magnetitum and the described magnetic force having between core coil, alleviates described further Physical burden.

11. the exposure device as described in any one of claim 4,5,9,10, wherein, described supporting member is with attachment means machine Tool be linked to described 2nd mobile member, when described 2nd mobile member moves by described attachment means by the described 2nd Mobile member draws, and is displaced into described 2nd direction according to this.

12. exposure devices as claimed in claim 11, wherein, in described attachment means, with the rigidity phase in described 2nd direction Relatively, the rigidity of its other direction is relatively low.

13. exposure devices as claimed in claim 11, wherein, described attachment means is in the center of gravity by described supporting member On the axis that position is parallel with described 2nd direction, it is connected to described supporting member.

14. exposure devices as claimed in claim 1, it is further equipped with guiding element, and described guiding element comprises and mechanically guides Described supporting member is toward the key element of the single shaft guiding device of the movement in described 2nd direction；

The most described moving body of described guiding element separates in vibration.

15. exposure devices as claimed in claim 14, wherein, described single shaft guiding device in described 1st direction with set Multiple every being provided with.

16. exposure devices as described in claims 14 or 15, wherein, described guiding element is along described 2nd direction configuration separated from one another Have multiple；

Described supporting member is to be mounted on the plurality of guiding element.

17. exposure devices as claimed in claim 1, wherein, described supporting member is by middle real stone material or the casting of hollow Thing is constituted.

18. exposure devices as claimed in claim 1, wherein, described weight canceller is to be mounted in institute with contactless state State in supporting member.

19. exposure devices as claimed in claim 1, wherein, described object holder can the most described moving body to being less than Described 1st direction, described 2nd direction and around the axis direction fine motion orthogonal with described horizontal plane.

20. exposure devices as claimed in claim 19, wherein, described object holder is further able to the most described moving body In the direction orthogonal with described horizontal plane and around the axis direction fine motion with described plane-parallel.

21. exposure devices as claimed in claim 1, its be further equipped with by described object holder supporting for can around with institute State the swinging mounting device of the axis oscillating of plane-parallel.

22. exposure devices as claimed in claim 21, wherein, described swinging mounting device supports described thing in a non contact fashion Body keeps component.

23. exposure devices as claimed in claim 21, wherein, described swinging mounting device is by described weight canceller Support from below；

Described weight canceller is to be mounted in described supporting member with contactless state.

24. exposure devices as described in claim 21 or 22, wherein, described weight canceller possess generation vertical direction to On the force generating apparatus of power；

Described swinging mounting device is arranged to move in the direction orthogonal with described horizontal plane, is produced by described force generating apparatus Raw described power is transferred to described object holder.

25. 1 kinds of scanning exposure apparatus, be when exposure-processed relative exposure energy beam make the object of exposure object with 1st direction of plane-parallel is moved with set 1st stroke, and it possesses:

1st mobile member, at least can move with described set 1st stroke in described 1st direction；

2nd mobile member, guides described 1st mobile member toward the movement in described 1st direction and can be in described horizontal plane and institute The 2nd direction stating the 1st direction orthogonal is moved with the 2nd stroke together with described 1st mobile member；

Object holder, keep described object, can together with described 1st mobile member at least with described plane-parallel Direction is moved；

Supporting pallet, comprises the platform supporting described weight canceller from below；

Linear motor, the coil comprising the Magnetitum being located at described 2nd mobile member with being located at described 1st mobile member, by described 1st mobile member drives in described 1st direction with described 1st stroke；And

Load-carrying alleviator, supports described 2nd mobile member, utilizes and acts on described Magnetitum and the one of described weight canceller Power between part, alleviates the physical burden of the gravity direction acting on described supporting pallet.

26. exposure devices as described in claim 1 or 25, wherein, the substrate that described object manufactures for flat-panel screens.

The manufacture method of 27. 1 kinds of flat-panel screens, comprises:

The exposure device described in claim 26 is used to make the action of described base plate exposure；And

Make the action that the described substrate after exposure develops.

28. 1 kinds of manufacturing methods, comprise:

Use the action that the exposure device according to any one of claim 1 to 25 makes object expose；And

Make the action that the described object after exposure develops.