TW201802620A - Exposure apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

In a substrate stage device (PST), an X movable element (56), which faces an X stator (82) provided on an X beam (25) and in which a magnetic attractive force is generated with respect to a weight canceling device (50), is fixed at the tip of an arm (54) of the weight canceling device (50). The weight canceling device (50) transfers its own weight and part of the weight of a micro-movement stage (30) that the weight canceling device (50) supports to a floor (11) via a base frame (14) by means of the magnetic attractive force. Therefore, the biased load applied to a vibration prevention device (34) is reduced.

Description

Exposure device, manufacturing method of flat display, and component manufacturing method

The present invention relates to an exposure device, a method for manufacturing a flat display, and a method for manufacturing an element. Specifically, the present invention relates to an exposure device used in a lithography process for manufacturing a semiconductor element, a liquid crystal display element, and the like, and a flat display using the aforementioned exposure device Manufacturing method, and device manufacturing method using the aforementioned exposure device.

In the lithography process for manufacturing electronic components (micro-components) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a photomask or a reticle (hereinafter, collectively referred to as a "photomask") has been used Step & scan (step & scan) that moves synchronously with a glass plate or wafer (hereinafter collectively referred to as the "substrate") along a predetermined scanning direction (scan direction) while transferring the pattern formed on the photomask to the substrate using an energy beam ) Exposure device (the so-called scanning stepper (also known as a scanner)) and so on.

As such an exposure apparatus, there is a type Y coarse movement capable of moving in a cross scan direction (a direction orthogonal to the scanning direction) on an X coarse movement stage capable of moving in a long stroke in the scanning direction. A superimposed type (gantry type) stage device of the stage is known as a type of such a stage device that moves along a horizontal plane on a surface plate made of stone (for example, refer to Patent Document 1) ).

Since the exposure device of the aforementioned Patent Document 1 is in a corresponding step because the weight canceling device is During the large-scale movement of scanning, the flatness of the platform (moving guide surface of the weight offset device) must be made high in a large range. In addition, in recent years, the substrate of the exposure device tends to become larger and larger. With this, the platform has also become larger. Therefore, in addition to the increase in cost, the transportability of the exposure device and the workability during installation have deteriorated. care. For this reason, everyone is looking forward to the emergence of a new technology that can make the platform smaller.

Advance technical literature

[Patent Document 1] US Patent Application Publication No. 2010/0018950

In order to reduce the platform, the inventor of the present case has proposed an exposure device having a platform called a step platform that moves in the scanning cross direction (US Patent Application No. 13/221568). The exposure device provided with this stepping platform is used to guide the movement of the weight canceling device supporting the substrate holding member holding the exposure target substrate from below to the scanning direction. The stepping platform is supported in a state capable of moving in the scanning cross direction. On the stand of anti-vibration device. The exposure device with a stepping platform is driven by the stepping platform in the scanning cross direction while supporting a substrate holding member and a weight canceling device, etc., so the entire center of the exposure device moves before and after driving. Big. Therefore, recently, it has been found that an exposure device using a stepping platform will exert a large partial load on the anti-vibration device, especially the substrate holding member holding a large substrate becomes heavy, so the weight canceling device supporting the substrate holding member acts on the stepping The platform and the eccentric load applied to the gantry further through the stepping platform are so large that the entire exposure device may be tilted slightly due to the eccentric load applied to the gantry supported by the anti-vibration device during the exposure operation, which may cause the exposure accuracy to decrease.

According to a first aspect of the present invention, there is provided a first scanning-type exposure apparatus that moves an exposure target object with a predetermined first stroke in a first direction parallel to a horizontal plane with respect to an energy beam for exposure during exposure processing, and includes: The body can move at least the predetermined first stroke in the first direction, and can move the second stroke in the second direction orthogonal to the first direction in the horizontal plane; the object holding member can hold the object, Move with the moving body at least in a direction parallel to the horizontal plane; a weight canceling device supports the object holding member from below to offset the weight of the object holding member; a supporting member extending in the first direction to support the weight from below The offset device can move in the second direction in the second direction while supporting the weight offset device from below; a support stand supporting the support member; and a load reducing device for reducing the weight acting on the support stand Load in the direction of gravity.

According to this invention, during the exposure process of an object, the load in the direction of gravity (vertical direction downward) due to the weight of the object holding member, the weight canceling device, and the support member itself will act on the support stand, but it will be affected by the load. Lighten the device while lightening. As a result, it is possible to reduce the eccentric load acting on the support frame including the object holding member, the weight canceling device and the support member, and the support frame, thereby maintaining a sufficiently high exposure accuracy.

According to a second aspect of the present invention, there is provided a second scanning-type exposure apparatus that moves an object of an exposure target in a first direction parallel to a horizontal plane with a predetermined first stroke during an exposure process with respect to an energy beam for exposure, and includes: 1 a moving member that can move at least the predetermined first stroke in the first direction; a second moving member that guides the first moving member to move in the first direction and can be positively aligned with the first direction in the horizontal plane The second direction intersects with the first moving member in a second stroke; the object holding member holds the object and can move with the first moving member at least in a direction parallel to the horizontal plane; the weight canceling device is from below Support the object A component to offset the weight of the object holding member; a support stand including a platform supporting the weight canceling device from below; a linear motor including a magnet provided on the second moving member and a coil provided on the first moving member, The first moving member is driven in the first direction by the first stroke; and a load reducing device that uses a force acting between the magnet and a part of the weight canceling device to reduce a load in the direction of gravity acting on the support stand. load.

According to this invention, during the exposure processing of the object, the first moving member capable of moving in the direction parallel to the horizontal plane together with the object holding member holding the object is driven by the linear motor in the first direction. At this time, although the load in the direction of gravity due to the weight of the object holding member and the weight canceling device itself will act on the support frame, the load can be used by the load reducing device to act as a part of the weight canceling device. Time to mitigate. Therefore, it is possible to reduce the eccentric load acting on the support frame including the movement of the center of gravity of the system including the object holding member, the weight canceling device, and the support frame, thereby maintaining sufficiently high exposure accuracy.

A third aspect of the present invention provides a method for manufacturing a flat panel display, including: an operation of exposing a substrate using any of the first and second exposure devices; and an operation of developing the substrate after the exposure.

According to a fourth aspect of the present invention, there is provided a device manufacturing method including: an operation of exposing an object using any one of the first and second exposure devices; and an operation of developing the aforementioned object after exposure.

10‧‧‧Exposure device

11‧‧‧ Ground

12‧‧‧ Department of Lighting

14, 414‧‧‧ base frame

14a, 414a‧‧‧The main body of the base frame

14b‧‧‧foot of base frame

14c‧‧‧Adjuster

15‧‧‧ auxiliary base frame

15a‧‧‧The main body of the auxiliary base frame

15b‧‧‧ Adjuster for auxiliary base frame

16‧‧‧Y linear guide

16a‧‧‧Y linear guide

16b‧‧‧Slider

17a‧‧‧X Linear Guide

17b‧‧‧Slider

18x‧‧‧X voice coil motor

18y‧‧‧Y voice coil motor

21, 28‧‧‧ mirror mount

22x‧‧‧X mobile mirror

22y‧‧‧Y moving mirror

23‧‧‧Coarse movement stage

23x, 123x, 223x‧‧‧X coarse motion stage

23y‧‧‧Y coarse moving stage

25, 125, 325, 325b‧‧‧X beam

26‧‧‧Sensor

27‧‧‧Target

30‧‧‧Micro-motion stage

31‧‧‧ substrate holder

33‧‧‧ Substrate Stage

34‧‧‧Anti-vibration device

35‧‧‧Y linear guide

35a‧‧‧Y linear guide

35b‧‧‧ slider

40, 140, 240, 340, 340b, 440‧‧‧X brackets

41, 341‧‧‧ link board

42‧‧‧ gap

43, 45‧‧‧Deflection device (connection device)

46, 446, 478‧‧‧ fixed members

50, 250, 350, 350a, 450‧‧‧ weight offset device

51, 351‧‧‧

52‧‧‧air spring

53‧‧‧Z slider

54‧‧‧arm

55‧‧‧ base pad (air bearing)

56‧‧‧X mover

57‧‧‧Gasket (air bearing)

59, 61‧‧‧ Flat member

58, 62, 66, 68‧‧‧ sidewall members

63‧‧‧Top

64‧‧‧ sidewall

65‧‧‧ flat member

70‧‧‧leveling device

72, 472‧‧‧Y

73‧‧‧Y

75, 475, 475a‧‧‧Y bracket

76‧‧‧ plates

77‧‧‧ support member

78‧‧‧ auxiliary bracket

81‧‧‧X mover

82‧‧‧X

90, 490, 490a‧‧‧Y step platform

94‧‧‧Y mover

96, 353‧‧‧ magnetic body

97, 343, 343a, 343b, 346‧‧‧ permanent magnets

124‧‧‧Mounting member

254‧‧‧X Arm

255‧‧‧Y Arm

342‧‧‧ opening

352‧‧‧ 锷 部

F ₁ ~ F ₄ ‧‧‧component

Fb, Ff, Fg, Fh‧‧‧ magnetic attraction

Fd‧‧‧Magnetic reaction force

IL‧‧‧illumination light

IOP‧‧‧Lighting Department

M‧‧‧Photomask

MST‧‧‧Photomask Stage

P‧‧‧ substrate

PL‧‧‧ Projection Optics

PST, PSTa, PST1 ~ PST4, PST3a, PST3b, PST4a‧‧‧ substrate stage device

FIG. 1 is a diagram schematically showing a configuration of an exposure apparatus according to a first embodiment.

FIG. 2 shows the substrate stage included in the exposure apparatus of FIG. 1 after being removed from the micro stage. The top view shown.

3 is a view of a substrate stage included in the exposure apparatus of FIG. 1 as viewed from the + X direction.

FIG. 4 is a diagram schematically showing a flow of a force due to the weight of the substrate stage device itself.

Fig. 5 is a diagram for explaining a magnetic attraction force acting on the weight canceling device.

FIG. 6 (A) is a diagram schematically showing the movement of the center of gravity of a substrate stage device without a magnetic attraction force generating device that acts on the weight canceling device, and FIG. 6 (B) is a schematic view showing the effect on the weight canceling device Figure of the center of gravity of the substrate stage device with magnetic attraction upward in the vertical direction.

Fig. 7 is a view of the substrate stage device of the second embodiment as viewed from the + X direction.

Fig. 8 is a plan view of a substrate stage device according to a third embodiment.

FIG. 9 is a partial cross-sectional view of the substrate stage device of the third embodiment as viewed from the + X direction.

FIG. 10 is a partial cross-sectional view of the substrate stage device of the fourth embodiment as viewed from the + X direction.

11 is a plan view of a substrate stage device according to a fourth embodiment.

FIG. 12 (A) is a diagram showing an example of a combination of a permanent magnet and a magnetic body that generates magnetic attraction, and FIG. 12 (B) is an example of a combination of a permanent magnet and a permanent magnet that generates magnetic attraction.

FIG. 13 is a partial cross-sectional view of a substrate stage device according to a first modification of the fourth embodiment as viewed from the + X direction.

FIG. 14 is a partial cross-sectional view of a substrate stage device according to a second modified example of the fourth embodiment as viewed from the + X direction.

FIG. 15 is a partial cross-sectional view of a substrate stage device provided in the exposure apparatus according to the fifth embodiment as viewed from the −Y direction.

FIG. 16 is a view showing a partial cross section of the substrate stage device of FIG. 15 as viewed from the + X direction.

Fig. 17 is a view showing a substrate stage device according to a modification of the fifth embodiment as viewed from the -Y direction; Illustration.

"First Embodiment"

Hereinafter, a first embodiment will be described with reference to FIGS. 1 to 6 (B). FIG. 1 schematically shows the configuration of an exposure apparatus 10 according to the first embodiment. Exposure device 10 is a projection exposure device (also referred to as a scanner) in a step-and-scan method using a rectangular (square) glass substrate P (hereinafter, simply referred to as a substrate P) for a liquid crystal display device (flat display) as an exposure target. ).

An exposure device 10, a mask stage MST having an illumination IOP, a holding mask M, a projection optics PL, a pair of substrate stage 33, a substrate stage device PST including a substrate holder 31 that holds a substrate P, and These controls are such. Hereinafter, the directions in which the reticle M and the substrate P are scanned relative to the projection optical system 16 during exposure are set to the X-axis direction, and the direction orthogonal to the X-axis in the horizontal plane is the Y-axis direction, and the directions orthogonal to the X-axis and Y-axis The directions are the Z-axis directions, and the directions of rotation about the X-axis, Y-axis, and Z-axis are the directions θx, θy, and θz, respectively. In addition, the positions in the X-axis, Y-axis, and Z-axis directions will be described as X, Y, and Z positions, respectively. A photoresist (sensitizer) is coated on the surface of the substrate P (the surface on the + Z side).

The lighting system IOP has the same configuration as the lighting system disclosed in, for example, US Pat. No. 6,552,775. That is, the lighting system IOP has a plurality of zigzag-shaped, for example, five lighting areas, such as five lighting systems arranged on the illumination mask M, and each lighting system will be a light source (such as a mercury lamp) (not shown). ) The emitted light is irradiated onto the mask M as an exposure illumination light (illumination light) IL through an unillustrated reflector, dichroic mirror, shade, wavelength selection filter, various lenses, and the like. For the illumination light IL, light (i.e., i-line, g-line, and h-line combined light) such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), and h-line (wavelength 405 nm) is used. Again, according to The wavelength of bright light IL can be switched by a wavelength selection filter, for example, depending on the required resolution.

On the photomask stage MST, for example, a photomask M having a circuit pattern or the like formed on its pattern surface (lower side in FIG. 1) is fixed by vacuum adsorption. The photomask stage MST is mounted on a guide (not shown) in a non-contact state, and is driven at a predetermined stroke by, for example, a photomask stage drive system (not shown) including a linear motor, and is appropriately micro-driven at Y-axis direction and θz direction. The position information of the mask stage MST in the XY plane (including the rotation information in the θz direction) is a laser that includes a laser beam (length-measuring beam) irradiated to the reflecting surface fixed (or formed) on the mask M The interferometer is a photomask interferometer system as shown in the figure. This measurement result is supplied to a master control device (not shown). The main control device drives (position control) the mask stage MST through the mask stage driving system (not shown) according to the above measurement results measured by the mask interferometer system. In addition, an encoder (or an encoder system composed of a plurality of encoders) may be used instead of or in combination with the mask interferometer system.

The projection optical system PL is arranged below the mask stage MST in FIG. 1. The projection optical system PL has the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system PL corresponds to the aforementioned plurality of illumination areas, and the projection areas including the pattern image of the mask M are arranged in a plurality of staggered shapes, for example, five projection optical systems (multi-lens projection optical systems), The projection optical system of the rectangular single image field whose axis direction is the long side direction has the same function. In the present embodiment, each of the plurality of projection optical systems uses, for example, a telecentric equal magnification system on both sides to form an erect image.

Therefore, when the illumination area on the mask M is illuminated with the illumination light IL from the lighting system IOP, the mask M that passes through the first surface (object surface) configured to project the optical system PL substantially coincides with the pattern surface. The illumination light IL is transmitted through the projection optical system PL to the electricity of the mask M in the illumination area. The projection image (partially erect image) of the road pattern is formed on the irradiation portion (exposure area) of the illumination light IL conjugated to the illumination area on the substrate P on the second surface (image surface) side of the projection optical system PL. . The photomask stage MST and the micro-movement stage 30 described later constituting a part of the substrate stage device PST are driven synchronously to move the photomask M in the scanning direction (X-axis direction) and relative to the illumination area (illumination light IL). The exposure area (illumination light IL) moves the substrate P in the scanning direction (X-axis direction), thereby performing scanning exposure of an irradiation area (regional area) on the substrate P, and transferring the pattern (light Hood pattern). That is, in this embodiment, the pattern of the photomask M is generated on the substrate P with the illumination system IOP and the projection optical system PL, and the exposure of the induction layer (photoresist layer) on the substrate P using the illumination light IL is performed in This pattern is formed on the substrate P.

The pair of substrate stage holders 33 are each constituted by members extending in the Y-axis direction (refer to FIG. 3, and both ends in the longitudinal direction are supported from below by a vibration isolator 34 provided on the ground 11. The pair of substrate stage holders 33 is arranged in parallel at a predetermined interval in the X-axis direction. On each of a pair of substrate stage stands 33, as shown in FIG. 2, a mechanical Y linear guide extending in the Y-axis direction is separated from each other in the X-axis direction and fixed in parallel. A plurality of Y linear guides 35a (for example, three for each substrate stage 33) of the guide device (single-axis guide device).

A pair of substrate stage 33 constitutes the apparatus body (body) of the exposure apparatus 10, and the projection optical system PL and the mask stage MST are mounted on the apparatus body.

As shown in FIG. 1, the substrate stage device PST includes a pair of base frames 14, an auxiliary base frame 15, a coarse motion stage 23, a micro motion stage 30, a weight canceling device 50, and a weight canceling device supported from below. Y step platform 90 of the device 50 and the like.

As shown in FIGS. 1 and 2, one of the pair of base frames 14 is disposed on the + X side of the substrate stage stand 33 on the + X side, and the other is disposed on the -X side of the substrate stage stand 33- X side . Since the pair of base frames 14 have the same structure, only the base frame 14 on the + X side will be described below. The base frame 14, as shown in FIG. 1, includes a main body portion 14a composed of a plate-shaped member having one surface parallel to the YZ plane and the other surface extending in the Y-axis direction, and a plurality of leg portions 14b supporting the main body portion 14a from below. . The leg portions 14b are provided at a predetermined interval in the Y-axis direction, for example, three leg portions 14b are provided. A plurality of adjusters 14c are provided at the lower end of each leg portion 14b, and the Z position of the main body portion 14a can be adjusted.

Y fixtures 73 which are elements of a linear motor are fixed to both sides of the body portion 14a in the X-axis direction (that is, one of the above faces and the other face). The Y holder 73 has a magnet unit, and the magnet unit includes a plurality of permanent magnets arranged at a predetermined interval in the Y-axis direction. Further, a Y linear guide 16a, which is a component of a mechanical Y linear guide (uniaxial guide) extending in the Y-axis direction, is fixed to the upper surface of the main body portion 14a.

The auxiliary base frame 15 is arranged between a pair of substrate stage frames 33. Although the auxiliary base frame 15 is different in size, portions other than the main body portion 14 a of the base frame 14 are similarly configured. That is, the auxiliary base frame 15 includes a main body portion 15a composed of a plate-like member extending in the Y-axis direction, and an adjuster 15b that supports the main body portion 15a from below to adjust the Z position of the main body portion 14a. A Y linear guide 16 a extending in the Y-axis direction is fixed to the main body portion 15 a of the auxiliary base frame 15 in the same manner as the base frame 14. The Z position of the upper end of the auxiliary base frame 15 is set to be slightly lower (or substantially the same) than the upper surfaces of the pair of substrate stage frames 33.

The coarse movement stage 23 includes a Y coarse movement stage 23y and an X coarse movement stage 23x mounted on the Y coarse movement stage 23y.

The Y coarse movement stage 23 y is mounted on a pair of the base frame 14 and the auxiliary base frame 15. The Y coarse movement stage 23y includes a pair of X beams 25 as shown in FIG. 2. The pair of X beams 25 are each composed of members extending in the X-axis direction, and are arranged parallel to each other at a predetermined interval in the Y-axis direction. Each of a pair of X beams 25, as shown in Figure 3 As shown, the shape of the YZ section is a generally isosceles trapezoid with an upper side longer than the bottom side. This trapezoid has one side inclined at an angle θ (θ is smaller than 45 degrees, for example, 10 degrees) with respect to the Z axis in the YZ plane, and two sides inclined with an angle -θ with respect to the Z axis in the YZ plane. the other side.

A member called a Y carriage 75 is fixed to the lower surface of the pair of X beams 25 near both ends in the longitudinal direction, as shown in FIG. 2. That is, a total of, for example, four Y brackets 75 are mounted below the Y coarse moving stage 23y. The two Y brackets 75 arranged on the + X side are connected to each other through a plate 76 fixed to each of the Y brackets 75. Similarly, two Y brackets 75 arranged on the -X side are also connected to each other through a plate 76. Since each of the four Y brackets 75 in total has the same structure, for example, only one Y bracket 75 corresponding to the + X side base frame 14 will be described below.

As shown in FIG. 1, the Y bracket 75 is made of an inverted U-shaped member in the XZ cross section, and the main body portion 14 a of the base frame 14 is inserted between a pair of facing surfaces. A pair of Y movers 72 are fixed to each of a pair of facing surfaces of the Y bracket 75 through a predetermined clearance (gap) and a pair of Y holders 73. Each Y mover 72 includes a coil unit (not shown), and an opposing Y holder 73 constitutes an electromagnetic force (Lorentz force) driving method that drives the Y coarse moving stage 23y in the Y axis direction with a predetermined stroke. Moving coil type Y linear motor. The Y position information of the Y coarse movement stage 23y is obtained using a linear encoder system (not shown).

On the top surface of the Y-bracket 75, a plurality of (for example, two (see FIG. 2)) fixed to each Y-bracket 75 include rolling elements (for example, a plurality of balls, etc.), and are slidably engaged with the Y-line. The sliding member 16b of the guide member 16a. The Y coarse movement stage 23y is linearly guided in the Y-axis direction by a plurality of Y linear guides including a Y linear guide 16a and a slider 16b.

同樣的，固定有以可滑動之方式卡合於Y線性導件16a之滑件16b。據此，Y粗動載台23y即相對基板載台架台33在振動上分離。此外，於圖1中雖係於紙面深度方向重疊而隱藏，針對1個輔助托架78，滑件16b係於紙面深度方向(Y軸方向)以既定間隔、例如安裝有2個。如此，Y粗動載台23y，其長邊方向中央部透過輔助托架78被輔助基架15從下方支承，而使本身重量引起之撓曲受到抑制。 Further, a plurality of (for example, two) auxiliary brackets 78 are fixed below the center portions in the longitudinal direction of the pair of X beams 25 through a support member 77. The auxiliary bracket 78 is made of a rectangular parallelepiped member, and below it, it is connected with the Y bracket 75

Similarly, a slider 16b that is slidably engaged with the Y linear guide 16a is fixed. Accordingly, the Y coarse movement stage 23y is separated from the substrate stage stage 33 in vibration. In addition, although it is hidden in the paper surface depth direction in FIG. 1, the slider 16 b is attached to the paper surface depth direction (Y-axis direction) at a predetermined interval, for example, two auxiliary brackets 78. In this way, the Y coarse movement stage 23y is supported by the auxiliary base frame 15 from below through the auxiliary bracket 78 through the auxiliary portion 78 in the longitudinal direction center portion, thereby suppressing deflection due to its own weight.

On each of a pair of X beams 25, as shown in FIG. 2 and FIG. 3, a plurality of fixed X beams are parallel to each other at a predetermined interval in the Y-axis direction (in this embodiment, for example, two X beams 25) An X linear guide 17a, which is an element of a mechanical single-axis guidance device extending in the X-axis direction. In addition, as shown in FIG. 1 and FIG. 2, two hypotenuses (inclined faces) in the YZ cross section of a pair of X beams 25 are fixed from the vicinity of the −X side end portion of the X beam 25 to the + X side end portion. X extension 82 fixed. The X holder 82 includes a magnet unit, and the magnet unit includes a plurality of permanent magnets arranged at a predetermined interval in the X-axis direction.

The X coarse movement stage 23x includes, as shown in FIG. 2, a pair of coupling plates 41 that connect one pair of X brackets 40 and one pair of X brackets 40. Since the pair of X brackets 40 have the same structure, only the X bracket 40 on the Y side will be described below.

As shown in FIGS. 2 and 3, the X bracket 40 includes a flat plate member 61 with a rectangular plan view with the X-axis direction being the long side direction, and a Y-axis direction at one end portion and the other end portion of the long-side direction of the plate member 61. The two end surfaces are respectively a pair of four side wall members 62 fixed in a state where the upper end surface and the upper surface of the flat plate member 61 are approximately the same height. The X bracket 40 is viewed from the + X direction, and has an inverted U-shape as shown in FIG. 3. The X-beams 25 are inserted between the + Y-side and -Y-side side wall members 62 that are paired with each other. The two ends of the flat plate member 61 in the X-axis direction are slightly protruded to the outer side in the X-axis direction with respect to each of the side wall members 62 on the + X side and the −X side (see FIG. 2). + Y side and -Y side in pairs The wall member 62 has a first portion parallel to the XZ plane from the upper end (+ Z side end) to the vicinity of the central portion, and is inclined toward the -Y side or + Y side from the central portion to the lower end (-Z side end). And the second part facing obliquely with the two X beams 25 mentioned above. Near the center of the long side (X-axis direction) of the X-bracket 40, there is a portion (hereinafter, referred to as a notch) in which the side wall member 62 is absent within a short range of 1/3 of the X-axis length of the X-bracket 40. Section) 42 (see FIG. 2).

Below each of the flat plate members 61 of the X bracket 40 (the surface on the -Z side), as shown in Fig. 3, a plurality of (for example, 4 (see Fig. 2)) rolling elements are fixed to each X linear guide 17a. Slider 17b which is slidably engaged with Y linear guide 17a. In this embodiment, for example, a total of 16 sliders 17b are fixed below the X coarse movement stage 23x. The X coarse movement stage 23x is linearly guided in the X axis direction by a plurality of X linear guides including a Y linear guide 17a and a slider 17b.

、X粗動載台23x之X位置資訊係以未圖示之線性編碼器系統加以求出。 On the inner surface of the second part of each of the four side wall members 62 included in the X bracket 40, an X mover 81 facing each of a pair of X holders 82 through a predetermined clearance (gap) is fixed. Each X mover 81 includes a coil unit (not shown) and, together with the opposite X fixer 82, constitutes an electromagnetic force (Lorentz force) driving method that drives the X coarse moving stage 23x in the X axis direction with a predetermined stroke. Moving coil type X linear motor. Each X mover 81 includes an iron core (not shown), and generates a magnetic attraction force between the X mover 81 and the opposite X fixer 82. That is, each movable element 81 constitutes a cored coil unit.

The X position information of the X coarse motion stage 23x is obtained using a linear encoder system (not shown).

Each of the pair of connecting plates 41 is, as shown in FIG. 2, a flat plate member extending in the Y-axis direction. One connection plate 41 is fixed from the center of the Y-axis of the X-bracket 40 arranged on the + Y side to the -Y side, and to the center of the Y-axis of the X-bracket 40 arranged on the -Y side. The + Y side connects the + X ends of the pair of X brackets 40 to each other. The connecting plate 41 on the other side is fixed from the -Y side to the center of the Y-axis of the X bracket 40 arranged on the + Y side, to the X arranged on the -Y side. The center of the bracket 40 in the Y-axis direction is slightly closer to the + Y side, and the −X ends of the pair of X brackets 40 are connected to each other. That is, the X coarse movement stage 23x having a pair of X brackets 40 and a pair of connecting plates 41 has a substantially rectangular shape with an opening at the center in plan view.

In addition, although not shown, a stopper member that mechanically restricts the amount of movement of the micro-motion stage 30 to the X-coarse movement stage 23x described later on the X-coarse movement stage 23x, or the X-axis and Y A gap sensor or the like for measuring the movement amount of the micro-movement stage 30 relative to the X coarse movement stage 23x in the axis direction.

As can be seen from FIGS. 1 and 3, the micro-movement stage 30 is composed of a plate-like member (or a box-shaped (hollow rectangular parallelepiped) member) having a substantially square shape in plan view, and a substrate holder 31 is passed therethrough for vacuum adsorption (or electrostatic adsorption), for example. ) Method to suck and hold the substrate P.

The micro-motion stage 30 is a micro-motion stage drive system including a plurality of voice coil motors (or linear motors) composed of a stator fixed to the X coarse motion stage 23x and a movable element fixed to the micro-motion stage 30, On the X coarse motion stage 23x, the three degrees of freedom (X-axis, Y-axis, and θz directions) in the XY plane are micro-driven. A plurality of voice coil motors, as shown in FIG. 1, an X voice coil motor 18x that micro-drives the micro-motion stage 30 in the X axis direction is separated from the Y axis, and a pair of X voice coil motors 18x deep in the paper (Pictured), as shown in FIG. 3, a Y voice coil motor 18y that drives the micro-motion stage 30 in the Y-axis direction is provided with a pair between the X-axis separations (the Y voice coil motor 18y deep inside the paper is not shown)示). The micro-movement stage 30 uses the X voice coil motor 18x and / or Y voice coil motor 18y to drive synchronously with the X coarse movement stage 23x (driving in the same direction and at the same speed as the X coarse movement stage 23x), and moves coarsely with X The stage 23x moves in the X-axis direction and / or the Y-axis direction together with a predetermined stroke. Therefore, the micro-motion stage 30 can move (coarse movement) with a long stroke in the XY2 axis direction relative to the projection optical system PL (refer to FIG. 1), and can move slightly (micro-motion) in 3 degrees of freedom in the X, Y, and θz directions. ).

In addition, the micro-motion stage driving system includes a plurality of Z voice coil motors (not shown) for driving the micro-motion stage 30 by a small amount in the directions of θx, θy, and 3 degrees of freedom in the Z-axis direction. The structure of a micro-motion stage drive system including a plurality of voice coil motors has been disclosed in, for example, US Patent Application Publication No. 2010/0018950.

On the side of the -X side of the micro-movement stage 30, as shown in Fig. 1, an X-moving mirror (rod-shaped mirror) 22x having a reflecting surface orthogonal to the X-axis is fixed through the lens holder 21. On the side of the -Y side of the micro-motion stage 30, as shown in FIG. 3, a Y moving mirror 22y having a reflecting surface orthogonal to the Y axis is fixed through the lens holder 28. The position information in the XY plane of the micro-motion stage 30 is a laser interferometer system including a plurality of laser interferometers that respectively irradiate a long-length beam (interferometer beam) to the X-moving mirror 22x and the Y-moving mirror 22y. Hereinafter, it is referred to as a substrate interferometer system) and is inspected at any time. In fact, the substrate interferometer system includes a plurality of X laser interferometers corresponding to the X moving mirror 22x and a Y laser interferometer corresponding to the Y moving mirror 22y. However, only a representative display in FIG. 1 comes from the X laser The measuring beam of the interferometer. A plurality of laser interferometers are respectively fixed to the device body. The position information of the micro-motion stage 30 in the θx, θy, and Z-axis directions is obtained by using a sensor 26 (see FIG. 3) fixed below the micro-motion stage 30. Find the thing 27. The configuration of the position measurement system of the micro-motion stage 30 is disclosed in, for example, US Patent Application Publication No. 2010/0018950.

As shown in FIG. 3, the weight canceling device 50 is composed of a columnar member extending in the Z-axis direction, and is also referred to as a core post. The weight canceling device 50 is inserted into the opening of the X coarse movement stage 23x, and is mounted on a Y step platform 90 described later. The weight canceling device 50 supports the micro-motion stage 30 from below through a leveling device 70 described later.

The weight canceling device 50 includes a casing 51, an air spring 52 and a Z slider 53, and a pair of The arm portion 54 and the like.

The casing 51 is formed of a rectangular member in plan view, and a circular opening portion (see FIG. 2) is formed in the central portion with a surface opening on the + Z side. A plurality of air bearings (hereinafter referred to as base pads) 55 with bearing surfaces facing the -Z side are mounted below the casing 51.

The air spring 52 is housed in the opening of the casing 51. The air spring 52 is supplied with pressurized gas from the outside.

The Z slider 53 is composed of a cylindrical member extending in the Z-axis direction, is inserted into an opening portion of the casing 51, and is mounted on an air spring 52.

Each of the pair of arm portions 54 is configured by a rod-shaped member extending in the Y-axis direction. One of the pair of arm portions 54 is disposed on the + Y side, one end of which is fixed to the + Y side surface of the casing 51 and the other end is inserted into the notch portion 42 of the X bracket 40. Similarly, one end of the arm portion 54 disposed on the -Y side is fixed to the side surface of the -Y side of the casing 51, and the other end is inserted into the notch portion 42 of the X bracket 40. The other end of each of the pair of arm portions 54 has an inclined surface facing in parallel with the inclined surface formed on the inner side in the Y-axis direction among the inclined surfaces each of the pair of X beams 25 has. In addition, on the inclined surface at the other end of each of the pair of arm portions 54, among the X-fixers 82 having one pair of X-fixers 82 and a pair of X-beams 25 respectively, the X-fixers 82 arranged inside the Y-axis direction pass through a predetermined gap ( clearance / gap) X mover 56 opposite. Each X mover 56 includes a coil unit (not shown) and an X linear motor that drives the weight canceling device 50 in the X axis direction with a predetermined stroke together with the opposite X fixer 82. Each X movable element 56 includes an iron core (not shown), and generates a magnetic attraction force between the X movable element 56 and the opposite X stationary element 82.

A leveling device 70 is mounted above the weight canceling device 50. The leveling device 70 is non-contactly supported from below by an air bearing (hereinafter, referred to as a gasket) 57 mounted on the + Z side end of the Z slider 53 with the bearing surface facing the + Z side. Leveling device 70 supports the micro-motion stage 30 It is a device that can tilt (freely swing in the directions of θx and θy relative to the XY plane). The weight canceling device 50 cancels the weight (force in the direction of gravity) of the system including the micro-motion stage 30 through the Z-slider 53 and the leveling device 70 by the upward force generated by the air spring 52, so as to reduce the above-mentioned plural number. Z voice coil motor load.

As shown in FIG. 2, the weight canceling device 50 is mechanically connected to the X coarse dynamic load through a plurality of (for example, four) devices called a flexure device connection device 45 (hereinafter, appropriately referred to as a flexure device 45). Station 23x (X bracket 40). The deflection device 45 includes, for example, a thin strip steel plate (or steel cable, synthetic resin rope, chain, etc.) arranged parallel to the XY plane, and hinge devices (such as ball joints or hinges) provided at both ends of the steel plate. Training device), the steel plate is erected between the weight canceling device 50 and the X bracket 40 through a hinge device. The Z positions of the plurality of deflection devices 45 substantially coincide with the positions of the centers of gravity of the weight canceling devices 50 in the Z-axis direction. One end of the bending device 45 is fixed to a corner portion of the casing 51 (the top of the casing 51 in plan view), and the other end is fixed to the side wall member 62 of the X bracket 40. That is, the weight canceling device 50 is pulled by the X coarse movement stage 23x through any one of the plurality of deflection devices 45, and moves integrally with the X coarse movement stage 23x in the X-axis direction or the Y-axis. direction. At this time, the weight cancelling device 50 has a traction force in a plane that is parallel to the XY plane including the position of the center of gravity in the Z-axis direction. Therefore, the moment (pitch moment) around the axis orthogonal to the moving direction does not occur. effect. In addition, a detailed configuration of the weight canceling device 50 of the present embodiment including the leveling device 70 and the flexing device 45 is disclosed in, for example, the specification of US Patent Application Publication No. 2010/0018950.

Y stepping platform 90, as shown in Figs. 1 to 3, is composed of a YZ cross-section rectangular member extending in the X-axis direction. In a plan view, it is in a state (non-contact state) at a predetermined distance from each of a pair of X beams 25. ) Is arranged between a pair of X beams 25. The length dimension of the Y step platform 90 is set to be slightly longer than the movement stroke of the micro-motion stage 30 in the X-axis direction. Also, the width of Y step platform 90 The size in the direction of the direction (Y-axis direction) is set to the width of the base pad 55 of the supportable weight canceling device 50. The material of the Y step platform 90 is cast iron or dense stone (gabbro), ceramics, CFRP, etc., and the flatness of the top is processed to be very high.

Below the Y step platform 90, a plurality of (for example, two (refer to FIG. 2)) fixed to each of the Y linear guides 35a are composed of rolling bodies (for example, a plurality of balls, etc.), and are slidably engaged with The slider 35b of the plurality of Y linear guides 35a. The Y step platform 90 is guided by a plurality of Y linear guides 35 including a Y linear guide 35a and a Y slider 35b on a pair of substrate stage tables 33 in a Y-axis direction.

As shown in FIG. 2, the Y step platform 90 is mechanically connected to each pair of Y brackets 75 through a pair of deflection devices 43 connected to each of the fixing members 46 fixed to the + X and -X side end faces. . The deflection device 43 has substantially the same configuration as the deflection device 45 described above. In this way, when the Y-bracket 75 on one or the other side of the Y-axis direction is driven in the Y-axis direction, the Y-step platform 90 is pulled by the Y-bracket 75 and moves in the Y-axis direction as a whole. The bending device 43 has a lower rigidity in the long-side direction (here, the Y-axis direction) than the other five-degree-of-freedom directions (here, the X, Z, θx, θy, and θz directions). The Y step platform 90 is separated from the Y coarse movement stage 23y in vibration.

The exposure device 10 configured as described above, under the management of a main control device (not shown), loads the photomask M onto the photomask stage MST with a photomask transfer device (photomask loader) (not shown), The substrate P is loaded (loaded) onto the substrate stage device PST by a substrate loading device (not shown). After that, the main control device performs an alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step & scan exposure operation is performed. Since this exposure operation is the same as the exposure operation of the conventional step-and-scan method, a detailed description is omitted.

Here, the exposure operation of the above-mentioned step-and-scan method is performed on the substrate P The plurality of irradiation areas are sequentially subjected to exposure processing. The substrate P is driven at a constant speed in a predetermined stroke in the X-axis direction during a scanning operation (hereinafter referred to as the X-scanning operation), and is appropriately driven in the X-axis direction during a stepping operation (when moving between irradiation areas). And / or the Y-axis direction (hereinafter referred to as the X step operation and the Y step operation, respectively).

When the substrate P is moved in the X-axis direction during the X scanning operation and the X step operation, the X coarse movement is carried on the Y coarse movement stage 23y at the substrate stage device PST according to the measurement value of the encoder system. The stage 23x is driven in the X-axis direction, and the micro-motion stage 30 and the X coarse-motion stage 23x are synchronously driven by a plurality of X voice coil motors 18x according to the measurement values of the substrate interferometer system. When the X coarse movement stage 23x moves in the X-axis direction, the weight cancelling device 50 moves in the X-axis direction together with the X coarse movement stage 23x because it is pulled by the X coarse movement stage 23x. At this time, the weight canceling device 50 is driven by the main control device in the X-axis direction in synchronization with the X coarse moving stage 23x through a linear motor composed of the X mover 56 and the X fixer 82. At this time, the weight canceling device 50 moves on the Y step platform 90. In the X-scanning operation and the X-stepping operation, the fine movement stage 30 may be slightly driven in the Y-axis direction and / or the θz direction with respect to the X coarse movement stage 23x. The Y position does not change, so the weight canceling device 50 constantly moves only on the Y step platform 90.

In contrast, during the above-mentioned Y step operation, the Y coarse movement stage 23y is driven on the pair of base frames 14 in the Y-axis direction with a predetermined stroke in the substrate stage device PST, and is integrated with the Y coarse movement stage 23y. Yes, the X coarse movement stage 23x moves in the Y-axis direction with a predetermined stroke. The weight canceller 50 is integrated with the X coarse movement stage 23x and moves in the Y-axis direction with a predetermined stroke. At this time, the Y step platform 90 supporting the weight canceling device 50 from below is driven synchronously with the Y coarse movement stage 23y. Therefore, the weight canceling device 50 is constantly supported by the Y step platform 90 from below.

Next, the assembly procedure of the substrate stage device PST will be described. First Embodiment In the substrate stage device PST, a pair of substrate stage stands 33, a pair of base frames 14, and an auxiliary base frame 15 are respectively arranged on the floor 11 of the clean room in the configuration shown in FIG. Thereafter, the Y bracket 75 is mounted on the pair of base frames 14, the auxiliary bracket 78 is mounted on the auxiliary base frame 15 through the Y linear guide 16, and a plurality of Y linears are transmitted through the pair of substrate stage frames 33. The guide device 35 is equipped with a Y step platform 90. In addition, the Y bracket 75 may be assembled to the pair of base frames 14 and the auxiliary bracket 78 may be assembled to the auxiliary base frame 15 at other locations in advance.

Next, a weight canceling device 50 is mounted on the Y step platform 90, and a pair of X beams 25 are mounted on the Y bracket 75 and the auxiliary bracket 78. After that, the X bracket 40 is mounted so that the X holder 82 faces the X mover 56 fixed to the arm portion 54 of the weight canceling device 50. Alternatively, the X brackets 40 may be attached to a pair of X beams in other places in advance. After that, adjust the position of the pair of X beams 25 (interval in the Y-axis direction) so that the X holder 82 and the X mover 56 fixed to the arm portion 54 of the weight canceling device 50 are spaced apart from each other at a predetermined interval. A pair of link plates 76 and 77 are fixed in position.

After that, the micro-motion stage 30 (including the leveling device 70) is mounted on the weight canceling device 50, and a plurality of voice coil motor holders and movable members are combined. Next, pressurized gas is supplied to the air spring 52, the base pad 55 and the sealing pad 57 of the weight canceling device 50, and an air bearing (not shown) included in the leveling device 70, and the micro-motion stage 30 is used by the weight canceling device 50 to Non-contact support.

Next, the flow of the force applied to the substrate stage device PST will be described. The force applied to the substrate stage device PST described below occurs regardless of whether the micro-motion stage 30 is stationary or in motion.

When the substrate stage device PST is assembled, the Z axis of the substrate P, the substrate holder 31, the micro-motion stage 30 (including the leveling device 70), etc. (hereinafter, referred to as the micro-motion stage 30, etc.) due to its weight. The downward force, as shown in FIG. 4, is transmitted to the ground 11 in the following flow direction. Also, although the substrate stage device PST in FIG. 4 is shown in a schematic manner and has a slightly different shape from that shown in FIGS. 1 to 3, the components corresponding to the components shown in FIGS. 1 to 3 are Use the same symbols.

As shown in FIG. 4, the weight of the micro-motion stage 30 and the like is supported by the Y step platform 90 through the weight canceling device 50. Here, as shown in FIG. 5, among the pair of arm portions 54 included in the weight canceling device 50, the arm portion 54 mounted on the + Y side will act on X movable including the iron core fixed to the other end of the arm portion 54. The magnetic attraction force F between the sub-56 and the X-fixer 82 installed on the inclined surface of the X-beam 25 is inclined in the θ direction with respect to the Y-axis in the YZ plane. Similarly, the arm portion 54 mounted on the -Y side acts on a magnetic attraction force F in which the YZ plane is inclined to the -θ direction with respect to the Y axis. Each of the magnetic attractive force F, divided into a vertical direction (Z axis direction) of the component force F _1, the horizontal direction (Y axis direction) of the component force F _2. Here, since the component force F _{2 in the} horizontal direction acts in a direction that cancels each other, only the force (ie, 2F ₁ ) that adds the component force F _{1 in} the vertical direction acts on the weight canceling device 50. Therefore, as shown in FIG. 4, a part of the weight of the micro-motion stage 30 and the like is cancelled by the component force F ₁ (2F ₁ ) in the vertical direction, and the remaining force is transmitted to the Y step platform 90. The force transmitted to the Y stepping platform 90 is transmitted to the ground 11 via the substrate stage 33 and the anti-vibration device 34. On the other hand, a reaction force of the component force F ₁ in the vertical direction is applied to the X beam 25. The reaction force of the weight and the component force F _{1 in} the vertical direction is transmitted through the base frame 14 and the auxiliary base frame 15 (see FIG. 1). To the ground 11.

As described above, according to the exposure apparatus 10 of this embodiment, as shown in FIGS. 6 (A) and 6 (B), a substrate stage device that does not generate magnetic attraction between the weight canceling device 50 and the X beam 25 Compared with PSTa (Fig. 6 (A)), the substrate stage device PST (Fig. 6 (B)) of this embodiment can treat the micro-motion stage 30 and the weight canceling device 50 as, for example, hollow members due to the effect of magnetic attraction. Since it is lightweight, it is possible to shorten the center-of-gravity moving distance L when the substrate stage device PST is driven in the scanning cross direction. In other words, the substrate stage device PST can reduce the vibration-proof mounting when it is driven in the scanning cross direction. The load of the bearing 34 is changed, so the deformation of the exposure device 10 can be reduced, and the exposure accuracy can be improved.

In addition, since a part of the downward force generated in the vertical direction due to the weight of the micro-motion stage 30 and the weight canceling device 50 itself is transmitted to the X beam 25, the Y step platform 90 can reduce the vertical direction acting on itself downward. Power. Therefore, as the base pad 55 of the supporting weight canceling device 50, a small base pad having a small load capacity can be used. That is, the Y step platform 90 can reduce the guide surface (the dimension in the Y-axis direction) of the support base pad 55.

In addition, the Y step platform 90 can reduce its own load, so the rigidity of the Y step platform 90 can be reduced. Therefore, the Y step platform 90 can be further downsized by reducing the thickness and the like.

In addition, since the substrate stage device PST can be miniaturized, the driving force for moving the Y step platform 90 in the Y-axis direction can be reduced.

Next, another embodiment of the exposure apparatus will be described. In the following embodiments after the second embodiment, the parts other than the substrate stage device are the same as the exposure device 10 of the first embodiment. Therefore, only the substrate stage device will be described below.

"Second Embodiment"

Next, a second embodiment will be described with reference to FIG. 7. Here, the same or equivalent components as those in the first embodiment described above are denoted by the same or similar symbols, and the description thereof is simplified or omitted.

Although the overall structure of the substrate stage device PST1 of the second embodiment is the same as the aforementioned substrate stage device PST, the point where the X beam 125 is provided instead of the X beam 25, the shape of the X bracket 140, and the X bracket 40 Part of the shape is different, and part of the configuration is different from the substrate stage device PST. The following description focuses on the differences between the two.

As shown in FIG. 7, the substrate stage device PST1 includes a pair of X beams 125 each having a shape in which four vertices of a rectangle (including a rhombus and a square) are cut off (cornered) at the YZ section, and That is, it has an octagonal shape. The X-beam 125 on one side (+ Y side) is fixed to the Y-bracket 75 on the one side through the mounting member 124 in a state of an inclination angle φ (for example, 45 degrees) with respect to the Y-axis in the θx direction. The X-beam 125 on the other side (-Y side) is symmetrical to the X-beam 125 on one side, that is, it is fixed to the other Y-bracket 75 through the mounting member 124 in a state of an inclination angle -φ relative to the Y-axis in the θx direction. Above. Each pair of X beams 125 has four inclined surfaces (surfaces inclined with respect to the XY plane).

Among the 4 slopes of one X-beam 125, a pair of slopes facing each other that are not fixed to the mounting member 124, that is, the first slope on the + Y side and + Z side and the -Y side and -Z side The second inclined surface is provided with each of a pair of X anchors 82 extending substantially over the entire length in the longitudinal direction (X-axis direction). In addition, the fourth inclined surface (that is, the -Y side and the + Z side inclined surface) of the X beam 125 on one side opposite to the third inclined surface fixed to the mounting member 124 is spaced at a predetermined interval in a direction parallel to the inclined surface. A plurality of (for example, two) X linear guides 17a extending in the X-axis direction are fixed in parallel to each other.

The X beam 125 on the other side is arranged symmetrically with the X beam on the other side, and is provided with a pair of X anchors 82 and a plurality of X linear guides 17a.

The pair of X brackets 140 are each formed of an inverted U-shaped member having a YZ cross section having a top portion and two pairs of side wall portions provided at both ends in the longitudinal direction of the top portion. The X bracket 140 on one side (+ Y side) is arranged in a side view (viewed from the + X direction) in the state of θx tilted φ with respect to the Y axis, and the first, second, and fourth oblique faces of the X beam 125 are arranged facing each other. . The X bracket 140 on the one side is formed near the central portion in the X-axis direction of the side wall portion (the portion facing the first and second slopes of the X beam 125), similarly to the X bracket 40 described above. The notch portion 42 (see FIG. 2) is inserted into the arm portion 54 in the one notch portion 42.

On the inner surface of one pair of side walls of one of the X brackets 140, a pair of X-fixers 82 facing each other through a predetermined clearance (gap / clearance) and each of the first and second slopes of the X-beam 125 are fixed. A pair of X mover 81. In addition, the inner surface of the top of the X bracket 140 is opposite to each X line. A plurality of (for example, four) guides 17a are fixed to the sliders 17b including rolling elements and slidably engaged with the Y linear guides 17a.

The X bracket 140 on the other side (-Y side) is bilaterally symmetrical with the X bracket 140 on the one side, and has the same structure, and is also provided with a pair of X movers 81 and a plurality of sliders 17b.

The X-fixer 82 and the X-mover 81 which oppose each other constitute a moving coil type X linear motor of an electromagnetic force (Lorentz force) driving method, respectively. Although the X coarse motion stage 123x is driven in the X-axis direction by these X linear motors, at this time, it is guided in the X-axis direction by a plurality of X linear guides including the X linear guide 17a and the slider 17b.

In this embodiment, whether the X coarse movement stage 123x is driven or stopped, the X beam 125 on one side (+ Y side), that is, the X bracket 140 engaged with this, is fixed to the X beam. The X anchor 82 of the first inclined plane of 125 generates a magnetic attraction Fb between the opposite X movable element 81, and the X anchor 82 fixed to the second inclined plane of the X beam 125 is X movable opposite to this A magnetic attraction force Fb is also generated between the sub-81s. The two magnetic attraction forces Fb are equal in size and facing in opposite directions. Of course, for the two magnetic attraction forces Fb, the vertical component force F ₃ and the horizontal component force F _{4 are} also equal. Therefore, between the X-beam 125 and the X-bracket 140 on one side (+ Y side), as a whole, no force is generated on the X-bracket 140 to be driven in the Z-axis and Y-axis directions with respect to the X-beam 125. Similarly, between the X-beam 125 and the X-bracket 140 on the other side (-Y side), the X-bracket 140 is not driven in the Z-axis and Y-axis directions relative to the X-beam 125 as a whole. force. That is, the predetermined position between the X movable element 56 (core coil unit (see FIG. 5)) and the X anchor 82 (magnet unit) mounted diagonally upward from the front ends of the pair of arm portions 54 of the weight canceling device 50 can be maintained. Clearance (gap).

As described above, according to the substrate stage device PST1 of the second embodiment, it is possible to obtain the same effect as that of the substrate stage device PST of the first embodiment. Other than that, according to On-board stage device PST1, since the magnetic attraction force Fb acting between a pair of X-beams 125 and a pair of X-brackets 140 is canceled, it is possible to prevent a vertical upward movement of a pair of X-brackets 140 (X slider 17b). Power. Therefore, by arbitrarily setting the inclination angle φ (-φ) of the pair of X beams 125 and the inclination angle φ of the arm portion 54 opposing the X beam 125 to a predetermined angle, it is possible to prevent the pair of X brackets 140 In the floating state, an arbitrary setting force acting on the base pad 55 and the Y step platform 90 in the vertical direction is set downward. In this way, it is possible to further miniaturize the base pad 55 and further miniaturize the Y step platform 90.

"Third Embodiment"

Next, a third embodiment will be described with reference to FIGS. 8 and 9. Here, the same or equivalent components as those in the second embodiment described above are denoted by the same or similar symbols, and the description thereof is simplified or omitted.

Although the overall structure of the substrate stage device PST2 of the third embodiment is the same as that of the substrate stage device PST1 of the second embodiment described above, an X bracket 240 and a weight cancellation are provided in place of the X bracket 140 and the weight cancellation device 50. The point and the like of the device 250 are different from those of the substrate stage device PST1. The following description focuses on the differences.

Each of a pair of X brackets 240, as shown in FIG. 8, has a flat plate-shaped top portion 63 extending in the X-axis direction and a pair of side wall portions 64 provided in the middle portion in the longitudinal direction of the top portion 63. (Viewed in the X direction) an inverted U-shape (see FIG. 9). In FIG. 8, a pair of X brackets 240 are simplified and displayed. In addition, as shown in FIG. 9, the X bracket 240 on one side (+ Y side) is in a state where the side view (viewed from the + X direction) is inclined φ with respect to the Y axis in the θx direction and the first and the first of the X beam 125 2 and 4 are placed diagonally. Comparing FIG. 2 and FIG. 8 with one X bracket 240, it can be seen that, compared with the X brackets 40 and 140 described above, the dimension in the X-axis direction is small, and no notch is formed near the central portion in the X-axis direction.

As shown in FIG. 9, the inner surfaces of a pair of side wall portions 64 of one of the X brackets 240 are respectively A pair of X movers 81 that are opposed to each other through a predetermined gap (clearance / gap) and fixed to one of the first and second slopes of the X beam 125 are fixed to the X mover 82. On the inner surface of the top 63 of the X bracket 240, a plurality of (for example, four) sliding members 17b including rolling elements are slidably engaged with the Y linear guide 17a with respect to each X linear guide 17a. .

The X bracket 240 on the other side (-Y side) is symmetrical with one X bracket 240 on the left and right sides, and has the same structure, and is also provided with a pair of X movers 81 and a plurality of sliders 17b.

The X-fixer 82 and the X-mover 81 which oppose each other constitute a moving coil type X linear motor of an electromagnetic force (Lorentz force) driving method, respectively. Although the X coarse movement stage 223x is driven in the X-axis direction by these X linear motors, at this time, it is guided in the X-axis direction by a plurality of X linear guides including the X-linear guide 17a and the slider 17b.

Returning to FIG. 8, a pair of X arm portions 254 are fixed to the weight canceling device 250 on both sides in the Y-axis direction of the casing 51. The pair of X arm portions 254 are respectively formed by rod-shaped members extending in the X-axis direction, and the length in the X-axis direction is slightly longer than the length in the X-axis direction of the inverted U-shaped portion of the cross section of the X bracket 240. Each of the pair of X arm portions 254 is connected to the side wall portion 64 of the X bracket 240 at a central position in the X axis direction on the outer side surface in the Y axis direction through a flexure device 45. The height of the deflection device 45 is substantially the same as the position of the center of gravity in the Z-axis direction of the weight canceling device 250. Each of the pair of X arm portions 254 is connected to the pair of Y arm portions 255 at both ends in the longitudinal direction. Each of the pair of Y arm portions 255 is composed of a rod-shaped member extending in the Y-axis direction, and the length in the Y-axis direction and the interval between the pair of X brackets 240 are approximately the same length. In addition, each of the pair of Y arm portions 255 is connected to the connection plate 41 via a flexure device 45 at a center position in the Y axis direction on the outer side surface in the X axis direction. On both ends of the pair of Y-arm portions 255 in the longitudinal direction, X-fixes arranged in a pair of X-fixers 82 that pass through a predetermined gap (clearance / gap) and a pair of X-beams 125 are arranged inside the Y-axis direction. Child 82 is opposite to X mover 56. Each X mover 56 includes The core coil unit constitutes a moving-coil linear motor that drives the weight canceling device 250 in the X-axis direction together with the opposing X holder 82 (magnet unit).

As described above, according to the substrate stage device PST2 of the third embodiment, it is possible to obtain effects equivalent to those of the substrate stage device PST1 of the second embodiment. In addition, according to the substrate stage device PST2, since a magnetic attraction force acts on both ends of a pair of Y arm portions 255, the force acting in the vertical direction on the weight canceling device 250 can be increased. In addition, the weight canceling device 250 is supported (fixed) by the X arm portion 254 at two places near the center in the long side direction of the Y arm portion 255 acting by the magnetic attraction force, so that the magnetic attraction force can be prevented from acting on the two sides of the Y arm portion 255. The deflection of the Y arm portion 255 at the end causes the weight canceling device 250 to generate a certain magnetic attraction force.

"Fourth Embodiment"

Next, a fourth embodiment will be described with reference to FIGS. 10 to 12. Here, the same or equivalent components as those in the first embodiment described above are denoted by the same or similar symbols, and the description thereof is simplified or omitted.

Although the overall structure of the substrate stage device PST3 of the fourth embodiment is the same as that of the substrate stage device PST, the shape of the X beam 325, the X bracket 340, and the weight canceling device 350 is the same as that of the X beam 25 and the X bracket. The difference between the rack 40 and the weight canceling device 50 is different from the substrate stage device PST. The following description focuses on the differences.

As shown in FIG. 10 and FIG. 11, the pair of X beams 325 are composed of rod-shaped members extending in the X-axis direction. Each of a pair of X beams 325 has a YZ cross-sectional shape different from that of the X beams 25. That is, each of a pair of X beams 325 has a rectangular shape outside the YZ cross section, and has a hollow portion that is located in the center of the Y axis direction and extends in the X axis direction and is parallel to the XZ plane. member. Each of a pair of X-beams 325 is fixed on both sides of the Y-axis direction with X-fixers 82 extending in the X-axis direction. A plurality of (for example, two) X linear guides 17a extending in the X-axis direction at predetermined intervals in the Y-axis direction are fixed.

Each of a pair of X brackets 340, as shown in FIG. 11, has a flat plate member 65 extending in the X-axis direction, and both sides of the Y-axis direction in the middle portion of the 65 long-side direction of the flat plate member with upper surfaces and The upper side of the flat plate member 65 is fixed to a side wall member 66 parallel to the pair of Z-axes in a state where the upper surface is substantially the same height. That is, the pair of X brackets 340 each have a shape in which the central portion in the X-axis direction has an inverted U-shape in cross section at the YZ cross section, and are arranged to straddle each of the pair of X beams 325 (see FIG. 10).

As shown in FIG. 10, one (+ Y side) X bracket 340 has a plurality of (for example, four) fixed in a slidable manner relative to each X linear guide 17a below (top surface) the flat plate member 65. The sliding piece 17b which is combined with the X linear guide 17a, and in addition, each of the pair of side members 66 is fixed on the inner surface of each of the pair of X-movers through a predetermined gap (clearance / gap) and a pair of X-fixers 82. Child 81. The X bracket 340 on the other side (-Y side) has the same configuration as the X bracket 340 on the other side.

As shown in FIG. 11, the pair of X brackets 340 are connected by a connection plate 341 that connects the side wall members 66 disposed on the inner side in the Y-axis direction among the pair of side wall members 66. The connection plate 341 is a flat plate member having a circular opening 342 formed in the center in a plan view, and has a predetermined length in the X-axis direction (for example, approximately the same length as the side wall member 66). A permanent magnet 343 (see FIG. 10) is fixed to a plurality of places around the opening portion 342 (for example, four places at 90-degree intervals) below the link plate 341. The material of the permanent magnet 343 is not particularly limited, and it is formed using, for example, a ferrite magnet, a neodymium magnet, and a nickel-cobalt magnet.

Returning to FIG. 10, the weight canceling device 350 is inserted into the opening portion 342 from below, and is supported on the Y step platform 90 through the base pad 55. The weight canceling device 350 is different from the aforementioned weight canceling device 50 in the shape of the casing 351 and the connection position of the flexure device 45.

The casing 351 is constituted by a bottomed cylindrical member having an opened upper surface. The casing 351 has a ring-shaped crotch 352 around the bottom surface. The flange portions 352 are arranged on the outer peripheral edge portion so as to face the permanent magnets 343 fixed to the connecting plate 341, and the magnetic bodies 353 are arranged at a predetermined interval (a predetermined angular interval). When the weight canceling device 350 is mounted on the Y stepping platform 90 in a non-contact state through the base pad 55, the permanent magnet 343 and the magnetic body 353 are arranged to face each other through a predetermined clearance (gap). The magnetic body 353 is composed of a block member having a certain thickness. Although the material is not particularly limited, it is formed using, for example, iron oxide, chromium oxide, cobalt, or ferrite.

One end of the bending device 45 is fixed to the outer peripheral surface of the casing 351 at a predetermined interval (predetermined angular interval) (for example, four), and the other end is fixed to the inner peripheral surface of the opening formed in the connecting plate 341 (see FIG. 11). ).

As the plurality of permanent magnets 343 fixed under the link plate 341, a single permanent magnet may be used respectively, but it is not limited thereto, and a plurality of magnets may be used in combination.

For example, as shown in FIG. 12 (A), a pair of permanent magnets 343a and 343b having different polarities can be fixed at a predetermined interval below the yoke 344 buried under the connecting plate 341, and can be constituted according to A permanent magnet 343. In the example of FIG. 12 (A), the permanent magnet 343a arranged on the -Y side has S pole on the + Z side and the N pole on the -Z side. On the other hand, the permanent magnet 343b on the + Y side has + The Z side is the N pole and the -Z side is the S pole. A magnetic attraction force Fc is generated between the pair of permanent magnets 343a and 343b and the magnetic body 353. As shown in FIG. 12 (B), instead of the magnetic body 353, the permanent magnet 345 may be arranged to face the permanent magnet 343. At this time, the permanent magnet 345 is arranged such that one side facing the permanent magnet 343a is an S pole, and the other side facing the permanent magnet 343b is an N pole.

As described above, according to the substrate stage device PST3 of the fourth embodiment, an effect equivalent to that of the substrate stage device PST of the first embodiment can be obtained. Other than that, according to Since the on-board stage device PST3 does not generate a force to float the X bracket 340, the X bracket 340 can be prevented from floating. According to this, in the substrate stage device PST3, the magnetic attraction force Fc generated between the permanent magnet 343 and the magnetic body 353 can be adjusted to an arbitrary size, and as a result, the Y step platform 90 and the vibration isolator can be lightened and relaxed. Load of 34.

"First Modification of Fourth Embodiment"

Next, a first modification of the fourth embodiment will be described with reference to FIG. 13. Here, the same or equivalent components as those in the fourth embodiment are denoted by the same or similar symbols, and descriptions thereof are simplified or omitted.

The substrate stage device PST3a of this modified example is a point where the position of the flange portion 352 and the connecting plate 341 of the weight offset device 350 in the substrate stage device PST3 is interchanged, and the flange portion 352 is then flexed by the flexure device 45 The point where the X bracket 340 is connected, and a part of the weight acting on the micro-movement stage 30 of the Y step platform 90 is reduced by the magnetic reaction force Fd between the permanent magnet 343 and the permanent magnet 346, as described above. The substrate stage device PST3 is different.

As shown in FIG. 13, the weight canceling device 350 a of this modification is provided at a middle position in the Z-axis direction of the casing 351 a, and specifically, a ridge portion 352 is provided at a height position substantially consistent with the center of gravity of the weight canceling device 350 a. . A permanent magnet 343 is fixed to the outer peripheral portion below the lower portion 352. Further, one end of a plurality of (for example, four) bending devices 45 are connected to the outer peripheral surface of the crotch portion 352 at a predetermined interval (a predetermined angular interval). The other end of the flexure device 45 is connected to the side wall member 66 of the X bracket 340 and the side wall member 66 disposed on the inner side in the Y-axis direction.

The connecting plate 341 that connects the pair of X brackets 340 is fixed to the lower end portion of the side wall member 66 disposed on the inner side in the Y-axis direction among the side wall members 66 of each of the pair of X brackets 340. In addition, around the opening on the upper surface of the connecting plate 341, a pair of permanent magnets are fixed at positions facing the permanent magnets 343, respectively. The permanent magnet 343 generates a permanent magnet 346 of a reactive magnetic force.

As described above, according to the substrate stage device PST3a of the first modified example, the same effect as that of the substrate stage device PST3 of the fourth embodiment can be obtained, because the crotch portion 352 to which the permanent magnet 343 is fixed is fixed to The weight offset device 350a is near the middle position in the Z-axis direction, and the connecting plate 341 fixed with the permanent magnet 346 is fixed at the lower end of the X bracket 340. Therefore, the Z position of the X beam 325 is arranged at the Z position of the weight offset device 350a. Several below. Accordingly, the substrate stage device PST3a can improve the stability when moving in the scanning direction and the scanning cross direction.

"Second Modification of Fourth Embodiment"

Next, a second modification of the fourth embodiment will be described with reference to FIG. 14. Here, the same or equivalent components as those in the fourth embodiment are denoted by the same or similar symbols, and descriptions thereof are simplified or omitted.

In the substrate stage device PST3b of this modification, the shape of the X beam 325b and the shape of the X bracket 340b are different from the shape of the X beam 325 and the shape of the X bracket 340 of the substrate stage device PST3.

A pair of X-beams 325b are each composed of rod-shaped members extending in the X-axis direction. The shape of the YZ cross section is thin and generally isosceles trapezoidal, which has a number of upsides than the bottom. That is, a pair of X beams each have a pair of inclined surfaces (both sides in the Y-axis direction) that are inclined above and below the XY plane and inclined with respect to the XZ plane at a predetermined angle θ, -θ. The X linear guide 17a and the X holder 82 are respectively fixed on the upper surface of the X beam 325b and a pair of inclined surfaces (both sides in the Y-axis direction) similarly to the X beam 325.

The pair of X brackets 340b each have a pair of side wall members 68 having a shape different from that of the pair of side wall members 66 that the X bracket 340 has. That is, the + Y side and the -Y side are paired with each other. The side wall member 68 has a first portion parallel to the XZ plane from the upper end (+ Z side end) to the vicinity of the central portion, and is inclined to the −Y side or the + Y side from the vicinity of the central portion to the lower end (−Z side end). The second part facing obliquely to the two X-beams 325b. On the top surfaces of the pair of X brackets 340b (below the flat plate member 65), a slide member 17b that is slidably engaged with the X linear guide 17a is fixed, and the second part of the inner wall surface of the side wall member 68 is fixed. The X mover 81 which is opposed to the X holder 82 through a predetermined clearance (clearance / gap) and generates a magnetic attraction Fe is fixed. The magnetic force Fe acting between the X-beam 325b on one side and the X bracket 340b is cancelled in the horizontal direction. Similarly, the magnetic force Fe acting between the X-beam 325b on the other side and the X bracket 340b is horizontal. The component of direction is also offset. That is, the magnetic attraction force Fe acting on the X-bracket 340b exerts only a vertical upward component force on the X-bracket 340b.

As described above, according to the substrate stage device PST3b of this modification, in addition to obtaining the same effect as the substrate stage device PST3 of the fourth embodiment, it is obtained by the downward force applied to the X bracket 340b in the vertical direction. This reduces the driving resistance generated between the X slider 17b and the X linear guide 17a when the substrate stage device PST3b is driven in the X-axis direction. In addition, in addition to the X mover 81 and the X holder 82 that generate the magnetic attraction force Fe for reducing the downward force acting on the X bracket 340b in the vertical direction, a generator for reducing the effect on the substrate carrier is also provided. The permanent magnet 343 and the magnetic body 353 of the magnetic attraction force Fc, which are a part of the weight of the stage 350 and the weight of the device 350, can be set to generate predetermined magnetic attraction forces, respectively.

"Fifth Embodiment"

Next, a fifth embodiment will be described with reference to Figs. 15 and 16. Here, the same or equivalent components as those in the first embodiment described above are denoted by the same or similar symbols, and the description thereof is simplified or omitted.

Although the overall structure of the substrate stage device PST4 of the fifth embodiment is the same as that of the substrate The stage device PST is the same, but the shape of the X-beam 325 and the shape of the X-bracket 440 are different from the shape of the X-beam 25 and the X-bracket 40 described above, and a method to reduce the load on the anti-vibration device 34, etc. The structure is different from that of the substrate stage device PST. The following description focuses on the differences.

As shown in Figs. 15 and 16, one pair of X beams 325 in this embodiment is composed of a member having the same shape as one of the pair of X beams 325 used in the fourth embodiment. Similarly, a plurality of X linear guides 17a. A pair of X anchors 82 are fixed on the upper surface and a pair of side surfaces.

As shown in FIG. 15 and FIG. 16, the pair of X brackets 440 have a flat plate member 59 with a rectangular plan view with the X-axis direction as the long side direction, and a state where the upper end surfaces and the upper surfaces of the flat plate members 59 are substantially the same as each other. A pair of side wall members 58 parallel to the Z axis are fixed to one pair of one end portion in the longitudinal direction and the other end portion in the Y-axis direction of the flat plate member 59. As viewed from the + X direction, the X bracket 440 has an inverted U shape as shown in FIG. 16, and X beams 325 are inserted between the side wall members 58 on the + Y side and the −Y side that are paired with each other. A notch portion 42 is provided near the center of the long side direction (X-axis direction) of the X bracket 440 (see FIG. 15).

A pair of X brackets 440 are respectively fixed on the top surface (below the flat plate member 59) with a plurality of (for example, four) sliding members that are slidably engaged with the X linear guides 17a relative to the X linear guides 17a. 17b. In addition, on the inner wall surface of the side wall member 58 are respectively fixed X movers 81 that pass through a predetermined clearance (gap) and a pair of X fixers 82 opposite to each other.

In the first embodiment, the X mover 56 is fixed to the front end of the pair of arm portions 54 fixed to one of the weight canceling devices 50 to reduce a portion of the load acting on the gravity direction of the anti-vibration device 34, but as shown in FIG. 16 As shown, the weight canceling device 450 in this embodiment is not provided with the arm portion 54 and the X mover 56. That is, the weight canceling device 450 includes a casing 51, an air spring 52, a Z slider 53, a base pad 55, and the like. The weight canceling device 450 passes through a plurality of bars (such as 4 The flexure device 45 is connected to a pair of X brackets 440. Each of the deflection devices 45 is formed at approximately the same height as the position of the center of gravity of the weight canceling device 450.

Returning to FIG. 15, a pair of base frames 414 are each composed of rod-shaped members extending in the Y-axis direction. A pair of base frames 414 respectively include an upper surface and a lower surface parallel to the XY plane, a surface (inclined surface) slightly inclined in the θx direction with respect to the YZ plane, and the other surface inclined at the same angle as the opposite direction (-θx direction). (Slope) A main body portion 414a composed of a hollow member, and a plurality of leg portions 14b supporting the main body portion 414a from below. A plurality of adjusters 14c are provided at the lower end of each leg portion 14b, and the Z position of the main body portion 414a can be adjusted.

On both sides of the body portion 414a in the X-axis direction (a pair of opposite inclined surfaces), Y-fixers 73 extending in the Y-axis direction, which are elements of a linear motor, are respectively fixed. Further, on the main body portion 414a, a plurality of (for example, two) mechanical Y linear guides (single-axis guides) extending in the Y-axis direction are fixed in parallel to each other, and the elements are extended in the Y-axis direction. Y linear guide 16a.

The main body portion 414a is disposed (inserted) between a pair of facing surfaces (between the side wall members) of one of the Y brackets 475 constituted by an inverted U-shaped member having an XZ cross section. A plurality of (for example, two) Y brackets 475 are arranged between the base frames 414 in the Y-axis direction, and each of the Y brackets 475 is connected to each other by a plate 76 fixed on the Y brackets 475. One of the opposite faces of the Y bracket 475 has a first portion parallel to the YZ plane from each upper end (+ Z side end) to the vicinity of the central portion, and is inclined from the near portion of the central portion to the lower end (-Z side end). -X side or + X side and the second part facing obliquely to the two main body parts 414a of the base frame 414. The Y bracket 475 is set so that the two inclined surfaces of the main body portion 414a are parallel to the second portion of the opposite surface of the opposite Y bracket 475 when the Y bracket 475 is mounted on the base frame 414. . A pair of Y movers 472 are fixed to each of the second part of one of the opposite sides of the Y bracket 475 through a predetermined clearance (gap) and each of a pair of Y holders 73. Each Y mover 472 includes The core coil unit constitutes a Y linear motor that drives the X beam 325 in the Y-axis direction with a predetermined stroke together with the opposing Y-fixer 73. Further, a magnetic attraction force Ff is generated between each of the Y movers 472 and the opposite Y fixer 73. In addition, a plurality of (for example, two) sliding members 16b slidably engaged with the Y linear guide 16a are fixed to the top surface of the Y bracket 475.

The Y step stage 490 is formed of a rod-shaped member extending in the X-axis direction, and is mounted on the substrate stage 33. At both ends in the longitudinal direction of the Y step platform 490, a Y mover 94 opposed to the Y holder 73 through a predetermined gap (clcarance / gap) is fixed through the fixing member 446. Each Y mover 94 includes a core coil unit (not shown), and an X linear motor that drives the Y step platform 490 in the X-axis direction with a predetermined stroke together with the opposite Y stator 73. Further, a magnetic attraction force Fg is generated between each of the Y movers 94 and the opposite Y fixer 73.

Between the Y mover 94 which is fixed to the + X side fixing member 446 of the Y step platform 490 and the opposite Y fixer 73, a magnetic attraction force Fg acts in the + X direction and the + Z direction, and is fixed to the Y Between the Y mover 94 of the -X side fixing member 446 of the stepping platform 490 and the opposite Y fixer 73, a magnetic attraction force Fg acts in the -X direction and the + Z direction. In this case, since the horizontal component forces of the two magnetic attraction forces Fg are equal to each other in opposite directions (opposite), they cancel each other out. That is, the above two magnetic attraction forces Fg exert a vertical upward force on the Y step platform 490, and the reaction force thereof is transmitted to the ground 11 through the base frame 414.

As described above, the substrate stage device PST4 of the fifth embodiment can obtain the same effects as the substrate stage device PST of the first embodiment. In addition, in the substrate stage device PST4, since the load received by the vibration prevention device 34 is reduced, it is possible to reduce the eccentric load of the vibration prevention device 34 when the substrate stage device PST4 is driven.

"Modification of the fifth embodiment"

Next, a modification of the fifth embodiment will be described with reference to FIG. 17. Here, the same or equivalent components as those in the fifth embodiment are denoted by the same or similar reference numerals, and descriptions thereof are simplified or omitted.

The substrate stage device PST4a of this modified example has a point where the Y mover 94 is not provided on the fixed member 446 provided at both ends in the longitudinal direction of the Y step platform 490a, and a magnetic body 96 is fixed on the fixed member 446. The point where a permanent magnet 97 is provided on the X bracket 475a through a predetermined clearance (gap) above the magnetic body 96 is different from the substrate stage device PST4.

The permanent magnet 97 is actually fixed under the fixing member 478. On the + X side of the Y step platform 490a, the fixing member 478 is fixed to each Y bracket 475a by connecting a plurality of (for example, two) Y brackets 475a to each other at a predetermined interval in the Y-axis direction. X side side above the end. The permanent magnet 97 is fixed below the fixed member 478 so as to face the magnetic body 96 through a predetermined gap. That is, in the Y step platform 490a of this modification, a magnetic attraction force is generated between the Y holder 73 fixed to the body portion 414a of the base frame 414 and the Y mover 472 fixed to the Y bracket 475a. Ff is different and the force in the vertical direction formed by the magnetic attraction force Fh generated between the magnetic body 96 and the permanent magnet 97 is independent. The other parts of the Y bracket 475a have the same configuration as the Y bracket 475 described above.

As described above, the substrate stage device PST4a according to the modification of the fifth embodiment can obtain the same effect as that of the fifth embodiment. In addition, according to the substrate stage device PST4a, since the vertical magnetic attraction force Fh acting on the Y step platform 490a and the magnetic attraction force Ff acting on the Y bracket 475a are generated by independent magnetic generating devices, The magnetic attraction force Fh acting on the Y step platform 490a and the magnetic attraction force Ff acting on the Y bracket 475a can be set as predetermined forces, respectively. That is, the load (eccentric load) acting on the anti-vibration device 34 and the Y linear guide 16a and The driving resistance experienced by the plurality of Y linear guides of the slider 16b is reduced to a predetermined value.

In addition, the device configuration described in each of the first to fifth embodiments and modifications (hereinafter, referred to as each embodiment, etc.) is only an example, and various modifications are of course possible. For example, in the above embodiments, the magnetic load or magnetic repulsion is used to reduce the load in the direction of gravity acting on the Y step platforms 90, 490, and 490a and the substrate stage 33 and the anti-vibration device 34 that support them. The load situation has been explained, but it is not limited to this. The electromagnetic force in the direction with the vertical component force is generated by the linear motor for driving the X coarse movement stage or the linear motor for driving the Y coarse movement stage. In this case, a load-reducing device that can use the electromagnetic force to reduce the load in the direction of gravity acting on the Y-step platforms 90, 490, and 490a, and the substrate stage 33 and the anti-vibration device 34 supporting the same can be reduced. , Equipped with substrate stage devices PST, PST1, PST2, PST3, PST3a, PST3b, PST4, PST4a.

In addition, instead of the combination of the stator (magnet unit) and the movable element (cored coil unit) in the above-mentioned embodiments, the load reduction can be constituted by the combination of the stator (magnet unit) and the magnetic member. Device. Alternatively, an electromagnet may be used instead of a permanent magnet constituting at least a part of the load reduction device.

In addition, each of the above embodiments is directed to the substrate stage devices PST, PST1, PST2, PST3, and PST3a provided with the weight canceling devices 50, 250, 350, 350a, and 450 that move on the Y step platforms 90, 490, and 490a. , PST3b, PST4, PST4a have been described, but are not limited to this. For example, as disclosed in US Patent Application Publication No. 2010/0018950, etc., in a scanning type exposure apparatus including a substrate stage device equipped with a weight canceling device , Including a fixed element (magnet) provided on the Y coarse movement stage and a movable element (coil) provided on the X coarse movement stage to drive the X coarse movement stage in the X-axis direction (scanning direction) with a predetermined stroke. X linear motor The force between the coil of the movable element and a part of the weight canceling device is used to cancel the load reducing device acting on the load in the direction of gravity acting on a support frame including a platform supporting the weight canceling device from below. In this case, during the exposure processing of the substrate (object), the X coarse movement stage that can move in a direction parallel to the horizontal plane together with the substrate holder (object holding member) holding the substrate is driven by the linear motor in the X-axis direction. . At this time, although the load in the direction of gravity formed by the weight of the substrate holder and the weight canceling device acts on the support stand, the load can be reduced from the weight by using the force acting between the load reducing device and a part of the weight canceling device. The canceling device moves part of the force to the X coarse movement stage to reduce it. Therefore, it is possible to reduce the eccentric load acting on the support stand formed by the movement of the center of gravity of the system including the substrate holder, the weight canceling device, and the support stand, thereby maintaining sufficient exposure accuracy.

The modified examples of the first to fourth embodiments may be used in combination with the fifth embodiment and the modified examples. That is, a device that generates a vertical upward force on the weight canceling devices 50, 250, 350, 350a, and 450 and a device that generates a vertical upward force on the Y step platforms 90, 490, and 490a can be used in combination.

In each of the above embodiments, although the pair of X brackets 40, 140, 240, 340, 340b, and 440 are connected by the connecting plates 41 and 341, the pair of X brackets may be replaced instead of the connecting plates 41 and 341. The rack is synchronously driven in the X-axis direction by the main control device. Similarly, although a plurality of Y brackets 75, 475, and 475a mounted on one base frame 14, 414 are connected by plates 76, respectively, instead of the plate 76, a plurality of Y brackets 75 and 475 may be connected. The 475a is synchronously driven in the Y-axis direction by the main control device.

In each of the above embodiments, the Y step platforms 90, 490, and 490a are solid members, but the invention is not limited thereto, and may be a hollow member or a shape having ribs provided inside the hollow member. For example, a Y step platform made of a hollow member can be manufactured by casting or the like.

Further, in the first embodiment, the deflection device 45 connecting the weight canceling device 50 and the X bracket 40 may be arranged so that the weight canceling device 50 can be pulled only in the Y-axis direction. In addition, if the weight canceling device 50 and the X bracket 40 are driven in the X-axis direction and the Y-axis direction by the flexure device 45, the X mover fixed at the front end of the arm portion 54 of the weight canceling device 50 may be replaced. 56, while fixing the magnetic body.

In addition, in the fourth embodiment and the modified examples of the fourth embodiment, although a pair of X brackets 340 and 340b are connected by a connecting plate 341 formed with an opening portion, it is not limited to this, and a pair of X brackets may also be connected. The racks 340 and 340b are connected by a plurality of connection plates arranged separately in the X-axis direction. In addition, the crotch portion 352 fixed to the weight canceling devices 350 and 350a need not be provided on the entire circumference of the weight canceling devices 350 and 350a, and may be a rod-shaped member protruding toward the outer peripheral direction.

In the modified example of the fifth embodiment, although the magnetic bodies 96 are arranged at both ends in the longitudinal direction of the Y step platform 490a, it is not limited to this, as long as the vertical direction can be applied to the Y step platform 490a The upward force is sufficient. Therefore, for example, the magnetic body 96 can be disposed through the fixing member at the middle portion in the long side direction of the Y step platform 490a, and fixed under the X beam 325 by arranging a permanent magnet 97 on the opposite side. Permanent magnet 97.

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). In addition, as the illuminating light, a single-wavelength laser light such as an infrared band or a visible light band emitted from a DFB semiconductor laser or an optical fiber laser may be used, for example, a fiber amplifier doped with erbium (or erbium and erbium). The amplitude is converted to harmonics of ultraviolet light using non-linear optical crystals. Furthermore, a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

In each of the above embodiments, the projection optical system PL A case has been described in which a multi-lens projection optical system having only a plurality of projection optical units is provided, but the number of projection optical units is not limited to this, as long as it is one or more. In addition, it is not limited to the projection optical system of the multi-lens method, and may be a projection optical system using, for example, a large-type reflector of the Ofner type. It should be noted that although the above embodiment has described the case where a projection magnification is used as the projection optical system PL, the projection optical system may be any of a reduction system and a large system.

In each of the embodiments described above, although a light-transmitting type mask in which a predetermined light-shielding pattern (or phase pattern or light-reduction pattern) is formed on a light-transmitting mask substrate is used, for example, U.S. Patent No. 6,778,257 may be used. According to the publication, an electronic photomask (variable forming photomask) that forms a transmission pattern or a reflection pattern or forms a light-emitting pattern according to the electronic data of the pattern to be exposed, for example, a non-light-emitting image display element (also referred to as A variable shape photomask of DMD (Digital Micro-mirror Device), which is a type of spatial light modulator.

In addition, as an exposure device, it is particularly suitable for exposing a substrate having a size (including at least one of outer diameter, diagonal length, and at least one of one side) of 500 mm or more, such as exposing a large substrate for a flat panel display such as a liquid crystal display element. It is particularly effective when installed.

In addition, as an exposure device, it can be applied to an exposure device of a step & repeat method, and an exposure device of a step & stitch method. In addition, the object held by the moving body of the moving body device is not limited to an exposure target object substrate or the like, but may be a pattern holding body (original plate) such as a photomask.

In addition, the application of the exposure device is not limited to an exposure device for liquid crystal that transfers a pattern of a liquid crystal display element to a square glass plate, and can also be widely applied to, for example, an exposure device for semiconductor manufacturing, a thin film magnetic head, a micromachine, and Exposure device for DNA wafers. Besides, not only It is a micro-element such as a semiconductor element, and the present invention can also be applied to transfer a circuit pattern to manufacture a photomask or a reticle for a light exposure device, an EUV exposure device, an X-ray exposure device, an electron-ray exposure device, and the like Exposure devices to glass substrates or silicon wafers. The device including an object holding device for holding an object is not limited to an exposure device, and may be another substrate processing device, such as a glass substrate (or wafer) inspection device. The object to be exposed is not limited to a glass plate, and may be other objects such as a wafer, a ceramic substrate, a thin film member, or a mask blank. When the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a film-like (flexible sheet-like member) is also included.

Electronic components such as liquid crystal display elements (or semiconductor elements) are the steps of designing the functional performance of the elements, the steps of making a photomask (or reticle) based on this design step, and the steps of making a glass substrate (or wafer). 5. The lithography step of transferring a photomask (reticle) pattern to a glass substrate by the exposure apparatus and exposure method of each of the above-mentioned embodiments, a development step of developing the exposed glass substrate, and a portion of the remaining resist The exposed parts of the other parts are manufactured by an etching step of removing the exposed members, a resist removing step of removing the resist that is not necessary to complete the etching, an element assembling step, an inspection step, and the like. In this case, since the exposure method is performed in the lithography step using the exposure apparatus of the above-mentioned embodiment to form an element pattern on a glass substrate, it is possible to manufacture a highly integrated element with good productivity.

In addition, the disclosures of all the publications on the exposure device, the International Publications, the U.S. Patent Application Publication, and the U.S. Patent Specification cited in the above description are cited as part of the description of this specification.

Industrial availability

As explained above, the exposure device of the present invention is suitable for exposing objects on the board. In addition, the manufacturing method of the flat display of the present invention is very suitable for developing an exposed object. In addition, the device manufacturing method of the present invention is very suitable for manufacturing micro-devices.

11‧‧‧ Ground

14‧‧‧ base frame

16a‧‧‧Y linear guide

17a‧‧‧X Linear Guide

17b‧‧‧Slider

18y‧‧‧Y voice coil motor

22y‧‧‧Y moving mirror

25‧‧‧X beam

26‧‧‧Sensor

27‧‧‧Target

28‧‧‧Mirror mount

30‧‧‧Micro-motion stage

31‧‧‧ substrate holder

33‧‧‧ Substrate Stage

34‧‧‧Anti-vibration device

35a‧‧‧Y linear guide

35b‧‧‧ slider

40‧‧‧X bracket

41‧‧‧Link board

50‧‧‧ weight offset device

51‧‧‧Chassis

52‧‧‧air spring

53‧‧‧Z slider

54‧‧‧arm

55‧‧‧ base pad (air bearing)

56‧‧‧X mover

57‧‧‧Gasket (air bearing)

61‧‧‧ flat member

62‧‧‧ sidewall members

70‧‧‧leveling device

73‧‧‧Y

75‧‧‧Y bracket

76‧‧‧ plates

81‧‧‧X mover

82‧‧‧X

90‧‧‧Y step platform

PST‧‧‧ substrate stage device

Claims (29)

A scanning type exposure device is configured to move an exposure target object in a first direction parallel to a horizontal plane in a predetermined first stroke during an exposure process with respect to an energy beam for exposure, and includes a moving body capable of moving at least the first direction in the first direction. The predetermined first stroke moves and can move with the second stroke within the horizontal plane in a second direction orthogonal to the first direction; the object holding member can hold the object and at least with the horizontal plane together with the moving body Moving in parallel directions; a weight canceling device supporting the object holding member from below to offset the weight of the object holding member; a supporting member extending in the first direction to support the weight canceling device from below and capable of supporting the weight from below In the state of the offset device, it moves in the second direction in the second stroke; a support stand supporting the support member; and a load reducing device for reducing a load in the direction of gravity acting on the support stand. For example, the exposure device of the first scope of the application for a patent, wherein the load reducing device reduces the load by releasing a part of the force acting on the weight canceling device to the outside of the support stand. For example, the exposure device according to item 1 or 2 of the patent application scope, wherein the load reducing device uses a force acting between a part of the moving body and a part of the weight canceling device to reduce the load. For example, the exposure device according to any one of claims 1 to 3, wherein the moving body includes a first moving member capable of moving at least the predetermined first stroke in the first direction, and guiding the first moving member Move in the first direction and can be in the second direction and the The first moving member moves the second moving member in the second stroke together. For example, the exposure device according to item 4 of the patent application, wherein the first moving member is a linear motor including a magnet provided on the second moving member and a coil provided on the first moving member. Driven in the first direction; the load reducing device utilizes a force acting between the magnet and a part of the weight canceling device or a part of the supporting member to reduce the load in the direction of gravity acting on the supporting member. For example, the exposure device according to item 5 of the patent application, wherein the weight canceling device is provided with a core coil; the weight canceling device is an electromagnetic force generated by the electromagnetic interaction between the magnet and the core coil. The support member is driven in the first direction; the load reducing device uses the magnetic force acting between the magnet and the cored coil to reduce the load. For example, the exposure device of the first patent application range, wherein the load reducing device uses a force acting between a part of the moving body and a part of the supporting member to reduce the load. For example, the exposure device of the seventh scope of the application for a patent, wherein the load reducing device reduces the load by releasing a part of the force acting on the supporting member to the outside of the supporting stand. For example, the exposure device according to item 7 or 8 of the patent application scope, wherein the moving body includes a first moving member capable of moving at least the predetermined first stroke in the first direction, and guiding the first moving member to the first Direction and can be in the second direction and the first moving structure in the horizontal plane. The second moving member that moves together with the second stroke. For example, the exposure device according to item 9 of the patent application, wherein the load reducing device uses a force acting between the second moving member and the supporting member to reduce the load. For example, the exposure device according to item 9 or 10 of the scope of patent application, further comprising a support frame supporting the second moving member and being separated from the support stand by vibration; the second moving member includes a magnet provided on the support frame. And a linear motor with a cored coil provided on the second moving member, driven in the second direction with the second stroke; the load reducing device further reduces the magnetic force acting between the magnet and the cored coil The heavy load. For example, in the exposure device according to any one of claims 4 to 6, 9 to 11, the support member is mechanically connected to the second moving member by a connecting device, and transmits when the second moving member moves. The connecting device is pulled by the second moving member, and accordingly moves in the second direction. For example, the exposure device of the scope of application for the patent No. 12 wherein the connection device has lower rigidity in the other direction than the rigidity in the second direction. For example, the exposure device according to claim 12 or 13, wherein the connection device is connected to the support member on an axis parallel to the second direction through the position of the center of gravity of the support member. For example, the exposure device of any of claims 1 to 14 of the scope of patent application, further comprising a guide, the guide including elements of a uniaxial guide device that mechanically guides the support member to move in the second direction; The guide is separated from the moving body in vibration. For example, the exposure device of the 15th patent scope, wherein the single-axis guide device is provided with a plurality of single-axis guide devices at a predetermined interval in the first direction. For example, the exposure device of the patent application No. 15 or 16, wherein the guide members are separated from each other along the second direction, and the support member is mounted on the plurality of guide members. For example, the exposure device according to any one of claims 1 to 17, wherein the supporting member is composed of solid stone or hollow cast. For example, the exposure device according to any one of claims 1 to 18, wherein the weight canceling device is mounted on the support member in a non-contact state. For example, the exposure device according to any one of claims 1 to 19, wherein the object holding member can be at least in the first direction, the second direction, and an axis direction orthogonal to the horizontal plane relative to the moving body. Flick. For example, the exposure device of claim 20, wherein the object holding member can further move slightly relative to the moving body in a direction orthogonal to the horizontal plane and about an axis direction parallel to the horizontal plane. For example, the exposure device according to any one of claims 1 to 21, further comprising a swing support device for supporting the object holding member to swing about an axis parallel to the horizontal plane. For example, the exposure device according to claim 22, wherein the swing support device supports the object holding member in a non-contact manner. For example, the exposure device of claim 22 or 23, wherein the swing support device is supported by the weight canceling device from below; The weight canceling device is mounted on the support member in a non-contact state. For example, the exposure device according to any one of claims 22 to 24, wherein the weight canceling device is provided with a force generating device that generates a vertical upward force; the swing support device is configured to be capable of Moving in the direction, the force generated by the force generating device is transmitted to the object holding member. A scanning type exposure device is configured to move an exposure target object in a first direction parallel to a horizontal plane with a predetermined first stroke during an exposure process with respect to an energy beam for exposure, and includes a first moving member capable of moving in the first direction. Move at least the predetermined first stroke; the second moving member guides the first moving member to move in the first direction, and can move in a second direction orthogonal to the first direction in the horizontal plane and the first movement The member moves in the second stroke together; the object holding member holds the object and can move at least in a direction parallel to the horizontal plane with the first moving member; the weight canceling device supports the object holding member from below to cancel the object holding The weight of the component; a support stand including a platform supporting the weight canceling device from below; a linear motor including a magnet provided on the second moving member and a coil provided on the first moving member; The first stroke is driven in the first direction; and a load reducing device that uses a force acting between the magnet and a part of the weight canceling device to reduce the force acting on the support Truck load of the direction of gravity of the gantry. For example, the exposure device according to any one of claims 1 to 26, wherein the object system is used for a substrate for manufacturing a flat display. A method for manufacturing a flat panel display includes: an operation of exposing the substrate using an exposure device in the 27th aspect of the patent application; and an operation of developing the substrate after the exposure. A component manufacturing method includes: an operation of exposing an object using the exposure device of any one of claims 1 to 26; and an operation of developing the object after exposure.