WO2013150790A1

WO2013150790A1 - Exposure device, method for manufacturing flat panel display, and method for manufacturing device

Info

Publication number: WO2013150790A1
Application number: PCT/JP2013/002308
Authority: WO
Inventors: 青木　保夫
Original assignee: 株式会社ニコン
Priority date: 2012-04-04
Filing date: 2013-04-03
Publication date: 2013-10-10
Also published as: CN104204955A; CN104204955B; TWI670574B; TW201351060A; JP2013217957A; JP5863149B2; KR102151930B1; KR20150003260A; TWI609244B; TW201802620A

Abstract

In a substrate stage device (PST), an X movable element (56), which faces an X stator (82) provided on an X beam (25) and in which a magnetic attractive force is generated with respect to a weight canceling device (50), is fixed at the tip of an arm (54) of the weight canceling device (50). The weight canceling device (50) transfers its own weight and part of the weight of a micro-movement stage (30) that the weight canceling device (50) supports to a floor (11) via a base frame (14) by means of the magnetic attractive force. Therefore, the biased load applied to a vibration prevention device (34) is reduced.

Description

Exposure apparatus, flat panel display manufacturing method, and device manufacturing method

The present invention relates to an exposure apparatus, a flat panel display manufacturing method, and a device manufacturing method. More specifically, the present invention relates to an exposure apparatus used in a lithography process for manufacturing a semiconductor element, a liquid crystal display element, and the like, and a flat panel using the exposure apparatus. The present invention relates to a display manufacturing method and a device manufacturing method using the exposure apparatus.

Conventionally, in a lithography process for manufacturing an electronic device (microdevice) such as a liquid crystal display element, a semiconductor element (such as an integrated circuit), a mask or reticle (hereinafter collectively referred to as “mask”), a glass plate or a wafer (hereinafter referred to as “mask”). Step-and-scan exposure in which the pattern formed on the mask is transferred onto the substrate using an energy beam while the substrate is collectively moved along a predetermined scanning direction (scanning direction). An apparatus (a so-called scanning stepper (also called a scanner)) or the like is used.

This type of exposure apparatus is a stacked type (gantry) in which a Y coarse movement stage movable in a cross scan direction (a direction perpendicular to the scan direction) is mounted on an X coarse movement stage movable in a scanning direction with a long stroke. A type having a stage device is known, and as the stage device, for example, a configuration in which a weight canceling device moves along a horizontal plane on a surface plate formed of stone is known (for example, Patent Document 1).

In the exposure apparatus described in Patent Document 1, since the weight cancellation apparatus moves in a wide range corresponding to the step-and-scan operation, the flatness of the upper surface of the surface plate (the movement guide surface of the weight cancellation apparatus) over a wide range. Need to finish high. However, in recent years, the substrate that is the exposure target of the exposure apparatus tends to be larger, and the surface plate is also enlarged accordingly. There was concern about deterioration of sex. For this reason, the appearance of a new technology for reducing the surface plate was expected.

US Patent Application Publication No. 2010/0018950

In order to make the surface plate smaller, the inventor previously proposed an exposure apparatus having a surface plate called a step surface plate in which the surface plate supporting the weight cancellation device moves in the cross-scan direction (US Patent). Application No. 13/221568). In the exposure apparatus provided with the step surface plate, the step surface plate that guides the movement in the scanning direction of the weight cancellation device that supports the substrate holding member that holds the substrate to be exposed from below is in a state that the step surface plate is movable in the cross scanning direction. It is mounted on a stand supported by a vibration isolator. In an exposure apparatus equipped with a step surface plate, the step surface plate, which is heavy in its own weight, is driven in the cross-scan direction with the substrate holding member and the weight canceling device supported. Becomes larger. For this reason, in an exposure apparatus using a step surface plate, a large offset load is applied to the vibration isolator, and the weight of the substrate holding member that holds a large substrate in particular is increased. Therefore, the weight cancellation that supports the substrate holding member is performed. The uneven load acting on the pedestal via the step surface plate, and further via the step stool increases, and the entire exposure apparatus is slightly affected by the uneven load applied to the gantry supported by the vibration isolator during the exposure operation. Recently, it has been found that there is a risk of lowering the tilt and exposure accuracy.

According to the first aspect of the present invention, there is provided a scanning type exposure apparatus that moves an object to be exposed with a predetermined first stroke in a first direction parallel to a horizontal plane with respect to an energy beam for exposure during an exposure process. A movable body movable in at least the predetermined first stroke in the first direction and movable in a second direction in a second direction perpendicular to the first direction in the horizontal plane, and holding the object. An object holding member that can move together with the moving body at least in a direction parallel to the horizontal plane, a weight cancellation device that supports the object holding member from below and cancels the weight of the object holding member, and the first direction. Extending and supporting the weight canceling device from below and supporting the weight canceling device from below and movable in the second direction in the second stroke And wood, and the support cradle for supporting the support member, and a load relief device to reduce the load application direction of gravity acting on said support cradle, the first exposure apparatus comprising, are provided.

According to this, during the exposure process on the object, a load load in the gravity direction (vertically downward) due to the weight of the object holding member, the weight canceling device, and the support member acts on the support frame. Mitigated by mitigation device. Accordingly, it is possible to reduce the uneven load acting on the support frame due to the center of gravity movement of the system including the object holding member, the weight canceling device and the support member, and the support frame, thereby maintaining the exposure accuracy with sufficient accuracy. .

According to the second aspect of the present invention, there is provided a scanning exposure apparatus that moves an object to be exposed with a predetermined first stroke in a first direction parallel to a horizontal plane with respect to an energy beam for exposure during an exposure process. A first moving member movable in at least the predetermined first stroke in the first direction, guiding the movement of the first moving member in the first direction, and in the first direction within the horizontal plane. A second moving member that can move in a second stroke with the first moving member in a second direction orthogonal to the second moving member, and the object that holds the object, and that can move with the first moving member at least in a direction parallel to the horizontal plane. A member, a weight cancellation device that supports the object holding member from below and cancels the weight of the object holding member, a support base including a surface plate that supports the weight cancellation device from below, and A linear motor for driving the first moving member in the first direction in the first stroke, the magnet including a magnet provided on the two moving members and a coil provided on the first moving member; There is provided a second exposure apparatus comprising: a load reducing device that reduces a load load in a gravitational direction acting on the support frame by using a force acting between a part of the weight canceling device and the weight canceling device. .

According to this, the first moving member that can move in the direction parallel to the horizontal plane together with the object holding member that holds the object during the exposure process on the object is driven in the first direction by the linear motor. At this time, a load load in the gravitational direction due to the weight of the object holding member and the weight canceling device acts on the support frame, but the load load acts between a part of the weight canceling device and the load reducing device. It is reduced by using the power to do. Therefore, it is possible to reduce the uneven load acting on the support frame due to the movement of the center of gravity of the system including the object holding member, the weight canceling device, and the support frame, thereby maintaining the exposure accuracy with sufficient accuracy.

According to a third aspect of the present invention, there is provided a flat panel display comprising: exposing a substrate using any of the first and second exposure apparatuses; and developing the exposed substrate. Is the method.

According to a fourth aspect of the present invention, there is provided a device manufacturing method comprising: exposing an object using any one of the first and second exposure apparatuses; and developing the exposed object. .

It is a figure which shows schematically the structure of the exposure apparatus which concerns on 1st Embodiment. FIG. 2 is a plan view showing the substrate stage of the exposure apparatus of FIG. 1 with the fine movement stage removed. It is a figure which shows the substrate stage which the exposure apparatus of FIG. 1 has seen from + X direction. It is a figure which shows typically the flow of the force by the dead weight of a substrate stage apparatus. It is a figure for demonstrating the magnetic attraction force which acts on a weight cancellation apparatus. FIG. 6A is a diagram schematically illustrating the movement of the center of gravity of a substrate stage device that is not provided with a magnetic attraction force generating device that acts on the weight canceling device, and FIG. 6B is perpendicular to the weight canceling device. It is a figure which shows typically the center-of-gravity movement of the substrate stage apparatus in which the upward magnetic attraction force acts. It is a figure which shows the substrate stage apparatus which concerns on 2nd Embodiment seeing from + X direction. It is a top view of the substrate stage device concerning a 3rd embodiment. It is a figure which partially shows and shows the substrate stage apparatus which concerns on 3rd Embodiment seeing from + X direction. It is a figure which shows a partial cross section seeing from the substrate stage apparatus + X direction which concerns on 4th Embodiment. It is a top view of the substrate stage device concerning a 4th embodiment. FIG. 12A is a diagram showing an example of a combination of a permanent magnet that generates a magnetic attractive force and a magnetic body, and FIG. 12B is an example of a combination of a permanent magnet that generates a magnetic attractive force and a permanent magnet. FIG. It is a figure which shows a partial cross section seeing the substrate stage device concerning the 1st modification of a 4th embodiment from the + X direction. It is a figure which partially shows a substrate stage device concerning the 2nd modification of a 4th embodiment seeing from + X direction. FIG. 10 is a view showing a partial cross section of a substrate stage device provided in an exposure apparatus according to a fifth embodiment when viewed from the −Y direction. FIG. 16 is a partial cross-sectional view of the substrate stage apparatus of FIG. 15 when viewed from the + X direction. It is a figure which shows the substrate stage apparatus concerning the modification of 5th Embodiment seeing from -Y direction.

<< First Embodiment >>
Hereinafter, the first embodiment will be described with reference to FIGS. 1 to 6B.

FIG. 1 schematically shows a configuration of an exposure apparatus 10 according to the first embodiment. The exposure apparatus 10 is a step-and-scan projection exposure apparatus that uses a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in a liquid crystal display device (flat panel display) as an exposure object. (Also called a scanner).

The exposure apparatus 10 includes an illumination system IOP, a mask stage MST that holds a mask M, a projection optical system PL, a pair of substrate stage mounts 33, a substrate stage apparatus PST that includes a substrate holder 31 that holds a substrate P, and a control system thereof. Etc. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL at the time of exposure is defined as the X-axis direction, and the direction orthogonal to the X-axis in the horizontal plane is defined as the Y-axis direction, X-axis, and Y-axis In the following description, the orthogonal direction is the Z-axis direction, and the rotation directions around the X-axis, Y-axis, and Z-axis are the θx, θy, and θz directions, respectively. Further, description will be made assuming that the positions in the X-axis, Y-axis, and Z-axis directions are the X position, the Y position, and the Z position, respectively. Note that a resist (sensitive agent) is applied to the surface of the substrate P (the surface on the + Z side).

The illumination system IOP is configured similarly to the illumination system disclosed in, for example, US Pat. No. 6,552,775. That is, the illumination system IOP has a plurality of, for example, five illumination systems that illuminate each of a plurality of, for example, five illumination regions arranged in a staggered pattern on the mask M. Each illumination system has a light source (for example, not shown) The light emitted from the mercury lamp) is irradiated to the mask M as exposure illumination light (illumination light) IL through a reflection mirror, a dichroic mirror, a shutter, a wavelength selection filter, various lenses, and the like (not shown). As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used. Further, the wavelength of the illumination light IL can be appropriately switched by a wavelength selection filter, for example, according to the required resolution.

A mask M having a circuit pattern or the like formed on its pattern surface (the lower surface in FIG. 1) is fixed to the mask stage MST by, for example, vacuum suction. The mask stage MST is mounted in a non-contact state on a guide member (not shown), and is driven with a predetermined stroke in the scanning direction (X-axis direction) by a mask stage drive system (not shown) including a linear motor, for example. It is slightly driven as appropriate in the Y-axis direction and the θz direction. The position information (including the rotation information in the θz direction) of the mask stage MST in the XY plane is, for example, a laser interferometer that irradiates a laser beam (measurement beam) onto a reflecting surface fixed (or formed) to the mask M. Is measured by a mask interferometer system not shown. This measurement result is supplied to a main controller (not shown). The main control device drives (position control) the mask stage MST via a mask stage drive system (not shown) based on the measurement result by the mask interferometer system. Note that an encoder (or an encoder system including a plurality of encoders) may be used instead of the mask interferometer system or together with the mask interferometer system.

Projection optical system PL is arranged below mask stage MST in FIG. The projection optical system PL is configured similarly to the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system PL includes a plurality of, for example, five projection optical systems (multi-lens projection optical systems) in which the projection areas of the pattern image of the mask M are arranged in a staggered manner corresponding to the plurality of illumination areas described above. And functions in the same manner as a projection optical system having a single rectangular image field whose longitudinal direction is the Y-axis direction. In the present embodiment, as each of the plurality of projection optical systems, for example, a bilateral telecentric equal magnification system that forms an erect image is used.

For this reason, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system IOP, the mask M in which the first surface (object surface) of the projection optical system PL and the pattern surface are substantially aligned with each other. The projection image (partial upright image) of the circuit pattern of the mask M in the illumination area is arranged on the second surface (image plane) side of the projection optical system PL through the projection optical system PL by the illumination light IL that has passed through the projection optical system PL. Formed in an irradiation region (exposure region) of illumination light IL conjugate to the illumination region on the substrate P. The mask M is moved relative to the illumination area (illumination light IL) in the scanning direction by the synchronous drive of the mask stage MST and a fine movement stage 30 that forms part of the substrate stage apparatus PST, and the exposure area. By moving the substrate P relative to the (illumination light IL) in the scanning direction, scanning exposure of one shot region (partition region) on the substrate P is performed, and the pattern of the mask M (mask pattern) is applied to the shot region. ) Is transcribed. That is, in this embodiment, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the pattern is formed on the substrate P by exposure of the sensitive layer (resist layer) on the substrate P by the illumination light IL. Is formed.

Each of the pair of substrate stage stands 33 is composed of a member extending in the Y-axis direction (see FIG. 3), and both ends in the longitudinal direction thereof are supported from below by a vibration isolator 34 installed on the floor (floor surface) 11. ing. The pair of substrate stage mounts 33 are arranged in parallel in the X axis direction at a predetermined interval. On the upper surface of each of the pair of substrate stage mounts 33, as shown in FIG. 2, a plurality of (for example, each substrate stage mount 33) that are elements of a mechanical Y linear guide device (single axis guide device) extending in the Y-axis direction. On the other hand, three Y linear guides 35a are spaced apart in the X-axis direction and fixed in parallel to each other.

The pair of substrate stage mounts 33 constitutes an apparatus main body (body) of the exposure apparatus 10, and the projection optical system PL, the mask stage MST, and the like are mounted on the apparatus main body.

As shown in FIG. 1, the substrate stage apparatus PST supports a pair of base frames 14, an auxiliary base frame 15, a coarse movement stage 23, a fine movement stage 30, a weight cancellation apparatus 50, and a weight cancellation apparatus 50 from below. A step surface plate 90 is provided.

As shown in FIGS. 1 and 2, one of the pair of base frames 14 is arranged on the + X side of the + X side substrate stage frame 33, and the other is −X side of the −X side substrate stage frame 33. Arranged on the side. Since the pair of base frames 14 have the same structure, the + X side base frame 14 will be described below. As shown in FIG. 1, the base frame 14 has a main body portion 14 a made up of a plate-like member having one surface parallel to the YZ plane and the other surface and extending in the Y-axis direction, and a plurality of members that support the main body portion 14 a from below. Leg portion 14b. For example, three leg portions 14b are provided at predetermined intervals in the Y-axis direction. A plurality of adjusters 14c are provided at the lower end of each leg portion 14b so that the Z position of the main body portion 14a can be adjusted.

The Y stator 73, which is an element of the linear motor, is fixed to both side surfaces of the main body portion 14a in the X-axis direction (that is, the one surface and the other surface described above). The Y stator 73 has a magnet unit including a plurality of permanent magnets arranged at a predetermined interval in the Y-axis direction. Further, a Y linear guide 16a that is an element of a mechanical Y linear guide device (uniaxial guide device) extending in the Y axis direction is fixed to the upper surface of the main body portion 14a.

The auxiliary base frame 15 is disposed between the pair of substrate stage mounts 33. Although the auxiliary base frame 15 is different in size, the auxiliary base frame 15 is configured in the same manner as the portion of the base frame 14 excluding the main body portion 14a. That is, the auxiliary base frame 15 includes a main body portion 15a made of a plate-like member extending in the Y-axis direction, and an adjuster 15b that supports the main body portion 15a from below and can adjust the Z position of the main body portion 14a. A Y linear guide 16 a extending in the Y-axis direction is fixed to the upper surface of the main body 15 a of the auxiliary base frame 15 in the same manner as the base frame 14. The Z position of the upper end of the auxiliary base frame 15 is set somewhat lower (or substantially the same) than the upper surfaces of the pair of substrate stage mounts 33.

The coarse movement stage 23 includes a Y coarse movement stage 23y and an X coarse movement stage 23x mounted on the Y coarse movement stage 23y.

The Y coarse movement stage 23y is mounted on the pair of base frames 14 and the auxiliary base frame 15. The Y coarse movement stage 23y has a pair of X beams 25 as shown in FIG. Each of the pair of X beams 25 is composed of a member extending in the X-axis direction, and is arranged in parallel to each other at a predetermined interval in the Y-axis direction. As shown in FIG. 3, each of the pair of X beams 25 has an approximately isosceles trapezoidal shape in which the shape of the YZ cross section is inverted with the top side somewhat longer than the bottom side. This trapezoid has one side inclined at an angle θ (θ is smaller than 45 degrees, for example, 10 degrees) with respect to the Z axis in the YZ plane in addition to the upper and lower sides, and an angle with respect to the Z axis within the YZ plane − and the other side inclined by θ.

As shown in FIG. 2, a member called a Y carriage 75 is fixed to the lower surfaces of the pair of X beams 25 in the vicinity of both ends in the longitudinal direction. That is, for example, a total of four Y carriages 75 are attached to the lower surface of the Y coarse movement stage 23y. The two Y carriages 75 arranged on the + X side are connected to each other by a plate 76 fixed to each upper surface. Similarly, two Y carriages 75 arranged on the −X side are also connected to each other by a plate 76. For example, since each of the four Y carriages 75 has the same structure, only one Y carriage 75 corresponding to the base frame 14 on the + X side will be described below.

As shown in FIG. 1, the Y carriage 75 is made of a member having an inverted U-shaped XZ cross section, and the main body portion 14a of the base frame 14 is inserted between a pair of opposing surfaces. A pair of Y movers 72 facing each of the pair of Y stators 73 via a predetermined gap (clearance / gap) is fixed to each of the pair of opposed surfaces of the Y carriage 75. Each Y mover 72 includes a coil unit (not shown), and a moving coil type of an electromagnetic force (Lorentz force) driving system that drives the Y coarse movement stage 23y with a predetermined stroke in the Y-axis direction together with the opposing Y stator 73. Y linear motor is configured. Note that the Y position information of the Y coarse movement stage 23y is obtained by a linear encoder system (not shown).

The ceiling surface of the Y carriage 75 includes rolling elements (for example, a plurality of balls, etc.), and a plurality of (for example, two (for example, two (2)) sliders 16b slidably engaged with the Y linear guide 16a. (See FIG. 2)) It is fixed. The Y coarse movement stage 23y is guided linearly in the Y-axis direction by a plurality of Y linear guide devices including a Y linear guide 16a and a slider 16b.

Further, a plurality of (for example, two) auxiliary carriages 78 are fixed to the lower surface of the center portion in the longitudinal direction of the pair of X beams 25 via a support member 77. The auxiliary carriage 78 is formed of a rectangular parallelepiped member, and a slider 16b that is slidably engaged with the Y linear guide 16a is fixed to the lower surface of the auxiliary carriage 78 similarly to the Y carriage 75. As a result, the Y coarse movement stage 23 y is vibrationally separated from the substrate stage mount 33. In FIG. 1, the two sliders 16b are attached to the auxiliary carriage 78 at a predetermined interval in the depth direction (Y-axis direction), for example. As described above, the Y coarse movement stage 23y is supported by the auxiliary base frame 15 from below through the auxiliary carriage 78 at the center in the longitudinal direction, and the deflection due to its own weight is suppressed.

As shown in FIGS. 2 and 3, X linear guides 17a, which are elements of a mechanical uniaxial guide device extending in the X-axis direction, are arranged on the upper surfaces of the pair of X beams 25 at predetermined intervals in the Y-axis direction. A plurality (for example, two for each X beam 25 in this embodiment) are fixed in parallel to each other. Further, as shown in FIGS. 1 and 2, two hypotenuses (slopes) in the YZ section of the pair of X beams 25 extend from the vicinity of the −X side end portion of the X beam 25 to the vicinity of the + X side end portion. The provided X stator 82 is fixed. The X stator 82 has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction.

The X coarse movement stage 23x includes a pair of X carriages 40 and a pair of connection plates 41 for connecting the pair of X carriages 40 as shown in FIG. Since the pair of X carriages 40 have the same structure, the + Y side X carriage 40 will be described below.

2 and 3, the X carriage 40 includes a flat plate member 61 that is rectangular in plan view with the X axis direction as the longitudinal direction, and one end portion and the other end portion of the flat plate member 61 in the Y axis direction. The pair of side wall members 62 are fixed in a state where the upper end surfaces thereof are substantially flush with the upper surface of the flat plate member 61. As shown in FIG. 3, the X carriage 40 has an inverted U-shape when viewed from the + X direction, and the X beam 25 is provided between the + Y side and −Y side side wall members 62 that form a pair with each other. Has been inserted. Both ends in the X-axis direction of the flat plate member 61 slightly protrude outward in the X-axis direction with respect to each of the side walls 62 on the + X side and the −X side (see FIG. 2). The side wall members 62 on the + Y side and the −Y side that make a pair are respectively a first portion parallel to the XZ plane from the upper end (+ Z side end) to the vicinity of the center portion, and a lower end (−Z side end from the vicinity of the center portion) ) To the −Y side or the + Y side, and has a second portion facing the two slopes of the X beam 25 described above. In the vicinity of the central portion of the X carriage 40 in the longitudinal direction (X-axis direction), a portion where the side wall member 62 does not exist within a range slightly shorter than 1/3 of the X-axis direction length of the X carriage 40 (hereinafter referred to as a notch portion). 42) (see FIG. 2).

As shown in FIG. 3, the lower surface (the surface on the −Z side) of each flat plate member 61 of the X carriage 40 includes a rolling element and a slider 17b slidably engaged with the X linear guide 17a. A plurality (for example, four (see FIG. 2)) are fixed to the linear guide 17a. In the present embodiment, for example, a total of 16 sliders 17b are fixed to the lower surface of the X coarse movement stage 23x. The X coarse movement stage 23x is linearly guided in the X-axis direction by a plurality of X linear guide devices including an X linear guide 17a and a slider 17b.

An X mover 81 is fixed to the inner surface of each second portion of each of the four side wall members 62 of the X carriage 40 so as to face each of the pair of X stators 82 with a predetermined gap (clearance / gap) therebetween. Yes. Each X mover 81 includes a coil unit (not shown), and a moving coil type of an electromagnetic force (Lorentz force) drive system that drives the X coarse movement stage 23x with a predetermined stroke in the X-axis direction together with the opposing X stator 82. X linear motor is configured. Each X mover 81 includes an iron core (not shown), and a magnetic attractive force is generated between the X mover 81 and the opposed X stator 82. That is, each mover 81 forms a coil unit with a core. Note that the X position information of the X coarse movement stage 23x is obtained by a linear encoder system (not shown).

Each of the pair of connecting plates 41 is composed of a flat plate member extending in the Y-axis direction, as shown in FIG. The one connecting plate 41 is somewhat from the -Y side of the X carriage 40 arranged on the + Y side, slightly + Y from the Y axis direction center of the X carriage 40 arranged on the -Y side. The + X ends of the pair of X carriages 40 are connected to each other. The other connecting plate 41 is somewhat + Y from the center in the Y-axis direction of the X carriage 40 disposed on the + Y side, and somewhat + Y from the center in the Y-axis direction of the X carriage 40 disposed on the −Y side. The -X ends of the pair of X carriages 40 are connected to each other. That is, the X coarse movement stage 23x having the pair of X carriages 40 and the pair of connecting plates 41 has a substantially rectangular shape having an opening at the center in plan view.

Although not shown, the X coarse movement stage 23x includes a stopper member that mechanically limits (restricts) the movable amount of the fine movement stage 30 to be described later relative to the X coarse movement stage 23x, or the X axis and the Y axis. A gap sensor or the like for measuring a relative movement amount of the fine movement stage 30 with respect to the X coarse movement stage 23x with respect to the direction is attached.

As can be seen from FIGS. 1 and 3, fine movement stage 30 is formed of a plate-like member (or a box-shaped (hollow rectangular parallelepiped) member) having a substantially square shape in plan view, and substrate P is placed on the upper surface thereof via substrate holder 31. , For example, by vacuum suction (or electrostatic suction).

Fine movement stage 30 includes a plurality of voice coil motors (or linear motors) each including a stator fixed to X coarse movement stage 23x and a movable element fixed to fine movement stage 30. The system is slightly driven on the X coarse movement stage 23x in directions of three degrees of freedom in the XY plane (each direction of the X axis, the Y axis, and θz). As the plurality of voice coil motors, as shown in FIG. 1, a pair of X voice coil motors 18x that finely drive the fine movement stage 30 in the X-axis direction are provided apart from each other in the Y-axis direction (X on the far side in the drawing). As shown in FIG. 3, a pair of Y voice coil motors 18y that slightly drive the fine movement stage 30 in the Y-axis direction are provided apart from each other in the X-axis direction (back in the drawing). The Y voice coil motor 18y on the side is not shown). The fine movement stage 30 is synchronously driven (driven at the same speed in the same direction as the X coarse movement stage 23x) by the X coarse movement stage 23x using the X voice coil motor 18x and / or the Y voice coil motor 18y. , Together with the X coarse movement stage 23x, it moves with a predetermined stroke in the X-axis direction and / or the Y-axis direction. Accordingly, the fine movement stage 30 can move (coarse movement) with a long stroke in the XY two-axis directions with respect to the projection optical system PL (see FIG. 1), and can move minutely (fine movement) in the three degrees of freedom in the X, Y, and θz directions. ) Is possible.

The fine movement stage drive system has a plurality of Z voice coil motors (not shown) for finely driving the fine movement stage 30 in the three degrees of freedom in the θx, θy, and Z-axis directions. The configuration of the fine movement stage drive system including a plurality of voice coil motors is disclosed in, for example, US Patent Application Publication No. 2010/0018950.

As shown in FIG. 1, an X moving mirror (bar mirror) 22x having a reflecting surface orthogonal to the X axis is fixed to the side surface on the −X side of the fine movement stage 30 as shown in FIG. Further, as shown in FIG. 3, a Y movable mirror 22 y having a reflecting surface orthogonal to the Y axis is fixed to the side surface on the −Y side of fine movement stage 30 via mirror base 28. The positional information of the fine movement stage 30 in the XY plane is a laser interferometer system (hereinafter referred to as a substrate) including a plurality of laser interferometers that respectively irradiate the X moving mirror 22x and the Y moving mirror 22y with side long beams (interferometer beams). (Referred to as an interferometer system). In practice, the substrate interferometer system includes a plurality of X laser interferometers corresponding to the X movable mirror 22x and a plurality of Y laser interferometers corresponding to the Y movable mirror 22y. Only the measurement beam from the X laser interferometer is shown. Each of the plurality of laser interferometers is fixed to the apparatus main body. Further, the positional information regarding θx, θy, and the Z-axis direction of the fine movement stage 30 is obtained by, for example, a target 27 fixed to a weight cancellation device 50 described later by a sensor 26 (see FIG. 3) fixed to the lower surface of the fine movement stage 30. It is calculated using. The configuration of the position measurement system of the fine movement stage 30 is disclosed in, for example, US Patent Application Publication No. 2010/0018950.

As shown in FIG. 3, the weight canceling device 50 is composed of a columnar member extending in the Z-axis direction, and is also referred to as a core column. The weight cancellation device 50 is inserted into the opening of the X coarse movement stage 23x and mounted on a Y step surface plate 90 described later. The weight canceling device 50 supports the fine movement stage 30 from below via a leveling device 70 described later.

The weight canceling device 50 includes a casing 51, an air spring 52, a Z slider 53, a pair of arms 54, and the like.

The housing 51 is made of a rectangular member in plan view, and has a circular opening with a + Z side surface opened at the center (see FIG. 2). A plurality of air bearings (hereinafter referred to as “base pads”) 55 whose bearing surfaces face the −Z side are attached to the lower surface of the casing 51.

The air spring 52 is accommodated in the opening of the housing 51. Pressurized gas is supplied to the air spring 52 from the outside.

The Z slider 53 is formed of a cylindrical member extending in the Z-axis direction, is inserted into the opening of the housing 51, and is mounted on the air spring 52.

Each of the pair of arms 54 is composed of a rod-shaped member extending in the Y-axis direction. One of the pair of arms 54 arranged on the + Y side is fixed to the + Y side surface of the casing 51, and the other end is inserted into the cutout portion 42 of the X carriage 40. Similarly, one end of the arm 54 arranged on the −Y side is fixed to the −Y side surface of the casing 51, and the other end is inserted into the cutout portion 42 of the X carriage 40. The other end of each of the pair of arms 54 has an inclined surface that is parallel to the inclined surface formed on the inner side in the Y-axis direction among the inclined surfaces of each of the pair of X beams 25. In addition, on the slope of the other end of each of the pair of arms 54, the X stator 82 disposed on the inner side in the Y-axis direction out of the pair of X stators 82 included in each of the pair of X beams 25 is predetermined. The X movers 56 facing each other through a gap (clearance / gap) are fixed. Each X mover 56 includes a coil unit (not shown) and constitutes an X linear motor that drives the weight canceling device 50 with a predetermined stroke in the X-axis direction together with the opposing X stator 82. Each X mover 56 includes an iron core (not shown), and a magnetic attractive force is generated between the X mover 56 and the opposing X stator 82.

The leveling device 70 is mounted above the weight cancellation device 50. The leveling device 70 is supported in a non-contact manner from below by an air bearing (hereinafter referred to as a sealing pad) 57 attached to the end of the Z slider 53 on the + Z side and having a bearing surface facing the + Z side. The leveling device 70 is a device that supports the fine movement stage 30 so as to be freely tiltable (swingable in the θx and θy directions with respect to the XY plane). The weight cancellation device 50 cancels (cancels) the weight (force in the direction of gravity) of the system including the fine movement stage 30 via the Z slider 53 and the leveling device 70 by the upward force generated by the air spring 52. This reduces the load on the plurality of Z voice coil motors described above.

As shown in FIG. 2, the weight canceling device 50 is connected to an X coarse movement stage 23x (X) via a plurality of (for example, four) connecting devices 45 (hereinafter also referred to as flexure devices 45). It is mechanically connected to the carriage 40). The flexure device 45 is, for example, a thin strip-shaped steel plate (or wire rope, synthetic resin rope, chain, etc.) disposed in parallel to the XY plane, and a smoothing device (for example, provided at both ends of the steel plate). The steel plate is installed between the weight canceling device 50 and the X carriage 40 via a sliding device. The Z positions of the plurality of flexure devices 45 substantially coincide with the center of gravity position of the weight cancellation device 50 in the Z-axis direction. One end of the flexure device 45 is fixed to a corner of the casing 51 (the apex of the casing 51 in a plan view), and the other end is fixed to a side wall member 62 of the X carriage 40. That is, the weight canceling device 50 is pulled by the X coarse movement stage 23x through any of the plurality of flexure devices 45, so that the weight cancellation device 50 is integrated with the X coarse movement stage 23x in the X axis direction or the Y axis direction. Moving. At this time, since the traction force acts on the weight cancellation device 50 in a plane parallel to the XY plane including the center of gravity position in the Z-axis direction, a moment around the axis perpendicular to the movement direction (pitching moment) does not act. The detailed configuration of the weight canceling device 50 of this embodiment including the leveling device 70 and the flexure device 45 is disclosed in, for example, US Patent Application Publication No. 2010/0018950.

As shown in FIG. 1 to FIG. 3, the Y-step surface plate 90 is made of a member having a rectangular YZ section extending in the X-axis direction, and is separated from the pair of X beams 25 by a predetermined distance in plan view ( It is disposed between the pair of X beams 25 in a non-contact state. The dimension in the longitudinal direction of the Y-step surface plate 90 is set slightly longer than the movement stroke of the fine movement stage 30 in the X-axis direction. The dimension in the width direction (Y-axis direction) of the Y-step surface plate 90 is set to a width that can support the base pad 55 included in the weight canceling device 50. The material of the Y-step surface plate 90 is cast iron, dense stone (gabbroic rock), ceramics, CFRP material, etc., and the top surface has a very high flatness.

A slider that includes rolling elements (for example, a plurality of balls or the like) on the lower surface of the Y-step surface plate 90 and that slidably engages with a plurality of Y linear guides 35 a fixed to the upper surfaces of the pair of substrate stage mounts 33. A plurality of (for example, two (see FIG. 2)) 35b is fixed to each Y linear guide 35a. The Y step surface plate 90 is guided in a straight line with a predetermined stroke in the Y-axis direction on the pair of substrate stage mounts 33 by a plurality of Y linear guide devices 35 including a Y linear guide 35a and a Y slider 35b.

As shown in FIG. 2, the Y-step surface plate 90 has a pair of Y carriages 75 via a pair of flexure devices 43 connected to the fixing members 46 fixed to the end surfaces on the + X side and the −X side. Are mechanically connected to each other. The flexure device 43 has substantially the same configuration as the flexure device 45 described above. As a result, when the Y carriage 75 located on one side or the other side in the Y-axis direction is driven in the Y-axis direction, the Y-step surface plate 90 is pulled by the Y carriage 75 and integrated in the Y-axis direction. Moving. The flexure device 43 has lower rigidity in the other five-degree-of-freedom directions (here, X, Z, θx, θy, and θz directions) than the rigidity in the longitudinal direction (here, the Y-axis direction). The Y-step surface plate 90 and the Y coarse movement stage 23y are vibrationally separated.

In the exposure apparatus 10 configured as described above, the mask M is loaded onto the mask stage MST by a mask transport apparatus (mask loader) (not shown) under the control of a main controller (not shown). The substrate P is loaded (loaded) onto the substrate stage device PST by a substrate loading device (not shown). Thereafter, the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as a conventional step-and-scan exposure operation, a detailed description thereof will be omitted.

Here, in the step-and-scan type exposure operation, a plurality of shot areas set on the substrate P are sequentially exposed. The substrate P is driven at a constant speed in the X-axis direction during the scanning operation (hereinafter referred to as X-scan operation), and during the step operation (moving between shot areas), and / or the Y-axis. Driven appropriately in the direction (hereinafter referred to as X-step operation and Y-step operation, respectively).

When the substrate P is moved in the X-axis direction during the X scan operation and the X step operation, the substrate stage device PST moves the X coarse motion stage 23x on the Y coarse motion stage 23y based on the measurement value of the encoder system. While being driven in the X-axis direction, fine movement stage 30 is synchronously driven by X coarse movement stage 23x by a plurality of X voice coil motors 18x based on the measurement value of the substrate interferometer system. Further, when the X coarse movement stage 23x is moved in the X axis direction, the weight cancellation device 50 moves in the X axis direction together with the X coarse movement stage 23x by being pulled by the X coarse movement stage 23x. At this time, the weight canceling device 50 is driven by the main control device in the X-axis direction in synchronization with the X coarse movement stage 23x via a linear motor including the X mover 56 and the X stator 82. At this time, the weight canceling device 50 moves on the Y step surface plate 90. In the X scan operation and the X step operation, the fine movement stage 30 may be slightly driven in the Y axis direction and / or the θz direction with respect to the X coarse movement stage 23x. Since the position does not change, the weight cancellation device 50 always moves only on the Y-step surface plate 90.

On the other hand, in the Y step operation, in the substrate stage apparatus PST, the Y coarse movement stage 23y is driven with a predetermined stroke in the Y-axis direction on the pair of base frames 14, and is integrated with the Y coarse movement stage 23y. The X coarse movement stage 23x moves with a predetermined stroke in the Y-axis direction. The weight canceling device 50 moves with a predetermined stroke in the Y-axis direction integrally with the X coarse movement stage 23x. At this time, the Y step surface plate 90 that supports the weight cancellation device 50 from below is driven synchronously with the Y coarse movement stage 23y. Therefore, the weight canceling device 50 is always supported on the Y step surface plate 90 from below.

Next, the assembly procedure of the substrate stage apparatus PST will be described. In the first embodiment, the substrate stage apparatus PST is arranged on the floor 11 of the clean room with the arrangement shown in FIG. 2, and the pair of substrate stage mounts 33, the pair of base frames 14, and the auxiliary base frame 15 are respectively provided. Installed. Thereafter, a Y carriage 75 is mounted on the pair of base frames 14, and an auxiliary carriage 78 is mounted on the auxiliary base frame 15 via the Y linear guide device 16, and a Y step surface plate is mounted on the pair of substrate stage mounts 33. 90 is mounted via a plurality of Y linear guide devices 35. The Y carriage 75 may be assembled to the pair of base frames 14, and the auxiliary carriage 78 may be assembled to the auxiliary base frame 15 in another place in advance.

Next, the weight cancellation device 50 is mounted on the Y step surface plate 90, and the pair of X beams 25 are mounted on the Y carriage 75 and the auxiliary carriage 78. Thereafter, the X carriage 40 is mounted so that the X stator 82 faces the X mover 56 fixed to the arm 54 of the weight cancellation device 50. The X carriage 40 may be attached to the pair of X beams in advance at different locations. Thereafter, the positions (intervals in the Y-axis direction) of the pair of X beams 25 are adjusted so that the X stator 82 faces the X movable element 56 fixed to the arm 54 of the weight cancellation device 50 with a predetermined gap. The positions may be fixed by the connecting

plates

76 and 77.

Thereafter, fine movement stage 30 (including leveling device 70) is placed on weight canceling device 50, and a plurality of voice coil motor stators and movers are combined. Subsequently, pressurized gas is supplied to the air spring 52, the base pad 55, the sealing pad 57, and the air bearing (not shown) of the leveling device 70 of the weight cancellation device 50, and the fine movement stage 30 is not in contact with the weight cancellation device 50. Supported.

Next, the flow of force applied to the substrate stage apparatus PST will be described. The force applied to the substrate stage apparatus PST described below is generated regardless of whether the fine movement stage 30 is stationary or in operation.

When the substrate stage device PST is assembled, the downward force in the Z-axis direction due to its own weight of the substrate P, the substrate holder 31, and the fine movement stage 30 (including the leveling device 70) (hereinafter referred to as the fine movement stage 30) is shown in FIG. As shown, it travels on the floor 11 in the following flow. The substrate stage apparatus PST in FIG. 4 is schematically shown and corresponds to the components shown in FIGS. 1 to 3 although it is slightly different from the shape shown in FIGS. The same reference numerals are used for the constituent parts.

As shown in FIG. 4, the own weight of the fine movement stage 30 or the like is supported by the Y-step surface plate 90 via the weight cancellation device 50. Here, as shown in FIG. 5, among the pair of arms 54 of the weight cancellation device 50, the arm 54 attached to the + Y side includes an X mover including an iron core fixed to the other end of the arm 54. A magnetic attraction force F acts in a direction inclined by θ with respect to the Y axis in the YZ plane between 56 and the X stator 82 attached to the slope of the X beam 25. Similarly, a magnetic attractive force F acts on the arm 54 attached to the −Y side in a direction inclined by −θ with respect to the Y axis in the YZ plane. Each of the magnetic attraction force F has a component force F ₁ in the vertical direction (Z axis direction), is decomposed into a component force F ₂ in the horizontal direction (Y axis direction). Here, to work in the direction component force F ₂ in the horizontal direction cancel each other, the weight canceling device 50 forces the sum of the component force F ₁ in the vertical direction (i.e. 2F ₁₎ only acts. Therefore, as shown in FIG. 4, a part of the dead weight of the fine movement stage 30 or the like is canceled by the vertical component force F ₁ (2F ₁ ), and the remaining force is transmitted to the Y step surface plate 90. The force transmitted to the Y step surface plate 90 is transmitted to the floor 11 via the substrate stage frame 33 and the vibration isolator 34. On the other hand, the X-beam 25, joined by the reaction force of the component force F ₁ in the vertical direction, its own weight and the vertical direction and the reaction force of the component force F ₁ of the base frame 14 and the auxiliary base frame 15 (see FIG. 1) It is transmitted to the floor 11 through.

As described above, according to the exposure apparatus 10 according to the present embodiment, as shown in FIGS. 6A and 6B, a magnetic attraction force is generated between the weight cancellation apparatus 50 and the X beam 25. Compared with the substrate stage device PSTa that does not generate (FIG. 6A), the substrate stage device PST of this embodiment (FIG. 6B) apparently has a fine movement stage 30 and a weight cancellation device 50 due to the action of magnetic attraction force. Can be regarded as lightweight like a hollow member or the like, for example, so that the center-of-gravity moving distance L when the substrate stage device PST is driven in the cross-scan direction can be shortened. That is, since the substrate stage apparatus PST can reduce the load change received by the vibration isolator 34 when driven in the cross-scan direction, the distortion of the exposure apparatus 10 can be reduced and the exposure accuracy can be improved. be able to.

Further, since a part of the vertical downward force due to the dead weight of the fine movement stage 30 and the weight canceling device 50 is transmitted to the X beam 25, the Y step surface plate 90 reduces the vertical downward force acting on itself. Can do. Therefore, the base pad 55 that supports the weight canceling device 50 can be a small base pad with a small load capacity. That is, the Y-step surface plate 90 can reduce the guide surface (Y-axis direction dimension) that supports the base pad 55.

Further, since the load applied to the Y step surface plate 90 is reduced, the rigidity of the Y step surface plate 90 can be lowered. Therefore, the Y step surface plate 90 can be reduced in size, for example, by reducing the thickness.

Also, since the Y step surface plate 90 is downsized in the substrate stage apparatus PST, the driving force for moving the Y step surface plate 90 stepwise in the Y-axis direction can be reduced.

Next, other embodiments of the exposure apparatus will be described. In each of the following embodiments, the parts other than the substrate stage apparatus are the same as those of the exposure apparatus 10 according to the first embodiment described above. Only the substrate stage apparatus will be described below because it is the same.

<< Second Embodiment >>
Next, a second embodiment will be described based on FIG. Here, the same or similar components as those in the first embodiment described above are denoted by the same or similar reference numerals, and the description thereof is simplified or omitted.

The overall configuration of the substrate stage apparatus PST1 according to the second embodiment is the same as that of the above-described substrate stage apparatus PST, except that an X beam 125 is provided instead of the X beam 25, and Some configurations are different from the substrate stage apparatus PST, such as the X carriage 140 being partially different from the X carriage 40. Hereinafter, the difference between the two will be mainly described.

As shown in FIG. 7, each of the pair of X beams 125 included in the substrate stage apparatus PST1 has a shape in which four vertices of a rectangle (including a rhombus and a square) are cut off (chamfered) in the YZ section. That is, it has an octagonal shape. One (+ Y side) X beam 125 is fixed to the upper surface of one Y carriage 75 via the attachment member 124 in a state inclined at an angle φ (for example, 45 degrees) with respect to the Y axis with respect to the θx direction. The other (−Y side) X beam 125 is symmetrical to one X beam 125, that is, tilted at an angle −φ with respect to the Y axis with respect to the θx direction through the mounting member 124. It is fixed on the top surface. Each of the pair of X beams 125 has four inclined surfaces (surfaces inclined with respect to the XY plane).

Of the four slopes of one X beam 125, a pair of opposite slopes that are not fixed to the attachment member 124, that is, a first slope on the + Y side and + Z side and a second slope on the -Y side and -Z side. In addition, each of the pair of X stators 82 extends substantially over the entire length in the longitudinal direction (X-axis direction). Further, an X linear guide 17a extending in the X-axis direction is provided on the fourth inclined surface (that is, the −Y side and + Z side inclined surface) opposite to the third inclined surface fixed to the attachment member 124 of one X beam 125. A plurality (for example, two) are fixed in parallel to each other at a predetermined interval in a direction parallel to the inclined surface.

The other X beam 125 is provided with a pair of X stators 82 and a plurality of X linear guides 17a in a symmetrical arrangement with the one X beam.

Each of the pair of X carriages 140 is made of a member having an inverted U-shaped YZ section having a ceiling portion and two pairs of side wall portions provided at both longitudinal ends of the ceiling portion. One (+ Y side) X carriage 140 faces the first, second, and fourth inclined surfaces of the X beam 125 in a state where it is tilted with respect to the Y axis in the θx direction in a side view (viewed from the + X direction). Are arranged. Further, the one X carriage 140 has a notch portion in the vicinity of the central portion in the X-axis direction of the side wall portion (portions facing the first and second inclined surfaces of the X beam 125) in the same manner as the X carriage 40 described above. 42 is formed (see FIG. 2), and the arm 54 is inserted into one of the cutouts 42 thereof.

On the inner surfaces of the pair of side walls of one X carriage 140, a pair of X stators 82 fixed to the first and second inclined surfaces of the X beam 125 described above are provided with a predetermined gap (clearance / gap). Each of the pair of X movers 81 facing each other is fixed. A plurality of (for example, four) sliders 17b including rolling elements and slidably engaged with the X linear guides 17a are fixed to the inner surface of the ceiling portion of the X carriage 140 with respect to each X linear guide 17a. Yes.

The other (−Y side) X carriage 140 is symmetrical with one X carriage 140, but is configured in the same manner, and is similarly provided with a pair of X movers 81 and a plurality of sliders 17b.

The X stator 82 and the X mover 81 facing each other constitute a moving coil type X linear motor driven by electromagnetic force (Lorentz force). The X coarse movement stage 123x is driven in the X-axis direction by these X linear motors. At that time, the X coarse movement stage 123x is linearly moved in the X-axis direction by a plurality of X linear guide devices including the X linear guide 17a and the slider 17b. Guided.

In this embodiment, regardless of whether the X coarse movement stage 123x is driven or stopped, the first inclined surface of the X beam 125 is between one (+ Y side) X beam 125 and the X carriage 140 engaged therewith. A magnetic attraction force Fb is generated between the X stator 82 fixed to the X and the X movable element 81 opposed thereto, and the X stator 82 fixed to the second inclined surface of the X beam 125 and the X stator opposed thereto. A magnetic attractive force Fb is also generated between the movable element 81 and the movable element 81. The two magnetic attraction forces Fb are equal in magnitude and are directly facing each other. Of course, the two magnetic attractive forces Fb are equal to the vertical component force F ₃ and the horizontal component force F ₄ . Therefore, between the X beam 125 on one side (+ Y side) and the X carriage 140, the force that drives the X carriage 140 in the Z-axis and Y-axis directions does not act on the X beam 125 as a whole. Similarly, the force that drives the X carriage 140 in the Z-axis and Y-axis directions does not act on the X beam 125 as a whole even between the other (−Y side) X beam 125 and the X carriage 140. That is, a predetermined gap between the diagonally upward X mover 56 (coil unit with core (see FIG. 5)) attached to the ends of the pair of arms 54 of the weight cancellation device 50 and the X stator 82 (magnet unit). (Clearance / gap) is maintained.

As described above, according to the substrate stage apparatus PST1 according to the second embodiment, an effect equivalent to that of the substrate stage apparatus PST according to the first embodiment can be obtained. In addition, according to the substrate stage apparatus PST1, the magnetic attractive force Fb acting between the pair of X beams 125 and the pair of X carriages 140 is canceled out, so that the pair of X carriages 140 (X slider 17b) It is possible to prevent a vertical upward force from being applied. Therefore, the tilt angle φ (−φ) of the pair of X beams 125 and the tilt angle φ of the arm 54 facing the X beam 125 are arbitrarily set to predetermined angles, thereby preventing the pair of X carriages 140 from being lifted. In this state, it is possible to arbitrarily set the vertical downward force applied to the base pad 55 and the Y step surface plate 90. As a result, the base pad 55 can be further miniaturized and the Y step surface plate 90 can be further miniaturized.

<< Third Embodiment >>
Next, a third embodiment will be described with reference to FIGS. Here, the same or similar components as those in the second embodiment described above are denoted by the same or similar reference numerals, and the description thereof is simplified or omitted.

The overall configuration of the substrate stage apparatus PST2 according to the third embodiment is the same as that of the substrate stage apparatus PST1 according to the second embodiment described above, but the X carriage 140 and the weight cancellation apparatus 50 are different. Instead, a part of the configuration is different from the substrate stage device PST1 in that an X carriage 240 and a weight cancellation device 250 are provided. Hereinafter, the difference will be mainly described.

As shown in FIG. 8, each of the pair of X carriages 240 includes a flat plate-like ceiling portion 63 that extends in the X-axis direction, and a pair of side wall portions 64 that are provided at a longitudinal intermediate portion of the ceiling portion 63. And has an inverted U-shape when viewed from the side (viewed from the + X direction) (see FIG. 9). In FIG. 8, the pair of X carriages 240 is illustrated in a simplified manner. Further, as shown in FIG. 9, one (+ Y side) X carriage 240 is tilted with respect to the Y axis in the θx direction as viewed from the side (viewed from the + X direction), and the first X beam 125 The second and fourth slopes are disposed opposite to each other. As can be seen from a comparison between FIG. 2 and FIG. 8, one X carriage 240 has a smaller dimension in the X-axis direction than the above-described

X carriages

40 and 140, and a notch is formed near the center in the X-axis direction. Absent.

As shown in FIG. 9, a predetermined pair of X stators 82 fixed to the first and second inclined surfaces of the X beam 125 described above are provided on the inner surfaces of the pair of side wall portions 64 of one X carriage 240. Each of the pair of X movers 81 facing each other through a gap (clearance / gap) is fixed. A plurality of (for example, four) sliders 17b including rolling elements and slidably engaged with the X linear guides 17a are fixed to the inner surface of the ceiling portion 63 of the X carriage 240. ing.

The other (−Y side) X carriage 240 is symmetrical with one X carriage 240, but is configured in the same manner, and is similarly provided with a pair of X movers 81 and a plurality of sliders 17b.

The X stator 82 and the X mover 81 facing each other constitute a moving coil type X linear motor driven by electromagnetic force (Lorentz force). The X coarse motor stage 223x is driven in the X-axis direction by these X linear motors. At that time, the X coarse motor stage 223x goes straight in the X-axis direction by a plurality of X linear guide devices including the X linear guide 17a and the slider 17b. Guided.

Returning to FIG. 8, the weight canceling device 250 has a pair of X arms 254 fixed to both side surfaces in the Y-axis direction of the casing 51. Each of the pair of X arms 254 is made of a rod-shaped member extending in the X-axis direction, and the X-axis direction length is somewhat larger than the X-axis direction length of the inverted U-shaped section of the X carriage 240. long. Each of the pair of X arms 254 is connected to the side wall portion 64 of the X carriage 240 via the flexure device 45 at the center position in the X axis direction on the outer surface in the Y axis direction. The height of the flexure device 45 substantially matches the position of the center of gravity of the weight cancellation device 250 in the Z-axis direction. Each of the pair of X arms 254 is connected to the pair of Y arms 255 at both ends in the longitudinal direction. Each of the pair of Y arms 255 is composed of a rod-like member extending in the Y-axis direction, and the length in the Y-axis direction is substantially the same as the distance between the pair of X carriages 240. Further, each of the pair of Y arms 255 is connected to the connecting plate 41 via the flexure device 45 at the center position in the Y-axis direction on the outer surface in the X-axis direction. A predetermined gap (with respect to the X stator 82 disposed on the inner side in the Y-axis direction among the pair of X stators 82 included in each of the pair of X beams 125 is provided on both end surfaces of the pair of Y arms 255 in the longitudinal direction. The X movers 56 that face each other via a clearance / gap are fixed. Each X mover 56 includes a coil unit with a core (not shown) and constitutes a moving coil type linear motor that drives the weight canceling device 250 in the X-axis direction together with the opposing X stator 82 (magnet unit). .

As described above, according to the substrate stage apparatus PST2 according to the third embodiment, an effect equivalent to that of the substrate stage apparatus PST1 according to the second embodiment can be obtained. In addition, according to the substrate stage device PST2, the magnetic attraction force acts on both ends of the pair of Y arms 255, so that the upward force acting on the weight cancellation device 250 can be increased. In addition, since the weight cancellation device 250 is supported (fixed) by the X arm 254 at two locations in the vicinity of the center in the longitudinal direction of the Y arm 255 on which the magnetic attraction force works, the magnetic attraction force acts on both ends of the Y arm 255. It is possible to prevent the Y arm 255 from being bent at the time, and it is possible to always generate a constant magnetic attractive force in the weight canceling device 250.

<< Fourth Embodiment >>
Next, a fourth embodiment will be described with reference to FIGS. Here, the same or similar components as those in the first embodiment described above are denoted by the same or similar reference numerals, and the description thereof is simplified or omitted.

The overall configuration of the substrate stage apparatus PST3 according to the fourth embodiment is the same as that of the above-described substrate stage apparatus PST, but the shapes of the X beam 325, the X carriage 340, and the weight cancellation apparatus 350 are as follows. The substrate stage apparatus PST is different from the X beam 25, the X carriage 40, and the weight cancellation apparatus 50 described above in part. Hereinafter, the difference will be mainly described.

As shown in FIGS. 10 and 11, the pair of X beams 325 is composed of a rod-like member extending in the X-axis direction. Each of the pair of X beams 325 is different from the X beam 25 in the shape of the YZ cross section. That is, each of the pair of X beams 325 has a hollow portion that is divided into two portions by a rib portion parallel to the XZ plane extending in the X-axis direction provided in the center in the Y-axis direction and having a rectangular outer shape in the YZ section. It is a member. Each of the pair of X beams 325 has an X stator 82 extending in the X axis direction fixed to both sides in the Y axis direction, and a plurality of (for example, two) X linear guides 17a extending in the X axis direction on the upper surface in the Y axis direction. Are fixed at predetermined intervals.

As shown in FIG. 11, each of the pair of X carriages 340 has a flat plate member 65 extending in the X-axis direction and upper and lower sides of the flat plate member 65 at both sides in the Y-axis direction. It has a pair of side wall members 66 parallel to the Z-axis that are fixed so that the end surfaces are substantially flush with the upper surface of the flat plate member 65. That is, each of the pair of X carriages 340 has an inverted U-shaped cross section in the YZ section at the center in the X-axis direction, and is disposed across each of the pair of X beams 325 (see FIG. 10).

As shown in FIG. 10, the X carriage 340 on one side (+ Y side) has a slider 17b slidably engaged with the X linear guide 17a on the lower surface (ceiling surface) of the flat plate member 65. A plurality (for example, four) of the X movable element 81 is fixed to the inner surface of each of the pair of side wall members 66 and is opposed to each of the pair of X stators 82 via a predetermined gap (clearance / gap). Each is fixed. The other (−Y side) X carriage 340 is configured in the same manner as the one X carriage 340.

As shown in FIG. 11, the pair of X carriages 340 are coupled via a coupling plate 341 that couples the side wall members 66 arranged on the inner side in the Y-axis direction among the pair of side wall members 66 that each has. Yes. The connecting plate 341 is made of a flat plate member having a circular opening 342 formed in the center in plan view, and has a predetermined length in the X-axis direction (for example, substantially the same length as the side wall member 66). On the lower surface of the connection plate 341, permanent magnets 343 are fixed at a plurality of locations around the opening 342 (for example, four locations at intervals of 90 degrees) (see FIG. 10). The permanent magnet 343 is not particularly limited as a material, but is formed using, for example, a ferrite magnet, a neodymium magnet, an alnico magnet, or the like.

10, the weight canceling device 350 is inserted into the opening 342 from below and supported on the Y step surface plate 90 via the base pad 55. The weight canceling device 350 is different from the weight canceling device 50 described above in the shape of the housing 351, the connection position of the flexure device 45, and the like.

The housing 351 is formed of a bottomed cylindrical member having an open top surface. The housing 351 has an annular collar portion 352 around the bottom surface. In the collar portion 352, magnetic bodies 353 are arranged at a predetermined interval (predetermined angular interval) so as to face the permanent magnet 343 fixed to the connecting plate 341 on the upper surface of the outer peripheral edge portion. When the weight cancellation device 350 is mounted on the Y-step surface plate 90 via the base pad 55 in a non-contact state, the permanent magnet 343 and the magnetic body 353 face each other with a predetermined gap (clearance / gap). Are arranged to be. The magnetic body 353 is made of a block-shaped member having a certain thickness, and is not particularly limited as a material, but is formed using, for example, iron oxide, chromium oxide, cobalt, or ferrite.

One end of the flexure device 45 is fixed to the outer peripheral surface of the housing 351 at a predetermined interval (predetermined angular interval) (for example, four), and the other end is fixed to the inner peripheral surface of the opening formed in the connecting plate 341. (See FIG. 11).

As the permanent magnets 343 fixed to a plurality of locations on the lower surface of the connecting plate 341, a single permanent magnet may be used, but the present invention is not limited thereto, and a plurality of magnets may be used in combination.

As an example, as shown in FIG. 12A, a pair of

permanent magnets

343a and 343b having different polarities are fixed to a lower surface of a yoke 344 embedded in a lower surface of the connecting plate 341 at a predetermined interval, thereby One permanent magnet 343 may be configured. In the example of FIG. 12A, the permanent magnet 343a arranged on the −Y side has the S pole on the + Z side surface and the N pole on the −Z side, while the permanent magnet 343b arranged on the + Y side has the + Z side surface. Is the N pole, and the -Z side is the S pole. A magnetic attractive force Fc is generated between the pair of

permanent magnets

343a and 343b and the magnetic body 353. As shown in FIG. 12B, a permanent magnet 345 may be disposed so as to face the permanent magnet 343 instead of the magnetic body 353. At this time, the permanent magnet 345 is arranged so that one side facing the permanent magnet 343a is an S pole and the other side facing the permanent magnet 343b is an N pole.

As described above, according to the substrate stage apparatus PST3 according to the fourth embodiment, an effect equivalent to that of the substrate stage apparatus PST according to the first embodiment can be obtained. In addition to this, according to the substrate stage apparatus PST3, since the force to lift the X carriage 340 does not work, it is possible to prevent the X carriage 340 from being lifted. As a result, in the substrate stage apparatus PST3, the magnetic attractive force Fc acting between the permanent magnet 343 and the magnetic body 353 can be adjusted to an arbitrary magnitude, and as a result, the Y-step surface plate 90 and The load applied to the vibration isolator 34 can be reduced freely.

<< First Modification of Fourth Embodiment >>
Next, a first modification of the fourth embodiment will be described with reference to FIG. Here, the same or similar components as those in the fourth embodiment described above are denoted by the same or similar reference numerals, and the description thereof is simplified or omitted.

In the substrate stage apparatus PST3a according to this modification, the position of the collar portion 352 and the connecting plate 341 of the weight cancellation device 350 in the substrate stage apparatus PST3 are interchanged, and accordingly the flexure device 45 causes the collar portion 352 and the X carriage 340 to be replaced. And the above-described substrate stage device is that a part of the weight of the fine movement stage 30 acting on the Y-step surface plate 90 is reduced by the magnetic repulsive force Fd between the permanent magnet 343 and the permanent magnet 346. Different from PST3.

As shown in FIG. 13, the weight canceling device 350a according to this modification is a position at a height that substantially matches the center position of the casing 351a in the Z-axis direction, specifically, the center of gravity of the weight canceling device 350a. A collar portion 352 is provided. A permanent magnet 343 is fixed to the outer peripheral edge portion of the lower surface of the collar portion 352. Further, one end of a plurality of (for example, four) flexure devices 45 is connected to the outer peripheral surface of the collar portion 352 at a predetermined interval (predetermined angular interval). The other end of the flexure device 45 is connected to a side wall member 66 arranged on the inner side in the Y-axis direction among the side wall members 66 of the X carriage 340.

The connecting plate 341 for connecting the pair of X carriages 340 is fixed to the lower end portion of the side wall member 66 arranged on the inner side in the Y-axis direction among the side wall members 66 of the pair of X carriages 340. Further, around the opening on the upper surface of the connecting plate 341, permanent magnets 346 that exert a repulsive magnetic force on the permanent magnets 343 are fixed at positions facing the permanent magnets 343, respectively.

As described above, according to the substrate stage device PST3a according to the first modification, the same effect as the substrate stage device PST3 according to the fourth embodiment can be obtained, and the collar portion to which the permanent magnet 343 is fixed. 352 is fixed in the vicinity of the intermediate position in the Z-axis direction of the weight canceling device 350a, and the connecting plate 341 to which the permanent magnet 346 is fixed is fixed to the lower end portion of the X carriage 340. Arranged somewhat below the Z position. Thereby, the substrate stage apparatus PST3a has improved stability when it is movable in the scan direction and the cross scan direction.

<< Second Modification of Fourth Embodiment >>
Next, a second modification of the fourth embodiment will be described with reference to FIG. Here, the same or similar components as those in the fourth embodiment described above are denoted by the same or similar reference numerals, and the description thereof is simplified or omitted.

In the substrate stage device PST3b according to this modification, the shape of the X beam 325b and the shape of the X carriage 340b are different from the shape of the X beam 325 and the shape of the X carriage 340 of the substrate stage device PST3 described above.

Each of the pair of X beams 325b is composed of a rod-shaped member extending in the X-axis direction, and the shape of the YZ cross section is an approximately isosceles trapezoid in which the top side is slightly longer than the bottom side. That is, each of the pair of X beams has an upper surface and a lower surface parallel to the XY plane, and a pair of inclined surfaces (both sides in the Y-axis direction) inclined by a predetermined angle θ and −θ in the θx direction with respect to the XZ plane. . Similar to the X beam 325, the X linear guide 17a and the X stator 82 are fixed to the upper surface and a pair of inclined surfaces (both sides in the Y-axis direction) of the X beam 325b, respectively.

The pair of X carriages 340b is different from the pair of sidewall members 66 of the X carriage 340 in the shape of the pair of side wall members 68 that each pair has. That is, the side wall member 68 on the + Y side and the −Y side that make a pair with each other has a first portion parallel to the XZ plane from the upper end (+ Z side end) to the vicinity of the central portion, and a lower portion (−Z And a second portion that is inclined to the −Y side or the + Y side toward the side end) and is opposed to the two inclined surfaces of the X beam 325b described above. A slider 17b that is slidably engaged with the X linear guide 17a is fixed to the ceiling surface of the pair of X carriages 340b (the lower surface of the flat plate member 65), and the X stator is fixed to the second portion of the inner wall surface of the side wall member 68. An X mover 81 is fixed so as to oppose 82 via a predetermined gap (clearance / gap) and generate a magnetic attractive force Fe. The magnetic attractive force Fe acting between one X beam 325b and the X carriage 340b cancels the horizontal component force, and similarly, the magnetic attractive force Fe acting between the other X beam 325b and the X carriage 340b is The horizontal component force is canceled out. In other words, the magnetic attraction force Fe acting on the X carriage 340b is only applied with a component force upward in the vertical direction with respect to the X carriage 340b.

As described above, according to the substrate stage apparatus PST3b according to this modification, the same effect as the substrate stage apparatus PST3 according to the fourth embodiment can be obtained, and the downward force applied to the X carriage 340b can be reduced. Therefore, when the substrate stage device PST3b is driven in the X-axis direction, the driving resistance generated between the X slider 17b and the X linear guide 17a can be reduced. In addition to the X mover 81 and the X stator 82 that generate the magnetic attractive force Fe that reduces the downward force acting on the X carriage 340b described above, the weight of the weight canceling device 350 that works on the substrate stage pedestal 33, etc. Since the permanent magnet 343 and the magnetic body 353 that generate the magnetic attractive force Fc for reducing a part of the magnetic attractive force are provided, the magnetic attractive force can be set to have a predetermined magnetic attractive force.

<< Fifth Embodiment >>
Next, a fifth embodiment will be described with reference to FIGS. 15 and 16. Here, the same or similar components as those in the first embodiment described above are denoted by the same or similar reference numerals, and the description thereof is simplified or omitted.

The overall configuration of the substrate stage apparatus PST4 according to the fifth embodiment is the same as that of the substrate stage apparatus PST. However, the shape of the X beam 325 and the shape of the X carriage 440 are the same as those of the X beam 25 described above. And the shape of the X carriage 40, and a part of the configuration is different from the substrate stage apparatus PST, such as a method of reducing the load applied to the vibration isolator 34. Hereinafter, the difference will be mainly described.

As shown in FIGS. 15 and 16, the pair of X beams 325 in the present embodiment is composed of members having the same shape as the pair of X beams 325 used in the fourth embodiment described above, and similarly The X linear guide 17a and the pair of X stators 82 are fixed to the upper surface and the pair of side surfaces.

As shown in FIGS. 15 and 16, the pair of X carriages 440 includes a flat plate member 59 having a rectangular shape in plan view with the X axis direction as the longitudinal direction, and Y at one end and the other end in the longitudinal direction of the flat plate member 59. On both end faces in the axial direction, there are a pair of side wall members 58 parallel to the Z axis, each pair being fixed in a state where the respective upper end faces are substantially flush with the upper surface of the flat plate member 59. As shown in FIG. 16, the X carriage 440 has an inverted U-shape when viewed from the + X direction, and the X beam 325 is provided between the + Y side and −Y side side wall members 58 that form a pair with each other. Has been inserted. A notch 42 is provided near the center of the longitudinal direction (X-axis direction) of the X carriage 440 (see FIG. 15).

In each of the pair of X carriages 440, a plurality of (for example, four) sliders 17b, which are slidably engaged with the X linear guides 17a, are fixed to the ceiling surface (the lower surface of the flat plate member 59). In addition, each of the X movers 81 that are opposed to each of the pair of X stators 82 via a predetermined gap (clearance / gap) is fixed to the inner wall surface of the side wall member 58.

In the first embodiment described above, the X mover 56 is fixed to the tip of the pair of arms 54 fixed to the weight canceling device 50, respectively, and part of the load in the gravity direction acting on the vibration isolator 34 is reduced. However, as shown in FIG. 16, the weight cancellation device 450 according to the present embodiment is not provided with the arm 54 and the X mover 56. That is, the weight canceling device 450 includes a housing 51, an air spring 52, a Z slider 53, a base pad 55, and the like. The weight cancellation device 450 is connected to a pair of X carriages 440 via a plurality of (for example, four) flexure devices 45 connected to the casing 51. Each flexure device 45 is disposed at substantially the same height as the center of gravity of the weight cancellation device 450.

Referring back to FIG. 15, each of the pair of base frames 414 is composed of a rod-shaped member extending in the Y-axis direction. Each of the pair of base frames 414 has an upper surface and a lower surface parallel to the XY plane, and one surface (slope) slightly inclined in the θx direction with respect to the YZ plane and the same angle in the opposite direction (−θx direction). It includes a main body portion 414a made of a hollow member having an inclined other surface (inclined surface), and a plurality of leg portions 14b that support the main body portion 414a from below. A plurality of adjusters 14c are provided at the lower end of each leg 14b so that the Z position of the main body 414a can be adjusted.

A Y stator 73 extending in the Y-axis direction, which is an element of the linear motor, is fixed to both side surfaces (a pair of opposed slopes) in the X-axis direction of the main body 414a. Further, a plurality of (for example, two) Y linear guides 16a extending in the Y-axis direction, which is an element of a mechanical Y linear guide device (single-axis guide device) extending in the Y-axis direction, are provided on the upper surface of the main body 414a. ) They are fixed parallel to each other.

The main body 414a is disposed (inserted) between a pair of opposing surfaces (between the side wall members) of the Y carriage 475 made of a member having an inverted U-shaped XZ cross section. A plurality of (for example, two) Y carriages 475 are arranged apart from one base frame 414 in the Y-axis direction, and each Y carriage 475 is connected to each other by a plate 76 fixed to the upper surface. . The pair of opposing surfaces of the Y carriage 475 are a first part parallel to the YZ plane from the upper end (+ Z side end) to the vicinity of the center part, and a −X side from the vicinity of the center part to the lower end (−Z side end). Alternatively, it has a second portion that is inclined to the + X side and faces the two inclined surfaces of the main body portion 414a of the base frame 414 described above. When mounted on the base frame 414, the Y carriage 475 is set so that the two inclined surfaces of the main body portion 414a and the second portions of the pair of opposing surfaces of the Y carriage 475 facing each other are parallel to each other. Yes. A pair of Y movers 472 that are opposed to each of the pair of Y stators 73 via a predetermined gap (clearance / gap) are fixed to each of the second portions of the pair of facing surfaces of the Y carriage 475. ing. Each Y mover 472 includes a coil unit with a core (not shown), and constitutes a Y linear motor that drives the X beam 325 with a predetermined stroke in the Y-axis direction together with the opposing Y stator 73. Further, a magnetic attraction force Ff is generated between each Y mover 472 and the opposing Y stator 73. A plurality of (for example, two) sliders 16 b slidably engaged with the Y linear guide 16 a are fixed to the ceiling surface of the Y carriage 475 with respect to each Y carriage 475.

The Y-step surface plate 490 is composed of a rod-like member extending in the X-axis direction and is mounted on the substrate stage mount 33. A Y movable element 94 is fixed to both ends in the longitudinal direction of the Y step surface plate 490 via a fixing member 446 and facing the Y stator 73 via a predetermined gap (clearance / gap). Each Y mover 94 includes a coil unit with a core (not shown) and constitutes an X linear motor that drives the Y step surface plate 490 with a predetermined stroke in the X axis direction together with the opposing Y stator 73. Further, a magnetic attractive force Fg is generated between each Y mover 94 and the opposing Y stator 73.

A magnetic attractive force Fg acts in the + X direction and the + Z direction between the Y mover 94 fixed to the + X side fixing member 446 of the Y step surface plate 490 and the Y stator 73 facing the Y mover 94, and the Y step A magnetic attractive force Fg acts in the −X direction and the + Z direction between the Y mover 94 fixed to the fixing member 446 on the −X side of the surface plate 490 and the Y stator 73 facing the Y mover 94. In this case, the horizontal component forces of the two magnetic attractive forces Fg are equal in magnitude and opposite in direction (because they face each other), so they are canceled out. That is, the above-described two magnetic attractive forces Fg apply a vertically upward force to the Y-step surface plate 490, and the reaction force is transmitted to the floor 11 via the base frame 414.

As described above, the substrate stage apparatus PST4 according to the fifth embodiment can obtain the same effects as those of the substrate stage apparatus PST according to the first embodiment. Further, in the substrate stage apparatus PST4, the load applied to the vibration isolator 34 is reduced, so that it is possible to reduce the unbalanced load that acts on the vibration isolator 34 when the substrate stage apparatus PST4 is driven.

<< Modification of Fifth Embodiment >>
Next, a modification of the fifth embodiment will be described with reference to FIG. Here, the same or similar components as those in the fifth embodiment described above are denoted by the same or similar reference numerals, and the description thereof is simplified or omitted.

In the substrate stage apparatus PST4a according to this modified example, the Y movable element 94 is not provided on the fixed members 446 provided at both ends in the longitudinal direction of the Y step surface plate 490a, and the magnetic body 96 is provided on the upper surface of the fixed member 446. Is different from the substrate stage apparatus PST4 in that a permanent magnet 97 is provided on the X carriage 475a via a predetermined gap (clearance / gap) above the magnetic body 96.

The permanent magnet 97 is actually fixed to the lower surface of the fixing member 478. On the + X side of the Y-step surface plate 490a, the fixing member 478 is connected to a plurality of (for example, two) Y-carriages 475a arranged at predetermined intervals in the Y-axis direction. It is fixed to the upper end of the side. The permanent magnet 97 is fixed to the lower surface of the fixing member 478 so as to face the magnetic body 96 with a predetermined gap. That is, in the Y-step surface plate 490a according to this modification, the magnetic attractive force generated between the Y stator 73 fixed to the main body 414a of the base frame 414 and the Y mover 472 fixed to the Y carriage 475a. An upward force in the vertical direction is applied by a magnetic attractive force Fh generated between the magnetic body 96 and the permanent magnet 97, independent of Ff. The other configuration of the Y carriage 475a is the same as that of the Y carriage 475 described above.

As described above, the substrate stage apparatus PST4a according to the modification of the fifth embodiment can obtain the same effects as those of the fifth embodiment. In addition, according to the substrate stage device PST4a, the vertical upward magnetic attraction force Fh acting on the Y step surface plate 490a and the magnetic attraction force Ff acting on the Y carriage 475a are generated by independent magnetic generators. The magnetic attractive force Fh acting on the surface plate 490a and the magnetic attractive force Ff acting on the Y carriage 475a can be set to predetermined forces, respectively. That is, it is possible to reduce the load load (uneven load) acting on the vibration isolator 34 and the drive resistance applied to a plurality of Y linear guide devices including the Y linear guide 16a and the slider 16b to a predetermined value.

The apparatus configurations described in the first to fifth embodiments and the modifications (hereinafter referred to as the embodiments) are merely examples, and various modifications can be made. For example, in each of the above-described embodiments, the gravity direction acting on the Y-

step surface plates

90, 490, and 490a, the substrate stage gantry 33 and the vibration isolator 34 that support the Y-

step surface plates

90, 490, and 490a using a magnetic attractive force or a magnetic repulsive force. However, the present invention is not limited to this, and the electromagnetic force in the direction having the vertical component force is applied to the linear motor for driving the X coarse movement stage or the linear motor for driving the Y coarse movement stage. Is generated, the Y

step surface plates

90, 490, and 490a that use the vertical component of the electromagnetic force, the substrate stage gantry 33 that supports this, and the load load in the gravity direction acting on the vibration isolator 34 are applied. The substrate stage devices PST, PST1, PST2, PST3, PST3a, PST3b, PST4, and PST4a may be provided with a load reducing device that reduces the load.

In addition, in the above embodiments, the above-described load reduction is achieved by combining a stator (magnet unit) and a magnetic member instead of a combination of a stator (magnet unit) and a mover (coil unit with a core). An apparatus may be configured. Alternatively, an electromagnet may be used instead of at least a part of the permanent magnets constituting the load reducing device.

In each of the above embodiments, the substrate stage apparatuses PST, PST1, PST2, PST3, PST3a, and PST3b including the

weight cancellation devices

50, 250, 350, 350a, and 450 that move on the Y-

step surface plates

90, 490, and 490a. , PST4, and PST4a are described above, but the present invention is not limited to this. For example, in a scanning type exposure apparatus having a substrate stage apparatus having a weight canceling apparatus disclosed in US Patent Application Publication No. 2010/0018950. , Including a stator (magnet) provided on the Y coarse movement stage and a mover (coil) provided on the X coarse movement stage, and driving the X coarse movement stage with a predetermined stroke in the X-axis direction (scanning direction) Between the X linear motor, the coil constituting the mover, and a part of the weight canceling device. Using the force, the load relief device to reduce the load application direction of gravity acting on the support cradle comprising a base plate for supporting the weight canceling device from below, it may be provided. In such a case, during the exposure process of the substrate (object), the X coarse movement stage that can move in the direction parallel to the horizontal plane together with the substrate holder (object holding member) that holds the substrate is driven in the X-axis direction by the linear motor. The At this time, a load load in the direction of gravity due to the weight of the substrate holder and the weight canceling device acts on the support frame, but the load load acts between a part of the weight canceling device and the load reducing device. This is mitigated by using force to transfer some force from the weight cancellation device to the X coarse stage. Therefore, it is possible to reduce the offset load acting on the support frame due to the movement of the center of gravity of the system including the substrate holder, the weight canceling device, and the support frame, thereby maintaining the exposure accuracy with sufficient accuracy.

Also, the modification examples of the first to fourth embodiments may be used in combination with the fifth embodiment and its modification examples. That is, a device that generates a vertically upward force on the

weight canceling devices

50, 250, 350, 350a, and 450, and a device that generates a vertically upward force on the Y-

step surface plates

90, 490, and 490a. May be used in combination.

In each of the above embodiments, the pair of

X carriages

40, 140, 240, 340, 340 b, and 440 are connected by connecting

plates

41 and 341, but instead of the connecting

plates

41 and 341, a pair of X carriages is used. The main controller may be driven synchronously in the X-axis direction. Similarly, a plurality of

Y carriages

75, 475, 475 a mounted on one

base frame

14, 414 are respectively connected by a plate 76, but a plurality of

Y carriages

75, 475, 475 a are replaced with the plate 76. The main controller may be driven synchronously in the Y-axis direction.

In each of the above embodiments, the Y-

step surface plates

90, 490, and 490a are solid members. However, the present invention is not limited to this and may be hollow members, and ribs are provided inside the hollow members. It may have a shape. For example, a Y-step surface plate made of a hollow member may be manufactured by casting or the like.

In the first embodiment, the flexure device 45 that connects the weight cancellation device 50 and the X carriage 40 may be arranged so that the weight cancellation device 50 can be pulled only in the Y-axis direction. Further, if the weight canceling device 50 is driven by the flexure device 45 in the X-axis direction and the Y-axis direction together with the X carriage 40, the magnetic element is replaced with the X mover 56 fixed to the tip of the arm 54 of the weight canceling device 50. You may fix your body.

Further, in the fourth embodiment and the modified example of the fourth embodiment, the pair of

X carriages

340 and 340b are connected by the connection plate 341 in which the opening is formed. , 340b may be coupled by a plurality of coupling plates that are spaced apart in the X-axis direction. Further, the collar portion 352 fixed to the

weight canceling devices

350 and 350a is not necessarily provided on the entire circumference of the

weight canceling devices

350 and 350a, and may be a rod-like member extending in the outer peripheral direction.

In the modification of the fifth embodiment, the magnetic body 96 is disposed at both ends in the longitudinal direction of the Y-step surface plate 490a. However, the present invention is not limited to this, and if an upward force in the vertical direction acts on the Y-step surface plate 490a. For example, the magnetic body 96 is disposed via a fixing member in the middle portion in the longitudinal direction of the Y-step surface plate 490a, and the permanent magnet 97 is fixed to the lower surface of the X beam 325 so that the permanent magnet 97 is disposed on the opposite surface. You may do it.

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

In each of the above-described embodiments, the case where the projection optical system PL is a multi-lens projection optical system including a plurality of projection optical units has been described, but the number of projection optical units is not limited thereto, One or more is enough. The projection optical system is not limited to a multi-lens type projection optical system, and may be a projection optical system using an Offner type large mirror, for example. In the above-described embodiment, the case where the projection optical system PL has an equal magnification is described. However, the present invention is not limited to this, and the projection optical system may be either a reduction system or an enlargement system.

In each of the above embodiments, etc., a light transmissive mask in which a predetermined light shielding pattern (or phase pattern / dimming pattern) is formed on a light transmissive mask substrate is used. As disclosed in US Pat. No. 6,778,257, an electronic mask (variable shaping mask) that forms a transmission pattern or a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, For example, a variable shaping mask using DMD (Digital Micro-mirror Device) which is a kind of non-light-emitting image display element (also called a spatial light modulator) may be used.

As an exposure apparatus, an exposure apparatus that exposes a substrate having a size (including at least one of an outer diameter, a diagonal length, and one side) of 500 mm or more, for example, a large substrate for a flat panel display such as a liquid crystal display element. It is particularly effective to apply to this.

The exposure apparatus can also be applied to a step-and-repeat type exposure apparatus and a step-and-stitch type exposure apparatus. Further, the object held by the moving body of the moving body apparatus is not limited to the substrate that is the object to be exposed, and may be a pattern holding body (original) such as a mask.

Further, the use of the exposure apparatus is not limited to a liquid crystal exposure apparatus that transfers a liquid crystal display element pattern onto a square glass plate. For example, an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, and a DNA chip The present invention can also be widely applied to an exposure apparatus for manufacturing the above. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. Moreover, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member).

For electronic devices such as liquid crystal display elements (or semiconductor elements), the step of designing the function and performance of the device, the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer) A lithography step for transferring a mask (reticle) pattern to a glass substrate by the exposure apparatus and the exposure method of each embodiment described above, a development step for developing the exposed glass substrate, and a portion where the resist remains. It is manufactured through an etching step for removing the exposed member of the portion by etching, a resist removing step for removing a resist that has become unnecessary after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .

It should be noted that all the publications related to the exposure apparatus and the like cited in the above description, the international publication, the US patent application specification, and the disclosure of the US patent specification are incorporated herein by reference.

As described above, the exposure apparatus of the present invention is suitable for exposing an object on a plate. Further, the flat panel display manufacturing method of the present invention is suitable for developing an exposed object. The device manufacturing method of the present invention is suitable for manufacturing a microdevice.

Claims

A scanning type exposure apparatus that moves an object to be exposed with a predetermined first stroke in a first direction parallel to a horizontal plane with respect to an energy beam for exposure during an exposure process,
A movable body capable of moving in the first direction at least with the predetermined first stroke and movable in a second direction perpendicular to the first direction within the horizontal plane;
An object holding member that holds the object and is movable together with the moving body in a direction parallel to at least the horizontal plane;
A weight canceling device that supports the object holding member from below and cancels the weight of the object holding member;
A support member that extends in the first direction, supports the weight cancellation device from below, and is movable in the second direction in the second stroke with the weight cancellation device supported from below;
A support frame for supporting the support member;
An exposure apparatus comprising: a load reducing device that reduces a load load in a gravitational direction acting on the support frame.
2. The exposure apparatus according to claim 1, wherein the load reducing device reduces the load load by allowing a part of the force acting on the weight canceling device to escape to the outside of the support frame.
3. The exposure apparatus according to claim 1, wherein the load reducing apparatus reduces the load load by using a force acting between a part of the moving body and a part of the weight canceling apparatus.
The moving body guides the movement of the first moving member in the first direction and the first moving member that is movable at least in the first direction with the predetermined first stroke, and the first moving member moves in the horizontal plane. The exposure apparatus according to any one of claims 1 to 3, further comprising: a second moving member movable in the second direction along with the first moving member in the second stroke.
The first moving member is driven by the first stroke in the first direction by a linear motor including a magnet provided on the second moving member and a coil provided on the first moving member,
The load reduction device reduces a load load in a gravity direction acting on the support member by using a force acting between the magnet and a part of the weight cancellation device or a part of the support member. The exposure apparatus according to claim 4.
The weight canceling device is provided with a cored coil,
The weight cancellation device is driven in the first direction on the support member by electromagnetic force generated by electromagnetic interaction between the magnet and the cored coil,
The exposure apparatus according to claim 5, wherein the load reducing device reduces the load load using a magnetic force acting between the magnet and the cored coil.
2. The exposure apparatus according to claim 1, wherein the load reducing device reduces the load load by using a force acting between a part of the moving body and a part of the support member.
8. The exposure apparatus according to claim 7, wherein the load reducing device reduces the load load by allowing a part of the force acting on the support member to escape to the outside of the support frame.
The moving body guides the movement of the first moving member in the first direction and the first moving member that is movable at least in the first direction with the predetermined first stroke, and the first moving member moves in the horizontal plane. The exposure apparatus according to claim 7, further comprising a second moving member movable in the second direction along with the first moving member by the second stroke.
The exposure apparatus according to claim 9, wherein the load reducing apparatus reduces the load load by using a force acting between the second moving member and the support member.
A support frame that supports the second moving member and that is vibrationally separated from the support frame;
The second moving member is driven by the second stroke in the second direction by a linear motor including a magnet provided on the support frame and a cored coil provided on the second moving member,
The exposure apparatus according to claim 9 or 10, wherein the load reducing device further reduces the load load using a magnetic force acting between the magnet and the coil with core.
The support member is mechanically coupled to the second moving member by a connecting device, and when the second moving member moves, the second moving member is pulled by the second moving member through the connecting device. The exposure apparatus according to any one of claims 4 to 6, 9 to 11, which moves in a direction.
13. The exposure apparatus according to claim 12, wherein the connection device has lower rigidity in the other direction than the rigidity in the second direction.
The exposure apparatus according to claim 12 or 13, wherein the connection device is connected to the support member on an axis parallel to the second direction, passing through the center of gravity of the support member.
A guide member including an element of a uniaxial guide device that mechanically guides the movement of the support member in the second direction;
The exposure apparatus according to any one of claims 1 to 14, wherein the guide member is vibrationally separated from the moving body.
The exposure apparatus according to claim 15, wherein a plurality of the uniaxial guide devices are provided at predetermined intervals in the first direction.
A plurality of the guide members are spaced apart from each other along the second direction,
The exposure apparatus according to claim 15 or 16, wherein the support member is mounted across the plurality of guide members.
The exposure apparatus according to any one of claims 1 to 17, wherein the support member is made of a solid stone material or a hollow casting.
The exposure apparatus according to any one of claims 1 to 18, wherein the weight cancellation apparatus is mounted on the support member in a non-contact state.
The object holding member can be slightly moved with respect to the moving body at least in the first direction, the second direction, and a direction around an axis perpendicular to the horizontal plane. Exposure equipment.
21. The exposure apparatus according to claim 20, wherein the object holding member is further movable with respect to the movable body in a direction perpendicular to the horizontal plane and in a direction around an axis parallel to the horizontal plane.
The exposure apparatus according to any one of claims 1 to 21, further comprising a swing support device that supports the object holding member so as to swing about an axis parallel to the horizontal plane.
The exposure apparatus according to claim 22, wherein the swing support device supports the object holding member in a non-contact manner.
The swing support device is supported from below by the weight cancellation device,
The exposure apparatus according to claim 22 or 23, wherein the weight cancellation apparatus is mounted on the support member in a non-contact state.
The weight cancellation device includes a force generator that generates upward force in the vertical direction,
The swing support device is disposed so as to be movable in a direction perpendicular to the horizontal plane, and transmits the force generated by the force generation device to the object holding member. Exposure device.
A scanning type exposure apparatus that moves an object to be exposed with a predetermined first stroke in a first direction parallel to a horizontal plane with respect to an energy beam for exposure during an exposure process,
A first moving member movable in at least the predetermined first stroke in the first direction;
A second moving member that guides the movement of the first moving member in the first direction and is movable in a second direction along with the first moving member in a second direction perpendicular to the first direction in the horizontal plane; ,
An object holding member that holds the object and is movable together with the first moving member in a direction parallel to at least the horizontal plane;
A weight canceling device that supports the object holding member from below and cancels the weight of the object holding member;
A support frame including a surface plate for supporting the weight cancellation device from below;
A linear motor including a magnet provided in the second moving member and a coil provided in the first moving member, and driving the first moving member in the first direction with the first stroke;
An exposure apparatus comprising: a load reducing device that reduces a load load in a gravitational direction acting on the support frame by using a force acting between the magnet and a part of the weight canceling device.
The exposure apparatus according to any one of claims 1 to 26, wherein the object is a substrate used for manufacturing a flat panel display.
Exposing the substrate using the exposure apparatus of claim 27;
Developing the exposed substrate. A method of manufacturing a flat panel display.
Exposing an object using the exposure apparatus according to any one of claims 1 to 26;
Developing the exposed object.